By Alignment In Lateral Direction Patents (Class 356/399)
  • Patent number: 10912525
    Abstract: An adjustment method is for a marking laser beam of an imaging modality. The marking laser beam includes a central beam and at least one peripheral beam and extends from a laser source to a detection plane. The detection plane includes a central target position for the central beam and at least one peripheral target position for the at least one peripheral beam and a detection unit. The detection unit is embodied to capture whether the marking laser beam is striking at least one of the target positions. In an embodiment, the method includes a first adjustment of the marking laser beam via an adjusting unit, until it strikes the central target position; and a second adjustment of the marking laser beam via the adjusting unit, until it strikes the at least one peripheral target position. The marking laser beam will also be kept at the central target position.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: February 9, 2021
    Assignee: SIEMENS HEALTHCARE GMBH
    Inventor: Thomas Benner
  • Patent number: 10908356
    Abstract: An optical circuit board which is mounted with a loop-back circuit for returning aligning light to the fiber array in the vicinity of the fiber array connection end. Since an aligning loop-back circuit can be formed in an optical waveguide pattern, a production cost does not increase in comparison to an optical circuit board of the related art. The aligning light combined from the optical fiber to the aligning port of the optical circuit board is returned to the optical fiber around the loop-back circuit. Therefore, it is possible to perform alignment using the returned light. That is, alignment can be performed while being mounted on a package without installing a light-reflecting film or mirror.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: February 2, 2021
    Assignees: NTT ELECTRONICS CORPORATION, NIPPON TELEGRAPH AND TELEPHONE CORPORATION
    Inventors: Tomohiro Nakanishi, Motoki Minami, Satoru Konno, Yuichi Suzuki, Teruaki Sato, Shigeo Nagashima, Shinji Mino, Motohaya Ishii, Shunichi Soma, Shin Kamei, Shuichiro Asakawa
  • Patent number: 10875155
    Abstract: Disclosed is a universal fixture based machine tool used in the machining industry. The tool includes a numerically controlled machine tool body, a multifunctional machine tool countertop, a first fixture pallet, a second fixture pallet, a fixture integration platform, a split bench vise, and a flexible fixture element. The multifunctional machine tool countertop, the first fixture pallet and the second fixture pallet are all made of perforated foundation plates. The numerically controlled machine tool body can achieve a three-axis linkage machining function of X-, Y-, and Z-coordinate moving axes. The fixture integration platform can achieve a rotary machining function of three rotation axes A, B, and C of the universal fixture based machine tool. The flexible fixture element can have various combinations and changes, so that the universal fixture based machine tool has a machining function of three increment axes U, V, and W.
    Type: Grant
    Filed: September 20, 2018
    Date of Patent: December 29, 2020
    Assignee: BEIJING LXT TECHNOLOGY CO., LTD.
    Inventors: Yumin Zhao, Yongyi Zhang
  • Patent number: 10852647
    Abstract: A movable body apparatus has: a substrate holder holding a substrate and can move in the X and Y-axes directions; a Y coarse movement stage movable in the Y-axis direction; a first measurement system acquiring position information on the substrate holder by heads on the substrate holder and a scale on the Y coarse movement stage; a second measurement system acquiring position information on the Y coarse movement stage by heads on the Y coarse movement stage and a scale; and a control system controlling the position of the substrate holder based on position information acquired by the first and second measurement systems. The first measurement system irradiates a measurement beam while moving the heads in the X-axis direction with respect to the scale, and the second measurement system irradiates a measurement beam while moving the heads in the Y-axis direction with respect to the scale.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: December 1, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10831011
    Abstract: A sample holder 100 for use in a device for image-based analysis of multiple samples, the sample holder comprising: an optically flat surface 10; multiple locations of interest 16, 18 dispersed across the optically flat surface 10 that each, in use, correspond to locations of a sample of the multiple samples; and multiple focal structures 12 associated with the multiple locations of interest 16, 18; wherein the focal structures 12 each comprise at least one pyramid shaped indentation 30 in the optically flat surface 10.
