Abstract: An optical diffraction component has a periodic grating structure profile. The diffraction structure levels are arranged so that a wavelength range around two different target wavelengths diffracted by the grating structure profile has radiation components with three different phases that interfere destructively with one another. Diffraction structure levels predefine a topography of a grating period of the grating structure profile that is repeated regularly along a period running direction. These include a neutral diffraction structure level, a positive diffraction structure level raised relative thereto, and a negative diffraction structure level lowered relative thereto. The neutral diffraction structure level has an extent along the period running direction which is less than 50% of the extent of the grating period. A difference between the two target wavelengths is less than 50%.

Abstract: Embodiments discussed herein refer to LiDAR systems that use diode lasers to generate a high-repetition rate and multi-mode light pulse that is input to a fiber optic cable that transmits the light pulse to a scanning system.

Abstract: A halftone raster image, suitable for rendering a continuous-tone image, which comprises a plurality of regularly tiled spiral dots. Said spiral dots comprise (i) image pixels arranged as a first arc (200) or as a plurality of arcs which together represent a first spiral (100), and (ii) non-image pixels arranged as a second arc (201) or as a plurality of arcs which together represent a second spiral (101), wherein neighbour halftone dots from said plurality of regularly tiled halftone dots represent a double spiral or triple spiral.

Abstract: A light projection system for projecting full-resolution, high quality images into different directions. The system includes a light source configured to provide a homogenous output beam of light and an illumination shaping optic elements configured with at least one of a predetermined cone angle, numerical aperture, and F-number. The system also includes a spatially-dependent, angular light modulator (ALM) with a plurality of pixels, each having an ON state, an OFF state, one input pupil, and N diffraction order pupils. The ALM is positioned such that the output beam is incident on the plurality of pixels. The at least one of the predetermined cone angle, numerical aperture, and F-number of the illumination shaping optic elements prevents contaminating light from entering an incorrect pupil. The system additionally includes a processor coupled to the ALM to provide discrete diffraction-based beam steering, whereby the ALM will project into one diffraction order at one time.

Abstract: A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is determined by an optical path difference between their respective light beams. This phase shift may be preselected to be any value by generating a corresponding wavelength at the light source based on the optical path difference. To generate a specific wavelength corresponding to the desired phase shift, the light source may produce multiple light components that have wavelengths that bracket the wavelength of the selected phase shift. The intensities of these components may then be controlled individually to produce an effect that approximates the selected phase shift on the substrate.

Abstract: A method includes: receiving a design layout comprising a feature extending in a peripheral region and a central region of the design layout; determining compensation values associated with a pellicle assembly and the peripheral region according to an exposure distribution in an exposure field of a workpiece; and adjusting the design layout according to the compensation values. The modifying of the shape of the feature according to the compensation values includes: partitioning the peripheral region into compensation zones, wherein the feature includes first portions disposed within the respective compensation zones and a second portion disposed within the central region; and reducing line widths of the first portions of the feature according to the compensation values associated with the respective compensation zones while keep the second portion of the feature uncompensated.

Abstract: A lens 1 has unevenness within an optical effective diameter D of an optical surface 2, an arithmetic mean roughness Ra within the optical effective diameter D of the optical surface 2 is 20 nm or more and 50 nm or less, and an average value of widths W of protrusion portions 3 of the unevenness on an average line C2 of a roughness curve C1 of the optical surface 2 is 1/200 or more and 1/50 or less of the optical effective diameter D of the optical surface 2. The lens 1 is suitably used as a lens that composes a zoom lens or an imaging lens.

Abstract: A device for generative manufacturing of an object made up of a plurality of cross sections. The device includes an application unit including an application surface for applying a sinterable material as a reproduction of one of the cross sections of the object on the application surface, a substrate for accommodating the reproduction from the first application surface, and a curing unit for curing the reproduction made of the sinterable material on the substrate, the curing unit being situated spatially separated from the application unit.

Abstract: A photo mask includes a plurality of device features, a first assist feature, and a second assist feature. The device features are in a patterning region of a device region. The first assist feature are in the patterning region and adjacent to the device features. The first assist feature is for correcting an optical proximity effect in a photolithography process. The second assist feature is in a non-patterning region of the device region. The second assist feature is a sub-resolution correction feature, and a first distance between the second assist feature and one of the device features closest to the second assist feature is greater than a second distance between adjacent two of the device features.

