By Alignment In Lateral Direction Patents (Class 356/399)
  • Patent number: 10415947
    Abstract: A probe includes a movable plate to which a stylus capable of contacting a measurable object is mounted, the movable plate displaceable in an X direction; a static plate arranged to overlap with the movable plate; a counter plate facing the movable plate and the static plate; an elastic movable side connection plate, the movable side connection plate connecting the counter plate at at least three places with each of a first end connector positioned toward a first end of the movable plate in the X direction and second end connectors positioned toward a second end in the X direction; and a static side connection plate which connects the static plate and the counter plate. An entire length of the first end connector in a Y direction orthogonal to the X direction is the same size as the entire length of the second end connectors in the Y direction.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: September 17, 2019
    Assignee: MITUTOYO CORPORATION
    Inventors: Hideyuki Arai, Kazuya Iwasaki, Minoru Tanaka, Shuichi Kamiyama, Kazuhiko Hidaka
  • Patent number: 10412870
    Abstract: In a board work machine that performs board work with reference to a reference mark provided on a board, in a case of performing board work with respect to a board provided with overall reference mark and local area reference mark that acts as a reference for a local area as reference marks, when recognizing the reference marks by imaging, checking is performed as to whether a recognized reference mark is recognized correctly. For this checking, when checking whether the position deviation amount from a normal position and the relative position deviation amount of an imaging target identified as a reference mark is within the range of a set tolerance, set tolerances for a local area reference mark are smaller than set tolerances for an overall reference mark.
    Type: Grant
    Filed: December 18, 2014
    Date of Patent: September 10, 2019
    Assignee: FUJI CORPORATION
    Inventors: Hideya Kuroda, Masahiro Takeda
  • Patent number: 10340169
    Abstract: According to one embodiment, there is provided an antireflection member including a first plate part, a second plate part, and a third plate part. The first plate part has a first end and a second end. The second end is arranged at a side opposite to the first end. The second plate part extends from a vicinity of the first end. A first notch part is arranged on the second plate part. The second plate part has an antireflection surface. The third plate part extends from a vicinity of the second end to be opposed to the second plate part A second notch part is arranged at a position corresponding to the first notch part on the third plate part. The third plate part has an antireflection surface directed to the antireflection surface of the second plate part.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: July 2, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventor: Katsutoshi Yamamoto
  • Patent number: 10317808
    Abstract: In an alignment sensor of a lithographic apparatus, position sensing radiation is delivered to a target (P1). After reflection or diffraction from the target, position sensing radiation is processed to determine a position of the target. Reference radiation interferes with the position sensing radiation) while a relative phase modulation is applied between the reference radiation and the position sensing radiation. The interfering radiation includes a time-varying component defined by the applied phase modulation. The interfering radiation is delivered to two photodetectors in such a way that each photodetector receives said time-varying component in anti-phase to that received at the other photodetector. A difference signal (i(t)) from said photodetectors contains an amplified, low noise version of said time-varying component. This is used in determining the position of the target. Mode matching enhances interference. Surface scattered radiation is rejected.
    Type: Grant
    Filed: January 16, 2017
    Date of Patent: June 11, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Simon Reinald Huisman, Alessandro Polo, Duygu Akbulut, Sebastianus Adrianus Goorden, Arie Jeffrey Den Boef
  • Patent number: 10303153
    Abstract: In a method for controlling the positioning of patterns on a substrate in a manufacturing process at least one registration measurement is conducted with a registration tool on at least one pattern formed in at least one layer on the substrate by a previous process step of the manufacturing process. From the registration measurement a position of the at least one pattern in a coordinate system is determined. The determined position of the at least one pattern is fed into an automatic process control of a manufacturing system for controlling a setup of the manufacturing system for a subsequent process step of the manufacturing process. The manufacturing process may be a wafer manufacturing process with a silicon substrate. Complementary information may be collected in addition to performing the registration measurement and fed to the automatic process control. The process steps may for example include lithography steps, etching steps, layer deposition.
