Abstract: A shape value of a pattern having a pivotal characteristic is measured (step S1), an exposure energy variation is detected from the measured value, a first data base is accessed using a result of the measurement of the shape value (Step S2), an exposure energy is calculated (Step S3), a shape value of an isolated pattern is measured (Step S4), a second data base is accessed using a result of the measurement (Step S5), and a focal variation is determined using the calculated proper exposure energy (Step S6).

Abstract: The invention provides an alignment measurement arrangement having a broadband source, an optical system and a detector. The broadband source is arranged to generate a radiation beam with a first and second range of wavelengths. The optical system is arranged to receive the generated radiation beam, produce an alignment beam, direct the alignment beam to a mark located on an object, to receive alignment radiation back from the mark, and to transmit the alignment radiation. The detector is arranged to receive the alignment radiation and to detect an image of the alignment mark located on the object. The detector furthermore produces a first and a second alignment signal, respectively, associated with said first and second range of wavelengths, respectively. The alignment measurement arrangement finally has a processor, which is connected to the detector.

Abstract: An apparatus for checking concentricity between a barrel holder and a lens barrel rotatably engaging with the barrel holder is provided. The lens barrel includes at least one lens coaxially received therein. The apparatus includes a barrel holder retaining member, a rotating member, a driving unit, a light source, and an image sensor. The barrel holder retaining member is used for fixedly retaining the barrel holder in position. The rotating member is structured for meshing with the lens barrel. The driving unit is used for driving the rotating member to rotate, thereby rotates the lens barrel. The light source is configured for emitting light toward a first end of the lens barrel. The image sensor is arranged to face toward an opposite second end of the lens barrel. The image sensor is configured for sensing the light emitted from the light source.

Abstract: The invention relates to a method for positioning a substrate relative to a substrate table, is presented. When the substrate is positioned on the substrate table for a first time, a first relative position of the substrate with respect to the substrate table is determined. When the substrate is positioned on the substrate table a second subsequent time, a second relative position of the substrate with respect to the substrate table is determined and the position of the substrate table with respect to the substrate is adjusted based on the first and second relative positions, so that the substrate is positioned with respect to the substrate table substantially equally to the first relative position.

Abstract: A method and a system are provided for calibrating metrological tools used to measure features of a semiconductor device. A critical dimension (CD) ruler defines a known pitch plus a pitch offset. A photoresist layer is measured to determine a measured pitch whereupon the measured pitch is compared to the known pitch. From the comparison, appropriate calibration steps can be taken to reduce the difference between the known pitch and the measured pitch.

Abstract: Improved systems, apparatus, and methods for detecting positions of moving stages and accurately compensating position error during operation (in “real time”) are provided. For some embodiments, rather than rely on two dimensional position measurements, measurements in at least three dimensions may be taken allowing compensation for pitch and roll and, therefore, more accurate position measurements. Further, by including a measurement of a beam column, compensation for movement of the beam may be performed.

Abstract: A lithographic apparatus comprises a substrate table that supports a substrate having alignment marks on a surface thereof. The apparatus further comprises a frame moveable relative to the substrate to provide for a scanning or stepping mode of operation. An array of projection systems is disposed across the frame for projecting respective patterned beams onto a target portion of the substrate. A plurality of alignment mark detectors are attached to the frame and are moveable with respect to the frame using respective linear drive mechanisms. A position sensor is associated with each alignment mark detector for determining the position of the detector relative to the frame. A control system is responsible for both initial positioning of the detectors above alignment mark patterns on the substrate, and for dynamic alignment of the frame and substrate during a lithographic process.

Abstract: An exposure apparatus performs AGA measurement by using a predetermined sample shot group formed on a wafer, and decides an alignment parameter. The exposure apparatus executes wafer alignment processing and exposure processing by using the alignment parameter. The exposure apparatus notifies a central processing unit of AGA measurement results and the alignment parameter. An overlay inspection apparatus measures an actual exposure position on the exposed wafer, and notifies the central processing unit of the measurement result. The central processing unit optimizes alignment processing on the basis of the AGA measurement results, alignment parameter, and actually measured exposure position.