    Type: Grant
    Filed: June 15, 2017
    Date of Patent: November 10, 2020
    Assignee: Q-Linea AB
    Inventors: Jonas Jarvius, Jan Grawe
  • Patent number: 10698326
    Abstract: A measurement device has: a slider which holds a substrate and is movable parallel to the XY plane; a drive system that drives the slider; a position measurement system which emits beams from a head section to a measurement surface in which grating section are provided on the slider, which receives respective return beams of the beams from the measurement surface, and which is capable of measuring position information in at least directions of three degrees of freedom including the absolute position coordinates of the slider; a mark detection system that detects a mark on the substrate; and a controller which detects the marks on the substrate using the mark detection system while controlling the drive of the slider, and which obtains the absolute position coordinates of each mark based on the detection result of each mark and measurement information by the position measurement system at the time of detection.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: June 30, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10692785
    Abstract: A semiconductor pattern for monitoring overlay and critical dimension at post-etching stage is provided in the present invention, which include a first inverted-T shaped pattern with a base portion and a middle portion extending from the base portion and a second pattern adjacent and spaced apart from the base portion of the first inverted-T shaped pattern, wherein the first inverted-T shaped pattern and the second pattern are composed of a plurality of spacer patterns spaced apart from each other.
    Type: Grant
    Filed: August 8, 2018
    Date of Patent: June 23, 2020
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Chien-Hao Chen, Chien-Wei Huang, Chia-Hung Wang, Sho-Shen Lee
  • Patent number: 10685883
    Abstract: A method of wafer dicing and a die are provided. The method includes the following processes. A wafer is provided, the wafer includes a plurality of die regions and a scribe region between the die regions. The scribe region includes a substrate, and a dielectric layer and a test structure on the substrate, the test structure is disposed in the dielectric layer. A first removal process is performed to remove the test structure and the dielectric layer around the test structure, so as to expose the substrate. The first removal process includes performing a plurality of etching cycles, and each etching cycle includes performing a first etching process to remove a portion of the test structure and performing a second etching process to remove a portion of the dielectric layer. A second removal process is performed to remove the substrate in the scribe region, so as to form a plurality of dies separated from each other.
    Type: Grant
    Filed: May 2, 2019
    Date of Patent: June 16, 2020
    Assignee: Winbond Electronics Corp.
    Inventors: Cheng-Hong Wei, Hung-Sheng Chen, Ching-Wei Chen, Shuo-Che Chang
  • Patent number: 10670398
    Abstract: Position-sensitive light beam detector comprising photodiodes and at least two weighting networks, each of which includes a signal output and network nodes. According to the invention, a plurality of the network nodes of the first weighting network is provided for the photodiode terminal in such a way that each node of said plurality of nodes is connected to a node of the second weighting network via a photodiode.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: June 2, 2020
    Assignee: ANDROTEC GMBH
    Inventor: Mirko Essling
  • Patent number: 10663874
    Abstract: An alignment system (100) and method for positioning and/or keeping a first object (1) at a controlled distanced (D1) with respect to a second object (2). An object stage (11) is configured to hold a surface (1a) of the first object (1) at a distance (D1) over a surface (2a) of the second object (2). A sensor device (31) comprising a probe tip (31a) is connected at a predetermined probe level distance (Dp) relative to the surface (1a) of the first object (1). The probe tip (31a) is configured to perform an atomic force measurement (AFM) of a force (F1) exerted via the probe tip (31a) on a surface (2a) of the second object (2). A controller (80) is configured to control an object stage actuator (21) as a function of the probe level distance (Dp) and the measured force (F1) to maintain the controlled distanced (D1).
    Type: Grant
    Filed: November 10, 2016
    Date of Patent: May 26, 2020
    Assignee: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNO
    Inventor: Hamed Sadeghian Marnani
  • Patent number: 10653936
    Abstract: A display device for displaying a marking in the form of a distance to be kept between game equipment, in particular a football, and a participant on a playing field of a sports facility, includes a display device for projecting light beams representing the marking onto the playing field. The projected light beams display the distance to be kept, and can be projected at least in sections in the shape of a circle, for example at a distance of 9.15 m, around the game equipment on the playing field. The display device is jointly movable with a transport device that is movable above the sports facility.
    Type: Grant
    Filed: August 14, 2015
    Date of Patent: May 19, 2020
    Inventor: Natalis Ganzer
  • Patent number: 10600667
    Abstract: Various embodiments of aligning wafers are described herein. In one embodiment, a photolithography system aligns a wafer by averaging individual via locations. In particular, some embodiments of the present technology determine the center locations of individual vias on a wafer and average them together to obtain an average center location of the set of vias. Based on a comparison of the average center location to a desired center location, the present technology adjusts the wafer position. Additionally, in some embodiments, the present technology compares wafer via patterns to a template and adjusts the position of the wafer based on the comparison.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: March 24, 2020
    Assignee: Micron Technology, Inc.