    Type: Grant
    Filed: August 4, 2016
    Date of Patent: May 28, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Slawomir Czerkas, Frank Laske
  • Patent number: 10249570
    Abstract: An overlay mark includes a first feature of a plurality of first alignment segments extending along a first direction in a first layer, a second feature of a plurality of second alignment segments extending along a second direction in a second layer over the first layer, and a third feature of a plurality of third alignment segments extending along the first direction and a plurality of fourth alignment segments extending along the second direction in a third layer over the second layer. In a plan view, each first alignment segment of the plurality of first alignment segments is adjacent to a corresponding third alignment segment of the plurality of third alignment segments along the first direction, and each second alignment segment of the plurality of second alignment segments is adjacent to a corresponding forth alignment segment of the plurality of fourth alignment segments along the second direction.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: April 2, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chen-Yu Chen, Ming-Feng Shieh, Ching-Yu Chang
  • Patent number: 10207360
    Abstract: Implementations of the present disclosure include methods, systems, and computer-readable storage mediums for determining a deviation between an actual position and a desired position of a laser machining head of a laser machining machine. Implementations include actions of selecting at least two different machining positions of the laser machining head, in which a laser beam emitted by the laser machining head is directed onto a desired position of a workpiece, moving the laser machining head into a first selected machining position and forming a through-opening into the workpiece at or around the desired position by operation of the laser beam, moving the laser machining head into a second selected machining position and detecting radiation generated by an interaction between the laser beam and the workpiece, and determining whether there is a deviation between an actual position of the laser machining head and the desired position based on the detected radiation.
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: February 19, 2019
    Assignee: TRUMPF Laser- und Systemtechnik GmbH
    Inventors: Wolf Wadehn, Tobias Hagenloche
  • Patent number: 10183140
    Abstract: The present invention relates to an apparatus and a method for local anesthesia and, more specifically, to an apparatus and a method for local anesthesia, which precisely indicate an anesthesia region and enable injection to be administered around the anesthesia region through a plurality of anesthesia needles. According to the present invention, the fear and pain of a subject to be anesthetized can be reduced since the affected part of the subject to be anesthetized can be anesthetized by injecting a plurality of syringes all at once, and an injection can be precisely administered to a region at which an injection is to be administered since the affected part can be precisely indicated by a provided laser pointer.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: January 22, 2019
    Assignees: AJOU UNIVERSITY INDUSTRY—ACADEMIC COOPERATION FOUNDATION, UNIVERSITY—INDUSTRY COOPERATION GROUP OF KYUNG HEE UNIVERSITY
    Inventors: Kilyeon Lee, Moongu Lee, Yongho Jeon, Jaeseung Kim
  • Patent number: 10162272
    Abstract: A substrate has a plurality of overlay gratings formed thereon by a lithographic process. Each overlay grating has a known overlay bias. The values of overlay bias include for example two values in a region centered on zero and two values in a region centered on P/2, where P is the pitch of the gratings. Overlay is calculated from asymmetry measurements for the gratings using knowledge of the different overlay bias values, each of the overall asymmetry measurements being weighted by a corresponding weight factor. Each one of the weight factors represents a measure of feature asymmetry within the respective overlay grating. The calculation is used to improve subsequent performance of the measurement process, and/or the lithographic process. Some of the asymmetry measurements may additionally be weighted by a second weight factor in order to eliminate or reduce the contribution of phase asymmetry to the overlay.
    Type: Grant
    Filed: August 18, 2016
    Date of Patent: December 25, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde, Te-Chih Huang, Victor Emanuel Calado, Henricus Wilhelmus Maria Van Buel, Richard Johannes Franciscus Van Haren
  • Patent number: 10161848
    Abstract: Aspects of the present disclosure include methods and systems for assessing alignment of a light source with a flow stream. Methods according to certain embodiments include detecting first and second light signals along a vertical axis of the a light irradiated flow stream and calculating a differential signal amplitude between the first light signal and second light signal to assess the alignment of the light source with the flow stream. Systems for practicing the subject methods are also described.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: December 25, 2018
    Assignee: BECTON, DICKINSON AND COMPANY
    Inventors: Matthew J. Crow, Valdis J. Riekstins, Timothy Wayne Petersen
  • Patent number: 10133186
    Abstract: An alignment apparatus for aligning a substrate, and a substrate processing system including such alignment apparatus. The alignment apparatus includes an alignment base for supporting the substrate and/or a substrate support member. A force generating device applies a contact force on the substrate. The force generating device includes an arm including a rigid proximal end and a rigid distal end. The distal end is provided with a contact section for contacting an edge of the substrate and an elastically deformable arm section extending between the proximal and distal ends. The connection part connects the proximal end to the alignment base. The arm is movable with respect to the alignment base via the connection part. The alignment apparatus also includes an actuator for causing a displacement of the proximal end, whereby the contact force, defined by the elastically deformable arm section, is applied to the substrate by the contact section.
