Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Abstract: Devices are disclosed herein which may comprise an EUV reflective optic having a surface of revolution that defines a rotation axis and a circular periphery. The optic may be positioned to incline the axis at a nonzero angle relative to a horizontal plane, and to establish a vertical projection of the periphery in the horizontal plane with the periphery projection bounding a region in the horizontal plane. The device may further comprise a system delivering target material, the system having a target material release point that is located in the horizontal plane and outside the region, bounded by the periphery projection and a system generating a laser beam for irradiating the target material to generate an EUV emission.

Abstract: An exemplary apparatus and method for producing a hyperthermal beam is provided. An apparatus may comprise a plasma discharge source, an emission system, and a magnetic source. The plasma discharge source may be configured to receive an elemental source, generate plasma based on the elemental source, and generate one or more neutral atoms of the elemental source. The emission system may be configured to emit a hyperthermal beam, comprising the one or more neutral atoms of the elemental source, from the plasma discharge source through an aperture of the plasma discharge source. The magnetic source may be configured to provide a magnetic field and to collimate the hyperthermal beam in a first direction and control a size of the hyperthermal beam.

Abstract: The present invention provides an apparatus which uses electromagnetic waves to identify and then quantifiably affect matter at the atomic and/or molecular level. The present invention generates frequencies that may range from DC to light waves and above, and then analyzes the transmitted, reflected, and absorbed interactions of said frequencies on any form of matter. The invention then defines and generates optimized combinations of said frequencies to create specific effects on said matter with a minimum of energy input and output.

Abstract: A reference structure tomography device is provided which includes a reference structure configured to intercept and modulate energy in the form of waves or otherwise propagating from a source to a sensor, along longitudinal and traverse directions. The reference structure modulates or otherwise conditions the propagating wave to simplify an inversion process on the data set created by the interaction between the wave and the sensors. The reference structure can modulate a wave through multiple types of interactions with the wave including obscuring, defracting, defusing, scattering, and otherwise altering any characteristic of a portion of the wave. By selecting a reference structure that is compatible with the sensors, the number of measurements needed to resolve the source through the source wave is reduced. The reference structure can also increase the resolution of an imaging system.

Abstract: A charged particle beam apparatus and a method for measuring an emission pattern of such an apparatus are provided. The apparatus comprises an emitter with an emission pattern including at least two emission peaks, a gun lens, and a diaphragm, wherein the gun lens comprises a deflector unit and the deflector unit is adapted to direct an emission peak of the at least two emission peaks to an opening of the diaphragm to thereby select the emission peak of the at least two emission peaks from the emission pattern.

Abstract: A source of pulsed radiation is coupled to a positionable filter. The positionable filter includes an element that produces an indication of a position of the filter. The source is configured to receive the indication of the position of the filter, and to regulate emission of a pulse of radiation based on the indication. A device includes an area including a material that alters a parameter of a beam of radiation that interacts with the material. The device is configured to move relative to a source of pulsed radiation. An element provides a signal to the source of pulsed radiation that indicates a position of the area relative to the source. The signal causes the source to trigger emission of a pulse at a time such that the emitted pulse is incident upon a portion of the area.

Abstract: Described is a radiation-emitting semiconductor body (1) with an active layer (2) for generation of radiation of a first wavelength (?1) and a reemission layer (3) which comprises a quantum well structure (4) comprising a quantum layer structure (5) and a barrier layer structure (6). The reemission layer is intended for generation of incoherent radiation of a second wavelength (?2) by absorption of the radiation of the first wavelength in the barrier layer structure.

Abstract: A method for creating a therapy plan for a particle therapy, in which a filter is used to adjust the depth of penetration of the particle beam and an immobilization device is used to immobilize a body region of a patient to be treated, includes adjusting the geometry of a deformable mass of a filter to the geometry of the immobilization device. The deformable filter mass is applied, at least partially, to the immobilization device. A planning data record is obtained with recordings of the filter, so that the properties of the filter are determined on the basis of the recordings and are used in the therapy plan.

Abstract: An active denial apparatus for use in non-lethal weaponry includes at least one focusing element configured to focus millimeter-wave energy along an axis of propagation. The at least one focusing element includes an astigmatic or dual axis focusing system configured to direct a focused beam that allows the active denial apparatus to accurately immobilize targets at both close and long range within acceptable limits of intensity.

