Abstract: A method of controlling an image forming apparatus having an image reading unit capable of conveying and reading a plurality of documents of different sizes includes determining whether an automatic magnification function is set in a case where an instruction to read a plurality of documents of different sizes is given, and performing control such that, in a case where the determining determines that the automatic magnification function is not set, a first document reading mode in which the plurality of documents is conveyed at a constant conveyance speed and is read is set to the image reading unit, and, in a case where the determining determines that the automatic magnification function is set, a second document reading mode in which the plurality of documents is conveyed at a different conveyance speed for each document and is read is set to the image reading unit.

Abstract: A method of controlling an image forming apparatus having an image reading unit capable of conveying and reading a plurality of documents of different sizes includes determining whether an automatic magnification function is set in a case where an instruction to read a plurality of documents of different sizes is given, and performing control such that, in a case where the determining determines that the automatic magnification function is not set, a first document reading mode in which the plurality of documents is conveyed at a constant conveyance speed and is read is set to the image reading unit, and, in a case where the determining determines that the automatic magnification function is set, a second document reading mode in which the plurality of documents is conveyed at a different conveyance speed for each document and is read is set to the image reading unit.

Abstract: According to one embodiment, a substrate processing apparatus includes: a removing part (D1) configured to remove liquid droplets present in a recess (30); a drain hole (30a) located at the bottom of the recess (30) of a nozzle head (32), and configured to discharge the liquid droplets as a target to be removed out of the recess (30); and a controller configured to control the discharge state of a gas discharge nozzle (33) such that there is a period in which a gas is discharged from the gas discharge nozzle (33) at a flow rate, at which the gas discharged does not reach a surface to be processed of s substrate W, in a period from the end of the rinsing process using a treatment liquid to the start of the drying process using the gas.

Abstract: A multiple lens system includes at least one lens unit, at least one reflecting unit, a first image sensing element, a second image sensing element, and a processing unit. The processing unit is electrically connected to the first image sensing element and the second image sensing element. The processing unit controls at least one angle of the at least one reflection unit according to a capturing mode, changes at least one optical path of the at least one reflection unit, and selects at least one lens of the at least one lens unit. At least one image beam obtained by the selected at least one lens is reflected or projected to at least one of the first image sensing element and the second image sensing element through the at least one optical path.

Abstract: An image processing apparatus configured to execute variable magnification processing on an image includes a position determination unit configured to serially determine pixel insertion or removal positions in the image in a direction perpendicular to a direction of the variable magnification processing, and an insertion or removal processing unit configured to execute insertion or removal processing on pixels existing at the insertion or removal positions determined by the position determination unit. The position determination unit is configured to determine, within a range defined by a position distant from an immediately previously determined insertion or removal position by a first distance in the variable magnification processing direction and a position distant therefrom by a second distance in the variable magnification processing direction, a next insertion or removal position while referring to the immediately previously determined insertion or removal position.

Abstract: A method and article determine a greatest distance between adjacent sensors along the media path and command a flushing to advance media the determined greatest distance in the print engine and the peripheral device.

Abstract: A stage device includes a stage and a frame-shaped member that move in three degrees of freedom directions in a two-dimensional plane while floating above a surface plate. The stage also holds an object. First fixed elements and second fixed elements are fitted to the frame-shaped member, and cooperate with first movable elements and second movable elements to generate drive forces to drive the stage in the two-dimensional plane. A reaction force generated by the driving of the stage acts on the first and/or second fixed elements, and causes the frame-shaped member to move in the two-dimensional plane. Because the reaction force caused by the movement of the stage is substantially completely cancelled, and because the movement of a center of gravity of a system including the stage and the frame-shaped member does not occur, no unbalanced load acts on the surface plate.

Abstract: A projection objective, such as for EUV lithography, for imaging a pattern arranged in an object plane into an image plane with the aid of electromagnetic radiation from the extreme ultraviolet range is provided. The projection objective includes a plurality of mirrors provided with reflective coatings and arranged between the object plane and the image plane. At least one of the mirrors includes a graded reflective coating with a rotationally-asymmetric coating thickness profile in the mirror plane on a substrate with a rotationally-asymmetric or rotationally-symmetric surface profile. The projection objective can exhibit increased overall transmission.

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: A device for irradiating a laser beam onto an amorphous silicon thin film formed on a substrate. The device includes: a stage mounting the substrate; a laser oscillator for generating a laser beam; a projection lens for focusing and guiding the laser beam onto the thin film; a reflector for reflecting the laser beam guided onto the thin film; a controller for controlling a position of the reflector; and an absorber for absorbing the laser beam reflected by the reflector.

