Abstract: A liquid immersion exposure apparatus includes a projection system having a final element and a liquid immersion member that forms a liquid immersion space under the final element. The liquid immersion member includes a first member that surrounds the final element and that has a liquid supply port and a liquid suction port and a second member at least a portion of which is disposed below the first member, and that is movable with respect to the first member. The first member has a channel therein, one end of the channel is open to a first space between the final element and the first member, the other end of the channel is disposed below the one end and is open to a second space different from the first space, and the channel is provided such that liquid is allowed to flow into the channel.

Abstract: An exposure apparatus and method exposes a substrate via a projection optical system and a liquid supplied to an immersion area below the projection optical system. First and second movable members move below the projection optical system. The first movable member has a mount area that mounts a substrate located in a hole of an upper surface of the first movable member. The upper surface outside the hole can maintain at least a part of the immersion area outside the substrate mounted in the hole. A drive system drives the first and second movable members to move the first and second movable members below the projection optical system relative to the liquid immersion region to replace one member positioned below the projection optical system with the other member such that the liquid immersion area is maintained below the projection optical system.

Abstract: An immersion lithography system and method exposes a substrate through a liquid. The substrate is exposed through the liquid, which is provided between a final optical element of a projection lens and the substrate. The liquid is recovered from an upper surface of the substrate via a recovery opening of an immersion apparatus under which the substrate is positioned, the immersion apparatus being disposed around the final optical element of the projection lens. The a pressure for recovering the liquid from the upper surface of the substrate via the recovery opening is controlled by a pressure control system, the pressure control system having a first tank connected to the recovery opening via a recovery flow line and a vacuum regulator to control a pressure in the first tank.

Abstract: Exposure apparatus exposes a substrate by irradiating the substrate with exposure light via a projection optical system and a liquid. The exposure apparatus is provided with a liquid immersion mechanism for supplying the liquid and recovering the liquid. The liquid immersion mechanism has an inclined surface, which is opposite to a surface of the substrate and is inclined with respect to the surface of the substrate, and a liquid recovering port of the liquid immersion mechanism is formed in the inclined surface. A flat portion is provided between the substrate and the projection optical system. A liquid immersion area can be maintained to be small.

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.

Abstract: A substrate stage is provided with an immersion liquid collection member that surrounds at least an alignment feature of the substrate stage used to align the substrate on the stage by engaging alignment structure of the substrate. The collection member is located at least partly below the periphery of the substrate held by the substrate holding member of the substrate stage. The collection member has an uppermost liquid-receiving surface that preferably is spaced below a lowermost surface of the substrate when the substrate is held by the substrate holding member. The collection member collects liquid that flows along the alignment feature so as to prevent that immersion liquid from flowing along the under-surface of the substrate.

Abstract: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.

Abstract: An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a light-receiving element having a light-receiving surface. An optical member provided on the stage has a first surface contacting the liquid when moved to face the projection system, and a second surface contacting a gas and transmitting light having come from the projection system via the liquid and the first surface. The optical member is configured such that at least a large-angle ray of the light, which has an angle with an optical axis of the projection system sufficiently large to undergo total reflection at an end surface of the projection system when the liquid is absent, travels from the projection system to the second surface without passing through gas. The second surface transmits the large-angle ray, which is received by the light-receiving surface.

Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

Abstract: The invention concerns an arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus, wherein the mirror has an optical effective surface and at least one access passage extending from a surface of the mirror, that does not correspond to the optical effective surface, in the direction of the effective surface, wherein the arrangement is designed for thermal actuation of the mirror via electromagnetic radiation which is propagated in the access passage, wherein the arrangement further has at least one heat radiating mechanism which produces the electromagnetic radiation which is propagated in the access passage, and wherein the heat radiating mechanism is actuable along the access passage.

Abstract: A liquid confinement member supplies liquid to and collects the liquid from a liquid immersion area formed adjacent to a final optical element of an immersion exposure apparatus, and includes a channel formation member that surrounds a portion of the final optical element of the immersion exposure apparatus. The channel formation member includes a hole through which exposure light projected by the final optical element passes, a liquid supply opening through which the liquid is supplied to the liquid immersion area, a liquid recovery opening through which the liquid is recovered from the liquid immersion area, a liquid supply channel by which the liquid is supplied to the liquid supply opening, and a liquid recovery channel by which the liquid is recovered from the liquid recovery opening. At least one of the liquid supply and liquid recovery channels includes a protrusion into a portion of the channel.

