Abstract: This device comprises a single radioactive source (44), capable of creating an incident beam (120), and a target (48) placed opposite the source (44). The target (48) is capable of creating the second beam (130) by interacting with a first part of the incident beam (120), a second part of the incident beam (120) passing through the target (48) to form the first beam (124).

Abstract: A method and irradiator apparatus used for wort sterilization by radiation for production of ethanol from sugar cane, comprising a modular irradiation drum, radioactive source, ducts for transmission of a fluid through an apparatus for irradiation, and application of radiation to a fluid within an apparatus for sterilization of such fluid.

Abstract: A lamp head module includes a high aspect ratio, high fill factor array of light emitting devices and a submount. The array includes multiple groups of electrically seriesed light emitting devices that are connected in electrical parallel. The submount is of monolithic construction and includes multiple L-shaped patterned circuit material layers. Each of the L-shaped patterned circuit material layers includes an arm portion and a stem portion. The arm portion functions as a light emitting device bond pad and the stem portion functions as a wire bond pad and a circuit trace. Each light emitting device of a group is affixed to a corresponding arm portion of the submount. The stem portions are located external to the array, run parallel to the length of the array and perform a primary current carrying function for current flow between adjacent light emitting devices of the group.

Abstract: According to a first aspect of the present invention, there is provided a radiation source comprising: a nozzle configured to direct a stream of fuel droplets (70) along a trajectory towards a plasma formation location; a laser configured to direct laser radiation at a fuel droplet at the plasma formation location to generate, in use, a radiation generating plasma; wherein the laser comprises: a seed laser (50) for providing a seed laser beam (52); a beam splitter (54) for receiving the seed laser beam from the seed laser; an optical amplifier (58) for receiving the seed laser beam from the beam splitter and performing optical amplification; a first reflector (60) located downstream of the optical amplifier, configured to direct the seed laser beam back through the optical amplifier and on to the beam splitter; and a second reflector (70) located further downstream of the beam splitter, configured to receive the seed laser beam from the beam splitter and to direct at least a portion of the seed laser beam bac

Abstract: The invention comprises a multi-field charged particle irradiation method and apparatus. Radiation is delivered through an entry point into the tumor and Bragg peak energy is targeted to a distal or far side of the tumor from an ingress point. Delivering Bragg peak energy to the distal side of the tumor from the ingress point is repeated from multiple rotational directions. Preferably, beam intensity is proportional to radiation dose delivery efficiency. Preferably, the charged particle therapy is timed to patient respiration via control of charged particle beam injection, acceleration, extraction, and/or targeting methods and apparatus. Optionally, multi-axis control of the charged particle beam is used simultaneously with the multi-field irradiation. Combined, the system allows multi-field and multi-axis charged particle irradiation of tumors yielding precise and accurate irradiation dosages to a tumor with distribution of harmful irradiation energy about the tumor.

Abstract: There is provided a charged particle beam treatment planning device that creates a treatment plan and is connected to a charged particle beam irradiation apparatus that includes a scanning electromagnet, which scans a charged particle beam, and a degrader, which adjusts a range of the charged particle beam by reducing the energy of the charged particle beam, and irradiates an irradiation object with the charged particle beam. The charged particle beam treatment planning device includes a control unit that adjusts the dose of the charged particle beam, which is irradiated to a predetermined position of the irradiation object, on the basis of a passing distance of the charged particle beam within the degrader calculated using a deflection angle of the charged particle beam.

Abstract: Embodiments of the present invention relate to an electromagnetic wave beam splitter, comprising a functional layer made of at least one metamaterial sheet, wherein different metamaterial sheets have the same refractive index distribution; the metamaterial sheet may be divided into a circular region and an annular region concentric to the circular region; a refractive index increases continuously as a radius increases and refractive indices at the same radius are the same within the circular region; and a refractive index decreases continuously as a radius increases and refractive indices are the same at the same radius within the annular region.

Abstract: A method for testing the sensitivity of electronic components and circuits against particle and photon beams using laser-plasma interaction, in which the flexibility of the multifaceted interaction can produce several types of radiation such as electron, proton, ion, neutron and photon radiation, and combinations of these types of radiation, in a wide range of parameters that are relevant to the use of electronic components in space, such as satellites, at high altitudes or in facilities that work with radioactive substances such as nuclear power plants. Relevant radiation parameter ranges are accessible by this method, which are hardly accessible with conventional accelerator technology. Because of the compactness of the procedure and its versatility, radiation testing can be performed in smaller laboratories at relatively low cost.

