Detailed Holder For Original Patents (Class 355/75)
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Patent number: 8035805Abstract: A guide includes a brittle material layer and a magnetically attracting magnetic body, e.g., a metal layer. A recess and a projection are formed on the metal layer. The brittle material layer is made of, e.g., a sprayed ceramic material and covers the recess formed on the magnetically attracting metal layer. A movable body moves as it levitates above the surface of the brittle material layer.Type: GrantFiled: October 7, 2008Date of Patent: October 11, 2011Assignee: Canon Kabushiki KaishaInventor: Osamu Yasunobe
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Publication number: 20110235016Abstract: A pellicle is provided that includes a pellicle film, a pellicle frame having the pellicle film stretched over one end face thereof and having the other end face open, and a pressure-sensitive adhesion layer for adhering the pellicle frame to a mask, the pressure-sensitive adhesion layer being provided on an inner peripheral face of the pellicle frame, and the pressure-sensitive adhesion layer being capable of adhering to a side face of a mask having a mask image on a front face.Type: ApplicationFiled: March 21, 2011Publication date: September 29, 2011Inventor: Toru SHIRASAKI
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Patent number: 8027028Abstract: A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units includes a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other.Type: GrantFiled: November 20, 2006Date of Patent: September 27, 2011Assignee: Shanghai Micro Electronics Equipment Co., Ltd.Inventors: Yingsheng Li, Xiaoping Li, Zhiyong Yang, Jun Guan, Shaowen Gao, Wenfeng Sun, Gang Li, Yanmin Cai
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Patent number: 8009275Abstract: An exposure apparatus that includes a movable stage apparatus. The movable stage apparatus includes a master stage on which a reflecting master is to be mounted, in which, when a space is divided by a plane including a reflection surface of the master, a guide surface to guide movement of the master stage is arranged in a space opposite to a space where an exposure light beam to be reflected by the master passes.Type: GrantFiled: March 11, 2008Date of Patent: August 30, 2011Assignee: Canon Kabushiki KaishaInventor: Kazuyuki Ono
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Patent number: 7999919Abstract: Disclosed is technology for holding a substrate and, specifically, an object holding apparatus including a chuck for holding an object, a holding unit for holding the chuck, a generating unit provided in the holding unit, for generating a field related to an attraction force, a member provided in the chuck and attracted by the generating unit in accordance with the field, and a supporting unit for supporting one of the generating unit and the member, for movement at least in a direction nearing the other and in a direction away from the other.Type: GrantFiled: February 16, 2007Date of Patent: August 16, 2011Assignee: Canon Kabushiki KaishaInventors: Yoshikazu Miyajima, Hideo Tanaka
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Patent number: 7994484Abstract: The present invention provides a stage apparatus wherein an object is disposed in an atmosphere with a gas pressure lower than atmospheric pressure, and the object can be driven with high accuracy. The stage apparatus that drives a reticle comprises: a vacuum chamber, which forms a space and has an opening; an integrated coarse and fine motion table, which has an electrostatic chuck that holds the object, that, when driven, moves the electrostatic chuck inside the space; a counter mass, which is disposed so that it covers the opening, that is capable of moving because of the reaction force produced when the integrated coarse and fine motion table is driven; and a vacuum cover, which forms a space that houses the counter mass; wherein the space and the space are set to prescribed gas pressures.Type: GrantFiled: March 30, 2009Date of Patent: August 9, 2011Assignee: Nikon CorporationInventor: Keiichi Tanaka
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Patent number: 7994793Abstract: A transfer point of a transfer arm is detected accurately and stably by using a position detecting wafer having an electrostatic capacitance sensor. A position detecting wafer S is formed in a wafer shape transferable by a transfer arm 20 and includes an electrostatic capacitance sensor 50 for detecting a relative position with respect to a reference object by detecting an electrostatic capacitance in relation with the reference object for a position detection. The electrostatic capacitance sensor 50 includes a detection electrode 52 for forming the electrostatic capacitance in relation with the reference object, and the detection electrode 52 is installed on a rear surface of a main body of the wafer shape. Installed on the main body is a guard electrode 100 covering the detecting electrode 52 when viewed from a front surface thereof, for blocking an electric field oriented toward the detection electrode 52 from the front surface.Type: GrantFiled: October 21, 2008Date of Patent: August 9, 2011Assignee: Tokyo Electron LimitedInventors: Toshiyuki Matsumoto, Tomohide Minami, Koji Mahara, Yuichi Douki
