Abstract: An optical position sensing system includes a bezel surrounding a display, a position sensor assembly, and a processor for calculating touch locations. Prismatic film may be applied to the bezel. Each optical position sensor assembly includes a body. A lens holder holds an imaging window on a first side and a single element aspherical lens on a second side. The imaging window has an inside face shaped to form a shallow convex surface. The lens holder is mounted to a front face of the body such that the lens is aligned with an opening in the body. An optical sensor is mounted to a rear face of the body and aligned with the opening. A radiation source is positioned within the body above the lens holder and behind an illumination window. A light path separator is positioned between the illumination window and the imaging window.

Abstract: A laser transmitter has a transmitter housing and a laser source in the housing. A gimbal support arrangement supports the laser source in the housing and includes a gimbal motor arrangement for moving the gimbal support arrangement and said laser source in said housing. A gimbal motor drive circuit actuates the gimbal motor arrangement to cause the gimbal support arrangement to move in said housing. A plurality of optical proximity sensors sense the orientation of said gimbal support arrangement to the interior of said housing. By this arrangement, damage to the transmitter is prevented.

Abstract: An exposure apparatus can mitigate the impact of fluctuations in the refractive index of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer on a wafer stage through a projection optical system, and forms a prescribed pattern on the wafer, and comprises: a scale, which is provided to the wafer stage; a plurality of X heads, which detect information related to the position of the scale; a measurement frame that integrally supports the plurality of X heads and has a coefficient of linear thermal expansion that is smaller than that of the main body of the wafer stage (portions excepting a plate wherein the scale is formed); and a control apparatus that derives information related to the displacement of the wafer stage based on the detection results of the plurality of X heads.

Abstract: A method for making a sample for evaluation of laser irradiation position and evaluating the sample, and an apparatus which is switchable between a first mode of modification of semiconductor and a second mode of making and evaluating the sample. Specifically, a sample is made by irradiating a semiconductor substrate for evaluation with a pulse laser beam while the semiconductor substrate is moved for evaluation at an evaluation speed higher than a modifying treatment speed, each relative positional information between pulse-irradiated regions in the sample is extracted, and stability of the each relative positional information between pulse-irradiated regions is evaluated. The evaluation speed is such a speed that separates the pulse-irradiated regions on the sample from each other in a moving direction.

Abstract: In a camera where the lens or image sensor is laterally moved in a carrier to shift the image for compensating for unwanted camera movement, a reflection surface is used to reflect light, and a photo-emitter/sensor pair is used to illuminate the reflection surface and to detect reflected light therefrom. Reflection surface is provided near the edge of one carrier section e and photo-emitter/sensor pair is disposed on another carrier section. These sections are movable relative to each other for imaging shifting purposes. The photo-emitter/sensor pair is positioned such that the light cone emitted by the photo-emitter partly hits the V reflection surface and partly falls beyond the edge. As the photo-emitter/sensor pair and the reflection surface move relative to each other, the area on the reflection surface illuminated by the photo-emitter changes causing a change in the amount of detected light.

Abstract: The present invention, which aims at providing a component mounting method and a mounter capable of correcting, with high accuracy, a mounting position of a component, includes: a mounting head (105); a recognition unit (108) including a shutter camera (111b) and instructing it to start taking an image of a component (103a) when the mounting head (105) arrives at a predetermined position; and a main control unit (160) (i) correcting a position of the component shown in the image taken by the shutter camera (111b), based on a first distance over which the mounting head (105) moves during a time period from when the instruction to start taking the image is given to when camera exposure by the shutter camera (111b) is performed, (ii) correcting the mounting position at which the mounting head (105) is to mount the component (103a), based on the corrected component position, and (iii) controlling the mounting head (105) so that it mounts the component (103a) at the corrected mounting position.

Abstract: A beam irradiation device includes: a first light source for emitting laser light; an actuator for moving a scanning section for receiving the laser light to scan a target area with the laser light; a second light source movable with the scanning section and adapted for emitting diffused light; a light receiving position detecting device for receiving the diffused light to output a signal depending on a position of receiving the diffused light; and a light projecting element, disposed at a position closer to the light receiving position detecting device with respect to an intermediate position between the second light source and the light receiving position detecting device, for projecting an emission position to be defined by the second light source on the light receiving position detecting device via a predetermined projection area.

