Depositing Magnetic Layer Or Coating Patents (Class 29/603.13)
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Patent number: 8009387Abstract: A method for forming a protective bilayer on a magnetic read/write head or magnetic disk. The bilayer is formed as an adhesion enhancing underlayer and a protective diamond-like carbon (DLC) overlayer. The underlayer is formed of an aluminum or alloyed aluminum oxynitride, having the general formula AlOxNy or MezAlOxNy where Mez symbolizes Tiz, Siz or Crz and where x, y and z can be varied within the formation process. By adjusting the values of x and y the adhesion underlayer contributes to such qualities of the protective bilayer as stress compensation, chemical and mechanical stability and low electrical conductivity. Various methods of forming the underlayer are provided, including reactive ion sputtering, plasma assisted chemical vapor deposition, pulsed laser deposition and plasma immersion ion implantation.Type: GrantFiled: August 2, 2010Date of Patent: August 30, 2011Assignee: SAE Magnetics (HK) Ltd.Inventors: Shide Cheng, Zhu Feng, Ellis T. Cha
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Patent number: 7996986Abstract: An apparatus includes: a first layer having a near field transducer positioned in a waveguide cladding; a second layer having a magnetic pole piece; a third layer including a solid immersion mirror; a first lapping guide positioned in the first layer; a second lapping guide positioned in the second layer; and a third lapping guide positioned in the third layer.Type: GrantFiled: February 13, 2009Date of Patent: August 16, 2011Assignee: Seagate Technology LLCInventor: Nils Jan Gokemeijer
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Patent number: 7989152Abstract: A method for a magneto-optical photoresist. The method includes applying a magneto-optical photoresist to a surface, and patterning the magneto-optical photoresist by using a magnetic alignment. The magneto-optical photoresist is also patterned by using a photo exposure, wherein the magnetic alignment provides a photo exposure alignment for the photo exposure.Type: GrantFiled: December 21, 2006Date of Patent: August 2, 2011Assignee: Hitachi Global Storage Technologies, Netherlands B.V.Inventor: Vladimir Nikitin
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Patent number: 7979978Abstract: A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.Type: GrantFiled: March 27, 2007Date of Patent: July 19, 2011Assignee: Headway Technologies, Inc.Inventors: Cherng-Chyi Han, Min Li, Fenglin Liu, Chen-Jung Chien
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Patent number: 7963024Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic data recording. The method allows an upper write coil to be formed directly on a conformally deposited layer of non-magnetic material such as alumina which has been deposited over a magnetic shaping layer and write pole. The method allows the write coil to be constructed without the need for the deposition of a thick alumina fill layer and subsequent chemical mechanical polishing. This, therefore, avoids the necessity of such a chemical mechanical polishing step.Type: GrantFiled: October 10, 2007Date of Patent: June 21, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Aaron Neuhaus
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Patent number: 7963023Abstract: An electrical lapping guide for a magnetic tape head is provided with a resistive transverse stripe with a longitudinal height affixed to a substrate. A pair of leads extend from the stripe with a notch formed therebetween. The notch has a height corresponding to a lapping target limit for associated tape head elements. During material removal of the transverse stripe and the tape head elements, resistance is measured across the stripe and a dramatic increase in resistance indicates that the material removal has reached the notch. A method for accurately machining a magnetic tape head is provided by depositing tape head elements and a resistive stripe with a notch on a substrate. Resistance is measured across leads on either side of the notch for discontinuing machining of the stripe due to a dramatic increase in resistance.Type: GrantFiled: November 16, 2007Date of Patent: June 21, 2011Assignee: Oracle America, Inc.Inventor: Ritz Mingho Lau
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Patent number: 7950135Abstract: A manufacturing method of an MR element in which current flows in a direction perpendicular to layer planes, includes a step of forming on a lower electrode layer an MR multi-layered structure with side surfaces substantially perpendicular to the layer lamination plane, a step of forming a first insulation layer on at least the side surfaces of the formed MR multi-layered structure, a step of forming a second insulation layer and a magnetic domain control bias layer on the lower electrode layer, and a step of forming an upper electrode layer on the MR multi-layered structure and the magnetic domain control bias layer.Type: GrantFiled: May 31, 2007Date of Patent: May 31, 2011Assignee: TDK CorporationInventors: Takeo Kagami, Takayasu Kanaya
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Patent number: 7950138Abstract: A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.Type: GrantFiled: February 8, 2010Date of Patent: May 31, 2011Assignee: Headway Technologies, Inc.Inventors: Donghong Li, Yoshitaka Sasaki
