Abstract: An infrared lamp device for a mobility vehicle and an infrared lamp system for a mobility vehicle may display whether an infrared sensor, for sensing peripheral environments during night traveling so as to secure traveling stability, is operating, and use infrared rays not only to sense peripheral environments, but also to deliver messages, thereby securing traveling stability and convenience.

Abstract: An adapter includes a hollow adapter body, a rotating ring connected to a second side of the adapter body, and at least three sliding connecting pieces. The rotating ring includes at least two rotating ring guide grooves corresponding to each sliding connecting piece. The adapter body includes at least two adapter body guide grooves corresponding to each sliding connecting piece. Each sliding connecting piece includes a connecting portion. When each sliding connecting piece moves along the corresponding at least two rotating ring guide grooves and the corresponding at least two adapter body guide grooves, configuration of the rotating ring guide grooves and the adapter body guide grooves make connecting portions move away from or close to the rotating ring in a direction perpendicular to the axial direction of the rotating ring and form a circumferential distribution, so as to match and connect with camera lenses having different apertures.

Abstract: An optical system includes a light source, a lens, and a light effect ring. The lens has first and second surfaces and receives a first light beam from the light source at the first surface and emits a second light beam from the second surface. The light effect ring includes a first plurality of light emitters emitting second light beams that obliquely illuminate the first surface of the lens and a second plurality of emitters that emit third light beams through the lens. The light effect ring may include a plurality of segments that move into and out of the first light beam, where each segment includes a first subset of the first plurality of light emitters and a second subset of the second plurality of emitters.

Abstract: A line narrowing module includes an enclosure, a prism which is disposed in an internal space of the enclosure and through which light passes, a mounter which is disposed in the internal space and on which the prism is mounted, a fixing unit which is disposed in the internal space and fixes the prism to the mounter, and a light blocking member. The light blocking member is disposed in the internal space and blocks scattered light in the internal space, the scattered light produced from the light and traveling to the fixing unit.

Abstract: A process cartridge mountable on an image forming apparatus includes a photoconductive drum, a developing unit including a developing roller and a toner storage unit. The toner storage includes a first toner storage chamber, a second toner storage chamber located above the first toner storage chamber, a first toner conveying member located in the first toner storage chamber and configured to convey the toner in the first toner storage chamber upward toward the second toner storage chamber in an area wider than the toner discharge outlet in the first direction, and a second toner conveying member located in the second toner storage chamber and configured to convey, in the first direction, the toner in the second toner storage chamber toward the toner discharge outlet.

Abstract: Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.

Abstract: An optical measuring system is used to reproduce a target wavefront of an imaging optical production system when an object is illuminated with illumination light. The optical measuring system comprises an object holder displaceable by actuator means and at least one optical component displaceable by actuator means. Within the scope of the target wavefront reproduction, a starting actuator position set (X0), in which each actuator is assigned a starting actuator position, is initially specified. An expected design wavefront (WD) which approximates the target wavefront and which the optical measuring system produces as a set wavefront is determined. A coarse measurement of a starting wavefront (W0) which the optical measuring system produces as actual wavefront after actually setting the starting actuator position set (X0) is carried out.

Abstract: A UV irradiation apparatus for coating systems that coat rigid or film-like workpieces, in particular furniture parts, having a transport apparatus for transporting workpieces provided with coating material from an inlet to an outlet through the UV irradiation apparatus, a UV light source arranged above the transport apparatus that irradiates the coated workpieces with UV light in an irradiation region between the inlet and the outlet, and a reflector or cover which shields the UV light source upward. A housing covers the irradiation region and the UV light source, which generally extends above the transport apparatus. A sensor of a measuring apparatus for direct or indirect automated measurement of radiant flux of the UV light source is arranged in the housing, and the sensor is in particular fitted fixed or movably on the housing or a holder. A method for quality assurance using this UV irradiation apparatus is also provided.

