Abstract: In methods and apparatus for increasing efficiency and optical bandwidth of a microelectromechanical system piston-mode spatial light modulator, an example apparatus includes: an electrode with spring legs; a base electrode; a mirror displacement determiner to determine a periodic signal corresponding to a displacement distance of the electrode beyond an instability point of the electrode; and a voltage source to output a periodic voltage to the base electrode in response to the periodic signal. The periodic voltage causes the spring legs to vary displacement of the electrode with respect to the base electrode according to the periodic voltage. The displacement includes distances beyond the instability point.

Abstract: A head-mounted display, or other near-to-eye display, incorporates optics that include a spatially-varying retarder (SVR). The SVR may include one or more layers of birefringent material. Light that enters and exits the SVR experiences a change in polarization where the phase of the light is modified by amounts that are different for different portions of the SVR. Focal length of light of an image generated by a pixelated display device is shortened by the optics so that the image can be focused onto a user's eye, which is relatively close to the pixelated display device.

Abstract: A holographic interferometer, comprising: at least one imaging device capturing an interference pattern created by at least two light beams; and at least one aperture located in an optical path of at least one light beam of the at least two light beams; wherein the at least one aperture is located away from an axis of the at least one light beam, thus transmitting a subset of the at least one light beam collected at an angle range.

Abstract: An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

Abstract: A new and useful illumination device, e.g. for a lithographic optical imaging system, is provided, and comprises a mirror array located between a radiation source and an illumination pupil. Each mirror element of the mirror array is individually steerable (controllable), and the polarization state of light from each mirror element of the mirror array can be selectively controlled, so that the illumination pupil can be filled with a distribution of light that is selectively controlled.

Abstract: A reflective EUV optic such as a collector mirror configured as an array of facets that are spaced apart to form respective gaps between adjacent facets. The gaps are used as inlets for gas flow across one of the facets such that flow is introduced parallel to the optic surface. The facets can be made with offsets such that loss of reflective area of the EUV optic can be minimized. The gas facilitates removal of target material from the surface of the facets.

Abstract: The disclosure relates to an optical system of a microlithographic projection exposure apparatus or of a wafer inspection apparatus having a first retardation manipulator, a second retardation manipulator, and a manipulator for displacing the second retardation manipulator independently of the first retardation manipulator in at least one direction that is transverse to the optical system axis of the optical system. The second retardation manipulator leaves the wavefront of light that passes through it during operation of the optical system unchanged. In a specified starting position of the first retardation manipulator and of the second retardation manipulator, the sum of the retardations caused by the first retardation manipulator and the second retardation manipulator coincides for all rays that travel parallel to the optical system axis during operation of the optical system.

Abstract: Disclosed are methods and apparatus for facilitating defect detection in a multilayer stack. The method includes selection of a set of structure parameters for modeling a particular multilayer stack and a particular defect contained within such particular multilayer stack and a set of operating parameters for an optical inspection system. Based on the set of structure and operating parameters, an electromagnetic simulation is performed of waves scattered from the particular multilayer stack and defect and arriving at a collection pupil of the optical inspection system.

Abstract: The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination targe

Abstract: A laser exposure system may include a plurality of laser devices configured to output laser beams with which an irradiated subject is irradiated, and at least one beam property adjustment unit disposed on optical paths of the laser beams outputted from the plurality of laser devices, and configured to allow beam properties of the laser beams to be approximately a same as each other.

Abstract: An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates while substantially conserving the pola

Abstract: The present invention discloses a filtering unit, comprising a plurality of filters, a fixing element and a drive controller. The fixing element is located on a body of the apparatus to be employed for fixedly supporting the plurality of filters. The plurality of filters are rotatably located on the fixing element. The drive controller is coupled to the plurality of filters to drive the corresponding filter rotating according to preset instructions to make light emitted by the lamp pass through the corresponding filter and to filter out light of a corresponding wavelength. Therefore, with the drive controller to drive the corresponding filter rotating according to preset instructions to make light emitted by the lamp pass through the corresponding filter and to filter out light of a corresponding wavelength, the replacement of the filters can be achieved without the manual operation.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

Abstract: A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.

Abstract: The invention concerns a method of and an arrangement for determining the heating condition of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. In an embodiment the mirror is an EUV mirror and a method according to the invention comprises the following steps: deflecting at least one input measuring beam on to the mirror; ascertaining at least one optical parameter of at least one output measuring beam produced from the input measuring beam after interaction with the mirror; and determining the heating condition of the mirror on the basis of the parameter.