Abstract: An inspection system for locating multiple features on an exterior of an object includes a fixture, a camera, a computer and software. The fixture secures the object and includes a plurality of nest points for mating with specific positions on the exterior of the object, and a reference point located at a specific position relative to the nest points and within a best-plane of the object. The camera is positioned normal to the best-plane of the object and obtains video imaging of a plurality of the features and the reference point. The computer communicates with the camera and collects the video imaging. The software determines the actual parameters of the features relative to the reference point based on the video imaging.

Abstract: A hand position detecting device stops optical detection of the respective rotational positions of seconds, center and hour hands when such detection is impossible. When it is determined that the respective positions of the hands have not been detected successively a predetermined number of times, the detection of the hand positions is stopped until a predetermined time, for example 5 minutes before 11 o'clock or 55 minutes past 10 o'clock. This prevents unnecessary repetition of detection of the hand positions and hence useless consumption of battery energy which would otherwise occur.

Abstract: A method for determining at least the position of a moving part of the drive assembly, in which the part is illuminated or exposed to light and thereby the passage of light between the moving part and a part which corresponds thereto is determined. The passage of light changes or can even be briefly interrupted during the movement of the part. As a result, it is possible to obtain reliable information about the instantaneous position of the respective part. The method can be used more widely than the known capacitive determination of the position of a moving part and is, in particular, independent of the material of the part.

Abstract: The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an adjacent second photomask pattern, the first photomask pattern having a critical edge for defining a critical dimension of a first device structure and a non-critical edge for defining a non-critical dimension. The non-critical edge is attached to the critical edge so that the positioning of the non-critical edge will affect the length of the critical edge. The non-critical edge of the first photomask pattern is positioned a distance X from an edge of the second photomask pattern, wherein the distance X is chosen to be substantially the minimum spacing allowed by the mask rules.

Abstract: A method includes determining relative positional relationships between applied fields on a substrate, one of the applied fields including a first field; in a lithographic apparatus, using an alignment apparatus to obtain at least one absolute positional relationship between the position of at least the first field of the substrate and a part of the lithographic apparatus; and determining an absolute positional relationship between at least one field, other than the first field, and a part of the lithographic apparatus using the relative positional relationships and the at least one obtained absolute relationship.

Abstract: A device for measuring the position of at least one structure on a substrate is disclosed. The substrate to be measured is positioned in a mirror body. A flat insert is provided in the mirror body and is formed such that the substrate and the insert together always have the same optical thickness, irrespective of the mechanical thickness of the substrate.

Abstract: There is provided a system for forming an optical screen, including a continuous wave or pulsed laser transmitter for transmitting a beam of radiation at a predetermined wavelength and forming a planar or curved surface to be traversed by a moving object, at least one receiver including an array of detectors for receiving reflected or scattered beam radiation from the object and directing it towards the detectors for producing a signal, and a detection logic receiving the signal and determining parameters selected from the group of spatial position, velocity and direction of propulsion of the moving object. A method for detecting a moving object is also provided.

Abstract: On the +X and ?X sides of a projection unit, a plurality of Z heads are arranged in parallel to the X-axis, by a distance half or less than half the effective width of the Y scale so that two Z heads each constantly form a pair and face a pair of Y scales. Of the pair of heads consisting of two Z heads which simultaneously face the scale, measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to dust and the like adhering on the scale surface, measurement values of the other head is used, and the positional information of the stage in at least the Z-axis direction is measured in a stable manner and with high precision.

Abstract: An optical scanning unit of a position measuring system for measuring a relative position of a first machine element with respect to a second machine element in a measuring direction. The optical scanning unit includes a support of a scanning grating attached to the first machine element and a detector unit attached separately to the first machine element, wherein a scanning light beam extends from the scanning grating to the detector unit as a free beam.

Abstract: A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.

Abstract: A sensor having a mass that moves relative to a structure is disclosed. A spring mechanism applies a restoring force to the mass when the mass moves from an equilibrium position with respect to the structure. A first code scale is attached to the mass and viewed by a first imaging system that is fixed with respect to the structure. The first imaging system forms images of the first code scale that are used by a controller to provide an indication of the relative position of the mass with respect to the structure. The mass can be located in a sealed chamber in the structure that has a transparent liquid through which the mass moves. The first imaging can view the first code scale from outside the chamber through a transparent window in the chamber.