Abstract: The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (3), and a collector optics (6) for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics (6) in order to protect the collector optics (6) from debris (4) generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (6). By thus shielding the collector optics (6) from the debris (4) its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics (6).

Abstract: Dental curing systems, apparatuses, and methods may include a light source, a perforated plate, and a dental composite. The perforated plate may be positioned between the light source and the dental composite. The perforated plate may include a plurality of perforations that convert a first curing light beam from the light source into multiple curing light beams before reaching the dental composite. The multiple curing light beams come in contact with the dental composite to begin the curing process at certain locations on the dental composite. The perforated plate may then be removed, and a second curing light beam from the light source may be applied to the dental composite to complete the curing process.

Abstract: Embodiments of a grey-scale holographic structure and system for generating a collimated wavefront in a compact range are generally described herein. In some embodiments, the grey-scale holographic structure comprising millimeter-wave transmissive material having a surface arranged to provide differing amounts of phase-delay to an incident millimeter-wave wavefront as the incident wavefront passes through the material. The grey-scale holographic structure may comprises a plurality of layers (N) to provide a phase total delay of lambda which results from a series tuned layers, each having a thickness of a wavelength/N. Each layer provides a predetermined amount of phase delay allowing the structure to operate as a phase-delay hologram.

Abstract: A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.

Abstract: An active denial apparatus for use in non-lethal weaponry includes at least one focusing element configured to focus millimeter-wave energy along an axis of propagation. The at least one focusing element includes an astigmatic or dual axis focusing system configured to direct a focused beam that allows the active denial apparatus to accurately immobilize targets at both close and long range within acceptable limits of intensity.

Abstract: A self-powered ‘near field’ lithographic system 100 includes three primary components, namely, a thin film or emitter substrate 110 including a radioactive material (e.g., a radioisotope 112), a target substrate 120 which carries an energy-modifiable layer 122 (e.g., photo-resist) and a stencil (e.g., 130) that is either positioned between the emitter and target substrates fabricated upon and defined in the emitter substrate. The stencil is made from a material capable of blocking particles emitted through radioactive decay from the radioisotope of the emitter substrate. The stencil includes openings or vias 132 patterned to permit selective transmission of the particles emitted through radioactive decay from the radioisotope of the emitter substrate 110, and the stencil is preferably placed up against (or very close to) the target substrate 120.

Abstract: A beam filter positioning device includes a first and a second axes operable to move a body supporting one or more collimators, one or more photon flattening filters, one or more electron foils, and field light mirror etc. The collimators may be configured to collimate radiation to define a treatment beam suitable for radiosurgery. A controller is programmed to control the servo motor of the first and second axes to accurately position the beam filters. Radiation apparatuses and systems incorporating the beam filter positioning device or assembly are also provided.

Abstract: An ion accelerator includes a plasma ion source and a micro-collimator. The micro-collimator has a plurality of channels. The length-to-width ratio of each channel is greater than five, and the channel width is less than one micron. The ion source is coupled to the micro-collimator such that ions from the ion source pass into the channels, and then through the plurality of channels. In one specific example, the ion source produces cold ions that have only a small amount of lateral momentum. Each channel is an individually gated acceleration channel that is formed into a solid dielectric material. Ions are accelerated down the acceleration channel. The ion accelerator forms a part of an ionjet head of a Direct Write On Wafer (DWOW) printing system. The DWOW printing system is useful in semiconductor processing in that it can direct write an image onto a 300 mm diameter wafer in one minute.

Abstract: In order to obtain optimal reflectivity on optical elements for the EUV and the soft X-ray range, multilayers constructed of a number of layers are used. Contamination or degradation of the surface leads to imaging defects and transmission losses. In the prior art, it has been attempted to counter a negative change in the surface by providing a cover layer system on the surface of the reflective optical element that should protect the surface. The invention renders the influence of the surface degradation manageable by a targeted selection of the distribution of thickness of the cover layer system, whereby at least one layer of the cover layer system has a gradient that is not equal to zero.

