Abstract: A wafer level chip scale package (WLCSP) includes a semiconductor device including an active surface having a contact pad, and side surfaces. A mold covers the side surfaces of the semiconductor device. A RDL structure includes a first PPI line electrically connected to the contact pad and extending on the active surface of the semiconductor device. A UBM layer is formed over and electrically connected to the first PPI line. A seal ring structure extends around the upper periphery of the semiconductor device on the mold. The seal ring structure includes a seal layer extending on the same level as at least one of the first PPI line and the UBM layer. A method of manufacturing a WLCSP includes forming a re-routing laminated structure by simultaneously forming an interconnection line and a seal layer on the molded semiconductor devices.

Abstract: A seal ring structure is formed through a multilayer structure of a plurality of dielectric films in a peripheral part of a chip region to surround the chip region. A dual damascene interconnect in which an interconnect and a plug connected to the interconnect are integrated is formed in at least one of the dielectric films in the chip region. Part of the seal ring structure formed in the dielectric film in which the dual damascene interconnect is formed is continuous. A protection film formed on the multilayer structure has an opening on the seal ring. A cap layer connected to the seal ring is formed in the opening.

Abstract: In a method for manufacturing a diode, a semiconductor crystal wafer is used to produce a p-n or n-p junction, which extends in planar fashion across the top side of a semiconductor crystal wafer. Separation edges form perpendicularly to the top side of the semiconductor crystal wafer, which edges extend across the p-n or n-p junction. The separation of the semiconductor crystal wafer is achieved in that, starting from a disturbance, a fissure is propagated by local heating and local cooling of the semiconductor crystal wafer. The separation fissure thus formed extends along crystal planes of the semiconductor crystal, which avoids the formation of defects in the area of the p-n or n-p junction.

Abstract: A method of manufacture of an integrated circuit packaging system includes: forming an integrated circuit device having a device contact surface, a device lateral side, and a device backside opposite the device contact surface; forming a device shell, having a shell lip, contiguous with the device backside and the device lateral side, the shell lip adjacent to and coplanar with the device contact surface; attaching a substrate to the integrated circuit device, the device shell between the integrated circuit device and the substrate; and forming an encapsulation on the substrate and covering the integrated circuit device and the device shell.

Abstract: The scribe line structure for wafer dicing according to the present invention includes a plurality of metal structures arranged up-and-down on a substrate in a dielectric layer, and an upper one of the metal structures has a lower metal density than a lower one of the metal structures. In another aspect, the scribe line structure for wafer dicing includes a plurality of metal structures arranged up-and-down on a substrate in a dielectric layer, and each of the metal structures has a lower metal density on a dicing path for the wafer dicing than not on the dicing path. The scribe line structure can effectively avoid interlayer delamination or peeling issue caused by a dicing process, especially on a low-k/Cu wafer.

Abstract: In accordance with certain embodiments, semiconductor dies are at least partially coated with a conductive adhesive prior to singulation and subsequently bonded to a substrate having electrical traces thereon.

Abstract: The present invention provides a technique for improving the reliability of a semiconductor device where spreading of cracking that occurs at the time of dicing to a seal ring can be restricted even in a semiconductor device with a low-k film used as an interlayer insulating film. Dummy vias are formed in each layer on a dicing region side. The dummy vias are formed at the same intervals in a matrix as viewed in a top view. Even in the case where cracking occurs at the time of dicing, the cracking can be prevented from spreading to a seal ring by the dummy vias. As a result, resistance to moisture absorbed in a circuit formation region can be improved, and deterioration in reliability can be prevented.

Abstract: A semiconductor device and a method of fabricating the same, includes vertically stacked layers on an insulator. Each of the layers includes a first dielectric insulator portion, a first metal conductor embedded within the first dielectric insulator portion, a first nitride cap covering the first metal conductor, a second dielectric insulator portion, a second metal conductor embedded within the second dielectric insulator portion, and a second nitride cap covering the second metal conductor. The first and second metal conductors form first vertically stacked conductor layers and second vertically stacked conductor layers. The first vertically stacked conductor layers are proximate the second vertically stacked conductor layers, and at least one air gap is positioned between the first vertically stacked conductor layers and the second vertically stacked conductor layers.