Abstract: An imaging optical system has a plurality of mirrors, which via a beam path for imaging light, image an object field in an object plane into an image field in an image plane. The imaging optical system has an exit pupil obscuration. At least one of the mirrors has no opening for passage of the imaging light. The fourth to last mirror in the beam path is concave, resulting in an imaging optical system having improved imaging properties without compromise in throughput.

Abstract: Optical devices that have at least one optical element and a plurality of kinematic components are disclosed. The number m of the kinematic components of one type exceed the number n of degrees of freedom in which the optical element can be manipulated. At least one of the n degrees of freedom can be x-displacement, y-displacement, z-displacement or tilt.

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: An optical system has a plurality of elements arranged to image radiation at a wavelength ? from an object surface to an image surface, the elements include mirror elements having a reflective surface positioned at a path of radiation. At least one of the mirror elements is a pupil mirror having a pupil mirror surface arranged at or near to a pupil surface of the optical system. At least one of the remaining mirror elements is a highly loaded mirror having a mirror surface arranged at a position where at least one of a largest value of a range of angles of incidence and a largest value of an average angle incidence of all remaining mirrors occurs, where the remaining mirrors include all mirrors except for the pupil mirror.

Abstract: In a lithographic projection apparatus, adjustment of the projection system, e.g. to compensate for lens heating effects, is performed by determining a region of interest for a given pattern and illumination arrangement, the region of interest being a non-circular region of a pupil plane of the projection system through which substantially all of the radiation of the modulated beam that contributes to formation of the image passes; obtaining a set of basis functions that are orthogonal over the region of interest; expressing the wavefront in the pupil plane in terms of the basis functions that are orthogonal over the region of interest and a set of coefficients; and determining a value of a control setting to minimize the values of the coefficients.

Abstract: An exposure apparatus that exposes an object to be exposed with light from an EUV light source. The light has an exposure wavelength component and a non-exposure wavelength component. The exposure apparatus has a detector that independently detects the quantity of light of the exposure wavelength component and the quantity of light of the non-exposure wavelength component of the light. Therefore, for example, even if the quantity of light of the exposure wavelength component and the quantity of light of the non-exposure wavelength component individually fluctuate, it is possible to accurately ascertain fluctuations in the characteristics of the optical system resulting from irradiation heat. As a result, it is also possible to achieve a high performance mirror adjustment system.

Abstract: An optical component for use in a lithographic apparatus. The optical component includes an optical element having an optical surface for reflecting electromagnetic radiation, and a protective zone covering the optical surface. The protective zone is provided with a material that substantially protects the optical surface against sputtering when the optical component is in use. The material has a refractive index that approximately equals unity for at least a predetermined wavelength of electromagnetic radiation to which the optical surface is exposed.

Abstract: An optical object detector including a feed path, a reference pattern facing the feed path, and an optical sensor configured to view the reference pattern through the feed path, absence of the reference pattern from the view of the optical sensor indicating presence of an object in the feed path.

Abstract: A catadioptric projection optical system for forming plural intermediate images of a first object and for imaging the image of the first object onto a second object, said catadioptric projection optical system includes at least one concave mirror, a first deflective reflector, and a second deflective reflector, wherein a light reflected by the first deflective reflector is directly led to the second deflective reflector.

Abstract: An exposure apparatus for transferring a pattern onto an object via a projection optical system, including a moving body arranged on an image plane side with respect to the projection optical system, a wave-front measuring unit at least a part of which is arranged in the moving body, and which measures wave-front information of the projection optical system, an adjusting unit that adjusts a state of an image of a projected pattern generated on the object via the projection optical system, and a controller that controls the adjusting unit using the wave-front information and Zernike Sensitivity corresponding to exposure conditions of the object.

Abstract: A driving apparatus for moving an object. The apparatus includes a first actuator which drives the object in X and Y directions, a second actuator which drives a reaction force counter which receives a reaction force generated when the first actuator drives the object, and a controller which controls the second actuator on the basis of X- and Y-direction positions of the object and X- and Y-direction accelerations of the object so as to cancel, by the second actuator, the reaction force to be received by the reaction force counter when the object is driven by the first actuator.

Abstract: A projection system includes at least one projection device configured to receive a beam of radiation coming from a first object and project the beam to a second object. The projection system further includes a sensor configured to measure a spatial orientation of the at least one projection device and a processing unit configured to communicate with the at least one sensor. The processing unit is configured to communicate with a positioning device configured to adjust the position of at least one of the first object and the second object based on the measured spatial orientation of the at least one projection device.

