Abstract: The present invention provides a detection apparatus for detecting a plurality of marks, comprising a plurality of detection units each including a mirror and a scope configured to detect light from the marks via the mirror, wherein the plurality of detection units include a first detection unit, a second detection unit, and a third detection unit, and in a surface direction parallel to a surface on which the plurality of marks are arranged, a direction of an optical axis between the mirror and the scope in the third detection unit is different from at least one of a direction of an optical axis between the mirror and the scope in the first detection unit and a direction of an optical axis between the mirror and the scope in the second detection unit.

Abstract: An actuator to displace, for example a mirror, provides movement with at least two degrees of freedom by varying the currents in two electromagnets (370). A moving part includes a permanent magnet (362) with a magnetic face constrained to move over a working area lying substantially in a first plane perpendicular to a direction of magnetization of the magnet. The electromagnets have pole faces lying substantially in a second plane closely parallel to the first plane, each pole face substantially filling a quadrant of the area traversed by the face of the moving magnet. A ferromagnetic shield (820) is provided around the moving part and has at least one interruption (822) to reduce the influence of adjacent actuators or stray fields while also minimizing attraction between the permanent magnet (362) and the shield (820).

Abstract: A semi-submersible microscope objective (100) includes a microscope objective having a protective barrel (120) with an optical inlet (122) and optical outlet (124), and a protective element (130) affixed to the microscope objective, sealing the optical outlet (124) but not the optical inlet (122). A transparent portion (132) of the protective element is aligned with the optical exit (124). The protective element is separable from the microscope objective without damaging the microscope objective. Use of the semi-submersible microscope objective in a multiphoton imaging method is also disclosed.

Abstract: In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.

Abstract: An illumination optical assembly for projection lithography serves for illuminating an illumination field, in which an object field of a downstream imaging optical assembly is arrangeable, with illumination light of an EUV light source. The illumination optical assembly has a pupil illumination unit, on which the illumination light impinges and which includes facets for illuminating a pupil in the illumination beam path with the illumination light with a predefined pupil intensity distribution. The pupil illumination unit is embodied such that a plurality of illumination channels of the pupil illumination unit illuminate only a part of the entire object field. This results in an illumination optical assembly in which an excessively high illumination intensity on the facets of the pupil illumination unit can be reduced.

Abstract: A method for producing a composite window pane, particularly a motor vehicle windscreen, includes mounting guide pins and electronic components on traces of a printed circuit board and inserting the printed circuit board between a first and a second glass plate. The guide pins are inserted in passthroughs in the first glass plate.

Abstract: A lithography apparatus includes an original conveying path, a substrate conveying path, and a plurality of patterning devices each configured to perform patterning on a substrate using an original. The plurality of patterning devices are arranged in two rows. The substrate conveying path is provided between and along the two rows. The original conveying path is provided in each of two rows between and along which the two rows of the patterning devices are arranged.

Abstract: An illumination optical unit for EUV projection lithography serves for illuminating an illumination field in which an object field of a downstream imaging optical unit is arranged. An object displaceable in an object displacement direction is in turn arrangeable in the object field. A facet mirror of the illumination optical unit has a plurality of facets arranged alongside one another and serving for the reflective, superimposing guidance of partial beams of a beam of EUV illumination light to the object field. The facet mirror is arranged such that a position of the respective facet on the facet mirror and an impingement region of an illumination light partial beam on the respective facet of the facet mirror predefine an illumination direction for the field points of the object field.

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

Abstract: A movement area of a stage includes first-fifth areas. In the first area, three of four heads except for a first head respectively face three of four sections of a scale member except for a first section. In the second area, three of four heads except for a second head respectively face three of four sections except for a second section of the scale member. In the third area, three of four heads except for a third head respectively face three of four sections except for a third section of the scale member. In the fourth area, three of four heads except for a fourth head respectively face three of four sections of the scale member. In the fifth area, the four heads respectively face the four sections. During exposure, the stage is moved from one of the first-fourth areas to another of those areas via the fifth area.

