Abstract: A seal ring structure is formed through a multilayer structure of a plurality of dielectric films in a peripheral part of a chip region to surround the chip region. A dual damascene interconnect in which an interconnect and a plug connected to the interconnect are integrated is formed in at least one of the dielectric films in the chip region. Part of the seal ring structure formed in the dielectric film in which the dual damascene interconnect is formed is continuous. A protection film formed on the multilayer structure has an opening on the seal ring. A cap layer connected to the seal ring is formed in the opening.

Abstract: A semiconductor device is disclosed that performs fingerprint recognition on the electrostatic-capacity principle. A finger sweeping across a fingerprint recognition area of a semiconductor chip provides positive fingerprint recognition operations with improved reliability. The semiconductor device includes the semiconductor chip having a sensor unit that performs fingerprint recognition, and a substrate having an opening formed in the position corresponding to the sensor unit. The semiconductor chip is flip chip bonded to the substrate such that the sensor unit corresponds to the opening, and except for the formed position of the opening, an under-fill material is provided between the semiconductor chip and the substrate.

Abstract: The invention is intended to specify an electrical measuring method for an operating temperature and a modified component for carrying out the method which improves the monitoring of the component. Measured temperature values are intended to be delivered without any time delay and without requiring additional surfaces for temperature sensors. Location-related temperature values need to be able to be measured. The invention proposes a method for said location-related electrical measurement of the operating temperature of a likewise proposed MOS power component with a gate electrode network comprising a material whose temperature coefficient of the electrical resistance is known. The gate electrode network is divided into a plurality of measuring sections with contact point pairs which are respectively connected to contacts (71.1, 72.1; 71.2, 72.2; 71.3, 7; 72.3, 7).

Abstract: It is desired to effectively suppress breaking of a protection target circuit caused by direct application of an ESD surge voltage to the circuit. The semiconductor device includes: a VDD pad; a signal output pad; a GND pad; a high-potential power source line; a signal line; a low-potential power source line; main ESD protection elements; a PMOS transistor; and an output circuit. The output circuit includes: an NMOS transistor N1 whose source is connected to the signal line, and whose drain is connected to the low-potential power source line; and an NMOS transistor N2 connected between the gate of the NMOS transistor N1 and the low-potential power source line. The source of the PMOS transistor is connected to the signal line, the drain thereof is connected to the gate of the NMOS transistor N1, and the gate and back gate thereof are connected to the high-potential power source line.

Abstract: The invention relates to a method for producing metal oxide layers from oxides of rare earth metals on silicon-containing surfaces, to the device used to carry out the coating method, and to the use of the starting materials used in the method according to the invention for the coating method.

Abstract: A semiconductor device and a method for manufacturing the same that reduces a process defect caused by pattern dependency in chemical mechanical polarization (CMP) or etching is excellent. The semiconductor device includes a device pattern formed on or in a substrate; and a plurality of dummy patterns having different longitudinal-sectional areas formed at one side of the device pattern. The dummy patterns, which have the same planar size but have different longitudinal-sectional areas from the three-dimensional structural point of view, include first dummy pattern having a first thickness and second dummy pattern having a second thickness larger than the first thickness.

Abstract: An integrated circuit is disclosed having a semiconductor component comprising a first p-type region and a first n-type region adjoining the first p-type region, which together form a first pn junction having a breakdown voltage. A further n-type region adjoining the first p-type region or a further p-type region adjoining the first n-type region is provided, the first p-type or n-type region and the further n-type or p-type region adjoining the latter together forming a further pn junction having a further breakdown voltage, the first pn junction and the further pn junction being connected or connectable to one another in such a way that, in the case of an overloading of the semiconductor component, on account of a current loading of the first pn junction, first of all the further pn junction breaks down.

Abstract: A semiconductor device, includes a semiconductor device, a wiring layer provided on the semiconductor substrate, a high frequency wiring provided in the wiring layer, and plural dummy metals provided in the wiring layer apart from the high frequency wiring, wherein the wiring layer in plan view includes a high frequency wiring vicinity region and an external region surrounding the high frequency wiring vicinity region, wherein the high frequency wiring vicinity region includes a first region enclosed by an outer edge of the high frequency wiring, and a second region surrounding the first region, wherein the plural dummy metals are disposed dispersedly in the high frequency wiring vicinity region and in the external region respectively, and wherein an average interval between the dummy metals in the high frequency wiring vicinity region is wider than that in the external region.

