Including Other Nonmonocrystalline Material (e.g., Semiconductor Particles Embedded In Insulating Material) (epo) Patents (Class 257/E31.051)
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Patent number: 10149392Abstract: The manufacturing method of the flexible printed wiring board relating to an embodiment includes a step of preparing a metal foil clad laminate 1 including an insulating substrate 2 and metal foil 3 and metal foil 4 provided on main surfaces of the substrate 2, a step of forming a circuit pattern 5 by patterning the metal foil 3, a step of forming a peelable printing plate layer 6 on the substrate 2 so as to embed the pattern 5, a step of forming blind holes 7a and 7b where the pattern 5 is exposed inside by partially removing the printing plate layer 6, a step of printing conductive paste with the printing plate layer 6 as a printing mask, and filling the conductive paste 8 inside the blind holes, and a step of peeling off the printing plate layer 6 from the metal foil clad laminate 1.Type: GrantFiled: February 16, 2015Date of Patent: December 4, 2018Assignee: NIPPO MEKTRON, LTD.Inventor: Fumihiko Matsuda
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Patent number: 8957401Abstract: In various embodiments, the present invention relates to a plurality of coated primary particles, each primary particle including a primary matrix material and containing a population of semiconductor nanoparticles, wherein each primary particle is provided with a separate layer of a surface coating material. Various methods of preparing such particles are described. Composite materials and light-emitting devices incorporating such primary particles are also described.Type: GrantFiled: September 23, 2010Date of Patent: February 17, 2015Assignee: Nanoco Technologies, LtdInventors: Nigel Pickett, Imad Naasani, James Harris
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Patent number: 8946798Abstract: A backside illumination type solid-state imaging device includes stacked semiconductor chips which are formed such that two or more semiconductor chip units are bonded to each other, at least a first semiconductor chip unit is formed with a pixel array and a first multi-layered wiring layer, and a second semiconductor chip unit is formed with a logic circuit and a second multi-layered wiring layer, a connection wire which connects the first semiconductor chip unit and the second semiconductor chip unit, and a first shield wire which shields adjacent connection wires in one direction therebetween.Type: GrantFiled: June 18, 2013Date of Patent: February 3, 2015Assignee: Sony CorporationInventors: Machiko Horiike, Kazuichiro Itonaga
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Publication number: 20140007933Abstract: Disclosed are a thin film solar cell and a method of manufacturing the thin film solar cell. The thin film solar cell according to an exemplary embodiment of the present invention thin film solar cell includes a substrate: a front electrode layer formed on the substrate; an oxide layer formed on the front electrode layer: a light absorbing layer (intrinsic layer) formed on the oxide layer; and a back electrode layer formed on the light absorbing layer, wherein the oxide layer is formed of a material selected from MoO2, WO2, V2O5, NiO and CrO3.Type: ApplicationFiled: August 10, 2012Publication date: January 9, 2014Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALSInventors: Seoung Yoon RYU, Dong Ho KIM, Kee Seok NAM, Yong Soo JEONG, Jung Dae KWON, Sung Hun LEE, Jung Heum YUN, Gun Hwan LEE, Hyung Hwan JUNG, Sung Gyu PARK, Chang Su KIM, Jae Wook KANG, Keong Su LIM, Sang II PARK
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Publication number: 20130074913Abstract: A photovoltaic cell comprises a first electrode that includes a first transparent conductive substrate, a first layer having a plurality of first semiconductor nanofibers, and a second layer having a plurality of second semiconductor super-fine fibers, the first semiconductor nanofibers having an average diameter smaller than an average diameter of the second semiconductor super-fine fibers, a light absorbing material adsorbed to at least some of the first semiconductor nanofibers and second semiconductor super-fine fibers, a second electrode includes a second transparent conductive substrate, and electrolytes dispersed in the first and second layers.Type: ApplicationFiled: September 26, 2011Publication date: March 28, 2013Applicant: The Hong Kong Polytechnic UniversityInventors: Wallace Woon-fong LEUNG, Lijun YANG
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Publication number: 20130061923Abstract: To provide a photoelectric conversion device having high conversion efficiency and a method for manufacturing the same. The photoelectric conversion device includes a working electrode that has a transparent electrode (2) and a porous metal oxide semiconductor layer (3) that is formed on a surface of the transparent electrode (2) and supported with a dye; a counter electrode (5); and an electrolyte layer (4), the hydroxyl group concentration on the surface of the oxide semiconductor layer is 0.01 groups/(nm)2 or more and 4.0 groups/(nm)2 or less, and the adsorbed water concentration on the surface thereof is 0.03 pieces/(nm)2 or more and 4.0 pieces/(nm)2 or less. The method for manufacturing a photoelectric conversion device includes a first step of forming a porous metal oxide semiconductor layer (3) on a surface of a transparent electrode (2), a second step of controlling the hydroxyl group concentration on the surface of the oxide semiconductor layer to be 0.01 groups/(nm)2 or more and 4.Type: ApplicationFiled: May 17, 2011Publication date: March 14, 2013Applicant: SONY CORPORATIONInventors: Masakazu Muroyama, Kazuaki Fukushima
