Abstract: Spin drying of a stack of flats such as egg trays is performed within a housing by movement of a rotatable lifting head into engagement with the undersurface of the stack. A stack lifting device lifts the lifting head and the stack of flats positioned thereon vertically upwardly into engagement with a drive engagement device thereabove which is rotatably powered by a drive with an optional braking device. Operation of the drive will cause rotation of the lifting head, the stack of flats and the drive engagement device simultaneously. The stack of flats will be held between the lifting head engaging the lower surface thereof and the drive engagement device engaging the upper surface thereof for fixedly securing these three elements together during powered rotation thereof. The rotation will spin off any liquids remaining on the flats such as would be present after being washed.

Abstract: A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in the measured ambient temperature is detected. The substrate temperature, polymeric temperature, ambient temperature or a substrate drying spin speed is adjusted in response to the detected variation in the measured ambient temperature.

Abstract: In a method for centrifugally dehydrating a pallet or the like, the pallet or the like is held on a diagonal line thereof, and is rotated in a state where the diagonal line is substantially aligned with an axis of rotation, thereby removing a liquid adhered thereto.

Abstract: In a method for centrifugally dehydrating a pallet or the like, the pallet or the like is held on a diagonal line thereof, and is rotated in a state where the diagonal line is substantially aligned with an axis of rotation, thereby removing a liquid adhered thereto.

Abstract: A wet material treatment apparatus includes an inlet hopper for introducing the wet material into the apparatus. The hopper feeds the wet material into an injector auger that physically directs the wet material into a high velocity air stream produced by a blower thereby directing the flow of the wet material through the apparatus. The wet material moves from the injector auger into a cyclone that separates the wet material through specific gravity and desiccation into a substantially liquid and a substantially solid portion. The substantially liquid portion is discharged through a first outlet in the cyclone to a wet scrubber, while the substantially solid portion of the wet material is discharged through a second outlet. The apparatus can be mounted to a trailer for mobile transportation, and can include two cyclones operating in series.

Abstract: A centrifuge for a semiconductor wafer has a centrifuge plate for holding a semiconductor wafer, has a drive for setting the centrifuge plate in rotation, and has a device for supplying a medium to a front side and a rear side of the semiconductor wafer. The centrifuge has a housing which separates a centrifuging area and the semiconductor wafer from the environment, and a device for generating a laminar gas flow in the housing. A method for centrifuging a semiconductor wafer has the semiconductor wafer being centrifuged in a laminar gas flow.

Abstract: The present invention provides a flow disrupter within the flow path of a slurry comprising a desired particulate matter and a transport fluid so as to impart a force angularly disposed to an otherwise obtained direction of travel, thereby preventing the formation of a sheet of aggregated particulates against the screen surface. In a method in accord with the present invention a force is imparted to the desired particulate matter in an angular direction to the direction of travel.

Abstract: A process for de-watering foodstuffs, such as leafy vegetables, includes moving the foodstuffs along a path, creating an upwardly moving air vortex which intersects the path, thereby raising the foodstuffs upwardly from the path while swirling them in a vortical manner. The foodstuffs raised above the path are received in one end of a duct, the other end of which deposits them on a conveying means. Preferably, the foodstuffs are moved by an air-permeable transport means such as an endless belt. The upwardly moving vortex is created by an air blower which forces air through a tubular portion that contains helically oriented vanes having a tighter and tighter helix in the downstream direction.

Abstract: The present invention relates to a process for drying protein crystals starting from an aqueous protein crystal suspension, which comprises drying the protein crystal suspension in a centrifugal dryer, where the protein crystals, after they have been filtered off from the protein crystal suspension, are brought into contact with a drying medium which consists of a mixture of water and a nonaqueous solvent which is miscible with water in any ratio and which has a lower vapor pressure than water. In the process, a drying gas which has been moistened with water is advantageously used. The protein crystal suspension is advantageously converted into a fluidized bed for the purpose of drying.

