Abstract: The invention includes methods and apparatuses for inspecting optical devices, particularly contact lenses.

Abstract: A micro-object having a desired sharp point or edge may be optically tested during fabrication. This is accomplished by applying a known force to the workpiece against an optically opaque layer disposed on a transparent substrate, passing light down the workpiece toward the opaque layer, and determining whether the shaped portion of the workpiece has sufficiently penetrated the opaque layer so that light passed through the workpiece can be detected on the remote side of the transparent substrate. If the light is not detected, the shaped portion of the workpiece is considered to be insufficiently sharp, and the workpiece can be subjected to further shaping operations. In another arrangement, after the force is applied to cause penetration of the opaque layer by the shaped portion of the workpiece, the substrate and the workpiece are moved laterally with respect to one another so as to form a scratch on the opaque layer.

Abstract: Microoptical systems with clear aperture of about one millimeter or less are fabricated from a layer of photoresist using a lithographic process to define the optical elements. A deep X-ray source is typically used to expose the photoresist. Exposure and development of the photoresist layer can produce planar, cylindrical, and radially symmetric micro-scale optical elements, comprising lenses, mirrors, apertures, diffractive elements, and prisms, monolithically formed on a common substrate with the mutual optical alignment required to provide the desired system functionality. Optical alignment can be controlled to better than one micron accuracy. Appropriate combinations of structure and materials enable optical designs that include corrections for chromatic and other optical aberrations. The developed photoresist can be used as the basis for a molding operation to produce microoptical systems made of a range of optical materials.

Abstract: The present invention provides a method, apparatus and system that pre-scans and pre-treats film for improved digital film processing. The apparatus for use with the invention includes, generally, a sensor for detecting one or more imperfections on the film and a microprocessor connected to the sensor that determines the amount and extent of imperfections of the film based on one or more reference readings. The present invention may also include a tape dispenser, cleaning rollers, a blower or vacuum to remove and/or correct any imperfections in the film. One embodiment includes a cleaning system for a particle removal member which removes particles from film. The cleaning system is relatively movable and selectively contactable with the particle removal member to clean particles from the particle removal member.

Abstract: In a color filter inspection apparatus (1), an image pickup part (13) for performing an image pickup of a color filter (9) which travels along guide rails (23) from above with a line sensor (130) and a fluorescence lamp (14) for irradiating the color filter (9) with an illumination light from below are provided and an optical filter (131) which transmits a light in a predetermined wavelength band is attached to the image pickup part (13). A transmission wavelength band of the optical filter (131) is a wavelength band in which the transmittance of one color component filter of the color filter (9) is high and transmittances of other color component filters are low. It is thereby possible to inspect unevenness in color of the color filter (9) with respect to one color component filter with high precision.

Abstract: An optical component measurement system including a holding fixture adapted to hold a plurality of optical components in an array; and an optical detector movably connected to the holding fixture. The detector is movable between a front side of the holding fixture and an opposite rear side of the holding fixture for taking measurements from more than one side of the optical components in the array.

Abstract: A film thickness measuring apparatus capable of restricting a measurement area on the surface of a sample is provided. An incident optical system provides an irradiating polarized light to the surface of the sample. A detecting optical system receives the reflected light having an elliptical polarization and provides a reduced aperture that can restrict the light provided through a fiber optic conduit to a spectrometer and thereby eliminate aberrations and noise problems.

Abstract: A lighting inspection apparatus is provided which uses a small backlight comprised of a dimmer plate and a xenon lamp or a fluorescent lamp that miniaturizes the inspection apparatus for a display panel. An inspection method is described for a display panel, which uses a dimmer plate autonomously adjusting light. The apparatus for inspecting a display panel includes: a support structure disposing thereon a display panel to be inspected; a light source; and a dimmer plate with a characteristic modulating a light transmission characteristic in accordance with an intensity of light incident thereonto, the dimmer plate being disposed between the support structure and the light source, wherein light emitted from the light source is made to transmit through the dimmer plate, then made incident onto the display panel disposed on the support structure.