Abstract: A method of creating insulating layers on different semiconductor materials includes providing a substrate having disposed thereon a first material and a second material, the second material having a chemical composition different from the first material; non-epitaxially depositing a continuous sacrificial layer of approximately constant thickness onto the first material and the second material, and then converting the sacrificial layer into a layer consisting essentially of SiO2 without oxidizing more than 10 angstroms into the second material. A structure includes a silicon nitride film disposed conformally on a silicon layer and a silicon germanium layer; a SiO2 layer is disposed on the silicon nitride film.

Abstract: Provided is a semiconductor device in which the drain region of the ESD protection NMOS transistor is electrically connected, through a drain extension region formed by an impurity diffusion region having the same conductivity as that of the drain region and arranged on both side surfaces and a bottom surface of the second trench isolation region which is formed next to the drain region, to the drain contact region formed by an impurity diffusion region having the same conductivity as that of the drain region.

Abstract: A method of texturing a surface of a substrate utilizing a phase-segregated mask and etching is disclosed. The resulting textured surface, which can be used as a component of a solar cell includes, in one embodiment, a randomly mixed collection of flat-topped and angled surfaces providing local high points and local low points. The flat-topped surfaces have an areal density of at least 1%, and the high points are coincident with the flat-topped surfaces. Moreover, a preponderance of said low points are approximately situated in a single common plane parallel to the plane defined by the flat-topped surfaces.

Abstract: Methods for detecting a void in an element portion of a semiconductor device having an element portion and a void detection structure are disclosed. As a part of the method, an insulating film is formed on a substrate, a plurality of holes is formed in the insulating film, and a metal portion is formed on the insulating film to fill the plurality of holes. The metal portion is polished until the insulating film is exposed and a recessed portion is formed in the void detection structure. It is determined if a void exists in the element portion of the semiconductor device by determining whether or not a void is exposed at a surface of the recessed portion of the void detection structure.

Abstract: A semiconductor memory device includes a semiconductor substrate provided with active areas and an element-isolating insulating film isolating the active areas from each other, the active areas each extending in a first direction; an interlayer insulating film formed on a surface of the semiconductor substrate; and a contact member provided in the interlayer insulating film, and including a first portion and a second portion, the first portion electrically connected to a wire above the semiconductor substrate, the second portion having a shape that spreads out of the first portion as viewed from above and connected to the first portion. A maximum width of the second portion measured in the first direction is larger than a width of the first portion measured in the first direction, and the second portion is in contact with the interlayer insulating film that surrounds the first portion.

Abstract: An electrostatic discharge protection device includes first and second wells of a first conductivity type, the first and second wells having different impurity doping concentrations, respectively, a gate formed on the first well, a source region of a second conductivity type formed at one side of the gate in the first well, a drift region of the second conductivity type formed at the other side of gate and over both of the first well and the second well, and a drain region of the second conductivity type formed in the drift region of the second well.

Abstract: A method of forming a semiconductor package is disclosed including disguising the test pads. Test pads are defined in the conductive pattern of the semiconductor package for allowing electrical test of the completed package. The test pads are formed in shapes such as letters or objects so that they are less recognizable as test pads.

Abstract: The invention relates to a method for producing passivation layers on crystalline silicon by a) coating the silicon with a solution containing at least one polysilazane of the general formula (1): —(SiR?R?—NR??)-n, wherein R?, R?, R?? are the same or different and stand independently of each other for hydrogen or a possibly substituted alkyl, aryl, vinyl, or (trialkoxysilyl)alkyl group, wherein n is an integer and n is chosen such that the polysilazane has a number average molecular weight of 150 to 150,000 g/mol, b) subsequently removing the solvent by evaporation, whereby polysilazane layers of 50-500 nm thickness remain on the silicon wafer, and c) heating the polysilazane layer at normal pressure to 200-1000° C. in the presence of air or nitrogen, wherein upon tempering the ceramic layers release hydrogen for bulk passivation of the silicon.