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Patent number: 7950136Abstract: A process to manufacturing a TMR read head with improved voltage breakdown is performed by laying down the AP1 layer as two or more layers. Each AP1 sub-layer is exposed to a low energy plasma for a short time before the next layer is deposited. This results in a smooth surface, onto which to deposit the tunneling barrier layer, with no disruption of the surface crystal structure of the completed AP1 layer.Type: GrantFiled: May 12, 2008Date of Patent: May 31, 2011Assignee: Headway Technologies, Inc.Inventors: Tong Zhao, Chyu-Jiuh Torng, Hui-Chuan Wang
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Patent number: 7950137Abstract: A method for manufacturing a write pole for perpendicular magnetic recording for accurately defining a side shield throat height and write pole flare point. The magnetic structure includes a write pole portion and first and second side shield portions. The side shields portions are magnetically connected with the write pole portion in a region in front of an intended air bearing surface plane (e.g. in the direction from which lapping will progress). The side shields portions are each separated from the write pole portion in a region behind the intended air bearing surface plane by notches that terminate at a desired location relative to the intended air bearing surface plane and which open up in a region behind the intended air bearing surface plane.Type: GrantFiled: June 21, 2007Date of Patent: May 31, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Christian Rene Bonhote, Thomas Dudley Boon, Jr., Ming Jiang, Jordan Asher Katine, Quang Le, Yinshi Liu, Xhavin Sinha, Sue Siyang Zhang, Yi Zheng
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Patent number: 7941911Abstract: A method is provided for forming a plurality of regions of magnetic material in a substrate having a first approximately planar surface. The method comprises the steps of fabricating projections in the first surface of the substrate, depositing onto the first surface a magnetic material in such a way that the tops of the projections are covered with magnetic material, and depositing filler material atop the substrate so produced. The filler material may then be planarized, for example by chemical-mechanical polishing. In an alternative embodiment magnetic material is deposited on a substrate and portions of it are removed, leaving islands of material. Filler material is then deposited, which may be planarized.Type: GrantFiled: December 18, 2006Date of Patent: May 17, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: Zvonimir Z. Bandic, Elizabeth Ann Dobisz, Jui-Lung Li, Henry Hung Yang
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Patent number: 7934310Abstract: Prior art designs of single pole writers have been limited by premature saturation at the tip. This limits the head field that can be achieved without simultaneously widening the write profile. This problem has bee solved by means of a vertical main pole whose thickness has its conventional value a short distance from the tip but that tapers down to a significantly reduced value as it approaches the tip. A process for manufacturing this tapered tip design is also presented.Type: GrantFiled: April 8, 2009Date of Patent: May 3, 2011Assignee: Headway Technologies, Inc.Inventors: Lijie Guan, Hung Liang Hu, Yaw Shing Tang
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Methods of fabricating exchange-coupling film, magnetoresistive element, and thin-film magnetic head
Patent number: 7934309Abstract: The method of fabricating an exchange-coupling film in accordance with the present invention comprises a multilayer body forming step of forming a multilayer body having an antiferromagnetic layer and a ferromagnetic layer laminated on the antiferromagnetic layer; and an annealing step of annealing the multilayer body in a magnetic field with a maximum temperature higher than a blocking temperature of the multilayer body by 15 to 60° C.Type: GrantFiled: December 26, 2007Date of Patent: May 3, 2011Assignee: TDK CorporationInventors: Keita Kawamori, Satoshi Miura -
Patent number: 7930817Abstract: A method comprises an opposing step of arranging a light-shielding film 50 having a recessed surface 52 and a pinhole 54 formed within the recessed surface 52 such that an end face 54X of the pinhole 54 of the light-shielding film 50 on the recessed surface 52 side and a light exit surface 4B oppose each other, while the shortest distance A52 between the light-shielding film 50 and a medium-opposing surface S in a thickness direction of the light-shielding film 50 is shorter than the shortest distance A54 between the end face 54X of the pinhole 54 on the side opposite from a transparent substrate 58 and the light exit surface 4B; a light-emitting step of causing a light-emitting device 3 to emit emission light 3A; and a detecting step of detecting the light transmitted through the pinhole 54 after being emitted from the light exit surface 4B.Type: GrantFiled: August 27, 2008Date of Patent: April 26, 2011Assignee: TDK CorporationInventors: Seiichi Takayama, Koji Shimazawa, Yasuhiro Ito