    Type: Grant
    Filed: October 20, 2016
    Date of Patent: November 20, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Bart Schipper
  • Patent number: 10128140
    Abstract: Automatically correcting for rotational misalignment of a wafer improperly mounted on a film frame includes capturing an image of portions of the wafer using an image capture device, prior to initiation of a wafer inspection procedure by an inspection system; digitally determining a rotational misalignment angle and a rotational misalignment direction of the wafer relative to the film frame and/or a set of reference axes of a field of view of the image capture device; and correcting for the rotational misalignment of the wafer by way of a film frame handling apparatus separate from the inspection system, which is configured for rotating the film frame across the rotational misalignment angle in a direction opposite to the rotational misalignment direction. Such film frame rotation can occur prior to placement of the film frame on the wafer table, without decreasing film frame handling throughput or inspection process throughput.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: November 13, 2018
    Assignee: SEMICONDUCTOR TECHNOLOGIES & INSTRUMENTS PTE LTD
    Inventor: Jing Lin
  • Patent number: 10112772
    Abstract: An inventory system includes an inventory holder that may be moved by a mobile drive unit. The inventory holder may hold inventory items. The mobile drive unit may move in a manner for facilitating a shift of position of at least one inventory item relative to the inventory holder. Such movement may be accomplished, for example, by accelerating, decelerating, turning while driving, spinning, dropping the inventory holder, or by causing at least one of the mobile drive unit or the inventory holder to at least one of interact with or engage an obstacle such as a bump over which the mobile drive unit drives, a bar positioned above a floor on which the mobile drive unit drives, a wall, another mobile drive unit, or another inventory holder.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: October 30, 2018
    Assignee: Amazon Technologies, Inc.
    Inventors: Andriy Palamarchuk, Jeremiah David Brazeau
  • Patent number: 10095131
    Abstract: A method including determining a position of a first pattern in each of a plurality of target portions on a substrate, based on a fitted mathematical model, wherein the first pattern includes at least one alignment mark, wherein the mathematical model is fitted to a plurality of alignment mark displacements (dx, dy) for the alignment marks in the target portions, and wherein the alignment mark displacements are a difference between a respective nominal position of the alignment mark and measured position of the alignment mark; and transferring a second pattern onto each of the target portions, using the determined position of the first pattern in each of the plurality of target portions, wherein the mathematical model includes polynomials Z1 and Z2: Z1=r2 cos(2?) and Z2=r2 sin(2?) in polar coordinates (r, ?) or Z1=x2?y2 and Z2=xy in Cartesian coordinates (x, y).
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: October 9, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Pieter Jacob Kramer, Rogier Sebastiaan Gilijamse, Niels Lammers, Daan Maurits Slotboom
  • Patent number: 10073227
    Abstract: Systems and methods are described for characterizing the location of optical components relative to one another for optimizing the performance of the optical module. In particular, a mechanism is provided for a user to visually determine, from a fiber point of view, the alignment and relative positioning of a lens assembly of the optical module with an optoelectronic transceiver, such as a VCSEL or a photodiode. By characterizing a location of the lens assembly with respect to the optoelectronic transceiver in an x-y plane and/or determining a spacing of the components in a z-direction, the user can compensate for expected signal losses through the optical module due to inaccuracies in the relative positioning of the components, adjust the relative positioning of the components in the optical module being examined, or modify manufacturing parameters to improve the accuracy of positioning in the modules and PCBAs yet to be built.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: September 11, 2018
    Assignee: Mellanox Technologies, Ltd.
    Inventors: Elad Mentovich, Itshak Kalifa
  • Patent number: 10070570
    Abstract: A mounting device that, during movement of a mounting head, captures a first image that includes components that are collected in the mounting head and first fiducial marks, captures a second image that includes the components that are collected in the mounting head and second fiducial marks, and generates an image of the components that are collected in the mounting head using the first image and the second image based on the positional relationship of the first fiducial marks and the second fiducial marks. At this time, the mounting device captures the first image after the components and the first fiducial marks enter the same imaging range prior to the second fiducial marks entering the imaging range, and after that, captures the second image after the first fiducial marks come out from the imaging range and the components and the second fiducial marks enter the same imaging range.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: September 4, 2018
    Assignee: FUJI CORPORATION
    Inventors: Masafumi Amano, Kazuya Kotani, Yusuke Yamakage
  • Patent number: 10062012
    Abstract: Methods and systems for finding patterns in a design for a specimen are provided. One system includes one or more computer subsystems configured for searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design. The one or more computer subsystems are also configured for separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: August 28, 2018
    Assignee: KLA-Tencor Corp.