Abstract: A UV irradiation apparatus for coating systems that coat rigid or film-like workpieces, in particular furniture parts, having a transport apparatus for transporting workpieces provided with coating material from an inlet to an outlet through the UV irradiation apparatus, a UV light source arranged above the transport apparatus that irradiates the coated workpieces with UV light in an irradiation region between the inlet and the outlet, and a reflector or cover which shields the UV light source upward. A housing covers the irradiation region and the UV light source, which generally extends above the transport apparatus. A sensor of a measuring apparatus for direct or indirect automated measurement of radiant flux of the UV light source is arranged in the housing, and the sensor is in particular fitted fixed or movably on the housing or a holder. A method for quality assurance using this UV irradiation apparatus is also provided.

Abstract: A semiconductor structure includes a substrate, a grating coupler structure over the substrate, a multi-layers film structure over the grating coupler structure. The multi-layers film structure include a first layer including a first refractive index, a second layer over the first layer and including a second refractive index and a third layer over the second layer and including a third refractive index. The second refractive index is greater than the first refractive index and is greater than the third refractive index of the third layer, and a thickness of each layer of the multi-layers film structure is within a range from ?/4 to ?2, ? is a wavelength of light.

Abstract: An exposure apparatus that exposes a substrate to light by using an original in which a pattern is formed includes an illumination optical system arranged to guide illumination light to the original, the illumination light including first illumination light with a first wavelength and second illumination light with a second wavelength different from the first wavelength, and a projection optical system arranged to form a pattern image of the original by using the illumination light at a plurality of positions in an optical axis direction. The illumination optical system is configured to adjust a position deviation in a direction perpendicular to the optical axis direction between a pattern image formed by the first illumination light and a pattern image formed by the second illumination light by changing an incident angle of the illumination light entering the original.

Abstract: The disclosure relates to an optical system, for example a lithography system, comprising an aperture stop having an aperture with an edge for delimiting a beam path of the optical system on its outer circumference. The optical system also includes a heat stop arranged upstream of the aperture stop for partially shading the aperture stop. The edge of the aperture stop is excluded from the shading.

Abstract: A detection system with a two-step homogenizing device (1) and with a receiver (42). Viewed in a field direction (54) of a photon field, the homogenizing device (1) is located between a measurement area (44) and the receiver (42). The homogenizing device (1) includes a first diffuser (10) and a second diffuser (12). The first diffuser (10) generates an intermediate photon field from an input photon field. The second diffuser (12) generates an output photon field from the intermediate photon field. The receiver (42) generates signals depending on the incident photon field.

Abstract: A lithography exposure system includes a light source, a substrate stage, and a mask stage between the light source and the substrate stage along an optical path from the light source to the substrate stage. The lithography exposure system further comprises a reflector along the optical path. The reflector comprises: a first layer having a first material and a first thickness; a second layer having the first material and a second thickness different from the first thickness; and a third layer between the first layer and the second layer, and having a second material different from the first material.

Abstract: A method for aligning molecular orientations of liquid crystals and/or polymeric materials into spatially variant patterns uses metamasks. When non-polarized or circularly polarized light is transmitted through or reflected by the metamasks, spatially varied polarization direction and intensity patterns of light can be generated. By projecting the optical patterns of the metamasks onto substrates coated with photoalignment materials, spatially variant molecular orientations encoded in the polarization and intensity patterns are induced in the photoalignment materials, and transfer into the liquid crystals. Possible designs for the metamask use nanostructures of metallic materials.

Abstract: An imaging optical arrangement serves to image an object illuminated by X-rays. An imaging optics serves to image a transfer field in a field plane into a detection field in a detection plane. A layer of scintillator material is arranged at the transfer field. A stop is arranged in a pupil plane of the imaging optics. The imaging optics has an optical axis. A center of a stop opening of the stop is arranged at a decentering distance with respect to the optical axis. Such imaging optical arrangement ensures a high quality imaging of the object irrespective of a tilt of X-rays entering the transfer field. The imaging optical arrangement is part of a detection assembly further comprising a detection array and an object mount. Such detection assembly is part of a detection system further comprising a X-ray source.

Abstract: The present disclosure describes a simple, efficient way to generate a lattice lightsheet for a lightsheet microscope. There are no moving parts, and even the need to dither is removed. The light efficiency is many times higher than conventional techniques. Similar to using a cylindrical lens to generate a Gaussian sheet, the present disclosure also uses cylindrical lenses and is called a Cylindrical Lattice Lightsheet or CLLS.