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Patent number: 7986396Abstract: An exposure apparatus includes a projection optical system that projects a pattern image of an original onto a substrate, an original stage that holds and drives the original, a substrate stage that holds and drives the substrate, and a position detecting system that detects the relative positional relationship between position detection marks formed on the original or the original stage and fiducial marks formed on the substrate stage. The position detection marks form a plurality of mark groups arranged in a first direction. Each of the plurality of mark groups has a first mark for measuring the position in the first direction and a second mark for measuring the position in a second direction perpendicular to the first direction. The position detecting system has a plurality of photoelectric conversion elements, which simultaneously detect a plurality of the first marks or a plurality of the second marks.Type: GrantFiled: August 17, 2007Date of Patent: July 26, 2011Assignee: Canon Kabushiki KaishaInventor: Kazuhiko Mishima
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Publication number: 20110176124Abstract: An original reading device is provided with an original cover, an original reading device main body, and a cover attachment portion that attaches the original cover to the original reading device main body in an openable and closeable manner, and the cover attachment portion is constituted by a rod-shaped hinge portion that is attached to the original cover through an open-close mechanism portion, and a hinge guide portion that is provided in the original reading device main body and through which the rod-shaped hinge portion is inserted and supported, and a latch indentation is provided in the hinge guide portion such that a latch protrusion provided at a lower portion of the rod-shaped hinge portion is latched into the latch indentation to maintain a state in which the rod-shaped hinge portion is pulled out a predetermined distance from the hinge guide portion.Type: ApplicationFiled: January 11, 2011Publication date: July 21, 2011Inventor: Sohichi TAKATA
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Patent number: 7978309Abstract: A clamping apparatus capable of fixing a roll film is disclosed. The clamping apparatus includes: a carrier comprising a slot; a cover positioned in the slot; and a cannelure formed between the cover and the carrier, for guiding the film inserted from the first film door to a predetermined position. The cover includes: an upper ramp, positioned on one side of the cannelure opening, for guiding the film from the first film door to the cannelure opening, wherein a first edge of the upper ramp is near the cannelure opening, and a second edge of the upper ramp is away from the slot opening and inclines to the first edge of the upper ramp.Type: GrantFiled: July 2, 2006Date of Patent: July 12, 2011Assignee: Lite-On Technology CorporationInventors: Ta-Yi Lee, Jeicy Lee, Jy Tang
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Patent number: 7978307Abstract: A gas bearing has a first bearing part defining a first bearing surface and a second bearing part defining a second bearing surface. Between the first bearing surface and the second bearing surface there is a gap. A gas supply device supplies a gas to the gap. The first bearing part is at least partly ferromagnetic, and the second bearing part has at least one permanent magnet interacting with the first bearing part for pre-tensioning the gas bearing. The gas bearing may be part of a lithographic apparatus.Type: GrantFiled: May 4, 2006Date of Patent: July 12, 2011Assignee: ASML Netherlands B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Adrianus Antonius Theodorus Dams, Jacob Willem Vink
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Patent number: 7969550Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a shield device arranged between a source of air flows and/or pressure waves and an element sensitive for the air flows and/or pressure waves.Type: GrantFiled: April 19, 2007Date of Patent: June 28, 2011Assignee: ASML Netherlands B.V.Inventors: Johan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Clementius Andreas Johannes Beijers
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Publication number: 20110141450Abstract: A method of measurement of at-resolution overlay offset may be implemented in a scatterometer. At least three targets are provided on a wafer, each target comprising a first marker grating and a second interleaved marker grating and each target having a different overlay bias between its first and second marker. The first and second markers are provided by subsequent lithography steps in a double patterning lithographic process. The targets are measured with a scatterometer and for each target a measured CD of at least one of the markers is determined using reconstruction. The CD of the first marker may be fixed in the reconstruction. The measured CDs and at least one of the overlay biases is used to determine an overlay result corresponding to a minimum measured CD. The overlay result may be determined by fitting a function such as a parabola to the measured CDs and the overlay biases and determining the overlay at the minimum of the fitted function.Type: ApplicationFiled: October 18, 2010Publication date: June 16, 2011Applicant: ASML Netherlands B.V.Inventors: Henricus Johannes Lambertus MEGENS, Johannes Anna Quaedackers, Christian Marinus Leewis, Peter Clement Paul Vanoppen