Abstract: A wafer-scale assembly circuit including a plurality of metal interconnect layers, where each metal layer includes patterned metal portions and where at least some of the patterned metal portions are RF signal lines. The circuit further includes at least one benzocyclobutene layer provided between two metal interconnect layers that includes at least one trench via formed around a perimeter of the benzocyclobutene layer at a circuit sealing ring, where the trench via provides a hermetic seal at the sealing ring. The benzocyclobutene layer also includes a plurality of stabilizing post vias formed through the benzocyclobutene layer adjacent to the trench via proximate to the sealing ring and extending around the perimeter of the benzocyclobutene layer, where the stabilizing vias operate to prevent the benzocyclobutene layer from shrinking in size.

Abstract: Systems and methods are disclosed for manufacturing grounded gate cross-hair cells and standard cross-hair cells of fin field-effect transistors (finFETs). In one embodiment, a process may include forming gate trenches and gates on and parallel to row trenches in a substrate, wherein the gate trenches and gates are pitch-doubled such that four gate trenches are formed for every two row trenches. In another embodiment, a process may include forming gate trenches, gates, and grounded gates in a substrate, wherein the gate trenches and gates are formed such that three gate trenches are formed for every two row trenches.

Abstract: The present disclosure relates generally to semiconductor techniques. More specifically, embodiments of the present disclosure provide methods for efficiently dicing substrates containing gallium and nitrogen material. Additionally the present disclosure provide techniques resulting in a optical device comprising a substrate having three or more corners, where at least one of the corners is defined by a dislocation bundle characterized by a diameter of less than 100 microns, the gallium and nitrogen containing substrate having a predefined portion free from dislocation bundle centers, an active region containing one or more active layers, the active region being positioned within the predefined region; and a conductive region formed within the predefined region.

Abstract: The invention provides an electronic device package structure and method of fabrication thereof. The electronic device package structure includes a chip having an active surface and a bottom surface. A dielectric layer is disposed on the active surface of the chip. At least one trench is formed through the dielectric layer. A first protection layer covers the dielectric layer and sidewalls of the trench. A second protection layer covers the first protection layer, filling the trench.

Abstract: Provided is an apparatus that includes an overlay mark. The overlay mark includes a first portion that includes a plurality of first features. Each of the first features have a first dimension measured in a first direction and a second dimension measured in a second direction that is approximately perpendicular to the first direction. The second dimension is greater than the first dimension. The overlay mark also includes a second portion that includes a plurality of second features. Each of the second features have a third dimension measured in the first direction and a fourth dimension measured in the second direction. The fourth dimension is less than the third dimension. At least one of the second features is partially surrounded by the plurality of first features in both the first and second directions.

Abstract: A method of manufacturing a semiconductor device forms the semiconductor device in a device region of a semiconductor substrate simultaneously with forming a monitor semiconductor device that includes a gate electrode made of silicon containing material arranged on a gate insulating film in a monitor region of the semiconductor substrate, a source electrode and a drain electrode formed on the semiconductor substrate on corresponding sides of the gate electrode. The gate electrode is removed without removing a gate insulating film by applying pyrolysis hydrogen generated by pyrolysis on the monitor semiconductor device in the monitor region, and the gate insulating film is removed by a wet process. Impurities distribution of a silicon active region appearing after the gate electrode is removed is measured and fed back to a semiconductor manufacturing process.

Abstract: A semiconductor device is made by providing a first semiconductor wafer having semiconductor die. A gap is made between the semiconductor die. An insulating material is deposited in the gap. A portion of the insulating material is removed to form a first through hole via (THV). A conductive lining is conformally deposited in the first THV. A solder material is disposed above the conductive lining of the first THV. A second semiconductor wafer having semiconductor die is disposed over the first wafer. A second THV is formed in a gap between the die of the second wafer. A conductive lining is conformally deposited in the second THV. A solder material is disposed above the second THV. The second THV is aligned to the first THV. The solder material is reflowed to form the conductive vias within the gap. The gap is singulated to separate the semiconductor die.