Abstract: An equipment includes a supporter and an etching device. The supporter is configured to support a semiconductor device. The semiconductor device includes an etch stop layer, a material layer, and a mask layer. The mask layer has openings to expose portions of the material layer. The etching device is configured to emit a plurality of directional charged particle beams to etch the exposed portions of the material layer for forming gaps in the material layer, in which the etching device has plural ion extraction apertures to emit the directional charged particle beams. A vertical distance between the semiconductor device and the ion extraction apertures is determined in accordance with a profile of each of the gap, each of the directional charged particle beams has two energy peaks at two angles, and the angles are determined in accordance with a profile of each of the gaps and the vertical distance.

Abstract: Provided are novel energy-efficient signal-transparent window assemblies and methods of fabricating thereof. These window assemblies are specifically configured to allow selective penetration of electromagnetic wavelengths greater than 0.5 millimeters, representing current and future wireless signal spectrum. This signal penetration is provided while IR-blocking properties are retained. Furthermore, the window assemblies remain substantially transparent within the visible spectrum with no specific features detectable to the naked eye. This unique performance is achieved by patterning conductive layers such that the conductive layer edges remain protected during most fabrication steps and the fabrication. As such, the conductive layers are encapsulated and separated from the environment while retaining separation between individual disjoined structures of these layers. For example, a barrier layer and/or a dielectric layer may extend over the conductive layer edge.

Abstract: An optical diffraction component has a periodic grating structure profile. The diffraction structure levels are arranged so that a wavelength range around two different target wavelengths diffracted by the grating structure profile has radiation components with three different phases that interfere destructively with one another. Diffraction structure levels predefine a topography of a grating period of the grating structure profile that is repeated regularly along a period running direction. These include a neutral diffraction structure level, a positive diffraction structure level raised relative thereto, and a negative diffraction structure level lowered relative thereto. The neutral diffraction structure level has an extent along the period running direction which is less than 50% of the extent of the grating period. A difference between the two target wavelengths is less than 50%.

Abstract: Embodiments discussed herein refer to LiDAR systems that use diode lasers to generate a high-repetition rate and multi-mode light pulse that is input to a fiber optic cable that transmits the light pulse to a scanning system.

Abstract: A halftone raster image, suitable for rendering a continuous-tone image, which comprises a plurality of regularly tiled spiral dots. Said spiral dots comprise (i) image pixels arranged as a first arc (200) or as a plurality of arcs which together represent a first spiral (100), and (ii) non-image pixels arranged as a second arc (201) or as a plurality of arcs which together represent a second spiral (101), wherein neighbour halftone dots from said plurality of regularly tiled halftone dots represent a double spiral or triple spiral.

Abstract: A light projection system for projecting full-resolution, high quality images into different directions. The system includes a light source configured to provide a homogenous output beam of light and an illumination shaping optic elements configured with at least one of a predetermined cone angle, numerical aperture, and F-number. The system also includes a spatially-dependent, angular light modulator (ALM) with a plurality of pixels, each having an ON state, an OFF state, one input pupil, and N diffraction order pupils. The ALM is positioned such that the output beam is incident on the plurality of pixels. The at least one of the predetermined cone angle, numerical aperture, and F-number of the illumination shaping optic elements prevents contaminating light from entering an incorrect pupil. The system additionally includes a processor coupled to the ALM to provide discrete diffraction-based beam steering, whereby the ALM will project into one diffraction order at one time.

Abstract: A digital lithography system may adjust a wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. Adjacent pixels may have a phase shift that is determined by an optical path difference between their respective light beams. This phase shift may be preselected to be any value by generating a corresponding wavelength at the light source based on the optical path difference. To generate a specific wavelength corresponding to the desired phase shift, the light source may produce multiple light components that have wavelengths that bracket the wavelength of the selected phase shift. The intensities of these components may then be controlled individually to produce an effect that approximates the selected phase shift on the substrate.