    Inventors: Allen Park, Michael Lennek
  • Patent number: 10061212
    Abstract: Disclosed is a method of measuring a target, associated substrate comprising a target and computer program. The target comprises overlapping first and second periodic structures. The method comprising illuminating the target with measurement radiation and detecting the resultant scattered radiation. The pitch of the second periodic structure is such, relative to a wavelength of the measurement radiation and its angle of incidence on the target, that there is no propagative non-zeroth diffraction at the second periodic structure resultant from said measurement radiation being initially incident on said second periodic structure. There may be propagative non-zeroth diffraction at the second periodic structure which comprises further diffraction of one or more non-zero diffraction orders resultant from diffraction by the first periodic structure.
    Type: Grant
    Filed: April 3, 2017
    Date of Patent: August 28, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Youping Zhang
  • Patent number: 10061210
    Abstract: A metrology target is designed for monitoring variations in a multiple patterning process, such as a self-aligned doubled patterning (SADP) or self-aligned quadruple patterning (SAQP) process. The metrology target may include a plurality of sub-patterns. For example, the metrology target may be a three-dimensional (3D) target rather than a conventional two-dimensional line-space target design. The 3D target design includes multiple sub-patterns arranged with a pitch in a direction that is different than the pitch of the lines and trenches. The pitch of the sub-patterns is sufficient so that multiple sub-patterns are simultaneously within the field of measurement.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: August 28, 2018
    Assignee: Nanometrics Incorporated
    Inventors: Jiangtao Hu, Nicholas James Keller
  • Patent number: 10054426
    Abstract: One aspect of the present invention relates to a mask inspection system for inspecting lithography masks, including a placement table for placing a lithography mask to be inspected, a first optical unit with a first beam path for examining structures of the lithography mask, and a second optical unit with a second beam path for establishing a position of at least one edge of the lithography mask. Here, the second beam path of the second optical unit passes at least once through a plane defined by the placement table.
    Type: Grant
    Filed: October 23, 2015
    Date of Patent: August 21, 2018
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jochen Hetzler, Joachim Schroeder
  • Patent number: 10031344
    Abstract: This disclosure describes techniques and apparatuses for rotational alignment of a circular display and a circular lens. In one or more implementations, a display device, such as a smart watch, includes a circular lens assembly that overlays a circular display assembly. The display device includes at least two alignment points positioned along the perimeter of the circular display assembly that enable a machine vision system to rotationally align the circular display assembly to the circular lens assembly. At least one of the alignment points includes a target mark on the perimeter of the circular lens assembly that is viewable by the machine vision system through a corresponding alignment hole on the perimeter of the circular display assembly. The alignment hole is within a border region of the circular display assembly, but is sized and positioned so that it does not impact the structure of the circular display assembly.
    Type: Grant
    Filed: June 25, 2014
    Date of Patent: July 24, 2018
    Assignee: Google Technology Holdings LLC
    Inventors: Daniel J. Meer, Thomas E. Gitzinger
  • Patent number: 10033309
    Abstract: Disclosed are a control apparatus for dynamically adjusting a phase switching of a DC motor and a method thereof. A rotor in the DC motor is divided into 2 M pole areas, wherein M is a positive integer not less than 1. The control apparatus comprises a phase detector, a current detector, a control circuit and a driving circuit. The phase detector detects the phase switching state of the pole areas to generate a standard phase signal. The current detector detects a current flowing through the DC motor in one of switching points of the standard phase signal to generate a current detection value. The control circuit periodically outputs 2 M drive signals, and determines to perform dynamically adjusting operation on the timing sequence of the drive signals according to the current detection value. The driving circuit receives the drive signals to perform the phase switching for driving the DC motor.
    Type: Grant
    Filed: April 17, 2017
    Date of Patent: July 24, 2018
    Assignee: ANPEC ELECTRONICS CORPORATION
    Inventor: Ming-Jung Tsai
  • Patent number: 10026011
    Abstract: A mask inspection apparatus includes an optical image acquisition unit configured to acquire an optical image by irradiating light on a mask, a reference image generation unit configured to generate a reference image from design data of the mask, a comparison circuit configured to compare the optical image with the reference image, a pattern data extraction unit configured to obtain coordinates of a defective portion determined to be defective by the comparison unit and to extract, from the design data, pattern data of a predetermined dimension range including the coordinates, and an interface unit configured to supply an aerial image measurement apparatus with information associated with the defect, the information including the defect coordinates and the extracted pattern data.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: July 17, 2018
    Assignee: NuFlare Technology, Inc.
