Depositing Magnetic Layer Or Coating Patents (Class 29/603.13)
  • Patent number: 7770285
    Abstract: A magnetic read/write head is produced with an insert layer between the substrate and the magnetic transducer. The insert layer has a lower coefficient of thermal expansion than the substrate, which reduces the temperature pole tip recession (T-PTR) of the head because the insert layer is an intervening layer between the substrate and magnetic transducer. The insert layer is produced by plating, e.g., an Invar layer over the substrate prior to fabricating the magnetic transducer. The Invar layer is annealed and the structure planarized prior to depositing a non-magnetic gap layer followed by the fabrication of the magnetic transducer.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: August 10, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Christian R. Bonhote, Malika D. Carter, David A. Dudek, Wen-Chien D. Hsiao, John W. Lam, Vladimir Nikitin
  • Patent number: 7770283
    Abstract: A multi-step process for notching the P1 pole of the write head element of a magnetic head. In a first step following the fabrication of the P2 pole tip, a layer of protective material is deposited on the approximately vertical side surfaces of the P2 pole tip. Thereafter, a first ion milling step, utilizing a species such as argon, is performed to mill through the write gap layer and to notch into the P1 pole layer therebelow. The removal of redeposited material from the side surfaces of the P2 pole tip is thereafter accomplished and the protective material formed on the side surfaces of the P2 pole tip protects the P2 pole tip during the redeposition clean up step. Thereafter, the protective material is removed from the side surfaces of the P2 pole tip, and a second ion milling step is performed to further notch the P1 pole material.
    Type: Grant
    Filed: February 3, 2006
    Date of Patent: August 10, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Daniel Wayne Bedell, Vladimir Nikitin, Aron Pentek, Sue Siyang Zhang
  • Patent number: 7765677
    Abstract: A method of manufacturing a write pole that prevents P2 pedestal consumption during ion milling removal of coil and pole seed layers. The write head can be constructed by forming a first pole and then forming a magnetic pedestal (P2) over the first pole. A protective layer of, for example, alumina is deposited over a portion of the pedestal in the pole tip region, leaving a portion of the pedestal uncovered in the flare region. A coil seed layer can then be deposited and a coil formed. When the coil seed layer is removed, such as by ion milling, the pole tip region of the pedestal is protected from the ion milling by the protective layer. Similarly, a top pole can be deposited by first depositing an electrically conductive, magnetic seed layer and then plating the top pole. When the top pole seed layer is removed by ion milling, the pole tip region of the pedestal is protected from removal by the protective layer.
    Type: Grant
    Filed: April 18, 2006
    Date of Patent: August 3, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamane, Yvette Chung Nga Winton, Yi Zheng
  • Patent number: 7765678
    Abstract: A method of bonding a metal ball for a magnetic head assembly is provided. The method comprises: preparing a capillary; disposing the capillary so as to face a bonding surface of the electrode pad of the slider and that of the electrode pad of the flexible printed circuit board; carrying the metal ball to the bonding surfaces by introducing the metal ball and the inactive gas stream into the carrying route of the capillary; positioning and retaining the metal ball on the bonding surfaces by the inactive gas stream passing through the carrying route and issued radially from the cutoff portions; and melting the metal ball by directly applying laser beams via the cutoff portions of the capillary, and bonding the electrode pad of the slider and the electrode pad of the flexible printed circuit board by the melted metal.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: August 3, 2010
    Assignee: TDK Corporation
    Inventors: Ooki Yamaguchi, Takao Haino
  • Patent number: 7757380
    Abstract: Methods for improving within wafer and wafer to wafer yields during fabrication of notched trailing shield structures are disclosed. Ta/Rh CMP stop layers are deposited prior to planarization and notch formation to ensure a planar surface for trailing shield structures. These stop layers may be blanket deposited or patterned prior to CMP. Patterned stop layers produce the highest yields.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: July 20, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Hung-chin Guthrie, Yimin Hsu, Ming Jiang, Aron Pentek
  • Patent number: 7748103
    Abstract: A perpendicular magnetic recording write head has a write pole, a trapezoidal-shaped trailing shield notch, and a metal gap layer between the write pole and notch. The write pole has a trailing edge that has a width substantially defining the track width and that faces the front edge of the notch but is spaced from it by the gap layer. The write head is fabricated by reactive ion beam etching of a thin mask film above the write pole to remove the mask film and widen the opening at the edges of the write pole. The gap layer and notch are deposited into the widened opening above the write pole. The write pole has nonmagnetic filler material, such as alumina, surrounding it except at its trailing edge, where it is in contact with the gap layer, which is formed of a different material than the surrounding filler material.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: July 6, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Donald G. Allen, Amanda Baer, Michael Feldbaum, Wen-Chien David Hsiao, Vladimir Nikitin, Aron Pentek, Katalin Pentek
  • Patent number: 7739787
    Abstract: In an MR element, each of a pinned layer and a free layer includes a Heusler alloy layer. The Heusler alloy layer has two surfaces that are quadrilateral in shape and face toward opposite directions. The Heusler alloy layer includes one crystal grain that touches four sides of one of the two surfaces. In a method of manufacturing the MR element, a layered film to be the MR element is formed and patterned, and then heat treatment is performed on the layered film patterned, so that crystal grains included in a film to be the Heusler alloy layer in the layered film grow and one crystal grain that touches four sides of one of the surfaces of the film to be the Heusler alloy layer is thereby formed.