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Patent number: 7929257Abstract: A magnetic thin film has a pinned layer whose magnetization direction is fixed with respect to an external magnetic field, a free layer whose magnetization direction is changed according to the external magnetic field, and a spacer layer which is sandwiched between said pinned layer and said free layer. Sense current is configured to flow in a direction that is perpendicular to film surfaces of said pinned layer, said spacer layer, and said free layer. Said spacer layer has a CuZn metal alloy which includes an oxide region, said oxide region consisting of an oxide of any of Al, Si, Cr, Ti, Hf, Zr, Zn, and Mg.Type: GrantFiled: February 23, 2007Date of Patent: April 19, 2011Assignee: TDK CorporationInventors: Takahiko Machita, Tomohito Mizuno, Yoshihiro Tsuchiya, Daisuke Miyauchi, Shinji Hara
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Patent number: 7921544Abstract: A thin-film magnetic head structure has a configuration adapted to manufacture a thin-film magnetic head configured such that a main magnetic pole layer including a magnetic pole end part on a side of a medium-opposing surface opposing a recording medium, a write shield layer opposing the magnetic pole end part so as to form a recording gap layer on the medium-opposing surface side, and a thin-film coil wound about the write shield layer or main magnetic pole layer are laminated. The main magnetic pole layer has an end face joint structure where respective end faces of the magnetic pole end part and a yoke magnetic pole part having a size greater than that of the magnetic pole end part are joined to each other, and a surface with a flat structure on a side closer to the thin-film coil.Type: GrantFiled: April 7, 2008Date of Patent: April 12, 2011Assignee: Headway Technologies, Inc.Inventors: Yoshitaka Sasaki, Hironori Araki, Shigeki Tanemura, Hiroyuki Ito, Lijie Guan
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Patent number: 7918014Abstract: A CPP-GMR spin valve having a CoFe/NiFe composite free layer is disclosed in which Fe content of the CoFe layer ranges from 20 to 70 atomic % and Ni content in the NiFe layer varies from 85 to 100 atomic % to maintain low Hc and ?S values. A small positive magnetostriction value in a Co75Fe25 layer is used to offset a negative magnetostriction value in a Ni90Fe10 layer. The CoFe layer is deposited on a sensor stack in which a seed layer, AFM layer, pinned layer, and non-magnetic spacer layer are sequentially formed on a substrate. After a NiFe layer and capping layer are sequentially deposited on the CoFe layer, the sensor stack is patterned to give a sensor element with top and bottom surfaces and a sidewall connecting the top and bottom surfaces. Thereafter, a dielectric layer is formed adjacent to the sidewalls.Type: GrantFiled: July 13, 2005Date of Patent: April 5, 2011Assignee: Headway Technologies, Inc.Inventors: Kunliang Zhang, Min Li, Yu-Hsia Chen, Chyu-Jiuh Torng
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Patent number: 7900342Abstract: Magnetoresistance sensors with magnetic pinned layers that are pinned by anisotropic etch induced magnetic anisotropies and methods for fabricating the magnetoresistance sensors are provided. The method comprises forming a seed layer structure. The seed layer is etched to form an anisotropic etch along a top surface of the seed layer. A magnetic pinned layer is formed on the top surface of the seed layer structure. The anisotropic etch on the top surface of the seed layer structure induces a magnetic anisotropy in the magnetic pinned layer, which pins the magnetization of the magnetic pinned layer structure.Type: GrantFiled: February 23, 2007Date of Patent: March 8, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: James M. Freitag, Mustafa M. Pinarbasi
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Patent number: 7895731Abstract: A method for manufacturing a magnetic field detecting element having a free layer whose magnetization direction is variable depending on an external magnetic field and a pinned layer whose magnetization direction is fixed and these are stacked with an electrically conductive, nonmagnetic spacer layer sandwiched therebetween, wherein sense current flows in a direction perpendicular to film planes of the magnetic field detecting element. The method comprises: forming a spacer adjoining layer adjacent to the spacer layer, Heusler alloy layer, and a metal layer successively in this order; and forming either at least a part of the pinned layer or the free layer by heating the spacer adjoining layer, the Heusler alloy layer, and the metal layer. The spacer adjoining layer has a layer chiefly made of cobalt and iron. The Heusler alloy layer includes metal which is silver, gold, copper, palladium, or platinum, or an alloy thereof. The metal layer is made of the same.Type: GrantFiled: June 22, 2007Date of Patent: March 1, 2011Assignee: TDK CorporationInventors: Tomohito Mizuno, Yoshihiro Tsuchiya, Koji Shimazawa, Kei Hirata, Keita Kawamori