Abstract: A micromechanical apparatus includes a moving element which comprises a controllable heating apparatus for introduction of a defined amount of heat into the moving element, wherein the apparatus furthermore has a control unit which is designed to control the heating apparatus as a function of an instantaneous temperature and/or of an instantaneous amount of heat that is introduced. The apparatus can be designed to project electromagnetic radiation when the moving element is in the form of a beam deflection unit for deflection of radiation, which originates from a radiation source, onto a projection surface.

Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

Abstract: Some embodiments of the disclosed subject matter provide systems, devices, and methods for tuning resonant wavelengths of an optical resonator. Some embodiments of the disclosed subject matter provide systems, devices, and methods for tuning dispersion properties of photonic crystal waveguides. In some embodiments, methods for tuning a resonant wavelength of an optical resonator are provided, the methods including: providing an optical resonator having a surface; determining an initial resonant wavelength emitted by the optical resonator in response to an electromagnetic radiation input; determining a number of layers of dielectric material based on a difference between the initial resonant wavelength and a target resonant wavelength and a predetermined tuning characteristic; and applying the determined number of layers of dielectric material to the surface of the optical resonator to tune the initial resonant wavelength to a tuned resonant wavelength.

Abstract: A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with he substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.

Abstract: Plasmon-enable devices such as ultra-small resonant devices produce electromagnetic radiation at frequencies in excess of microwave frequencies when induced to resonate by a passing electron beam. The resonant devices are surrounded by one or more depressed anodes to recover energy from the passing electron beam as/after the beam couples its energy into the ultra-small resonant devices.

Abstract: An illumination beam irradiation apparatus for use in pattern inspection systems is disclosed, which is less in deterioration of optical components and in attenuation of illumination light. The illumination apparatus includes a light source which yields a fundamental wave, a beam-shaper unit which performs beam-shaping of the fundamental wave so that this wave has a prespecified shape, and a pattern generator unit which operates, upon receipt of the beam-shaped fundamental wave, to convert this incoming wave into illumination light with a shorter wavelength to thereby generate illumination light of a prespecified shape. The illuminator also includes an image relay unit for guiding the illumination light that was generated by the pattern generator to fall onto a workpiece under inspection, such as a photomask or else.

Abstract: A system for providing extreme ultraviolet (EUV) radiation comprises a laser source arranged to produce a laser beam having a focus; and a carrier movable relative to the laser source for carrying a surface material, the surface material when carried by the carrier providing a renewable target edge. The focussed beam is arranged to impinge on the target edge to produce an EUV radiation emitting plasma. The system is cooperable with a mirror for harnessing the EUV radiation by reflecting EUV radiation impinging thereon. The mirror comprises a substantially aspheric surface and means for supplying a reflecting liquid to at least partially coat the aspheric surface, the mirror being rotatable to centrifugally confine the liquid to the aspheric surface.

Abstract: Apparatus for producing and storing positrons may include a trap that defines an interior chamber therein and that contains an electric field and a magnetic field. The trap may further include a source material that includes atoms that, when activated by photon bombardment, become positron emitters to produce positrons. The trap may also include a moderator positioned adjacent the source material. A photon source is positioned adjacent the trap so that photons produced by the photon source bombard the source material to produce the positron emitters. Positrons from the positron emitters and moderated positrons from the moderator are confined within the interior chamber of the trap by the electric and magnetic fields. Apparatus for producing and storing protons are also disclosed.

Abstract: The invention relates to a patient-positioning device for positioning a patient in an irradiation position in a radiation therapy arrangement, in particular in a particle radiation therapy arrangement comprising a patient supporting module, which is provided with a patient supporting device for holding the patient in a body holder where the irradiation is to be carried out, wherein, said patient supporting device is mounted on a base unit in such a way that it is rotatable about an axis by means of a bearing, said base unit is provided with a coupling element, the inventive device is also provided with a positioning arm, which comprises several joints and a coupling point for coupling the coupling element and for freely positioning the patient in any predefined irradiation position by adjusting the angle of rotation of the patient supporting module.

Abstract: A debris mitigation system for trapping debris coming from a tin debris-generating radiation source is provided. The debris mitigating system includes a debris barrier comprising a plurality of foils, and a cleaning system constructed and arranged to clean the foils. The cleaning system includes a supply unit to provide a liquid alloy to the foils to dissolve and flush trapped debris from the foils. The alloy includes gallium, indium, tin, or any combination thereof.