    Inventors: Hideo Tsuchiya, Nobutaka Kikuiri, Ikunao Isomura
  • Patent number: 10018919
    Abstract: A lithography system includes an illumination source including two illumination poles separated along a first direction and symmetrically distributed around an optical axis, a pattern mask to receive illumination from the illumination source, and a set of projection optics to generate an image corresponding to the pattern mask onto a sample. The pattern mask includes a metrology target pattern mask and device pattern mask elements. The device pattern mask elements are distributed along the first direction with a device separation distance. The metrology target pattern mask includes a set of metrology target pattern mask elements having a diffraction pattern corresponding to that of the device pattern mask elements. A metrology target generated on the sample associated with the metrology target pattern mask is characterizable along a second direction and has printing characteristics corresponding to those of device pattern elements generated on the sample associated with the device pattern mask elements.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: July 10, 2018
    Assignee: KLA-Tencor Corporation
    Inventors: Myungjun Lee, Mark D. Smith
  • Patent number: 10001710
    Abstract: Disclosed is a method of monitoring a lithographic process parameter, such as focus and/or dose, of a lithographic process. The method comprises acquiring a first and a second target measurement using respectively a first measurement configuration and a second measurement configuration, and determining the lithographic process parameter from a first metric derived from said first target measurement and said second target measurement. The first metric may be difference. Also disclosed are corresponding measurement and lithographic apparatuses, a computer program and a method of manufacturing devices.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: June 19, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Staals, Carlo Cornelis Maria Luijten, Paul Christiaan Hinnen, Anton Bernhard Van Oosten
  • Patent number: 9989754
    Abstract: A light scanning microscope with an illumination module switchable between an illumination with m number of spots and an illumination with n number of spots, a deflecting unit which moves the m or n spots in a predetermined sample region, and a detector module for confocal and spectrally resolved detection of the sample radiation. The detector module has a confocal diaphragm unit, a splitting unit which is arranged downstream of the confocal diaphragm unit, a detector, and an imaging unit which images the partial beams on the detector in a spatially separated manner. The confocal diaphragm unit is switchable between a confocal diaphragm with exactly m apertures for m-spot illumination and a confocal diaphragm with n apertures for n-spot illumination. The splitting unit has a first beam path for m-spot illumination and a second beam path for n-spot illumination. The splitting unit is switchable between the two beam paths.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: June 5, 2018
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Tiemo Anhut, Daniel Schwedt, Ralf Wolleschensky, Lars-Christian Wittig, Ulrich Preiβer
  • Patent number: 9983300
    Abstract: Systems, methods, and apparatus for living object protection in wireless power transfer applications are provided. In one aspect, an apparatus for detecting objects in a detection area of a wireless power transfer system is provided. The apparatus comprises a plurality of radar transceivers. The apparatus comprises at least one processor configured to receive radar data from the plurality of radar transceivers, detect an object in the detection area based on the received radar data, and adjust the detection area. The apparatus is configured to adjust the detection area based on at least one of a type of chargeable vehicle present, an amount of power being wirelessly transferred by the wireless power transfer system, an alignment of a vehicle with the wireless power transfer system, or a speed of the object approaching the detection area.
    Type: Grant
    Filed: July 16, 2015
    Date of Patent: May 29, 2018
    Assignee: QUALCOMM Incorporated
    Inventors: Lukas Sieber, Swagat Chopra
  • Patent number: 9861766
    Abstract: Described is a medicament delivery device comprising a case, a container slidably disposed in the case between a first position and a second position, a needle coupled to the container, and a needle alignment detection mechanism disposed on the case and adapted to receive the needle. The needle alignment detection mechanism determines whether the needle is aligned with a longitudinal axis (L) when the needle is in the first position, the second position or translating between the first position and the second position.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: January 9, 2018
    Assignee: Sanofi-Aventis Deutschland GMBH
    Inventors: Charley Henderson, David Cross, Douglas Ivan Jennings, Ryan Anthony McGinley
  • Patent number: 9856084
    Abstract: An inventory system includes an inventory holder that may be moved by a mobile drive unit. The inventory holder may hold inventory items. The mobile drive unit may move in a manner for facilitating a shift of position of at least one inventory item relative to the inventory holder. Such movement may be accomplished, for example, by accelerating, decelerating, turning while driving, spinning, dropping the inventory holder, or by causing at least one of the mobile drive unit or the inventory holder to at least one of interact with or engage an obstacle such as a bump over which the mobile drive unit drives, a bar positioned above a floor on which the mobile drive unit drives, a wall, another mobile drive unit, or another inventory holder.
    Type: Grant
    Filed: July 24, 2017
    Date of Patent: January 2, 2018
    Assignee: Amazon Technologies, Inc.
