Abstract: Disclosed is a method of measuring aberration of a projection optical system, that includes an illuminating step for illuminating a reticle by use of light from a light source and through an illumination optical system, a projecting step for projecting an image of a test pattern formed on the reticle, upon a substrate through the projection optical system, a measuring step for measuring a positional deviation amount of the image of the test pattern, and a determining step for determining the aberration of the projection optical system on the basis of the positional deviation amount measured at the measuring step, wherein the projecting step includes a shaping step for shaping the light by use of shaping means disposed in one of the illumination optical system and the projection optical system and a light blocking pattern formed on a surface of the reticle, remote from a surface of the reticle where the test pattern is formed, so that the light passes only through a predetermined region of a pupil of the proje

Abstract: An optical lens testing device (10) includes a light source (12), a resolution test chart (16), and a diffusion plate (14). The diffusion plate (14) is disposed between the light source (12) and the resolution test chart (16). The diffusion plate (14) includes a base (141) and a diffusion layer (142) formed thereon. The diffusion layer (142) has a plurality of nano-sized silicon dioxide particles (144) dispersed therein for uniformly dispersing the light beams emitted from the light source (12) so as to improve the precision and reliability of the optical lens testing device (10).

Abstract: A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.

Abstract: A system and method for characterizing an imaging system causes a diffraction image indicative of a test structure having a generalized line-grating to be formed and then extracts from a measurement of the diffraction image a lens transmittance function, a photoresist property or a defocus distance.

Abstract: An optical object distance simulation device is disclosed. The device has an optical lens module composed of a plurality of optical lens and the optical lens module is arranged between an optical lens and a chart for simulating the real object distance and reducing the space required for testing an optical lens. Moreover, the optical lens module is separated from a light-emitting element, a power supply or any heat-generating elements all separated from the optical lens module. Furthermore, the heat-dissipating elements are arranged near elements that generate substantial heat. Hence, not only does the present invention have a good heat-dissipating effect, but it also prevents external dust from polluting the optical lens module because of the positioning of the heat-dissipating element and the heat-dissipating hole.

Abstract: A wavefront aberration measuring method for measuring wavefront aberration of a projection optical system. The method includes providing a reticle having lines and spaces in which, with respect to a repetition direction thereof and from a center to a periphery, a pitch of the spaces is substantially constant while widths of the spaces gradually decrease and in which adjacent lines are not resolvable by the projection optical system, projecting light fluxes to the lines and spaces from different directions, whereby plural images of the lines and spaces are formed through the projection optical system, and detecting respective positions of the plural images and detecting, by use of the result of the detection, the wavefront aberration of the projection optical system.

Abstract: A system for the inspection of the optical quality of a part, object or product having a portion comprising transparent material such as ophthalmologic lenses, protective eyewear, visors, eyewear shield and the like is provided. A liquid crystal display (LCD) screen emits variable patterns of light through the transparent part under inspection to a charged coupled device (CCD) camera that captures the image and transmits the image data to an image processing module. The processed image data are then transmitted to an analysis module which then generally measures the dimensions of the part, the transparency, the colour and the optical strength. The analysis module also advantageously detects and measures the presence of dots, stains, scratches, optical distortions, fingerprints, cloudiness and other optical artefacts and/or defects in the transparent material. Accordingly, the patterns emitted by the LCD screen are designed to measure the optical specifications and highlight potential optical defects.

Abstract: An apparatus measures optical deviations caused by an aircraft canopy. In this apparatus, a light source generates a beam of light. A collimator, optically coupled to the light source, then collimates the beam of light. An optical assembly patterns the collimated beam of light into a patterned array of subaperture beams, which is directed onto an imaging screen. The patterned collimated beam of light produces images, which are electronically imaged and recorded to memory. An undistorted image results when the aircraft canopy is not placed in a path of the patterned collimated beam of light. However, a distorted image results when the aircraft canopy is placed in a path of the patterned collimated beam of light and distorts the patterned collimated beam of light. A processing unit compares the distorted image to the undistorted image to determine the optical distortions caused by the aircraft canopy.