Abstract: An optical apparatus includes an optical device arranged on the optical path of EUV light which extends from a plasma light source to a predetermined position, an optical sensor, and a measuring device which measures the optical characteristic or its change of the optical device on the basis of an output from the optical sensor. The optical sensor measures in situ the optical characteristic or its change of the optical device arranged on the optical path by the optical apparatus arranged outside the optical path.

Abstract: An inspection method for an exposure apparatus for illuminating a photomask on a first installation member by an illumination optical system, and for projecting an image of a pattern of the photomask onto a substrate on a second installation member through a projection optical system, the inspection method comprises disposing an inspection photosensitive substrate as the substrate on the second installation member, illuminating a first region which doesn't include a pupil end of the projection optical system and a second region which includes the pupil end of the projection optical system and which isn't overlapped with the first region, in a state in which a surface of the photosensitive substrate and a surface of a secondary light source of the illumination optical system are optically conjugate with each other, and inspecting an illumination axis offset of the exposure apparatus based on a pattern obtained by developing the photosensitive substrate.

Abstract: Methods, systems and apparatuses for inspecting tinted ophthalmic parts are disclosed.

Abstract: An apparatus for monitoring the functionality of an optical element includes a detector and a light source whose radiation is reflected to the detector by a surface of the optical element facing the detector and the light source.

Abstract: [Object] To automate determination of the quantity of a index matching liquid.

Abstract: A monitoring system for detection of defects in an optical fiber coating during production of the fiber has first and second beam generating means which produce planar coherent beams which cross each other at the fiber passing through the system creating one or more diffraction patterns. A first plurality of photodetectors are mounted in a mount, the front face of which is impinged by the planar diffraction pattern, and a second plurality of photodetectors is similarly mounted in position below the impinging pattern. A defect in the fiber coating, regardless of shape or orientation, will cause the pattern or patterns to be tilted or shifted upward, downward, or planarly tilted to impinge one or more of the photodiodes which, as a result, generates a signal which is applied to a comparator and control circuit.

Abstract: An inspection method that enables efficient inspection operations before the shipment of a sheet lens product. A sheet-like Fresnel lens sheet having a masking material bonded on its light-incidence surface is placed on an operation surface equipped with a black color system of background with the light-incidence surface up. On the operation surface the masking material is exfoliated. At the same time the Fresnel lens sheet is inspected by the reflected light to thereby make an inspection of the presence or absence of a white color system of defects. Thereafter, the Fresnel lens sheet is inspected by a the transmission light.

Abstract: A method of detecting a crack in a body of a quartz window provides for having a source of a laser beam and a light receiver; applying a reflective coating onto an exterior surface of the quartz window; directing the laser beam from the source into the quartz window so that, in the course of successive reflections of the beam from an exterior surface of the quartz window, the beam undergoes a plurality of predetermined strokes within the body of the quartz window thus probing the body, making the conclusion of the absence of a crack in the body of the quartz window by receiving a reflected beam by the light receiver, which is installed so as to catch the beam having unobtrusively passed through the body of the quartz window, or arriving at the conclusion of the presence of a crack in the body of the quartz window if a reflected beam is not received by the light receiver.

Abstract: The image pick-up device picks up an image of the inspection target optical member whenever it rotates a predetermined angle. The image data which is output by the image pick-up device picking-up the image undergoes coordinate transformation from polar coordinate system to rectangular coordinate system and thereafter binarization process. The area of the defective candidate objects which are extracted from the image data in two color system obtained through the binarization process are normalized in accordance with the reference values prepared for each region in which said defective candidate objects formed within the image data. The points which are calculated as a result of this normalization, are added to the corresponding columns in the classification table. It is judged whether the inspection target optical member is satisfactory or not, in accordance with whether or not evaluation function calculated on the basis of the value in each column exceeds a predetermined reference value.