Abstract: An optical system for alignment assembly of a field emission display panel comprises an optical lens tube, a lens unit, an image conversion unit and an image processing and display unit. The lens unit has at least two optical lenses corresponding to a first outlet end and a second outlet end of the optical lens tube, respectively. A reflective translucent lens is disposed in the optical lens tube to correspond to the inlet end and the first and second outlet ends. The reflective translucent lens transmits several optical signals generated during alignment of the anode and cathode substrates to the lens unit. The image conversion unit and the image processing and display unit are used to display the image captured by the optical lenses on the same display, thereby accomplishing image capture and alignment reference for reference points of the anode and cathode substrates at different focus depths.

Abstract: The orientation of a machine 2 relative to a work-piece 10 is manually controlled by means of an alignment device 4. The device 4 includes a light source 24 rigidly attached to a foot 12 that is resiliently movably attached to the main body 18 of the device. The body 18 of the device 4 houses a light detector 26 for detecting a light beam from the light source 24, the position of the region on the detector 26 illuminated by the beam depending on the orientation of the machine 2 relative to the work-piece 10. The operator is provided with feedback on whether the machine 2 is correctly aligned with a target orientation (usually perpendicular to the surface) and concerning the direction of corrective movement required, if any.

Abstract: Substrate processing apparatus includes a lithographic apparatus which comprises an illumination system for supplying a projection beam of radiation, an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, and a projection system for projecting the patterned beam onto a target portion of a substrate. The processing apparatus also includes a substrate supply arranged to output at least one unbroken length of substrate, and a substrate conveying system arranged to convey each outputted unbroken length of substrate from the substrate supply and past the projection system such that the projection system is able to project the patterned beam onto a series of target portions along each unbroken length of substrate. In certain embodiments, long lengths of substrate are supplied from a roll, but alternatively a series of separate sheets can be supplied.

Abstract: An image display device including a plurality of laser light sources arranged to produce angularly offset beams of light, and scanning optics configured to raster scan the angularly offset beams of light simultaneously across separate parallel lines of pixels of a display surface to form an image, wherein each beam of light scans substantially the entire display surface.

Abstract: It is an object of the present invention to provide a substrate processing apparatus, comprising a housing body mounting unit that is capable of mounting a plurality of housing bodies which can house a plurality of substrates, a processing apparatus main body for processing a substrate extracted from the housing body, a transportation unit for transporting the substrate between the housing body and the processing apparatus main body, a processing control unit for controlling the transportation unit and making it transport the substrate between the housing body and the processing apparatus main body, and a transportation control unit for controlling the transportation unit and making it transport the substrate from one housing body to another housing body without passing through the processing apparatus main body.

Abstract: Non-imaging measurement is made of misalignment of lithographic exposures by illuminating periodic features of a mark formed by two lithographic exposures with broadband light and detecting an interference pattern at different wavelengths using a specular spectroscopic scatterometer including a wavelength dispersive detector. Misalignment can be discriminated by inspection of a spectral response curve and by comparison with stored spectral response curves that may be empirical data or derived by simulation. Determination of best fit to a stored spectral curve, preferably using an optimization technique can be used to quantify the detected misalignment. Such a measurement may be made on-line or in-line in a short time while avoiding tool induced shift, contact with the mark or use of a tool requiring high vacuum.

Abstract: A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. Visible light is used to detect alignment patterns on the surface layer and infrared light is used to detect patterns one layers below the surface. For example, reflected visible light and transmitted infrared light are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.

Abstract: An array of optical elements for processing a spatially dispersed optical beam including monitoring optical elements for determining the position of the optical beam in the array is disclosed. The monitoring optical elements have a width that varies in ay direction normal to the array axis, enabling the determination of the beam position across the monitoring elements in both x and y directions. The monitoring optical elements are preferably disposed in the end portions of the array for the beam tilt determination. The optical elements can be e.g. liquid crystal pixels or micro-mirrors.

Abstract: Both the 1st and 0th diffraction orders are detected in a scatterometer. The 1st diffraction orders are used to detect the overlay error. The 0th diffraction order is then used to flag if this is a false overlay error calculation of magnitude greater than the bias but smaller than the pitch of the grating.

Abstract: A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.