Abstract: A method for manufacturing an electronic component includes mounting a vibrating element on each singulation region of a base substrate, joining the surface of a lid substrate where grooves are arranged to the base substrate via low-melting glass so as to cover a functional element in each singulation region, thereby obtaining a laminate, and performing singulation in each singulation region by breaking the laminate along grooves.

Abstract: A wafer-leveled chip packaging method, comprising the steps of: providing a wafer; attaching at least one first chip to the wafer; forming a first insulating layer on the wafer; forming a plurality of first conductive vias penetrating the first insulating layer, wherein parts of the first conductive vias are electrically connected with the first chip; forming a conductive pattern layer on the surface of the first insulating layer wherein the conductive pattern layer is electrically connected with the first conductive vias; forming a plurality of through holes penetrating the wafer; filling a second insulating layer in the through holes; and forming a plurality of second conductive vias in the second insulating layer, wherein the second conductive vias are electrically connected with the first conductive vias.

Abstract: The present disclosure provides a semiconductor device, including a substrate having a seal ring region and a circuit region, a seal ring structure disposed over the seal ring region, a first passivation layer disposed over the seal ring structure, the first passivation layer having a first passivation layer aperture over the seal ring structure, and a metal pad disposed over the first passivation layer, the metal pad coupled to the seal ring structure through the first passivation layer aperture and having a metal pad aperture above the first passivation layer aperture. The device further includes a second passivation layer disposed over the metal pad, the second passivation layer having a second passivation layer aperture above the metal pad aperture, and a polyimide layer disposed over the second passivation layer, the polyimide layer filling the second passivation layer aperture to form a polyimide root at an exterior tapered edge of the polyimide layer.

Abstract: The invention provides a die seal ring structure. The die seal ring structure includes an inner seal ring portion surrounding an integrated circuit region. An outer seal ring portion is surrounded by a scribe line, surrounding the inner seal ring portion, wherein the outer seal ring portion has an outer top metal layer pattern with a first width extending over the inner seal ring portion and connecting to an inner next-to-top metal layer pattern of the inner seal ring portion. A first redistribution pattern is disposed on the outer top metal layer pattern, having a second width which is narrower than the first width. A second redistribution pattern is disposed on the first redistribution pattern. A redistribution passivation layer covers the second redistribution pattern and the inner seal ring portion, wherein the redistribution passivation layer is separated from the scribe line by a second distance.

Abstract: A seal ring structure is formed through a multilayer structure of a plurality of dielectric films in a peripheral part of a chip region to surround the chip region. A dual damascene interconnect in which an interconnect and a plug connected to the interconnect are integrated is formed in at least one of the dielectric films in the chip region. Part of the seal ring structure formed in the dielectric film in which the dual damascene interconnect is formed is continuous. A protection film formed on the multilayer structure has an opening on the seal ring. A cap layer connected to the seal ring is formed in the opening.

Abstract: A wafer having a die area and a scribe street is formed. The die area comprises die circuitry and a plurality of bond pads, and the scribe street comprises a test structure. Circuitry of the test structure is probed, and then a passivation layer overlying the surface of the wafer is formed, the passivation layer overlying the plurality of bond pads and overlying the test structure. Openings in the regions of the passivation layer overlying the plurality of bond pads are then formed to expose the plurality of bond pads while retaining the regions of the passivation layer overlying the test structure until singulation of the wafer. Pad metallizations are formed at the plurality of bond pads via the openings in the regions of the passivation layer and the wafer is singulated. The resulting dies may be packaged and the resulting IC packages may be implemented in electronic devices.

Abstract: A semiconductor wafer having a plurality of interconnect layers, includes a plurality of chip-composing portions, a dicing region separating the chip-composing portions from each other, and a plurality of inter-chip interconnects formed in the dicing region and electrically connecting adjacent ones of the chip-composing portions, wherein each of the inter-chip interconnects has a width of an intermediate portion narrower than widths of connection end portions connected to the adjacent ones of the chip-composing portions.