Abstract: An optical system that includes a molded optical element having a non-uniform refractive index distribution due to molding and a method of manufacturing the optical system is disclosed. Data of the non-uniformity of the refractive index distribution associated with molding of the molded optical element is acquired and used in order to determine the form of an aspheric surface of the molded optical element for correcting aberrations caused by the non-uniformity of the refractive index distribution. This data may be acquired by measuring the refractive index distribution of an optical element molded based on initial design values that are based on assuming uniformity in the refractive index distribution of the molded optical element or it may be computed based on the form of the molded optical element. The optical element may include a concave optical surface and may be a lens element that includes an aspheric surface.

Abstract: A method for designing, an optical assembly (16) for transmitting an illumination beam (334) includes the steps of selecting an optical element (32), selecting at least two rays (356) from the illumination beam (334), and calculating a contrast of the at least two rays (356) that exit the optical element (32) based on the at least two rays (356). With this design, one or more parameters of the optical element (32) can be adjusted and the contrast recalculated until the performance characteristics of the optical element (32) are optimized. For example, the optical element (32) can include a crystalline first optical component (350) and a crystalline second optical component (352) that are stacked on each other and that are rotated relative to each other a rotation angle (358). The first optical component (350) has a FOC thickness (360) and a FOC entry curvature (362) and the second optical component (352) has a SOC thickness (366) and a SOC entry curvature (368).

Abstract: Method and apparatus for setting optical imaging properties using radiation treatment, specifically a method and an apparatus for setting the imaging properties of an optical system with radiation treatment of at least one optical element of the optical system in the installed state, and a method for setting the imaging properties of an internal optical element with radiation treatment. A measurement is carried out on the optical system in order to determine one or more aberrations in a spatially resolved fashion, a correction that changes the shape and/or refractive index of the internal optical element is calculated in order to reduce the measured aberration or aberrations, and the optical element is irradiated with the aid of a processing radiation that changes the shape and/or refractive index, in accordance with the calculated correction.

Abstract: In accordance with one embodiment of the present invention, a method of characterizing a lens is provided. According to the method, an optical source such as a laser is configured to generate a collimated beam that is focused along an optical axis at a distance fext. A test lens is placed along the optical axis, wherein the test lens is characterized by an effective focal length fi that is substantially independent of incident irradiance. An output beam generated from the focused optical source and the test lens defines an output intensity profile at an observation plane located a distance Z0 from the focal point of the optical source. The on-axis intensity I of the output intensity profile along the optical axis at the observation plane is monitored as the placement of the test lens along the optical axis is varied. A z-scan signature of the test lens is generated from the monitored intensity I.

Abstract: An optical nulling apparatus for testing an optical surface includes an aspheric mirror having a reflecting surface for imaging light near or onto the optical surface under test, where the aspheric mirror is configured to reduce spherical aberration of the optical surface under test. The apparatus includes a light source for emitting light toward the aspheric mirror, the light source longitudinally aligned with the aspheric mirror and the optical surface under test. The aspheric mirror is disposed between the light source and the optical surface under test, and the emitted light is reflected off the reflecting surface of the aspheric mirror and imaged near or onto the optical surface under test. An optical measuring device is disposed between the light source and the aspheric mirror, where light reflected from the optical surface under test enters the optical measuring device.

Abstract: An apparatus for wavefront detection includes a wavefront source for the production of a wavefront, an optical system transforming the wavefront, a diffraction grating through which the transformed wavefront passes, and a spatially resolving detector following the diffraction grating. The wavefront source has a two-dimensional structure.

