Abstract: A camera module includes: a lens module comprising one or more lenses; and an optical path adjustment member disposed to face the lens module or an imaging plane, and configured to be driven in a direction of an optical axis of the lens module to vary a distance from a rearmost lens of the lens module to the imaging plane.

Abstract: In accordance with an embodiment, an apparatus includes a millimeter wave radar sensor system configured to detect a location of a body of a person, where the detected location of the body of the person defines a direction of the person relative to the apparatus; and a microphone system configured to generate at least one audio beam as a function at least of the direction.

Abstract: A system and method evaluate defects in printed images. A target image, which has been captured of a printed image, is processed to identify defects, where present, which do not occur in a source image from which the printed image was generated. A trained classification model predicts a defect class for respective regions of the target image, each of the defect classes being drawn from a predefined set of defect classes. For at least one of the identified defects, a measure of severity of the defect is determined, such as a size of the defect. A decision on the acceptability of the printed image is made, based on the measure of severity of the at least one defect and the predicted defect class of a respective one of the regions in which the defect occurs.

Abstract: Fringe-projection autofocus system devoid of a reference mirror. Contributions to error in determination of a target surface profile caused by air non-uniformities measured based on multiple measurements of the target surface performed at different wavelengths, and/or angles of incidence, and/or grating pitches and subtracted from the measured profile, rendering the system substantially insensitive to presence of air turbulence. Same optical beams forming a fringe irradiance pattern on target surface are used for measurement of the surface profile and reduction of measurement error by the amount attributed to air turbulence.

Abstract: A method for determining an exposure condition for use in projecting an image of a pattern of an original on a substrate includes a setting step of setting an exposure condition, an image calculating step of calculating a dimension of an image to be projected on the substrate under the set exposure condition, an electrical characteristic calculating step of calculating an electrical characteristic of at least one of a portion for use as an interconnection and a portion for use as a transistor in a pattern to be formed on the substrate in accordance with a result calculated in the image calculating step, a determining step of determining whether the electrical characteristic calculated in the electrical characteristic calculating step satisfies a requirement, and an adjusting step of adjusting the set exposure condition when the electrical characteristic is determined not to satisfy the requirement in the determining step.

Abstract: An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

Abstract: An exposure apparatus according to an embodiment controls the positioning between layers using an alignment correction value calculated on the basis of lower layer position information of a lower-layer-side pattern and upper layer position information of an upper-layer-side pattern. The lower layer position information includes alignment data, a focus map, and a correction value which is set on the basis of the previous substrate. The upper layer position information includes alignment data, a focus map, and a correction value which is a correction value for the positioning and is used when the upper-layer-side pattern is transferred.

Abstract: Fringe projection autofocus systems are provided with variable pitch diffraction gratings or multiple diffraction gratings so that a reference beam and a measurement beam propagate along a common path. Alternatively, an input beam can be directed to a diffraction grating so that the selected diffraction orders propagate along a common path. In some examples, distinct spectral bands are used for reference and measurement beams.

Abstract: In a lithography tool used in fabricating microelectronic devices, autofocus (AF) systems provide automatic image focusing before making exposures. To reduce production of erroneous results based on interaction of a beam of AF light with certain regions on lithographic substrates, a subject AF device has a sending unit and a receiving unit. The sending unit directs an AF light beam to the substrate, and the receiving unit receives AF light reflected from the substrate. The receiving unit has a system photodetector and a patterned optical element that receives AF light from the substrate and transmits a selected diffraction order(s) of said light. The system photodetector senses light of the selected diffraction order of reflected AF light while at least one additional photodetector detects divergent reflected AF light. Substrate areas exhibiting unusual amounts of divergent light may indicate a focus-error condition. The AF systems can be configured as fringe-projection or slit-projection AF systems.

Abstract: Embodiments relate to a method, optical module and auto-focusing system for wafer edge exposure. The optical module comprises a light source emitting light of a wavelength to expose a photoresist, an exposing optics and a mask with an aperture between the light source and the exposing optics. The light emitted from the light source passes through the mask and then reaches the exposing optics to image the aperture on the wafer edge covered with the photoresist to form a focused light spot. The positions of the light source, the mask and the exposing optics, and the size of the aperture are configured such that the optical axis of the incident light is perpendicular to the wafer surface, and the light spot completely covers the wafer edge in the radial direction of the wafer.