Abstract: A method includes: receiving a design layout comprising a feature extending in a peripheral region and a central region of the design layout; determining compensation values associated with a pellicle assembly and the peripheral region according to an exposure distribution in an exposure field of a workpiece; and adjusting the design layout according to the compensation values. The modifying of the shape of the feature according to the compensation values includes: partitioning the peripheral region into compensation zones, wherein the feature includes first portions disposed within the respective compensation zones and a second portion disposed within the central region; and reducing line widths of the first portions of the feature according to the compensation values associated with the respective compensation zones while keep the second portion of the feature uncompensated.

Abstract: A lens 1 has unevenness within an optical effective diameter D of an optical surface 2, an arithmetic mean roughness Ra within the optical effective diameter D of the optical surface 2 is 20 nm or more and 50 nm or less, and an average value of widths W of protrusion portions 3 of the unevenness on an average line C2 of a roughness curve C1 of the optical surface 2 is 1/200 or more and 1/50 or less of the optical effective diameter D of the optical surface 2. The lens 1 is suitably used as a lens that composes a zoom lens or an imaging lens.

Abstract: A device for generative manufacturing of an object made up of a plurality of cross sections. The device includes an application unit including an application surface for applying a sinterable material as a reproduction of one of the cross sections of the object on the application surface, a substrate for accommodating the reproduction from the first application surface, and a curing unit for curing the reproduction made of the sinterable material on the substrate, the curing unit being situated spatially separated from the application unit.

Abstract: A display device and method of manufacturing the same, in which the display device includes: a first substrate; a transflective layer disposed on a surface of the first substrate; a wavelength conversion layer disposed on the transflective layer; a capping layer disposed on the wavelength conversion layer; a first polarizing layer disposed on the capping layer; and a second polarizing layer disposed on the other surface of the first substrate. The first polarizing layer and the second polarizing layer have different polarization directions.

Abstract: A photo mask includes a plurality of device features, a first assist feature, and a second assist feature. The device features are in a patterning region of a device region. The first assist feature are in the patterning region and adjacent to the device features. The first assist feature is for correcting an optical proximity effect in a photolithography process. The second assist feature is in a non-patterning region of the device region. The second assist feature is a sub-resolution correction feature, and a first distance between the second assist feature and one of the device features closest to the second assist feature is greater than a second distance between adjacent two of the device features.

Abstract: An exposure apparatus that exposes a substrate to light by using an original in which a pattern is formed includes an illumination optical system arranged to guide illumination light to the original, the illumination light including first illumination light with a first wavelength and second illumination light with a second wavelength different from the first wavelength, and a projection optical system arranged to form a pattern image of the original by using the illumination light at a plurality of positions in an optical axis direction. The illumination optical system is configured to adjust a position deviation in a direction perpendicular to the optical axis direction between a pattern image formed by the first illumination light and a pattern image formed by the second illumination light by changing an incident angle of the illumination light entering the original.

Abstract: Optical image sensor systems and process for simultaneously tracking multiple stationary or moving objects to provide attitude and geolocation information are provided. The objects are detected and tracked within subframe areas defined within a field of view of the image sensor system. Multiple objects within the field of view can be detected and tracked using parallel processing streams. Processing subframe areas can include applying precomputed detector data to image data. Image data within each subframe area obtained from a series of image frames is aggregated to enable the centroid of an object within a particular subframe to be located. Information from an inertial measurement unit can be applied to maintain a stationary object, such as a star, at the center of a respective subframe. Ephemeris data can be applied in combination with the information from the IMU to track a resident space object traversing a known trajectory.

Abstract: Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair.

Abstract: A method for removing particles from a mask system for a projection exposure apparatus, including the following method steps: detecting the particle in the mask system, providing laser radiation, and removing the particle by irradiating the particle with laser radiation. The wavelength of the laser radiation corresponds to that of used radiation used by the projection exposure apparatus.