    Inventors: Andriy Palamarchuk, Jeremiah David Brazeau
  • Patent number: 9840003
    Abstract: Apparatus and methods for navigation of a robotic device configured to operate in an environment comprising objects and/or persons. Location of objects and/or persons may changed prior and/or during operation of the robot. In one embodiment, a bistatic sensor comprises a transmitter and a receiver. The receiver may be spatially displaced from the transmitter. The transmitter may project a pattern on a surface in the direction of robot movement. In one variant, the pattern comprises an encoded portion and an information portion. The information portion may be used to communicate information related to robot movement to one or more persons. The encoded portion may be used to determine presence of one or more object in the path of the robot. The receiver may sample a reflected pattern and compare it with the transmitted pattern. Based on a similarity measure breaching a threshold, indication of object present may be produced.
    Type: Grant
    Filed: June 24, 2015
    Date of Patent: December 12, 2017
    Assignee: Brain Corporation
    Inventors: Botond Szatmary, Micah Richert
  • Patent number: 9835447
    Abstract: A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
    Type: Grant
    Filed: October 24, 2016
    Date of Patent: December 5, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Ibrahim Abdulhalim, Mike Adel, Michael Friedmann, Michael Faeyrman
  • Patent number: 9816804
    Abstract: An apparatus is described. The apparatus includes a camera comprising a beam splitter to impose different optical paths for visible light and infra red light received by the camera. The camera also includes an infra red light detector to detect the infra red light and a visible light detector to detect the visible light, wherein, the different optical paths include an optical path having more than one internal reflection within the beam splitter.
    Type: Grant
    Filed: July 8, 2015
    Date of Patent: November 14, 2017
    Assignee: Google Inc.
    Inventors: Chung Chun Wan, Jamyuen Ko
  • Patent number: 9811896
    Abstract: A measuring apparatus includes an input unit to input optical image data of a figure pattern obtained by a pattern inspection apparatus which inspects a defect of a pattern on a target object to be inspected by scanning an inspection region of the target object, from the pattern inspection apparatus, and to input reference image data generated from design data of the pattern by the pattern inspection apparatus to be compared with the optical image data, from the pattern inspection apparatus, a positional deviation distribution generation unit to generate positional deviation distribution by measuring positional deviation of the pattern on the target object, by using the optical image data and the reference image data input from the pattern inspection apparatus, and an output unit to output generated positional deviation distribution of the pattern on the target object, wherein the measuring apparatus is arranged independently from the pattern inspection apparatus.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: November 7, 2017
    Assignee: NuFlare Technology, Inc.
    Inventors: Ikunao Isomura, Nobutaka Kikuiri
  • Patent number: 9797805
    Abstract: A test object for measuring the point spread function (PSF) of an optical system having a given Airy diameter (dAiry) comprises a structure to be imaged having a plurality of structure elements to be imaged, wherein the structure elements are embodied and arranged in such a way that the structure has at least two axes of symmetry.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: October 24, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Lars Stoppe, Robert Pomraenke, Michael Arnz
  • Patent number: 9781395
    Abstract: A projection system includes a plurality of projection units configured to project an image as a whole; a receiver configured to receive an instruction for shifting reference points that define a projection target area onto which the plurality of projection units project the whole image on an occasion of an initial calibration processing; a storage unit configured to store the reference points of the projection target area used in the initial calibration processing; a controller configured to start a recalibration processing in response to an event; a setting unit configured to reset the projection target area based on the reference points stored in the storage unit on an occasion of the recalibration processing; and a correction coefficient calculator configured to calculate correction coefficients for the plurality of projection units based on the projection target area that is reset by the setting unit.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: October 3, 2017
    Assignee: Ricoh Company, Ltd.
    Inventors: Masaaki Ishikawa, Yukinaka Uchiyama
  • Patent number: 9748128
    Abstract: Various embodiments of aligning wafers are described herein. In one embodiment, a photolithography system aligns a wafer by averaging individual via locations. In particular, some embodiments of the present technology determine the center locations of individual vias on a wafer and average them together to obtain an average center location of the set of vias. Based on a comparison of the average center location to a desired center location, the present technology adjusts the wafer position. Additionally, in some embodiments, the present technology compares wafer via patterns to a template and adjusts the position of the wafer based on the comparison.
    Type: Grant
    Filed: June 1, 2016
    Date of Patent: August 29, 2017
    Assignee: Micron Technology, Inc.
    Inventors: Yang Chao, Keith E. Ypma, Steve J. Strauch
  • Patent number: 9603519
    Abstract: Embodiments of the invention provide methods and systems for analyzing the ophthalmic anatomy of a patient posterior to the cornea. The method may include scanning a focus of a femtosecond laser beam along a path within the patient's eye. A portion of the path may be disposed posterior to the patient's cornea. The method may also include acquiring a first reflectance image and a second reflectance image associated with the focus disposed respectively at a first location of the path and a second location of the path. The method may further include determining the presence or absence of an ophthalmic anatomical feature of the eye based on a comparison between the first reflectance image and the second reflectance image.