Abstract: A method for aligning a mirror of a microlithographic projection exposure apparatus, according to one formulation, involves: recording a first partial interferogram between a wave reflected at a first mirror segment (101) and a reference wave reflected at a reference surface (110, 310, 510), recording a second partial interferogram between a wave reflected at a second mirror segment (102) and a reference wave reflected at the reference surface, determining a phase offset between the first partial interferogram and the second partial interferogram, and aligning the first mirror segment and the second mirror segment in relation to one another in accordance with the determined phase offset, so that the distance of the relevant mirror segments (101, 102) from a respective predetermined, hypothetical surface in the direction of the respective surface normal is less than ?/10 at each point on the mirror segments, where ? denotes the operating wavelength of the mirror.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: The present invention relates to a light baffle assembly including a base baffle member comprising a base wall portion positioned substantially parallel to a longitudinal axis, an upper baffle member comprising an upper wall portion coupled to an upper blade portion, the upper wall portion positioned substantially parallel to the longitudinal axis, and the upper blade portion positioned to extend inwards from the upper wall portion towards the longitudinal axis, and a resilient member configured to extend the upper baffle member away from the base baffle member.

Abstract: In an imaging section (imaging device), optical filters constituting an optical filter device are inserted and extracted, and an aperture varies an f-number in accordance with the insertion and the extraction of the optical filters. Thus, during the writing operation to the surface of the projection screen, namely during the interactive projector operation, entering of the light in the wavelength band other than that of the detected light DL is suppressed while capturing the detected light DL with the necessary light intensity, and during an alignment (a calibration), the axial chromatic aberration caused by the difference in wavelength band between the pattern image light GL as the image light and the detected light DL is suppressed to achieve an improvement in accuracy.

Abstract: A feeding device for feeding a developer includes a cleaning member, an accommodating portion, a feeding member, and a sheet member. A wall surface of the accommodating portion is positioned in a side where the sheet member is provided with respect to a rectilinear line connecting a rotation center of the image bearing member and a rotation center of the feeding member in a flat plane perpendicular to an axial direction of the image bearing member. The wall surface approaches the rectilinear line with an increasing level with respect to a vertical direction. The feeding member is provided vertically above a position where the cleaning member contacts the image bearing member. A rotational direction of the feeding member and a rotational direction of the image bearing member are the same.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical unit for projection lithography illuminates an illumination field, in which an object field of a downstream imaging optical unit and an object to be illuminated are arrangeable, with illumination light of an EUV light source. The illumination optical unit includes two facet mirrors for reflecting, overlaid guidance of partial beams of a beam of the EUV illumination light via exactly one facet of one of the two facet mirrors in each case. The facet mirror is a distance from a pupil plane of the illumination optical unit. Individual mirrors of the other facet mirror, which is arranged in, or in the vicinity of, a field plane that is conjugate to the object field, may be grouped into individual mirror groups which are tiltable together.

Abstract: A shutter unit that opens and closes an optical path of light for a lithography apparatus is provided. The shutter unit includes a motor which rotatably drives a shaft extended along a rotation axis of the motor, and a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion. The shutter unit further includes a partition plate arranged at a location between the shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.

Abstract: An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light modulator and exposing a wafer with light from the second spatial light modulator, accompanied by: controlling a conversion state of the second spatial light modulator including a plurality of second mirror elements; and controlling a conversion state of the first spatial light modulator including a plurality of first mirror elements to control intensity distribution of the illumination light on a predetermined plane between the first spatial light modulator and the second spatial light modulator.

Abstract: The present invention provides an exposure apparatus including a rotation shutter, and a control unit configured to control a rotational speed of the rotation shutter so as to match an exposure amount on a substrate with a target exposure amount in exposure processing for a shot region, based on first information indicating a relationship between a rotational speed of the rotation shutter and an exposure amount on the substrate when rotating the rotation shutter at the rotational speed without stopping rotation of the rotation shutter so as to make a shift from a first state in which the rotation shutter shields a light to a second state in which the rotation shutter passes the light and then back to the first state, wherein the control unit updates the first information based on second information concerning a change in the illuminance of light.

Abstract: Disclosed herein is a method for manufacturing a patterned object and a light irradiation apparatus that make it possible to form a pattern that accurately follows a mask pattern with higher accuracy in a patterning process of irradiating a pattern forming substrate with vacuum ultra violet light. The light irradiation apparatus includes a mask stage arranged apart from the pattern forming substrate and configured to hold a mask on which a prescribed pattern is formed, and a vacuum ultra violet light source unit configured to irradiate the pattern forming substrate with vacuum ultra violet light through the mask. A space between the mask and the pattern forming substrate is set to be an atmosphere containing oxygen. The vacuum ultra violet light source unit irradiates light, as the vacuum ultra violet light, having a continuous spectrum in a range where a wavelength ranges from 180 nm to 200 nm.