    Type: Grant
    Filed: March 8, 2007
    Date of Patent: June 22, 2010
    Assignee: TDK Corporation
    Inventors: Koji Shimazawa, Yoshihiro Tsuchiya, Tomohito Mizuno, Daisuke Miyauchi, Shinji Hara, Takahiko Machita
  • Patent number: 7739786
    Abstract: An apparatus and a method for manufacturing a magnetic head slider are to improve product quality of the magnetic head slider while simplifying the process and reducing the manufacturing time. The apparatus includes: holding devices for holding the both ends of a block member of an array of the magnetic head sliders respectively; a cutting device for cutting out a potion in which the magnetic head sliders are to be formed from the block member; and a cut surface treatment device having cut surface treating parts on the front and back surfaces of the cutting device for treating cut surfaces opposite to each other which form the predetermined two cut surfaces of the magnetic head sliders.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: June 22, 2010
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Ryuji Fujii
  • Patent number: 7726009
    Abstract: A method of fabricating a write head for perpendicular recording includes forming a pole layer on an undercoat layer, forming a mask over at least a portion of the pole layer, and forming the pole by removing material from the pole layer. The method further includes forming a first gap portion of a gap along a first side and a second side of the pole, forming a protective layer over at least a portion of the first gap portion, removing the mask, and removing the protective layer. The method further includes forming a second gap portion of the gap over at least a top surface of the pole and forming a shield over at least the second gap portion.
    Type: Grant
    Filed: July 17, 2007
    Date of Patent: June 1, 2010
    Assignee: Western Digital (Fremont), LLC
    Inventors: Yinshi Liu, Benjamin Chen, Kyusik Sin, Hongping Yuan
  • Patent number: 7721415
    Abstract: A thin-film magnetic head is manufactured as follows. First, a base insulating layer having a magnetic pole forming depression sunken into a form corresponding to the main magnetic pole layer is formed, a stop film for CMP is formed such as to fill the magnetic pole forming depression, and then a magnetic layer is formed on the stop film. Next, the magnetic layer is separated by forming a separation groove substantially surrounding the magnetic pole forming depression on the outside thereof, and thus separated magnetic layer is formed with a cover insulating film adapted to cover the whole upper face. The surface is polished by CMP until the stop film is exposed, so that the part of magnetic layer remaining on the inside of the magnetic pole forming depression is used as the main magnetic pole layer. Further, a recording gap layer, a write shield layer, and a thin-film coil are formed.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: May 25, 2010
    Assignees: Headway Technologies, Inc, SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshitaka Sasaki, Hiroyuki Ito, Takehiro Horinaka, Takehiro Kamigama, Tatsushi Shimizu
  • Patent number: 7716812
    Abstract: A main magnetic pole of a recording head is formed in an inverted trapezoidal shape by ion milling but, the long milling time poses a problem of variations in the inverted trapezoidal shape and the dimensional variations in track width. In one embodiment of the invention, a recording head is formed by first forming a lower magnetic pole, a gap layer, and conductor coils, forming an upper magnetic yoke over the gap layer at a position recessed from the air bearing surface, and forming an inorganic insulative layer in the recessed portion. A back magnetic pole connected with the upper magnetic yoke is formed on the back of the lower electrode. Successively, the upper surfaces of the inorganic insulative layer and the upper magnetic yoke are planarized, on which an underlayer film such as of Rh is formed. A magnetic layer is formed by stacking a plurality of thin magnetic films by sputtering over the underlayer film from the air bearing surface as far as the position overlapping the upper magnetic yoke.
