Abstract: A reading device includes a visible light source to irradiate a subject with light having a visible wavelength; an invisible light source to irradiate the subject with light having an invisible wavelength; first and second image sensors to receive reflected light from the subject being irradiated with the light having the visible wavelength and the light having the invisible wavelength, and circuitry. The first image sensor generates visible image data containing a first invisible component, and the second image sensor generates invisible image data of a second invisible component. The circuitry removes the first invisible component contained in the visible image data using the invisible image data. The circuitry multiplies the invisible image data with the correction coefficient that absorbs an individual variation in removal of the first invisible component, and the correction coefficient is generated based on the visible image data and the invisible image.

Abstract: A developing device includes a regulating member fixed to a frame at one end thereof and including a contact portion which contacts a developer carrying member. The contact portion includes a first region positioned upstream of a reference position and a second region positioned downstream of the reference position in a rotational direction of the developer carrying member. A length of the second region is longer than a length of the first region in a position corresponding to a contact nip with respect to a direction from a fixed end of the regulating member toward the other end as a free end of the regulating member, and the contact portion has a surface roughness smaller in the first region than in the second region, with the surface roughness in the second region being 20% or less of an average particle size of toner particles contained in a developer.

Abstract: An imprint apparatus includes first illumination optical system for emit light to cure imprint material between mold and substrate, second illumination optical system having light adjuster for illuminating the imprint material in part of region between the mold and the substrate, combiner located on pupil plane common to the first and second illumination optical systems and configured to combine the light from the first illumination optical system and the light from the second illumination optical system The combiner combines the light from the first illumination optical system and the light from the second illumination optical system by a mirror located in region surrounded by illumination region of the first illumination optical system including annular light intensity distribution on the pupil plane reflecting the light from the second illumination optical system.

Abstract: A method for eliminating a ring effect is provided. The method includes: capturing, by a camera, a standard ring image generated by light illuminating a standard Fresnel lens; establishing a compensation lookup table according to the standard ring image and obtaining a standard ring center point; capturing, by the camera, a ring image generated by the light illuminating a Fresnel lens to be tested; obtaining a ring center point according to the ring image; obtaining a conversion relationship between the ring center point and the standard ring center point; and performing a compensation procedure on the ring image according to the compensation lookup table and the conversion relationship to eliminate the ring effect in the ring image.

Abstract: An extreme ultraviolet light condensation mirror may include a reflective surface formed in a concave shape and configured to diffract a laser beam incident from a first focal point and having a wavelength longer than a wavelength of extreme ultraviolet light. The reflective surface may be provided with a plurality of first reflection portions, a plurality of second reflection portions, a plurality of first stepped portions, and a plurality of second stepped portions. The first and second stepped portions may have such heights that the laser beam obtains phases opposite to each other through reflection at the first and second reflection portions adjacent to each other. The height of each first stepped portion may be equal to or higher than the height of each second stepped portion. The height of at least one of the first stepped portions may be higher than the height of each second stepped portion.

Abstract: This disclosure provides systems, methods, and apparatus related to light detection and ranging. In one aspect, a method comprises providing an apparatus. The apparatus comprises a LiDAR unit and a LiDAR enclosure. The LiDAR enclosure comprises a four-sided container having a square or rectangular cross-section with a first open end and a second open end comprising two opposite ends of the four-sided container. The LiDAR unit is attached to a mounting area inside the four-sided container. A reflective material is disposed on an interior of a second side and a third side of the four-sided container. Laser light is generated with the LiDAR unit. The laser light that has interacted with environment surrounding the LiDAR enclosure and that has been reflected back to the LiDAR unit is detected. The detected laser light is processed to construct an image of the environment surrounding the LiDAR enclosure.

Abstract: A printer may include a main body and a development cartridge attachable to and detachable from the main body. The development cartridge may comprise a developing portion in which a photoconductive drum and a developing roller are provided, a waste toner container to receive waste toner removed from the photoconductive drum, a toner container connected to the developing portion and to receive toner, and a toner refilling portion connected to the toner container and to refill toner through the toner refilling portion into the toner container. The printer may include a communicating portion provided in the main body to be connected to the toner refilling portion to provide an access the toner refilling portion from outside of the main body when the development cartridge is attached to the main body.

