Abstract: An optical system includes more than two optical interferometers that generate interference phenomena between optical waves to measure a plurality of distances, a plurality of thicknesses, and a plurality of indices of refraction of a sample. An electromagnetic detector receives an output of the optical interferometers to render a magnified image of at least a portion of the sample. A controller reduces or eliminates undesired optical signals through a hierarchical phase unwrapping of the output of the electromagnetic detector.

Abstract: An angular displacement of an object is measured interferometrically by splitting a laser beam into a reference beam and a measuring beam. The reference beam is directed at a stationary reference retroreflector and then a phase shift detector. The measuring beam is directed at a rotatable reflective surface of the object and then a stationary measuring retroreflector and then back to the rotatable reflective surface and then to the phase shift detector such that the phase shift detector measures an angular displacement of the rotatable reflective surface when the length of the path of the measuring beam changes when the rotatable reflective surface is displaced.

Abstract: An apparatus and method are provided. In particular, at least one first electro-magnetic radiation may be provided to a sample and at least one second electro-magnetic radiation can be provided to a non-reflective reference. A frequency of the first and/or second radiations varies over time. An interference is detected between at least one third radiation associated with the first radiation and at least one fourth radiation associated with the second radiation. Alternatively, the first electro-magnetic radiation and/or second electro-magnetic radiation have a spectrum which changes over time. The spectrum may contain multiple frequencies at a particular time. In addition, it is possible to detect the interference signal between the third radiation and the fourth radiation in a first polarization state. Further, it may be preferable to detect a further interference signal between the third and fourth radiations in a second polarization state which is different from the first polarization state.

Abstract: An interferometric system for measuring surfaces of a measured object using an optical system. The optical system has a beam splitter, which directs measuring beams in a first beam path and measuring beams in a second beam path onto the surfaces of the measured object with the aid of two mirrors. The beam paths which are formed by the light beams which are reflected on the surfaces at least partially overlap in an area having identical beam direction. In this manner, measured surfaces of the measured object are at least partially imaged on an identically irradiated surface of a detector, such as an image recorder.

Abstract: A device for optically sensing a specimen with a large depth of field has a lighting module which illuminates a zone of the specimen during a predetermined measurement period with a pattern whose phase is modified in time during the measurement period, generating a specimen light to which a corresponding time-variable phase is imparted. The device also includes a detection module having a space-resolving detection zone which records the specimen zone and has multiple recording pixels, two analysis channels which can be connected to the recording pixels, and an analysis unit is connected to both analysis channels.

Abstract: Measurement of Brillouin scattered light is enabled without an optical receiver having a wide reception band.

Abstract: A laser Doppler vibrometer for vibration measurement that employs active feedback to cancel the effect of large vibration excursions at low frequencies, obviating the need to unwrap phase data. The Doppler shift of a reflective vibrating test object is sensed interferometrically and compensated by means of a voltage-controlled oscillator driving an acousto-optic modulator. For frequencies within the servo bandwidth, the feedback signal provides a direct measurement of vibration velocity. For frequencies outside the servo bandwidth, feedback biases the interferometer at a point of maximal sensitivity, thus enabling phase-sensitive measurement of the high-frequency excursions. Using two measurements, one with a low bandwidth and one with a high bandwidth, more than five decades of frequency may be spanned.

Abstract: The present invention relates to alignment marks for use on substrates, the alignment marks consisting of periodic 2-dimensional arrays of structures, the spacing of the structures being smaller than an alignment beam but larger than an exposure beam and the width of the structures varying sinusoidally from one end of an array to the other.

Abstract: Various systems and methods for analysis of optical pulses are provided. In one embodiment, an optical system is provided having an optical axis. The optical system includes a two-dimensional diffraction grating positioned along the optical axis, and a spectral filter positioned along the optical axis after the two-dimensional diffraction grating. The spectral filter is angularly offset about a vertical transverse angle associated with the optical system. The diffraction grating is angularly offset about the optical axis relative to the spectral filter, and an optical capture device positioned after the spectral filter.

Abstract: Provided are a three-dimensional image measuring method and apparatus for an LCD color filter automatic grinder. It is possible to measure a three-dimensional image of an LCD color filter, even though textures for recovering the three-dimensional image are insufficient, by irradiating illumination passed through a patterned filter to the LCD color filter. In addition, it is possible to measure a three-dimensional image of an LCD color filter by obtaining a plurality of image sequences along an optical axis of a camera composed of CCD or CIS. Illumination is irradiated to an LCD color filter to be measured through a patterned filter.