Abstract: The present invention provides a self-propelled image read module, which comprises a sensor, a guide rod, a motor, a gear set, and a belt. The guide rod is fixed on a base of a scanner. The sensor is slidably matched on the guide rod. The motor is disposed at one side of the sensor. The gear set is connected to the motor. The belt is fixed on the base. The belt passes through between and contacts a transmission wheel and an idle wheel of the gear set. Thereby, a scanner's image read module of simple assembly, low cost, and small size is formed.

Abstract: In a projection system for EUV, the positions of mirrors are measured and controlled relative to each other, rather than to a reference frame. Relative position measurements may be made by interferometers or capacitive sensors mounted on rigid extensions of the mirrors.

Abstract: A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.

Abstract: An original reading apparatus can realize stepwise or sequential variable magnification using relatively small size optical system upon reading an original. The apparatus includes a first mirror arranged in an optical path from a reading position of an original to an image forming portion across an image forming lens and reflecting a light from the reading position of the original, and a second mirror arranged with placing a reflection surface in opposition to a reflection surface of the first mirror and reflecting a light reflected from the first mirror for a plurality of times between the first and second mirrors, and thereafter reflecting toward the image forming lens. A mirror angle positioner for varying an angle of the reflection surface of at least one of the first and second mirrors depending upon a designated original reading magnification.

Abstract: An exposure apparatus includes a projection optical system of catadioptric type, and an optical element disposed on a reciprocating light path of the projection optical system, the optical element being movable to correct at least one of spherical aberration, astigmatism, and curvature of field of the projection optical system.

Abstract: A scanning exposure apparatus for exposing a substrate to a pattern of a reticle. The apparatus includes an exposure system which exposes the substrate to the pattern with respect to a unit region, to which the pattern is transferred, of the substrate, by relatively moving the reticle and the substrate, a control system which controls an operation of the exposure system, the control system determining whether a condition of an exposure performed by the exposure system is within a tolerance during the exposure, and causing the exposure system to continue exposing a remaining region in the unit region of the substrate to the pattern, even after the control system determines that the condition is out of the tolerance for the unit region, and a user interface system which indicates information for identifying the unit region, for which the control system determines that the condition is out of the tolerance, of the substrate.

Abstract: An optical head having a laser source of beams at an input end and image forming beams at an output end and a plurality of optical components arranged along the beams between the input and output ends to obtain an image on a photosensitive printing plate from the beams. The optical components include reflecting surfaces adapted to fold the beams several times between the input and output ends times in such a way as to reduce the width and height of the optical head. The folded beams are located in a plurality of parallel surfaces perpendicular to the image formed on the photosensitive printing plate. The optical head further includes optical components adapted to adjust the width, location, orientation and intensity of the image from the beams.

Abstract: A computer system comprises a first computer into which target information that an optical apparatus is to achieve is inputted and a second computer that determines the specification of a projection optical system based on the target information received from the first computer via a communication path with using a wave-front aberration amount, which the projection optical system is to satisfy, as a standard. Therefore, in the process of making the projection optical system, higher-order components of the aberration as well as lower-order components can be simultaneously corrected by adjusting the projection optical system based on the result of measuring the wave-front aberration to satisfy the specification, so that the making process becomes simpler. Furthermore, the target that the exposure apparatus is to achieve is securely achieved due to the projection optical system.

Abstract: A system for correcting aberration and distortion in EUV lithography places a reticle on a deformable reticle chuck, and a reticle height sensor is used to measure the surface height of the reticle placed on the deformable reticle chuck. An optical system projects EUV radiation onto the reticle and collects and projects reflected EUV radiation from the reticle through its exit pupil onto a wafer placed on a wafer chuck. A deformable mirror disposed proximal to the exit pupil may also be controlled for this purpose. The deformable reticle chuck and the deformable mirror are controlled such that aberration and distortion of an image of the reticle formed on the wafer by the optical system are corrected based on the height measured by the reticle height sensor.

Abstract: An exposure apparatus includes a projection optical system of a catadioptric type and an optical element disposed on a reciprocating light path of the projection optical system. The optical element is movable along an optical axis direction.

Abstract: In this exposure apparatus, position information such as the position, inclination, or shape of a first mirror, a second mirror, a third mirror, and a fourth mirror constituting a projection optical system PO is measured with a mirror monitor mechanism. Based on the obtained position information, the position or inclination or shape or the like of the first mirror, the second mirror, the third mirror, and the fourth mirror is corrected by actuators serving as a correction mechanism. As a result, in the case where changes occur in the projection optical system, these can be corrected in order to maintain the exposure conditions.