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Patent number: 7895732Abstract: An embodiment of the present invention relates to a method of manufacturing a perpendicular magnetic recording having a main pole, return pole and trailing side shield disposed on the trailing side and the cross track direction side of said main pole. A process is described where the main pole has an etching layer in the upper part. The top and sides of the main pole having the etching signal layer in the upper part are covered with a nonmagnetic gap layer while leaving open a region forming the side shield. The nonmagnetic gap layer is then etched until a signal from the etching signal layer is detected by an etching signal detector. The trailing side shield on the top and sides of the nonmagnetic gap layer are then formed after the etching is halted.Type: GrantFiled: March 15, 2007Date of Patent: March 1, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Tomohiro Okada, Isao Nunokawa, Kimitoshi Etoh, Kikuo Kusukawa
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Patent number: 7891081Abstract: A process is described for the fabrication of a magnetic read head in which contact between the pinned layer and the AFM is limited to their edges. The principal steps are to deposit an antiferromagnetic layer and to then pattern it into a pair of antiferromagnetic layers separated by no more than about 2 microns. A layer of magnetic material that lies between, and is in contact with, said antiferromagnetic layers is then deposited, following which the layer of magnetic material is magnetized.Type: GrantFiled: April 1, 2004Date of Patent: February 22, 2011Assignee: Headway Technologies, Inc.Inventor: Glen Garfunkel
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Patent number: 7882617Abstract: The main magnetic pole piece of a magnetic head for perpendicular magnetic recording preferably has an inverted trapezoidal shape in order to maintain a sufficient recording magnetic field. Embodiments of the present invention enhance the covering power of the protective film around the main magnetic pole piece of the magnetic head and thereby ensure reliability even when the main magnetic pole piece has such a shape. In one embodiment, the protective film for protecting the main magnetic pole piece is formed by a sputtering apparatus while applying a bias, or it is formed by a carousel type sputtering apparatus or the chemical vapor deposition (CVD) technique.Type: GrantFiled: October 25, 2005Date of Patent: February 8, 2011Inventors: Atsushi Kato, Isao Nunokawa, Tomohiro Okada, Ichiro Oodake
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Patent number: 7882618Abstract: Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.Type: GrantFiled: December 16, 2007Date of Patent: February 8, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: David P. Druist, Mohamad T. Krounbi, David J. Seagle
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Patent number: 7877859Abstract: Methods are provided for fabricating a write head with a self aligned wrap around shield and a self aligned flared region of a write pole. A flare point and a track width of a write pole may be fabricated using multiple processes. The multiple processes utilize several masking structures to define the track width and the flare point of the write pole. A mask structure is formed to cover a first portion of the write pole. An edge of the mask structure adjacent to an exposed second portion of the write pole defines a flare point of the write pole. Various structures of the write head, including shield gap layers, a wrap around shield and a flared region (e.g., the yoke) of the write pole may be fabricated from the flare point defined by the mask structure.Type: GrantFiled: June 22, 2007Date of Patent: February 1, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventors: Wen-Chien Hsiao, Yimin Hsu, Vladimir Nikitin
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Patent number: 7877860Abstract: A method of manufacturing a magnetic head includes the steps of forming an underlying layer, forming a pole layer including a track width defining portion at least by plating, using the underlying layer as an electrode, such that the track width defining portion is disposed on the underlying layer, and removing the underlying layer except a portion below the pole layer by ion beam etching. The underlying layer is made of a conductive material whose etching rate of ion beam etching is higher than that of the magnetic alloy used to make the pole layer.Type: GrantFiled: February 20, 2009Date of Patent: February 1, 2011Assignee: Headway Technologies, Inc.Inventors: Yoshitaka Sasaki, Hiroyuki Itoh, Shigeki Tanemura, Hironori Araki
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Patent number: 7874062Abstract: A method of making a magnetic head according to one embodiment comprises forming a shield layer having first and second recesses in first and second end regions which surround a central region; depositing first and second lead layers in the first and the second recesses; and forming a read sensor in the central region such that a first edge of the read sensor is positioned above an edge of the first lead layer and a second edge of the read sensor is positioned above an edge of the second lead layer.Type: GrantFiled: October 4, 2007Date of Patent: January 25, 2011Assignee: International Business Machines CorporationInventor: Hugo Alberto Emilio Santini