Abstract: A method of patterning a thin film is provided. The method includes coating a thin film layer and photoresist on a surface of a substrate; forming a first partially cured zone by performing a first exposing process of the photoresist with a mask, wherein exposing energy applied to the photoresist of the first partially cured zone is less than a photosensitive threshold of the photoresist; forming a cured zone on the first partially cured zone by performing a second exposing process of the photoresist with the mask, wherein a width of the cured zone is less than a width of the first partially cured zone, and exposing energy applied to the photoresist of the cured zone is equal to or greater than the photosensitive threshold of the photoresist; developing the photoresist; etching the thin film layer that is not covered by the photoresist; and removing the photoresist of the cured zone.

Abstract: An illumination optical unit serves for illuminating objects to be examined by a metrology system. The illumination optical unit has an optical pupil shaping assembly for generating a defined distribution of illumination angles of illumination light over an object field in which an object to be examined can be arranged. An optical field shaping assembly for generating a defined intensity distribution of the illumination light over the object field is disposed downstream of the pupil shaping assembly in the beam path of the illumination light. The field shaping assembly has at least one optical field shaping element arranged in the region of a pupil plane of the illumination optical unit. This results in an illumination optical unit which ensures an illumination which can be set in a defined manner with regard to an intensity distribution and an illumination angle distribution over the entire object field.

Abstract: A positioning system having a flat base comprising (i) a X-axis assembly having a X-axis linear actuator means arranged orthogonal to the Y-axis; (ii) a Y-axis assembly having a pair of Y-axis linear actuator means mounted onto the flat base forming a H-configuration; (iii) a Z-axis assembly having an aerostatic bearing mechanism that floats on thin film of externally pressurized air on top of the flat base; and a ?-axis actuator anchored from the X-axis to drive the Z-axis assembly which carries a workpiece, wherein the Z-axis assembly is rotated with the rotary axis for the ?-axis perpendicular to the flat base.

Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).

Abstract: A light transmission device is provided. The light transmission device includes a light source, a light transmission module and at least one light regulator. The light transmission module transmits a portion of the light of the light source for implementing a first semiconductor manufacturing process over the wafer. The light source is utilized to implement a second semiconductor manufacturing process over a wafer. The first semiconductor manufacturing process is different from the second semiconductor manufacturing process. The at least one light regulator regulates the light of the light transmission module transmitted to the wafer.

Abstract: Maskless lithographic apparatus measuring accumulated amount of light is provided. The maskless lithographic apparatus includes a light source which emits light, a stage on which a substrate is disposed, an optical system which converts the light into a beam spot array including a plurality of columns and a plurality of rows and irradiates the beam spot array onto the stage, a slit to which the beam spot array is irradiated and which passes an nth (n is a natural number) row of the beam spot array, an optical sensor which senses the nth row of the beam spot array which has passed through the slit, and a measuring unit which measures an accumulated amount of light in the nth row of the beam spot array sensed by the optical sensor.

Abstract: Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other.

Abstract: An immersion-type exposure apparatus includes a measurement area for measuring a substrate, an exposure area, which differs from the measurement area, for exposing the substrate via a projection optical system, plural stages configured to hold the substrate and to be movable between the exposure area and the measurement area, and a controller configured to control the driving of the plural stages, wherein in a case that one stage of the plural stage is positioned in the exposure area, and immersion liquid that is supplied onto the one stage is retained in exposure area and delivered to another stage, the controller is configured to determine a delivery position of the immersion liquid for the other stage based on at least a first processing position of the other stage.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

Abstract: A laser device includes: a laser light source which generates a laser light in a pulse waveform of preset predetermined frequency; intensity modulator which is driven with a transmittance waveform wherein transmittance changes at either the predetermined frequency or an integer-multiple frequency thereof and which extracts and outputs the laser light which is outputted from the laser light source; control unit which controls an operation of the intensity modulator; an amplifier which amplifies the laser light which is outputted from the intensity modulator; and a wavelength conversion optical element which converts a wavelength of the laser light which is amplified by the amplifier, wherein the control unit changes relative timing of the transmittance waveform with respect to the pulse waveform, thereby changing the pulse waveform of the laser light which is emitted from the intensity modulator, to output a pulse light of predetermined waveform from the wavelength conversion optical element.