    Inventors: Yang Chao, Keith E. Ypma, Steve J. Strauch
  • Patent number: 10585360
    Abstract: Methods are provided that, in some embodiments that provide alignment of a first layer of a printing plate on a chuck. For example, in one embodiment, images of reference marks on a chuck are captured to determine the initial positions of the reference marks on the chuck. A reference model is created from those initial positions. Images of alignment marks on a reference plate are captured and the locations of the alignment marks are determined. A reference plate model is created from the positions of the alignment marks. A mapping model is then created from the reference model and the reference plate model.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: March 10, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Tamer Coskun, Qin Zhong
  • Patent number: 10586781
    Abstract: A bonding apparatus 10 having a diagonal optical system 30, the bonding apparatus moves a capillary 24 down to a first heightwise position to calculate a position A11 of a tip end portion of the capillary 24 and a position A12 of a tip end portion of the capillary in an image on an imaging plane of the diagonal optical system 30, and similarly moves the capillary 24 down to a further lower second heightwise position to calculate a position A21 of the tip end portion of the capillary 24 and a position A22 of the tip end portion of the capillary in the image on the imaging plane. The bonding apparatus then estimates the position of the landing point of the capillary 24 on a bonding target 8 based on positional data for the four calculated positions A11, A12, A21, and A22, the first heightwise position, and the second heightwise position. With this, it is possible to use the diagonal optical system in the bonding apparatus to further improve positional accuracy in the bonding process.
    Type: Grant
    Filed: December 9, 2016
    Date of Patent: March 10, 2020
    Assignee: SHINKAWA LTD.
    Inventors: Shigeru Hayata, Hiroya Yuzawa, Hiromi Tomiyama
  • Patent number: 10573633
    Abstract: A semiconductor device includes a first overlay group and a second overlay group disposed on a semiconductor substrate. The first overlay group includes first lower overlay patterns which extend in a first direction, first upper overlay patterns overlapping the first lower overlay patterns, and first via overlay patterns interposed between the first lower overlay patterns and the first upper overlay patterns. The second overlay group includes second lower overlay patterns which extend in a second direction, second upper overlay patterns overlapping the second lower overlay patterns, and second via overlay patterns interposed between the second lower overlay patterns and the second upper overlay patterns. The second lower overlay patterns include end portions adjacent to and spaced apart from the first overlay group.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: February 25, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae Sun Kim, Hyun Jae Kang, Tae Hoi Park, Jin Seong Lee, Eun Sol Choi, Min Keun Kwak, Byung Kap Kim, Sung Won Choi
  • Patent number: 10540561
    Abstract: An inspection method includes a rough alignment process of acquiring optical images of first and second patterns previously set to confirm whether a position misalignment amount in a rotation direction of a sample with respect to an X or Y direction is equal to or smaller than a first acceptable value, and conforming whether the position misalignment amount is equal to or smaller than the first acceptable value on the basis of an acquisition result, and a fine alignment process of acquiring optical images of third patterns positioned on different corners of a rectangular frame constituted of four sides along the X or Y direction on an optical image of the sample and rotating a stage until a position misalignment amount detected based on the optical images of the third patterns becomes equal to or smaller than a second acceptable value being smaller than the first acceptable value.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: January 21, 2020
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Makoto Yabe, Hiroteru Akiyama, Takafumi Inoue
  • Patent number: 10527951
    Abstract: Imaging metrology targets and methods are provided, which combine one-dimensional (1D) elements designed to provide 1D imaging metrology signals along at least two measurement directions and two-dimensional (2D) elements designed to provide at least one 2D imaging metrology overlay signal. The target area of the 1D elements may enclose the 2D elements or the target areas of the 1D and 2D elements may be partially or fully congruent. The compound targets are small, possibly multilayered, and may be designed to be process compatible (e.g., by segmentation of the elements, interspaces between elements and element backgrounds) and possibly be produced in die. Two dimensional elements may be designed to be periodic to provide additional one dimensional metrology signals.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: January 7, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Raviv Yohanan, Eran Amit, Mark Ghinovker, Tal Itzkovich, Nuriel Amir
  • Patent number: 10514612
    Abstract: A method for overlay monitoring and control is introduced in the present disclosure. The method includes selecting a group of patterned wafers from a lot using a wafer selection model; selecting a group of fields for each of the selected group of patterned wafers using a field selection model; selecting at least one point in each of the selected group of fields using a point selection model; measuring overlay errors of the selected at least one point on a selected wafer; forming an overlay correction map using the measured overlay errors on the selected wafer; and generating a combined overlay correction map using the overlay correction map of each selected wafer in the lot.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: December 24, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yang-Hung Chang, Chih-Ming Ke, Kai-Hsiung Chen
  • Patent number: 10508906
    Abstract: A method of determining a parameter of a patterning process applied to an object comprising two features (for example an overlay of the two features) comprises: irradiating the two features of the object with a radiation beam and receiving at least a portion of the radiation beam scattered from the two features of the object. The at least a portion of the radiation beam comprises: a first portion comprising at least one diffraction order and a second portion comprising at least one diffraction order that is different to a diffraction order of the first portion. The method further comprises moderating a phase difference between the first and second portions and combining the first and second portions such that they interfere to produce a time dependent intensity signal. The method further comprises determining the parameter of the patterning process from a contrast of the time dependent intensity signal.