Abstract: In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

Abstract: A system and method for testing the sensitivity of optical components comprises providing an optical testing unit which measures the sensitivity of an optical device under test (DUT). The optical testing unit includes an optical transmitter, which transmits an optical test signal that is transmitted to the DUT; an optical receiver, which receives an input signal from the DUT; a graphical user interface, which provides an interface with a user; and a controller, selectively coupled to the transmitter, the receiver and the graphical user interface, wherein the controller provides a central control of the transmitter, the receiver and the graphical user interface.

Abstract: An apparatus for testing and evaluating the condition of an endoscope. The apparatus includes a guide tube dimensioned to accommodate an endoscope, the guide tube having a proximal end, a distal end, and an axis. The apparatus also includes a lens assembly at the proximal end, the lens assembly defining an eyepiece, and an endoscope support disposed in the guide tube. The lens assembly has an optical axis aligned with the guide tube axis. The endoscope support is slidably movable within the guide tube along the guide tube axis. The apparatus may also include a manually-operable device to aid in moving the endoscope support, such as a ratchet wheel rotatably disposed in a wall of the guide tube which engages a groove disposed along a length of the endoscope support, such that when the ratchet wheel is manually rotated, the endoscope support is moved within the guide tube.

Abstract: Detecting decay of equipment lens anti-reflective coating (ARC) by detecting undesired residue is disclosed. The undesired residue detected correlates with the decay of the ARC, where a greater amount of undesired residue detected indicates a greater level of the decay. The undesired residue is detected due to stray light reflected by the ARC because of its decay. In the context of semiconductor fabrication equipment, photoresist residue results from negative photoresist on a semiconductor wafer, and may be viewed on one or more scribe lines of a mask within a field of view of the lens of the semiconductor fabrication equipment.

Abstract: Disclosed is an apparatus for measuring a residual stress and a photoelastic effect of an optical fiber, which includes: a light source; a rotary type optical diffuser distanced from the light source in a predetermined distance for suppressing the spatial coherence of a light radiated in the light source; an optical condenser for condensing the radiated light passed through the optical diffuser into a spot where the optical fiber is located; a polarizer for polarizing the light passed through the optical condenser into a 45° linear polarized light from an axis of the optical fiber; a polarization analyzer, installed at 90° angle with respect to the polariscope and attached closely with the optical fiber, to prevent the penetration by the background image of the optical fiber; an optical fiber strain unit including a strain sensor for straining the optical fiber on the polarization analyzer toward a longitudinal direction and measuring the strain on the optical fiber; an object lens for magnifying the

Abstract: A system is provided for producing a high contrast image of features of an optical component. In the system of the present invention, light is focused through the optical component prior to reaching the detector of an image sensing means. In addition, a novel cuvette is provided for holding and locating an optical component in position during inspection. The cuvette comprises a bottom portion having a concave curved inner surface for utilizing the force of gravity to hold an optical component in place.

Abstract: Higher-order structure in the transparent optical polymer molding such as CD, DVD is enabled to be visualized and observed non-destructively and non-contactingly in a wide range of a microscopic level to a macroscopic level by applying light with specific wavelength to the transparent optical polymer molding from an incident optical system, and visualizing light with specific wavelength selected among a reflected wave and/or a transmitted wave of the light applied to the transparent optical polymer molding through an outgoing optical system.

Abstract: In an inspection module for inspecting optical parts (12) for defects, especially contact lenses manufactured as injection-moulded parts, the optical parts (12) are illuminated from one side and are observed from the opposite side by means of an image-resolving sensor (34). The image data of the sensor (34) are forwarded to image-processing means for identification of defects. To obtain a high throughput with a simple construction, a chain (52) of liquid-filled vessels (10) circulating in an endless line is provided. The endless line is passed in an inspection station (72) between an illumination device (32) and the image-resolving sensor (34). Handling means in the form of grippers (56, 58) revolve with the vessels (10), by means of which optical parts (12) to be inspected can be introduced into the vessels (10) at a position of the line upstream of the inspection station (72) and the inspected parts can be taken out of the vessels (10) at another position of the line.