Abstract: Provided are an ion beam control apparatus and a control method for controlling an ion beam energy expansion level and an ion beam size in a radial direction. An ion beam control apparatus Sa is provided with an ion beam generating unit 2, and an ion beam control unit 1a in which a generated ion beam (IB) is input and controlled to be output with the prescribed level of energy expansion and the prescribed diameter in the radial direction. In the ion beam control unit 1a, phase rotation by a radio frequency electric field that increases existing probability with the prescribed level of energy is at least used.

Abstract: Interposing a programmable path length of one or more materials into a particle beam modulates scattering angle and beam range in a predetermined manner to create a predetermined spread out Bragg peak at a predetermined range. Materials can be “low Z” and “high Z” materials that include fluids. A charged particle beam scatterer/range modulator can comprise a fluid reservoir having opposing walls in a particle beam path and a drive to adjust the distance between the walls of the fluid reservoir under control by a programmable controller. A “high Z” and, independently, a “low Z” reservoir, arranged in series, can be used. When used for radiation treatment, the beam can be monitored by measuring beam intensity, and the programmable controller can adjust the distance between the opposing walls of the “high Z” reservoir and, independently, the distance between the opposing walls of the “low Z” reservoir according to a predetermined relationship to integral beam intensity.

Abstract: A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.

Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

Abstract: Multi-energy radiation sources comprising charged particle accelerators driven by power generators providing different RF powers to the accelerator, capable of interlaced operation, are disclosed. Automatic frequency control techniques are provided to match the frequency of RF power provided to the accelerator with the accelerator resonance frequency. In one example where the power generator is a mechanically tunable magnetron, an automatic frequency controller is provided to match the frequency of RF power pulses at one power to the accelerator resonance frequency when those RF power pulses are provided, and the magnetron is operated such that frequency shift in the magnetron at the other power at least partially matches the resonance frequency shift in the accelerator when those RF power pulses are provided. In other examples, when the power generator is a klystron or electrically tunable magnetron, separate automatic frequency controllers are provided for each RF power pulse.

Abstract: According to one exemplary embodiment, an extreme ultraviolet (EUV) source collector module for use in a lithographic tool comprises an EUV debris mitigation filter. The EUV debris mitigation filter can be in the form of an aerogel film, and can be used in combination with an EUV debris mitigation module comprising a combination of conventional debris mitigation techniques. The EUV debris mitigation filter protects collector optics from contamination by undesirable debris produced during EUV light emission, while advantageously providing a high level of EUV light transmittance. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a discharge-produced plasma (DPP) light source. One disclosed embodiment comprises implementation of an EUV debris mitigation filter in an EUV source collector module utilizing a laser-produced plasma (LPP) light source.

Abstract: A neutron moderator includes a neutron generator; a neutron moderating material arranged on one side of the neutron generator; a gamma ray shielding material covering an external surface of the neutron moderating material; and a thermal neutron absorbing material covering the external surface of the neutron moderating material except a side where the neutron generator is arranged.

Abstract: Apparatus, methods, and systems provide emitting and negatively-refractive focusing of electromagnetic energy. In some approaches the negatively-refractive focusing includes negatively-refractive focusing from an interior field region with an axial magnification substantially less than one. In some approaches the negatively-refractive focusing includes negatively-refractive focusing with a transformation medium, where the transformation medium may include an artificially-structured material such as a metamaterial.

Abstract: The present invention relates to a dielectric lens able to be used in both the radio wave band and the light wave band, and a device using this dielectric lens. The device comprises a dielectric lens formed of a transparent dielectric member being small in dielectric loss and having an omni-directional feature with regard to an electromagnetic wave, a transparent dielectric shell being hollow inside and having the radius of any one surface of this hollow shape that is equal to the focal distance of the dielectric lens, and a holding mechanism for positioning and holding the dielectric shell and the dielectric lens so as to locate the dielectric shell at a position along the focal distance with the dielectric lens included at the inner center of this dielectric shell. The device is provided, at the focal point of the dielectric lens, with a reflector for reflecting an electromagnetic wave or a generator for generating an electromagnetic wave.