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Arie Jeffrey Den Boef, Simon Reinald Huisman
  • Patent number: 10506220
    Abstract: Binocular augmented reality display devices and corresponding methods allow alignment calibration to be performed by an end user. According to one approach, a camera is positioned to have a field of view which includes simultaneously part of a projected image from the left-eye display and part of a projected image from the right-eye display. By projecting via each display at least part of a calibration image and identifying within the camera-sampled image right-field and left-field alignment features, an alignment correction can be derived. Alternative approaches employ correlation of images sampled by forward-looking cameras rigidly associated with the respective right-eye and left-eye display units, or require a user to input a manual adjustment for aligning transversely-swapped camera images with the real world view.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: December 10, 2019
    Assignee: Lumus Ltd.
    Inventor: Yochay Danziger
  • Patent number: 10506207
    Abstract: A projection system which arranges n×m projection images and forms one composite projection image on a projection surface includes: n×m projectors; an operation unit which accepts an operation by a user; and a control unit which controls the projection by each of the n×m projectors. The control unit causes a reference image showing a reference point common to a plurality of projection areas to be projected in an overlap area where the plurality of projection areas overlap each other, and causes each of a plurality of projectors projecting the projection image in the overlap are where the reference image to be moved is projected, to execute geometric correction of the projection image in such a way that the reference image moves to a position on the projection surface designated by the user by the operation via the operation unit, and to project the projection image.
    Type: Grant
    Filed: January 30, 2019
    Date of Patent: December 10, 2019
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Shiki Furui
  • Patent number: 10475859
    Abstract: An organic light-emitting display apparatus includes: a substrate including a display area and a peripheral area outside the display area; an alignment mark located in the peripheral area; and an insulating film located in the peripheral area and including a first opening through which at least a part of the alignment mark is exposed and a plurality of slits that extend from the first opening.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: November 12, 2019
    Assignee: Samsung Display Co., Ltd.
    Inventors: Wonwoo Choi, Seungwook Kwon, Seungho Yoon, Sangbong Lee
  • Patent number: 10453186
    Abstract: A system is provided for correcting an error of a camera for a camera monitoring system (CMS), including a camera attached to a side of a vehicle, a memory configured to store processor-executable instructions for correcting an error of an image captured by the camera, and a processor configured with the processor-executable instructions to detect a correction point is the image captured by the camera, generate a correction parameter based on a resultant value of a comparison between the detected correction point and a preset correction point, and correct the error of the image based on the generated correction parameter.
    Type: Grant
    Filed: June 20, 2017
    Date of Patent: October 22, 2019
    Assignee: Hyundai Mobis Co., Ltd.