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: March 28, 2017
    Assignee: AMO DEVELOPMENT, LLC
    Inventor: John Tamkin
  • Patent number: 9592109
    Abstract: A method for hernia mesh placement during in-situ surgical applications. The method includes the step of positioning a mesh having a center mark within an abdominal cavity near a site of repair. A light assembly projecting a light beam through a free end is provided. Next, the free end of the light assembly is inserted through a central location of the site of repair. Finally, the center mark of the mesh is aligned with the light beam of the light assembly to position the mesh at the central location of the site of repair.
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: March 14, 2017
    Assignee: Covidien LP
    Inventor: Alexey Sharonov
  • Patent number: 9552963
    Abstract: A charged particle beam writing apparatus includes a reading unit to read an identifier from a substrate where an absorber film which absorbs extreme ultraviolet light is formed and the identifier which can be optically read is formed, a storage unit to store defect position information indicating a position of a defect on the substrate based on reference marks, defect size information indicating a size of the defect, which are corresponding to the identifier, and pattern data for writing, an examination unit to input partial pattern data corresponding to a region including at least the defect in the pattern data, the defect position information based on reference marks, and the defect size information, and to examine whether a pattern layout is formed such that the defect is located in a region where the absorber film remains after patterning, and a writing unit to write a pattern on the substrate.
    Type: Grant
    Filed: March 16, 2011
    Date of Patent: January 24, 2017
    Assignee: NuFlare Technology, Inc.
    Inventor: Shusuke Yoshitake
  • Patent number: 9523569
    Abstract: An apparatus, includes first and second measurement devices configured to measure a position in a first direction of a moving body; a drive unit configured to drive the moving body in the first direction; a controller configured to generate a control input for driving the drive unit, based on a control deviation in accordance with position command information in the first direction of the moving body and position measurement information from the first or second measurement device, and a control parameter set to a certain value.
    Type: Grant
    Filed: November 24, 2014
    Date of Patent: December 20, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masanori Yamada
  • Patent number: 9513447
    Abstract: An apparatus comprising a first photonic device comprising a waveguide loop configured to guide a first light from a first location of a surface to a second location of the surface, and a second photonic device comprising a light source configured to provide the first light, and a first alignment coupler optically coupled to the light source and configured to optically couple to the waveguide loop at the first location, a second alignment coupler configured to optically couple to the waveguide loop at the second location, and a photodetector optically coupled to the second alignment coupler and configured to detect the first light when the waveguide loop is aligned with the first alignment coupler and the second alignment coupler, and generate, based on the detection and on the received light, an electrical signal.
    Type: Grant
    Filed: May 14, 2015
    Date of Patent: December 6, 2016
    Assignee: Huawei Technologies Co.., Ltd.
    Inventors: Dritan Celo, Dominic John Goodwill, Eric Bernier
  • Patent number: 9513460
    Abstract: In a lithography tool used in fabricating microelectronic devices, autofocus (AF) systems provide automatic image focusing before making exposures. To reduce production of erroneous results based on interaction of a beam of AF light with certain regions on lithographic substrates, a subject AF device has a sending unit and a receiving unit. The sending unit directs an AF light beam to the substrate, and the receiving unit receives AF light reflected from the substrate. The receiving unit has a system photodetector and a patterned optical element that receives AF light from the substrate and transmits a selected diffraction order(s) of said light. The system photodetector senses light of the selected diffraction order of reflected AF light while at least one additional photodetector detects divergent reflected AF light. Substrate areas exhibiting unusual amounts of divergent light may indicate a focus-error condition. The AF systems can be configured as fringe-projection or slit-projection AF systems.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: December 6, 2016
    Assignee: Nikon Corporation
    Inventor: Michael Sogard
  • Patent number: 9508906
    Abstract: A light emitting device package may be provided that includes: a lead frame which includes a first frame and a second frame disposed on both sides of the first frame respectively; a light emitting device which is disposed on the first frame and is electrically connected to the second frame; and a resin body which includes a first resin body which is disposed between the first frame and the second frame, and a second resin body which covers an outer surface of the lead frame. An end of the first frame and an end of the second frame are disposed on an outer surface of the second resin body.