Abstract: A process (300) is disclosed to measure predetermined wavelength reflectance spectra of a photo resist coated wafer (305,310,315,320) at a nominal thickness. After coating, the predetermined wavelength reflectance (325,330) is measured and the peak heights and valleys in the vicinity of the predetermined wavelength are tabulated. The relative swing ratio is computed (335) as the average peak height of the spectra at the exposure wavelength. This relative swing ratio is then compared to similar computations on other processes to determine which provides the best critical dimension (CD) control.

Abstract: Brillouin scattered light is used to measure the distribution of elasticity and viscosity in a measurement object without contact and in a noninvasive and simpler manner. Measuring light emitted from a light source is directed from a light probe onto a measurement object, and scattered light is received by the light probe. A control computer analyzes the light spectrum of scattered light received by the light probe, calculates at least one parameter selected from the center frequency and the linewidth of the elastic wave scattered components as viscoelastic information, matches the viscoelastic information with the position of a target area in the measurement object, and outputs image information. The position information of the target area in the measurement object is acquired by photographing light spots of guide light with a camera provided to the light probe.

Abstract: An apparatus and a method for measuring very small separations between a transparent or semi-transparent first body and a second body, wherein one or more light sources produce light that is split into two distinct paths. One path is directed through the first body at two locations, one where it reflects from the interface at the separation to be measured, and another where the second body does not affect the reflection. The second path is directed at a frequency shifter, which shifts the frequency of the light. The two paths are recombined and interfereometric variations of intensity, substantially at the frequency of the shifter, are detected. The difference in phase between the measurement and reference areas with the second body not present is subtracted from the difference in phase between the measurement and reference areas with the second body present. The difference in differences yields the phase change that occurs when the second body is introduced.

Abstract: A method includes calculating destructive interference conditions between two linearly s-polarized waves and between two linearly p-polarized waves, respectively, in dependence on varying parameters of the s- and p-polarized waves, representing the destructive interference conditions in a diagram, setting an optical radiation field to be used in the optical imaging process, and comparing the optical radiation field with the diagram.

Abstract: A heterodyne interferometer having two interferometer arms and one optical modulator for changing the frequency of a radiation conducted via one interferometer arm and having a control device for setting the frequency change of the radiation and a detector device for analyzing the interfered output radiation. The amplitude of an input beam conducted into the heterodyne interferometer is modulated using a frequency which is different from the frequency change of the radiation in the optical modulator prior to being split between the interferometer arms. A heterodyne frequency corresponding to the difference of the frequency change of the radiation and the frequency of the amplitude modulation of the radiation may be achieved.

Abstract: A method and an apparatus for measuring optical heterodyne interference in which a reference light and a measurement light differing in frequency is generated. The measurement light is S- or P-polarization light which is irradiated on a target through a polarization light beam splitter, and the reference light is P or S-polarization light which is reflected by a mirror. Interference of the measurement light from the target and the reference light reflected from the mirror is obtained by a light receiving element so as to measure a surface condition or detecting a surface detect on the target. A polarizing plate which is arranged before the light receiving element has an axis rotated so that a signal from the light receiving element becomes a minimum when the reference light is selectively shut off by a light shut off mechanism arranged before the polarization light beam splitter.

Abstract: An optical characteristic measuring apparatus includes: a light source section which sweeps wavelengths of a first input light and a second input light respectively, frequencies of the first and second input lights being different from each other and polarized states of the first and second input lights being perpendicular to each other, and outputs the first and second input light; an interference section which inputs one branched light of the first and second input lights to a measuring object, makes output light from the measuring object interfere with other branched light of the first and second input lights, and outputs a plurality of interference lights; a plurality of light receiving sections which are respectively provided for the interference lights, receives the interference lights respectively, and outputs signals in accordance with optical powers of the interference lights respectively; and a low-pass filter for filtering the outputted signals.