Abstract: The present invention relates to a display apparatus and to a display method adopting a novel system capable of displaying images using light in the invisible spectrum instead of using light in the visible spectrum which can be observed by the naked eye of a human. The novel system may be applied to various display apparatuses such as a television, a computer monitor, a mobile phone, a game console screen, and an outdoor advertisement display panel for displaying a variety of pieces of information such as documents, pictures, and videos.

Abstract: Disclosed is a terahertz wave generator which includes a first light source outputting a first light having a first frequency; a second light source outputting a second light having a second frequency different from the first frequency; a second harmonic generation unit performing second harmonic conversion on the first and second lights to generate a third light and a fourth light; and a photomixer converting a mixing light of the third and fourth lights into a terahertz wave alternating signal and outputting a terahertz wave.

Abstract: An extreme ultra violet light source device of a laser produced plasma type, in which charged particles such as ions emitted from plasma can be efficiently ejected. The extreme ultra violet light source device includes: a target nozzle that supplies a target material; a laser oscillator that applies a laser beam to the target material supplied from the target nozzle to generate plasma; collector optics that collects extreme ultra violet light radiated from the plasma; and a magnetic field forming unit that forms an asymmetric magnetic field in a position where the laser beam is applied to the target material.

Abstract: In an LPP type EUV light source apparatus, the intensity of radiated EUV light is stabilized by improving the positional stability of droplets. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a target supply division including a target tank for storing a target material therein and an injection nozzle for injecting the target material in a jet form, for supplying the target material into the chamber; a charging electrode applied with a direct-current voltage between the target tank and itself, for charging droplets when the target material in the jet form injected from the injection nozzle is broken up into the droplets; a laser for applying a laser beam to the droplets of the target material to generate plasma; and a collector mirror for collecting extreme ultra violet light radiated from the plasma to output the extreme ultra violet light.

Abstract: An ionization device comprises: a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons. The plasma source comprises an aperture disposed such that at least part of the light passes through the aperture and is incident on a gas sample. The ionization device further comprises an ionization region; and a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region.

Abstract: The invention concerns a passive terahertz radiation source configured to emit electromagnetic radiation having frequency in the range of 10 GHz to 50 THz and a method for generating a terahertz radiation. The passive terahertz radiation source comprises: a source of a pulsed excitation light; an emitter comprising one or more emitter elements, each emitter element comprising a semiconductor layer being arranged such that at least a portion of a first major surface of said semiconductor layer is exposed to the excitation light, wherein each emitter element is configured such that upon exposure to the excitation light, a gradient of the charge carrier density is generated in the semiconductor layer in the area of transition between a first area of the semiconductor layer and a second area of the semiconductor layer, the gradient being substantially parallel to the first major surface of the semiconductor layer.

Abstract: This invention provides for a removable/replaceable, wavelength-transforming sleeve/sheath to be placed around a primary UV radiation source that emits a primary UV wavelength spectral distribution; such that at least a portion of the sleeve/sheath transforms at least a portion of the primary UV wavelength spectral distribution to a different secondary wavelength spectral distribution. Additionally, the sleeve/sheath may help to prevent breakage of the primary UV radiation source and to contain the broken pieces in the event of breakage. In some embodiments, a portion of the sleeve/sheath may be coupled with a UV reflective surface to direct radiation in a preferred direction. Individual sleeves/sheaths may have various patterns of wavelength-transforming materials that emit one or more secondary wavelength spectral distributions and the sleeve/sheath may also have one or more sections that allow transmission of the primary UV wavelength spectral distribution.

Abstract: A self-focusing radioactive source device and a radiating apparatus employing the same are disclosed. The self-focusing radioactive source device includes: a source capsule; a source body disposed in the source capsule; and M radioactive sources arranged in the source body, wherein radioactive rays emitted from the M radioactive sources in the source capsule are focused on a common focus, and wherein M is a natural number greater than 1. The self-focusing radioactive source device and the radiating apparatus can greatly reduce the volume and weight of the source body, obtain a small penumbra and small focus radius, and provide flexible incident angles and wide applications.