Abstract: An overlay metrology tool may include an illumination source, illumination optics to illuminate an overlay target having periodic features with one or more illumination beams, collection optics to direct diffracted light from the periodic features of the overlay target to a detector, an adjustable pupil mask located at a pupil plane, and a controller. The adjustable pupil mask may include one or more individually-addressable control zones distributed across the one or more portions of the pupil plane to provide an adjustable pupil transmissivity distribution. The controller may direct the adjustable pupil mask to provide a selected pupil transmissivity distribution corresponding to a selected overlay metrology recipe, where the selected pupil transmissivity distribution corresponds to a selected configuration of the one or more control zones providing transmission of a selected set of diffraction orders from the target to the detector.

Abstract: An illumination optical system for projection lithography includes a pupil facet mirror having pupil facets. For at least some of the pupil facets which are designed as selectively reflecting pupil facets, the selectively reflecting pupil facet has a reflective coating for the illumination light, wherein a first coating area on a first part of the selectively reflecting pupil facet has a first reflectivity, a second coating area on a second part of the selectively reflecting pupil facet has a second reflectivity, the first coating area is different from the second coating area, and the first reflectivity is different from the second reflectivity. In combination or as an alternative, for at least some of the pupil facets which are designed as broadbands reflecting pupil facets, the broadband reflecting facets have a broadband reflective coating for the illumination light.

Abstract: An image forming apparatus, having a housing, a drawer movable between an inner position and an outer position, and a cartridge attachable to the drawer, is provided. The cartridge includes a photosensitive drum rotatable about an axis extending in a first direction and a drum cover movable between a first position and a second position. The drawer includes a guide configured to guide the cartridge in a second direction intersecting with the first direction when the cartridge is being attached to the drawer and a contacting portion configured to contact the drum cover and move the drum cover from the first position to the second position when the cartridge is being guided by the guide. The housing includes a stopper configured to stop the cartridge from separating from the guide in a third direction intersecting with the first direction and with the second direction.

Abstract: A system for projecting an image of an object on an image plane can include a beam splitter that outputs a first image beam and a second image beam in response to an input image beam, wherein the input image beam comprises an image of an object. The system can also include a Fourier transform lens to transform the second image beam into a Fourier image beam. The system can further include a bucket detector that is aligned in a light path of the Fourier image beam. The bucket detector asserts a control signal in response to detecting a threshold number of photons with an elevated probability of having a high spatial frequency within a timeframe and to de-assert the control signal in response to detecting less than the threshold number of photons with an elevated probability of having a high spatial frequency within the timeframe.

Abstract: A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.

Abstract: A method for imaging a sample, wherein the sample changes a polarization state of light as a function of position, wherein the method includes changing a polarization state of a purely polarized light of an incident light striking a micro-retarder array, thereby inducing a changed polarization state of the polarization state. The micro-retarder array is placed in a rear conjugate focal plane of a microscope. The method additionally includes projecting the changed polarization state of the polarization state into an object plane of the microscope containing the sample.

Abstract: A method including: obtaining a characteristic of a portion of a design layout; determining a characteristic of M3D of a patterning device including or forming the portion; and training, by a computer, a neural network using training data including a sample whose feature vector includes the characteristic of the portion and whose supervisory signal includes the characteristic of the M3D. Also disclosed is a method including: obtaining a characteristic of a portion of a design layout; obtaining a characteristic of a lithographic process that uses a patterning device including or forming the portion; determining a characteristic of a result of the lithographic process; training, by a computer, a neural network using training data including a sample whose feature vector includes the characteristic of the portion and the characteristic of the lithographic process, and whose supervisory signal includes the characteristic of the result.

Abstract: An illumination optical system is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and is configured to illuminate an illumination area on the first plane with a light from a light source. The illumination optical system includes one or more reflecting mirrors configured to reflect the light from the light source to the first plane such that the reflected light reaches the first plane after crossing an optical path of a light which travels in the reflective imaging optical system.