Abstract: In a particle beam irradiation method and a particle beam irradiation apparatus in which depth direction irradiation field spread and lateral direction irradiation field spread are performed, an irradiation dose in each of the irradiation layers of an irradiation target is made substantially constant, the control is simplified, and the irradiation error by the displacement of the irradiation target is reduced. The depth direction irradiation field spread is an active irradiation field spread to superimpose plural irradiation layers having different ranges in the irradiation direction of the particle beam. A bolus having a shape along a deepest part of the irradiation target in the depth direction is disposed to cross the particle beam. At least one irradiation layer selected from the plural irradiation layers is re-irradiated one or more times with the particle beam.

Abstract: An ultraviolet radiation emission unit includes a housing and an aperture located on the housing. A radiation source includes a light emitting diode configured to emit radiation having a wavelength within a range of about 240 nm and about 280 nm. A radiation reflector is disposed proximate to the radiation source and configured to direct the radiation emitted from the radiation source through the aperture in the housing.

Abstract: A device for generating extreme ultraviolet (EUV) or soft X-ray radiation comprising: a laser source for producing a laser radiation which is focused to intensities beyond 106 W/cm2 onto a target to produce a plasma; and said electrodes located around the path of the plasma produced by the laser source; and said electrodes being combined with components for producing a rapid electric discharge in the plasma with a characteristic time constant which is less than the time constant of the laser produced plasma expansion time.

Abstract: A target supplier accelerates a target material injected from a nozzle such that a velocity of the target material after accelerated is kept within a predetermined range. The target supplier includes: a target nozzle that injects a target material in a liquid droplet state or solid particle state; an electric charge supplying unit that supplies electric charge to the target material; a charge amount measuring unit that measures an amount of the electric charge supplied to the target material by the electric charge supplying unit; a control unit that controls the electric charge supplying unit in a feedback manner based on a measurement result obtained by the charge amount measuring unit; and an accelerator that accelerates the target material supplied with the electric charge by the electric charge supplying unit.

Abstract: A lithographic apparatus includes a radiation system including a radiation source for the production of a radiation beam, and a contaminant trap arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels that are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

Abstract: An EUV (extreme ultra violet) light source device in which a degree of vacuum or cleanness in a plasma generation chamber is improved while the construction is simplified. The device includes a first chamber; a second chamber connected to the first chamber through an opening portion; a target supplier that supplies a target material into the first chamber; a droplet generating unit that generates droplets of the target material of molten metal repetitively dropping based on the target material supplied by the target supplier; a blocking unit that prevents the droplets of the target material generated by the droplet generating unit from passing through the opening portion; control unit that controls the blocking unit to operate at predetermined timing; a laser light source; and an optical system that leads a laser beam to the droplets of the target material introduced into the second chamber.

Abstract: A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with the substance at the interaction point, and a conduit constructed and arranged to deliver a buffer gas into the chamber. The conduit has an outlet located adjacent to the interaction point.

Abstract: Microwave source and polarizer which is formed of an electroformed monobloc comprising a thick plate or septum, greater than 1 mm in thickness. Frequencies of application include the 7.25 GHz and 8.4 GHz frequency bands.

Abstract: Spectral-purity filters (SPFS) are disclosed that produce a stream of “SPF gas” through which a beam of light, particularly a beam including extreme ultraviolet (EUV) light, is allowed to pass. The SPF can be located in a system that receives a beam of EUV-containing light from a source and delivers the beam to a downstream EUV-optical system, wherein the beam from the source passes through the SPF to the optical system. The gaseous SPF is formulated and configured to enrich the beam in at least one EUV wavelength as the beam passes through the gaseous SPF. For enrichment of EUV wavelengths, an exemplary SPF gas is ZrCl4. The stream of SPF gas can be sheathed in an inert “sheath gas.” The gaseous SPF is usable in a vacuum environment, in which used SPF gas, and sheath gas if used, is collected.

Abstract: An adjustable, low-temperature blackbody radiation system includes a blackbody enclosure having an optical port formed therein, and a cold element provided within the blackbody enclosure adjacent the optical port, the cold element configured to emit thermal radiation through the optical port. A dry gas source is in fluid communication with the blackbody enclosure, and is configured to purge the blackbody enclosure with a gas. A temperature control system is coupled to the cold element to maintain the cold element at a predetermined temperature. A light trap feature (e.g., a dark mirror cube corner structure) is incorporated into and/or around the cold element.