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Patent number: 7961291Abstract: A lithographic apparatus includes an illumination system to condition a radiation beam, a patterning device support to support a patterning device in a projection plane, the patterning device to pattern the radiation beam, a substrate table to hold a substrate, a projection system to project the patterned beam onto the substrate, and an exchange device to exchange an exchangeable object with an exchangeable object support that holds the exchangeable object during projection. The exchange device includes a load unit and an unload unit that each have a holding device to hold an exchangeable object. The holding devices are positioned substantially adjacent to each other and configured to hold an exchangeable object in a plane substantially parallel to the plane in which the exchangeable object is held in the exchangeable object support during projection. The exchangeable object support exchanges an exchangeable object with each of the holding devices.Type: GrantFiled: December 23, 2005Date of Patent: June 14, 2011Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Bernardus Antonius Johannes Luttikhuis
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Patent number: 7956982Abstract: A cooling apparatus is described that has a first cooling structure, in thermal contact with a heat source having a temperature greater than a cool structure, including a channel through which a cooling fluid is passed, an isolator between the heat source and the cool structure, the isolator in thermal contact with the first cooling structure and including a material of low thermal conductivity, and a second cooling structure between the isolator and the cool structure, the second cooling structure including a channel through which cooling fluid is passed.Type: GrantFiled: November 18, 2005Date of Patent: June 7, 2011Assignee: ASML Netherlands B.V.Inventors: Sven Antoin Johan Hol, Angelo Cesar Peter De Klerk, Erik Roelof Loopstra, Fransicus Mathijs Jacobs, Mark Scholten
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Patent number: 7956983Abstract: Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source and a first photo mask spaced apart from the light source by a desired distance. A second photo mask may include a third region and a fourth region. An exposure method using the exposure equipment also may be provided.Type: GrantFiled: December 7, 2006Date of Patent: June 7, 2011Assignee: Samsung Electronics Co., Ltd.Inventor: Dong-Seok Nam
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Publication number: 20110128523Abstract: A drive system drives the moving body based on: measurement results of a first measuring system that measures the position of the moving body within an plane by radiating a measurement beam from an arm member to a grating disposed in one surface of a moving body that is parallel to an XY plane; and measurement results of a second measuring system that uses laser interferometers to measure a change in the shape of the arm member. The drive system uses the measurement results of the second measuring system to correct measurement error, owing to a change in the shape of the arm member, included in the measurement results of the first measuring system.Type: ApplicationFiled: November 17, 2010Publication date: June 2, 2011Applicant: NIKON CORPORATIONInventor: Hiromitsu YOSHIMOTO
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Patent number: 7952686Abstract: A stage apparatus that includes a stage and moves the stage in at least a first direction. The stage apparatus also includes a plurality of holding units fixed on the stage to extend in the first direction, in which the first direction is a longitudinal direction. Each of the holding units includes a first portion. A second portion is arranged between the first portion and the stage and a third portion is arranged between the second portion and the stage. The first portion includes a holding surface to hold an object. A length of the second portion in the first direction is less than a length of the first portion in the first direction, and the length of the second portion in the first direction is less than a length of the third portion in the first direction.Type: GrantFiled: April 1, 2008Date of Patent: May 31, 2011Assignee: Canon Kabushiki KaishaInventor: Yasuhiro Fujiwara
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Patent number: 7948609Abstract: In an embodiment, a lithographic apparatus includes a stage system including a movable stage, and a stage control system to control a position of the stage in response to a setpoint signal. The stage control system includes a feedback control loop to control the position in a feedback manner, the feedback control loop having a setpoint input, and an acceleration feedforward to generate a feedforward signal to be forwardly fed into the feedback control loop. The feedforward signal is derived from the setpoint signal. The stage control system is arranged to modify the position setpoint signal into a modified position setpoint signal, the setpoint input of the feedback control loop to receive the modified position setpoint signal, the modified position setpoint signal to take account of a non rigid body behavior of the stage.Type: GrantFiled: December 17, 2008Date of Patent: May 24, 2011Assignee: ASML Netherlands B.V.Inventors: Mauritius Gerardus Elisabeth Schneiders, Wilhelmus Franciscus Johannes Simons
