Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the. reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: A single sensor that can operate in multiple bands and display either one radiation band alone or multiple overlaid bands, using an appropriate color choice to distinguish the bands. The multiple-band sensor allows the user to look through at least one eyepiece and with the use of a switch, see scenes formed via the human eye under visible light, an II sensor, an MWIR sensor, or an LWIR sensor, either individually or superimposed. The device is equipped with multiple switching mechanisms. The first, for allowing the user to select between radiation bands and overlays, and the second, as with most thermal imaging sensors, for allowing the user to switch between “white-hot/black-hot” i.e., a polarity switch.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: A system and method for simultaneous imaging of both infrared and millimeter wave radiation. The novel optical system (10) includes a primary mirror (20), a Mangin secondary mirror (30) positioned to receive energy reflected from the primary mirror (20), and an immersion lens (40) for focusing energy received from the Mangin mirror (30). In the illustrative embodiment, the primary mirror (20) and Mangin mirror (30) are arranged in a Cassegrain configuration. Central to this invention is the use of a negative power refractive Mangin mirror (30) as the Cassegrain secondary mirror, so that the field curvature of the secondary mirror (30) and immersion lens (40) can be made to cancel. The immersion lens (40) effectively decreases the wavelength of the millimeter wave radiation, allowing a smaller detector to collect the same amount of radiation as would a larger detector in air.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: An ultraviolet microscope comprises an observation device which observes a specimen with ultraviolet light; a gas supply device which, during the observation with ultraviolet light, supplies an inert gas to surroundings of the specimen; and a timing control device which controls supply timing of the inert gas by the gas supply device, and the timing control device controls the gas supply device so as to cause preliminary supply of the inert gas before the observation of the specimen with ultraviolet light, and also so as to cause regular supply of the inert gas at least during the observation of the specimen with ultraviolet light.

Abstract: A large screen emissive display operating at atmospheric pressure includes pixels, the red, green, and blue subpixels of which are excited by UV laser light scanned onto the subpixels by a pixel activation mechanism. The pixel activation mechanism includes three grating light valves (GLVs) that are controlled by a processor in response to a demanded image to modulate the UV light as appropriate to produce the demanded image.

Abstract: A night vision system, suitable for vehicular use, including an infra-red detector mounted on a vehicle, a display mounted on the vehicle, a single-element lens mounted upstream of the infra-red detector so as to direct light from a scene onto the infra-red detector, and circuitry operative to receive a detector output from the infra-red detector and to provide an image output based on the detector output to the display. The system is suitable for applications other than vehicular use, where a comparatively narrow field of view is to be imaged.

Abstract: Birefringent optical films have a Brewster angle (the angle at which reflectance of p-polarized light goes to zero) which is very large or is nonexistent. This allows for the construction of multilayer mirrors and polarizers whose reflectivity for p-polarized light decreases slowly with angle of incidence, are independent of angle of incidence, or increase with angle of incidence away from the normal. As a result, mirror films with high reflectivity in two different planes of polarization for any incident direction over a wide bandwidth can be achieved.

Abstract: Apparatus and methods for converting a monochrome night vision or other electro-optical device into one that provide a sensation of full color, including from red to blue with white and black. Preferred apparatus of the invention comprise an electro-optical viewing device, particularly a mono-chromatic night vision device, that comprises a plurality of light filters. A first light filter system is positioned at a light-input end of the device, and a second light filter system is positioned at a light-output end of the device, whereby the plurality of filters systems provide to a viewer a sensation of full color, including from red to blue with white and black.

Abstract: A novel, cost effective optical filter is employed for photosensors used in ultraviolet-based water purification systems. Optically tuned to specifically eliminate the non-germicidal wavelength polychromatic emissions from mercury lamps, this unique optical filter approach significantly reduces the cost in manufacturing reliable water purification systems employing ultraviolet light.