Abstract: A self referencing heterodyne reflectometer is disclosed which rapidly alternates between a heterodyne reflectometry (HR) mode, in which an HR beam comprised of s- and p-polarized beam components at split angular frequencies of ? and ?+?? is employed, and a self referencing (SR) mode, in which an SR beam comprised of p-polarized beam components at split angular frequencies of ? and ?+?? is employed. Alternatively, in SR operating mode the SR beam is replaced by a p-polarized amplitude modulated (AM) beam, operating at two modulated amplitudes of ? and ?+?? at a single frequency, ??. When the two measurements are made in rapid succession, using an optical chopper switcher, temperature induced noise in the detector is be assumed to be equivalent. Film phase shift information is derived from the measured phase shift ?Ref/film, generated from the HR beam, and the reference phase shift ?Ref/Sub, generated from the SR/AM beam, which are used for calculating film thickness.

Abstract: The present invention is directed to a self referencing heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, without the availability of a reference wafer for calibrations. The self referencing heterodyne reflectometer rapidly alternates between a heterodyne reflectometry (HR) mode, in which an HR beam comprised of s- and p-polarized beam components at split angular frequencies of ? and ?+?? is employed, and a self referencing (SR) mode, in which an SR beam comprised of p-polarized beam components at split angular frequencies of ? and ?+?? is employed. When the two measurements are made in rapid succession, temperature induced noise in the detector is be assumed to be the same as for both measurements. A measured phase shift ?Ref/film is generated from the HR beam and a reference phase shift ?Ref/Sub is generated from the SR beam.

Abstract: An optical characteristic measuring apparatus includes: a light source section which sweeps wavelengths of a first input light and a second input light respectively, frequencies of the first and second input lights being different from each other and polarized states of the first and second input lights being perpendicular to each other, and outputs the first and second input light; an interference section which inputs one branched light of the first and second input lights to a measuring object, makes output light from the measuring object interfere with other branched light of the first and second input lights, and outputs a plurality of interference lights; a plurality of light receiving sections which are respectively provided for the interference lights, receives the interference lights respectively, and outputs signals in accordance with optical powers of the interference lights respectively; and a low-pass filter for filtering the outputted signals.

Abstract: The present invention provides a compact analog directly modulated laser configuration that is suitable for use in the field that uses electrical feedback to compensate for non-linearity in real time, such that no matter how the LI curve changes, the electrical feedback compensates for non-linearity by amplifying a portion of the output analog optical signal and combining it with the input analog electrical signal using the standard control method of negative feedback. When the gain of the feedback loop is relatively high, the overall transfer function of the system is primarily dependent on the feedback loop gain block, which is substantially linear. This is accomplished by incorporating a relatively large bandwidth photo-detector at the back facet of the laser that both monitors the output power of the system and provides a feedback signal to the linearization control circuit, as well as an amplifier.

Abstract: In an example embodiment, there is a method (600) for determining an approximately optimal resist thickness comprising providing a first substrate coated with a resist film having a first thickness using a first coat program, (605, 610). The first thickness of resist is measured (615, 620). A second substrate is provided (625) and coated with a resist film using the first coat program. The resist film on the second substrate is exposed to radiation. The reflectance spectrum near the actinic wavelength of the resist film is measured (630). As a function of the periodicity of the reflectance spectrum, an effective refractive index is determined. Based on the effective refractive index, a periodicity of a swing curve of the resist film coated on the second substrate is determined (635). The maxima and minima are determined as a function of the periodicity.

Abstract: A device for aligning a substrate and a mask, and a method using the same, where the device includes aligning marks in unused portions of the substrate and the mask, a sensing unit for determining overlap of the aligning marks when the substrate is aligned with the mask, and a control unit for controlling an aligning process to be repeated on the basis of data sensed and determined by the sensing unit. The sensing unit may include a camera positioned in photographic range to determine any alignment error in the alignment marks. According to another embodiment of the present invention, the alignment error between the substrate and the mask is sensed to determine whether it is acceptable or not. When the alignment error is unacceptable, the operations for aligning the substrate with the mask are repeated until the alignment error is acceptable.

Abstract: A light source apparatus is equipped with at least three light sources each having a predetermined wavelength interval and different central wavelengths. At least one multiplexing means having wavelength selectivity, for multiplexing light emitted from each of a first group and a second group of the light sources is provided, the first group of light sources including odd ordered light sources and the second group of light sources including even ordered light sources when counted in order of lengths of the central wavelengths thereof. Multiplexing means not having wavelength selectivity, for multiplexing light emitted from the first group of light sources and the second group of light sources is also provided.