Abstract: An embodiment of the present invention is a technique to prevent reliability failures in semiconductor devices. A trench is patterned in a polyimide layer over a guard ring having a top metal layer. A passivation layer is etched at bottom of the trench. A capping layer is deposited on the trench over the etched passivation layer. The capping layer and the top metal layer form a mechanical strong interface to prevent a crack propagation.

Abstract: Methods and systems for intra-chip waveguide communication are disclosed and may include configuring one or more waveguides in an integrated circuit and communicating one or more signals between blocks within the integrated circuit via the one or more waveguides. The one or more waveguides may be configured via switches in the integrated circuit by adjusting a length of the one or more waveguides. The one or more signals may include a microwave signal and a low frequency control signal that configures the microwave signal. The low frequency control signal may include a digital signal. The one or more waveguides may include metal layers deposited on the integrated circuit or within the integrated circuit. The one or more waveguides may include semiconductor layers deposited on the integrated circuit or embedded within the integrated circuit.

Abstract: A method for fabricating a semiconductor with a fuse includes providing a substrate, forming an insulation layer over the substrate, forming a polysilicon hard mask to form a metal contact over the insulation layer, forming a first mask pattern to form a fuse over the polysilicon hard mask, and removing the polysilicon hard mask exposed by the first hard mask pattern to form a polysilicon fuse connected to a portion of the polysilicon hard mask.

Abstract: The present invention relates to a semiconductor-on-insulator (SOI) substrate having one or more device regions. Each device region comprises at least a base semiconductor substrate layer and a semiconductor device layer with a buried insulator layer located therebetween, while the semiconductor device layer is supported by one or more vertical insulating pillars. The vertical insulating pillars each preferably has a ledge extending between the base semiconductor substrate layer and the semiconductor device layer. The SOI substrates of the present invention can be readily formed from a precursor substrate structure with a “floating” semiconductor device layer that is spaced apart from the base semiconductor substrate layer by an air gap and is supported by one or more vertical insulating pillars. The air gap is preferably formed by selective removal of a sacrificial layer located between the base semiconductor substrate layer and the semiconductor device layer.

Abstract: A sensor element is described that includes at least one semiconductor component having a gas-sensitive layer which is attached to a substrate by the flip-chip method, the gas-sensitive layer facing the substrate and a supply arrangement being provided to supply a gas to be examined to the gas-sensitive layer. The semiconductor component is enclosed in a casing. Also described is a method for manufacturing the sensor element, in which a semiconductor component having a gas-sensitive layer is attached by the flip-chip method to a substrate in such a way that the gas-sensitive layer faces the substrate. After that, the casing is applied by a plasma sputtering method, in particular an atmospheric plasma sputtering method. Finally, a use of the sensor element in the exhaust system of an internal combustion engine is also described.

Abstract: The present disclosure is related to a dielectric layer comprising a rare-earth aluminate (RExAl2-xO3 with 0<x<2) and having a perovskite crystalline structure, wherein the rare-earth aluminate comprises a rare-earth element having an atomic number higher than or equal to 63 and lower than or equal to 71. The disclosure also relates to method of manufacturing of a dielectric stack and a dielectric stack comprising said rare-earth aluminate dielectric layer and further comprising a template stack comprising at least an upper template layer, wherein the upper template layer has a perovskite structure, and wherein the upper template layer is underlying and in contact with the rare-earth aluminate dielectric layer. In a preferred embodiment the dielectric stack further comprises a lower template layer having a crystalline structure, wherein the lower template layer is underlying and in contact with the upper template layer.

Abstract: A semiconductor die has through silicon vias arranged to reduce warpage. The through silicon vias adjust the coefficient of thermal expansion of the semiconductor die, permit substrate deformation, and also relieve residual stress. The through silicon vias may be located in the edges and/or corners of the semiconductor die. The through silicon vias are stress relief vias that can be supplemented with round corner vias to reducing warpage of the semiconductor die.

Abstract: A method of forming an electrostatic discharging (ESD) device includes forming a first and a second semiconductor fin over a substrate and adjacent to each other; epitaxially growing a semiconductor material on the first and the second semiconductor fins, wherein a first portion of the semiconductor material grown from the first semiconductor fin joins a second portion of the semiconductor material grown from the second semiconductor fin; and implanting a first end and a second end of the semiconductor material and first end portions of the first and the second semiconductor fins to form a first and a second implant region, respectively. A P-N junction is formed between the first end and the second end of the semiconductor material. The P-N junction is a junction of an ESD diode, or a junction in an NPN or a PNP BJT.