Abstract: The invention relates to a particle therapy apparatus having an accelerator for generating a particle beam, a passive energy modulator comprising an absorber element, and a control entity. The control entity is designed to switch between an active adjustment of the energy in the accelerator and a passive energy modulation by the energy modulator, for the purpose of changing the energy of the particle beam from a high energy level to a low energy level in a step-by-step manner. In particular, this has the effect of shortening the dead times when changing between the energy levels.

Abstract: Plasmon-enable devices such as ultra-small resonant devices produce electromagnetic radiation at frequencies in excess of microwave frequencies when induced to resonate by a passing electron beam. The resonant devices are surrounded by one or more depressed anodes to recover energy from the passing electron beam as/after the beam couples its energy into the ultra-small resonant devices.

Abstract: An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing optical element having a first range of operating center wavelengths; a droplet detection radiation source having a second range of operating center wavelengths; a drive laser steering element comprising a material that is highly reflective within at least some part of the first range of wavelengths and highly transmissive within at least some part of the second range of center wavelengths; a droplet detection radiation aiming mechanism directing the droplet detection radiation through the drive laser steering element and the lens to focus at a selected droplet detection position intermediate the droplet generator and the irradiation site.

Abstract: A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.

Abstract: A waveguide conduit is constructed and adapted to capture the light emitted by the at least one nano-resonant structure. The nano-resonant structure emits light in response to excitation by a beam of charged particles, The source of charged particles may be an ion gun, a thermionic filament, a tungsten filament, a cathode, a field-emission cathode, a planar vacuum triode, an electron-impact ionizer, a laser ionizer, a chemical ionizer, a thermal ionizer, or an ion-impact ionizer.

Abstract: A charged particle beam device is described. The charged particle beam device includes an emitter adapted for emitting a primary charged particle beam, a specimen location adapted for holding a specimen, from which secondary and/or backscattered charged particles are released on impingement of the primary charged particle beam, a detection unit adapted for detecting the secondary particles and/or secondary particles, and a beam guiding unit adapted for guiding the primary charged particle beam to the detection unit for impingement of a primary charged particle beam on the detection unit.

Abstract: The invention provides a method and an apparatus for preparing a relief printing form from a photosensitive element. More specifically, this invention describes a method and an apparatus for preparing a relief form in an environment having controlled oxygen concentration during exposure to actinic radiation. The method includes forming an in-situ mask on a photosensitive element, exposing the element to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and treating the exposed element to form the relief printing form having a pattern of raised surface areas.

Abstract: A combination of radio frequency energy responsive and infrared energy responsive reflection based plasma radiant energy steering apparatus usable in directing radiant energy originating in for example an antenna array or an infrared source in order to direct the energy to a point of use under conditions of low inertia electrical directing control. Plasma gas films of electrode element determined properties achieve reflection control of the radiant energy both with and without use of a discrete reflector element. Theoretical support and identification of prior art supporting documents are included in the disclosure.

Abstract: In order to obtain optimal reflectivity on optical elements for the EUV and the soft X-ray range, multilayers constructed of a number of layers are used. Contamination or degradation of the surface leads to imaging defects and transmission losses. In the prior art, it has been attempted to counter a negative change in the surface by providing a cover layer system on the surface of the reflective optical element that should protect the surface. The invention renders the influence of the surface degradation manageable by a targeted selection of the distribution of thickness of the cover layer system, whereby at least one layer of the cover layer system has a gradient that is not equal to zero.

Abstract: A device couples energy from an electromagnetic wave to charged particles in a beam. The device includes a micro-resonant structure and a cathode for providing electrons along a path. The micro-resonant structure, on receiving the electromagnetic wave, generates a varying field in a space including a portion of the path. Electrons are deflected or angularly modulated to a second path.

Abstract: The states of matter system (110) having only ones basis state that couples to an excited state can be entangled using measurements of photons during transitions from the excited state. High efficiency of entanglement operation can be achieved by repeating the measurements after performing bit flips on the matter systems (110). High efficiency of entanglement operation can be achieved using non-absorbing parity measurements on the emitted photons so that measured photons can be subsequently manipulated and measured to near-deterministically produce entangled states. Such entanglement operations can be employed to construct cluster states suitable for simulating arbitrary logic networks.