    Type: Grant
    Filed: July 8, 2015
    Date of Patent: November 29, 2016
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Satoshi Ozeki, Yuichiro Tanda
  • Patent number: 9477225
    Abstract: A method for autonomously driving a motor vehicle in a car wash to enhance comfort and safety includes detecting a passageway of the car wash and determine with vehicle sensors the vehicle position and the vehicle orientation of the vehicle relative to the passageway. The vehicle is subsequently automatically driven into the car wash based on the vehicle position and the vehicle orientation, and automatically stopped in a washing position. After washing is complete, a completion signal signaling completion of a working step of the car wash is received or detected by the motor vehicle. Finally, the motor vehicle is automatically driven out of the car wash in response to the completion signal.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: October 25, 2016
    Assignee: AUDI AG
    Inventor: Michael Stadler
  • Patent number: 9438162
    Abstract: A solar panel mounting system may include a solar panel mounting assembly for mounting to a support structure. The solar panel mounting assembly may include a restraining element, a retaining element and a biasing assembly that supports the restraining and retaining elements. The support structure may include an upper surface and a lower surface spaced from the upper surface. The biasing assembly may further include a biasing element that resiliently urges the retaining element toward a securing element for supporting a solar panel that is positioned between the retaining element and the upper surface of the support structure, and resiliently urges the restraining element toward the lower surface of the support structure. A retention device may resiliently bias the solar panels of a solar panel assembly together on a support structure.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: September 6, 2016
    Inventor: Marc M. Thomas
  • Patent number: 9417412
    Abstract: An arrangement for providing passive alignment of optical components on a common substrate uses a set of reference cavities, where each optical device is positioned within a separate reference cavity. The reference cavities are formed to have a predetermined depth, with perimeters slightly larger than the footprint of their associated optical components. The reference cavity includes at least one right-angle corner that is used as a registration corner against which a right-angle corner of an associated optical component is positioned. The placement of each optical component in its own reference cavity allows for passive optical alignment to be achieved by placing each component against its predefined registration corner.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: August 16, 2016
    Assignee: CISCO TECHNOLOGY, INC.
    Inventors: Kalpendu Shastri, Ravinder Kachru, Kishor Desai
  • Patent number: 9411456
    Abstract: In embodiments of an embedded light sensing component, a lens assembly includes a display component to display a user interface, such as when implemented in a wearable device. The lens assembly has a lens structure that covers the display component. The lens assembly also includes a light sensor that is implemented to sense ambient light in an environment proximate the lens structure, where the light sensor is embedded between the display component and the lens structure of the lens assembly.
    Type: Grant
    Filed: September 3, 2014
    Date of Patent: August 9, 2016
    Assignee: Google Technology Holdings LLC
    Inventors: Daniel J. Meer, Thomas E. Gitzinger
  • Patent number: 9319638
    Abstract: An on-axis dichroic guide system provides a telescope with an automated active control and focusing system for imaging celestial bodies. The on-axis dichroic guide system mainly comprises a system body, a scope port, a guide port, an imaging port, and an dichroic beam splitter. The scope port is positioned adjacent to the system body, and the guide port is positioned adjacent to the system body opposite to the scope port. The imaging port is positioned adjacent to the system body on an axis that is non-parallel to the axis containing the scope port and the guide port. The dichroic beam splitter is positioned with the system body. In addition, the dichroic beam splitter is arranged to reflect the visible portion of the input light towards the imaging port and to direct the infrared portion the input light towards the guide port.
    Type: Grant
    Filed: June 22, 2012
    Date of Patent: April 19, 2016
    Inventor: Gaston Daniel Baudat
  • Patent number: 9299868
    Abstract: A solar panel mounting system may include a solar panel mounting assembly for mounting to a support structure. The solar panel mounting assembly may include a restraining element, a retaining element and a biasing assembly that supports the restraining and retaining elements. The support structure may include an upper surface and a lower surface spaced from the upper surface. The biasing assembly may further include a biasing element that resiliently urges the retaining element toward a securing element for supporting a solar panel that is positioned between the retaining element and the upper surface of the support structure, and resiliently urges the restraining element toward the lower surface of the support structure. A retention device may resiliently bias the solar panels of a solar panel assembly together on a support structure.
    Type: Grant
    Filed: October 1, 2012
    Date of Patent: March 29, 2016
    Inventor: Marc M. Thomas
  • Patent number: 9263853
    Abstract: An optical semiconductor device includes: a resonator end face; an optical waveguide; a window structure located between the resonator end face and the optical waveguide; and a vernier on the window structure and allowing measurement of length of the window structure along an optical axis direction.
    Type: Grant
    Filed: June 10, 2014
    Date of Patent: February 16, 2016
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yusuke Azuma, Eitaro Ishimura, Kimitaka Shibata