Abstract: An optical element assembly includes a base, and an element unit. The element unit includes (i) an optical element having an element central axis and an element perimeter; and (ii) an element connector assembly that couples the optical element to the base, the element connector assembly including a flexure assembly having an element flexure and a base flexure. A distal end of the element flexure is coupled to the optical element near the element perimeter, a distal end of the base flexure is coupled to the base, and a proximal end of the element flexure is coupled to a proximal end of the base flexure near the element central axis.

Abstract: A controller inclines a movable body with respect to an XY plane at an angle ? in a periodic direction of a grating, based on a measurement value of an interferometer which measures an angle of inclination of the movable body to the XY plane, and based on a measurement value of an encoder system and information of angle ? before and after inclination, and computes an Abbe offset quantity of the grating surface with respect to a reference surface which serves as a reference for position control of the movable body in the XY plane. The controller drives the movable body, based on positional information of the movable body in the XY plane measured by the encoder system and a measurement error of the encoder system corresponding to an angle of inclination of the movable body to the XY plane due to Abbe offset quantity of the grating surface.

Abstract: A method of manufacturing an integrated circuit includes the following steps. A substrate including a plurality of exposure fields is provided, and each of the exposure fields includes a target portion and a set of overlay marks. The substrate is exposed to form a first layer lithography pattern on the target portion for the respective exposure field by an exposure system. The overlay of the first layer lithography pattern and the target portion is measured by the set of overlay marks of each exposure field to obtain first overlay data for the respective exposure field by a measuring system. The first overlay data is fed to form a second layer lithography pattern.

Abstract: A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors.

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

Abstract: A method for manufacturing a pellicle includes: providing a supporting substrate; forming an oxide layer over the supporting substrate; forming a metal layer over the oxide layer; forming a graphene layer over the metal layer; and removing at least a portion of the supporting substrate and the oxide layer. An associated method includes: providing a supporting substrate; forming a first silicon carbide (SiC) layer or a diamond layer over the supporting substrate; forming a graphene layer over the SiC layer or the diamond layer; and removing at least a portion of the supporting substrate and the first silicon carbide (SiC) layer or the diamond layer; wherein the pellicle is at least partially transparent to extreme ultraviolet (EUV) radiation. An associated pellicle is also disclosed.

Abstract: A method for fabricating a pattern on a semiconductor substrate, comprising the steps of: (a) providing the semiconductor substrate having a photosensitive layer thereon; (b) transmitting the semiconductor substrate to an exposure apparatus including several tubes; (c) providing the supporting assembly to support the tubes, where the supporting assembly includes a first supporting rod having several first parallel recesses, a second supporting rod disposed opposite to the first supporting rod, a bridging member connected to one end of the first supporting rod or one end of the second supporting rod; and a rolling member received by the bridging member; (d) providing a photomask to the exposure apparatus; and (e) transferring the pattern from the photomask to the photosensitive layer.

Abstract: An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.

Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

Abstract: A projection exposure apparatus for microlithography includes a projection lens which includes a plurality of optical elements for imaging mask structures onto a substrate during an exposure process. The projection exposure apparatus also includes at least one manipulator configured to change, as part of a manipulator actuation, the optical effects of at least one of the optical elements within the projection lens by changing a state variable of the optical element along a predetermined travel. The projection exposure apparatus further includes an algorithm generator configured to generate a travel generating optimization algorithm, adapted to at least one predetermined imaging parameter, on the basis of the at least one predetermined imaging parameter.

Abstract: Laser light from a light source part is guided to an irradiation plane by an irradiation optical system. In the irradiation optical system, element lenses are arrayed, and light fluxes that have passed through the element lenses respectively enter transparent elements. Irradiation regions of the light from the element lenses are superimposed on the irradiation plane. When each pair of adjacent target element lenses out of three target element lenses arrayed sequentially is regarded as a target element lens pair, the optical path lengths of three transparent elements corresponding to the three target element lenses are determined such that a peak position of light intensity on the irradiation plane resulting from the interference between the light fluxes through one target element lens pair is different from that corresponding to the other pair. This suppresses variations in light intensity caused by interference between the light fluxes on the irradiation plane.