Abstract: No-bridging fluorine sites in calcium fluoride (CaF2) caused by lanthanide, transition metal or actinide impurities are eliminated by doping the CaF2 with sodium or another monovalent anionic dopant during or after growth of the crystal. This doping technique may be applied in the growth of other UV-transmissive fluoride materials in a family designated by a general formula Z:XFN where X is one or some combination of magnesium, calcium, zinc, strontium, cadmium, and barium, Z is one or some combination of lithium, sodium, potassium, rubidium, cesium, thallium, copper, silver and gold, and N is an integer in the range 1 through 6, and dependant on X. Elimination of the non-bridging fluorine sites can provide solarization resistant materials with low UV absorption even when the material contains sufficient lanthanide transition metal, or actinide impurities to cause the fluoride materials to be highly absorbing for UV radiation in the absence of the monovalent anion doping.

Abstract: A diffraction grating (1) has a multiplicity of parallel diffraction structures succeeding one another periodically. The latter are arranged on a support (2) and each incorporate a slat (3) extending from a base area (4) of the support (2). Said slat has a substantially rectangular cross-section. The width w of the slat (3) comes to less than 100 nm, preferably between 20 nm and 60 nm, more preferably in the area of 50 nm. Advantageous uses of the diffraction grating (1) are obtained e.g. in a Littrow configuration, preferably in third order of the incident light beams (8), in particular at a light wavelength that is less than 250 nm.

Abstract: The invention is directed to an optical system for the vacuum ultraviolet range wherein the optical system utilizes the isotropic point at which the wavelength of the double refraction of a crystal is eliminated. The crystal is preferably of MgF2. With the optical system, a known good optical material, namely, MgF2, which is limited only by its double refraction, becomes usable for the VUV optics.

Abstract: Windows for infrared Mid-IR optical systems include thin film materials stretched over a rigid frame. The windows form a barrier between sensitive optics in an optic head and damaging elements of weather and environment. Windows and methods for making windows for free space optics communications systems include use of specialized materials and structural components to form durable inexpensive barriers in agreement with these inventions. Barriers can be used to provide protection of optics contained in an optical transceiver from an atmosphere composed of matter hostile to optics elements. The barrier can operate in conjunction with an enclosure housing to form a complete barrier between those optics and that atmosphere. These windows may be removable from the housing for replacement or maintenance. Advanced versions of these windows may also include specialized condensation prevention means.

Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.

Abstract: An antistatic pellicle for use with deep-ultraviolet light. The pellicle is coated with a thin metal oxide layer that has high transmissivity for deep-ultraviolet light and an electrical resistivity low enough to minimize electrostatic discharge. The metal oxide layer may be produced by a sol-gel process using a reactive polyvalent metal sol-precursor. The sol-precursor is converted to a sol, the sol is applied to a membrane so that it produces a gel on a surface of the membrane, and then the gel is dried to a coating.

Abstract: Light of multiple wavelengths passes through, in order, a plane polarizer, a ½ wave plate, a means for attenuating polarized light in a selected plane, and a ¼ wave plate. The ¼ wave plate and the ½ wave plate are selected for green light. The ½ wave plate induces an error for nongreen light which is twice the error which the ¼ wave plate would induce for a particular light wavelength but of opposite sign. The errors are reduced by ½ by attenuation by passing all wavelengths of light through glass air interfaces defined by a plurality of glass plates, angled at between about 45 and 55 degrees with respect to the optical axis. Light which is plane polarized for green light, and precorrected for every other wavelength is passed through the ¼ wave plate and all wavelengths are converted to circularly polarized light.

Abstract: This invention provides a synthetic silica glass optical member used together with light having a specific wavelength of 250 nm or less, in which the difference between the maximum value and the minimum value of transmittance [%/cm] per cm in thickness for the light in a predetermined direction within a plane perpendicular to the optical axis is 2.0%/cm or less.

Abstract: An method, and method of production thereof, which provides excellent performance, reduced cost, and reduced breakage due to reduced manual handling. The present invention comprises a substrate, a bond layer coating the substrate, a reflective layer coating the bond layer, and a radiative layer coating the reflective layer. Preferably, the radiative layer comprises SiO2, Si3N4 or SiOxNy, low absorbency of electromagnetic radiation having wavelengths of approximately 200 nm to approximately 2500 nm and high absorbency and emissivity electromagnetic radiation having wavelengths of approximately 2.5 &mgr;m to approximately 25 &mgr;m. Preferably, the bond layer comprises chromium, titanium, or titanium-tungsten and the substrate comprises aluminum, aluminum alloys, polyimide, carbon-filled polyimide, or carbon composite.