Abstract: The present invention relates to a method and system for testing integrity of a passivation layer (108) covering a semiconductor device. A structured layer of electrically conducting material (104) is deposited onto at least a portion of a top surface of a substrate (102) of the semiconductor device. The structured layer (104) comprises a plurality of bands (104.1, 104.2) connected to at least two contacts (106.1, 106.2) and disposed on the at least a portion of the top surface such that one of consecutive bands (104.1, 104.2) and consecutive portions of the bands (104.1, 104.2) are connected to different contacts (106.1, 106.2). A passivation layer (108) is deposited onto the at least a portion of the top surface of the substrate (102) and the structured layer (104) such that material of the passivation layer(108) is disposed between the bands of conducting material (104.1, 104.2) and on top of the structured layer (104).

Abstract: An electronic system, method of manufacture of a semiconductor structure, and one or more semiconductor structures are disclosed. For example, a method of manufacture of a semiconductor structure is disclosed, which includes forming a semiconductor layer over a thermal conduction layer, forming an isolation region over the thermal conduction layer, and forming a thermal conduction region in the isolation region.

Abstract: A dummy columnar electrode having the same outer size and cross section as a columnar electrode formed in a semiconductor device formation region is formed in the peripheral part of a semiconductor device test region in the same process as the columnar electrode. The semiconductor device test regions are provided at several places on the peripheral edge of an effective semiconductor wafer region. Each of the semiconductor device test regions is formed to partly protrude out of the effective semiconductor wafer region. Thus, the number of the semiconductor device formation regions to be products can be prevented from decreasing.

Abstract: A conductor-filled damage propagation barrier is formed extending into a low-k dielectric layer between a fuse and an adjacent circuit element for preventing propagation of damage during a fuse blow operation. Conductor material filling the damage propagation barrier is formed from the same conductor layer as that used to form an interconnect structure.

Abstract: A semiconductor device (1) includes a wiring (10) and dummy conductor patterns (20). The wiring (10) is a wiring through which a current with a frequency of 5 GHz or higher flows. Near the wiring (10), the dummy conductor patterns (20) are formed. A planar shape of each of the dummy conductor patterns (20) is equivalent to a shape with an internal angle larger than 180°.

Abstract: A process for manufacturing a semiconductor wafer including SOI-insulation wells includes forming, in a die region of a semiconductor body, buried cavities and semiconductor structural elements, which traverse the buried cavities and are distributed in the die region. The process moreover includes the step of oxidizing selectively first adjacent semiconductor structural elements, arranged inside a closed region, and preventing oxidation of second semiconductor structural elements outside the closed region, so as to form a die buried dielectric layer selectively inside the closed region.

Abstract: An apparatus and method, the apparatus includes a substrate configured to support a plurality of dielectric layers, a device coupling area positioned in the substrate, and a plurality of gas exit apertures formed through the substrate. The plurality of gas exit apertures is configured to provide venting of at least one of moisture and outgassed material and the device coupling area is configured to receive an electronic device coupleable to the plurality of dielectric layers.

Abstract: Method of manufacturing semiconductor device including forming inter-layer insulating film on semiconductor substrate. First metal film is formed on inter-layer insulating film. First resist is formed on first metal film and patterned. Anisotropic etching performed on first metal film using first resist as mask. First resist is removed and second metal film is formed on inter-layer insulating film to cover remaining first metal film. Second resist is formed on second metal film in area where first metal film exists on inter-layer insulating film and part of area where first metal film does not exist. Anisotropic etching is performed on second metal film using second resist as mask and bonding pad having first metal film and second metal film, and upper layer wiring having second metal film and not first metal film. Second resist is removed. Surface protection film covering bonding pad is formed. Pad opening is formed on bonding pad.

Abstract: A multi-station polish system and process for polishing thin, flat (planar) and rigid workpieces. Workpieces are conveyed through multiple polishing stations that include a bulk material removal belt polishing station and finishing rotary polishing station. The bulk of the material is relatively quickly removed at the bulk removal station using a conformable abrasive belt and the workpiece surface is then polished to the desired finish at the finishing station using a conformable annular rotary polishing pad.