Abstract: An electron gun, an electron source for an electron gun, an extractor for an electron gun, and a respective method for producing the electron gun, the electron source and the extractor are disclosed. Embodiments provide an electron source utilizing a carbon nanotube (CNT) bonded to a substrate for increased stability, reliability, and durability. An extractor with an aperture in a conductive material is used to extract electrons from the electron source, where the aperture may substantially align with the CNT of the electron source when the extractor and electron source are mated to form the electron gun. The electron source and extractor may have alignment features for aligning the electron source and the extractor, thereby bringing the aperture and CNT into substantial alignment when assembled. The alignment features may provide and maintain this alignment during operation to improve the field emission characteristics and overall system stability of the electron gun.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: A method for cleaning collector mirrors in an EUV light generator in which a target is made into a plasma state and EUV light generated is collected by a collector mirror, the method being adopted to the EUV light generator for cleaning contaminants adhering thereto, the method comprising: preparing at least two collector mirrors; locating one of the mirrors at an EUV light condensing position while locating the other mirror at a cleaning position; determining whether the mirror at the cleaning position is cleaned while determining whether the mirror at the light condensing position requires cleaning; and once determined that the mirror at the cleaning position is cleaned and the mirror at the light condensing position requires cleaning, conveying the mirror at the light condensing position and requiring cleaning to the cleaning position while conveying the mirror at the cleaning position and having been cleaned to the light condensing position.

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Abstract: Provided are methods of tuning the emission wavelength from a tunable infrared plasmonic emitting structure, which structure comprises: (a) a perforated or patterned first conductive layer having a plurality of relief features provided in a periodic spatial configuration, wherein the relief features are separated from each other by adjacent recessed features, wherein the distance between features is between 1-15 ?m; (b) a dielectric layer underlying the first conductive layer; (c) a second conductive layer underlying the dielectric film; and (d) a substrate underlying the second conductive layer; wherein the emission wavelength is tuned by applying a force in a biaxial direction parallel to the substrate, changing the distance between relief features, or changing the resistivity and dielectric constant of the dielectric layer.

Abstract: An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

Abstract: In a deep-ultraviolet tight source includes sapphire substrate, a wide band gap semiconductor layer having a wavelength smaller than 300 nm, formed on the sapphire substrate, and en electron beam source for irradiating the wide band gap semiconductor layer with an electron beam. The wide band gap semiconductor layer is configured to be irradiated with the electron beam to emit deep-ultraviolet light through the sapphire substrate. A thickness t1 of the sapphire substrate satisfies: t1??·E3 is an energy of the electron beam (keV); and ? is 1 ?m/(keV)3.

Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

Abstract: An active denial apparatus for use in non-lethal weaponry includes at least one focusing element configured to focus millimeter-wave energy along an axis of propagation. The at least one focusing element includes an astigmatic or dual axis focusing system configured to direct a focused beam that allows the active denial apparatus to accurately immobilize targets at both close and long range within acceptable limits of intensity.

Abstract: In a photon pair generating apparatus for generating a pair of correlated photons by hyper-parametric scattering, a light-shaping section irradiates an optical resonator with two beams of light of equal wavelength from different directions, and the optical resonator is configured to emit two correlated photons of different wavelengths in one direction as a pair of correlated photons. This makes it possible to provide a photon pair generating apparatus capable of achieving generation of a pair of correlated photons by a simpler configuration.

Abstract: A photoneutron-x ray source includes a photoneutron conversion target, which outputs both photoneutrons and x-rays simultaneously. The photoneutron-x ray source includes an x-ray generator for generating an x-ray main beam that is applied to the photoneutron conversion target. The photoneutron conversion target generates photoneutrons upon the application of the x-ray main beam to the photoneutron conversion target. The photoneutron conversion target has a body that defines a passageway extending through the body and that is structured such that a first x-ray beam of the x-ray main beam can pass through the passageway without any reaction with the body, while a second x-ray beam of the x-ray main beam can enter the body and react with the body to emit the photoneutrons.

Abstract: The present invention relates to a debris mitigation device for use with a radiation source (2) generating optical radiation, in particular extreme ultraviolet radiation (EUV) or soft x-rays, and emitting undesired substances and/or particles which can deposit on optical surfaces in a radiation path of said radiation source (2), and to a corresponding drive assembly. The debris mitigation device comprises at least one rotating foil trap (5) and the drive assembly. The drive assembly comprises a driving motor (14) and a driving axis (10), to which the rotating foil trap (5) is fixed. The driving motor (14) and bearings (13) supporting the driving axis (10) are enclosed in a casing (20) having an aperture for the driving axis (10) and at least one outlet opening (21) for a sealing gas. The outlet opening (21) is connectable to a pump for pumping out the sealing gas.