Abstract: An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.

Abstract: An illumination optical system is revolved at a given speed around a rotation shaft and emanates exposure light onto a reticle. The light having passed through the reticle is projected onto a semiconductor substrate, by means of a projection optical system which is revolved around the rotation shaft such that a relative positional relationship between the illumination optical system and the projection optical system is maintained.

Abstract: A predetermined pattern is transferred by applying an exposure beam while driving a stage by a driver so as to move an object along a moving plane. While the exposure beam is being applied, that is, during exposure, a counter stage is moved in a direction opposite from the moving direction of the stage in response to the movement of the stage, thereby substantially completely absorbing reaction force produced due to the driving of the stage. Accordingly, vibration and unbalanced load are not produced due to the driving of the stage, and precise exposure is possible. Furthermore, when the exposure beam is not applied, a correction device corrects the position of the counter stage so as to ensure that there is sufficient room (stroke) for the counter stage to move in a subsequent exposure operation. This makes it possible to shorten the stroke provided for the counter stage and to thereby prevent the apparatus from being of increased size.

Abstract: Annealing technology is capable of heating a wafer on which a copper film is formed at a desired temperature within a short period of time. A light-shielding plate 106 of SiC (silicon carbide) exhibiting a flat emissivity irrespective of the wavelengths and emitting light over a wide band of wavelengths is interposed between the wafer 1 on which is formed a copper film having a high light reflection factor and lamps 102. The lamps 102 are turned on in this state so that the light-shielding plate 106 is heated, first, and, then, the wafer 1 is heated by light radiated from the light-shielding plate 106 that is heated, thereby to anneal the copper film.

Abstract: When an illumination light beam is radiated by an illumination system at a predetermined angle of incidence &thgr; with respect to a pattern plane of a mask, the illumination light beam is reflected by the pattern plane. The reflected light beam is projected by a projection optical system PO onto a substrate, and a pattern in an area on the mask illuminated with the illumination light beam is transferred onto the substrate. During the transfer, a stage control system is operated to synchronously move a mask stage and a substrate stage in the Y direction, while adjusting a relative position of the mask in the Z direction with respect to the projection optical system, on the basis of predetermined adjusting position information.

Abstract: A stimulable phosphor sheet, on which a radiation image has been stored, is scanned with stimulating rays in a main scanning direction and moved in a sub-scanning direction, which is approximately normal to the main scanning direction. A read-out device photoelectrically detects the light, which is emitted by the stimulable phosphor sheet when the stimulable phosphor sheet is scanned with the stimulating rays in the main scanning direction, to obtain an image signal representing the radiation image. A light guiding mirror for reflecting the emitted light toward the read-out device is located to extend in the main scanning direction at a position in the vicinity of a position on the stimulable phosphor sheet, which position is scanned with the stimulating rays in the main scanning direction. The light guiding mirror is supported by a support member, which is formed from a metallic material and is electrically isolated from a ground, or which is formed from an electrical insulating material.

Abstract: An image reading apparatus includes a light source for illuminating an original, a plurality of mirrors for reflecting a light beam from the original illuminated with the light source, an imaging lens for forming an image of the light beam reflected by the plurality of mirrors, an image sensor arranged at an image forming position of the imaging lens, and an integrated scanning optical unit movable in a scanning direction. The integrated scanning optical unit integrally accommodate the light source, the plurality of mirrors, the imaging lens, and the image sensor to thereby obtain image information of the original. An optical axis L connecting, of the plurality of mirrors, a mirror B optically closest to an incident surface of the imaging lens, the imaging lens, and the image sensor is substantially parallel to the original surface. The mirror B, the imaging lens, and the image sensor are located at a lowest position of the integrated scanning optical system unit with respect to the original surface.

Abstract: A multiple-resolution optical device used to scan objects of variable sizes in various resolutions and forming corresponding images onto an image sensor is disclosed. The multiple-resolution optical device according to the present invention comprises a light source, a mirror set, and a lens set. The mirror set reflects the light from the light source projected onto the object and provides a plurality of optical paths. The lens set selects one of the optical paths to provide an object distance and an image distance whereby the corresponding image is clearly formed on the image sensor in response to said size. Hence, an optimal resolution is acquired and the optical resolution for optical scan processing is substantially enhanced.

Abstract: A projection optical system of the present invention comprises a shaping optical system which is disposed in an optical path between a first surface and a second surface on which an image of the first surface is formed and has a refractive power in only one of two directions which are perpendicular to an optical axis of the projection optical system and orthogonal to each other. This shaping optical system comprises a first lens group which has a refractive power in only one of the two directions which are orthogonal to each other and a second lens group which has a refractive power only in the direction in which the first lens group has the refractive power.