    Type: Grant
    Filed: April 20, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Atsushi Kato, Norihiro Ookawa, Hisashi Kimura
  • Patent number: 7716813
    Abstract: A method is disclosed for independently controlling track width and bevel angle of a write pole tip of a magnetic recording head. The method includes establishing the track width in the pole tip layer material utilizing E-beam lithography. A portion of this pole tip material having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion. The protected portion produces an upper pole tip portion which together with the beveled portion produce an improved pole tip. Also disclosed is a magnetic head having the improved pole tip, and a disk drive having a magnetic head having the improved pole tip.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: May 18, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Kim Y. Lee, Jyh-Shuey Lo
  • Patent number: 7712205
    Abstract: In a magnetic head manufacturing method, a floated surface of each block having plural magnetic head elements formed and arranged on a substrate is ground and lapped in a grinding/lapping step. The grinding/lapping step contains an angle adjusting step for adjusting the angle of the floated surface of the block with reference to a magnetic-head-element formed surface of a substrate and grinding the floated surface concerned, and a finishing lapping step of lapping the floated surface at an angle adjusted in the angle adjusting step.
    Type: Grant
    Filed: November 16, 2005
    Date of Patent: May 11, 2010
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventors: Yoshiaki Ito, Osamu Fukuroi, Hiroyasu Tuchiya, Kenji Kodaka
  • Patent number: 7712207
    Abstract: A method for manufacturing a magnetic write pole and trailing wrap around magnetic shield for use in a perpendicular magnetic data recording system. The method includes the use of a hard mask structure with end point detection material embedded in a hard mask material. The novel hard mask structure provides the mill resistance of a hard mask, with the end point detection advantages of an end point detection layer.
    Type: Grant
    Filed: December 22, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Yi Zheng, Howard Gordon Zolla
  • Patent number: 7712206
    Abstract: A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield. After forming a magnetic write pole such as by masking and ion milling a magnetic write pole layer, a thin layer of alumina is deposited. This is followed by the deposition of a thin layer of Rh. Then, a thick layer of alumina is deposited, having a thickness that is preferably at least equal to the height of the write pole layer. A chemical mechanical polish is then performed until a portion of the Rh layer over the top (trailing edge) of the write pole is exposed. A material removal process such as ion milling is then performed to remove the exposed Rh layer exposing the thin alumina layer there beneath. Since the Rh trailing gap layer is electrically conductive it can also serve as a seed layer for electroplating the magnetic trailing shield.
    Type: Grant
    Filed: May 22, 2006
    Date of Patent: May 11, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Ming Jiang, Aron Pentek, Yi Zheng
  • Patent number: 7707707
    Abstract: A method of temporarily protecting an electrically sensitive component from damage due to electrostatic discharge includes defining a shunt having first and second leads electrically connected in parallel with the component and separated by a gap. A portion of a shield layer is deposited to form the shunt between the first and second leads to span the gap therebetween and form a shunted assembly. The shunted assembly and component are lapped to form the ABS at the location of the component, a sacrificial carbon overcoat is deposited on the ABS, and additional processing is performed on the shunted assembly. A portion of the shunted assembly, the shunt, and portions of the sacrificial carbon overcoat are then removed to form an electrical open for an unshunted assembly having ABS features comprising an air bearing cavity/deep gap at a former location of the shunted assembly.
    Type: Grant
    Filed: December 19, 2006
    Date of Patent: May 4, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: David John Seagle
  • Patent number: 7703194
    Abstract: A method for creating a write element of a magnetic head according to one embodiment includes forming a first pole pedestal; forming a write gap layer above the first pole pedestal; forming a second pole pedestal above the write gap layer; and forming at least one of: a cap layer of CoFeON between the first pole pedestal and the write gap, and a seed layer of CoFeON between the write gap layer and the second pole pedestal. Note that other layers may be interspersed between those set forth here.