Abstract: The invention relates to a system, method and device for evaluating imperfections in a lens for a display for an electronic device. For the device, it comprises: a substrate; and a pattern imposed on the substrate. For the pattern, when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens. For the system, it comprises: an evaluation table for the lens, the table having a mounting area; and a substrate for mounting on the mounting area, the substrate having a pattern imposed thereon wherein when the pattern is viewed through the lens, the pattern is noticeably distorted around an area where a defect is present in the lens.

Abstract: In one aspect, the invention relates to an optical apparatus for producing light of a predetermined intensity from light sources of less than the predetermined intensity. In one embodiment the apparatus includes a first light source; a second light source; a double dove anti-Gaussian generator in optical communication with the first light source; and a compensator in optical communication with the second light source. Light from the first light source passes through the double dove anti-Gaussian generator and light from the second light source passes through the compensator, and are combined to produce a flattened Gaussian intensity distribution. In another aspect, the invention relates to a method and apparatus for separating an image into subunits and reading the separate subimages out of the detectors in parallel.

Abstract: Embodiments of the present invention provide methods and systems for integrating optical interfacial elements with a high power acoustic resonator. More specifically, but not by way of limitation, in certain embodiments of the present invention, one or more optical interfacial elements may be integrated with a high power acoustic resonator to provide a robust sensing device that may provide for acoustic cleaning of the optical interfacial elements and/or combining optical and acoustic measurements made by the integrated system for analysis purposes. In certain aspects, the high power acoustic resonator may include an acoustic horn for focusing acoustic energy and the optical interfacial elements may be integrated with the acoustic horn.

Abstract: A system for orthogonal alignment of a specimen disclosed. The system includes a light-beam illumination source, collection optics, imaging optics, and a tiltable specimen holder. The light-beam source is activated to illuminate a spot on the specimen, and the imaging optics is used image that spot. The location of the spot on the imager is used to determine whether the specimen is orthogonal to the optical axis of the collection optics.

Abstract: The system comprises a light source, supplying an incident light beam illuminating the ophthalmic lens. On the optical path of the incident beam, reflecting means are arranged downstream from the ophthalmic lens and a collimation and magnifying lens is arranged upstream from the ophthalmic lens. A camera, the lens, the ophthalmic lens and the reflecting means are arranged on the same main optical axis. The reflecting means comprise a plurality of flat reflecting faces, arranged in the form of at least one cube corner block open in the direction of the ophthalmic lens. The flat faces can form a matrix of adjacent cube corner blocks made of plastic.

Abstract: An optical object distance simulation device is disclosed. The device has an optical lens module composed of a plurality of optical lens and the optical lens module is arranged between an optical lens and a chart for simulating the real object distance and reducing the space required for testing an optical lens. Moreover, the optical lens module is separated from a light-emitting element, a power supply or any heat-generating elements all separated from the optical lens module. Furthermore, the heat-dissipating elements are arranged near elements that generate substantial heat. Hence, not only does the present invention have a good heat-dissipating effect, but it also prevents external dust from polluting the optical lens module because of the positioning of the heat-dissipating element and the heat-dissipating hole.

Abstract: A method and system for monitoring a curvature of a micro-lens in-line is disclosed. According to embodiments, sizes of circles (or circle images) from a top view of a micro-lens are measured and correlated to a change in focus depth of an optical scope. A method in accordance with embodiments can include the steps of: (i) measuring a diameter or area of a circle in the micro-lens when focusing a scope on a top point of the micro-lens; (ii) measuring a diameter or area of one or more second circles in the micro-lens by focusing the scope on one or more points lower than the top point of the micro-lens in stages, each stage correlated to changing a depth of focus of the scope; and (iii) calculating the curvature of the micro-lens with each diameter or area of the measured circles.

Abstract: The illumination profile of a radiation beam is initially measured using a CCD detector. A reference mirror is then placed in the focal plane of the high aperture lens and the reflected radiation measured. By comparing the illumination profile and the detected radiation it is possible to determine the transmission losses for S and P polarisation which can then be used in scatterometry modeling.