Abstract: A terahertz (THz) anti-reflection device, for example, a broadband tunable THz anti-reflection device, includes a silicon substrate having a plurality of recesses, each of the plurality of recesses having a plurality of cavities of decreasing dimension. The cavities may be nested polygonal cavities, for example, having a square or rectangular cross section. The recesses having the cavities may be positioned at regular periods, for example, periods ranging from 10 ?m to 20 ?m. The devices may be fabricated by conventional lithographic methods. Also disclosed are methods for modifying terahertz radiation and methods for fabricating anti-reflection devices.

Abstract: A charged particle beam device is described. The device includes an emitter unit including an emitter tip; a voltage supply unit adapted for providing a stable voltage to generate a stable extraction field at the emitter tip; a pulsed voltage supply member adapted for providing a pulsed voltage to generate a pulsed extraction field on top of the stable extraction field; a measuring unit for measuring an emitter characteristic; and a control unit adapted for receiving a signal from the measuring unit and for control of the pulsed voltage supply member.

Abstract: One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece. The ion implanter also includes an array of absorption and radiation elements arranged to absorb energy of the scanned ion beam and radiate at least some of the absorbed energy away from the propagation direction. A detection element (e.g., an infrared detector) is arranged to detect energy (e.g., in the form of heat) radiated by the array of absorption and radiation elements and to determine a beam profile of the scanned ion beam based on the detected energy.

Abstract: An apparatus includes a chamber configured to support a number of quasi-orthogonal resonant modes, and at least one antenna assembly, where the antenna assembly includes an antenna having a radiating element, where (i) the antenna has predominantly linear polarization of radiation defined by a polarization plane, (ii) the radiating element is disposed within the chamber such that the polarization plane is not parallel and not perpendicular to the plane containing a primary axis of the chamber and a central point of the radiating element, and (iii) each antenna is coupled to the chamber through a designated surface of the chamber and coupled to a source of microwave or radio frequency energy external to the chamber having a nominal operating frequency.

Abstract: A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.

Abstract: Irradiating assemblies can have a housing with a reflector extending linearly parallel to a lamp. Radiation can be emitted from one opening, for example in a bottom portion of the housing, as well as from another opening, for example a side opening in the housing. Irradiating assemblies can also have first and second reflector portions at angles with respect to each other wherein radiation is reflected out of a housing that does not have an end reflector. Irradiating assemblies can be configured to have cooling flow openings in side walls so that cooling fluid such as air can flow between the side walls and adjacent surfaces of a reflector. Irradiating assemblies can incorporate lamps having first and second electrodes wherein the first and second electrodes are oriented at an angle with respect to each other.

Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.

Abstract: An apparatus for forming a beam of electromagnetic radiation. The apparatus includes a plasma radiation source, a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source, and a grid disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. An electrical potential application circuit is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap. A distance between the grid and the foil trap is at least equal to one-half of a radius of the foil trap.

Abstract: In a light source device provided with a light emission tube in which a light emitting element is enclosed and at least one laser oscillator part for radiating a laser beam towards said light emission tube, for focusing a beam within a light emission tube with a large solid angle and for preventing that the beam with a high energy density impinges upon the wall of the light emission tube, the light emission tube has a tube wall, part of which is made to function as a focusing means, or the light emission tube has a focusing means at the inner surface thereof.

Abstract: A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

Abstract: Exemplary embodiments of system and apparatus can be provided for treating various dermatological and biological conditions using electromagnetic energy in the form of optical radiation. For example, energy can be provided by a chemical reaction, such as by combustion of a fine metallic filament, which can be used to generate a high-intensity pulse of energy without requiring external energy sources. Various parameters of the reactive materials and enclosures can be selected and/or applied to provide a radiation pulse having particular characteristics, including fluence, peak intensity, and radiation wavelength distribution. Various filters may be provided to further modify characteristics of the radiation. Such radiation pulses can be used to irradiate tissue such as skin to obtain various therapeutic or beneficial effects, including improvement in the appearance of pigmented or venous lesions.