    Type: Grant
    Filed: March 19, 2007
    Date of Patent: April 27, 2010
    Assignee: International Business Machines Corporation
    Inventors: Brian E. Brusca, Joel S. Forrest, Richard Hsiao, James D. Jarratt, Brian R. York
  • Patent number: 7681303
    Abstract: Embodiments of the present invention provide a method of manufacturing a magnetic head slider, the method being adapted so that throat height of a main magnetic pole piece of a perpendicular recording magnetic head can be controlled with high accuracy. According to one embodiment, a first Electrical Lapping Guide element (ELG) is disposed on the same layer as a plated underlayer of a shield of one write head in a row bar, and other ELGs are disposed on the same layer as that of a main magnetic pole piece of another write head. Front end positions (Tops) are detected from changes in resistance values of the other ELGs and an ending position of lapping is calculated. Since the front end positions (Tops) of the other ELGs are accurate, it is possible to assign a correlation to throat height “Th” of the main magnetic pole piece and the resistance value of the first ELG by detecting this resistance value existing when the front end positions (Tops) are detected.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: March 23, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Akira Kondo, Koji Tanaka, Kimitoshi Etoh, Ichiro Oodake
  • Patent number: 7676904
    Abstract: A method of manufacturing a GMR, TMR or CPP GMR sensor having a smooth interface between magnetic and non-magnetic layers to improve sensor performance by exposing a layer to a low energy ion beam prior to depositing a subsequent layer.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: March 16, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Phong V. Chau, James Mac Freitag, Mustafa Michael Pinarbasi, Hua Ai Zeng
  • Patent number: 7661188
    Abstract: In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: February 16, 2010
    Assignee: Hoya Corporation
    Inventor: Yoshinori Marumo
  • Patent number: 7650684
    Abstract: A method for fabricating a magnetic head including a spin valve sensor having a sensor layer stack that includes a pinned magnetic layer, a spacer layer formed on the pinned magnetic layer, and a free magnetic layer formed on the spacer layer. In a preferred embodiment the spacer layer is comprised of CuOx. The method includes the plasma smoothing of the upper surface of the pinned magnetic layer prior to depositing the spacer layer, and a preferred plasma gas is a mixture of argon and oxygen.
    Type: Grant
    Filed: July 16, 2004
    Date of Patent: January 26, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Yaung Lee, Tsann Lin, Danielle Mauri, Alexander Michael Zeltser
  • Patent number: 7640650
    Abstract: A method of making a magnetoresistive sensor includes defining a track width of a magnetoresistive element stack of the sensor. Further, processes of the method enable depositing of hard magnetic bias material on each side of the stack. These processes may permit both milling of excess depositions of the material outside of regions where the hard magnetic bias material is desired via use of a photoresist and making the material have a planar surface via chemical mechanical polishing, which also removes the material on top of the stack. The method includes removing excess material outside of the photoresist, wherein the excess material includes part of the hard bias layer, while a portion of the hard bias layer remains directly above the MR sensor stack.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: January 5, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Satoru Araki, Ying Hong, Wipul Jayasekara, Ming Jiang
  • Patent number: 7634850
    Abstract: Embodiments of the present invention allow control over the element height of read and write heads without damage to a lapping surface table when an air-bearing surface is lapped with a row bar or magnetic head slider tilted. According to one embodiment, the air-bearing surface is lapped with the row bar tilted in the longitudinal direction of a slider to compensate element height-wise positional deviations of the read head and the write head. The lapping is performed while changing an inclination angle stepwise and swinging the row bar in the longitudinal direction of the slider centering around an inclination angle at each step. Thus, the element heights of the magnetic pole piece and the read element can be controlled without damage to a lapping surface table.
    Type: Grant
    Filed: July 20, 2007
    Date of Patent: December 22, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Koji Tanaka
  • Patent number: 7634851
    Abstract: A method of forming a magnetic tunnel junction memory element and the resulting structure are disclosed. A magnetic tunnel junction memory element comprising a thick nonmagnetic layer between two ferromagnetic layers. The thick nonmagnetic layer has an opening in which a thinner tunnel barrier layer is disposed. The resistance of a magnetic tunnel junction memory element may be controlled by adjusting the surface area and/or thickness of the tunnel barrier layer without regard to the surface area of the ferromagnetic layers.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: December 22, 2009
    Assignee: Micron Technology, Inc.