Abstract: The invention relates to arrangements for actuating an element in a microlithographic projection exposure apparatus. In accordance with one aspect, an arrangement for actuating an element in a microlithographic projection exposure apparatus comprises a first number (nR) of degrees of freedom, wherein an adjustable force can be transmitted to the optical element in each of the degrees of freedom, and a second number (nA) of actuators, which are coupled to the optical element in each case via a mechanical coupling for the purpose of transmitting force to the optical element, wherein the second number (nA) is greater than the first number (nR). In accordance with one aspect, at least one of the actuators is arranged in a node of at least one natural vibration mode of the optical element.

Abstract: A method for controlling a vibrating optical element of a lithographic system the optical element having a predetermined number of degrees of freedom comprises: detecting a number of displacements of the optical element, each displacement corresponding to a degree of freedom, wherein the number of detected displacements is larger than the number of degrees of freedom; for each displacement according to a degree of freedom, generating a sensor signal corresponding to a movement in a degree of freedom; wherein the optical element moves as a function of a rigid body transformation matrix, the optical element movement including a first type of movement and a second type of movement; and modifying the sensor signals as a function of a modified transformation matrix, wherein the modified transformation matrix at least partially reduces at least one eigen mode or resonance of one of the first type of movements or the second type of movements.

Abstract: An apparatus for measuring the surface contour of a target area of a substrate has a light source to emit a measurement light beam. A beam splitting element defines a measurement axis and a reference axis. A substrate holder disposes the target area along the measurement axis and tilted away from normal incidence, about a tilt axis that orthogonally intersects the measurement axis, according to a predetermined tilt angle that is a function of the measurement light beam wavelength. An imaging sensor records a fringe pattern generated from the measurement light beam and a reference light beam. A computer extracts frequency profiles from the recorded fringe pattern, each profile taken in a direction that is orthogonal to the direction of the tilt axis, wherein the programmed instructions further compute changes in the contour of the target area surface according to the frequency profiles.

Abstract: Generating images to be projected at different projection distances with a multi-aperture projection display, statically or without any conversion, neither mechanically nor at the imager, is enabled by designing the single images of the multi-aperture projection display in a suitable manner, namely by combining provisional single images for the projection channels of the multi-aperture projection display, which are intended for each of the at least two images to be projected, projection channel by projection channel, to the actual or final single images.

Abstract: A light source device includes: a first semiconductor laser; a second semiconductor laser; a first collimator lens corresponding to the first semiconductor laser; a second collimator lens corresponding to the second semiconductor laser; and a deflection prism provided on the light exiting side of the first collimator lens so that an angle formed by a principal ray of first light emitted from the first semiconductor laser and a principal ray of second light emitted from the second semiconductor laser is smaller on the light exiting side of the deflection prism than on the light incident side thereof.

Abstract: A chuck for aligning a first planar substrate in parallel to a second planar substrate includes a top plate having a top surface for arrangement of the first planar substrate. A bottom plate is at least one distance measuring sensor configured to measure a distance between the top surface of the top plate and a surface of the second planar substrate, and at least three linear actuators in contact with the top plate and the bottom plate. The method for setting a gap between the first and second planar substrate includes measuring the thickness of the first planar substrate and measuring between a surface of the second planar substrate and the top surface of the top plate. The tilt adjusts between a top surface of the first planar substrate or the chuck and the surface of the second planar substrate by using at least three linear actuators of the chuck.

Abstract: A liquid immersion member used in a liquid immersion exposure apparatus, and is capable of forming liquid immersion space on a surface of an object opposite to an emitting surface of optical member which emits exposure light. Liquid immersion member includes a first member that includes a first part disposed at surrounding of an optical path of exposure light, and in which a first opening part, through which exposure light is able to pass, and first liquid supply part, which is disposed at at least a portion of surrounding of first opening part and is capable of opposing surface of object, are provided at first part, and a second member that includes a first liquid recovery part which is capable of opposing surface of object and is movable with respect to first member outside first part with respect to optical path.

Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

Abstract: The optical path changing device of the present disclosure includes an optical member having a parallel plate face for changing an optical path, and first, second, and third actuators. The first, the second, and the third actuators are connected with the optical member at first, second, and third vertices of a triangle imaginarily drawn on a plane parallel to the parallel plate face of the optical member. The first, the second, and the third actuators drive the optical member forward and backward in a normal direction of the parallel plate face at the first, the second, and the third vertices serving as points of load. The optical member has a center of gravity within the triangle when seen from the normal direction.

Abstract: Subject matter disclosed herein relates to arrangements and techniques that provide for improving contact angle measurement of a liquid droplet on an interface. An apparatus for measuring contact angles of a liquid droplet on a substrate comprises a platform configured to support the substrate and a camera configured to capture images of a liquid droplet on the interface. The apparatus further comprises multiple light sources to illuminate the liquid droplet along multiple direction and multiple optical paths to direct light illuminating the liquid droplet to the camera.

Abstract: A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

Abstract: A facet mirror, such as for use as an optical component in a projection exposure apparatus for EUV microlithography, includes at least two mirror modules having individual mirrors and mirror module surfaces and at least on one side a non-reflective edge region and a module edge. Adjacent individual mirrors in the mirror modules are a distance from each other that is less than half the width of the non-reflective edge region. The at least two adjacent module edges of adjacent mirror modules are offset with respect to each other by a height h along the surface normal of one of the two mirror module surfaces.

Abstract: A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate via liquid by exposure light, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light, that includes a second upper surface which is opposite to the first lower surface of the first member via a gap, a second lower surface which is capable of being opposite to the object, and a fluid recovery part which is disposed at at least a portion of surrounding of the second lower surface, and that is relatively movable with respect to the first member.

Abstract: This disclosure provides a lithography apparatus including: a lens barrel having an optical system configured to irradiate a substrate with a beam; and a stage apparatus configured to repeat a long distance movement in a primary scanning direction of the substrate and a short distance movement which is shorter than the long distance movement in terms of the amount of movement in a secondary scanning direction of the substrate, and being configured to form a pattern on the substrate with the beam, wherein the stage apparatus includes: a first moving body configured to move in the primary scanning direction; a floating unit configured to support the first moving body, so as to float by a magnetic force and be movable in the primary scanning direction; a second moving body configured to move in the secondary scanning direction; and a guide using a rolling body configured to support the second moving body in contact therewith so as to be movable in the secondary scanning direction.

Abstract: A method, comprising: —providing a process space atmosphere at a process space atmosphere pressure; —providing an exterior atmosphere at an exterior atmosphere pressure that is different from the process space atmosphere pressure; —providing a passage via which the exterior atmosphere is in open communication with the process space atmosphere, and via which substrates are exchangeable between the exterior atmosphere and the process space atmosphere; —injecting an exchange fluid into the passage at at least one exchange fluid injection point, so as to effect a flow of exchange fluid that extends through at least a part of the passage, wherein said flow is directed towards —the exterior in case the exterior atmosphere pressure is greater than the process space atmosphere pressure; or —the process space in case the exterior atmosphere pressure is smaller than the process space atmosphere pressure.

Abstract: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion 5 liquid), The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element (Lp) arranged nearest to the second plane. The refractive optical element includes a light emitting surface (Lpb) shaped to be substantially symmetric with respect to two axial directions (XY·axes) perpendicular to each other on the second plane. The light emitting surface has a central axis (Lpba) that substantially coincides with a central axis (40a) of a circle (40) corresponding to a circumference of a light entering surface (Lpa) of the refractive optical element. The central axis of the light emitting surface is decentered in one of the two axial directions (Y˜axis) from an optical axis (AX).

Abstract: A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern includes providing the pattern between an illumination system and a projection lens of a projection exposure apparatus so that the pattern is arranged in the region of an object plane of the projection lens and can be imaged via the projection lens into an image plane of the projection lens. The image plane is optically conjugate with respect to the object plane, and imaging-relevant properties of the pattern can be characterized by pattern data. The method also includes illuminating an illumination region of the pattern with an illumination radiation provided by the illumination system in accordance with an illumination setting which is specific to a use case and which can be characterized by illumination setting data.

Abstract: There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.