Abstract: A semiconductor wafer includes at least one chip formed on a substrate, and a scribe line region surrounding the chip. The chip includes a device formation region, and a chip boundary region surrounding the device formation region and formed between the device formation region and the scribe line region. The chip boundary region includes a guard ring structure which physically separates the device formation region from the scribe line region. The guard ring structure includes a signal transfer element which transfers an electric signal between the device formation region and the scribe line region.

Abstract: A chip structure includes a substrate and a stress buffer layer. The substrate has a first surface and a second surface opposite to the first surface. The stress buffer layer is disposed on the periphery of the substrate and located in at least one of the first surface and the second surface of the substrate.

Abstract: A semiconductor chip having a current source coupled between a first potential and an electrical node, a detection circuit having an input coupled to the electrical node, and a first active component coupled in series with the current source and further coupled between the electrical node and a second potential, wherein the first active component is coupled to the electrical node via a first conductive interconnect.

Abstract: A wafer is formed having a plurality of laser-to-slider submount features on a first surface. An etching process is used to form scribe lines between the submounts on the first surface of the wafer. The wafer is separated at the scribe lines to form the submounts.

Abstract: A process to divide a wafer into individual chips is disclosed. The process (1) etches semiconductor layers for an active device to form two grooves putting the virtual cut line therebetween, where the semiconductor wafer is to be divided along the virtual cut line; (2) etches the substrate in a region including the virtual cut line but offset from the groove from the back surface thereof so as to expose the semiconductor layers in the primary surface; and (3) etches the semiconductor layer exposed in step (2).

Abstract: A method for manufacturing a semiconductor device includes forming at least one stripe-shaped protection film over a multilayer film in a scribe region of a semiconductor substrate having a plurality of semiconductor element regions formed therein, the protection film having a thickness larger in a center portion thereof than at an end surface thereof and being made of a member which transmits a laser beam, and removing the multilayer film in the scribe region by irradiating the protection film with a laser beam.

Abstract: A semiconductor device in which it is possible to suppress short-circuiting between pads for chip arising from dicing processing is provided. The semiconductor device includes a semiconductor substrate, multiple first pads, and multiple second pads. The first pads are formed in an element formation region and the second pads are formed in a dicing line region surrounding the element formation region. The dicing line region includes a first region for which second pads are prone to electrically short-circuit to each other and a second region for which second pads are less prone to electrically short-circuit to each other. Some first pads arranged in positions opposite the first region are arranged farther away from one side of the outer edge of the element formation region than the remaining first pads arranged in positions opposite the second region are.

Abstract: A method of forming a semiconductor device includes preparing a semiconductor substrate having a plurality of chips formed thereon and a scribe lane disposed between the chips, simultaneously forming a groove having a first depth in the scribe lane, and a through hole penetrating the chips and having a second depth. The chips are separated along the groove. The first depth is smaller than the second depth.

Abstract: A semiconductor IC includes grooves formed in a substrate to define a first dummy region and second dummy regions formed at a scribing area, and third dummy regions and a fourth dummy region formed at a product area. A width of the first dummy region is greater than widths of each of the second and third dummy regions and a width of the fourth dummy region is greater than widths of each of the third dummy regions. A conductor pattern is formed over the first dummy region for optical pattern recognition. The first dummy region is formed under the conductor pattern so the grooves are not formed under the conductor pattern. The second dummy regions are spaced from one another by a predetermined spacing at the scribing area, and the third dummy regions are spaced from one another by a predetermined spacing at the product area.

Abstract: In a laminated semiconductor substrate, a plurality of semiconductor substrates are laminated. Each of the semiconductor substrate has a plurality of scribe-groove parts formed along scribe lines. Further, each of the semiconductor substrate has a plurality of device regions having a semiconductor device formed therein and insulated from each other, and a plurality of wiring electrodes connected to the semiconductor devices respectively formed in the plurality of device regions and extending from the device regions into the inside of the scribe-groove parts. The plurality of wiring electrodes are arranged in a partial arrangement pattern in which the wiring electrodes are arranged along only a part of four boundary sides, corresponding to boundaries between each of the device regions and the scribe-groove parts. Further, the plurality of wiring electrodes extend into the scribe-groove part from only one of two device regions adjacent to each other with the scribe-groove part therebetween.