Abstract: A display device and method of manufacturing the same, in which the display device includes: a first substrate; a transflective layer disposed on a surface of the first substrate; a wavelength conversion layer disposed on the transflective layer; a capping layer disposed on the wavelength conversion layer; a first polarizing layer disposed on the capping layer; and a second polarizing layer disposed on the other surface of the first substrate. The first polarizing layer and the second polarizing layer have different polarization directions.

Abstract: An exposure apparatus that exposes a substrate to light by using an original in which a pattern is formed includes an illumination optical system arranged to guide illumination light to the original, the illumination light including first illumination light with a first wavelength and second illumination light with a second wavelength different from the first wavelength, and a projection optical system arranged to form a pattern image of the original by using the illumination light at a plurality of positions in an optical axis direction. The illumination optical system is configured to adjust a position deviation in a direction perpendicular to the optical axis direction between a pattern image formed by the first illumination light and a pattern image formed by the second illumination light by changing an incident angle of the illumination light entering the original.

Abstract: Optical image sensor systems and process for simultaneously tracking multiple stationary or moving objects to provide attitude and geolocation information are provided. The objects are detected and tracked within subframe areas defined within a field of view of the image sensor system. Multiple objects within the field of view can be detected and tracked using parallel processing streams. Processing subframe areas can include applying precomputed detector data to image data. Image data within each subframe area obtained from a series of image frames is aggregated to enable the centroid of an object within a particular subframe to be located. Information from an inertial measurement unit can be applied to maintain a stationary object, such as a star, at the center of a respective subframe. Ephemeris data can be applied in combination with the information from the IMU to track a resident space object traversing a known trajectory.

Abstract: Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair.

Abstract: The invention relates firstly to a method for determining a mechanical deviation on a displacement path of an optical zoom lens, in particular on a displacement path of an optical zoom lens of a microscope. The optical zoom lens is arranged in a beam path between an object to be recorded and an electronic image sensor. In a first method step, an optical marker is introduced into the beam path at a position of the beam path located between the object to be recorded and the optical zoom lens, such that the optical marker passes the optical zoom lens and then is depicted on an image in which a position of the optical marker is detected and determined. This is compared with a reference position of the optical marker in order to determine the mechanical deviation on the displacement path of the optical zoom lens. The invention further relates to a method for correction of a displacement error of an image recorded by an electronic image sensor and to an electronic image recording device.

Abstract: The invention relates to a filter interchange apparatus for an optical observation instrument having two beam paths, in particular for a stereoscopic observation instrument, in particular for a stereo video endoscope, a stereo exoscope or a stereo surgical microscope, wherein the filter interchange apparatus comprises a first filter wheel, a second filter wheel and a third filter wheel, wherein the filter wheels are arranged in succession along a common axle and are rotatable about the common axle and relative to one another. Each filter wheel comprises at least one filter and at least one free optical passage such that a filter or a free optical passage of each filter wheel is introducible into each of the two beam paths. The second filter wheel is drivable and the first filter wheel is coupled to the second filter wheel via a first entrainment element and the third filter wheel is coupled to the second filter wheel via a second entrainment element.

Abstract: A method for removing particles from a mask system for a projection exposure apparatus, including the following method steps: detecting the particle in the mask system, providing laser radiation, and removing the particle by irradiating the particle with laser radiation. The wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.

Abstract: A method for a lithography exposing process includes placing a reticle over a reticle stage, generating a light beam by irradiating a droplet by a laser, projecting a first portion of the light beam over a plurality of light permeable protrusions formed on a reflection layer and directing, by the protrusions and the reflection layer, the first portion of the light beam to the reticle.

Abstract: A multispectral light assembly includes a multispectral light source configured to generate a plurality of different wavelengths of light, a light pipe positioned in front of the multispectral light source and configured to provide color mixing for two or more of the plurality of different wavelengths, a diffusive surface on the light pipe exit surface, and a projection lens positioned in front of the diffusive surface. A processor device is in communication with the multispectral light assemblies to control activation of the multispectral light source. A machine vision system includes an illumination assembly with a plurality of multispectral light assemblies, an optics assembly, a sensor assembly, and a processor device in communication with the optics assembly, the sensor assembly, and the illumination assembly.