Abstract: A method for determining an exposure condition for use in projecting an image of a pattern of an original on a substrate includes a setting step of setting an exposure condition, an image calculating step of calculating a dimension of an image to be projected on the substrate under the set exposure condition, an electrical characteristic calculating step of calculating an electrical characteristic of at least one of a portion for use as an interconnection and a portion for use as a transistor in a pattern to be formed on the substrate in accordance with a result calculated in the image calculating step, a determining step of determining whether the electrical characteristic calculated in the electrical characteristic calculating step satisfies a requirement, and an adjusting step of adjusting the set exposure condition when the electrical characteristic is determined not to satisfy the requirement in the determining step.

Abstract: An exposure method includes the following processes. An autofocus scan process is performed to detect a defocused portion of a first resist film over a semiconductor wafer and to generate a detection signal that indicates the defocused portion detected. A first exposure scan process is performed while selectively blinding the first resist film, with reference to a detection signal related to the defocused portion detected.

Abstract: Example embodiments are directed to an auto-focusing device for use in a maskless exposure apparatus that performs a beam focus calibration and an auto-focusing method using the same. The auto-focusing device includes a projection optical unit, a focus calibration unit, and a controller. The projection optical unit includes a distance measurement sensor and a focus controller that generate a beam of light. The focus calibration unit includes a substrate having a reference mark on which the beam generated from the projection optical unit is illuminated, a measuring optical unit configured to obtain image information of the beam illuminated on the reference mark, and a stage configured to support the substrate and the measuring optical unit. The controller is configured to control the focus controller so that a beam of the beam generated from the measuring optical unit is located on the surface of an exposed member.

Abstract: A system and method for calibrating the focal position of the imaging plane of a sequential lateral solidification (SLS) system. A test pattern is formed on a test substrate while varying the z-position of the focal position. Information concerning the z-position of the focal position is stored by a data processing system for various positions in the test pattern. An inspection light beam is directed onto the test pattern at a predetermined angle. The reflection of the inspection light beam is detected by an optical detector. The data processing system analyzes the reflection and determines whether the reflected light is substantially specular or substantially scattered. The data processing system uses the analysis of the reflected light and the information concerning the z-position of the focal position to select an optimal focal position for calibrating the SLS system.

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract: A photosensitive layer stack, lithographic systems and methods of patterning a substrate are disclosed having a patterning layer and a photochromic layer with an absorption switching from transmissive to absorptive upon exposure.

Abstract: Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided.

Abstract: An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

Abstract: In an image exposing apparatus that includes: a spatial optical modulation device having multitudes of pixel sections arranged two-dimensionally, each for modulating irradiated light; a light source for irradiating light on the spatial optical modulation device; and an image focusing optical system for focusing an image represented by the light modulated by the spatial optical modulation device on a photosensitive material, which includes image focusing lenses, and a microlens array disposed such that a plurality of microlenses are positioned at the image location of each of the pixel sections focused by the image focusing lenses, degradation in the image quality of an exposed image due to dust adhered to the microlens array is prevented by accommodating the microlens array in a housing having two transparent sections for transmitting the light to be passed through the microlens array and the light passed through the array.

Abstract: A photographic lens and test chart provide for a method of inspecting and adjusting the focus of the lens. The test chart is obliquely inclined relative to a plane perpendicular to the viewing axis of the photographic lens. Test photographs are taken of the test chart under low magnification and high magnifications the test photographs enabling the photographic lens to be adjusted for proper focus.

Abstract: A photolithography system includes a photolithography tool 32 that includes a stage upon which a semiconductor wafer is mounted. The tool is operable to move the stage to automatically focus a pre-determined image on a surface of the semiconductor wafer. The tool is further operable to log movements of the stage. The system also includes an automation host computer 36 operable to poll the photolithography tool 32 to obtain data reflecting the logged movements of the stage. The automation host computer 36 is further operable to analyze the data and compare the data to pre-determined error conditions. The host computer also takes a pre-determined action, including sending an electronic mail message to the personal computers 38 of relevant line personnel, in the event the data meets the pre-determined error conditions.

Abstract: A best focus determining method. First, a test mask is provided, wherein the test mask comprises a transparent substrate and an opaque layer covering parts of the transparent substrate to define a first transparent area with 0° phase and a second transparent area with 90° phase. The sizes of the two transparent areas are the same. Next, a light source is provided and transmits the test mask to perform an exposure. Then, a first image corresponding to the first transparent area and a second image corresponding to the second transparent area are formed. The sizes of the first and second images are measured to ensure the best focus possible.