Abstract: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured to measure an amount of the liquid collected via the liquid collection outlet.

Abstract: A system that may include a mechanical stage that is arranged to move an object along a predetermined path in relation to an optical module during an illumination of the object by the optical module; a structural support element that is arranged to support at least a part of the optical module; a gas flow module that is arranged to direct clean gas towards the object through gas flow module openings that define a coverage area that is (a) bigger than the object and (b) is positioned directly above at least a majority of the object when the object is positioned anywhere along the predetermined path.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Abstract: An exposure apparatus includes an atmosphere maintaining unit which maintains an exposure chamber in an air atmosphere, a gas supply unit which supplies air or a mixed gas containing air and an inert gas to a local space, between a final surface of a projection optical system and a substrate, a detector which detects an alignment mark and a reference mark formed on the substrate stage, and a controller. The controller controls the gas supply unit not to supply the mixed gas to the local space when the detector detects the reference mark, and controls the gas supply unit to supply the mixed gas to the local space when an instruction to detect the alignment mark upon setting the local space in a mixed gas atmosphere, and expose the substrate based on the detection results of the reference mark and the alignment mark is issued from the recipe.

Abstract: Disclosed are cooling apparatus and methods of cooling a template. The cooling apparatus includes a reticle and an optical cooling material. The reticle includes patterning for at least partially reflecting patterning radiation incident on a first side of the reticle. The optical cooling material is in thermally-conductive coupling with the reticle mount and is configured to produce cooling when exposed to a laser radiation. More particularly, the optical cooling material includes a glass material that exhibits anti-Stokes fluorescence that produces cooling of the glass material when exposed to an infrared laser beam. In some embodiments, the cooling apparatus may be incorporated with a reticle mount. The reticle mount is in thermally-conductive coupling with a second side of the reticle.

Abstract: The present invention provides an exposure apparatus which includes a projection optical system that projects a pattern of a reticle onto a substrate, and exposes the substrate through the projection optical system and a liquid, the apparatus including a recovery unit which includes a recovery path connected to a recovery port, and is configured to reduce a pressure in the recovery path to recover the liquid, supplied to a space between the projection optical system and the substrate, through the recovery port and the recovery path, and a heating unit which is disposed in the recovery path, and configured to heat the liquid recovered through the recovery port and the recovery path.

Abstract: A transmitting device in a tire condition monitoring system includes a sensor having a plane sensor detecting face that senses tire information; a transmitter that wirelessly transmits the tire information; and a housing within which the sensor and the transmitter are provided, that includes an internal space in contact with the sensor detecting face of the sensor, and a ventilation hole that communicates with the internal space and the tire cavity region and that extends in a linear manner. An inside opening part of the ventilation hole is inclined with respect to the sensor detecting face, and is provided on the wall surface of the internal space that extends parallel to the sensor detecting face. An angle ? between the extension direction of the ventilation hole extending from the internal space to the tire cavity region and the normal line direction of the sensor detecting face is 10°???120°.

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract: A scan lens and an interferometric measuring device using the scan lens are disclosed. The scan lens includes a lens set, a beam splitter, and a reflector disposed between the lens set and the beam splitter. During application the applied light beam passes through the lens set of the interferometric measuring device to fall upon the beam splitter where the light beam that passes through the beam splitter is defined as a first light beam and the light beam that is reflected by the beam splitter is defined as a second light beam. The first light beam is projected onto the test object. The second light beam is projected onto the reflector. The second light beam reflected by the reflector and the first light beam reflected or scattered by the test object will interfere with each other to form interference patterns for measuring the test object.

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.

Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.

Abstract: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas supply device provides a flow of gas in the receiving region. An associated method of inserting or removing an optical element into or from a receiving region in a housing is also disclosed.

Abstract: Provided is a lithography apparatus that includes a plurality of patterning devices each of which is configured to perform patterning for a substrate supplied from a preprocessing apparatus; and a controller configured to control the plurality of patterning devices such that a plurality of substrates respectively belonging to a plurality of lots is subjected to parallel processings by the plurality of patterning devices based on a plurality of recipe information respectively corresponding to the plurality of lots, and transmit information regarding a schedule of the parallel processings to the preprocessing apparatus.