Abstract: In a method according to one embodiment of the invention, aberrations in a lithographic apparatus are detected by printing a test pattern having at least one degree of symmetry and being sensitive to a particular aberration in the apparatus, and using a scatterometer to derive information concerning the aberration. The test structure may comprise a two-bar grating, in which case the inner and outer duty ratios can be reconstructed to derive information indicative of comatic aberration. Alternatively, a hexagonal array of dots can be used, such that scatterometry data can be used to reconstruct dot diameters indicative of 3-wave aberration.

Abstract: A surface to be tested and an optical system for projecting an index to an apparent spherical center position of the surface to be tested are moved relative to each other and an eccentric quantity of the surface to be tested is calculated from an movement quantity. A focal distance of an optical system is changed according to an apparent radius of curvature of each surface to be tested, which is calculated in advance. A reflection image on a surface to be tested, which is to be measured, is determined from the apparent radius of curvature of each surface to be tested, which is calculated in advance. Thus, an eccentric quantity of the entire lens system is accurately measured.

Abstract: An object pattern is imaged by an imaging system onto the image plane of the imaging system at a location where a reference pattern suited to the object pattern is situated in order to measure the imaging fidelity of an optical imaging system, for example, an eyeglass lens, a photographic lens, or a projection lens, for use in the visible spectral range. The resultant, two-dimensional, superposition pattern is detected in a spatially resolved manner in order to determine imaging parameters therefrom. The object pattern is generated with the aid of at least one electronically controllable pattern generator that serves as a self-luminous, electronically configurable, incoherent light source and may, for example, have a color monitor. The measuring system allows rapidly, flexibly, checking optical imaging systems with minimal time and effort spent on the mechanical setup required.

Abstract: Estimating one or more optical characteristics of a Device-Under-Test (DUT). The method, includes directing an optical wavefront, generated by a source, towards a test location and generating at least one ray from the wavefront at the test location. Then for each ray at two or more measurement planes, each measurement plane transverse to the direction of travel of the wavefront and beyond the test location relative to the source at different optical path distances, measuring respective points of intersection of the ray with the measurement planes with and without the DUT at the test location.

Abstract: A device and a method for testing lens modules are disclosed in accordance with a preferred embodiment. The device includes a testing platform, an image sensor, a light source assembly, and a turnplate. The testing platform defines a receiving opening for receiving the turnplate therein. The image sensor faces towards the receiving opening. The light source assembly is disposed at a side of the testing platform opposite to the image sensor. The light source assembly is aligned with respect to the image sensor. The light source assembly is configured for providing a testing specimen. The turnplate defines at least two through holes. Each through hole is configured for receiving the lens modules therein and being sequentially aligned with respect to the image sensor. The image sensor is configured for catching images of the testing specimen formed by the lens module in each through hole.

Abstract: A lens-refracting characteristic measuring apparatus includes a measuring optical device to measure refracting characteristics of eyeglass lenses, an input device to input a pupillary distance of eyes of a person wearing eyeglasses, and an arithmetic and control circuit for obtaining refracting characteristics of the eyeglass lenses in positions of centers of right and left pupils of the person wearing the eyeglasses based on the pupillary distance of right and left eyes of the person wearing the eyeglasses input by the input device and the refracting characteristics measured by the measuring optical device.

Abstract: An optical apparatus which includes an image forming optical system having a movable optical element, and a driving mechanism configured to move the optical element. The apparatus includes a first block which measures a wavefront aberration of the optical system. A second block obtains a linear evaluation value of an aberration expressed by a linear function of a position of the movable optical element out of aberrations of the optical system, and a quadratic evaluation value of a square of a root mean square of the wavefront aberration measured by the first block expressed by a quadratic function of the position. A third block uses a dummy variable as an upper limit value of the linear evaluation value and obtains a minimum value of the dummy variable by a linear programming. A fourth block determines a position of the optical element to be moved by the driving mechanism.