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Electronic photosensitive body and manufacturing method for same, as well as image forming apparatus
Patent number: 8330161Abstract: Disclosed is an electrophotographic photoreceptor which comprises a base material and a photoconductive layer. The photoconductive layer is formed on the base material, and comprises a non-single-crystal material mainly composed of silicon. In the photoconductive layer, with regard to a characteristic energy E (eV) which has the relationship with a light absorption coefficient ?(cm?1) represented by the following formula (1), the characteristic energy E1 (eV) for an exposure wavelength in larger than the characteristic energy E2 (eV) for a neutralization wavelength. [Formula (1) a=C exp(h?/E) C: a constant h?: a photon energy h: a rationalized Planck's ?: the number of frequency.Type: GrantFiled: July 31, 2008Date of Patent: December 11, 2012Assignee: Kyocera CorporationInventor: Yoshinobu Ishii -
Publication number: 20120060904Abstract: A solar cell structure includes silicon nano-particle diffusion regions. The diffusion regions may be formed by printing silicon nano-particles over a thin dielectric, such as silicon dioxide. A wetting agent may be formed on the thin dielectric prior to printing of the nano-particles. The nano-particles may be printed by inkjet printing. The nano-particles may be thermally processed in a first phase by heating the nano-particles to thermally drive out organic materials from the nano-particles, and in a second phase by heating the nano-particles to form a continuous nano-particle film over the thin dielectric.Type: ApplicationFiled: November 5, 2010Publication date: March 15, 2012Inventors: David D. SMITH, Taeseok KIM
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Publication number: 20120032170Abstract: The present invention relates to a solar power generation device which includes an electric double-layer capacitor and a solar cell. The electric double-layer capacitor includes a pair of current collectors formed using a light-transmitting conductive material; active materials which are dispersed on the pair of current collectors; a light-transmitting electrolyte layer which is provided between the pair of current collectors; and a terminal portion which is electrically connected to the current collector. The solar cell includes, over a light-transmitting substrate, a first light-transmitting conductive film; a photoelectric conversion layer which is provided in contact with the first light-transmitting conductive film; and a second light-transmitting conductive film which is provided in contact with the photoelectric conversion layer.Type: ApplicationFiled: August 2, 2011Publication date: February 9, 2012Inventors: Yumiko Saito, Junpei Momo, Rie Matsubara, Kuniharu Nomoto, Hiroatsu Todoriki
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Patent number: 7994592Abstract: MEMs devices are integrally fabricated with included micro or nanoparticles by providing a mixture of a sacrificial material and a multiplicity of particles, disposing the mixture onto a substrate, fabricating a MEMs structure on the substrate including at least part of the mixture, so that at least some of the mixture is enclosed in the MEMs structure, removing the sacrificial material, and leaving at least some of the multiplicity of particles substantially free and enclosed in the MEMs structure. The step of fabricating a MEMs structure is quite general and is contemplated as including one or a multiplicity of additional steps for creating some type of structure in which the particles, which may be microbeads or nanobeads, are included. A wide variety of useful applications for MEMs integrated with micro or nanoparticles are available.Type: GrantFiled: July 18, 2005Date of Patent: August 9, 2011Assignee: California Institute of TechnologyInventors: Yu-Chong Tai, Qing He
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Publication number: 20110136289Abstract: The present invention relates to a photodetector using nanoparticles, and more particularly, to a novel photodetector wherein surfaces of nanoparticles synthesized by a wet colloidal process are capped with organic materials which then serve as channels for electron migration, or nanoparticles, from which organic materials capped on the surfaces of nanoparticles are removed to form a close-packed particle structure, directly serve to transport electrons. In accordance with specific embodiments of the present invention, it is possible to improve performance of the photodetector and simplify the manufacturing process thereof.Type: ApplicationFiled: February 16, 2011Publication date: June 9, 2011Applicant: SAMSUNG ELECTRONICS CO., LTDInventors: Sangsig KIM, Hyunsuk KIM, Eun Joo JANG