Abstract: In a housing (1), a hollow shaft (3) is located for rotation, driven by a motor (5). Rigidly attached to the shaft (3) is a pressure vessel (6). Fitted to the shaft (3) inside the vessel (6) is a filter comprising a number of tube-shaped filter elements (9). The liquid to be filtered is fed into an upper chamber (19) of the shaft (3) via an inlet ring (18), and flows through transverse holes (20) into the vessel (6). After passing through the filter (9), the purified liquid is discharged via holes (10) in the hollow shaft (3) through an outlet ring (12). To clean the filter the residual liquid in the vessel (6) is pressed out through the filter with compressed air. Subsequently the deposit adhering to the filter tubes (9) is flung off by rotating the shaft (3) and propelled to the bottom of the vessel by feeding compressed air or clean oil to cleaning nozzles (38). An outlet ring (7) is raised slightly and the deposit at the vessel wall is dried by centrifuging.

Abstract: A process for drying a polymeric material present on a substrate is provided. Temperatures of the polymeric material is measured and the ambient temperature in the vicinity of the substrate. A temperature of the substrate is also measured. A variation in the measured ambient temperature is detected. The substrate temperature, polymeric temperature, ambient temperature or a substrate drying spin speed is adjusted in response to the detected variation in the measured ambient temperature.

Abstract: A device and method for planarizing a film layer device on a silicon wafer. The device has a circular track whose surface faces the track center, a carrier capable of moving along the track and carrying wafers around with their front surfaces facing the center, and a set of heating elements for heating the film layers on the wafers to make them fluid. Utilizing the centrifugal force on the film layer generated by the circular movement and the fluidity of the film layer provided by heating, planarization of the film layer is achieved.

Abstract: Many improvements for a high speed camera including being able to process image data from a CCD array at one-quarter the pixel rate at which that image is provided by the CCD array; automatically demultiplexing color information in the digital domain; a high frequency, temperature compensated phase shift clock circuit to individually adjust the phase of the clock signal to each A/D converter; high frequency, high power analog, bipolar clock drivers to drive the horizontal functions of the CCD array since the necessary speed and power is not available in the horizontal driver section of commercially available CCD drivers; a technique to minimize the smearing of partial values of previous pixels into later pixels since the CCD array is being clocked faster than the internal time constant of the output stage of the CCD array; determination of, and compensation for, the dark reference (i.e.

Abstract: A method and apparatus for processing whole head vegetables, characterized by a core end, and an open leafy end, is disclosed. Whole head vegetables pass through a washer which has a bottom belt which runs through the length of the washing line and passes through a first and a second tank (or more tanks) of cleaning water. Between the first and second cleaning tanks, a plurality of spray bars further clean the whole head vegetables. Top belts at each of the cleaning tanks above the bottom belt to secure the produce as it passes through the first cleaning tank and through the second cleaning tank. The lower belt, and the upper belts are controlled by a single speed control system resulting in less damage to the produce. Additionally, the angle of the belts conveying the produce through the two cleaning tanks is chosen for optimum performance.

Abstract: The disclosed invention is an improved means of cleaning paint brushes and paint rollers. The device consists of a base with at least two pliable longitudinal extensions which are held together by a series of ring segments. This combination of extensions and ring segments define a cavity that is capable of receiving and releasably securing the handle of a paint brush. The base is capable of receiving a paint roller, the roller fitting over the longitudinal extensions. An attachment rod extends from the base, opposite to the extensions. The attachment rod can be received by a drill chuck, or other rotary device and thereby rotated, including the brush received therein. As the brush rotates the flexible nature of the extensions allow the brush to orbit about the axis of rotation imparted by the drill. This allows rotation and translation of the brush so that no bristles of the brush are consistently in line with the center of rotation.

Abstract: There is provided an improved centrifugal dryer that includes a motor section or portion, a dryer section or portion disposed therebelow, and a reservoir section or portion disposed below the dryer portion, the dryer portion being hingedly attached to the reservoir portion. A product slurry is introduced into the dryer portion through a center inlet pipe and flows into the dryer section where the product is dried by forcing the fluid in the slurry through apertures in a perforated screen held in position between upper and lower screen positioning plates.