    Inventor: Myung Suk Byeon
  • Patent number: 10415947
    Abstract: A probe includes a movable plate to which a stylus capable of contacting a measurable object is mounted, the movable plate displaceable in an X direction; a static plate arranged to overlap with the movable plate; a counter plate facing the movable plate and the static plate; an elastic movable side connection plate, the movable side connection plate connecting the counter plate at at least three places with each of a first end connector positioned toward a first end of the movable plate in the X direction and second end connectors positioned toward a second end in the X direction; and a static side connection plate which connects the static plate and the counter plate. An entire length of the first end connector in a Y direction orthogonal to the X direction is the same size as the entire length of the second end connectors in the Y direction.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: September 17, 2019
    Assignee: MITUTOYO CORPORATION
    Inventors: Hideyuki Arai, Kazuya Iwasaki, Minoru Tanaka, Shuichi Kamiyama, Kazuhiko Hidaka
  • Patent number: 10412870
    Abstract: In a board work machine that performs board work with reference to a reference mark provided on a board, in a case of performing board work with respect to a board provided with overall reference mark and local area reference mark that acts as a reference for a local area as reference marks, when recognizing the reference marks by imaging, checking is performed as to whether a recognized reference mark is recognized correctly. For this checking, when checking whether the position deviation amount from a normal position and the relative position deviation amount of an imaging target identified as a reference mark is within the range of a set tolerance, set tolerances for a local area reference mark are smaller than set tolerances for an overall reference mark.
    Type: Grant
    Filed: December 18, 2014
    Date of Patent: September 10, 2019
    Assignee: FUJI CORPORATION
    Inventors: Hideya Kuroda, Masahiro Takeda
  • Patent number: 10340169
    Abstract: According to one embodiment, there is provided an antireflection member including a first plate part, a second plate part, and a third plate part. The first plate part has a first end and a second end. The second end is arranged at a side opposite to the first end. The second plate part extends from a vicinity of the first end. A first notch part is arranged on the second plate part. The second plate part has an antireflection surface. The third plate part extends from a vicinity of the second end to be opposed to the second plate part A second notch part is arranged at a position corresponding to the first notch part on the third plate part. The third plate part has an antireflection surface directed to the antireflection surface of the second plate part.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: July 2, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventor: Katsutoshi Yamamoto
  • Patent number: 10317808
    Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
    Type: Grant
    Filed: January 16, 2017
    Date of Patent: June 11, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Simon Reinald Huisman, Alessandro Polo, Duygu Akbulut, Sebastianus Adrianus Goorden, Arie Jeffrey Den Boef
  • Patent number: 10303153
    Abstract: In a method for controlling the positioning of patterns on a substrate in a manufacturing process at least one registration measurement is conducted with a registration tool on at least one pattern formed in at least one layer on the substrate by a previous process step of the manufacturing process. From the registration measurement a position of the at least one pattern in a coordinate system is determined. The determined position of the at least one pattern is fed into an automatic process control of a manufacturing system for controlling a setup of the manufacturing system for a subsequent process step of the manufacturing process. The manufacturing process may be a wafer manufacturing process with a silicon substrate. Complementary information may be collected in addition to performing the registration measurement and fed to the automatic process control. The process steps may for example include lithography steps, etching steps, layer deposition.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: May 28, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Slawomir Czerkas, Frank Laske
  • Patent number: 10249570
    Abstract: An overlay mark includes a first feature of a plurality of first alignment segments extending along a first direction in a first layer, a second feature of a plurality of second alignment segments extending along a second direction in a second layer over the first layer, and a third feature of a plurality of third alignment segments extending along the first direction and a plurality of fourth alignment segments extending along the second direction in a third layer over the second layer. In a plan view, each first alignment segment of the plurality of first alignment segments is adjacent to a corresponding third alignment segment of the plurality of third alignment segments along the first direction, and each second alignment segment of the plurality of second alignment segments is adjacent to a corresponding forth alignment segment of the plurality of fourth alignment segments along the second direction.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: April 2, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chen-Yu Chen, Ming-Feng Shieh, Ching-Yu Chang
  • Patent number: 10207360
    Abstract: Implementations of the present disclosure include methods, systems, and computer-readable storage mediums for determining a deviation between an actual position and a desired position of a laser machining head of a laser machining machine. Implementations include actions of selecting at least two different machining positions of the laser machining head, in which a laser beam emitted by the laser machining head is directed onto a desired position of a workpiece, moving the laser machining head into a first selected machining position and forming a through-opening into the workpiece at or around the desired position by operation of the laser beam, moving the laser machining head into a second selected machining position and detecting radiation generated by an interaction between the laser beam and the workpiece, and determining whether there is a deviation between an actual position of the laser machining head and the desired position based on the detected radiation.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: February 19, 2019