Abstract: The invention relates firstly to a method for determining a mechanical deviation on a displacement path of an optical zoom lens, in particular on a displacement path of an optical zoom lens of a microscope. The optical zoom lens is arranged in a beam path between an object to be recorded and an electronic image sensor. In a first method step, an optical marker is introduced into the beam path at a position of the beam path located between the object to be recorded and the optical zoom lens, such that the optical marker passes the optical zoom lens and then is depicted on an image in which a position of the optical marker is detected and determined. This is compared with a reference position of the optical marker in order to determine the mechanical deviation on the displacement path of the optical zoom lens. The invention further relates to a method for correction of a displacement error of an image recorded by an electronic image sensor and to an electronic image recording device.

Abstract: The invention relates to a filter interchange apparatus for an optical observation instrument having two beam paths, in particular for a stereoscopic observation instrument, in particular for a stereo video endoscope, a stereo exoscope or a stereo surgical microscope, wherein the filter interchange apparatus comprises a first filter wheel, a second filter wheel and a third filter wheel, wherein the filter wheels are arranged in succession along a common axle and are rotatable about the common axle and relative to one another. Each filter wheel comprises at least one filter and at least one free optical passage such that a filter or a free optical passage of each filter wheel is introducible into each of the two beam paths. The second filter wheel is drivable and the first filter wheel is coupled to the second filter wheel via a first entrainment element and the third filter wheel is coupled to the second filter wheel via a second entrainment element.

Abstract: A method for a lithography exposing process includes placing a reticle over a reticle stage, generating a light beam by irradiating a droplet by a laser, projecting a first portion of the light beam over a plurality of light permeable protrusions formed on a reflection layer and directing, by the protrusions and the reflection layer, the first portion of the light beam to the reticle.

Abstract: A multispectral light assembly includes a multispectral light source configured to generate a plurality of different wavelengths of light, a light pipe positioned in front of the multispectral light source and configured to provide color mixing for two or more of the plurality of different wavelengths, a diffusive surface on the light pipe exit surface, and a projection lens positioned in front of the diffusive surface. A processor device is in communication with the multispectral light assemblies to control activation of the multispectral light source. A machine vision system includes an illumination assembly with a plurality of multispectral light assemblies, an optics assembly, a sensor assembly, and a processor device in communication with the optics assembly, the sensor assembly, and the illumination assembly.

Abstract: A collector mirror for an extreme ultraviolet (EUV) light generator includes a first mirror in a vessel, the vessel being configured to receive a material and a laser beam for generating the EUV light, a second mirror surrounding the first mirror, and a detachable third mirror between the first mirror and the second mirror, the third mirror having an inner diameter that is not smaller than an outer diameter of the first mirror, and an outer diameter that is not larger than an inner diameter of the second mirror.

Abstract: An additive manufacturing system including a two-dimensional energy patterning system for imaging a powder bed is disclosed. Improved structure formation, part creation and manipulation, use of multiple additive manufacturing systems, and high throughput manufacturing methods suitable for automated or semi-automated factories are also disclosed.

Abstract: A digital exposure apparatus includes a lens array, the lens array at least including a first lens unit and a second lens unit, a light transposition assembly arranged on an exit light path of the second lens unit, and the light transposition assembly being used for controlling a light exiting from the second lens unit to be transposed with respect to an exposure direction of the digital exposure apparatus. When the digital exposure apparatus is used for exposure, a light passing through the first lens unit and a light penetrating through the second lens unit are needed to expose the same position for multiple times.

Abstract: A method of forming a planarization layer on a substrate is disclosed. The method can include aligning a superstrate with the substrate, where aligning the superstrate with the substrate comprises tuning a diffusing element to a first operational state, dispensing a formable material over the substrate, contacting the formable material over the substrate with the superstrate, tuning the diffusing element to a second operational state, where the first operational state is different from the second operational state, and curing the formable material over the substrate to form a layer over the substrate while the superstrate is contacting the formable material, where curing the formable material can include directing a set of actinic radiation beams to enter the diffusing element at an entering state and exit the diffusing element at an exiting state, and where the entering state is different from the exiting state.

Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.

Abstract: A distance measuring device includes a light emitting unit that outputs a measurement light, a first polarization state control unit that controls a polarization state of the measurement light output from the light emitting unit, a second polarization state control unit that controls the polarization state of the measurement light of which a polarization state is controlled by the first polarization state control unit, and an optical path switching element that selects an emission direction of the measurement light of which a polarization state is controlled by the second polarization state control unit, in which the second polarization state control unit controls the polarization state of the measurement light so that the measurement lights are emitted from the optical path switching element in a plurality of the emission directions, and the optical path switching element receives a reflected light obtained by reflecting the emitted measurement light by an object.