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Publication number: 20110061733Abstract: The objective of this invention is to use chemical additives to increase the rate of deposition processes for the amorphous silicon film (?Si:H) and/or the microcrystalline silicon film (?CSi:H), and improve the electrical current generating capability of the deposited films for photoconductive films used in the manufacturing of Thin Film based Photovoltaic (TFPV) devices.Type: ApplicationFiled: August 31, 2010Publication date: March 17, 2011Applicant: AIR PRODUCTS AND CHEMICALS, INC.Inventors: Patrick Timothy Hurley, Robert Gordon Ridgeway, Katherine Anne Hutchison, John Giles Langan
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Electronic Photosensitive Body and Manufacturing Method for Same, as well as Image Forming Apparatus
Publication number: 20100224877Abstract: Disclosed is an electrophotographic photoreceptor which comprises a base material and a photoconductive layer. The photoconductive layer is formed on the base material, and comprises a non-single-crystal material mainly composed of silicon. In the photoconductive layer, with regard to a characteristic energy E (eV) which has the relationship with a light absorption coefficient ? (cm?1) represented by the following formula (1), the characteristic energy E1 (eV) for an exposure wavelength in larger than the characteristic energy E2 (eV) for a neutralization wavelength.Type: ApplicationFiled: July 31, 2008Publication date: September 9, 2010Applicant: KYOCERA CORPORATIONInventor: Yoshinobu Ishii -
Publication number: 20100068845Abstract: The present invention relates to a photodetector using nanoparticles, and more particularly, to a novel photodetector wherein surfaces of nanoparticles synthesized by a wet colloidal process are capped with organic materials which then serve as channels for electron migration, or nanoparticles, from which organic materials capped on the surfaces of nanoparticles are removed to form a close-packed particle structure, directly serve to transport electrons. In accordance with specific embodiments of the present invention, it is possible to improve performance of the photodetector and simplify the manufacturing process thereof.Type: ApplicationFiled: March 16, 2009Publication date: March 18, 2010Applicant: Samsung Electronics Co., Ltd.Inventors: Sangsig KIM, Hyunsuk Kim, Eun Joo Jang
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Patent number: 7629269Abstract: A method including depositing a suspension of a colloid comprising an amount of nano-particles of a ceramic material on a substrate; and thermally treating the suspension to form a thin film. A method including depositing a plurality of nano-particles of a ceramic material to pre-determined locations across a surface of a substrate; and thermally treating the plurality of nano-particles to form a thin film. A system including a computing device comprising a microprocessor, the microprocessor coupled to a printed circuit board through a substrate, the substrate comprising at least one capacitor structure formed on a surface, the capacitor structure comprising a first electrode, a second electrode, and a ceramic material disposed between the first electrode and the second electrode, wherein the ceramic material comprises columnar grains.Type: GrantFiled: March 31, 2005Date of Patent: December 8, 2009Assignee: Intel CorporationInventor: Cengiz A. Palanduz
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Patent number: 7378679Abstract: A patterned substrate includes a laminated pattern having laminated patterns that are formed by drying droplets containing a pattern formation material. A lower layer pattern contains lyophilic microparticles that are lyophilic with respect to droplets that form an upper layer pattern.Type: GrantFiled: December 12, 2005Date of Patent: May 27, 2008Assignee: Seiko Epson CorporationInventor: Naoyuki Toyoda
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Patent number: 7351997Abstract: A photon receptor having a sensitivity threshold of a single photon is readily fabricated on a nanometric scale for compact and/or large-scale array devices. The fundamental receptor element is a quantum dot of a direct semiconductor, as for example in a semiconductor (such as GaAs) isolated from a parallel or adjacent gate electrodes by Nano-scale gap(s). Source and drain electrodes are separated from the photoelectric material by a smaller gap such that photoelectrons created when a photon impinges on the photoelectric material it will release a single electron under a bias (applied between the source and drain to the drain) to the drain electrode, rather than directly to the gate electrode. The drain electrode is connected to the gate electrode by a detection circuit configured to count each photoelectron that flows to the gate electrode.Type: GrantFiled: October 16, 2006Date of Patent: April 1, 2008Assignee: Physical Logic AGInventor: Eran Ofek