Abstract: The present invention enables the user to measure process line shortening (PLS) on an overlay tool. In an example embodiment (900), to obtain the PLS, the user applies a method to determine the misalignment (MA) of a composite image on a substrate (940a), from the composite image the user may determine the total line (940b) shortening (TLS) and the equipment line (940c) shortening (ELS). The process line shortening (PLS) is determined (940d) as a function of TLS and ELS.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: An alignment system uses a self-referencing interferometer that produces two overlapping and relatively rotated images of an alignment marker. Detectors detect intensities in a pupil plane where Fourier transforms of the images are caused to interfere. The positional information is derived from the phase difference between diffraction orders of the two images which manifests as intensity variations in the interfered orders. Asymmetry can also be measured by measuring intensities at two positions either side of a diffraction order.

Abstract: A film frame aligner for automatically aligning a film frame includes a film frame support, a film frame pusher for pushing the film frame, and a film frame location mechanism for locating at least one notch in the film frame.

Abstract: A surface position measuring method wherein measurement light is obliquely projected onto a substrate surface and on the basis of a position of the detected measurement light and a predetected offset, the position of the substrate surface with respect to a direction of an optical axis of the projection optical system is measured, memorizing a first position of a point on the substrate while using a reference mark provided on a substrate stage, measuring the position of the measurement light as a first measurement position; rotating the substrate by 180 deg. in a plane perpendicular to the optical axis; memorizing a second position of the measurement point on the rotated substrate with reference to the reference mark; measuring the position of the measurement light as a second measurement position; and detecting of the offset at the measurement point on the basis of the first and second measurement position.

Abstract: An exposure apparatus includes an original stage arranged to hold a reflective original having a pattern, a substrate stage arranged to hold a substrate, an illumination optical system arranged to emit exposure light along a first direction inclined from a direction of a reflection surface of the reflective original, a projection optical system arranged to project the pattern onto the substrate along a second direction using the exposure light reflected by the reflection surface of the reflective original, an original reference member arranged on the original stage or the reflective original, a substrate reference member, having a substrate mark, arranged on the substrate stage or the substrate, and a detector arranged to detect light from the substrate mark of the substrate reference number, which is illuminated with light.

Abstract: A laser beam may be used to provide a virtual reference axis of travel for the in-axis direction of motion of lenses in a zoom assembly to be positioned during a zoom operation. The virtual reference axis is projected along the optical axis, parallel to existing mechanical lens slides. The virtual reference axis passes through an aperture on each of the lens assemblies, and is sampled by a set of optics and detectors on each of the lens assemblies. The optics and detectors are arranged such that any change in the position of a lens cell within a lens assembly relative to the virtual reference axis is sensed and corrected using a feedback signal to a positioning motor. Since the same virtual reference axis is used for each lens in the zoom assembly, each lens can be independently corrected for off-axis position errors to very high precision.

Abstract: An optical alignment detection system for detecting the alignment of a first object relative to a second object is provided. One or more light sources and one or more light detectors, either or both of which are secured relative to the second object, are used to detect the position of one or more light scattering elements on the first object.

Abstract: A system and related method are provided for automated positioning of camera. The system includes a remote control configured to generate a spot signal in response to input from a user. The camera generates image data of the camera's field of view. The camera is captures the spot signal within the image data. The camera includes a positioning subsystem configured to orient the camera. The system further includes a processing subsystem configured to identify the location of the spot signal within the image data. Based upon the identified location, the processing subsystem provides instructions to the positioning subsystem to reorient the camera. In this manner, users of the system can align the camera upon a prescribed location, without needing to monitor camera output to ensure proper alignment.

Abstract: A laparoscopic tumor therapy method and an articulated electron beam transport system are provided for use with a high power, long focus electron source for tumor therapy. The high power, long focus electron source generates an e-beam. The e-beam is transported through a laparoscopic tube proximate a target tumor for electron irradiation therapy.

Abstract: A method and apparatus for measuring the relative positions of first and second components, comprising: mounting first and second measurement units on respective housings forming part of each component and which are rotatably arranged and infinitely adjustable thereon in respective brackets for defining first and second adjustably selected rotational axes, respectively; measuring the relative positions of the components in first and second states of operation by detecting the relative positions of those selected axes in each state of operation and producing measurement values determinative of those relative positions.