    Inventor: Mark E. Tuttle
  • Patent number: 7631416
    Abstract: A reticle having a convex portion and a concave portion is used to form a convex portion and concave portion in the resist pattern for magnetic detection element and conductive layer, respectively. Then, with each resist pattern as a mask, unnecessary portions are removed to determine an initial height and to form a convex portion and concave portion in the magnetic detection element layer and in the conductive layer, respectively. Then, based on a ratio between widths of the convex portion and of the concave portion of the magnetic detection element layer, a deviation of the magnetic detection element layer is obtained, and a deviation of the conductive layer is obtained in a similar way, and based on these deviations the medium facing surface is ground with the conductive layer as a resistance sensor so that the height of the magnetic detection element layer be a desired value.
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: December 15, 2009
    Assignee: TDK Corporation
    Inventors: Naoki Ohta, Kazuki Sato
  • Patent number: 7631417
    Abstract: Methods and structures for the fabrication of perpendicular thin film heads are disclosed. Prior to the deposition of shield structures, seed layers having anti-reflective properties are utilized, eliminating the need to deposit, then remove, traditional inorganic anti-reflection coatings prior to shield plating.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: December 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hieu Lam, Patrick Rush Webb, Yi Zheng
  • Patent number: 7621038
    Abstract: A method for fabricating a three terminal magnetic (TTM) sensor of a magnetic head according to one embodiment includes fabricating a P-type semiconductor material; fabricating an N-type semiconductor material at an upper surface of a portion of said P-type semiconductor material; fabricating a spin valve structure upon said N-type semiconductor material; engaging a collector lead to said P-type semiconductor material; engaging a base lead to said N-type semiconductor material; and engaging an emitter lead to said spin valve structure.
    Type: Grant
    Filed: January 17, 2008
    Date of Patent: November 24, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Jeffrey S. Lille
  • Patent number: 7610673
    Abstract: A vertical recording magnetic head and a method of manufacturing the same is provided. The magnetic head includes a main magnetic pole layer on a surface opposite to a recording medium and a pair of neck height markers which is exposed on the surface around the main magnetic pole layer and which indicates a neck height position of the main magnetic pole layer by way of inter-exposure area ratios. The neck height markers have one cross sections that increases and the other that decreases even though the cross sections in a plane parallel to the surface are oriented toward forward or backward directions in a neck height direction. The neck height markers have the same cross sections at a specific cross sectional position parallel to the surface.
    Type: Grant
    Filed: April 4, 2005
    Date of Patent: November 3, 2009
    Assignee: TDK Corporation
    Inventor: Toru Takahashi
  • Publication number: 20090265917
    Abstract: By the method of manufacturing a thin film magnetic head, a magnetic material having a suitable characteristic can be used for manufacturing a magnetic pole and corrosion of the magnetic pole can be prevented. The method comprises: a step of forming a multilayered magnetic pole; a step of forming a stopper layer on the magnetic pole; a step of forming an insulating layer on the stopper layer; a step of polishing the insulating layer, by chemical mechanical polishing process, until an upper face of the stopper layer is exposed; a step of removing the stopper layer, by dry etching process with a reactive gas, until an upper face of the magnetic head is exposed; a step of removing the upper face of the magnetic pole, by dry etching process with an inert gas, until reaching a prescribed depth; and a step of polishing the upper face of the magnetic pole, by chemical mechanical polishing process, until the upper face of the magnetic pole is flattened.
    Type: Application
    Filed: December 11, 2008
    Publication date: October 29, 2009
    Applicant: FUJITSU LIMITED
    Inventors: Koichi Sugimoto, Masanori Tachibana, Kazuaki Satoh, Yoshiyuki Ikeda
  • Patent number: 7607215
    Abstract: To provide a method of manufacturing magnetic head slider which is capable of improving the product quality, simplifying the manufacturing process, and reducing the manufacturing time. This method of manufacturing a magnetic head slider, formed by cutting out from a block member, includes the steps of: processing an end face of the block member forming one surface of a magnetic head slider; holding fixedly the end face of the block member processed; and while maintaining a holding state provided by the step of holding, cutting a portion of the end face side of the block member, and processing a cut surface of the cut portion forming another surface of the magnetic head slider.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: October 27, 2009
    Assignee: SAE Magnetics (H.K.) Ltd.