Abstract: Embodiments disclosed herein include lithographic patterning systems for non-orthogonal patterning and devices formed with such patterning. In an embodiment, a lithographic patterning system comprises an actinic radiation source, where the actinic radiation source is configured to propagate light along an optical axis. In an embodiment, the lithographic patterning system further comprises a mask mount, where the mask mount is configurable to orient a surface of a mask at a first angle with respect to the optical axis. In an embodiment, the lithographic patterning system further comprises a lens module, and a substrate mount, where the substrate mount is configurable to orient a surface of a substrate at a second angle with respect to the optical axis.

Abstract: A method includes: receiving a photomask; patterning a wafer by directing a first radiation beam to the wafer through the photomask at a first tilt angle; and inspecting the photomask. The inspecting includes: directing a second radiation beam to the photomask at a second tilt angle greater than the first tilt angle; receiving a third radiation beam reflected from the photomask; and generating an image of the photomask according to the third radiation beam.

Abstract: An ion implanter includes an implantation processing chamber in which an implantation process of irradiating a wafer with an ion beam is performed, a first Faraday cup disposed inside the implantation processing chamber to measure a beam current of the ion beam during a preparation process performed before the implantation process, a second Faraday cup disposed inside the implantation processing chamber to measure a beam current of the ion beam during a calibration process for calibrating a beam current measurement value of the first Faraday cup, and a blockade member for blocking the ion beam directed toward the second Faraday cup, the blockade member being configured so that the ion beam is not incident into the second Faraday cup during the implantation process and the preparation process, and the ion beam is incident into the second Faraday cup during the calibration process.

Abstract: Systems and methods for manufacturing multiple integrated tip probes for scanning probe microscopy. According to an embodiment is a microscope probe configured to analyze a sample, the microscope probe including: a movable probe tip including a terminal probe end; a first actuator configured to displace the movable probe tip along a first axis; and a detection component configured to detect motion of the movable probe tip in response to an applied signal; where the moveable probe tip comprises a metal layer affixed to a supporting layer, at least a portion of the metal layer at the terminal probe end extending past the supporting layer.

Abstract: A nanofabrication method comprises receiving information regarding a distortion within an imprint system, generating a first drop pattern of formable material based on the received information, dispensing a first plurality of drops onto a substrate according to the first drop pattern, contacting the dispensed first plurality of drops with a patternless superstrate to form a first layer of formable material, forming a first cured layer by curing the first layer of formable material while the superstrate is contacting the first layer of formable material, separating the superstrate from the first cured layer, depositing an etch resistant layer on the first cured layer, generating a second drop pattern of formable material, dispensing a second plurality of drops onto the etch resistant layer according to the second drop pattern, and contacting the dispensed second plurality of drops with a patterned template to form a second layer of formable material.

Abstract: A method of manufacturing a semiconductor device by using an exposure apparatus having a reticle stage and a projection optical system includes a first period in which substrates are exposed by using a first reticle arranged on the reticle stage, a second period in which substrates are exposed by using a second reticle arranged on the reticle stage, and a third period which is between the first and second periods. The method includes changing, in at least part of the third period, the first reticle arranged on the reticle stage to the second reticle, and performing control, in the first and second periods, to adjust temperature distribution of an optical element of the projection optical system so as to reduce change in aberration of the projection optical system. The third period is shorter than the first period.

Abstract: A color chart includes a first portion and a second portion. The first portion includes no patch. The second portion includes a plurality of patches having different densities or luminances. The plurality of patches includes a reference patch indicating a color having a reference density or luminance. The reference patch is adjacent to the first portion. The plurality of patches is located in order of increasing density from the density of the color indicated by the reference patch, decreasing density from the density of the color indicated by the reference patch, increasing luminance from the luminance of the color indicated by the reference patch, or decreasing luminance from the luminance of the color indicated by the reference patch.