Abstract: A semiconductor wafer may include: a disk-shaped wafer body made of silicon; and an identification trench section having at least one trench and provided at a periphery section of the wafer body, wherein the trench is opened in the periphery of the wafer body, and has a depth less than a thickness of the wafer body.

Abstract: A semiconductor device has a build-up interconnect structure formed over an active surface of a semiconductor wafer containing a plurality of semiconductor die separated by a saw street. An insulating layer is formed over the interconnect structure. Bumps are formed over the interconnect structure. A protective coating material is deposited over the insulating layer and saw street. A lamination tape is applied over the coating material. A portion of a back surface of the semiconductor wafer is removed. A mounting tape is applied over the back surface. The lamination tape is removed while leaving the coating material over the insulating layer and saw street. A first channel is formed through the saw street extending partially through the semiconductor wafer. The coating material is removed after forming the first channel. A second channel is formed through the saw street and the mounting tape is removed to singulate the semiconductor wafer.

Abstract: According to an embodiment, a semiconductor device includes a substrate provided with a first region including an active element, the substrate including a second region containing boron with a density of 2×1020 cm?3 or more on a surface excluding the first region.

Abstract: A substrate is mounted onto an elevated substrate support of a substrate carrier plate. The substrate carrier plate with the substrate is then placed in a plasma reactor. Due to the elevated substrate support, both opposite sides of the substrate are exposed to the plasma and are therefore coated with an electrical passivation layer.

Abstract: A double seal ring for an integrated circuit includes a first seal ring with a first opening. The first seal ring surrounds the integrated circuit. A second seal ring with a second opening surrounds the first seal ring. Two connectors connect the first opening of the first seal ring and the second opening of the second seal ring. The first seal ring, the second seal ring, and the two connectors form a closed loop.

Abstract: A method for manufacturing a chip is disclosed. The method comprises forming a material structure in a kerf adjacent the chip on a wafer. The method further comprises selectively removing the material structure in the kerf and dicing the wafer. A semiconductor wafer is disclosed. The semiconductor wafer comprises a plurality of chips and a plurality of kerfs. The kerfs separate the chips from each other. At least one kerf comprises a kerf framing. The kerf framing is arranged directly adjacent a side of the at least on chip.

Abstract: A semiconductor device is disclosed which includes active section 100, edge termination section 110 having a voltage blocking structure and disposed around active section 100, and separation section 120 having a device separation structure and disposed around edge termination section 110. A surface device structure is formed on the first major surface of active section 100, trench 23 is formed in separation section 120 from the second major surface side, and p+-type separation region 24 is formed on the side wall of trench 23 such that p+-type separation region 24 is in contact with p-type channel stopper region 21 formed in the surface portion on the first major surface side and p-type collector layer 9 formed in the surface portion on the second major surface side. The semiconductor device and the method for manufacturing the semiconductor device according to the invention facilitate preventing the reverse blocking voltage from decreasing and shorten the manufacturing time of the semiconductor device.

Abstract: The present disclosures relates to a method for producing ultrathin chip stacks and chip stacks. Generally, a plurality of first semiconductor chips is formed in a wafer. A second semiconductor chip is applied to each of the plurality of first semiconductor chips via a connection layer and a stabilization layer is applied to fill in the interspace between each of the second semiconductor chips. The wafer, semiconductor chip, and stabilization layer are thinned and the wafer is sawed to produce a plurality of singulated chip stacks.

Abstract: Semiconductor packages are disclosed. A semiconductor package includes: a first chip that includes a chip region and scribe regions at edges of the chip region, wherein the chip region comprises integrated circuit units and main through substrate vias electrically connected to the integrated circuit units; and a second chip that is bonded onto the first chip. The semiconductor package includes dummy conductive connectors including at least dummy wiring lines, the dummy conductive connectors electrically connected to the main through substrate vias at one end, and not capable of forming an electrical connection at the other end.