Abstract: Method for operating a projection exposure apparatus for microlithography, the projection exposure apparatus comprising an optical element, a manipulator, which acts on the optical element by changing the temperature of the optical element and the deflection of which brings about a heat flow caused by the manipulator into the optical element. The history of the effects, in particular the temperatures introduced into the optical element or the optical effects caused thereby, of the manipulator are recorded in a record.

Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.

Abstract: A system for producing an exclusionary buffer gas flow in an EUV light source, comprising a vacuum chamber, a light path, a plasma generation region, at least one shield, at least one through-bore arranged in the at least one shield, at least one buffer gas injector arranged within the at least one through-bore to inject a buffer gas into the light path substantially towards the plasma generation region to prevent a flow of a target material into the light path, and a vacuum pump arranged to remove the buffer gas and the target material from the vacuum chamber.

Abstract: A liquid immersion exposure apparatus includes a projection system having a last optical element, a first member having a liquid supply port, a second member having a liquid recovery port, and a driving system which electromagnetically moves the first member, the second member, or both of the first and second members. A substrate is moved below and relative to the last optical element, the first member and the second member. A liquid supply from the liquid supply port and a liquid recovery from the liquid recovery port are performed to form a liquid immersion area on a portion of an upper surface of the substrate. The substrate is exposed with a beam through liquid in the liquid immersion area.

Abstract: Here are disclosed a pellicle for EUV and an assembly made up of this pellicle and a mask, which brings about a projection of low contrast (intensity) shadows of a mesh structure on the mask, thus minimizing the adverse effect of the shadow on the lithographic printing; also a method for assembling such assembly is disclosed wherein the pellicle is rotated relative to the mask to minimize the shadow contrast, in terms of a contrast ratio, of the mesh structure; the angle of the rotation is 30 degrees or smaller, and the resultant contrast ratio should be 25% or lower.

Abstract: A liquid immersion exposure apparatus includes a projection system, a movable stage, an alignment system and a measurement member. The projection system has a last optical element, and projects a beam onto a substrate through an immersion liquid. The movable stage has a holder by which the substrate is held. The alignment system detects an alignment mark on the substrate not through the immersion liquid. The measurement member is provided on the movable stage, and has a reference mark to be detected by the alignment system not through the immersion liquid. The measurement member has a material to form the reference mark, the material being covered with a light-transmissive material. The movable stage is movable to a position so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.

Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.

Abstract: A projection objective of a microlithographic projection exposure apparatus includes a wavefront correction device including a refractive optical element that has two opposite optical surfaces, through which projection light passes, and a circumferential rim surface extending between the two optical surfaces. A first and a second optical system are configured to direct first and second heating light to different portions of the rim surface such that at least a portion of the first and second heating light enters the refractive optical element. A temperature distribution caused by a partial absorption of the heating light results in a refractive index distribution inside the refractive optical element that corrects a wavefront error. At least the first optical system includes a focusing optical element that focuses the first heating light in a focal area such that the first heating light emerging from the focal area impinges on the rim surface.

Abstract: A solvent removing apparatus is disclosed. One aspect includes a chamber, a first pump, a silencer, a valve, and a discharge unit. The chamber dries a coating layer formed on a substrate. The first pump intakes a solvent evaporated from the coating layer of the chamber and discharges the inhaled solvent. The silencer reduces discharge noise of the first pump and accommodates a liquefied solvent of the evaporated solvent provided from the first pump. The valve discharges the liquefied solvent accommodated in the silencer. The discharge unit discharges the evaporated solvent provided by the silencer.

Abstract: The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing assembly having two or more lamps. The lamp housing assembly includes an air distribution assembly having an air chamber that is disposed adjacent to the lamps and pressurized to provide uniform distribution of air exiting the air chamber to impinge a backside of each of the lamps. The air exiting the chamber and impinging the lamps is controlled by monitoring the temperature of the lamps and/or the irradiance emitting from the lamps.

Abstract: A light-emitting element and its fabrication method are provided. The light-emitting element includes an EL layer between a pair of electrode, and the EL layer is formed by evaporation of an organic compound. The evaporation is conducted so that the partial pressure of a component with a specific molecular weight in a film-formation chamber, which is monitored by a mass spectrometer, does not exceed a specific value during the evaporation. This method allows the formation of a light-emitting element having an improved lifetime.