Abstract: In an apparatus for detecting a position of a substrate in a film thickness measuring apparatus, an image pickup area on a substrate by an image pickup device of an imaging part is rotated by a rotation mechanism of a position detecting part. With this operation, an image of an edge of the substrate can be easily picked up at a plurality of image pickup positions around a central axis to detect a position of the substrate, without providing a mechanism for rotating a stage holding the substrate. As a result, it is possible to suppress upsizing of a structure for detecting a position of the substrate in the film thickness measuring apparatus and to achieve high-speed and high precision-position detection of the substrate, as compared with a conventional apparatus where a mechanism for rotating a substrate is provided above a mechanism for moving the substrate in a horizontal direction.

Abstract: The invention provides a method for determining vibration-related information by projecting an aerial image at an image position in a projection plane, mapping an intensity of the aerial image into an image map, the image map arranged for comprising values of coordinates of sampling locations and of the intensity sampled at each sampling location, and measuring intensity of the aerial image received through a slot pattern. The method further includes determining from the image map a detection position of a slope portion of the image map, at the detection position of the slope portion, measuring of a temporal intensity of the aerial image and measuring of relative positions of the slot pattern and the image position, the relative positions of the slot being measured as position-related data of the slot pattern and determining from the temporal intensity of the aerial image vibration-related information for said aerial image.

Abstract: An information display system has a display unit having a display screen, a control unit for controlling the displayed information, and an input devices for inputting a user's control command. The input devices may be a distance detecting sensor adapted to detect the position of a user controlled object in a sensing field arranged at a given distance in front of the screen. The control unit is adapted to determine a display control command based on the detected object position.

Abstract: An optical interrogation system and method are described herein that are capable of detecting and correcting a positional misalignment of a label independent detection (LID) microplate so that the LID microplate can be properly interrogated after being removed from and then re-inserted back into a microplate holder/XY translation stage.

Abstract: A method of inspecting an exposure system uses a mask pattern including a first and a second mask pattern, the first pattern being formed in a line-and-space of a first pitch, the second pattern being disposed in parallel with the first mask pattern and formed in a line-and-space of a second pitch. The method includes illuminating the mask pattern with inspection light at a first angle with the optical axis of the illumination light from a light source, allowing the first mask pattern to diffract the inspection light to generate first diffraction light, and allowing the second mask pattern to diffract the inspection light to generate second diffraction light. The first angle is to allow the first diffraction light to be diffracted asymmetrically with the optical axis into the projection optical system and the second diffraction light to be diffracted symmetrically with the optical axis into the projection optical system.

Abstract: Singulation handler is provided which comprises a loading zone where a carrier mechanism receives and holds an electronic component and a singulation zone where the electronic component held by the carrier mechanism is singulated. A loader that is movable along an axis is operative to place the electronic component onto the carrier mechanism when it is situated in the loading zone and a vision system that is movable along substantially the same axis as the loader is operative to obtain at least one image of the electronic component showing alignment information so that the electronic component can be properly aligned during singulation.

Abstract: A reticle has a mask substrate, a test pattern established on the mask substrate having an asymmetrical diffraction grating so as to generate positive first order diffracting light and negative first order diffracting light in different diffraction efficiencies, and a device pattern adjacent to the test pattern established on the mask substrate.

Abstract: A particle-optical apparatus comprising: A first source, for generating a first irradiating beam (E) along a first axis (A1); A second source, for generating a second irradiating beam (I) along a second axis (A2) that intersects the first axis at a beam intersection point, the first and second axes (A1, A2) defining a beam plane, A stage assembly (3) for positioning a sample in the vicinity of the beam intersection point, provided with: A sample table (21) to which the sample can be mounted; A set of actuators, arranged so as to effect translation of the sample table along directions substantially parallel to an X-axis perpendicular to the beam plane, a Y-axis parallel to the beam plane, and a Z-axis parallel to the beam plane, said X-axis, Y-axis and Z-axis being mutually orthogonal and passing through the beam intersection point, wherein the set of actuators is further arranged to effect: rotation of the sample table about a rotation axis (RA) substantially parallel to the Z-axis, and; rotation of the sa

Abstract: A device for measuring positions of structures (3) on a substrate (2) is disclosed, wherein the device is enclosed by a climatic chamber (30). An illumination and imaging means (6, 14) is also arranged in the climatic chamber (30). At least one loading station (32) for substrates is formed on an outer wall (30a) of the climatic chamber (30), wherein at least one transport means (34, 40) for transporting the substrates is provided within the climatic chamber (30). A means (36) for orienting the substrates (2) with respect to a coordinate system of the coordinate measuring machine (1) is provided, wherein the transport means (34, 40) deposits the substrates (2) on the means (36) for orienting.