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Patent number: 7870659Abstract: A method for defining a perpendicular magnetic head is provided. The method includes forming a portion of the read and write head including depositing a sensor film on a surface only over a region of the read head to form a sensor; depositing a full-film shaping pole layer over the write head; defining a track width of the sensor; patterning a photoresist to define a pole tip of the write head including write track width and flare position, and at the same time to define a back edge of the sensor; removing material of the sensor and pole tip from the areas not covered by the photoresist; completing the fabrication of the write and read head layers; and lapping the write pole concurrently with the sensor to define the flare position of the pole tip and to define a sensor height with accurate positioning of write head flare.Type: GrantFiled: September 7, 2007Date of Patent: January 18, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Vladimir Nikitin, Samuel Wei-san Yuan
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Patent number: 7866029Abstract: A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W1; forming a second frame layer having end surfaces facing each other across a space having a width W2 that is larger than the width W1, the space having the width W2 being located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3 that is smaller than the width W1 so as to fill at least a part of the spaces having the width W1 and the width W2 respectively; and forming a pattern film so as to fill at least a part of the trench.Type: GrantFiled: March 22, 2007Date of Patent: January 11, 2011Assignee: TDK CorporationInventors: Hirotaka Gomi, Mitsuharu Isobe, Noriyuki Ito, Hiroaki Funada, Takeshi Yamana, Makoto Terasawa, Yasuhiro Hasegawa
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Patent number: 7861400Abstract: Write heads and corresponding methods of fabrication are provided using multiple electronic lapping guides to collect information regarding multiple distances of a write head, such as a throat height and a flare point distance of a write pole. A method of fabricating a write head includes fabricating a write pole and a corresponding write pole ELG. The method further includes fabricating a trailing shield and a corresponding trailing shield ELG. The method further includes performing a lapping process on the write head, and monitoring a lapping depth of the lapping process based on the resistance of the write pole ELG and the resistance of the trailing shield ELG.Type: GrantFiled: May 4, 2007Date of Patent: January 4, 2011Assignee: Hitachi Global Storage Technologies Netherlands, B.V.Inventor: Jeffrey S. Lille
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Patent number: 7859800Abstract: A magneto-resistive effect element is provided with a first soft magnetic layer, a magneto-resistive effect film formed directly on the first soft magnetic layer. and a second soft magnetic layer formed on the magneto-resistive effect film. The magneto-resistive effect element is configured as allowing electric current to flow in the thickness-wise direction. The first soft magnetic layer is composed of columnar crystals. The magneto-resistive effect film has an anti-ferromagnetic layer. The anti-ferromagnetic layer is formed directly on the first soft magnetic layer.Type: GrantFiled: October 30, 2006Date of Patent: December 28, 2010Assignee: Fujitsu LimitedInventors: Toyoo Miyajima, Mineharu Tsukada
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Patent number: 7841069Abstract: A method of manufacturing thin closure magnetic read/write heads, such as magnetic tape heads is provided. The method provides improved flexural strength of the closure so that the closure breakage during fabrication of the heads is mitigated and closure thickness is reduced. An array of chips is fabricated on a wafer. The array is closed, with a closure strip bonded to each row of the array. Closures span only the length of a row, so that the closures are not subjected to flexure during processing and breakage due to flexure is mitigated. Side bars are bonded to the array to form a column with dimensions similar to prior art columns. This allows columns manufactured by the invention to undergo additional processing using existing processes.Type: GrantFiled: August 30, 2007Date of Patent: November 30, 2010Assignee: International Business Machines CorporationInventors: Robert G. Biskeborn, Calvin S. Lo
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Patent number: 7841068Abstract: A method of fabricating a single-pole perpendicular magnetic recording head to contain a bevel angle promotion layer that facilitates the fabrication of the bevel angle in a trapezoidal main pole. The bevel angle promotion layer is made of a non-magnetic material that is softer than the material (e.g., Al2O3) that normally underlies the main pole. In one embodiment, the bevel angle promotion layer is formed between an end of the yoke and the air bearing surface (ABS), with the top surface of the bevel angle promotion layer being substantially coplanar with the top surface of the yoke. In other embodiment the bevel angle promotion layer is integrated with a leading edge taper material, which is formed of a magnetic material, to broaden the magnetic flux path between the yoke and the main pole.Type: GrantFiled: July 2, 2007Date of Patent: November 30, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Tsung Yuan Chen, Yimin Hsu, Yinshi Liu