Abstract: An off-axis alignment system in a lithographic projection apparatus uses broadband radiation to illuminate a phase grating on the wafer. The broadband radiation source may include fluorescent materials, e.g. Yag:Ce or ND:Yag crystals illuminated by excitation light.

Abstract: A method for actively aligning the components of an optoelectronic device. The optoelectronic device includes a first portion containing a laser and a second portion containing an optical element. In one embodiment, the optoelectronic device is a laser package having a header structure containing a laser and a header can containing a lens. The method includes transmitting an optical signal from the laser through the optical element and comparing the position of the optical signal relative to a reference in order to determine whether the optical coupling of the laser with the optical element is within a desired tolerance range.

Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.

Abstract: A system and method for determining whether one or more slides are loaded properly within a cassette. Each slide includes one or more transparent regions and one or more non-transparent regions. The slides are between a light source and a sensor. The light source generates light that is directed towards the sensor through the slides. If the sensor is able to detect light from the light source, then the slides are properly loaded in the cassette. Slides are not properly loaded if the light is blocked by a non-transparent region before reaching the sensor. The sensor or a separate controller can generate a signal or data to provide an indication to a user or to processing equipment that the slides are or are not properly loaded. For example, a speaker or an indicator light can be used to provide an indication to the user. The signal or data can also be used for other functions, such as displaying a message on a screen indicating whether the slides are properly loaded.

Abstract: The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract: A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.

Abstract: An alignment device and method for delivering a light beam to an optical application, such as an optical trap having a pair of lenses with overlapping focal regions for trapping a particle therein. The alignment device includes a light source for generating a beam of light, a support member, an optical fiber, a collimating lens, and actuators. The optical fiber includes an input end for receiving the beam of light, and a generally rigid portion extending from the support member and terminating in a delivery end for emitting the beam of light. The collimating lens collimates the emitted beam of light. The actuators exert forces on the generally rigid portion such that it pivots about a pivot point of the optical fiber at the support member. The collimated beam of light pivots about an optical pivot point as the optical fiber pivots about the pivot point.

Abstract: An apparatus for measuring an alignment accuracy between overlaid alignment marks formed to each of alignment mark portions on every plural chip units or exposure units arranged on a substrate to be measured includes an XY stage movable X and Y directions while mounting the substrate, an illumination system for illuminating each of the alignment mark portions, a detecting system having a lens for collecting a reflection light, a focusing system for focusing the reflection light, a scanning system for scanning a reflection light image and an image sensor receiving reflection light image for conversion into an image signal. An alignment accuracy calculator measures the alignment accuracy between the overlaid alignment marks.

Abstract: A level sensor for a lithographic projection apparatus includes a light source configured to direct light onto a substrate to be measured, a detector configured to detect light reflected from the substrate, and a processor configured to calculate a difference between measurements made with the filter in the first configuration and in the second configuration. The sensor is adjustable between a first configuration, in which the light is given a first property, and a second configuration, in which the light is given a second property. The sensor may include a polarizing filter, such that the first and second properties are different polarization states.

Abstract: A scanning exposure apparatus includes a projection system, a stage system, a first detector and a control system. The stage system has first and second stages, each of which is movable independently in a plane while holding a substrate. The first detector detects focusing information of a vicinity of an outer circumference of the substrate during a detecting operation. The control system controls the stage system to perform the detecting operation with the first stage, while performing a first exposure operation on the substrate held by the second stage. After the first exposure operation, a second exposure operation for the substrate held on the first stage is performed, in which a shot area in the vicinity of the outer circumference of the substrate is exposed by moving the first stage while adjusting a position of the substrate surface held by the first stage using the detected focusing information.

Abstract: An apparatus for analyzing a population of particles is set forth. The apparatus includes an emitter adapted to generate a beam of electromagnetic radiation, such as from a laser, and a particle chamber disposed in a path of the electromagnetic radiation beam. The apparatus also includes a sensor to detect electromagnetic radiation scattered by or otherwise received from the particle chamber. A sensor alignment unit supports the sensor along a detection axis and allows adjustment of the position of the sensor along orthogonal axes lying in a plane that is generally perpendicular to the detection axis. In one embodiment, the sensor alignment unit includes a first support platform and a first adjustment mechanism disposed to adjust the position of the first support platform along a first orthogonal axis. The sensor alignment unit also includes a second support platform that supports the sensor.

