Abstract: A charged particle beam apparatus includes: a charged particle beam source which generates a charged particle beam to be incident on a specimen, the specimen having a pattern on a surface thereof; an edge position detector which detects an edge position of the pattern from shape information of the pattern; an irradiation region setter which sets an irradiation region in the specimen to be irradiated with a charged particle beam to an edge of the pattern and a region in the vicinity of the edge; an irradiation position information provider which successively outputs an irradiation position information signal designating an irradiation position of the charged particle beam in the surface of the specimen scanned by the charged particle beam, while avoiding successive designation of irradiation positions in the irradiation region which are adjacent to each other; and an irradiation controller which controls the charged particle beam generated by the charged particle beam source so that the irradiation position co

Abstract: A system for selectively generating and feeding forward reticle fabrication data is provided. The system includes components for fabricating a reticle and a control system operatively connected to the fabricating components, where the control system can control the operation of the fabricating components. The control system bases its control of the fabricating components, at least in part, on feed forward control information generated by a processor that analyzes scatterometry based reticle fabrication data gathered from measurement components. The scatterometry data is compared to data stored in a signature data store that facilitates analyzing gathered scatterometry signatures to produce feed forward control information that can be employed to manipulate subsequent reticle fabrication processes and/or apparatus.

Abstract: A method of measuring a radial index distribution of a rod lens has the steps: (1) the rod lens is processed so that the length is approximately P/2 (where P is pitch length) or an integer multiple thereof and so end surfaces parallel, (2) a patterned surface is set as an object surface in the proximity of one end surface, and an image surface is formed in the proximity of the other end surface by irradiating the patterned surface with condensed monochromatic light, (3) the positions of paraxial focal points and the curves of curvature of field are obtained by observing the image surface, and (4) higher-order index distribution coefficients are calculated back by a fitting process on the basis of the positions of paraxial focal points and the curves of curvature of field.

Abstract: A method of correcting aberrations in an optical system by applying a light adjustable aberration conjugator layer to a component of the system, determining the nature of the aberration, applying radiation to the conjugator layer such as to change the refraction and/or shape of the conjugator layer to compensate for the aberration, and locking in the desired optical property.

Abstract: A method for measuring the geometrical structure of an optical component (2) in transmission, comprises illuminating the optical component by means of a first incident beam (8, 10), the wavefront of which is known. After the first beam is transmitted by the optical component, its wavefront is measured by deflectometry (16, 18). The optical component is then illuminated by a second incident beam (12, 14), the wavefront of which is known. After the second beam is transmitted by the optical component, its wavefront is measured by deflectometry (16, 18). The geometrical structure of the optical component is then calculated from the measured wavefronts. Measuring light transmitted in two distinct optical configurations allows a calculation by optimizing the two surfaces of the component, without prior knowledge of one of the surfaces.

Abstract: A system and method are described for automatically determining the modulation transfer function (MTF) of an optical system. In accordance with exemplary embodiments of the present invention, optical information is collected from the optical system by imaging a bar target having at least one associated frequency to provide a bar target image for a first focus setting of the optical system. A first MTF of the optical system is determined for the at least one associated frequency at the first focus setting from the bar target image. The steps of collecting and determining are repeated by automatically selecting at least a second focus setting of the optical system to determine at least a second MTF for the at least one associated frequency. An MTF for the at least one associated frequency of the optical system is determined by interpolating the first and at least second MTFs.

Abstract: A method of determining aberration of an optical imaging system comprises measuring at least one parameter, such as position of best-focus and/or lateral position, of an image formed by the imaging system. This is repeated for a plurality of different illumination settings of the imaging system, and from these measurements at least one coefficient, representative of aberration of said imaging system, is calculated.

Abstract: A system is disclosed for use in assembling a plurality of rotatable elements in the assembly of a turbine engine. The system includes an initialization unit, a measurement unit, and a processing unit. The initialization unit is for entering initialization data into a database. The initialization data includes a first set of initialization data that is representative of characteristics of a first rotatable element, and a second set of initialization data that is representative of characteristics of a second rotatable element. The measurement unit is for permitting a user to enter measured data including a first set of measured data characteristic of measured features of the first rotatable element, and a second set of measured data characteristic of measured features of the second rotatable element.