    Inventor: Ryuta Murakoshi
  • Patent number: 7603763
    Abstract: A method for manufacturing a magnetoresistive multilayer film. An antiferromagnetic layer, a pinned-magnetization layer, a nonmagnetic spacer layer and a free-magnetization layer are laminated on a substrate in this order. A film for the antiferromagnetic layer is deposited by a sputtering process as oxygen gas is added to a gas for sputtering. A film for an extra layer interposed between the substrate and the antiferromagnetic layer is deposited by a sputtering process as oxygen gas is added to a gas for sputtering. A film for the antiferromagnetic layer is deposited by a sputtering process with a gas mixture of argon and another gas of larger atomic number than argon.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: October 20, 2009
    Assignee: Canon Anelva Corporation
    Inventors: David Djulianto Djayaprawira, Koji Tsunekawa, Motonobu Nagai
  • Patent number: 7596854
    Abstract: A method is disclosed for fabricating a read head for a magnetic disk drive having a read head sensor and a hard bias layer, where the read head has a shaped junction between the read head sensor and the hard bias layer. The method includes providing a layered wafer stack to be shaped. A single- or multi-layered photoresist mask having no undercut is deposited upon the layered wafer stack to be shaped. The layered wafer stack is shaped by the output of a milling source, where the shaping includes partial milling to within a partial milling range to form a shaped junction. A hard bias layer is then deposited which is in contact with the shaped junction of the wafer stack.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: October 6, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Marie-Claire Cyrille, Wipul Pemsiri Jayasckara, Mustafa Michael Pinarbasi
  • Patent number: 7596853
    Abstract: The method of manufacturing a thin film magnetic head includes forming a first recessed portion for insulation and a second recessed portion for contact that reach the substrate through the first insulating layer from a side of the first insulating layer of the substrate having the first insulating layer thereon; forming a second insulating layer on the substrate in the first recessed portion; and forming the lower shield layer in the first recessed portion and a contact portion in the second recessed portion.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: October 6, 2009
    Assignee: TDK Corporation
    Inventors: Kenji Ichinohe, Yosuke Goto
  • Patent number: 7587811
    Abstract: A method for manufacturing a magnetic write head for perpendicular magnetic recording having a write pole with a very narrow track width and well controlled critical dimensions. The write pole is formed by depositing an electrically conductive seed layer over a substrate, and then depositing a photo resist layer over the seed layer. The photo resist layer is photolithographically exposed and developed to form an opening or trench in the photoreist layer, the opening defining the pattern of the write pole. A magnetic material is then plated into the opening in the photoresist layer. The photo resist layer can then be removed by a chemical lift off, and portions of the seed layer that are not covered by the write pole can be removed by ion milling.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: September 15, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hamid Balamane, Christian Rene Bonhote, Yimin Hsu, Aaron Neuhaus, Aron Pentek, Yi Zheng
  • Patent number: 7578049
    Abstract: A method for manufacturing a write pole for a perpendicular magnetic write head. The method includes forming a mask structure over a full film layer of magnetic write pole material. A layer of hard mask material such as conformally deposited alumina is then deposited full film over the mask and write pole material. An ion mill, such as in an Ar or CHF3 chemistry is then used to preferentially remove horizontally disposed portions of the alumina layer (hard mask layer), thereby forming vertical hard mask walls at the sides of the mask structure. An ion mill is then used to form the write pole, with the alumna side walls providing excellent masking for forming well defined write pole edges. A relatively gentle clean up process can then be performed to remove the remaining mask material and side walls.