Abstract: A semiconductor wafer includes a die, an edge seal, a bond pad, a plating bus, and trace. The die is adjacent to a saw street. The edge seal is along a perimeter of the die and includes a conductive layer formed in a last interconnect layer of the die. The bond pad is formed as part of metal deposition layer above the last interconnect layer or part of the last interconnect layer. The plating bus is within the saw street. The trace is connected to the bond pad and to the plating bus (1) over the edge seal, insulated from the edge seal, and formed in the metal deposition layer or (2) through the edge seal and insulated from the edge seal.

Abstract: A semiconductor wafer structure includes a plurality of dies, a first scribe line extending along a first direction, a second scribe line extending along a second direction and intersecting the first scribe line, wherein the first and the second scribe lines have an intersection region. A test line is formed in the scribe line, wherein the test line crosses the intersection region. Test pads are formed in the test line and only outside a free region defined substantially in the intersection region.

Abstract: A semiconductor chip includes a redistribution interconnect that is implemented by shorting bumps, and a semiconductor package and a system each including the semiconductor chip. The semiconductor chip includes a semiconductor substrate, a passivation film disposed on the semiconductor substrate, and a plurality of pseudo bumps disposed on the passivation film. Each pseudo bump is directly connected to adjacent pseudo bumps to form at least one redistribution interconnect.

Abstract: A substrate dividing method which can thin and divide a substrate while preventing chipping and cracking from occurring. This substrate dividing method comprises the steps of irradiating a semiconductor substrate 1 having a front face 3 formed with functional devices 19 with laser light while positioning a light-converging point within the substrate, so as to form a modified region including a molten processed region due to multiphoton absorption within the semiconductor substrate 1, and causing the modified region including the molten processed region to form a starting point region for cutting; and grinding a rear face 21 of the semiconductor substrate 1 after the step of forming the starting point region for cutting such that the semiconductor substrate 1 attains a predetermined thickness.

Abstract: A semiconductor wafer is adapted to support partial wafer processing generally transparently to a facility capable of processing a full wafer. The wafer has provided thereon a plurality of semiconductor dice and a plurality of visible reference features. The reference features are positioned among the dice to support a predetermined partitioning of the wafer into partial wafers. The positioning of the reference features may render each partial wafer uniquely visually distinguishable from every other partial wafer. Each partial wafer may contain at least one of the reference features, with the position of each reference feature identified in accordance with a coordinate system of an electronic wafer map. The positioning of the reference features may provide a visual indication of where to cut the wafer to effect the partitioning.

Abstract: A method for generating reticle data for forming a reticle. The method includes recognizing a non-layout region free from main chips in a process pattern, dividing the non-layout region into a plurality of rectangular non-layout regions, generating scribe data using the plurality of divided rectangular non-layout region as a plurality of dummy chips, and generating a dummy pattern for each of the dummy chips.

Abstract: Disclosed is a semiconductor device that is capable of preventing impurities such as moisture from being introduced into an active region at the time of dicing and at the time of bonding and that is capable of being easily miniaturized. The semiconductor device includes a cylindrical dummy wire having an opening for allowing a wire interconnecting a semiconductor element and an external connection terminal to pass therethrough, extending in an insulation film provided on a semiconductor layer having the semiconductor element to surround the semiconductor element, and disposed inside the external connection terminal.

Abstract: A semiconductor device comprising scribe areas that include dicing areas for separating chip areas, a groove forming area surrounding each chip area, and includes interlayer insulating lamination disposed above the semiconductor wafer; a multilayer wiring structure formed in the interlayer insulating lamination, the multilayer wiring structure including wiring layers disposed in the chip area, and dummy wirings disposed in the chip area and the scribe area, the wiring layers and the dummy wirings being formed from same mother layers; a cover layer including a passivation layer, the cover layer covering the multilayer wiring structure; and a groove formed in each groove forming area, the groove surrounding the chip areas and extending from a surface of the semiconductor wafer and at least through the passivation layer; wherein the multilayer wiring structure includes no dummy wirings in the groove forming area at least in an uppermost wiring layer.

Abstract: A system and method for preventing cracks is provided. An embodiment comprises placing crack stoppers into a connection between a semiconductor die and a substrate. The crack stoppers may be in the shape of hollow or solid cylinders and may be placed so as to prevent any cracks from propagating through the crack stoppers.