Abstract: A device for automatically detecting characteristics of an ophthalmic lens includes a support receiving the lens, an illumination system and an analysis system. The optics of the illumination system define two alternate optical paths, one of which passes through a mask forming a Hartmann matrix.

Abstract: The invention provides an optical element inspection device and an optical element inspection method capable of inspecting a relative position of each reflective surface of an optical element. An optical element inspection device includes a pedestal with a cross-dichroic prism installed thereon, an autocollimator which introduces the measurement light into any of four reflective surfaces at the angle of incidence of 45°, and detects the return light thereof, and a switching device to introduce the measurement light into only either a left area or a right area. The relative position between two reflective surfaces of each color reflective surface can be easily inspected by introducing the measurement light in only the reflective surface of either area of the color reflective surface by a switching device.

Abstract: The invention includes methods and apparatuses for inspecting optical devices, particularly contact lenses.

Abstract: Microoptical systems with clear aperture of about one millimeter or less are fabricated from a layer of photoresist using a lithographic process to define the optical elements. A deep X-ray source is typically used to expose the photoresist. Exposure and development of the photoresist layer can produce planar, cylindrical, and radially symmetric micro-scale optical elements, comprising lenses, mirrors, apertures, diffractive elements, and prisms, monolithically formed on a common substrate with the mutual optical alignment required to provide the desired system functionality. Optical alignment can be controlled to better than one micron accuracy. Appropriate combinations of structure and materials enable optical designs that include corrections for chromatic and other optical aberrations. The developed photoresist can be used as the basis for a molding operation to produce microoptical systems made of a range of optical materials.

Abstract: The present invention contemplates a programmed displacement to prolong the usage life of UV crystal for deep UV generation by displacing step by step the crystal with interval between steps much shorter than the degradation time of the crystal. Meanwhile, the present invention contemplates the programmed displacement to obtain stable UV generation by avoiding defect locations of the crystal. Further, the present invention contemplates the programmed displacement to achieve optimal stability in UV power for each layer of UV ablation in photo-refractive surgery.

Abstract: Disclosed are a spectacle lens optical characteristics measuring method and a lens meter in which measurement beams are not intercepted by lens pressers. The left and right lenses of a pair of spectacles are point-supported by lens rest shafts at some midpoints in the optical paths of a pair of left and right measurement optical systems, and the spectacle frame for the lenses is held by a pair of frame retaining plates from the front and rear sides. In this state, the spectacle lenses are pressed against lens rest shafts by lens presser shafts to be thereby supported, whereby the way the spectacle frame is held by the frame retaining plates is corrected.

Abstract: A refracting power measuring apparatus according to the present invention comprises an optical system 1 for projecting a measuring light P toward a lens TL wet with liquid 12, a light receiving sensor 7 for receiving and outputting the measuring light P which passes through the lens TL, an arithmetic circuit 13 for calculating optical characteristic values based on a receiving signal, a residual quantity arithmetic circuit 14 for outputting a residual quantity signal based on characteristic value data of the arithmetic circuit 13, a delay circuit 19 for delaying the residual quantity signal, a comparing circuit 18 which compares a residual quantity signal delayed by the delaying circuit 19 and the following residual quantity signal and judges whether a difference therebetween is less than an allowed value.

Abstract: A method is described for determining lens aberrations using a test reticle and a standard metrology tool. The method provides test patterns, preferably in the form of standard overlay metrology test patterns, that include blazed gratings having orientation and pitch selected to sample desired portions of the lens pupil. The method measures relative shifts in the imaged test patterns using standard metrology tools to provide both magnitude and sign of the aberrations. The metrology tools need not be modified if standard test patterns are used, but can be adapted to obtain additional information. The test reticles may be formed with multiple test patterns having a range of orientations and pitch in order to compute any desired order of lens aberration. Alternatively, single test patterns may be used to determine both the magnitude and sign of lower order lens aberrations, such as defocus or coma.

Abstract: There is disclosed aberration measuring method of a projection optical system comprising collectively irradiating the finite region of the photomask in which a diffraction grating is formed with the illuminating light emitted from secondary light source having point sources, projecting 0th-order and 1st-order diffracted lights to first and second measurement planes conjugated with the secondary light source by using a projection optical system, respectively, the 0th-order and 1st-order diffracted lights being passed through the photomask, measuring a relation of projected positions in the first and second measurement planes between the 0th-order diffracted light and 1st-order diffracted light of the light emitted from one arbitrary point source, respectively, obtaining lay aberration concerning the light emitted from the point source on the basis of the obtained two relations of projected positions.