    Assignee: TRUMPF Laser- und Systemtechnik GmbH
    Inventors: Wolf Wadehn, Tobias Hagenloche
  • Patent number: 10183140
    Abstract: The present invention relates to an apparatus and a method for local anesthesia and, more specifically, to an apparatus and a method for local anesthesia, which precisely indicate an anesthesia region and enable injection to be administered around the anesthesia region through a plurality of anesthesia needles. According to the present invention, the fear and pain of a subject to be anesthetized can be reduced since the affected part of the subject to be anesthetized can be anesthetized by injecting a plurality of syringes all at once, and an injection can be precisely administered to a region at which an injection is to be administered since the affected part can be precisely indicated by a provided laser pointer.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: January 22, 2019
    Assignees: AJOU UNIVERSITY INDUSTRY—ACADEMIC COOPERATION FOUNDATION, UNIVERSITY—INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY
    Inventors: Kilyeon Lee, Moongu Lee, Yongho Jeon, Jaeseung Kim
  • Patent number: 10162272
    Abstract: A substrate has a plurality of overlay gratings formed thereon by a lithographic process. Each overlay grating has a known overlay bias. The values of overlay bias include for example two values in a region centered on zero and two values in a region centered on P/2, where P is the pitch of the gratings. Overlay is calculated from asymmetry measurements for the gratings using knowledge of the different overlay bias values, each of the overall asymmetry measurements being weighted by a corresponding weight factor. Each one of the weight factors represents a measure of feature asymmetry within the respective overlay grating. The calculation is used to improve subsequent performance of the measurement process, and/or the lithographic process. Some of the asymmetry measurements may additionally be weighted by a second weight factor in order to eliminate or reduce the contribution of phase asymmetry to the overlay.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: December 25, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde, Te-Chih Huang, Victor Emanuel Calado, Henricus Wilhelmus Maria Van Buel, Richard Johannes Franciscus Van Haren
  • Patent number: 10161848
    Abstract: Aspects of the present disclosure include methods and systems for assessing alignment of a light source with a flow stream. Methods according to certain embodiments include detecting first and second light signals along a vertical axis of the a light irradiated flow stream and calculating a differential signal amplitude between the first light signal and second light signal to assess the alignment of the light source with the flow stream. Systems for practicing the subject methods are also described.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: December 25, 2018
    Assignee: BECTON, DICKINSON AND COMPANY
    Inventors: Matthew J. Crow, Valdis J. Riekstins, Timothy Wayne Petersen
  • Patent number: 10133186
    Abstract: An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: November 20, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Bart Schipper
  • Patent number: 10128140
    Abstract: Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: November 13, 2018
    Assignee: SEMICONDUCTOR TECHNOLOGIES & INSTRUMENTS PTE LTD
    Inventor: Jing Lin
  • Patent number: 10112772
    Abstract: An inventory system includes an inventory holder that may be moved by a mobile drive unit. The inventory holder may hold inventory items. The mobile drive unit may move in a manner for facilitating a shift of position of at least one inventory item relative to the inventory holder. Such movement may be accomplished, for example, by accelerating, decelerating, turning while driving, spinning, dropping the inventory holder, or by causing at least one of the mobile drive unit or the inventory holder to at least one of interact with or engage an obstacle such as a bump over which the mobile drive unit drives, a bar positioned above a floor on which the mobile drive unit drives, a wall, another mobile drive unit, or another inventory holder.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: October 30, 2018
    Assignee: Amazon Technologies, Inc.
    Inventors: Andriy Palamarchuk, Jeremiah David Brazeau
  • Patent number: 10095131
    Abstract: A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Z1 and Z2: Z1=r2 cos(2?) and Z2=r2 sin(2?) in polar coordinates (r, ?) or Z1=x2?y2 and Z2=xy in Cartesian coordinates (x, y).
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: October 9, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Jacob Kramer, Rogier Sebastiaan Gilijamse, Niels Lammers, Daan Maurits Slotboom
  • Patent number: 10073227
    Abstract: Systems and methods are described for characterizing the location of optical components relative to one another for optimizing the performance of the optical module. In particular, a mechanism is provided for a user to visually determine, from a fiber point of view, the alignment and relative positioning of a lens assembly of the optical module with an optoelectronic transceiver, such as a VCSEL or a photodiode. By characterizing a location of the lens assembly with respect to the optoelectronic transceiver in an x-y plane and/or determining a spacing of the components in a z-direction, the user can compensate for expected signal losses through the optical module due to inaccuracies in the relative positioning of the components, adjust the relative positioning of the components in the optical module being examined, or modify manufacturing parameters to improve the accuracy of positioning in the modules and PCBAs yet to be built.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: September 11, 2018
    Assignee: Mellanox Technologies, Ltd.