Abstract: A system for determining the presence and optionally the position of an ophthalmic product such as a contact lens in a container is provided.

Abstract: A system and method for real time process control, using a linearly swept tunable laser, which allows high speed in-situ monitoring and control of wavelength-specific properties of optical components. The invention comprises scanning an optical component with a high speed, high linearity tunable laser, and detecting optical output from the component during the scanning. Preferably, the invention also includes adjusting or controlling the optical properties of the component during scanning, according to detected optical output from the component. The invention is embodied in a process control system comprising a high speed, high linearity, tunable operatively coupled to an optical component which in turn is operatively coupled to an optical detector. A system control processor is operatively coupled to the tunable laser and detector. A processing control unit is associated with the optical component and is operatively coupled to the system control processor.

Abstract: An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system utilizes an at least two wavelengths of light. The light is directed to the reticle at the at least two wavelengths of light.

Abstract: A contaminant inspecting device with multi-color light source comprises a support, a house mounted on the support, a transparent cover mounted on the house, a rotatable frame pivotally connected to the house, a plurality of varied color filters mounted on the frame, and a light source deposited within the house The light of the light source goes though the filter for transforming into a specific color light, and then the specific color light through the transparent cover is projected out of the house. The present invention further provides an inspecting method of the surface of the back light module using the multi-color light projected from the contaminant inspecting device with multi-color light source.

Abstract: A technique for testing the quality of optical components of a line-narrowing module is performed on-line. As the wavelength tends to drift from a desired value when the optical components of the line-narrowing module are heated due to absorption, one or more optical components is adjusted such as by rotation to tune the wavelength back to the desired wavelength using a feedback loop. The amount of adjustment of these optical components is monitored for indirectly measuring, and thereby testing, the absorption or quality of the optical components.

Abstract: Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

Abstract: Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device 8 at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device 98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device 84 at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

Abstract: An optical testing device includes an optical fiber having a first numerical aperture at a first end of the optical fiber. A positioning structure is attached to the optical fiber for moving the first end of the optical fiber to any portion of a substrate for testing an optical device. The optical device may be disposed at any location on the substrate and provides a light beam with an emission angle less than the first numerical aperture. A test head collects the light beam through the optical fiber to test the optical device. A method for positioning the optical fiber and testing the optical device is also disclosed.

Abstract: A system (100) for determining particle contamination on optical surfaces (112, 114, 116) includes a detector array (118) and a non-coherent light source (110) that illuminates the detector array with non-coherent light reflected or refracted by the optical surfaces. Processing equipment (134) identifies shadows (302, 402, 502) on the detector array which are indicative of particle contamination of the optical surfaces. A light source controller (130) moves the non-coherent light source resulting in movement of the shadows on the detector array. The processing equipment distinguishes shadows caused by particle contamination on a first of the optical surfaces (112) from shadows caused by particle contamination on the other optical surfaces (114, 116) based on the movement of the shadows. The system also includes a particle contamination level analyzer (128) to estimate a particle contamination level for each optical surface from contrast levels of the shadows identified for each optical surface.

Abstract: The invention enables more objective defect evaluation of ophthalmic lenses, especially contact lenses, to take place through the combination of the schlieren method with the transmitted light method, with the result that the advantages of these two different systems are combined. The schlieren method is in a position to illustrate the edge of a contact lens and its ruptures, in high contrast, for the CCD camera. Likewise, tears and surface defects can be made visible. Using the transmitted light method, the bubbles may be suitably prepared for the camera.

Abstract: An optical member inspection apparatus includes an inspection optical system having a light source, and a diffusing means for diffusing the light emitted from the light source. The diffusing means has a central portion and a peripheral portion. The diffusion transmittance of the peripheral portion is higher than the diffusion transmittance of the central portion. The inspection optical system is also provided with an image pick-up means to pick-up an image of the optical member to be inspected, and is positioned so as to receive that light emitted from the light source and transmitted through the diffusing means and the optical member. A judging means is also provided, for judging whether or not the optical member has a defect, in accordance with image signals output from the image pick-up means.