Abstract: An apparatus for testing the state of the optical system of an endoscope comprises a first supporting device for the endoscope, a test pattern and a second supporting device for the test pattern, wherein the test pattern comprises a pattern, which allows a check of the actual viewing direction and of the actual field of view angle within tolerance values.

Abstract: A lens meter according, including: a unit body provided with eyeglasses support means for supporting eyeglasses; a left measurement optical system provided in the unit body and provided with a left light-emitting optical system that emits measurement light to a left eyeglass lens of the eyeglasses and a left light-receiving optical system that receives the measurement light passing through the left eyeglass lens with a CCD (light-receiving element); a right measurement optical system provided in the unit body and provided with a right light-emitting optical system that emits measurement light to a right eyeglass lens of the eyeglasses and a right light-receiving optical system that receives the measurement light passing through the right eyeglass lens with the CCD. (light-receiving element); and an arithmetic control circuit that performs operation to the optical characteristics of a pair of the eyeglass lenses based on an output of the CCD (light-receiving element).

Abstract: A method and arrangement are disclosed for increasing the depth contrast in microscope imaging. The method and implementation described can be designated as structured illumination for generating quasi-confocal optical sections. In implementing the method, a grating structure located in the field diaphragm plane of a microscope, the object plane and the TV intermediate image plane of a microscope are arranged confocally. The term “confocally” refers to the fact that the grating, object and the intermediate image plane are positioned on optically conjugate planes. By this arrangement, the grating structure is projected in the object plane of the microscope and the object which is structured in this way is imaged in the TV intermediate image plane of the microscope by the optical system following it. Optical sections are generated by calculating the modulation depth of the structured object.

Abstract: An aberration measuring apparatus has a converging lens L disposed on the light path of light beam to converge light beam traveling through a measurement target optical system PL on a predetermined surface IP, an aperture stop AP disposed on the light path of light beam to transmit a part of the light beams, a converging position detection unit DET disposed on the predetermined surface to detect a positional deviation of a converging position P of a part of the light beams traveling through the aperture stop on the predetermined surface IP, a moving unit M connected the aperture stop to move the aperture stop within the light beam, and an arithmetic processing unit connected the converging position detection unit to calculate an aberration of the measurement target optical system PL on the basis of an output signal from the converging position detection unit DET.

Abstract: The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.

Abstract: The present invention provides an inexpensive and convenient method and apparatus for measuring light transmittance of an optical lens having refractive power. The method comprises obtaining the light transmittance of an examined lens from a value corresponding to a ratio between the intensity of measured light detected by a light detector when the examined lens is placed in the path of the measured light emitted from a light source and an intensity of measured light detected by the light detector when there is no lens undergoing examination placed in the path of the measured light so that the measured light does not pass through an examined lens and provides a baseline value. Specifically, the present invention focuses (converges) the measured light at or in a vicinity of a position where the examined lens is disposed when the examined lens is placed in the path of the measured light.

Abstract: In a moiré method for measuring the distortion of an optical imaging system in which and object grid having a two-dimensional object pattern is arranged in an object plane of the imaging system and an image grid having a two-dimensional image pattern is arranged in an image plane of the imaging system, these patterns are configured in the form of, for example cross-hatched patterns or checker board patterns, are adapted to suit one another such that a two-dimensional moiré fringe pattern that may be detected by a two-dimensional, spatially resolving, detection device is created when the object grid is imaged onto the image grid using the imaging system. Distortion components of the imaging system may be simultaneously determined along two differently oriented, in particular, two mutually orthogonal, image directions from a two-dimensional moiré fringe pattern.