Abstract: An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm.

Abstract: The invention provides a UV below 200 nm lithography method utilizing mixed calcium strontium fluoride crystals. The invention includes providing a below 200 nm radiation source for producing <200-nm light, providing a plurality of mixed calcium strontium cubic fluoride crystal optical elements, with the fluoride crystals comprised of a combination of calcium strontium cations having different optical polarizabilities such as to produce an overall isotropic polarizability which minimizes the fluoride crystal spatial dispersion below 200 nm, transmitting <200-nm light through the cubic fluoride crystal optical elements, forming a lithography pattern with the light, reducing the lithography pattern and projecting the lithography pattern with the fluoride crystal optical elements onto a UV radiation sensitive lithography printing medium to form a printed lithographic pattern. The invention includes making the mixed fluoride crystals, optical element blanks thereof and optical lithography elements.

Abstract: An ultraviolet microscope comprises an illumination optical system that guides ultraviolet light emitted from a light source to a specimen; and an observation optical system through which the specimen is observed. The illumination optical system and the observation optical system are set within an inert gas atmosphere.

Abstract: An optical material including a crystalline silicon and FexSi2 in the form of dots, islands, or a film is provided. The FexSi2 has a symmetrical monoclinic crystalline structure belonging to the P21/c space group and is synthesized at the surface or in the interior of the crystalline silicon. The monoclinic structure corresponds to a deformed structure of &bgr;-FeSi2 generated by heteroepitaxial stress between the {110} plane of the FexSi2 and the {111} plane of the crystalline silicon. The value of x is 0.85≦x≦1.1. An optical element using the optical material is also provided.

Abstract: Dual band millimeter-wave and infrared anti-reflecting coatings are presented, which enhance the passage of millimeter-wave and infrared radiation into a substrate material. A substrate is coated with a quarter-wave coating of an infrared anti-reflecting material followed by a quarter-wave coating of a millimeter-wave anti-reflecting material followed by a second quarter-wave coating of an infrared anti-reflecting material. The second infrared anti-reflecting coating enables incident infrared radiation to pass into the millimeter-wave anti-reflecting material, while minimizing reflection. The first infrared anti-reflecting coating enables incident infrared radiation from the millimeter-wave anti-reflecting material to pass into the substrate material, while minimizing reflection. The millimeter-wave anti-reflecting coating enables incident millimeter-wave radiation to pass into the substrate material, while minimizing reflection.

Abstract: An optical article, which is a preform for an optical lens, which is isotropic, consisting essentially of silicon oxide or silicon oxide in combination with one or more oxides of elements belonging to Groups III to VI of the Periodic Table, the article having a dimensional precision which has tolerance to surface roughness and profilometric accuracy required in the spectral interval of 200-800 nm of the electromagnetic spectrum, the tolerance being between one-half and one-tenth wavelength corresponding to the range of about 0.350-0.02 &mgr;m.

Abstract: An optical assembly is provided that allows a user to view objects with normal perspective and scale under conditions of total darkness, in daylight, or other conditions limiting normal vision, or adverse weather conditions. The optical assembly includes a white light flashlight, with a filter cap mounted to the illuminating end of the flashlight. The filter cap permits infrared light in the appropriate range of 900 to 1200 nanometers to pass through. The optical assembly further includes a camera pack including a camera, and preferably including a transmitter. Said camera pack attached to the flashlight and in communication with a display mounted to a head gear worn by the user so that the screen of the display is directly in front of an eye of the user. The camera lens of the camera pack and the illuminating end of the flashlight are aligned along a single linear optical axis. The camera pack communicates with the display via a communication means when wireless communication is not preferred.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: A novel, cost effective optical filter is employed for photosensors used in ultraviolet-based water purification systems. Optically tuned to specifically eliminate the non-germicidal wavelength polychromatic emissions from mercury lamps, this unique optical filter approach significantly reduces the cost in manufacturing reliable water purification systems employing ultraviolet light.