    Inventors: Elad Mentovich, Itshak Kalifa
  • Patent number: 10070570
    Abstract: A mounting device that, during movement of a mounting head, captures a first image that includes components that are collected in the mounting head and first fiducial marks, captures a second image that includes the components that are collected in the mounting head and second fiducial marks, and generates an image of the components that are collected in the mounting head using the first image and the second image based on the positional relationship of the first fiducial marks and the second fiducial marks. At this time, the mounting device captures the first image after the components and the first fiducial marks enter the same imaging range prior to the second fiducial marks entering the imaging range, and after that, captures the second image after the first fiducial marks come out from the imaging range and the components and the second fiducial marks enter the same imaging range.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: September 4, 2018
    Assignee: FUJI CORPORATION
    Inventors: Masafumi Amano, Kazuya Kotani, Yusuke Yamakage
  • Patent number: 10062012
    Abstract: Methods and systems for finding patterns in a design for a specimen are provided. One system includes one or more computer subsystems configured for searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design. The one or more computer subsystems are also configured for separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: August 28, 2018
    Assignee: KLA-Tencor Corp.
    Inventors: Allen Park, Michael Lennek
  • Patent number: 10061212
    Abstract: Disclosed is a method of measuring a target, associated substrate comprising a target and computer program. The target comprises overlapping first and second periodic structures. The method comprising illuminating the target with measurement radiation and detecting the resultant scattered radiation. The pitch of the second periodic structure is such, relative to a wavelength of the measurement radiation and its angle of incidence on the target, that there is no propagative non-zeroth diffraction at the second periodic structure resultant from said measurement radiation being initially incident on said second periodic structure. There may be propagative non-zeroth diffraction at the second periodic structure which comprises further diffraction of one or more non-zero diffraction orders resultant from diffraction by the first periodic structure.
    Type: Grant
    Filed: April 3, 2017
    Date of Patent: August 28, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Youping Zhang
  • Patent number: 10061210
    Abstract: A metrology target is designed for monitoring variations in a multiple patterning process, such as a self-aligned doubled patterning (SADP) or self-aligned quadruple patterning (SAQP) process. The metrology target may include a plurality of sub-patterns. For example, the metrology target may be a three-dimensional (3D) target rather than a conventional two-dimensional line-space target design. The 3D target design includes multiple sub-patterns arranged with a pitch in a direction that is different than the pitch of the lines and trenches. The pitch of the sub-patterns is sufficient so that multiple sub-patterns are simultaneously within the field of measurement.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: August 28, 2018
    Assignee: Nanometrics Incorporated
    Inventors: Jiangtao Hu, Nicholas James Keller
  • Patent number: 10054426
    Abstract: One aspect of the present invention relates to a mask inspection system for inspecting lithography masks, including a placement table for placing a lithography mask to be inspected, a first optical unit with a first beam path for examining structures of the lithography mask, and a second optical unit with a second beam path for establishing a position of at least one edge of the lithography mask. Here, the second beam path of the second optical unit passes at least once through a plane defined by the placement table.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: August 21, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jochen Hetzler, Joachim Schroeder
  • Patent number: 10031344
    Abstract: This disclosure describes techniques and apparatuses for rotational alignment of a circular display and a circular lens. In one or more implementations, a display device, such as a smart watch, includes a circular lens assembly that overlays a circular display assembly. The display device includes at least two alignment points positioned along the perimeter of the circular display assembly that enable a machine vision system to rotationally align the circular display assembly to the circular lens assembly. At least one of the alignment points includes a target mark on the perimeter of the circular lens assembly that is viewable by the machine vision system through a corresponding alignment hole on the perimeter of the circular display assembly. The alignment hole is within a border region of the circular display assembly, but is sized and positioned so that it does not impact the structure of the circular display assembly.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: July 24, 2018
    Assignee: Google Technology Holdings LLC
    Inventors: Daniel J. Meer, Thomas E. Gitzinger
  • Patent number: 10033309
    Abstract: Disclosed are a control apparatus for dynamically adjusting a phase switching of a DC motor and a method thereof. A rotor in the DC motor is divided into 2 M pole areas, wherein M is a positive integer not less than 1. The control apparatus comprises a phase detector, a current detector, a control circuit and a driving circuit. The phase detector detects the phase switching state of the pole areas to generate a standard phase signal. The current detector detects a current flowing through the DC motor in one of switching points of the standard phase signal to generate a current detection value. The control circuit periodically outputs 2 M drive signals, and determines to perform dynamically adjusting operation on the timing sequence of the drive signals according to the current detection value. The driving circuit receives the drive signals to perform the phase switching for driving the DC motor.