Abstract: A measurement device may illuminate lens 10 to be inspected with light at a plurality of different angles of incidence. The transmitted light that passes through lens 10 may be preferably detected by light detecting means 36. When light detecting means 36 detects the light, it outputs an electrical signal. Control unit 54 may (1) align light source 22 in the predetermined position and turns it on and (2) calculate the degree of refraction of the transmitted light that passes through lens 10, based upon the electrical signal output from light detecting means 36. Then, control unit 54 may further (3) conduct illumination at a plurality of different angles of incidence and obtain a plurality of “angle of incidence—degree of refraction” relationships from the degree of refraction calculated for each angle of incidence, and (4) calculate the fundamental data of lens 10 by using the plurality of “angle of incidence—degree of refraction” relationships.

Abstract: A method and system for inspecting ophthalmic lenses using absorption where an ophthalmic lens is illuminated with light comprising wavelengths that are substantially absorptive to said lens, the image subsequently detected being created using only light at said absorptive wavelengths. Variations in transmitted light intensity translate into thickness changes in the lens caused by cosmetic flaws. The invention is also directed to imaging lens assemblies employing highly positive-powered field flattening lens elements to image a curved object, such as an ophthalmic lens, onto a flat image plane.

Abstract: In a cup attaching apparatus, a cup is attached as a processing jig to a subject lens along a reference axis, the lens and an index plate having an index of a predetermined pattern are illuminated by substantially parallel rays of light shaped into a diameter larger than a diameter of the lens so that an image of the lens and an image of the index are projected onto a screen, and the index image projected onto the screen is detected, whereas an entire image of the lens projected onto the screen is picked up. An optical center of the lens with respect to the reference axis is obtained on the basis of the index image detected by said detecting means, thereby displaying in a superposed manner alignment information indicating a relative position of the optical center with respect to the reference axis and the image thus picked up. The alignment is effected while observing the displayed information.

Abstract: A method for compensating for lens aberrations, which includes the steps of: (a) defining a cost metric which quantifies an imaging performance of an imaging system, where the cost metric reflects the effects of lens aberrations on the imaging performance; (b) defining a source illumination profile; (c) evaluating the cost metric based on the source illumination profile; (d) modifying the source illumination profile, and re-evaluating the cost metric based on the modified source illumination profile; and (e) repeating step (d) until the cost metric is minimized. The source illumination profile corresponding to the minimized cost metric represents the optimal illumination for the imaging device.

Abstract: A pattern arranged on an object is sequentially transferred onto a wafer arranged on an image plane side of a projection optical system so as to form a matrix shaped first area, which is made up of a plurality of divided areas, and in the periphery of the first area an overexposed second area is formed. And, a formed state of an image of the pattern in a plurality of divided areas is detected by an image processing method such as contrast detection. In this case, since the overexposed second area is located on the outer side of the first area, the borderline of the divided areas in the outermost section of the first area and the second area can be detected with a good S/N ratio, and the position of other divided areas can be calculated with substantial precision, with the borderline serving as datums. Accordingly, the formed state of the pattern image can be detected in a short period of time.

Abstract: A lens evaluation method for calculating resolution evaluation value based on a detected luminance value in order to evaluate resolution of lens has a background luminance value acquiring step for acquiring a luminance value at a background part having no test pattern formed thereon, a maximum luminance value acquiring step for acquiring maximum luminance value in the test pattern image, a minimum luminance value acquiring step for acquiring minimum luminance value and an evaluation value calculating step for calculating a resolution evaluation value based on the luminance values obtained in the respective steps.

Abstract: A correlation between develop inspect (DI) and final inspect (FI) profile parameters are established empirically with test wafers. During production, a wafer is measured at DI phase to obtain DI profile parameters and FI phase profile parameters are predicted according to the DI profile parameters and the established correlation. Each wafer is subsequently measured at FI phase to obtain actual FI profile parameters and the correlation is updated with actual DI and FI profile parameters.

Abstract: An image lens distortion correcting method having step (A) for printing an arbitrary image I1 in a computer; step (B) for photographing the printed image I1 with a camera having a lens distortion and obtaining a photographed image I2 in the computer; step (C) for obtaining a parameter &thgr; such that the image I1 is artificially distorted with the parameter &thgr; and an obtained distorted image I1ud equals with the photographed image 2; and step (D) for using the obtained parameter &thgr; to correct the image photographed by the camera. Thereby, (1) no correspondence point needs to be given, (2) no special tool or object is used, and (3) all points on the image are used, so that an internal parameter can automatically be obtained with high precision, and image lens distortion can be corrected with high precision.