Abstract: A first electronic component having two alignment holes perforated at predetermined positions thereof at a predetermined interval is held with a receiving table, and also a second electronic component having two alignment marks formed at predetermined positions thereon at an interval therebetween in agreement with that between the two alignment holes is held with a position-adjusting mechanism. In a state in which the alignment marks of the second electronic component are introduced in the corresponding alignment holes of the first electronic component, the mark-recognition apparatus captures the alignment marks and the alignment holes in the same fields of view thereof and measures the positions of the two components, and the position-adjusting mechanism adjusts the position of the second electronic component such that the alignment marks of the second electronic component lie at predetermined positions in the alignment holes of the first electronic component.

Abstract: The unevennesses of a chuck are measured at various positions and are stored, as discrepancies from an idealized plane, in a databank. The measured discrepancies are used to calculate corrections for the predetermined settings for the focus distance and/or the tilt of the chuck. These corrections are in each case used differently for adjusting the respective exposure of the exposure areas.

Abstract: An exposure apparatus which exposes substrates to a pattern on a master. The apparatus includes first, second and third chucks which hold the substrates, a first fine adjustment stage which holds the first chuck to perform fine driving, a second fine adjustment stage which holds the second chuck to perform fine driving, a coarse adjustment stage on which the first and second fine adjustment stages are mounted and which can move in an X-Y plane substantially perpendicular to an optical axis, an exposure unit which performs exposure operation for the substrate held by the first chuck, a measurement unit which performs measurement operation for the substrate held by the second chuck, and a controller which drives the coarse adjustment stage and causes the measurement and exposure units to perform the measurement and exposure operations, respectively.

Abstract: An alignment measuring system includes a focusing diode, a light source, an image sensor, first and second splitters, and a controller. The first splitter directs a portion of light from the light source toward a wafer, and directs light returned by the wafer to the second splitter. The second splitter directs a first portion of the light toward the image sensor, and a second portion of the light toward the focusing diode, and control the ratio of the first and second portions in response to a control signal from the controller. The image sensor receives the first portion of light and produces a detection signal. The controller receives the detection signal, determines an alignment state of the wafer, and controls a stage to align and position the wafer.

Abstract: A calibration method comprising generating a pattern with an array of individually controllable elements, providing a substrate table with a radiation sensor, using radiation to generate an image of the pattern at the substrate table, moving at least one of the generated pattern and the substrate table relative to each other in order to move the image relative to the sensor, detecting radiation intensity with the sensor, and calculating a calibration establishing a relationship between coordinates of the coordinate system of the array of individually controllable elements and coordinates of the coordinate system of the substrate table, based on the detected intensity and the positions of the array of individually controllable elements and the substrate table.

Abstract: Improved component placement inspection and verification is performed by a pick and place machine. Improvements include stereovision imaging of the intended placement location; enhanced illumination to facilitate the provision of relatively high-power illumination in the restricted space near the placement nozzle(s); optics to allow image acquisition device to view the placement location from an angle relative to a plane of the placement location, thereby reducing the possibility of such images being obstructed by the component; techniques for rapidly acquiring images with commercially available CCD arrays such that acquisition of before and after images does not substantially impact system throughput; and image processing techniques to provide component inspection and verification information.

Abstract: An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns at multiple polarization states and comparing the resulting intensities of the polarization states, it can be determined if the two elements are aligned. A reference measurement location may be used that includes third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is measured at two polarization states. The difference in the intensities of the polarization states at reference measurement location and is used to determine the amount of the alignment error.

Abstract: A movable portion of a substrate carrier handler is extended into a transport path along which a substrate carrier transport system transports a substrate carrier, respective kinematic coupling events are detected between corresponding interface elements of the movable portion and the substrate carrier, respective signals are generated in response thereto, and an alignment offset between the substrate carrier and the substrate carrier transport system is determined based on the signals. A movable portion matches an elevation, position, and/or a speed/velocity of a substrate carrier moving along the transport path. Sensors for detecting kinematic coupling and generating signals in response thereto are provided on the movable portion. An end effector includes a support with interface elements and sensors for detecting kinematic coupling and generating respective signals.