Abstract: A device (10) for changing the focus and field of view of an optical device having an optical element (19, 21) which is movable grossly to change field of view and movable incrementally to change focus of the device (10) with either field of view includes an operator actuatable control system for varying incrementally the axial position of this optical element within each of the regions to focus the optical device in each field of view mode. The device (10) includes a control knob (31), a threaded shaft (33) coupled to the control knob (31), a pair of stop members (37, 39) engaging threadedly the threaded shaft, and a linkage (45, 53, 49, 63, 59, 55, 67, 69) for converting axial motion of a stop member along the threaded shaft to incremental movement of the movable optical element along the primary optical axis (29).

Abstract: A carriage positioning structure includes a carriage pivoted to a longitudinal guide rod and reciprocated along a longitudinal sliding rail inside a scanner between a bottom shell and a flat glass plate, an image pick-up mechanism carried on the carriage and moved with the carriage to pick up the image of an object placed on the flat glass plate, a bottom guide wheel mounted on the carriage at the bottom and supported on the longitudinal sliding rail to guide reciprocating movement of the carriage along the longitudinal sliding rail, and a top guide wheel mounted on the carriage at the top and spaced below the flat glass plate by a gap, the top guide wheel being forced into contact with the flat glass plate by the gravity weight of the carriage when the scanner is turned upside down, permitting the carriage to be reciprocated on the flat glass plate along the longitudinal guide rod so that the image pick-up mechanism can pick up the image of a 3-D document placed below the scanner.

Abstract: A low-cost and small-size image reader incorporating a variable power function. An original document is irradiated with the light from a light source. The light is reflected in a reading position. The reflected light is incident on a mirror block via a fixed mirror. The light incident on the mirror block is deflected by a pair of mirrors. An optical path is thus extended and shortened in its length without taking a space in the horizontal directions of the reader. The mirror block and the lens are provided with driving devices. The mirror block and the lens are moved to adjust a focal point and a magnification.

Abstract: A zoom objective for a photographic printer has a housing which accommodates two groups of lenses. One group is fixed and the other group is shiftable along the optical axis of the objective to change the magnification. The housing is externally threaded and meshes with an internally threaded magnification ring which surrounds the housing and serves to move the shiftable lens group. A clamping ring circumscribes the housing on either side of the magnification ring, and the clamping rings constitute abutments for the magnification ring. The clamping rings are adjustable along the optical axis of the objective. The housing is further surrounded by an internally threaded focusing ring which is in mesh with the housing and is provided with mounting elements for mounting the objective in a printer. The position of the housing in the printer can be varied by rotating the housing and the focusing ring relative to one another. This allows the objective to be focused following a change in magnification.

Abstract: Three layer patterns are formed on a shot area, and wafer marks for X axis and wafer marks for Y axis are formed in each of the first to third layers. When a reticle pattern to be exposed has a certain relationship with the first and second layer patterns, an alignment reference coordinate value is determined on the basis of coordinate values of the wafer marks in the first and second layers. Alignment between a predetermined shot area and a reticle pattern is performed on the basis of the alignment reference coordinate value. The alignment reference coordinate value can be determined on the basis of an average value or a weighted mean value of the coordinate values of the wafer marks.

Abstract: An image reading apparatus equipped In an electronic copying apparatus has a variable-power optical system including a first and second fixed focus lens group mounted on a lens mount base. Each lens group has a different magnifying power. The lens mount base is moved by a motor to a partial position and then by a biasing mechanism to the final position such that in one final position the optical axis of the first lens group is aligned with the incident ray axis, and in another final position the optical axis of the second lens group is aligned with the incident ray axis. Further when the first lens group is employed a movable reflecting mirror is positioned such that it is out of the incident ray axis. When the second lens group is employed, the movable reflecting mirror is positioned such that is placed in the incident ray axis to reflect the incident ray to the second lens group. Further, the reflecting mirror is moved in conjunction with the movement of the lens mount base.

Abstract: A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.

Abstract: A system and method are used to form features on a substrate. The system and method include using a first array including individually controllable elements that selectively pattern a beam of radiation, a second array including sets of lenses and apertures stops that form an image from a respective one of the individually controllable elements in a first plane, a third array including lenses that form an image from a respective one of the second array in a second plane, and a substrate table that holds a substrate in the second plane, such that the substrate receives the image from the respective one of the second array. A same spacing is formed between elements in the first, second, and third arrays.