Abstract: An assembly and method for inspecting ophthalmic lenses includes a light source and a 360° light structuring aperture configured to direct structured light toward an open center where a lens is positioned for imaging by an imaging device positioned beneath the assembly. The structured light is directed at the entire periphery of the lens and is internally reflected by the lens in the manner of a fiber optic conduit whereby the lens appears dark at clear areas of the lens. If there are defects or imprints on the lens, the internally reflected light will scatter at that point and appear as a bright spot to the imaging device.

Abstract: A method of detecting aberrations associated with a projection lens utilized in an optical lithography system. The method includes the steps of forming a mask for transferring a lithographic pattern onto a substrate, forming a plurality of non-resolvable features disposed on the mask, where the plurality of non-resolvable features are arranged so as to form a predetermined pattern on the substrate, exposing the mask using an optical exposure tool so as to print the mask on the substrate, and analyzing the position of the predetermined pattern formed on the substrate and the position of the plurality of non-resolvable features disposed on the mask so as to determine if there is an aberration. If the position of the predetermined pattern formed on the substrate differs from an expected position, which is determined from the position of the plurality of non-resolvable features, this shift from the expected position indicates the presence of an aberration.

Abstract: The present invention provides a lens inspection apparatus and an inspection sheet that make is possible to easily evaluate the resolution of a lens at low cost. A lens inspection apparatus can include an inspection sheet having a test pattern, a sliding holding portion for holding the inspection sheet, a light source for introducing a light beam into the test pattern of the inspection sheet held by the sliding holding portion, a rotary holding portion for holding the sliding holding portion so that the sliding holding portion can rotate in a plane, and a measuring section for capturing an image projected on a screen through the inspection sheet and a projection lens to be inspected, and subjecting the image to image processing. The test pattern has a measuring region in which linear light-shielding portions are arranged in stripes so as to achieve a predetermined spatial frequency.

Abstract: A method of correcting aberrations in an optical system by applying a light adjustable aberration conjugator layer to a component of the system, determining the nature of the aberration, applying radiation to the conjugator layer such as to change the refraction and/or shape of the conjugator layer to compensate for the aberration, and locking in the desired optical property.

Abstract: An aberration mark for use in an optical photolithography system, and a method for estimating overlay errors and optical aberrations. The aberration mark includes an inner polygon pattern and an outer polygon pattern, wherein each of the inner and outer polygon patterns include a center, and two sets of lines and spaces having a different feature size and pitch that surround the outer polygon pattern. The aberration mark can be used to estimate overlay errors and optical aberrations. In some embodiments, the mark can also be used with scatterometry or scanning electron microscope devices. In other embodiments, the mark can be used to monitor aberrations of a lens in an optical photolithography system.

Abstract: A lens meter according, including: a unit body provided with eyeglasses support means for supporting eyeglasses; a left measurement optical system provided in the unit body and provided with a left light-emitting optical system that emits measurement light to a left eyeglass lens of the eyeglasses and a left light-receiving optical system that receives the measurement light passing through the left eyeglass lens with a CCD (light-receiving element); a right measurement optical system provided in the unit body and provided with a right light-emitting optical system that emits measurement light to a right eyeglass lens of the eyeglasses and a right light-receiving optical system that receives the measurement light passing through the right eyeglass lens with the CCD (light-receiving element); and an arithmetic control circuit that performs operation to the optical characteristics of a pair of the eyeglass lenses based on an output of the CCD (light-receiving element).

Abstract: A method for measuring the optical parameters of a phase object, comprising recording a moiré pattern viewed through said phase object, said moiré pattern being formed by illuminating by means of a source of diffuse light, first and second gratings positioned in the space between said light source and said phase object, wherein the plane of said first grating is parallel to the plane of said second grating, and calculating the optical parameters of interest from said moiré pattern.

Abstract: A device for testing sunglasses is disclosed, including an image to be viewed having a light source configured to project light in a direction from which the image is viewed, the projected light being chosen so as to simulate specific lighting conditions such as snow, beach or desert lighting conditions. Also, a method for testing sunglasses is disclosed. An image, such as a physical picture is placed in the line of sight of a person wearing a pair of sunglasses. Light simulating specific lighting conditions is projected at the person. By looking at the image while being illuminated, the person can evaluate the efficacy and comfort of the glasses. Also, a method of selling sunglasses is disclosed. A purchaser wears a pair of sunglasses to be purchased while being subjected to lighting conditions simulating conditions where the glasses are to be worn.