Abstract: A polarization filter includes a multilayer structure including a first plurality of elements and a second plurality of elements alternating between each other. The first plurality of elements and the second plurality of elements have different thicknesses, and the multilayer structure is configured to interact with unpolarized light incident on the multilayer structure and separate transverse electric (TE) waves and transverse magnetic (TM) waves of the unpolarized light.

Abstract: An LED lamp with an adjustable illuminating range is provided, including a lamp body. The lamp body includes a base, a lamp housing arranged on the base, and a light source assembly arranged inside the lamp housing. At least one side of the lamp housing includes an open structure allowing light from the light source assembly to emit. An adjusting mechanism is configured inside the lamp housing to adjust the illuminating range of the light emitted from the light source assembly. An emergence angle of the light source assembly or a size of the opening structure can be adjusted by the adjusting mechanism, thereby adjusting the illuminating range or an illuminating area of emitted light and meeting different user demands.

Abstract: An optical assembly guides an output beam of a free electron laser to a downstream illumination-optical assembly of an EUV projection exposure apparatus. The optical assembly has first and a second GI mirrors, each with a structured reflection surface to be impinged upon by the output beam. A first angle of incidence on the first GI mirror is between one mrd and 10 mrad. A maximum first scattering angle is produced, amounting to between 50% and 100% of the first angle of incidence. A second angle of incidence on the second GI mirror is at least twice as large as the first angle of incidence. A maximum second scattering angle of the output beam amounts to between 30% and 100% of the second angle of incidence. The two planes of incidence on the two GI mirrors include an angle with respect to one another that is greater than 45°.

Abstract: A polarization control device includes a first wave plate having a first surface profile and a second wave plate having a second surface profile complementary to the first surface profile. The optical axis of the first wave plate is orthogonal to the optical axis of the second wave plate. The first wave plate and the second wave plate are positioned to align the first surface profile with the second surface profile and maintain a constant thickness across the polarization control device. The first wave plate and the second wave plate may control polarization rotation as a continuous function of transverse position across a pupil plane of an optical system. The first wave plate and the second wave plate are separated by a sufficiently small distance so as to limit wave front distortion below a selected level.

Abstract: An exit aperture is set forth for placement between a prism and a projection lens capable of projecting light on a screen, comprising a frame with an opening for passing a cone of light and mounting points for securing the frame relative to the projection lens, wherein the opening has serrated edges for diffracting light incident thereon in multiple directions perpendicular to the serrated edges so as to be imperceptible when projected on the screen.

Abstract: A controller causes a display device, upon receipt of an instruction designating fixed data, to display a fixed image represented by the fixed data; generates, upon receipt of an instruction designating a position for generating a first region in the fixed image, a first position information on a basis of the position designated, and stores the first position information in the storage device; acquires, upon receipt of an instruction designating a plurality of pieces of variable data, the plurality of pieces of variable data through a data input device; and causes an image forming device to form on a recording medium an image, in which a variable image represented by the variable data is inserted as replacement in the first region in each page of the fixed image, on a basis of the fixed data, the first position information, and the plurality of pieces of variable data acquired.

Abstract: Debris is removed from a collector of an extreme ultraviolet light source vessel by applying a suction force through a vacuum opening of a cable. The method for removing debris also includes weakening debris attachment by using a sticky surface or by spreading a solution through a nozzle, wherein the sticky surface and the nozzle are arranged on the cable proximal to the vacuum opening. A borescope system and interchangeable rigid portions of the cable assists in targeting a target area of the collector where the debris is.

Abstract: A backlight source, and a method for controlling a light output direction thereof, a display panel, and a display device are provided, the backlight source includes: a back plate; at least one light source, which is disposed on a surface of the back plate; and a light direction transformation part, which is configured to be movable along the back plate, such that the at least one light source is changed from directly facing a first portion of the light direction transformation part having a first light direction transformation mode to directly facing a second portion of the light direction transformation part having a second light direction transformation mode.

Abstract: An emitter emits light such that the light crosses a conveyance path. A reflector reflects the light. A receiver receives reflected light. A determiner determines that a sheet is present on the basis of an amount of reflected light. A controller may increase a light amount of the light-emitting unit from a first light amount to a second light amount on the basis of a temperature of the light-emitting unit and a reflectance of the reflecting member. The controller may increase a receiving gain of the receiver from a first gain to a second gain on the basis of a reflectance of the reflecting member.