Abstract: Embodiments of the invention provide an electronic device which may include an interior compartment housing at least one electronic component that may be reactive to target impurities. The electronic component may include at least a cathode and an anode. A purifier material may be interspersed within a conducting polymer layer between the cathode and the anode. The purifier material may decrease target impurities within the interior compartment of the electronic device from a first level to a second level.

Abstract: In the course of forming a resistor in the back end of an integrated circuit, an intermediate dielectric layer is deposited and a trench etched through it and into a lower dielectric layer by a controllable amount, so that the top of a resistor layer deposited in the trench is close in height to the top of the lower dielectric layer; the trench is filled and the resistor layer outside the trench is removed, after which a second dielectric layer is deposited. Vias passing through the second dielectric layer to contact the resistor then have the same depth as vias contacting metal interconnects in the lower dielectric layer. A tri-layer resistor structure is employed in which the resistive film is sandwiched between two protective layers that block diffusion between the resistor and BEOL ILD layers.

Abstract: The present disclosure provides ESD protection devices that can effectively cope with electrostatic stress of microchips for high voltage operation.

Abstract: An ESD protection device is provided, which includes a P-type doped region, an N-type doped region, a first P+ doped region, a first N+ doped region, a second N+ doped region and a third N+ doped region. The N-type doped region is located in the P-type doped region. The first P+ doped region connected to a pad is located in the N-type doped region. A part of the first N+ doped region is located in the N-type doped region and the residue part thereof is located in the P-type doped region. The second and the third N+ doped regions are located in the P-type doped region and outside the N-type doped region, and are respectively electrically connected to a first power rail and a second power rail. In addition, the second N+ doped region is located between the first and the third N+ doped regions.

Abstract: Methods for forming a front-end-of-the-line (FEOL) dual high-k gate using a photoresist mask and structures thereof are disclosed. One embodiment of the disclosed method includes depositing a high-k dielectric film on a substrate of a FEOL CMOS structure followed by depositing a photoresist thereon; patterning the high-k dielectric according to the photoresist; and removing the photoresist thereafter. The removing of the photoresist includes using an organic solvent followed by removal of any residual photoresist including organic and/or carbon film. The removal of residual photoresist may include a degas process, alternatively known as a bake process. Alternatively, a nitrogen-hydrogen forming gas (i.e., a mixture of nitrogen and hydrogen) (N2/H2) or ammonia (NH3) may be used to remove the photoresist mask. With the use of the plasma nitrogen-hydrogen forming gas (N2/H2) or a plasma ammonia (NH3), no apparent organic residual is observed.

Abstract: A seal ring structure is formed through a multilayer structure of a plurality of dielectric films in a peripheral part of a chip region to surround the chip region. A dual damascene interconnect in which an interconnect and a plug connected to the interconnect are integrated is formed in at least one of the dielectric films in the chip region. Part of the seal ring structure formed in the dielectric film in which the dual damascene interconnect is formed is continuous. A protection film formed on the multilayer structure has an opening on the seal ring. A cap layer connected to the seal ring is formed in the opening.

Abstract: Provided is a method of fabricating a semiconductor device that includes providing a semiconductor substrate having a front side and a back side, forming a first circuit and a second circuit at the front side of the semiconductor substrate, bonding the front side of the semiconductor substrate to a carrier substrate, thinning the semiconductor substrate from the back side, and forming an trench from the back side to the front side of the semiconductor substrate to isolate the first circuit from the second circuit.

Abstract: Detecting and/or mitigating the presence of particle contaminants in a MEMS device involves including MEMS structures that in normal operation are robust against the presence of particles but which can be made sensitive to that presence during a test mode prior to use, e.g.

Abstract: An example semiconductor device includes a trench formed in a semiconductor substrate to define an active region, a filling dielectric layer provided within the trench, an oxide layer provided between the filling dielectric layer and the trench, a nitride layer provided between the oxide layer and the filling dielectric layer, and a barrier layer provided between the oxide layer and the nitride layer.