    Type: Grant
    Filed: September 21, 2006
    Date of Patent: August 25, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yimin Hsu, Vladimir Nikitin, Aron Pentek
  • Patent number: 7565733
    Abstract: An improved method for the manufacture of magnetoresistive multilayer sensors is disclosed. The method is particularly advantageous for the production of magnetic tunnel junction (MTJ) sensors, which can be damaged at the air bearing surface by conventional lapping and ion milling. The disclosed process protects the ABS of the magnetoresistive sensor by depositing a diamond like carbon layer which remains in place through ion milling. The DLC layer is removed by oxidation subsequent to the formation of the ABS.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: July 28, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Hardayal Singh Gill, Wipul Pemsiri Jayasekara, Huey-Ming Tzeng, Xiao Z. Wu
  • Patent number: 7565732
    Abstract: A method of fabricating a magnetic write head, in accordance with one embodiment, includes forming a beveled write pole. A conformal spacer may be formed upon a portion of a flare length proximate a tip of the write pole. A shield layer may also be formed upon the conformal spacer adjacent the flare length proximate the tip of the write pole.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: July 28, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Quang Le, Howard Zolla, Nian-Xiang Sun
  • Patent number: 7562437
    Abstract: A method for constructing a magnetic write head for use in perpendicular magnetic recording, the write head having a write pole with a trailing shield that wraps around the write pole. The method allows the trailing shield to be constructed with a very well controlled trailing gap thickness and also allows the write pole to be constructed with a well controlled track width and a straight, flat trailing edge. The method includes depositing a magnetic write pole over a substrate and forming a mask structure over the write pole layer. The mask structure includes an end point detection layer that can be removed by reactive ion etching. An ion mill is performed to form a write pole by removing magnetic write pole material that is not covered by the mask layer. A layer of non-magnetic material is deposited and is ion milled to expose the end point detection layer.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Aron Pentek, Yi Zheng
  • Patent number: 7563381
    Abstract: A method for constructing a tapered write pole, the method including the use of a bilayer hard mask.
    Type: Grant
    Filed: April 30, 2004
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Quang Le, Kim Lee, Aron Pentek, Douglas J. Werner, Sue S. Zhang
  • Patent number: 7562436
    Abstract: In one embodiment, a method of forming a CPP sensor comprises providing a sensor having a hard mask disposed on a left side thereof and a right side with a portion of the sensor material removed therefrom, the hard mask having a vertical surface; forming a right dielectric layer including a vertical surface disposed adjacent the vertical surface of the hard mask; forming a right hard bias layer or right side shields on the right dielectric layer; removing the hard mask to expose the left side of the sensor; forming an electrically conductive layer on the sensor, the electrically conductive layer including a vertical electrically conductive portion disposed adjacent the vertical surface of the right dielectric layer; removing the electrically conductive layer except the vertical electrically conductive portion; removing a portion of the sensor material from the left side of the sensor; forming a left dielectric layer on the left side of the sensor, the left dielectric layer including a vertical surface dispose
    Type: Grant
    Filed: July 29, 2005
    Date of Patent: July 21, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventor: Wipul Pemsiri Jayasekara
  • Patent number: 7555828
    Abstract: A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: July 7, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Gregory Breyta, Mark Whitney Hart, Bulent Nihat Kurdi, Dennis Richard McKean, Alfred Floyd Renaldo, Douglas Johnson Werner
  • Patent number: 7552523
    Abstract: A method and system for manufacturing a perpendicular magnetic recording transducer by a process that includes plating is described. The method and system include forming a chemical mechanical planarization (CMP) uniformity structure around a perpendicular magnetic recording pole. The CMP uniformity structure has a height substantially equal to a desired pole height. The method and system also include fabricating an insulator on the CMP uniformity structure and performing a CMP to remove a portion of the insulator. The CMP exposes a portion of the perpendicular magnetic recording pole and planarizes an exposed surface of the perpendicular magnetic recording transducer.
    Type: Grant
    Filed: July 1, 2005
    Date of Patent: June 30, 2009
    Assignee: Western Digital (Fremont), LLC
    Inventors: Li He, Jun Liu, Danning Yang, Yining Hu
  • Patent number: 7552524
    Abstract: A method for preventing TMR (tunnel magneto-resistance) MRR (magneto-resistance resistance) drop of a slider, comprises steps of: positioning a row bar constructed by a plurality of slider structural bodies on a tray, each slider body having a pole tip with a TMR element; loading the tray into a processing chamber and evacuating the processing chamber to a preset pressure; introducing a processing gas containing oxygen gas into the processing chamber; and exposing the slider structural bodies to an etching means in the atmosphere of the processing gas to oxidize a surface of the TMR element to form an oxidation layer thereon. The invention also discloses a method for forming micro-texture on a surface of slider in same process, and a method for forming such a slider.
    Type: Grant
    Filed: May 16, 2006
    Date of Patent: June 30, 2009
    Assignee: Sae Magnetics (H.K.) Ltd.