Abstract: A collector mirror for an extreme ultraviolet (EUV) light generator includes a first mirror in a vessel, the vessel being configured to receive a material and a laser beam for generating the EUV light, a second mirror surrounding the first mirror, and a detachable third mirror between the first mirror and the second mirror, the third mirror having an inner diameter that is not smaller than an outer diameter of the first mirror, and an outer diameter that is not larger than an inner diameter of the second mirror.

Abstract: An additive manufacturing system including a two-dimensional energy patterning system for imaging a powder bed is disclosed. Improved structure formation, part creation and manipulation, use of multiple additive manufacturing systems, and high throughput manufacturing methods suitable for automated or semi-automated factories are also disclosed.

Abstract: A digital exposure apparatus includes a lens array, the lens array at least including a first lens unit and a second lens unit, a light transposition assembly arranged on an exit light path of the second lens unit, and the light transposition assembly being used for controlling a light exiting from the second lens unit to be transposed with respect to an exposure direction of the digital exposure apparatus. When the digital exposure apparatus is used for exposure, a light passing through the first lens unit and a light penetrating through the second lens unit are needed to expose the same position for multiple times.

Abstract: A method of forming a planarization layer on a substrate is disclosed. The method can include aligning a superstrate with the substrate, where aligning the superstrate with the substrate comprises tuning a diffusing element to a first operational state, dispensing a formable material over the substrate, contacting the formable material over the substrate with the superstrate, tuning the diffusing element to a second operational state, where the first operational state is different from the second operational state, and curing the formable material over the substrate to form a layer over the substrate while the superstrate is contacting the formable material, where curing the formable material can include directing a set of actinic radiation beams to enter the diffusing element at an entering state and exit the diffusing element at an exiting state, and where the entering state is different from the exiting state.

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.

Abstract: Embodiments disclosed herein include lithographic patterning systems for non-orthogonal patterning and devices formed with such patterning. In an embodiment, a lithographic patterning system comprises an actinic radiation source, where the actinic radiation source is configured to propagate light along an optical axis. In an embodiment, the lithographic patterning system further comprises a mask mount, where the mask mount is configurable to orient a surface of a mask at a first angle with respect to the optical axis. In an embodiment, the lithographic patterning system further comprises a lens module, and a substrate mount, where the substrate mount is configurable to orient a surface of a substrate at a second angle with respect to the optical axis.

Abstract: A distance measuring device includes a light emitting unit that outputs a measurement light, a first polarization state control unit that controls a polarization state of the measurement light output from the light emitting unit, a second polarization state control unit that controls the polarization state of the measurement light of which a polarization state is controlled by the first polarization state control unit, and an optical path switching element that selects an emission direction of the measurement light of which a polarization state is controlled by the second polarization state control unit, in which the second polarization state control unit controls the polarization state of the measurement light so that the measurement lights are emitted from the optical path switching element in a plurality of the emission directions, and the optical path switching element receives a reflected light obtained by reflecting the emitted measurement light by an object.

Abstract: A method includes: receiving a photomask; patterning a wafer by directing a first radiation beam to the wafer through the photomask at a first tilt angle; and inspecting the photomask. The inspecting includes: directing a second radiation beam to the photomask at a second tilt angle greater than the first tilt angle; receiving a third radiation beam reflected from the photomask; and generating an image of the photomask according to the third radiation beam.

Abstract: An ion implanter includes an implantation processing chamber in which an implantation process of irradiating a wafer with an ion beam is performed, a first Faraday cup disposed inside the implantation processing chamber to measure a beam current of the ion beam during a preparation process performed before the implantation process, a second Faraday cup disposed inside the implantation processing chamber to measure a beam current of the ion beam during a calibration process for calibrating a beam current measurement value of the first Faraday cup, and a blockade member for blocking the ion beam directed toward the second Faraday cup, the blockade member being configured so that the ion beam is not incident into the second Faraday cup during the implantation process and the preparation process, and the ion beam is incident into the second Faraday cup during the calibration process.