Abstract: The present invention provides a mask for measuring an optical aberration, the mask including at least a measuring pattern comprising plural pattern parts being separated from each other, wherein the plural pattern parts provide individual widths which are simply increased on first and second directional axes non-parallel to each other and vertical to a plane of the mask, provided that the width of each of the plural pattern parts is unchanged at least on the first and second directional axes.

Abstract: A device for inspecting surfaces includes a beam splitter which couples out, from an input radiation a first measuring radiation and a second measuring radiation. Both measuring radiations exhibit different properties. A first exemplary embodiment makes provision for the different property to be achieved by different polarization planes. Another exemplary embodiment makes provision for the different properties to be achieved by different wavelengths. The measuring radiations reflected by the surfaces are brought together by the beam splitter to form an output radiation which is fed to an optical receiving device. The device according to the present invention is mainly suited for inspecting surfaces in bores, especially, in blind-end bores.

Abstract: The invention concerns a method and device for automatic cleaning of opto-electronic measuring systems used in process-technology for the analysis of substances in liquids and gases by means of optical absorption and fluorescence. The method is characterized in that the soiling degree is detected by the opto-electronic sensor system itself and, with predetermined soiling degree, a cleaning liquid cleans the soiling-sensitive optical components and detects the residual soiling, which is then evaluated quantitatively and compensated for in the signal analysis.

Abstract: A method and device detect for the presence of defects, namely micro-scratches, in the surface of a wafer. Light is projected onto a medium at the surface of the wafer, at an angle at which light is not reflected by another layer that may be located under the medium. Light reflected by the surface of the wafer is converted into an electrical signal but any light scattered by the surface is excluded as much as possible from contributing to the formation of the signal. The electric signal corresponds to the intensity of the light reflected from the surface of the wafer. As the light is scanned across the wafer, the values of the electric signal are compared to yield a determination of whether defects are present in the medium. Because the light projected onto the surface of the wafer will be scattered by defects such as micro-scratches, the wafer can be successfully monitored for the existence of such micro-scratches.

Abstract: Optical circuits, in optical waveguide structures, are provided by making grating elements in patterns defined by perturbations of the refractive index of the waveguide material. An optical waveguide including ultraviolet (UV) photosensitive material is carried by a substrate to provide a waveguide assembly. The assembly is overlaid with a first mask being nontransparent to ultraviolet light and having a transparent aperture which defines an area of the optical waveguide for formation of an optical circuit. The first mask also includes registration targets. A grating mask with ports for passing ultraviolet light is removably clamped in a space registered relationship over the first mask, to provide a process assembly which is vibration tolerant. Exposing the grating mask to an ultraviolet radiation source, such as a UV lamp, forms the desired perturbations to affect the grating elements. The grating mask is removed and is reusable.

Abstract: A LCD test system is provided for use in a high volume production environment. An automated test is performed that tests each LCD and provides a pass/fail indication. The automated test includes an image-sticking test that drives the test image based on a control voltage that corresponds to a maximum rate of change of brightness. The control voltage is determined by differentiating an electro-optic curve. The brightness difference between the test image and another test image is compared to predetermined threshold. The other test image may be a gray scale test. Alternatively, the image-sticking test may integrate brightness levels of odd and even frames, compare these results to predetermined thresholds. The test includes a color uniformity test in which average differences in peak reflectance and peak frequency within sections of the LCD are compared to predetermined thresholds for the pass/fall indication. The test includes a spatial distribution of defects test.

Abstract: Provided is an inspection method that enables highly efficient inspection operations that are necessary before the shipment of a sheet lens product. A sheet-like Fresnel lens sheet having bonded on its light-incidence surface a masking material is placed on an operation surface equipped with a black color system of background with that light-incidence surface up. On the operation surface the masking material is exfoliated. Along with this, the Fresnel lens sheet is inspected based on the reflected light to thereby make an inspection of the presence or absence of a white color system of defects. Thereafter, the Fresnel lens sheet is inspected based on the transmission light.