Abstract: A process for the determination of focal plane deviation uniquely due to the lens field curvature associated with a photolithographic projection tool is described. A series of lithographic exposures is performed on a resist coated silicon wafer using a stepper or scanner running in static mode. The lithographic exposures produce an array of focusing fiducials that are displaced relative to each other in a unique way. The resulting measurements are fed into a computer algorithm that calculates the lens field curvature in an absolute sense in the presence of wafer height variation and varying stage performance.

Abstract: A method of testing a coating on a reflector having a first focal point includes placing a mirror at the first focal point of the reflector and angled to orient with an area on the coating. Electromagnetic (EM) radiation is directed to the mirror which then directs the EM radiation on the area. The EM radiation which is reflected from the coating is collected onto a sensor disposed at a second focal point. The intensity of the EM radiation collected on the sensor is detected.

Abstract: Methods and systems are described for a system for measuring aberrations in a wave front. In the improved system multiple closely-spaced, small-aperture laser beams traverse an aberrating flow that introduces deflections of small-aperture laser beams from which aberrated wavefronts can be constructed. These beams may then be focused on position sensing devices using focusing lenses. The position sensing devices may then detect the positions of these beams and a difference between the detected position and the unaberrated position of the beams detected. This information may then be used to determine information regarding the optical aberrations introduced by the flow that may be used, for example, in improving communications systems and/or laser weapon systems.

Abstract: An electronic imaging apparatus includes a connecting section connected to an optical apparatus; an optical element having a preset transmittance with respect to light in a preset wavelength region, incident from the optical apparatus; and an electronic image sensor receiving the light transmitted through the optical element.

Abstract: An apparatus for measuring the eccentricity of the aspherical surface has a light source unit; a condenser lens condensing light rays in the proximity of the center of paraxial curvature of a surface to be examined, of an aspherical lens; an angle changing means for entering the rays on the surface to be examined, at angles ?1i (i=1, 2, . . . , N) with an optical axis; a holding tool of the aspherical lens; a light-splitting element; an imaging lens; a light-detecting element detecting the situation of light collected by the imaging lens; and an arithmetical unit. The arithmetical unit is such as to calculate the amount of eccentricity of the surface to be examined, from amounts of shift ?P1i (i=1, 2, . . . , N) between spot positions P1i (i=1, 2, . . . , N) based on the design data of the surface to be examined and spot positions P1mi (i=1, 2, . . . , N) derived from the light-detecting element, with respect to light rays Q1i (i=1, 2, . . . , N) produced by the angle changing means.

Abstract: A measurement device may illuminate lens 10 to be inspected with light at a plurality of different angles of incidence. The transmitted light that passes through lens 10 may be preferably detected by light detecting means 36. When light detecting means 36 detects the light, it outputs an electrical signal. Control unit 54 may (1) align light source 22 in the predetermined position and turns it on and (2) calculate the degree of refraction of the transmitted light that passes through lens 10, based upon the electrical signal output from light detecting means 36. Then, control unit 54 may further (3) conduct illumination at a plurality of different angles of incidence and obtain a plurality of “angle of incidence—degree of refraction” relationships from the degree of refraction calculated for each angle of incidence, and (4) calculate the fundamental data of lens 10 by using the plurality of “angle of incidence—degree of refraction” relationships.

Abstract: A reflection-testing device for testing for unwanted reflections in a lens module (12) includes a plurality of light sources (18) and an image capturer (16). The plurality of light sources is provided around the top end of the lens module, and the image capturer is provided near the other end of the lens module for receiving optical signals through the lens module. A lens reflection testing method is also disclosed.

Abstract: A reflection-testing device for reflection testing of a lens module (12) includes a light source (18), which can emit light in an annular pattern, and an image capturer (16). The light source is provided around the top end of the lens module, and the image capturer is provided near the other end of the lens module for receiving an optical signal through the lens module. A reflection testing method is also disclosed.