Abstract: A position detection method of detecting a position of a detection mark. The method includes a matching step of calculating a value of a correlation using a template for an image including the detection mark, a change step of changing the template to be used for the correlation, a repeat step of, when a value of a correlation in the matching step is not more than a predetermined value, changing the matching processing while changing the template in the change step, and a step of performing position detection on the basis of a result of correlation in the matching step or the repeat step.

Abstract: A measuring instrument of polygon mirror motors includes a first light source, a first photo detecting element for detecting a first reflected light beam, i.e. first measuring light beam emitted from the first light source and reflected from the polygon mirror, a second light source, a second photo detecting element for detecting a second reflected light beam, i.e. second measuring light beam emitted from the second light source and reflected from the polygon mirror; and a calculator for performing a calculation based on a time difference between an output from the first photo detecting element and an output from the second photo detecting element. The calculator outputs at least one of an eccentricity and a level difference between facets of the polygon mirror.

Abstract: A stencil printer is provided for depositing solder paste onto a surface of an electronic substrate. The stencil printer includes a frame and a stencil coupled to the frame. The stencil has a plurality of apertures formed therein. The stencil printer further includes a dispenser coupled to the frame. The stencil and the dispenser are adapted to deposit solder paste onto the electronic substrate. The stencil printer further includes an imaging system constructed and arranged to capture an image of the electronic substrate. The imaging system includes a camera assembly, an on-axis illumination assembly adapted to generate light substantially along a first axis generally perpendicular to the surface of the electronic substrate, and an off-axis illumination assembly adapted to generate rays of light substantially along a second axis extending at an angle with respect to the first axis. A controller is coupled to the imaging system to control movement of the imaging system to capture an image.

Abstract: Provided is a centrifugal force based microfluidic system including: a microfluidic device including a rotatable platform and an optical path formed to extend horizontally in a straight line from a circumference of the platform; a motor rotating so as to control the microfluidic device; a light emitting unit emitting light towards the microfluidic device; a light receiving unit detecting the light emitted from the light emitting unit; and a controller determining a home position to be the position of the microfluidic device at a point of time when the light emitted from the light emitting unit is detected by the light receiving unit, wherein the light emitted from the light emitting unit passes through the optical path to be incident on the light receiving unit only when the microfluidic device is located in a predetermined position.

Abstract: An absolute position length-measurement type encoder includes a scale having an incremental track, an absolute track, and a reference position track. The incremental track has incremental patterns including first light and dark patterns formed at equal intervals in first periods. The absolute track has absolute patterns representing an absolute position. The reference position track has reference position patterns including second light and dark patterns formed at equal intervals in second periods longer than the first periods. A light source emits a measurement light to the scale. A photodetector receives the measurement light reflected at or transmitted through the scale. A signal processing circuit processes the received light signal of the photodetector to detect an absolute position of the scale.

Abstract: The present invention relates to a method for determining a lateral relative movement between a processing head and a workpiece during processing the workpiece as well as a device to carry it out. In the method a surface of the workpiece (12) is illuminated in the region of the processing head with an optical radiation (2). The optical radiation (3) reflected from the surface of the workpiece (12) in the region of the processing head is repeatedly detected in a locally resolved manner by an optical detector (9), which is firmly fixed mechanically to the processing head, to obtain optical reflection patterns. The repeated detection occurs in temporal intervals in which the temporally successive reflection patterns of overlapping surface regions of the workpiece (12) are obtained. The lateral relative movement is determined by comparing the temporally successive reflection patterns.

Abstract: In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.