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Publication number: 20110096306Abstract: A stage apparatus includes a guide member that extends in first directions, that moves in second directions, which are substantially orthogonal to the first directions; two second moving bodies, which are provided along the guide member such that they are independently moveable in the first directions, that move in the second directions together with the guide member by the movement of the first moving body; and a holding member that holds an object and is supported by the two second moving bodies such that it is capable of moving within a two dimensional plane that includes at least the first directions and the second directions.Type: ApplicationFiled: September 22, 2010Publication date: April 28, 2011Applicant: NIKON CORPORATIONInventor: Hiromitsu YOSHIMOTO
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Patent number: 7933000Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An applicator, such as a humidifier is provided to provide molecules, such as water molecules, to a clamp area of the patterning device.Type: GrantFiled: November 16, 2006Date of Patent: April 26, 2011Assignee: ASML Netherlands B.V.Inventors: Johannes Onvlee, Dirk-Jan Bijvoet
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Patent number: 7933513Abstract: A film copy system includes a camera supported by a cradle which is removably attached to a cradle mount. A light shaft carried by the cradle is provided for releasably engaging a film holder and spacing the film holder a predetermined distance from the camera.Type: GrantFiled: August 2, 2006Date of Patent: April 26, 2011Inventor: Anthony Lam
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Patent number: 7929117Abstract: An apparatus for real-time contamination, environmental, or physical monitoring of a photomask. The apparatus includes a photomask having a patterned region configured to correspond to features of an integrated circuit and a sensor physically coupled with the photomask. The sensor is configured to monitor an attribute related to the photomask. Attributes monitored by the sensor may include chemical contamination, temperature changes, humidity changes, acceleration, shock, vibration, optical flux through the photomask, electrostatic discharge environment of the photomask, particulates, and pressure.Type: GrantFiled: March 26, 2008Date of Patent: April 19, 2011Assignee: International Business Machines CorporationInventors: Brent A. Anderson, Robert K. Leidy, Jed H. Rankin
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Patent number: 7924399Abstract: An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.Type: GrantFiled: March 27, 2006Date of Patent: April 12, 2011Assignee: ASML Netherlands B.V.Inventors: Ronald Van Der Ham, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
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Patent number: 7924398Abstract: An optical apparatus including an optical element includes a holder configured to hold the optical element, and a rectifier configured to rectify a flow of gas in a space adjacent to a surface of the optical element, and to decrease the flow rate of the gas adjacent to the surface of the optical element.Type: GrantFiled: February 28, 2006Date of Patent: April 12, 2011Assignee: Canon Kabushiki KaishaInventor: Shinichi Shima
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Patent number: 7916268Abstract: The present invention relates to a substrate carrying device that carries a substrate such as a reticle, a substrate carrying method, and an exposure device. The substrate carrying device includes a movable stage having a chuck and being movable in a horizontal direction, the chuck having a sucking surface which faces downward and sucking a substrate on the sucking surface; and a fixed blind disposed below the movable stage. The movable stage moves to a position apart from the fixed blind in a horizontal direction and attaches and detaches the substrate. In addition, the substrate carrying device also includes a lifting portion having a lifting table which is movable in a movable range of the movable stage and is capable of being positioned below the movable stage; and a carrying portion having a carrying arm which carries the substrate to the lifting portion.Type: GrantFiled: November 11, 2005Date of Patent: March 29, 2011Assignee: Nikon CorporationInventor: Keiichi Tanaka
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Patent number: 7916267Abstract: A lithographic device includes a cooling device for removing heat from a motor. The cooling device has a cooling element provided in thermal contact with at least part of the motor. The cooling device further has a cooling duct assembly with a supply duct to supply a cooling fluid to the cooling element, and a discharge duct to discharge the cooling fluid from the cooling element. A pump causes the cooling fluid to flow through at least part of the cooling duct assembly. A flow control device controls a flow rate of the cooling fluid through at least part of the cooling duct assembly, to maintain a predetermined average temperature of the cooling fluid in the cooling element.Type: GrantFiled: August 29, 2006Date of Patent: March 29, 2011Assignee: ASML Netherlands B.V.Inventor: Frank Auer