Abstract: An integrated circuit, method of forming the integrated circuit and a method of testing the integrated circuit for soft-error fails. The integrated circuit includes: a silicon substrate; a dielectric layer formed over the substrate; electrically conductive wires formed in the dielectric layer, the wires interconnecting semiconductor devices formed in the substrate into circuits; and an alpha particle emitting region in the integrated circuit chip proximate to one or more of the semiconductor devices. The method includes exposing the integrated circuit to an artificial flux of thermal neutrons to cause fission of atoms in the alpha particle emitting region into alpha particles and other atoms.

Abstract: A structure for memorizing tensile stress in a semiconductor device includes a gate electrode of the semiconductor device; a silicon spacer adjacent to the gate electrode; and a capping layer encapsulating the gate electrode and the silicon spacer, wherein the silicon spacer and capping layer are configured to cause a tensile stress to be memorized in the gate electrode during an annealing process. A method for memorizing tensile stress in a semiconductor device includes forming a silicon spacer adjacent to a gate electrode of the semiconductor device; forming a capping layer over the silicon spacer and the gate electrode; and annealing the semiconductor device, wherein the silicon spacer and capping layer cause a tensile stress to be memorized in the gate electrode during annealing. A disposable silicon spacer is configured to induce a tensile stress in a semiconductor device during a stress memorization technique process.

Abstract: In a laminated chip package, a plurality of semiconductor plates each having a semiconductor device and a wiring electrode connected to the semiconductor device are laminated. On a side surface for wiring of the laminated chip package, an end face of an inner electrode for examination formed inside the side surface for wiring in the semiconductor plate is formed. The laminated chip package further has an outer electrode for examination connecting the end faces of the inner electrodes for examination along a lamination direction of the semiconductor plates, only for two adjacent semiconductor plates among the semiconductor plates.

Abstract: A semiconductor device having a semiconductor substrate, an insulating layer, a fuse, a diffusion layer and a resistor. The semiconductor substrate has a first conductivity type. The insulating layer is selectively formed on the surface of the semiconductor substrate. The fuse is formed on the insulating layer. The diffusion layer has a second conductivity type. The diffusion layer is formed on the surface of the semiconductor substrate and electrically connected to the fuse. The first resistor is electrically connected to the fuse.

Abstract: A semiconductor integrated circuit device with a balun which is formed above a conductive semiconductor substrate and which includes a dielectric film, an unbalanced line for transmitting an unbalanced signal, and balanced lines for transmitting a balanced signal. The unbalanced line is placed opposite to the balanced lines via a nano-composite film that is a region of the dielectric film. The nano-composite film, interposed between the unbalanced line and the balanced lines, has a relative permittivity higher than that of other regions of the dielectric film. This allows suppression of electromagnetic coupling of transmission lines or passive elements other than the balun, thereby providing a semiconductor device with a wide-band and small-size balun.

Abstract: A semiconductor having an optimized insulation structure which is simple and inexpensive to produce and can be made smaller than LOCOS insulation structures is disclosed. An implantation mask on a surface of a semiconductor substrate is used to implant elements into the semiconductor substrate, which elements, on thermal activation, form an insulation region together with the further elements of the semiconductor substrate. The thermal activation is effected by means of laser irradiation, during which the semiconductor substrate is briefly melted and then recrystallizes during the subsequent cooling, so that the implanted elements form the insulation region together with the further elements of the semiconductor substrate.

Abstract: An interposer chip may include an insulating substrate, conductive patterns, and a test pattern. The conductive patterns may be formed on the insulating substrate. Further, the conductive patterns may be electrically connected to conductive wires. The test pattern may be connected to the conductive patterns. A test current for testing an electrical connection between the conductive patterns and the conductive wires may flow through the test pattern. Thus, the interposer chip may have the test pattern connected to the conductive patterns, so that the test current may flow to the test pattern through the conductive wires and the conductive patterns. As a result, an electrical connection between the conductive wires and the conductive patterns may be identified based on the test current supplied to the test pattern.

Abstract: A semiconductor device having no voids and a semiconductor package using the same is described. The semiconductor device includes a semiconductor chip having a circuit section which is formed in a first area and a peripheral section which is formed in a second area defined around the first area, and an insulation layer covering the first and second areas and having at least one void removing part which extends from the first area to the second area to prevent a void from being formed.