Abstract: A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor.

Abstract: There is provided a method of measuring defocusing when a semiconductor wafer is exposed to light. With the method, a resist is exposed to light by deviating a focus of the light by a given distance in relation to the semiconductor wafer with the resist applied thereto, and after development of the resist, resist patterns for measurement are formed. Based on respective lengths of the resist patterns for measurement, defocusing in relation to the resist is found.

Abstract: To obtain an exposure condition determined in accordance with properties of each aligner without performing complicated processes for verification of the exposure condition, a database 10 included in an exposure condition determination system 100 stores information about exposures performed in the past. Specifically, the database 10 stores mask information 11, aligner information 12, resist process information 13 and past exposure condition information 14. An exposure condition determination unit 15 determines an exposure condition suitable for a new mask in accordance with an exposure condition determination program, based on various information extracted from the database 10 and information about the new mask. Then, the exposure condition determination unit 15 outputs an exposure condition 21 for the new mask resulted from the determination.

Abstract: An auto focusing apparatus comprises a contrast AF (auto focusing) means (10), an outside light AF means (20), a release button (30), a focusing accurate priority button (40) and control means (50). The control means controls the contrast AF (10) and outside light AF (20) to select a contrast AF operation when the focusing accurate priority button (40) is pressed before the release button (40) is pressed and to select an outside light AF operation when focusing accurate priority button (40) is not pressed before the release button (40) is pressed.

Abstract: The invention provides a projection exposure device that makes precise positional alignment possible.

Abstract: An exposure method for preventing accumulation of process error for substrates processed by an apparatus designed for multiprocessing and producing high quality semiconductor chips. A semiconductor integrated circuit production line polishes wafers of individual lots at a first processing system and second processing system of a CMP system two at a time. Wafer processing information indicating at which processing system of the first processing system of second processing system each wafer has been processed is transmitted through a communication line to a later processing apparatus including an exposure apparatus. The wafers of a lot loaded in the exposure apparatus are allocated to a plurality of processing systems of the exposure apparatus so that wafers processed by the same processing system are processed by the same processing system among the two processing systems of the exposure apparatus and are exposed at those processing systems.

Abstract: A method of producing an image of least a portion of a photographic image onto a photographic receiver including receiving a digital image corresponding to the photographic image, the digital image comprising pixels, and locating the relative optical position of a photographic image, the lens, and the photographic receiver in response to pixels of the digital image and illuminating a portion of the photographic image of high subject content to produce an image of such portion onto the photographic receiver.

Abstract: An image reading apparatus includes a diffusion box unit comprising a plurality of diffusion boxes, which each correspond to different sizes of photographic films, and controls the unit in such a manner that the diffusion box, which corresponds to the size of a film whose image is to be read, is positioned on an optical axis of a light source. Accordingly, the responsibility imposed upon an operator can be reduced and the error of choosing a wrong diffusion box can be prevented.

Abstract: To detect a deviation of an object focal plane of a printing lens from a reference focal plane that is perpendicular to an optical axis of the lens, a focusing chart with a test pattern thereon is held inclined to the reference focal plane with a center of the test pattern aligned with the reference focal plane, and test prints are made from the focusing chart through the printing lens while setting the printing lens at different printing magnifications. The test pattern consists of a plurality of lines extending in parallel to a transverse direction to the inclined direction of the focusing chart, and being spaced equally from each other in the inclined direction.

Abstract: An image reading apparatus includes a diffusion box unit comprising a plurality of diffusion boxes, which each correspond to different sizes of photographic films, and controls the unit in such a manner that the diffusion box, which corresponds to the size of a film whose image is to be read, is positioned on an optical axis of a light source. Accordingly, the responsibility imposed upon an operator can be reduced and the error of choosing a wrong diffusion box can be prevented.

Abstract: The position or the inclination of a substrate surface is detected at a high accuracy and a high speed, and corrected. When moving the substrate in a direction substantially at right angles to an optical axis of a projection optical system and feeding an area on the substrate into an image space of the projection optical system, at least one of the position and inclination in the optical axis direction of the substrate is detected, to bring that area into focus with the focal plane of the projection optical system. One of a first mode of conducting the measurement during travel of the substrate and a second mode of performing the measurement in a state in which that area has substantially been positioned in the image space is selected.