Abstract: An electromagnetic transducer, such as an audio speaker, having a voicecoil disposed within a magnetic gap between a pair of magnetic arrays, e.g., Halbach arrays, is disclosed. In an example, the paired Halbach arrays include vertically-poled magnets to direct magnetic flux across the magnetic gap orthogonal to electrical current carried by a planar winding of the voicecoil. Accordingly, a Lorentz force may drive an oscillational mass, e.g., a speaker diaphragm, in a longitudinal direction orthogonal to the magnetic flux and the electrical current to generate vibration or sound. Other embodiments are also described and claimed.

Abstract: A display device comprising a radiation source and a glazing unit is disclosed. The glazing unit comprises a glazing function substrate and a coating that prevents reflection of incident monochromatic laser radiation emitted by the radiation source, which scans a portion of the gazing unit. The coating comprises a stack of two layers, namely, a first layer made of a material based on zinc oxide, tin oxide, silicon nitride, zinc tin oxide or zirconium silicon oxide; and a second layer made of a material based on a silicon oxide, in which the respective geometric thicknesses Ep1 and Ep2 of the layers are substantially equal to: Ep1=26+0.07(?)?0.007(?)2??(1) Ep2=83?0.1(?)+0.01(?)2??(2), in which ? is the mean angle of orientation of incident monochromatic laser radiation to the normal to the glazing unit in the scanned portion thereof.

Abstract: An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one beam and less than a depth of focus in the pupil plane of the objective optical system.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An image forming apparatus includes: a photoconductor; an electric charging device charging the photoconductor; an exposure device exposing a portion of the photoconductor charged by the electric charging device to light based on image information, to form an electrostatic latent image; a first charge eliminating device emitting light to the photoconductor so as to eliminate an electric charge on a surface of the photoconductor; a second charge eliminating device emitting light to the photoconductor so as to eliminate an electric charge on a surface of the photoconductor, a wavelength of the light emitted by the first charge eliminating device being different from a wavelength of the light emitted by the second charge eliminating device; and a controller selectively operating the first and second charge eliminating devices depending on an image content of the electrostatic latent image in an image forming process.

Abstract: An EUV light source for an illumination device of a microlithographic proj ection exposure apparatus, includes an electron source for generating an electron beam, an accelerator unit for accelerating the electron beam, and an undulator arrangement for generating EUV light by deflecting the electron beam. The undulator arrangement includes a first undulator for generating EUV light having a first polarization state and at least one second undulator for generating EUV light having a second polarization state different than the first polarization state. The second undulator is downstream of the first undulator along the direction of propagation of the electron beam. The undulator arrangement is configured so that it has a first operating mode, in which the first undulator is in saturation with regard to the generation of EUV light, and at least one second operating mode, in which the first undulator is not in saturation with regard to the generation of EUV light.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a second reflection surface, wherein the first reflection surface and the second reflection surface are arranged at an angle of 0°±10° or at an angle of 90°±10° relative to one another, wherein light incident on the first reflection surface during the operation of the optical system forms an angle of 45°±5° with the first reflection surface, and wherein the polarization-influencing arrangement is rotatable about a rotation axis running parallel to the light propagation direction of light incident on the first reflection surface during the operation of the optical system.

Abstract: A framing system for shaping light beam comprises a frame support having a number of shutter blades surrounding said light beam, and a number of actuators that move said shutter blades in and out of said light beam. The shutter blades form a merged pile, where part of a first shutter blade is placed over a part of a second shutter blade. A first actuator rotates at least one of said shutter blades in relation to a first rotational point and a second actuator moves the first rotational point in relation to said light beam. A method of shaping a light beam is provided, and involves rotating a shutter blade around a first rotation point using a first actuator, and moving the first rotation point in relation to the light beam using a second actuator.

Abstract: A photolithography system includes an optical system, an actuation apparatus, and a control module. The optical system includes an optical source that produces a pulsed light beam traveling along a beam path; a plurality of optical components positioned between the optical source and a photolithography exposure apparatus, at least some of the plurality of optical components configured to receive the pulsed light beam and direct the pulsed light beam to the photolithography exposure apparatus; and an optical element positioned to interact with the pulsed light beam. The actuation apparatus is coupled to the optical element. The actuation apparatus is configured to adjust a physical property of the optical element based on a control signal from the control module to thereby adjust a polarization of the pulsed light beam.

Abstract: A projection exposure apparatus for microlithography, in particular an EUV projection exposure apparatus, having a beam path along which propagates electromagnetic radiation with which the projection exposure apparatus is operated, and having at least one filter (55) arranged in the beam path, wherein the projection exposure apparatus furthermore comprises at least one sensor device for monitoring the filter, wherein at least one blocking element (60) is provided which is movable between a standby position and a bather position, and wherein the movement of the blocking element can be effected at least in a manner dependent on a signal of the sensor device. An associated method for operating an apparatus of this type is also disclosed.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.