Abstract: The invention enables more objective defect evaluation of ophthalmic lenses, especially contact lenses, to take place through the combination of the schlieren method with the transmitted light method, with the result that the advantages of these two different systems are combined. The schlieren method is in a position to illustrate the edge of a contact lens and its ruptures, in high contrast, for the CCD camera. Likewise, tears and surface defects can be made visible. Using the transmitted light method, the bubbles may be suitably prepared for the camera.

Abstract: A method for evaluating the quality of a lens comprising illuminating imaging light on a screen through the lens to form a projected image, where the imaging light having a test-pattern image is generated using a test sheet on which a test pattern for measuring a resolution of the lens is formed to evaluate the resolution of the lens; detecting a brightness of the test-pattern image displayed on the screen by an image-capturing device using an imaging sensor; calculating an input level on the basis of the detected brightness of the test-pattern image; and calculating an evaluated value of resolution. The method, further comprises adjusting a position of the test sheet to a position corresponding to a focus of the lens by detecting the test-pattern image while moving the test sheet back and forth in the direction along an optical axis of the lens.

Abstract: A method of detecting aberrations associated with a projection lens utilized in an optical lithography system. The method includes the steps of forming a mask for transferring a lithographic pattern onto a substrate, forming a plurality of non-resolvable features disposed on the mask, where the plurality of non-resolvable features are arranged so as to form a predetermined pattern on the substrate, exposing the mask using an optical exposure tool so as to print the mask on the substrate, and analyzing the position of the predetermined pattern formed on the substrate and the position of the plurality of non-resolvable features disposed on the mask so as to determine if there is an aberration. If the position of the predetermined pattern formed on the substrate differs from an expected position, which is determined from the position of the plurality of non-resolvable features, this shift from the expected position indicates the presence of an aberration.

Abstract: In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

Abstract: An automated apparatus and method for measuring properties of optical components based on wavefront sensing and analysis. A wavefront of predetermined profile is directed at a surface to be measured so that it is more or less distorted in accordance with the shape of the surface and the distorted wavefront is sensed and analyzed. From the information derived from the distorted wavefront and other knowledge of the relationship between the surface and position of the wavefront of predetermined profile, the shape of the surface maybe inferred along with other properties such as radius of curvature, focal length, conic constants, asphericity, toricity, tilt, and decentering. Concave, convex, cylindrical, and flat parts may be measured along with wavefront errors in bandpass transmitting components such as lenses, filters, and windows.

Abstract: [Object] To automate determination of the quantity of a index matching liquid.

Abstract: An apparatus for inspecting a collimator including a pigtail formed with first and second fibers, a GRIN lens disposed coaxially relative to the pigtail, and a glass tube supporting the pigtail and the GRIN lens in a single unit, to inspect optical properties of the collimator, comprising an inspection table; a gripping part, which is provided on the inspection table, gripping the collimator subject to inspection; a light supplying part transmitting a predetermined optical signal to the first fiber; a light receiving part, which is connected to the second fiber, receiving an optical signal returned from the second fiber, entering the first fiber; a measuring part calculating a value of the predetermined optical signal, which entered the first fiber, and a value of the optical signal, which returned from the second fiber; and an image displaying part displaying the value obtained from the measuring part.

Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

Abstract: A method of correcting aberrations in an optical system by applying a light adjustable aberration conjugator layer to a component of the system, determining the nature of the aberration, applying radiation to the conjugator layer such as to change the refraction and/or shape of the conjugator layer to compensate for the aberration, and locking in the desired optical property.

Abstract: An inspection system and method are disclosed. The inspection system is configured to inspect a projection unit having multiple optical subsystems. The optical subsystems are configured to project an image during a lithography step. The inspection system provides self calibration by measuring both a test mask and the aerial image of the test mask with the same detector assembly. The inspection system is also capable of measuring multiple fields simultaneously using multiple detectors and 6 axis interferometry to accurately determine the position of each detector. Additionally, the inspection system is capable of measuring the distance between the test mask and the detector assembly with an indirect path around the projection unit which normally blocks the direct path.