Abstract: Eyewear is provided including a frame, and a camera connected with the frame, in which the camera is configured to be controlled by a remote controller. The camera may be configured to capture video and/or a photo. The eyewear may include data storage, and the camera may be connected to the data storage. A wrist watch may be configured to act both as a time piece and a controller of the camera. The eyewear may also include a heads up display and/or a video file player. The eyewear may also include an electro-active lens.

Abstract: In methods and apparatus for increasing efficiency and optical bandwidth of a microelectromechanical system piston-mode spatial light modulator, an example apparatus includes: an electrode with spring legs; a base electrode; a mirror displacement determiner to determine a periodic signal corresponding to a displacement distance of the electrode beyond an instability point of the electrode; and a voltage source to output a periodic voltage to the base electrode in response to the periodic signal. The periodic voltage causes the spring legs to vary displacement of the electrode with respect to the base electrode according to the periodic voltage. The displacement includes distances beyond the instability point.

Abstract: A head-mounted display, or other near-to-eye display, incorporates optics that include a spatially-varying retarder (SVR). The SVR may include one or more layers of birefringent material. Light that enters and exits the SVR experiences a change in polarization where the phase of the light is modified by amounts that are different for different portions of the SVR. Focal length of light of an image generated by a pixelated display device is shortened by the optics so that the image can be focused onto a user's eye, which is relatively close to the pixelated display device.

Abstract: A holographic interferometer, comprising: at least one imaging device capturing an interference pattern created by at least two light beams; and at least one aperture located in an optical path of at least one light beam of the at least two light beams; wherein the at least one aperture is located away from an axis of the at least one light beam, thus transmitting a subset of the at least one light beam collected at an angle range.

Abstract: An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

Abstract: A new and useful illumination device, e.g. for a lithographic optical imaging system, is provided, and comprises a mirror array located between a radiation source and an illumination pupil. Each mirror element of the mirror array is individually steerable (controllable), and the polarization state of light from each mirror element of the mirror array can be selectively controlled, so that the illumination pupil can be filled with a distribution of light that is selectively controlled.

Abstract: A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.

Abstract: The disclosure relates to an optical system of a microlithographic projection exposure apparatus or of a wafer inspection apparatus having a first retardation manipulator, a second retardation manipulator, and a manipulator for displacing the second retardation manipulator independently of the first retardation manipulator in at least one direction that is transverse to the optical system axis of the optical system. The second retardation manipulator leaves the wavefront of light that passes through it during operation of the optical system unchanged. In a specified starting position of the first retardation manipulator and of the second retardation manipulator, the sum of the retardations caused by the first retardation manipulator and the second retardation manipulator coincides for all rays that travel parallel to the optical system axis during operation of the optical system.

Abstract: Disclosed are methods and apparatus for facilitating defect detection in a multilayer stack. The method includes selection of a set of structure parameters for modeling a particular multilayer stack and a particular defect contained within such particular multilayer stack and a set of operating parameters for an optical inspection system. Based on the set of structure and operating parameters, an electromagnetic simulation is performed of waves scattered from the particular multilayer stack and defect and arriving at a collection pupil of the optical inspection system.

Abstract: The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination targe

Abstract: A laser exposure system may include a plurality of laser devices configured to output laser beams with which an irradiated subject is irradiated, and at least one beam property adjustment unit disposed on optical paths of the laser beams outputted from the plurality of laser devices, and configured to allow beam properties of the laser beams to be approximately a same as each other.

Abstract: An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates while substantially conserving the pola

Abstract: The present invention discloses a filtering unit, comprising a plurality of filters, a fixing element and a drive controller. The fixing element is located on a body of the apparatus to be employed for fixedly supporting the plurality of filters. The plurality of filters are rotatably located on the fixing element. The drive controller is coupled to the plurality of filters to drive the corresponding filter rotating according to preset instructions to make light emitted by the lamp pass through the corresponding filter and to filter out light of a corresponding wavelength. Therefore, with the drive controller to drive the corresponding filter rotating according to preset instructions to make light emitted by the lamp pass through the corresponding filter and to filter out light of a corresponding wavelength, the replacement of the filters can be achieved without the manual operation.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

Abstract: The invention concerns a method of and an arrangement for determining the heating condition of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. In an embodiment the mirror is an EUV mirror and a method according to the invention comprises the following steps: deflecting at least one input measuring beam on to the mirror; ascertaining at least one optical parameter of at least one output measuring beam produced from the input measuring beam after interaction with the mirror; and determining the heating condition of the mirror on the basis of the parameter.