Abstract: A vibrometer system for determining the vibration spectrum of an object under examination. The vibrometer includes a bundle of optical fibers arranged in an array, wherein a majority of the fibers in the array are arranged to receive light reflected from the object under examination and a minority of the fibers in the array are arranged to transmit light to illuminate the object under examination, wherein the light reflected from the object under test by received by the majority of fibers was transmitted by the minority of fibers; a plurality of light amplifiers and detectors for amplifying and detecting the received light; and a coherent detector responsive to the detected light and to the transmitted light for providing an output signal representative of the vibration spectrum of the object under examination.

Abstract: The present invention is directed to a heterodyne reflectometer system and method for obtaining highly accurate phase shift information from heterodyned optical signals, from which extremely accurate film depths can be calculated. A linearly polarized light comprised of two linearly polarized components that are orthogonal to each other, with split optical frequencies, is directed toward a film causing one of the optical polarization components to lag behind the other due to an increase in the optical path in the film for that component. A pair of detectors receives the beam reflected from the film layer and produces a measurement signal, and the beam prior to incidence on the film layer and generates a reference signal, respectively. The measurement signal and reference signal are analyzed by a phase detector for phase shift. The detected phase shift is then fed into a thickness calculator for film thickness results.

Abstract: An optical apparatus according to this invention includes a first element, a second element, a support which supports the first element, a first measuring device which measures the position of the first element relative to the support, a second measuring device which measures the position of the second element relative to the support, a third measuring device which measures any deformation of the support, and a controller. The controller controls the relative position between the first element and the second element on the basis of the measurement results obtained by the first measuring device, the second measuring device, and the third measuring device.

Abstract: Two common-path interferometers share a measuring cavity for measuring opposite sides of opaque test parts. Interference patterns are formed between one side of the test parts and the reference surface of a first of the two interferometers, between the other side of the test parts and the reference surface of a second of the two interferometers, and between the first and second reference surfaces. The latter measurement between the reference surfaces of the two interferometers enables the measurements of the opposite sides of the test parts to be related to each other.

Abstract: An apparatus for inspecting a ball-bumped wafer is provided in which an wafer to be inspected, in which a plurality of chips having ball bumps are formed, is mounted on a wafer table; an inspection light is irradiated from a light projection optical system to the wafer mounted on the wafer table; an intensity of the reflected light from a surface, including a bump surface, of the wafer is detected by a detection optical system; and a shape, such as a height, a diameter and a position, of the ball bump is measured on the basis of the intensity of the inspection light.

Abstract: A double pass apparatus for detecting defects on a disk surface includes a light source that generates a light beam and a beamsplitter that splits the light beam into a first light beam portion and a second light beam portion. A modulator is provided that modulates the second light beam portion into a frequency shifted modulated light beam for illuminating the surface of the disk. The frequency shifted modulated light beam is twice reflected from the surface of the disk, thus doubling the frequency shift of the reflected light beam. A polarizing beamsplitter combines the first light beam portion with the reflected light beam portion providing an interference signal.

Abstract: An optical system provides information about tangential vibration components of a surface at remote location. The optical system includes a light source assembly that emits first and second beams, each having one or more wavelengths and one or two polarizations. The first and second beams are directed to the interrogated surface. A detector system is positioned to detect a third beam formed by at least a portion of the first and second beams being reflected from the interrogated surface. The first, second and third beams having incident and reflection angles relative to the interrogated surface that do not lay in a same plane. The detector system positioned remotely from the interrogated surface, and providing information on a phase change in the third beam relative to the first and second beam. The phase change is indicative of at least one surface vibration vector component of the interrogated surface. The detector system is a 90 degree optical hybrid balanced detector with four photodiodes.

Abstract: Thermal expansion characteristics of test materials of ultra-low thermal expansion material are measured with a test beam that is split into a test material-measuring portion and an instrument-measuring portion. Both measuring portions propagate through common portions of a test arm. The test material-measuring portion encounters a test material, but the instrument-measuring portion does not. Thermal expansion characteristics of the test material are measured to high accuracy by manipulating the measures to distinguish displacements associated with the test material from displacements associated with the instrument structure.

Abstract: Apparatus for determining the thickness of a configuration having flat, parallel surfaces that are transparent, or nearly so, to pre-specified types of energy. Embodiments comprise a mechanism for illuminating a front surface with an energy source and mechanisms for measuring reflections of the illumination from a parallel back surface. The energy is contained in a spectrum of wavelengths, the energy being refracted in components at unique wavelengths, e.g., different colored light bands, and similarly reflected from the back surface. The measuring mechanisms, e.g., spectrometers, determine the relative lateral displacement between two spectral lines in the refracted and reflected beams to enable determination of thickness. Other characteristics of the material of the configuration may be ascertained, e.g., chemical composition is ascertained by measuring the intensity of responses at multiple wavelengths and comparing this to responses of known materials.