Abstract: The method includes performing a photolithography process which includes using a photomask to pattern a radiation beam. The photolithography process also includes exposing a target substrate to the patterned radiation beam. During the exposing of the target surface, there is a real-time monitoring for particles incident or approximate the photomask.

Abstract: Opto-electronic modules include masking features that can help reduce the visibility of interior components or enhance the outer appearance of the module or of an appliance incorporating the module as a component. The modules can include an optical diode or saturable optical absorber.

Abstract: A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

Abstract: A scanning illuminating device includes an emission center from which radiation is emitted in an illuminating sector. A cylindrical ring is centered on the source and is rotatably movable about a first axis. The ring includes a plurality of slits regularly distributed about its axis of rotation and having the same angular amplitude ?. A cylinder portion is centered on the source and is rotatably movable about a second axis crossing the first axis at the center and forming a nonzero angle therewith. The cylinder portion includes a slit having an angular amplitude ?. A first device control of the rotation of the ring, defining an elementary angular step as such that an integer N1 other than 1 meets the condition ?=N1·??. A second device controls the rotation of the ring portion defining an angular step ?? such that an integer N2 other than 1 meets the condition ?=N2·??.

Abstract: An illumination system having a refractive optical element that compensates for dependence in irradiance of images of objects captured by a photosensor is provided. The refractive optical element may structure the light such that similar objects in the same spherical surface in the field of view of the camera have the same irradiance on the camera photosensor. The illumination system may have an image sensor, a light source, and a refractive optical element. The image sensor has a photosensor that captures images of objects in a field of view. The irradiance of images of objects having a given exitance that are captured by the photosensor may depend on angular displacement from an optical axis of the image sensor. The refractive optical structures light from the light source to illuminate the field of view to compensate for the dependence of irradiance on angular displacement from the optical axis.

Abstract: A scanning-type projection device is provided with an emitted-light-intensity control unit for controlling the light intensity of a laser light emitted by a laser light source unit, a polarization direction control unit for controlling the polarization direction of the laser light, a scanning unit for scanning the laser light and generating a display image, and a divergence unit on which the laser light scanned by the scanning unit is incident. The emitted-light-intensity control unit has a polarization control element for controlling the polarization state of the laser light, and a polarizing plate on which the laser light emitted from the polarization control element is incident, and the polarization direction control unit adjusts the polarization direction of display light incident on a projection surface by controlling the polarization direction of the laser light emitted by the emitted-light-intensity control unit.

Abstract: An illumination optical system can form a pupil intensity distribution with a desired beam profile. The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a spatial light modulator which has a plurality of optical elements arrayed on a predetermined surface and individually controlled and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system; a divergence angle providing member which is arranged in a conjugate space including a surface optically conjugate with the predetermined surface and which provides a divergence angle to an incident beam and emits the beam; and a polarizing member which is arranged at a position in the vicinity of the predetermined surface or in the conjugate space and which changes a polarization state of a partial beam of a propagating beam propagating in an optical path.

Abstract: Projection objectives, such as projection objectives of lithography projection exposure apparatuses, as well as related systems, components and methods, such as methods of revising and/or repairing such objectives, are disclosed.

Abstract: In an image forming apparatus, a photoconductor cartridge including a photoconductor is removably installed in a housing, a transfer unit configured to transfer a developer image onto a sheet in a transfer position is disposed in contact with the photoconductor, a developer cartridge is removably installed in the housing, and a fixing unit is configured to fix a developer image on the sheet in a fixing position. The housing has a first opening provided behind the transfer unit opposite to the photoconductor, and a second opening provided separate from the first opening. The photoconductor cartridge can be removed from and installed into the housing through the to first opening. The developer cartridge can be removed from and installed into the housing through the second opening. The photoconductor cartridge includes a chute that extends between the transfer position and the fixing unit to guide the sheet toward the fixing unit.

Abstract: A focus monitor structure on a reticle includes a lithographic feature region, a horizontal grating region including a horizontal grating located on one side of the lithographic feature region, and a vertical grating region including a vertical grating located on the opposite side of the lithographic feature region. A polarized illumination beam causes a printed image of the lithographic feature region to shift either toward the direction of the horizontal grating region or toward the direction of the vertical grating region in a manner that depends on the sign of the focus offset of the photoresist layer relative to the lens of an exposure tool. The magnitude and sign of the focus offset can be monitored to provide a real-time feedback on the focus offset of the exposure tool by measuring the shift of the printed image of the lithographic feature region.