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Patent number: 7841067Abstract: A method for forming a head having a trailing shield that includes forming a gap layer above a pole, forming a mask above the gap layer, and forming a trailing shield above the gap layer and adjacent the mask, a throat height of the trailing shield being defined between the mask.Type: GrantFiled: February 26, 2007Date of Patent: November 30, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Jeffrey S. Lille
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Patent number: 7832085Abstract: A method of manufacturing a magnetic head includes the steps of: fabricating a substructure in which pre-head portions are aligned in a plurality of rows by forming components of a plurality of magnetic heads on a single substrate; and fabricating the plurality of magnetic heads by separating the pre-head portions from one another through cutting the substructure. In the step of fabricating the substructure, the resistance of an MR film that will be formed into an MR element by undergoing lapping later is detected to determine the target position of the boundary between a track width defining portion and a wide portion of a pole layer based on the resistance detected, and the pole layer is thereby formed. In the step of fabricating the magnetic heads, the surface formed by cutting the substructure is lapped such that the MR film is lapped and the resistance thereof thereby reaches a predetermined value.Type: GrantFiled: December 27, 2007Date of Patent: November 16, 2010Assignee: TDK CorporationInventors: Takeo Kagami, Tetsuro Sasaki, Yuichi Watabe, Takamitsu Sakamoto
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Patent number: 7832084Abstract: A method of recording servo information includes writing servo information in a data storage medium using a compound magnetic recording head. The compound magnetic recording head has a substrate including first and second magnetically permeable substrate portions and a substantially non-magnetic member interposed between the first and second magnetically permeable substrate portions. A magnetically permeable layer is provided over the first and second magnetically permeable substrate portions of the substrate and includes first and second writing gap features associated with the first and second substrate portions. The writing gap features are formed using a patterned mask layer over the magnetically permeable layer, wherein the patterned mask layer comprises first and second patterned gap features corresponding to the first and second writing gap features.Type: GrantFiled: August 28, 2006Date of Patent: November 16, 2010Assignee: Advanced Research CorporationInventors: Matthew P. Dugas, Theodore A. Schwarz, Gregory L. Wagner
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Patent number: 7827674Abstract: A method for providing a giant magneto-resistive (GMR) sensor for use in sensing magnetic flux is provided. The method comprises positioning a layer of Cu material between first and second layers of a specified ferromagnetic material. The respective end surfaces of the Cu layer and the first and second layers are initially located in a common plane and in a co-planar relationship with one another. The method further comprises removing an amount of material from the copper layer to form a new end surface thereof that is selectively spaced apart from the common plane and applying a protective coating to the new end surface of the Cu layer to inhibit corrosion of the Cu layer.Type: GrantFiled: June 5, 2008Date of Patent: November 9, 2010Assignee: Oracle America, Inc.Inventors: John P. Nibarger, Herbert House
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Patent number: 7810228Abstract: An example method for manufacturing a magneto-resistance effect element involves irradiating inert gas ions to enhance an adhesive force between an area around an oxide layer and a metallic layer.Type: GrantFiled: July 5, 2007Date of Patent: October 12, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Hiromi Yuasa, Hideaki Fukuzawa, Yoshihiko Fuji
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Patent number: 7810227Abstract: Using a beam of xenon ions together with a suitable mask, a GMR stack is ion milled until a part of it, no more than about 0.1 microns thick, has been removed so that a pedestal, having sidewalls comprising a vertical section that includes all of the free layer, has been formed. This is followed by formation of the dielectric and conductive lead layers in the usual way. Using xenon as the sputtering gas enables the point at which milling is terminated to be more precisely controlled.Type: GrantFiled: October 18, 2007Date of Patent: October 12, 2010Assignees: Headway Technologies, Inc., TDK CorporationInventors: Stuart Kao, Chunping Luo, Chaopeng Chen, Takahiko Machita, Daisuke Miyauchi, Jeiwei Chang
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Patent number: 7802357Abstract: A method of forming a plating film capable of improving magnetic properties is provided. A photoresist pattern, having a first opening with an aspect ratio greater than 1 and a second opening with an aspect ratio smaller than that of the first opening, is formed on a surface of a substrate. A seed film is formed to cover an exposed surface of the substrate in the openings and an inner wall of the photoresist pattern in the openings. On the seed film in the openings, the plating film of magnetic material is deposited such that the first opening is filled under application of a magnetic field in the direction intersecting the surface of the substrate, and the second opening is filled under application of the magnetic field in the direction along the surface of the substrate.Type: GrantFiled: July 12, 2007Date of Patent: September 28, 2010Assignee: TDK CorporationInventor: Akifumi Kamijima