Abstract: A lens meter that measures optical characteristics of lenses of an eyeglass unit and an inspection glass unit, including a glass unit support, light sources, light-projecting and -detecting optical systems, light detectors, and inspection glass frame adaptors for the inspection glass unit. The support includes two sandwiching members displaceable to sandwich an outer peripheral portion of the eyeglass unit, and the adaptors can be fitted to and detached from the sandwiching members. The adaptors include projecting sandwiching portions projecting toward opposite sandwiching members when the adaptors are fitted to the sandwiching members and which contact portions of the inspection glass unit's frame, other than movable areas of tabs of detachable lenses projecting from a frame of an inspection glass lens unit supported by the support as the eyeglass unit, whereas adaptor portions other than the projecting sandwiching portions do not interfere with the movable areas of the tabs.

Abstract: Apparatus, and a related method, for eliminating the effect of speckle images caused by surface imperfections in a primary mirror of a stellar coronagraph. Depending on their size, mirror imperfections can result in speckles in a field of view that also includes an image of a distant target planet. By generating a traveling surface wave in the mirror surface, and then tuning the spatial wavelength of the surface wave to approximately match that of a surface imperfection, the speckle image corresponding to that surface imperfection is made to twinkle in irradiance. Tuning the traveling surface wave though a wide range of spatial wavelengths causes each speckle image in turn to be identified by twinkling, while the target planetary image remains unvarying. Accordingly, multiple speckles corresponding to different mirror imperfections may be conveniently eliminated by image processing.

Abstract: A lens meter for measuring refractive power distribution of a progressive power lens and displaying its distribution map, has a lens rest having an aperture, an optical system including an axis, a source projecting a light bundle along the axis, a plate having targets and a two-dimensional image sensor detecting images by the bundle passing through the lens, aperture and plate, a part calculating the distribution within a measurement region from detection results, a part detecting a lens-position in a two-dimensional direction orthogonal to the axis, a device guiding movement on the rest to shift the measurement region and obtaining the distribution within an analysis region including distance, progressive and near portions, a part storing the distribution in the measurement region in association with the detected position, a display part, and a part controlling to display the distribution map within the analysis region based on the stored distribution and position.

Abstract: A method of optimizing the predictability of a vision correction procedure by comparing historical data, including the vision defect, the correction method and outcome, in terms of wavefront aberrations with a patient's condition to select an acceptable procedure. The patient's eye is examined and an optical model is created and compared to the historical data to select an acceptable procedure. The procedure is performed and the outcome is included in the data base.

Abstract: A process for providing illumination source conditions for the accurate determination Zernike tilt coefficients in the presence of coma is described. Large feature-shift coma sensitivity is simulated for a range of illumination conditions. The resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified. The optimized set of source shapes can be used to more accurately determine Zernike terms a2 and a3 using a variety of methods. Knowledge of the lens distortion data in the absence of coma induced shifts can be entered into more traditional overlay regression routines to better identify systematic and random error.

Abstract: Described are a method and apparatus for analysing an optical device, including: a) arranging an illuminating device which generates a test beam, the optical device that the test beam passes and a position-resolving sensor device which detects the test beam, relative to each other in a reference position that establishes a reference beam path; b) transmitting the test beam in a plurality of relative positions off set with respect to the reference position, relative to the reference position, the test beam being incident upon a measuring point assigned to the respective relative position on the optical device; c) detecting, for a respective relative position, a position of incidence of the test beam, after it passes the optical device, on one or a plurality of planes of detection offset relative to each other; d) determining the beam path of the test beam from the positions of incidence detected in step c) for each relative position and calculating optical characteristics of the optical device.

Abstract: An automated lens inspection system that images the edge and surface of an ophthalmic lens transmits light through the ophthalmic lens to a camera to create a complete digital image of the lens edge or lens surface. The digitized image(s) is(are) analyzed to detect defects or abnormalities of the ophthalmic lens. Methods of inspecting ophthalmic lenses are also disclosed.