Abstract: Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.

Abstract: A nanofabrication method comprises receiving information regarding a distortion within an imprint system, generating a first drop pattern of formable material based on the received information, dispensing a first plurality of drops onto a substrate according to the first drop pattern, contacting the dispensed first plurality of drops with a patternless superstrate to form a first layer of formable material, forming a first cured layer by curing the first layer of formable material while the superstrate is contacting the first layer of formable material, separating the superstrate from the first cured layer, depositing an etch resistant layer on the first cured layer, generating a second drop pattern of formable material, dispensing a second plurality of drops onto the etch resistant layer according to the second drop pattern, and contacting the dispensed second plurality of drops with a patterned template to form a second layer of formable material.

Abstract: A method of manufacturing a semiconductor device by using an exposure apparatus having a reticle stage and a projection optical system includes a first period in which substrates are exposed by using a first reticle arranged on the reticle stage, a second period in which substrates are exposed by using a second reticle arranged on the reticle stage, and a third period which is between the first and second periods. The method includes changing, in at least part of the third period, the first reticle arranged on the reticle stage to the second reticle, and performing control, in the first and second periods, to adjust temperature distribution of an optical element of the projection optical system so as to reduce change in aberration of the projection optical system. The third period is shorter than the first period.

Abstract: The present invention provides a measurement apparatus that measures a position of an object which includes a first mark and a second mark, comprising: an image capturing unit configured to capture the first mark and the second mark in a state in which the first mark and the second mark are contained in a field of view; and a polarizing element configured to generate different polarization directions from each other in light from the first mark and in light from the second mark which are incident on the image capturing unit.

Abstract: A color chart includes a first portion and a second portion. The first portion includes no patch. The second portion includes a plurality of patches having different densities or luminances. The plurality of patches includes a reference patch indicating a color having a reference density or luminance. The reference patch is adjacent to the first portion. The plurality of patches is located in order of increasing density from the density of the color indicated by the reference patch, decreasing density from the density of the color indicated by the reference patch, increasing luminance from the luminance of the color indicated by the reference patch, or decreasing luminance from the luminance of the color indicated by the reference patch.

Abstract: A camera mount is disclosed in the present invention. The camera mount includes a gimbal fixing unit, a rotating unit, a camera base fixing unit, a camera fixing screw and a tightening screw. The gimbal fixing unit includes a fixing portion and a rotating portion, and the rotating unit includes a rotating round frame and a connecting structure. The design of the gimbal fixing unit and the rotating unit allows a camera to rotate the composition angle relative to the gimbal, which is convenient for changing the lens without compromising the line of sight of the lens, which solves the problems existing in the use of the gimbal.

Abstract: A pupil stop serves for use in an illumination optical unit of a metrology system for determining, as a result of illumination and imaging under illumination and imaging conditions corresponding to those of an optical production system, an aerial image of an object to be measured. The pupil stop has two pole passage openings for specifying a respective pole of an illumination of the illumination optical unit specified by the pupil stop. In each case at least one stop web passes through the respective pole passage opening and consequently divides the pole passage opening into a plurality of partial pole openings. This yields a pupil stop with which an accuracy of a convergence of the illumination and imaging conditions of the optical production system to the illumination and imaging conditions of the optical measurement system can be improved.

Abstract: A reading device includes a visible light source to irradiate a subject with light having a visible wavelength; an invisible light source to irradiate the subject with light having an invisible wavelength; first and second image sensors to receive reflected light from the subject being irradiated with the light having the visible wavelength and the light having the invisible wavelength, and circuitry. The first image sensor generates visible image data containing a first invisible component, and the second image sensor generates invisible image data of a second invisible component. The circuitry removes the first invisible component contained in the visible image data using the invisible image data. The circuitry multiplies the invisible image data with the correction coefficient that absorbs an individual variation in removal of the first invisible component, and the correction coefficient is generated based on the visible image data and the invisible image.