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Patent number: 7793406Abstract: A method for manufacturing a perpendicular magnetic write head having a trailing shield and with a tapered step. The method includes forming a write pole with a non-magnetic trailing gap and first and second non-magnetic side gap layers. A mask is formed having an opening over a portion of the write pole that is configured to define a non-magnetic bump. A non-magnetic bump material is deposited into the opening in a manner that defines a non-magnetic bump having a tapered front edge. A magnetic wrap around shield can then be formed over the non-magnetic bump, so that the bump forms a tapered stepped feature on the wrap-around magnetic shield. The bump location can be controlled by an electric lapping guide, which is defined to be aligned to the bump front edge.Type: GrantFiled: December 5, 2007Date of Patent: September 14, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventor: Yi Zheng
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Patent number: 7788795Abstract: A method for manufacturing a magnetic head that is effective for the suppression of thermal protrusion. The magnetic head includes SiO2, Si nitride, or Si oxide as a coil insulator having a low coefficient of thermal expansion and high workability. The coil insulator is arranged at a position away from the air bearing surface and the air bearing surface is made of alumina, making slider processing easy.Type: GrantFiled: September 11, 2006Date of Patent: September 7, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Kimitoshi Etoh, Hisako Takei, Masayuki Kurita, Yuji Kumazawa
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Patent number: 7788798Abstract: A method for manufacturing a magnetic write head having a wrap around magnetic shield. The method allows a highly accurate short wavelength such as 193 mm photolithography to be used to accurately define the placement and critical dimension of wrap around magnetic shield. The method includes the formation of a magnetic write pole, top gap, and side gap and the deposition of a RIEable fill layer thereover, and CMP to planarization. A 193 nm photolithography and ion milling is used to form a mask over the RIEable layer and one or more reactive ion etching processes are performed to pattern the RIEable layer through 193 nm photolithography mask. A wrap around shield can then be electroplated into the opening formed in the RIEable layer.Type: GrantFiled: November 21, 2007Date of Patent: September 7, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Hung-Chin Guthrie, Ming Jiang, Changqing Shi, Sue Siyang Zhang
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Patent number: 7788796Abstract: A method for constructing a magnetic write head using an electrical lapping guide to carefully control critical dimensions during a lapping operation used to define an air bearing surface. The lapping guide is photolithograhically patterned in a common photolithographic step with another write head structure so that special relation between the lapping guide and critical dimensions of the write head structure can be carefully maintained. The electrical lapping guide can be patterned in a common photolithographic step as the write pole so that the location of the flare point can be carefully controlled with respect to the location of the lapping guide. A stitched flare structure can also be built together with the electrical lapping guide, then a self-aligned shield can be further built over this stitched flare structure so that both flare point and shield throat can be controlled tightly together by this electrical lapping guide during lapping process.Type: GrantFiled: December 15, 2006Date of Patent: September 7, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Wen-Chien David Hsiao, Ming Jiang, Vladimir Nikitin, Aron Pentek, Yi Zheng
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Patent number: 7788797Abstract: A method for making a perpendicular magnetic recording write head that has a write pole, a trapezoidal-shaped trailing shield notch, and a gap between the write pole and notch uses a reactive ion beam etching (RIBE) process in CHF3 that removes filler material at the side edges of the write pole and thus widens the opening at the side edges. The gap is formed of a nonmagnetic mask film, such as alumina, a nonmagnetic metal protective film and a nonmagnetic gap layer. The nonmagnetic metal film is substantially less reactive to CHF3 than the filler material and protects the underlying mask film and write pole during the widening of the opening. The gap layer and trailing shield notch are deposited into a widened opening above the write pole, so the sides of the notch diverge to cause the generally trapezoidal shape.Type: GrantFiled: April 16, 2007Date of Patent: September 7, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: John I. Kim, Aron Pentek