Abstract: There is provided a microscope device comprising an objective, a light source for illuminating a specimen via an illumination beam path, an arrangement for continuously moving the specimen during observation in a direction perpendicular to the optical axis of the objective, a two-dimensional detector for detecting light coming from the specimen via an image beam path, said detector being capable of shifting charges during observation in a row-wise manner in the direction of the movement of the specimen on the detector, a beam deflection element which is adjustable for moving the illumination beam path and the image beam path during observation relative to the specimen in the direction of the movement of the specimen, and a control unit for selecting the velocity of the specimen, the adjustment velocity of the beam deflection element and the charge shift velocity in such a manner that the charge shift velocity acts to compensate the movement of a point of the specimen, which point is imaged onto the detector,

Abstract: Device for measuring the position of a structure on an object 30 with at least one laser interferometer system 29 to determine a positional displacement of the object 30 in at least one spatial direction, whereby the object is placed on a stage which is translatable in the X and Y coordinate direction An illumination device is provided, which illuminates the structures to be measured. The structure is imaged on a detector 34 via a high-resolution microscope optics in incident light and/or transmitted light in the near UV spectral range. The illumination device is an excimer laser, a frequency multiplied solid-state or gas laser, or an excimer lamp.

Abstract: There is provided a curvature measuring apparatus and method using multiple beams. m×n multiple beams generated by an m×n laser diode (LD) array or an m×n vertical cavity surface emitting laser array having a uniform pitch are converted into multiple divergent or multiple parallel beams. The multiple beams strike and reflect from the surface of a thin film formed on a substrate Then, the multiple beams are detected by an m×n spot array in a detector such as a charge coupled device (CCD) or a CMOS image sensor. The spot spacing between the beams in the array is measured in a direction parallel to the incident plane. The spot spacing between the beams is changed by the curvature of the substrate in the direction parallel to the incident plane and the curvature may be expressed by a function including change in beam spacing, an incident angle, a distance between the surface of the thin film and the detector.

Abstract: A system for reproducibly measuring motion along surfaces of arbitrary or indeterminate length and of arbitrary curvature, using an opto-electronic sensor mounted to an object in motion along the surfaces. The system involves the detection of alternating reflective and non-reflective markings, on surfaces which can be curved in a certain dimension and can be of any length. Additionally, the system can be applied to measure the motion of camera carts or dollies along straight track, curved track, or any combination of straight and curved track.

Abstract: An optical encoder includes: a rotary slit plate having a rotation angle detection track including an optical slit; a light source for applying light to the optical slit; light detecting elements for rotation angle detection and arranged at positions to which light emitted from the light source is applied to the optical slit, to detect the light emitted from the light source and passing through the optical slit; and light detecting elements for light amount monitoring arranged at locations on a circumference in corresponding relationship with positions to which light emitted from the light source is applied to the optical slit, to detect the light emitted from the light source and passing through the optical slit. The light detecting elements for light amount monitoring have an angular width that is an integer multiple of the angular interval of the light intensity distribution on surfaces of the light detecting elements for light amount monitoring.

Abstract: The invention relates to a method for optically measuring a chassis at a testing station. According to said method, radiation that is reflected by a surface structure of a vehicle, comprising at least one wheel (5) and a surrounding bodywork section, is detected by a measuring device with the aid of appropriate sensors, and at least the wheel plane and the wheel centre point are determined by an evaluation of the positional data obtained by means of the detected radiation. To achieve a reliable, precise measurement of the chassis in a simple operation, the surface structure of at least the vehicle bodywork section and at least the wheel is scanned, over its entire surface or at least by any two lines that record both the wheel and the bodywork, using a laser beam (12) that is emitted by the measuring device (10), and at least two surface profiles are obtained from the scanned surface structure as characteristic structures.

Abstract: A transport system is provided for a sample testing machine. The transport system includes a carrier holding a set of test sample devices and a drive subsystem for moving the carrier through the sample testing machine. The drive subsystem includes a reciprocating motor-driven block engaging the carrier and moving the carrier back and forth in a predetermined longitudinal path extending along a longitudinal axis from an entrance station to a plurality of processing stations in the sample testing machine. The processing stations are accessed as the carrier is moved along the path. The carrier includes features in the form of slots or voids that are detected by strategically placed optical interrupt sensors. As the carrier moves, the slots are detected by the sensors to thereby continuously track the position of the carrier and the test devices as they are moved through the instrument.

Abstract: In a device for location positioning, and more particularly, in a system for identifying an environmental source emitting a base frequency and waveform signal, a sensor (101) records an environmental source (105) emitting a base frequency and waveform signal, the signal being amplified (102), digitized (103), processed and compared (104) with a stored unique waveform characteristic. On the basis of the comparison result(s), location positioning and/or a device orientation may be determined.