Abstract: A developing device includes a regulating member fixed to a frame at one end thereof and including a contact portion which contacts a developer carrying member. The contact portion includes a first region positioned upstream of a reference position and a second region positioned downstream of the reference position in a rotational direction of the developer carrying member. A length of the second region is longer than a length of the first region in a position corresponding to a contact nip with respect to a direction from a fixed end of the regulating member toward the other end as a free end of the regulating member, and the contact portion has a surface roughness smaller in the first region than in the second region, with the surface roughness in the second region being 20% or less of an average particle size of toner particles contained in a developer.

Abstract: An imprint apparatus includes first illumination optical system for emit light to cure imprint material between mold and substrate, second illumination optical system having light adjuster for illuminating the imprint material in part of region between the mold and the substrate, combiner located on pupil plane common to the first and second illumination optical systems and configured to combine the light from the first illumination optical system and the light from the second illumination optical system The combiner combines the light from the first illumination optical system and the light from the second illumination optical system by a mirror located in region surrounded by illumination region of the first illumination optical system including annular light intensity distribution on the pupil plane reflecting the light from the second illumination optical system.

Abstract: A method for eliminating a ring effect is provided. The method includes: capturing, by a camera, a standard ring image generated by light illuminating a standard Fresnel lens; establishing a compensation lookup table according to the standard ring image and obtaining a standard ring center point; capturing, by the camera, a ring image generated by the light illuminating a Fresnel lens to be tested; obtaining a ring center point according to the ring image; obtaining a conversion relationship between the ring center point and the standard ring center point; and performing a compensation procedure on the ring image according to the compensation lookup table and the conversion relationship to eliminate the ring effect in the ring image.

Abstract: An extreme ultraviolet light condensation mirror may include a reflective surface formed in a concave shape and configured to diffract a laser beam incident from a first focal point and having a wavelength longer than a wavelength of extreme ultraviolet light. The reflective surface may be provided with a plurality of first reflection portions, a plurality of second reflection portions, a plurality of first stepped portions, and a plurality of second stepped portions. The first and second stepped portions may have such heights that the laser beam obtains phases opposite to each other through reflection at the first and second reflection portions adjacent to each other. The height of each first stepped portion may be equal to or higher than the height of each second stepped portion. The height of at least one of the first stepped portions may be higher than the height of each second stepped portion.

Abstract: This disclosure provides systems, methods, and apparatus related to light detection and ranging. In one aspect, a method comprises providing an apparatus. The apparatus comprises a LiDAR unit and a LiDAR enclosure. The LiDAR enclosure comprises a four-sided container having a square or rectangular cross-section with a first open end and a second open end comprising two opposite ends of the four-sided container. The LiDAR unit is attached to a mounting area inside the four-sided container. A reflective material is disposed on an interior of a second side and a third side of the four-sided container. Laser light is generated with the LiDAR unit. The laser light that has interacted with environment surrounding the LiDAR enclosure and that has been reflected back to the LiDAR unit is detected. The detected laser light is processed to construct an image of the environment surrounding the LiDAR enclosure.

Abstract: A printer may include a main body and a development cartridge attachable to and detachable from the main body. The development cartridge may comprise a developing portion in which a photoconductive drum and a developing roller are provided, a waste toner container to receive waste toner removed from the photoconductive drum, a toner container connected to the developing portion and to receive toner, and a toner refilling portion connected to the toner container and to refill toner through the toner refilling portion into the toner container. The printer may include a communicating portion provided in the main body to be connected to the toner refilling portion to provide an access the toner refilling portion from outside of the main body when the development cartridge is attached to the main body.

Abstract: An overlay metrology tool may include an illumination source, illumination optics to illuminate an overlay target having periodic features with one or more illumination beams, collection optics to direct diffracted light from the periodic features of the overlay target to a detector, an adjustable pupil mask located at a pupil plane, and a controller. The adjustable pupil mask may include one or more individually-addressable control zones distributed across the one or more portions of the pupil plane to provide an adjustable pupil transmissivity distribution. The controller may direct the adjustable pupil mask to provide a selected pupil transmissivity distribution corresponding to a selected overlay metrology recipe, where the selected pupil transmissivity distribution corresponds to a selected configuration of the one or more control zones providing transmission of a selected set of diffraction orders from the target to the detector.