Abstract: The invention relates to a method for optically analyzing a sample liquid (34) contained in a sample container (24a-h), wherein the sample liquid (34) contains at least one substance (40) in at least partially dissolved form, comprising the following steps: providing at least one sample container (24a-h) filled with sample liquid (34); illuminating the at least one sample container (24a-h) by means of a light source (18a-h); and recording an image of an identification pattern (32a-h) associated with the at least one sample container (24a-h) by means of an image recording device (22) that produces image data, wherein the optical path (OP) is selected in such a way that the sample liquid (34) contained in the at least one sample container (24a-h) lies at least partially between the image recording plane (36) of the image recording device (22) and the identification pattern (32a-h). The invention further relates to an analysis device for carrying out the method.

Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Abstract: An image forming apparatus is provided in which, in receiving a job and processing an image, a central processing unit (CPU) that can be cooled by a cooling unit to which electric power is supplied from a power supply unit controls a printing unit. The CPU, after a power state of the image forming apparatus is shifted to a second power state lower in power consumption than a first power state, recognizes that a receiving unit has received a job for returning from the second power state to the first power state. Then, the CPU performs adjustment such that start timing for supplying electric power from the power supply unit to the cooling unit is delayed.

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Abstract: An exposure apparatus includes a measuring member disposed in a substrate stage for holding the substrate, at a side of a surface holding the substrate of a substrate stage, an auxiliary member disposed at a side of the surface of the substrate stage, with a gap with the measuring member, and a sealing member contacting a surface of the auxiliary member, disposed to cover the gap, and for suppressing penetration of the liquid locating on a surface of the measuring member, or the surface of the auxiliary member into the gap, and wherein the sealing member has a shape forming a space where a part of the surface of the measuring member contacts gas, while the liquid is on the surface of the measuring member and the liquid contacts an edge of the sealing member.

Abstract: A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

Abstract: An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step.

Abstract: A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus.

Abstract: An immersion liquid confinement apparatus confines an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus also recovers the immersion liquid from the immersion area. The apparatus includes an aperture through which a patterned image is projected, an outlet, a first chamber into which the immersion liquid is recovered through the outlet, and a second chamber into which the immersion liquid is recovered through a porous member from the first chamber. The porous member has a first surface contacting the first chamber and a second surface contacting the second chamber. A vertical position of a first portion of the first surface is different from a vertical position of a second portion of the first surface.

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

Abstract: A liquid immersion exposure apparatus in which a substrate is exposed with an exposure beam, includes a projection optical system by which the substrate is exposed to the exposure beam, a first inlet disposed at a first position, which is capable of supplying a first liquid to a space adjacent to a bottom surface of the projection optical system, and a second inlet disposed at a second position which is different from the first position, the second inlet being capable of supplying a second liquid that is different from the first liquid to the space.

Abstract: An apparatus and method provide fluid for immersion lithography. A nozzle member that can move in a direction, is arranged to encircle a space under the optical element. The nozzle member can have an input to supply the immersion liquid to the space under the optical element during the exposure, and an output to remove the immersion liquid from a gap between the nozzle member and the wafer during the exposure. Immersion liquid can be supplied at a first rate to the space from a first portion of the nozzle member and at a second rate to the space from a second portion during the exposure. A wafer substrate is exposed by light through the immersion liquid.

Abstract: A method of projecting a pattern from a patterning device onto a substrate using a projection system, the method including using an optical phase adjustment apparatus in the projection system to apply a phase modification to radiation which has been diffracted from an assist feature of the pattern, the phase modification acting to reduce the size of an assist feature image exposed in resist on the substrate or prevent printing of the assist feature image in the resist on the substrate, while maintaining a contribution of the assist feature image to an image enhancement of a functional feature of the pattern.

Abstract: An exposure apparatus and method exposes a substrate via a projection optical system and a liquid supplied to an immersion area below the projection optical system. First and second movable members move below the projection optical system. The first movable member has a mount area that mounts a substrate located in a hole of an upper surface of the first movable member. The upper surface outside the hole can maintain at least a part of the immersion area outside the substrate mounted in the hole. A drive system drives the first and second movable members to move the first and second movable members below the projection optical system relative to the liquid immersion region to replace one member positioned below the projection optical system with the other member such that the liquid immersion area is maintained below the projection optical system.