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Patent number: 7784170Abstract: A resist pattern for lift-off is formed on a first film composed of one or more layers deposited on a substrate. The first film is patterned by dry-etching using the resist pattern as a mask. Subsequently, a second film is deposited with presence of the resist pattern on the first film. Then, the resist pattern for lift-off is removed for conducting lift-off. Subsequently, the resulting substrate is etched. In the etching, the substrate is dry-etched using etching particles which are oriented at an incident angle set in a range of 60 ° to 90 ° relative to the normal direction of the substrate.Type: GrantFiled: May 11, 2007Date of Patent: August 31, 2010Assignee: TDK CorporationInventors: Takeo Kagami, Kazuki Sato
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Patent number: 7784171Abstract: A method is provided for manufacturing a magneto-resistive device. The magneto-resistive device is for reducing the deterioration in the characteristics of the device due to annealing. The magneto-resistive device has a magneto-resistive layer formed on one surface side of a base, and an insulating layer formed of two layers and deposited around the magneto-resistive layer. The layer of the insulating layer closest to the base is made of a metal or semiconductor oxide. This layer extends over end faces of a plurality of layers made of different materials from one another, which make up the magneto-resistive device, and is in contact with the end faces of the plurality of layers with the same materials.Type: GrantFiled: May 4, 2007Date of Patent: August 31, 2010Assignee: TDK CorporationInventors: Takeo Kagami, Tetsuya Kuwashima, Norio Takahashi
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Patent number: 7779534Abstract: The present invention provides a thin film magnetic head capable of suppressing unintentional wiring to a neighboring track and preventing information recorded on a recording medium from being erased. A main magnetic pole layer is constructed so that height of a widened end surface in a lower main magnetic pole layer specifying a wide portion is smaller than height of an exposed surface in an upper main magnetic pole layer (front end portion) specifying a uniform width portion.Type: GrantFiled: June 18, 2007Date of Patent: August 24, 2010Assignee: SAE Magnetics (H.K.) Ltd.Inventor: Naoto Matono
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Patent number: 7779535Abstract: An MR effect element that can obtain the sufficient back flux-guide effect under the condition of reducing the capacitance between the upper and lower electrode layers is provided. The element comprises: an MR effect multilayer provided on the lower electrode layer; an insulating layer surrounding a rear side surface and side surfaces opposed to each other in track width direction of the MR effect multilayer; and an upper electrode layer provided on the MR effect multilayer and the insulating layer, the insulating layer having a concave portion filled with a portion of the upper electrode layer, the concave portion positioned near the rear side surface of the MR effect multilayer, and a bottom point of a concave of the concave portion positioned at the same level or a lower level in stacking direction compared to an upper surface of the free layer.Type: GrantFiled: November 24, 2006Date of Patent: August 24, 2010Assignee: TDK CorporationInventors: Takayasu Kanaya, Kazuki Sato
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Patent number: 7770282Abstract: A magnetic sensing device for use in a magnetic head includes a sensor stack structure having a sensing layer structure and an insulator structure formed adjacent the sensing layer structure. The insulator structure includes a plurality of oxidized metallic sublayers, a plurality of nitrided metallic sublayers, or a plurality of oxynitrided metallic sublayers. The insulator structure may be a capping layer structure of a giant magnetoresistance sensor or, alternatively, a tunnel barrier layer structure of a tunneling magnetoresistance sensor or a magnetic random access memory. Advantageously, each treated metallic sublayer is sufficiently uniformly treated so as to increase the magnetoresistive effect and improve soft magnetic properties of the magnetic sensing device.Type: GrantFiled: September 1, 2005Date of Patent: August 10, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Alexander M. Zeltser, Jinshan Li, Brian York
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Patent number: 7770284Abstract: A manufacturing method of an MR element in which current flows in a direction perpendicular to layer planes, includes forming on a lower electrode layer an MR multi-layered film having a cap layer at a top thereof, forming a mask on the cap layer of the MR multi-layered film, patterning the MR multi-layered film by milling through the mask to form an MR multi-layered structure, forming a magnetic domain control bias layer by using a lift off method using the mask, after forming the magnetic domain control bias layer, forming an additional cap layer on the cap layer and a part of the magnetic domain control bias layer, planarizing a top surface of the additional cap layer and the magnetic domain control bias layer, and forming an upper electrode layer on the planarized top surface.Type: GrantFiled: May 30, 2007Date of Patent: August 10, 2010Assignee: TDK CorporationInventors: Naoki Ohta, Takeo Kagami