Abstract: A multiple-resolution optical device used to scan objects of variable sizes in various resolutions and forming corresponding images onto an image sensor is disclosed. The multiple-resolution optical device according to the present invention comprises a light source, a mirror set, and a lens set. The mirror set reflects the light from the light source projected onto the object and provides a plurality of optical paths. The lens set selects one of the optical paths to provide an object distance and an image distance whereby the corresponding image is clearly formed on the image sensor in response to said size. Hence, an optimal resolution is acquired and the optical resolution for optical scan processing is substantially enhanced.

Abstract: When no trimming is executed, the optical magnification is fixed and the electronic magnification is changed each time a print size changes in a film original having the same film size, even if recorded images have a different size. Further, the fixed optical magnification is the standard or set optical magnification, which permits the image of the film original to be projected to the effective image region of the image sensor in the state that it inscribes or nearly inscribes the effective pixel region to the greatest possible degree. As a result, a high quality print can be obtained without the deterioration of image quality in high productivity, and without the need of effecting the troublesome optical magnification by operating the zoom lens. Further, when trimming is executed, since preference is given to the optical magnification over the electronic magnification, even if only a part of the image recorded on a film original is enlarged, the deterioration of image quality can be prevented or minimized.

Abstract: There is provided a film image detection method, comprising the steps of measuring densities at a large number of measurement points arranged along a first direction and a second direction crossing the first direction in a measurement area including an image recording range on a photographic film on which an image is recorded, calculating density variation amounts at the measurement points along the first and second directions on the basis of the densities at the measurement points in the measured measurement area, accumulating the calculated density variation amounts at the measurement points along the first direction for each of a plurality of first rows of measurement points constituted by a predetermined number of measurement points arranged along the second direction, and for accumulating the density variation amounts at the measurement points along the second direction for each of a plurality of second rows of measurement points constituted by a predetermined number of measurement points arranged along

Abstract: An apparatus for making a lithographic printing plate according to the silver salt diffusion transfer process image-wise exposes an imaging element with a high intensity short time scanning exposure. The imaging element comprises on a support in the order given a silver halide emulsion layer and a layer containing physical development nuclei. A thus obtained image-wise exposed imaging element is subsequently developed in the presence of a developing agent and silver halide solvent. The image-wise exposure is focused substantially within the silver halide emulsion layer of the imaging element.

Abstract: A zoom objective for a photographic printer has a housing which accommodates two groups of lenses. One group is fixed and the other group is shiftable along the optical axis of the objective to change the magnification. The housing is externally threaded and meshes with an internally threaded magnification ring which surrounds the housing and serves to move the shiftable lens group. A clamping ring circumscribes the housing on either side of the magnification ring, and the clamping rings constitute abutments for the magnification ring. The clamping rings are adjustable along the optical axis of the objective. The housing is further surrounded by an internally threaded focusing ring which is in mesh with the housing and is provided with mounting elements for mounting the objective in a printer. The position of the housing in the printer can be varied by rotating the housing and the focusing ring relative to one another. This allows the objective to be focused following a change in magnification.

Abstract: A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of the apparatus can be calibrated by measuring a latent image of a mark by means of a scanning microscope (LID) forming a diffraction-limited radiation spot (Sp) on the photoresist layer on the substrate (W), in which layer the latent image is formed by means of a projection beam (PB).

Abstract: A motor control device for controlling a plurality of stepping motors, e.g., to move optical scanning units in an electrophotographic copying apparatus has a pulse generator, a pulse counter for counting the number of pulses generated by the pulse generator, a driver for driving the plurality of stepping motors in accordance with pulses generated by the pulse generator, a selector for selecting connections between the driver and each stepping motor, a comparison device for comparing the excitation phase of the driver and the excitation phase of each respective stepping motor, and a controller for matching the excitation phase of the driver and the excitation phase of each stepping motor based on the results of the comparison by the comparison device.

Abstract: Apparatus and method for detecting a position of a flat object includes structure and process steps for providing marks having at least one of (i) projections and (ii) recesses on a surface of a flat object. Structure and steps are provided for detecting the position of a surface of the object in a direction perpendicular to the surface of the object. Structure and steps are also provided for determining the position of a predetermined plane parallel to the surface of the object based on the detected position of the object surface. Structure and steps are also provided for detecting the positions of the marks within the predetermined plane.