Abstract: A method for aligning a mirror of a microlithographic projection exposure apparatus, according to one formulation, involves: recording a first partial interferogram between a wave reflected at a first mirror segment (101) and a reference wave reflected at a reference surface (110, 310, 510), recording a second partial interferogram between a wave reflected at a second mirror segment (102) and a reference wave reflected at the reference surface, determining a phase offset between the first partial interferogram and the second partial interferogram, and aligning the first mirror segment and the second mirror segment in relation to one another in accordance with the determined phase offset, so that the distance of the relevant mirror segments (101, 102) from a respective predetermined, hypothetical surface in the direction of the respective surface normal is less than ?/10 at each point on the mirror segments, where ? denotes the operating wavelength of the mirror.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: The present invention relates to a light baffle assembly including a base baffle member comprising a base wall portion positioned substantially parallel to a longitudinal axis, an upper baffle member comprising an upper wall portion coupled to an upper blade portion, the upper wall portion positioned substantially parallel to the longitudinal axis, and the upper blade portion positioned to extend inwards from the upper wall portion towards the longitudinal axis, and a resilient member configured to extend the upper baffle member away from the base baffle member.

Abstract: In an imaging section (imaging device), optical filters constituting an optical filter device are inserted and extracted, and an aperture varies an f-number in accordance with the insertion and the extraction of the optical filters. Thus, during the writing operation to the surface of the projection screen, namely during the interactive projector operation, entering of the light in the wavelength band other than that of the detected light DL is suppressed while capturing the detected light DL with the necessary light intensity, and during an alignment (a calibration), the axial chromatic aberration caused by the difference in wavelength band between the pattern image light GL as the image light and the detected light DL is suppressed to achieve an improvement in accuracy.

Abstract: A feeding device for feeding a developer includes a cleaning member, an accommodating portion, a feeding member, and a sheet member. A wall surface of the accommodating portion is positioned in a side where the sheet member is provided with respect to a rectilinear line connecting a rotation center of the image bearing member and a rotation center of the feeding member in a flat plane perpendicular to an axial direction of the image bearing member. The wall surface approaches the rectilinear line with an increasing level with respect to a vertical direction. The feeding member is provided vertically above a position where the cleaning member contacts the image bearing member. A rotational direction of the feeding member and a rotational direction of the image bearing member are the same.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical unit for projection lithography illuminates an illumination field, in which an object field of a downstream imaging optical unit and an object to be illuminated are arrangeable, with illumination light of an EUV light source. The illumination optical unit includes two facet mirrors for reflecting, overlaid guidance of partial beams of a beam of the EUV illumination light via exactly one facet of one of the two facet mirrors in each case. The facet mirror is a distance from a pupil plane of the illumination optical unit. Individual mirrors of the other facet mirror, which is arranged in, or in the vicinity of, a field plane that is conjugate to the object field, may be grouped into individual mirror groups which are tiltable together.

Abstract: A shutter unit that opens and closes an optical path of light for a lithography apparatus is provided. The shutter unit includes a motor which rotatably drives a shaft extended along a rotation axis of the motor, and a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion. The shutter unit further includes a partition plate arranged at a location between the shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.

Abstract: The present invention provides an exposure apparatus including a rotation shutter, and a control unit configured to control a rotational speed of the rotation shutter so as to match an exposure amount on a substrate with a target exposure amount in exposure processing for a shot region, based on first information indicating a relationship between a rotational speed of the rotation shutter and an exposure amount on the substrate when rotating the rotation shutter at the rotational speed without stopping rotation of the rotation shutter so as to make a shift from a first state in which the rotation shutter shields a light to a second state in which the rotation shutter passes the light and then back to the first state, wherein the control unit updates the first information based on second information concerning a change in the illuminance of light.