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Patent number: 7911588Abstract: An exposure apparatus configured to expose a pattern of an original onto a substrate includes a wire electrode row that includes plural parallel wire electrodes, and that is opposed to the original, and a power source that applies an AC voltage to the plural wire electrodes, wherein the wire electrode row includes a first electrode group, and a second wire electrode group to which an AC voltage having a phase different from that of an AC voltage applied to the first electrode group is applied.Type: GrantFiled: March 27, 2008Date of Patent: March 22, 2011Assignee: Canon Kabushiki KaishaInventors: Masami Yonekawa, Mitsuru Inoue
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Publication number: 20110063599Abstract: A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and a leveling portion. The input portion has an entrance, a channel and an exit, the channel disposed between the entrance and the exit. During scanning of the to-be-scanned object, the to-be-scanned object passes through the channel. The guiding portion connects to the input portion for guiding the to-be-scanned object. The leveling portion is disposed on one side of the channel. During scanning of the to-be-scanned object, the leveling portion leans against the to-be-scanned object. The sensing unit stably senses the to-be-scanned object. The to-be-scanned object inside the film holder is kept from being scratched and the to-be-scanned object is in smooth move during scanning.Type: ApplicationFiled: June 4, 2010Publication date: March 17, 2011Applicant: QISDA (SUZHOU) CO., LTDInventors: Xian-Jun Wang, Ming-Jie Zhao, Jian-Chun Yu
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Publication number: 20110063600Abstract: A film holder is provided. During scanning of a to-be-scanned object, the film holder is inserted into a scanning device. The film holder includes an input portion, a guiding portion and an information window. The input portion has an entrance, a channel and an exit, the channel disposed between the entrance and the exit. During scanning of the to-be-scanned object, the to-be-scanned object passes through the channel. The guiding portion connects to the input portion for guiding the to-be-scanned object. The information window is formed at and through the guiding portion. During scanning of the to-be-scanned object, the side regions of the to-be-scanned object pass through the information window. Functions of the scanning device are effectively augmented; the film is kept from being scratched; the quality of image scanning is kept from being deteriorated; and it is convenient to use the scanning device.Type: ApplicationFiled: June 4, 2010Publication date: March 17, 2011Applicant: QISDA (SUZHOU) CO., LTDInventors: Xian-Jun Wang, Ming-Jie Zhao, Jian-Chun Yu
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Publication number: 20110063601Abstract: A pellicle frame, including aluminum, aluminum oxide, and a transition metal.Type: ApplicationFiled: September 10, 2010Publication date: March 17, 2011Inventors: Jung-jin KIM, Bum-hyun An, Chan-uk Jeon, Jang-dong You, Sung-wan Kim, Ik-jun Kim, Jae-hyuck Choi, Han-shin Lee
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Patent number: 7907256Abstract: At least one exemplary embodiment is directed to a stage apparatus which comprises a first stage that is movable with respect to a horizontal plane that is defined by a first axis and a second axis that intersect each other at right angles, and a second stage that is movable on the first stage at least in the axial direction and in a rotational direction around a third axis, where a regulating member for restricting a movable range of the second stage is provided at a location in which a movable unit of the second stage faces the first stage through a gap.Type: GrantFiled: June 4, 2007Date of Patent: March 15, 2011Assignee: Canon Kabushiki KaishaInventor: Atsushi Ito
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Patent number: 7900320Abstract: An original cover closer is described in which a compression coil spring can stably and surely work, an original cover can expeditiously and smoothly be operated, and the compression amount of the compression coil spring can be set and changed in an extremely easy manner. The cover closer comprises: a mounting member mounted to the main body of a copying machine; a supporting member pivotally attached to the mounting member and operable to support the original cover; a first slider and a second slider which are slidably installed in the supporting member; and a compression coil spring inserted between these sliders and operable to urge the original cover in the direction to open, wherein at least one of the sliders is formed integrally with a spring cover which covers the compression coil spring even when the original cover is opened.Type: GrantFiled: February 8, 2007Date of Patent: March 8, 2011Inventors: Tsutomu Katsumata, Hirofumi Kohda
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Patent number: 7880864Abstract: This invention relates to a stage apparatus including a first stage, a second stage mounted on the first stage, a first actuator which drives the first stage in a first direction, and a second actuator which drives the second stage such that the second stage moves relative to the first stage. The stage apparatus also includes a first unit including a first movable magnet arranged at an end of the first stage in the first direction, and a first stationary magnet which faces the first movable magnet and generates a repulsive force against the first movable magnet. The stage apparatus also includes a second unit including a second movable magnet arranged at the two ends of the second stage in the first direction, and a second stationary magnet which faces the second movable magnet and generates a repulsive force against the second movable magnet.Type: GrantFiled: December 26, 2007Date of Patent: February 1, 2011Assignee: Canon Kabusiki KaishaInventor: Yugo Shibata