    Inventors: Hongtao Ma, Hongxin Fang, Baohua Chen
  • Patent number: 7549213
    Abstract: A method for independently controlling track width and bevel angle of a write pole tip having a P3 pole tip for perpendicular recording. The method includes establishing the track width in a portion of the P3 layer material. A portion of this portion having the established track width is protected by providing a temporary masking material to make a protected portion. At least one unprotected portion is left exposed to be shaped. This unprotected portion is then beveled to produce at least one beveled portion having a bevel angle. The protected portion produces a rectangular portion which together with the beveled portion produce a hexagonal pole tip. Also a magnetic head having a hexagonal pole tip, and a disk drive having a magnetic head having a hexagonal pole tip.
    Type: Grant
    Filed: January 12, 2005
    Date of Patent: June 23, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Yimin Hsu, Jyh-Shuey Lo
  • Patent number: 7549215
    Abstract: A structure and method for performing magnetic inductance testing of write heads formed on a wafer. The structure and method allows for the effective inductive testing of magnetic write heads at wafer level even if the write heads have an inductance that is too low to be effectively measured directly. A test head is constructed having a structure similar to that of the write heads, but having a significantly higher magnetic inductance. The higher magnetic inductance of the write head can be provided by extending the shaping layer to or beyond the air bearing surface plane ABS. The inductance of the test head can be further increased by increasing the width of the portion of the shaping layer that extends to the ABS (ie. shaping layer throat) and by increasing the width of the write pole throat.
    Type: Grant
    Filed: March 28, 2007
    Date of Patent: June 23, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Wen-Chien David Hsiao, Michael Ming Hsiang Yang
  • Publication number: 20090151151
    Abstract: Methods of fabricating magnetic read heads are provided which reduce the width of the scratch exposure region of a read head. During normal fabrication processes, a read head is formed with a first shield, a read element formed on the first shield, and hard bias layers formed on either side of the read element. The width of the read elements and the hard bias layers define an initial scratch exposure region. According to embodiments herein, a mask structure is formed to protect the read element and first portions of the hard bias layers proximate to the read element. A removal process is then performed to remove second portions of the hard bias layers that are not protected by the mask structure, which defines a final scratch exposure region that is smaller than the initial scratch exposure region.
    Type: Application
    Filed: December 16, 2007
    Publication date: June 18, 2009
    Inventors: David P. Druist, Mohamad T. Krounbi, David J. Seagle
  • Patent number: 7536775
    Abstract: A method for sample preparation. The method includes mechanically polishing portions of an insulating layer over a main pole of a recording head embedded within a sample structure. The insulating layer is polished top down in planar layers perpendicular to an air bearing surface adjoining the main pole. The method also includes selectively wet etching the remaining portions of the insulating layer to expose the main pole, wherein the insulating layer surrounds the main pole. Etching is made without damaging the main pole.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Phillip J. Peterson, Monica L. Vargas
  • Patent number: 7536776
    Abstract: A fabrication method for thin film magnetic heads, comprises, forming a Current Perpendicular to a Plane (CPP) sensor film over a lower shield and a first chemical mechanical polishing (CMP) stop film over the CPP sensor film, etching the CPP sensor film and forming a track width on the CPP sensor film, and covering at least the etching section of the CPP sensor film with an insulating film. The method further comprises forming a CMP dummy film over the insulating film and a second CMP stop film over the CMP dummy film, exposing the first CMP stop film, and removing the first CMP stop film and the second CMP stop film by oxygen reactive ion etching (RIE) and the CMP dummy film by fluorine RIE, and forming an upper shield film over the insulating film and over the CPP sensor film.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuo Yoshida, Taku Shintani, Hisako Takei
  • Patent number: 7536774
    Abstract: A method and apparatus for integrating a stair notch and a gap bump at a pole tip in a write head is disclosed. A protective plated layer is formed over the bump to prevent the bump form being damaged during formation of the notch at the pole tip. The flux from the second pole outside of the track will be effectively channeled to the first pole piece under the alumina bump.
    Type: Grant
    Filed: April 7, 2006
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies B.V.
    Inventors: Daniel Wayne Bedell, Wen-Chien David Hsiao, Ming Jiang, Hieu Lam, Kim Y. Lee, Jyh-Shuey Lo, Aron Pentek
  • Patent number: 7536778
    Abstract: A method of fabrication is disclosed for a slider having sites for fabrication of a continuous coil having a set of front coils and a set of back coils and a center tab, where the slider includes underpass leads.
    Type: Grant
    Filed: September 5, 2007
    Date of Patent: May 26, 2009
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Amanda Baer, Tsung Yuan Chen, David Patrick Druist, Edward Hin Pong Lee