Abstract: An illumination optical system for projection lithography includes a pupil facet mirror having pupil facets. For at least some of the pupil facets which are designed as selectively reflecting pupil facets, the selectively reflecting pupil facet has a reflective coating for the illumination light, wherein a first coating area on a first part of the selectively reflecting pupil facet has a first reflectivity, a second coating area on a second part of the selectively reflecting pupil facet has a second reflectivity, the first coating area is different from the second coating area, and the first reflectivity is different from the second reflectivity. In combination or as an alternative, for at least some of the pupil facets which are designed as broadbands reflecting pupil facets, the broadband reflecting facets have a broadband reflective coating for the illumination light.

Abstract: An image forming apparatus, having a housing, a drawer movable between an inner position and an outer position, and a cartridge attachable to the drawer, is provided. The cartridge includes a photosensitive drum rotatable about an axis extending in a first direction and a drum cover movable between a first position and a second position. The drawer includes a guide configured to guide the cartridge in a second direction intersecting with the first direction when the cartridge is being attached to the drawer and a contacting portion configured to contact the drum cover and move the drum cover from the first position to the second position when the cartridge is being guided by the guide. The housing includes a stopper configured to stop the cartridge from separating from the guide in a third direction intersecting with the first direction and with the second direction.

Abstract: A system for projecting an image of an object on an image plane can include a beam splitter that outputs a first image beam and a second image beam in response to an input image beam, wherein the input image beam comprises an image of an object. The system can also include a Fourier transform lens to transform the second image beam into a Fourier image beam. The system can further include a bucket detector that is aligned in a light path of the Fourier image beam. The bucket detector asserts a control signal in response to detecting a threshold number of photons with an elevated probability of having a high spatial frequency within a timeframe and to de-assert the control signal in response to detecting less than the threshold number of photons with an elevated probability of having a high spatial frequency within the timeframe.

Abstract: A system for heating an optical component of a lithographic apparatus, the system comprising a heating radiation source, the heating radiation source being configured to emit heating radiation for heating of the optical component, wherein the system is configured to direct the heating radiation emitted by the heating radiation source onto the optical component, a portion of the heating radiation being absorbed by the optical component and another portion of the heating radiation being reflected by optical component, and wherein the system is configured to vary or change a property of the heating radiation emitted by the heating radiation source such that the other portion of the heating radiation that is reflected by the optical component is constant during operation of the lithographic apparatus.

Abstract: A method for imaging a sample, wherein the sample changes a polarization state of light as a function of position, wherein the method includes changing a polarization state of a purely polarized light of an incident light striking a micro-retarder array, thereby inducing a changed polarization state of the polarization state. The micro-retarder array is placed in a rear conjugate focal plane of a microscope. The method additionally includes projecting the changed polarization state of the polarization state into an object plane of the microscope containing the sample.

Abstract: A method including: obtaining a characteristic of a portion of a design layout; determining a characteristic of M3D of a patterning device including or forming the portion; and training, by a computer, a neural network using training data including a sample whose feature vector includes the characteristic of the portion and whose supervisory signal includes the characteristic of the M3D. Also disclosed is a method including: obtaining a characteristic of a portion of a design layout; obtaining a characteristic of a lithographic process that uses a patterning device including or forming the portion; determining a characteristic of a result of the lithographic process; training, by a computer, a neural network using training data including a sample whose feature vector includes the characteristic of the portion and the characteristic of the lithographic process, and whose supervisory signal includes the characteristic of the result.

Abstract: An illumination optical system is used with a reflective imaging optical system configured to form an image of a pattern arranged on a first plane onto a second plane, and is configured to illuminate an illumination area on the first plane with a light from a light source. The illumination optical system includes one or more reflecting mirrors configured to reflect the light from the light source to the first plane such that the reflected light reaches the first plane after crossing an optical path of a light which travels in the reflective imaging optical system.

Abstract: A polarization filter includes a multilayer structure including a first plurality of elements and a second plurality of elements alternating between each other. The first plurality of elements and the second plurality of elements have different thicknesses, and the multilayer structure is configured to interact with unpolarized light incident on the multilayer structure and separate transverse electric (TE) waves and transverse magnetic (TM) waves of the unpolarized light.