    Type: Grant
    Filed: April 17, 2017
    Date of Patent: July 24, 2018
    Assignee: ANPEC ELECTRONICS CORPORATION
    Inventor: Ming-Jung Tsai
  • Patent number: 10026011
    Abstract: A mask inspection apparatus includes an optical image acquisition unit configured to acquire an optical image by irradiating light on a mask, a reference image generation unit configured to generate a reference image from design data of the mask, a comparison circuit configured to compare the optical image with the reference image, a pattern data extraction unit configured to obtain coordinates of a defective portion determined to be defective by the comparison unit and to extract, from the design data, pattern data of a predetermined dimension range including the coordinates, and an interface unit configured to supply an aerial image measurement apparatus with information associated with the defect, the information including the defect coordinates and the extracted pattern data.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: July 17, 2018
    Assignee: NuFlare Technology, Inc.
    Inventors: Hideo Tsuchiya, Nobutaka Kikuiri, Ikunao Isomura
  • Patent number: 10018919
    Abstract: A lithography system includes an illumination source including two illumination poles separated along a first direction and symmetrically distributed around an optical axis, a pattern mask to receive illumination from the illumination source, and a set of projection optics to generate an image corresponding to the pattern mask onto a sample. The pattern mask includes a metrology target pattern mask and device pattern mask elements. The device pattern mask elements are distributed along the first direction with a device separation distance. The metrology target pattern mask includes a set of metrology target pattern mask elements having a diffraction pattern corresponding to that of the device pattern mask elements. A metrology target generated on the sample associated with the metrology target pattern mask is characterizable along a second direction and has printing characteristics corresponding to those of device pattern elements generated on the sample associated with the device pattern mask elements.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: July 10, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Myungjun Lee, Mark D. Smith
  • Patent number: 10001710
    Abstract: Disclosed is a method of monitoring a lithographic process parameter, such as focus and/or dose, of a lithographic process. The method comprises acquiring a first and a second target measurement using respectively a first measurement configuration and a second measurement configuration, and determining the lithographic process parameter from a first metric derived from said first target measurement and said second target measurement. The first metric may be difference. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: June 19, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Staals, Carlo Cornelis Maria Luijten, Paul Christiaan Hinnen, Anton Bernhard Van Oosten
  • Patent number: 9989754
    Abstract: A light scanning microscope with an illumination module switchable between an illumination with m number of spots and an illumination with n number of spots, a deflecting unit which moves the m or n spots in a predetermined sample region, and a detector module for confocal and spectrally resolved detection of the sample radiation. The detector module has a confocal diaphragm unit, a splitting unit which is arranged downstream of the confocal diaphragm unit, a detector, and an imaging unit which images the partial beams on the detector in a spatially separated manner. The confocal diaphragm unit is switchable between a confocal diaphragm with exactly m apertures for m-spot illumination and a confocal diaphragm with n apertures for n-spot illumination. The splitting unit has a first beam path for m-spot illumination and a second beam path for n-spot illumination. The splitting unit is switchable between the two beam paths.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: June 5, 2018
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Tiemo Anhut, Daniel Schwedt, Ralf Wolleschensky, Lars-Christian Wittig, Ulrich Preiβer
  • Patent number: 9983300
    Abstract: Systems, methods, and apparatus for living object protection in wireless power transfer applications are provided. In one aspect, an apparatus for detecting objects in a detection area of a wireless power transfer system is provided. The apparatus comprises a plurality of radar transceivers. The apparatus comprises at least one processor configured to receive radar data from the plurality of radar transceivers, detect an object in the detection area based on the received radar data, and adjust the detection area. The apparatus is configured to adjust the detection area based on at least one of a type of chargeable vehicle present, an amount of power being wirelessly transferred by the wireless power transfer system, an alignment of a vehicle with the wireless power transfer system, or a speed of the object approaching the detection area.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: May 29, 2018
    Assignee: QUALCOMM Incorporated
    Inventors: Lukas Sieber, Swagat Chopra