Abstract: A frequency-scanning interferometer is modified to include a diffuse reference surface. An illuminating system produces an expanding measuring beam, portions of which reflect from a test object surface and the diffuse reference surface on converging paths to an imaging system. Interference patterns between overlapping images of the object and reference surfaces are generated at a plurality of frequencies for measuring the object surface with respect to the reference surface.

Abstract: A method and apparatus for measuring the optical thickness and absolute physical thickness of an optically transparent object utilizes a reflective interferometric process. A broadband optical signal is directed toward the object to be measured, and a pair of signals reflected off of the object are processed to determine the optical thickness of the object. When used with an optical fiber preform, the technique can be used to measure the outer diameter of the preform and control the drawing process. If the index of refraction of optically transparent object is known, the absolute physical thickness can also be determined.

Abstract: A position measuring arrangement for determining a relative position between a first object and a second object. The arrangement includes a light source having a single-mode laser light source that generates radiation and a signal generator that receives the radiation and generates displacement-dependent output signals that determine a relative position between a first object and a second object. A feedback device, wherein the laser light source interacts with the feedback device in such a way that an excitation of several modes takes place in the single-mode laser light source, and a multi-mode operation of the single-mode laser light source results.

Abstract: In one aspect, the invention relates to an apparatus for monitoring thickness variations of an object having first and second opposing surfaces. The apparatus includes a first source positioned to project a first fringe pattern at a first location on the first surface and a second source positioned to project a second fringe pattern at a first location on the second surface. The apparatus further includes a first detector positioned to detect the first fringe pattern at the first location on the first surface, the first detector generating a first signal in response to the first fringe pattern at the first location. The apparatus also includes a second detector positioned to detect the second fringe pattern at the first location on the second surface, the second detector generating a second signal in response to the second fringe pattern at the first location.

Abstract: The methods of the present invention are directed at an accurate phase-based technique for measuring arbitrarily long optical distances with sub-nanometer precision. A preferred embodiment of the present invention method employs a interferometer, for example, a Michelson interferometer, with a pair of harmonically related light sources, one continuous wave (CW) and a second source having low coherence. By slightly adjusting the center wavelength of the low coherence source between scans of the target sample, the phase relationship between the heterodyne signals of the CW and low coherence light is used to measure the separation between reflecting interfaces with sub-nanometer precision. As the preferred embodiment of this method is completely free of 2? ambiguity, an issue that plagues most phase-based techniques, it can be used to measure arbitrarily long optical distances without loss of precision.

Abstract: A high-resolution and high-speed film thickness and thickness uniformity measurement method is disclosed in this invention. The disclosed method includes a step a) of measuring a film thickness at a single point on the top surface of the substrate using an interferometry with a measuring light beam having a range of wavelengths. The method further includes a step b) of selecting an optimal wavelength from the range of wavelengths applied for measuring the film thickness at the single point. The method further includes a step c) of measuring reflection intensities by scanning over a plurality of points with a measuring light beam of the optimal wavelength over the top surface of the substrate. The method further includes a step d) of calculating a film thickness at the plurality of points applying the optimal-wavelength reflection intensities at the plurality of points over the top surface of the substrate.

Abstract: Described is a method for screening for alterations in exocytosis of a population of cells. The cells are sorted by a FACS machine by assaying for alterations in at least three of the properties selected from the group consisting of light scattering, fluorescent dye uptake, fluorescent dye release, annexin granule binding, surface granule enzyme activity, and the quantity of granule specific proteins. Methods for screening for bioactive agents capable of modulating exocytosis in a cell are also described. The methods provide for reduced background and increased specificity without increasing the time or steps involved in assaying for exocytosis.

Abstract: The invention features a method for determining a geometric property of a test object, the method including: interferometrically profiling a first surface of the test object in a first coordinate system; interferometrically profiling a second surface of the test object in a second coordinate system different from the first coordinate system; providing a relationship between the first and second coordinate system; and calculating the geometric property based on the interferometrically profiled surfaces and the relationship between the first and second coordinate system. In some embodiments, the relationship may be determined by using calibrated gage blocks or by using a displacement measuring interferometer. Corresponding system are also described.