Abstract: A detection method for detecting quality of an optical element includes the following steps. Firstly, a point light source is provided. Then, the point light source is allowed to penetrate through the optical element, thereby forming a first optical image on an optical image processing device. Then, the position of the optical element is adjusted when there is a shade block included in the first optical image, and the point light source is allowed to penetrate through the optical element after the adjusting step, thereby forming a second optical image on the optical image processing device. Afterward, the first optical image is compared with the second optical image to discriminate whether the shade block is synchronously moved with position adjustment of the optical element so as to realize the quality of the optical element.

Abstract: There is disclosed an exposure method for correcting a focal point, comprising: illuminating a mask, in which a mask-pattern including at least a set of a first mask-pattern and a second mask-pattern mutually different in shape is formed, from a direction in which a point located off an optical axis of an exposure apparatus is a center of illumination, and exposing and projecting an image of said mask-pattern toward an image-receiving element; measuring a mutual relative distance between images of said first and second mask-patterns exposed and projected on said image-receiving element, thereby measuring a focal point of a projecting optical system of said exposure apparatus; and moving said image-receiving element along a direction of said optical axis of said exposure apparatus on a basis of a result of said measurement, and disposing said image-receiving element at an appropriate focal point of said projecting optical system.

Abstract: An apparatus and method for automatically focusing a miniature digital camera module (MUT) is described. A MUT is loaded onto a test fixture and aligned with an optics system of a test handler. Focus targets contained within two target wheels are positioned over an optical centerline above the digital camera module using stepper motors. A field lens is positioned to focus an image of the targets onto the lens opening of the MUT. The image can be of a single target or a combination of targets contained on the target wheels at various optical distances from the MUT. A focusing unit adjusts the lens cap of the MUT for a best focus setting and after the MUT has been tested the best focus setting if physically fixed by permanently connecting the lens cap to the body of the MUT.

Abstract: A method for evaluating the refractive index homogeneity of an optical member includes passing light through an optical member (1) used for photolithography. The side surface (1a) with respect to the optical axis (AX) of the optical member (1) is retained by elastic members (4) at a plurality of positions disposed at equal intervals to pass light through the optical member (1) and measure a wave front aberration. The optical member is rotated around the optical axis (AX) by the equal interval to measure a wave front aberration again and determine the difference from the initial measurement. The optical member (1) is moved in a direction perpendicular to the optical axis (AX) to measure a wave front aberration again and determined the difference from the initial measurement. The refractive index homogeneity of the optical member can be accurately evaluated from those differences by using fitting of the Zernike cylindrical function.

Abstract: A lens meter excellent in operability during alignment capable of informing in which direction a subject lens should be moved. A lens meter has a measurement optical system having an optical axis, a light source projecting a light bundle onto the lens, and a photo-sensor photo-receiving the bundle, a part which obtains the optical characteristics from a photo-receiving result, a device which detects an alignment condition of a desired position or region with the axis, a part which displays an alignment screen, and a part which provides fixed display of a target mark indicating a measurement position or region and provides movable display of a lens mark representing the lens and a guide mark indicating an alignment target position or region, where a movement direction of the lens relative to the axis coincides with movement directions of the lens mark and the guide mark relative to the target mark.

Abstract: Characterization of an optical system is quickly and easily obtained in a single acquisition step by obtaining image data within a volume of image space. A reticle and image plane are positioned obliquely with respect to each other such that a reticle having a plurality of feature sets thereon, including periodic patterns or gratings, is imaged in a volume of space, including the depth of focus. Metrology tools are used to analyze the detected or recorded image in the volume of space through the depth of focus in a single step or exposure to determine the imaging characteristics of an optical system. Focus, field curvature, astigmatism, spherical, coma, and/or focal plane deviations can be determined. The present invention is particularly applicable to semiconductor manufacturing and photolithographic techniques used therein, and is able to quickly characterize an optical system in a single exposure with dramatically increased data quality and continuous coverage of the full parameter space.