Abstract: A method and a system for checking the position of a mechanical part (2), for example a tool of a lathe, along a checking direction (X), employs an optoelectronic device (1) with a laser beam (7) and a sensor (8) for detecting the interruption of the beam. Mutual displacements between the part to be checked and the optoelectronic device within a checking area (13) are controlled according to a sequence including linear inspection movements (30) along a direction (Z) perpendicular to the checking direction and at inspection positions (Pi;P1-P4). The inspection positions are spaced apart along the checking direction at progressively decreasing mutual distances (D), according to a sequence that converges to the searched position (PN).

Abstract: An apparatus and associated method for measuring spatial characteristics of a test object with stacked features. First and second measurement assemblies for measuring opposing first and second planar features, respectively, of a test object, by directing light beams into a gap between the features to measure a position and a static attitude of each feature.

Abstract: A method for non-instrument-dependent determination of coordinates of a point imaged using a microscope includes determining, at object-related reference coordinates of at least one imaged reference point in a DICOM coordinate system, corresponding first instrument coordinates of the at least one imaged reference point in an instrument-dependent coordinate system. Using the object-related reference coordinates and the corresponding fast instrument coordinates, a transformation rule convening instrument-dependent coordinates into corresponding coordinates of the DICOM coordinate system is determined. Then, using the transformation rule, second instrument coordinates of an imaged point are converted into non-instrument-dependent coordinates of the DICOM coordinate system.

Abstract: A system for determining the longitudinal position of a displaceable element positioned between two substantially orthogonally laterally opposing displacement sensors measures a distance from each displacement sensor to the displaceable element. The displaceable element has a tapered thickness along its length. A change in the longitudinal position of the displaceable element causes the proximity sensors to each detect their distance to the displaceable element, which distances then correspond directly to the local thickness and thus the longitudinal position of the displaceable element. The system calculates the position of the displaceable element. The system can easily factor out errors in measured lateral proximity position of the displaceable element, since an erroneous proximity to one sensor is equal and opposite to an erroneous proximity to the other.

Abstract: A handheld metrology imaging system and method. In one embodiment, the device may comprise an imaging portion, a display portion, a signal processing and control portion, an image capture activation element and a user interface. The user interface may comprise user adjustable video measurement tools configurable relative to an image on the display portion, and video tool adjusting elements. Measurement functions are provided that operate to provide a dimensional measurement result based on the configurations of the video measurement tools. The handheld device can be used to measure not only the normal parts which have traditionally been measured by conventional handheld tools such as a caliper or micrometer, but also very small or flat parts that are difficult to measure with conventional tools.

Abstract: An optical apparatus according to this invention includes a first element, a second element, a support which supports the first element, a first measuring device which measures the position of the first element relative to the support, a second measuring device which measures the position of the second element relative to the support, a third measuring device which measures any deformation of the support, and a controller. The controller controls the relative position between the first element and the second element on the basis of the measurement results obtained by the first measuring device, the second measuring device, and the third measuring device.

Abstract: An apparatus for sensing the position of a susceptor in a semiconductor device manufacturing equipment comprises a susceptor which receives a wafer and high frequency power, a sensor unit which irradiates light to a lower face of the susceptor when the susceptor is in a lifted up state and which receives light reflected from the lower face of the susceptor, a light path measuring unit which measures a length of the light reflected to the sensor unit, an operating unit which compares the length of the light measured by the light path measuring unit with reference data indicating a rising height of the susceptor, and which decides whether the length of the measured light is within a range of the reference data, and a controller which interlocks a process equipment when the length of the measured light deviates from the range of the reference data, and which controls a horizontal level state of the susceptor.

Abstract: The invention describes a method of determining the position of fluorescent markers in a sample (4), with a high spatial resolution. To this end, the sample (4) is illuminated with an exciting light beam (11), while the sample (4) is simultaneously scanned by a particle beam (3). During scanning, markers will be impinged upon by the particle beam (3) and will be damaged, in such a manner that the marker impinged upon will no longer emit fluorescence radiation. This leads to a reduction of the flux of fluorescence radiation. This reduction is detected. Seeing as the position of the particle beam (3) w.r.t. the sample is known at the moment that the marker is damaged, the position of the marker in the sample is, accordingly, also known.