Abstract: An optical member inspection apparatus includes an inspection optical system having a light source, and a diffusing means for diffusing the light emitted from the light source. The diffusing means has a central portion and a peripheral portion. The diffusion transmittance of the peripheral portion is higher than the diffusion transmittance of the central portion. The inspection optical system is also provided with an image pick-up means to pickup an image of the optical member to be inspected, and is positioned so as to receive that light emitted from the light source and transmitted through the diffusing means and the optical member. A judging means is also provided, for judging whether or not the optical member has a defect, in accordance with image signals output from the image pickup means.

Abstract: A device and method for inspecting a test piece with a laser beam in which the laser beam is divided into plural beams, and each of the plural beams has an identification marker, such as a particular polarity or intensity. Each of the marked beams, scans a different portion of the test piece to reduce the time needed to inspect the test piece.

Abstract: A method for determining the susceptibility of solar cell cover glass or second surface mirror to ultraviolet (UV) degradation comprises the steps of illuminating the solar cell cover glass with ultra violet light at a preselected illumination angle where the solar cell cover glass reflects a portion of the ultraviolet light; measuring the reflected portion of the ultraviolet light; and, characterizing the propensity of the cover glass or contaminate layer on a second surface mirror to degradation as a function of the reflectance. The process results in an improvement of the long-term power output of solar cells by screening out cover glasses that have a propensity to darken under solar-equivalent UV exposure and thus maintaining optical transparency arising from increased solar absorption in darkened cover glass. The process will additionally result in decreased contaminant levels on thermal control surfaces and less on-orbit degradation.

Abstract: The present invention provides a method, apparatus and system that pre-scans and pre-treats film for improved digital film processing. The apparatus for use with the invention includes, generally, a sensor for detecting one or more imperfections on the film and a microprocessor connected to the sensor that determines the amount and extent of imperfections of the film based on one or more reference readings. The present invention may also include a tape dispenser, cleaning rollers, a blower or vacuum to remove and/or correct any imperfections in the film. One embodiment includes a cleaning system for a particle removal member which removes particles from film. The cleaning system is relatively movable and selectively contactable with the particle removal member to clean particles from the particle removal member.

Abstract: Optical systems of projection exposure apparatuses may have aberrations, and this fact may hamper the achievement of predetermined accuracy of dimensions and position of a circuit pattern which is necessary to attain desired device performance. Further, because of the difficulty in measuring the above-described aberrations, it was not possible to correct the optical system so as to realize a substantially aberration-free characteristic. The aberrations of a projection lens can be found accurately by steps of: measuring the light intensities of a projected image of a particular pattern on a mask at n different points in the projected image; and solving n simultaneous equations with m (m<n) unknown weighting coefficients for m known wavefront aberration functions. Based on the aberrations thus found, one can adjust aberration characteristic of the projection lens or correct dimensions and positions of patterns on a mask instead.

Abstract: A method for monitoring an optical system having a front lens disposed immediately at a combustion chamber minimizes the time that the optical system is impaired for maintenance and cleaning work on the front lens. According to the invention, intensity values of the light of a flame of the combustion chamber are recorded for this purpose via the optical system, and the front lens surface is cleaned if necessary. In this process, a temperature value and a mean intensity value are determined from the intensity values, and then the relative degree of pollution of the front lens is determined therefrom and used for the purpose of determining a cleaning and/or maintenance time of the front lens.

Abstract: A process and an apparatus for the examination, especially the quality control, of optical components, in which an image of the particular component to be examined is produced and flaws in the imaged article are detected by image analysis, as well as the integration of that examining process into the manufacture of the component. The optical components may be optical components for the eye, such as spectacle lenses, contact lenses, intraocular lenses and the like.