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Patent number: 7869001Abstract: An eddy current damper has an electrically conducting body having a face, and an array of magnets extending over the face of the conducting body. Each magnet generates a magnetic field directed essentially transversely to the face of the conducting body. The magnet array generates oppositely directed magnetic fields each having a field width. At least one of the magnetic fields generated by the magnets has a field width that is smaller than a field width of an adjacent magnetic field. The conducting body may have an opening having a width that is smaller than a field width of a corresponding magnetic field.Type: GrantFiled: November 8, 2006Date of Patent: January 11, 2011Assignee: ASML Netherlands B.V.Inventor: Juraj Makarovic
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Patent number: 7869003Abstract: A reticle gripper to hold a reticle of a lithographic apparatus is presented. The reticle gripper includes three gripper structures to contact the surface of the reticle. Each of the three gripper structures determines a position with respect to the reticle gripper of one of the points on the surface of the reticle.Type: GrantFiled: July 12, 2006Date of Patent: January 11, 2011Assignee: ASML Holding NVInventors: Matthew J. Van Doren, Jonathan H. Feroce
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Patent number: 7864300Abstract: A door opening and closing unit is provided for an image forming apparatus. The image forming apparatus includes a main body, and a door rotatably mounted on the main body. The door opening and closing unit includes a door speed control unit coupling the door to the main body that includes a coupling boss; and a guide groove that engages the coupling boss and along which the coupling boss moves as the door rotates relative to the main body; wherein the door speed control unit controls a frictional force between the coupling boss and the guide groove according to a rotating angle of the door relative to the main body to control a rotating speed of the door as the door rotates relative to the main body.Type: GrantFiled: February 5, 2008Date of Patent: January 4, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jin-soo Lee, Bong-hwan Choi
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Patent number: 7864299Abstract: In an apparatus for supporting a wafer, the apparatus may remove particles thereon. The apparatus may include a conductive support configured to support the wafer, and a power source electrically connected to the conductive support, the power source configured to provide at least one current to the conductive support to remove particles from the conductive support.Type: GrantFiled: August 17, 2007Date of Patent: January 4, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jae-Hyun Sung, Jong-Min Kim
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Patent number: 7862961Abstract: An exposure apparatus transfers a pattern from a mask onto a sensitive substrate. A film protects the mask, and a film frame, between the mask and the film, holds the film spaced away from a surface of the mask. The film has a first transmittance for radiation of a necessary wavelength and has a second transmittance for radiation of an unnecessary wavelength; the first transmittance is higher than the second transmittance. The film might reflect or absorb the unnecessary wavelength. The necessary wavelength may be an exposure wavelength and may also be in the range of extreme ultra violet radiation. An atmosphere around the mask transitions from an air atmosphere to a reduced-pressure atmosphere, or from a reduced-pressure atmosphere to an air atmosphere, at a speed that allows a difference between a pressure applied to one surface of the film and a pressure applied to the other surface of the film to be held at a predetermined value or smaller.Type: GrantFiled: February 16, 2007Date of Patent: January 4, 2011Assignee: Nikon CorporationInventor: Noriyuki Hirayanagi
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Publication number: 20100328641Abstract: A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm2. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.Type: ApplicationFiled: June 21, 2010Publication date: December 30, 2010Applicants: SHIN-ETSU CHEMICAL CO., LTD, INTEL CORPORATIONInventors: Toru SHIRASAKI, Kishore Chakravorty, David Mushell, Grace Ng
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Patent number: 7847919Abstract: An optical component of the lithographic apparatus is moved. A substrate support is moved so as to be synchronous with the motion of the optical component. A momentary position of the optical component is measured. A momentary position of the substrate support is measured at a first sampling rate. The measured momentary position of the optical component is compared with a desired momentary position of the optical component to generate an optical component position error signal in accordance with a difference between the two optical component positions. The measured momentary position of the substrate support is compared with a desired momentary position of the substrate support to generate a substrate support position error signal in accordance with a difference between the two substrate support positions. The momentary position of the optical component is adjusted so as to compensate for the difference between the two substrate support positions.Type: GrantFiled: March 29, 2007Date of Patent: December 7, 2010Assignee: ASML Netherlands B.V.Inventor: Hans Butler