Abstract: The present invention relates to a wafer cleaning machine having an input station, a water track, a cleaning station, a rinsing station, a spin-dry station, and a load station. The input station includes two or more wafer supply areas for a continuous supply of wafers to the water track. After the wafers enter the water track from the input station, the wafers are transported down the track into the wafer cleaning station. The wafer cleaning station comprises a plurality of pairs of rollers which pull the wafers through the cleaning station and thereby clean the top and bottom flat surfaces of the wafers. A cleaning fluid manifold formed within the upper panel of the cleaning station facilitates effective distribution of the cleaning fluid to the rollers. From the cleaning station, the wafers are transported to a rinse station. From the rinsing station, the workpieces are transferred to a dual spin-dry station.

Abstract: A processor for processing semiconductor articles, such as integrated circuit wafers, flat panel displays, semiconductor substrates, and data disks. The processor has an interface section which receives articles in article carriers. The interface section transfers the articles from carriers into processing arrays. A conveyor having an automated arm assembly moves article arrays to and between processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.

Abstract: A centrifugal semiconductor processing system having a rotor which holds articles for centrifugal processing. The rotor includes a rotor frame with a receiver for holding the wafers or other articles in a spaced array without a wafer carrier to improve fluid access to the wafers. The rotor also has one or more retainers which are pivoted relative to the rotor to controllably urge the wafers into their desired processing positions. The retainers are preferably constructed to provide initial spring biasing with added restraining forces being generated during rotation. The processing system also preferably includes an implement mounted on a robot for loading the rotor, and a vision system to aid in the loading operation.

Abstract: A processor for processing semiconductor articles, such as integrated circuit wafers, flat panel displays, semiconductor substrates, and data disks. The processor has an interface section which receives articles in article carriers. The interface section transfers the articles from carriers into processing arrays. A conveyor having an automated arm assembly moves article arrays to and between processing stations. The processing stations are accessed from an enclosed area adjoining the interface section.

Abstract: A semiconductor processing system for wafers or other semiconductor articles. The system uses an interface section at an end of the machine accessible from the clean room. A plurality of processing stations are arranged away from the clean room interface. A transfer subsystem removes wafers from supporting carriers, and positions both the wafers and carriers onto a carrousel which is used as an inventory storage. Wafers are shuttled between the inventory and processing stations by a robotic conveyor which is oriented to move toward and away from the interface end. The system processes the wafers without wafer carriers.

Abstract: An apparatus for drying vegetables, fruits, and other produce having a support including a base and at least two upstanding posts. A housing element is secured to the support. A roller conveyor for transferring a container from outside of the housing element to a position within the housing element and for transferring the container from within the housing element to outside of the housing element is secured to the housing element. A hold-down lid for securing and positioning the container within the housing element is secured by a hold-down lid shaft and may be manually or electronically controlled. A plate for supporting and for rotating the container is secured to the plate shafts. The plate is mounted within the housing element and includes a plurality of spaced centrifugal pins being positioned so as to secure the container on the plate. The plate also has a centrifugal pin activation mechanism for activating and positioning the plurality of spaced centrifugal pins as the plate is rotated.

Abstract: A rotary-type wafer drying apparatus includes a deflection prevention protecting plate attached to a cradle for a wafer, for diminishing rebounding of dewaterized water. A free side of the protecting plate in the cradle containing wafer maintains an appropriate angle with the cradle and the transverse length of the plate is longer than the transverse length of the radially outward side of the cradle.

Abstract: Excess liquid is removed from a fast-moving thread, in that the latter is deflected, so that the liquid is hurled off, the hurled off liquid is removed from the thread, in that the thread is passed through a closed chamber, where a vacuum is produced in order to facilitate liquid evaporation and in that the thread is led through a narrow gap, so that the layer directly surrounding the thread and travelling therewith is peeled off. The combination of these drying effects constitutes one process stage. Advantageously, this process stage is performed several times in direct succession, so that in the case of a thread-protecting, small deflection angle a good thread drying can be achieved. The process is performed by an apparatus comprising several chambers (K.1-3) connected in series in the thread movement direction, the thread being deflected at the inlet and/or outlet with respect to each chamber by a deflection element (U.1-4) and passes through a narrow gap (S.1-). The chamber walls (20.