Abstract: An interferometric measuring device for measuring the shape of a surface of an object has a radiation source which emits a short-coherent radiation, a beam splitter for forming an object beam which is directed via an object light path to the object and a reference beam which is directed via a reference light path to a reflective reference plane. The interferometric measuring device also has an image converter which picks up the radiation that has been brought to interference and reflected back from the surface and the reference plane and sends it to an analyzing device for determining a measurement result pertaining to the surface. To analyze the interference peak by scanning, the optical length of the object light path is altered relative to the optical length of the reference light path, or an intermediate image of the surface produced in the object light path is scanned.

Abstract: To determine the uniformity of an optical component, a light beam is directed to impinge on a surface of an optical component at each of multiple points. A characteristic of the light beam impinging on the optical component surface at each of the multiple points is modified so as to have multiple different values. Light from the impinging light beam that passes through the optical component at each of the multiple points, with the light beam characteristic at each of the multiple different values, is detected. The non-uniformity of the optical component is determined based on the detected passing light.

Abstract: A method for determining the thickness and other properties of a metal layer comprising producing an acoustic wave at a first frequency in the metal layer with a first laser beam, measuring the angle of diffraction of a second laser beam from the acoustic wave, and calculating the wavelength of the acoustic wave and thickness of the metal layer from the angle of diffraction.

Abstract: An arrangement comprises an optical modulator for fast modulation which is provided in an interferometer arm of the interferometer arrangement for heterodyne detection. In one aspect, the modulator is used simultaneously for switching and/or beam attenuation in a laser scanning microscope. A method for operation of the arrangement by using such laser scanning microscope for single-photon and/or multiphoton fluorescence and using the heterodyne detection for referencing the fluorescence to regions deep in the specimen is also disclosed.

Abstract: A method and apparatus for measuring the optical thickness and absolute physical thickness of an optically transparent object utilizes a reflective interferometric process. A broadband optical signal is directed toward the object to be measured, and a pair of signals reflected off of the object are processed to determine the optical thickness of the object. When used with an optical fiber preform, the technique can be used to measure the outer diameter of the preform and control the drawing process. If the index of refraction of optically transparent object is known, the absolute physical thickness can also be determined.

Abstract: At each measurement time, reflected light from a semiconductor wafer W or the like by measurement light from a measurement light source 11 is coupled to reference light from a reference light generating section 14, and interference light is detected by a photodetector 15. A raw thickness value calculating section 16b selects two light intensity peaks corresponding to the upper and lower surfaces of the wafer W from a light intensity distribution between an interference light intensity and a reference optical path length and calculates a raw thickness value. A statistical thickness value calculating section 16c executes statistical processing including data sorting, determination whether the raw thickness value falls within an allowable numerical value range, and determination of a thickness change line, thereby obtaining a statistical thickness value.

Abstract: An interferometric measuring device for detecting the shape of rough surfaces includes a spatially coherent beam gun unit that emits a short time coherent and broad-band beam. The device is separated into a section containing the components of a modulation interferometer and the components of a measuring probe. The measuring probe is coupled to the modulation interferometer via an optical fiber arrangement, and used remotely from the modulation interferometer.

Abstract: An anodizing system for forming a anodized coating on at least a portion of a substrate thereby creating an anodized substrate is disclosed. The anodizing system includes a bath, a coating thickness monitor, at least one probe and at least one controller. The coating thickness monitor includes at least one radiation source directed at at least a portion of the anodized substrate; at least one probe for capturing at least a portion of the radiation reflected and refracted by the anodized coating on the anodized substrate, the captured radiation being at least a portion of the radiation directed the anodized substrate from the radiation source; and at least one detector in communication with the at least one probe, the at least one detector capable of processing the captured radiation to allow a determination of at least the thickness.

Abstract: A film deposition apparatus includes an optical monitor for measuring the light intensities of a plurality of measuring light beams having different wavelengths that are transmitted or reflected by a film during deposition, a phase estimating section for calculating the phase of a point corresponding to a desired film thickness for each of the measuring wavelengths based on the relationship between the expected periodic change in the light intensity of the corresponding measuring light beam until the desired thickness is reached, and the phase corresponding to the periodic change, and calculating the degree of phase advance by comparing the periodic change and the change in the intensity monitored by the optical monitor, and a deposition control unit for comprehensively determining a deposition end point based on all the degrees of phase advance and for completing the film deposition at the deposition end point.