Abstract: An apparatus for drying semiconductor wafers in a solvent drying chamber and a method for drying are disclosed. The apparatus is equipped with an alarm/interlocking system such that when a flow of the solvent vapor into the drying chamber is stopped, the alarm is triggered and the interlocking system is activated to stop the further loading of wafers into the drying chamber and thus preventing the outputting of undried wafers from the chamber. The apparatus is used to prevent any malfunction in the flow control valves or in any other flow control system that stops the flow of solvent vapor into the drying chamber.

Abstract: A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.

Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.

Abstract: Method for drying wood raw material (10) by means of hot gases (20) supplied to the drying process, in which VOC, apart from water, evaporate from the wood raw material into the gases. The drying process is divided and carried out in at least two sub-steps (I, II), from which process gas (22, 33) is removed separately, and the drying process is thus controlled that VOC evaporate during one of the sub-steps, and the VOC are concentrated to this sub-step. The temperature of the gas containing VOC is increased to a temperature exceeding 180° C. before VOC are oxidized catalytically at said elevated temperature, in order to reduce the discharge of VOC from the drying process.

Abstract: A method and apparatus for fabricating and drying wafers, including micro-electro-mechanical system (MEMS) structures, in a second, supercritical processing fluid environment. The apparatus utilizes an inverted pressure vessel connected to a supercritical processing fluid supply and recover system, with an internal heat exchanger connected to external heating and cooling sources, which is closed with a vertically movable base plate. A wafer cassette configured for supporting multiple wafers is submerged in a first processing fluid within a container, which is installed on the base plate for insertion into the pressure vessel. Vessel inlet and outlet tubes extend vertically downward from the ceiling of the pressure vessel to nearly the base plate. Container inlet and outlet tubes extend vertically downward from the ceiling of the pressure vessel to inside the container and nearly to the bottom of the container.

Abstract: A system for shipping perishable product in a controlled atmosphere environment, by means of various transport containers and/or vehicles. Quantifies of the product are placed in flexible containers or bags having a controlled atmosphere inlet and a gas outlet, to form shipping units. The shipping units are placed in a containing section of the transport vehicle or structure, and the individual shipping units are supplied with the controlled atmosphere gas from a suitable gas source or sources having a gas regulator or regulators. During shipment and storage, controlled atmosphere gas is directed into the shipping units as needed to maintain the proper atmosphere within the shipping units. When arriving at a destination, the quantities of perishable product are either removed from the shipping units, or kept in the shipping units for further storage and/or shipment.

Abstract: In one embodiment, a cart (5) having a first vessel (10) which fits within a second vessel (90) is used to transport and store an integrated circuit substrate. The integrated circuit substrate is placed within the first vessel (10) and the door (18) of the first vessel (10) is closed and sealed against a door seal (24). The first vessel (10) is then purged with nitrogen to expel moisture and reactive gases from the interior of the first vessel (10). After purging, the first vessel (10) is then placed within the second vessel (90). The door (102) of the second vessel (90) is then closed and sealed against a door seal (104). The second vessel (90) is then purged with nitrogen to expel moisture and reactive gases from the interior of the second vessel (90). The cart (5) containing the integrated circuit substrate is then transported to the next manufacturing area. Integrated circuits and other articles may be manufacturing using the cart system of the present invention.

Abstract: A method for drying a moist organic material which is continuously supplied in a stream includes passing hot air through the moist organic material in a part of the stream to absorb an amount of moisture, whereby the moist organic material cools the hot air into warm air. The warm air is reheated after it exits the moist organic material to form reheated air with increased capability of absorbing moisture, and the reheated air is passed through the moist organic material further upstream, which has a greater moisture content. The drying can preferably be performed in five minutes or less. A method for drying moist organic material using hot air includes providing the moist organic material in a continuous material stream, and providing the hot air in a continuous air stream. The air stream flows in a direction generally opposite to that of the material stream.

Abstract: The present invention provides method and apparatus for reducing particulate contamination during the processing of a substrate. In one embodiment, the step of preheating a substrate in a preheater to a desired temperature. The preheated substrate is transferred from the preheater to a buffer region having a pressure therein that is between about two (2) Torr and about seven hundred and sixty (760) Torr. The preheated substrate is transferred from the buffer region to a reaction chamber. Thermophoretic forces help repel particles away from the substrate surface during substrate transfer.

Abstract: The present invention relates to a device and process for transporting flat objects confined in a specific atmosphere. The device comprises at least one assembly provided with several thin, flat cells (31) that open onto a lateral face (33) of said assembly with the cells arranged in parallel and linked by the same ventilation system. Each cell is constructed to receive a flat object (10) and is closed by an independent door (33). The cells are arranged in tandem and the device includes assembly means for interlocking an upper cell to an adjacent lower cell in each successive pair and in a complementary arrangement.