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Patent number: 7843552Abstract: The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.Type: GrantFiled: June 17, 2005Date of Patent: November 30, 2010Assignee: ASML Netherlands B.V.Inventors: Richard Joseph Bruls, Orlando Serapio Cicilia, Tammo Uitterdijk, Herman Boom
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Patent number: 7839489Abstract: A system for use in a lithographic apparatus includes an assembly of a reticle and a reticle holder. The reticle includes a marker. The system also includes a position detector arranged to detect the reticle marker to position the reticle with respect to the reticle holder, and a storage container constructed and arranged to store the assembly during the positioning of the reticle with respect to the reticle holder. The reticle holder and the detector are arranged to be kinematically aligned with respect to each other.Type: GrantFiled: June 15, 2007Date of Patent: November 23, 2010Assignee: ASML Netherlands B.V.Inventors: Gert-Jan Heerens, Bastiaan Lambertus Wilhelmus Marinus Van De Ven
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Patent number: 7839480Abstract: Where a framed pellicle is mounted on a photomaps, the framed pellicle comprises a pellicle frame and a pellicle membrane coupled to the pellicle frame, the pellicle frame has first and second apertures each communicating a first space surrounded by the photomask and the framed pellicle with a second space outside of the framed pellicle, exposing a photoresist layer formed on a substrate by flowing gas from within the first space to outside the framed pellicle through the first aperture while simultaneously exposing the photoresist layer to ultraviolet light through the pellicle membrane and the photomask.Type: GrantFiled: April 25, 2007Date of Patent: November 23, 2010Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventor: Chue San Yoo
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Patent number: 7834982Abstract: A substrate holding apparatus including a first holding member for attracting a first surface of a substrate, a second holding member which contacts a second surface, opposite to the first surface, of the substrate, in which the second holding member attracts the second surface, and a forcing member for forcing the first holding member toward the second holding member.Type: GrantFiled: June 27, 2007Date of Patent: November 16, 2010Assignee: Canon Kabushiki KaishaInventor: Kiyohito Yamamoto
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Publication number: 20100285399Abstract: A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.Type: ApplicationFiled: May 8, 2009Publication date: November 11, 2010Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Po-Chang Huang, Heng-Hsin Liu, Heng-Jen Lee
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Patent number: 7830498Abstract: A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.Type: GrantFiled: October 10, 2006Date of Patent: November 9, 2010Assignee: Hewlett-Packard Development Company, L.P.Inventors: Jun Gao, Wei Wu, Carl Picciotto
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Patent number: 7826038Abstract: A method for adjusting the flatness of a lithographic mask includes determining an initial mask flatness of the mask, determining an applied stress for bringing the mask to a desired mask flatness, and determining a mounting temperature of a pellicle frame to be mounted to the mask, the mounting temperature corresponding to the applied stress. The actual temperature of the pellicle frame is adjusted to the determined mounting temperature, and the pellicle frame is mounted to the mask at the mounting temperature.Type: GrantFiled: February 12, 2008Date of Patent: November 2, 2010Assignee: International Business Machines CorporationInventors: Emily F. Gallagher, Louis M. Kindt, James A. Slinkman, Richard E. Wistron
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Patent number: 7817252Abstract: A holder is described for carrying a photolithography mask in a flattened condition. The holder may include a mask chuck and may be able to flatten a mask for use in photolithography. In one example, the holder may include a substrate and a plurality of independently controllable actuators coupled to the substrate and coupled to a photolithography mask to flatten the photolithography mask.Type: GrantFiled: September 29, 2006Date of Patent: October 19, 2010Assignee: Intel CorporationInventor: Matthew F. Vernon
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Patent number: 7817251Abstract: A supporting apparatus supports a movable element by a bearing. The apparatus has a moment reducing unit that exerts a force on a portion of the movable element, which is different from a portion supported by the bearing. The moment reducing unit reduces a moment that acts on the movable element when the portion of the movable element, which is supported by the bearing, changes as the movable element moves. This stabilizes the attitude of the movable element.Type: GrantFiled: September 11, 2007Date of Patent: October 19, 2010Assignee: Canon Kabushiki KaishaInventor: Atsushi Kimura