Abstract: An image input apparatus, or "scanner," capable of adjusting the focal point of an image-forming optical system and pre-scanning the same portion of an original document for various focal points of the image-forming optical system. The various pre-scan images are displayed side-by-side on a display device so that an operator can compare images and select an appropriate focal point. The scanner includes an image-forming optical system which forms an image of an original source, an image pickup unit, positioned so as to correspond with the image-forming optical system, for sensing the image formed by the image-forming optical system, an adjustment mechanism for adjusting the focus of the image-forming optical system, and a display device, interfaced to the image pickup unit, for displaying the image sensed by the image pickup unit.

Abstract: In an imaging apparatus, provided is an optical device which is capable of changing the magnifying power thereof. The optical device includes a zoom lens system having a power varying lens group and a correction lens group both of which are movable in the direction of the optical axis of the zoom lens system with respect to the zoom lens system. The zoom lens system is moved in the direction of the optical axis of the zoom lens system, and the power varying lens is driven synchronously with the movement of the zoom lens system. Further, the zoom lens system and the correction lens are moved in accordance with a magnifying power and data representing the amount of the displacement of the zoom lens system respective to the optical axis and the displacement of the correction lens with respect to the optical system.

Abstract: A reproduction magnification of an image to be reproduced is inputted through a inputting device. A projection optical system is adjusted according to the reproduction magnification, and then projects image light reflected from an original in the form of a slit onto a photosensitive material sheet. As projecting the slit image light, the original and the photosensitive material sheet are synchronously fed each other.

Abstract: Multiple mode "tele," "pan" and "normal" prints are produced automatically using a tele/pan camera. With the camera set to a single frame - multiple mode option, a single exposed frame is encoded with a composite fiducial representing all of the chosen modes. During subsequent printing, in response to sensing the composite code, a printer produces multiple prints from the single frame, each print corresponding to a different one of the modes. With the camera set to a multiple frame - multiple mode option, a single depression of a shutter release button initiates a rapid sequence of exposures of multiple frames, each exposure being coded to correspond with a different single one of the multiple modes. Subsequent printing then proceeds on a one frame - one print basis to produce prints in each mode.

Abstract: This invention for reading an image of a document employs a optical projection magnification lens for projecting the image of a document; a movable image reading device for transforming the projected image into electrical signals and for providing a focussing adjustment; an electrical magnification process for varying electrically the size of the image projected on the image reading device; and a controller for controlling the optical projection lens, the electrical magnification process, and the movable reading device.

Abstract: A control mechanism for an optical system wherein a scanning operation by an optical system is controlled by the amount and the direction of an electric current supplied to an optical system drive motor; and wherein a current limiter value modifying means for changing a current limiter value which stipulates a maximum current value for the optical system drive motor is provided which sets a smaller current limiter value during control of a return scan by the optical system than the current limiter value set during control of a forward scan by the optical system.

Abstract: An image reading apparatus includes a reading unit for reading the image and a stepping motor for moving the reading unit. The stepping motor is excited and driven in one of a plurality of phase excitation modes each causing a different amount of movement per unit synchronizing signal. A phase excitation mode is selected from the plurality of phase excitation modes corresponding to an enlargement or reduction ratio of the image to alter the moving speed of the reading unit corresponding to the rotation speed of the stepping motor.

Abstract: An image forming apparatus including a copy image forming section for forming a copy image on the basis of an original image under each of a plurality of image forming conditions including a plurality of magnification ratios, a first key for inputing the change of magnification ratio from first magnification ratio to second magnification ratio, a second key for inputing one of the image forming conditions and a microprocessor for setting the second magnification ratio to the magnification ratio in accordance with first changing ratio when only the first key is operated and for setting the second magnification ratio to the magnification ratio in accordance with second changing ratio different from the first changing ratio when both the first key and the second key are operated.

Abstract: An apparatus for correcting a focal point according to a lens temperature includes an operation unit, to which data concerning a distance between a focusing lens and an object, data concerning a distance of the focusing lens and a focusing screen, and data concerning a variation of a focal point of the focusing lens per temperature variation are inputted beforehand. When data on a desired magnification are inputted, the operation unit performs arithmetic operations on a focal point at a present temperature. According to the calculated data, adjusting means adjusts distance between the focusing lens and the object, and that between the focusing lens and the focusing screen. As the temperature of the focusing lens further changes, the operation unit continues calculating the variation of the focal point, and another adjusting means adjusts the focal points accordingly.