Abstract: A drying processing apparatus for supplying a dry gas to a processing chamber 35, which houses therein semiconductor wafers W, to dry the semiconductor wafers W, including a heater 32 for heating N.sub.2 gas serving as a carrier gas; a vapor generator 34 for making IPA misty by using the N.sub.2 gas heated by the heater 32 and for heating the IPA to produce the dry gas; and a flow control element 36 for supplying a predetermined rate of N.sub.2 gas to the processing chamber 35. Thus, it is possible to improve the efficiency of heat transfer of N.sub.2 gas, and it is possible to increase the amount of produced IPA gas and decrease the time to produce IPA gas. In addition, it is possible to prevent the turbulence of atmosphere in the processing chamber 35 after the drying processing is completed.

Abstract: In one embodiment, a cart (5) having a first vessel (10) which fits within a second vessel (90) is used to transport and store an integrated circuit substrate. The integrated circuit substrate is placed within the first vessel (10) and the door (18) of the first vessel (10) is closed and sealed against a door seal (24). The first vessel (10) is then purged with nitrogen to expel moisture and reactive gases from the interior of the first vessel (10). After purging, the first vessel (10) is then placed within the second vessel (90). The door (102) of the second vessel (90) is then closed and sealed against a door seal (104). The second vessel (90) is then purged with nitrogen to expel moisture and reactive gases from the interior of the second vessel (90). The cart (5) containing the integrated circuit substrate is then transported to the next manufacturing area. Integrated circuits and other articles may be manufacturing using the cart system of the present invention.

Abstract: A method for drying a moist organic material which is continuously supplied in a stream includes passing hot air through the moist organic material in a part of the stream to absorb an amount of moisture, whereby the moist organic material cools the hot air into warm air. The warm air is reheated after it exits the moist organic material to form reheated air with increased capability of absorbing moisture, and the reheated air is passed through the moist organic material further upstream, which has a greater moisture content. The drying can preferably be performed in five minutes or less. A method for drying moist organic material using hot air includes providing the moist organic material in a continuous material stream, and providing the hot air in a continuous air stream. The air stream flows in a direction generally opposite to that of the material stream.

Abstract: A process for drying a wet material in a drying system includes supplying a current of heated gas to a dryer from a combustion chamber. The material is exposed to the current in the dryer. The dried material is separated from the current of heated gas. The current of heated gas is split into a first stream of heated gas and a second stream of heated gas after the dried material has been separated. The first stream of heated gas is introduced into the combustion chamber so that the first stream is further oxidized therein. A third stream of heated gas is removed from the combustion chamber. The third stream includes at least a portion of the first stream. The second stream of heated gas is introduced into the combustion chamber so that it makes up a portion of the current conveyed to the dryer.

Abstract: A process and apparatus for drying material, particularly sludges, with indirectly heated driers includes a system for the thermal decontamination of exhaust air from the drier. Excess exhaust air from the drier loop is fed as secondary air to the heating boiler or furnace separately from the primary air for combustion of the fuel and to thermally clean the exhaust air from the drier. The exhaust drier gas from the drier remains in the furnace for a period to decontaminate the drier gas, after which it is mixed with the flue gases. The mixture is then removed from the furnace. The system is suitable for operation under normal operating temperatures and at low, below normal operating temperatures.

Abstract: A processing apparatus including a drying part provided with at least a drying fan and a drying heater to automatically develop a photosensitive material wherein the drying part further includes a means for detecting reduction in air amount of the drying fan.

Abstract: The invention relates to a method of dry cleaning textiles which are washed with solvent and dried by hot air, the solvent being recovered after condensation, the invention being characterised in that the solvent concentration is measured at the point where it is highest and temperature is measured, both being measured continuously throughout the whole of the drying process and the values are processed in a computer, and the concentration in the supply of hot air is controlled as a function of the relationship of concentration, acting as the pilot value, to temperature along a characteristic.

Abstract: In a process for drying material in a drying system, a first current of heated gas is supplied to a first dryer from a corresponding first combustion chamber. Material to be dried is exposed to the first current in the first dryer. The dried material is separated from the first current of heated gas. The first current of heated gas is split into a first stream of heated gas and a second stream of heated gas after the dried material has been separated. The first stream is introduced into the first combustion chamber so that the gas generated in the first combustion chamber and the first stream are combined to constitute the first current of heated gas. At least a portion of the second stream is introduced into the second combustion chamber. A second current of heated gas is supplied to a second dryer from the second combustion chamber. The portion of the second stream introduced into the second combustion chamber constitutes a portion of the second current.

Abstract: A process for the production of pourable and free flowing granules of materials or mixtures thereof which are suitable for use as wetting agents, detergents or cleaning products wherein an aqueous solution or suspension of the wetting agents, detergents or cleaning products is dried using a hot gas stream of superheated steam. Drying is terminated before the granules are damaged by heat, and the hot gas stream is freed from entrained particles of the materials by means of filters.

Abstract: A controlled atmosphere container system for shipping and storing perishable products, wherein the container system includes a plurality of individual, transportable containers to be connected from time to time with a central source for providing a controlled atmosphere to those containers. A controller preferably enables the container system to optimally allocate the capacity of the central source of the controlled atmosphere based upon the relative atmospheric conditions of the containers attached thereto and the capacity of the source. Such control is provided in the form of a predetermined hierarchy of priorities for allocating the controlled atmosphere gas to the individual containers.