Abstract: A window has at least two surfaces oriented relative to each other at an angle greater than zero. A conductive path is disposed across the two surfaces and renders the window reflective or absorptive to a second predetermined bandwidth of energy, which can be radio frequency energy. The window utilizes window geometry, surface treatments, and bonding techniques to maintain electrical continuity across the surface. The window can be constructed from multiple segmented elements, such as sapphire, or from a unitary body. The window is transmissive to a desired wavelength of energy for the sensor while being reflective, refractive, or absorptive to a desired RF bandwidth of energy. The window provides RF signature management coupled with a substantial sensor Field of Regard and allows for full-time use of an embedded sensor.

Abstract: A solar control film which includes an adhesive layer for adhering the solar control film to a substrate, a metallized layer and a scratch resistant layer containing dispersed carbon black particles wherein the metallized layer is between the adhesive layer for adhering to a substrate and the scratch resistant layer. The solar control film can be prepared by a process which involves mixing a composition comprised of carbon black in particulate form dispersed in a nitrocellulose resin with a polymer forming material to form a coating composition and applying the coating composition to a component of a solar control film whereby the coating composition forms a scratch resistant layer containing dispersed carbon black particles.

Abstract: A catoptric element is made from a hollow member having inner reflective surfaces that can reflect light having a wavelength shorter than 157 nm. An illumination optical system for illuminating an illumination plane includes a light source for providing a light flux, the catoptric element, which generates a plurality of images of the light source by internally reflecting the light flux from the light source, and a relay optical system for leading the light from the catoptric element to the illumination plane. A projection exposure apparatus for projecting and transferring a predetermined pattern formed on a projection original onto a substrate to be exposed via a projection optical system includes the illumination optical system, which forms the illumination plane on the projection original. The projection exposure apparatus can be used to manufacture various devices.

Abstract: The invention provides a method of making a <194 nm wavelength calcium fluoride crystal optical lithography element for transmitting wavelengths less than about 194 nm along an optical axis with minimal birefringence by providing an optical element optical calcium fluoride crystal with an input face {100} crystal plane and forming the input face {100} crystal plane into an optical lithography element surface of an optical lithography element having an optical axis, with the optical axis aligned with a <100> crystal direction of the optical calcium fluoride crystal. In a preferred embodiment, the below 194 nm transmitting optical element is a <100>oriented calcium fluoride lens. In a preferred embodiment, the below 194 nm transmitting optical element is a <100> oriented calcium fluoride beam splitter.

Abstract: An optical device, for homogenising the lighting in an image plane, defined by a digital optical sensor wherein the optical device is formed of a block made of transparent homogenous filtering material, this block having a substantially uniform absorption coefficient for all the wavelengths of the visible optical spectrum which pass through it, and having a variable thickness suited to a determined absorption profile.

Abstract: A broadband source, including associated devices that may incorporate the broadband source, which makes use of at least one, preferably two or more broad fluorescence spectra in combination from one or more species of transition metal ions doped in one or more material bodies. The bodies are selected from crystalline, glass-ceramic, glass, or polymer-organic materials. The broadband source or devices can generate a very broad fluorescence spectrum. The combined spectrum preferably spans a wavelength range of about 500 nm to 600 nm to 700 nm, and having an intensity that does not deviate from an average intensity by more than about 10 dB, over a range or portion of the near infrared region.

Abstract: An infrared absorption filter which has absorption in the near-infrared region, manifests high light transmission in the visible region, and does not have large absorption of specific wavelength in the visible region, further, is excellent in environmental stability and durability and has little optical defect, the filter comprising an infrared absorption layer laminated at least on one surface of a transparent polymer film, wherein said transparent polymer film is a film comprising a polymer easy adhesion layer laminated at least on one surface, said transparent polymer film contains substantially no particle, and said transparent polymer film contains foreign materials having a size of 20 &mgr;m or more in an amount of 10/m2 or less per unit area of the film.

Abstract: An ultraviolet-permeable resin is used for a substrate of a diffraction grating, and at least one grating portion formed from ultraviolet cured resin is provided onto a surface of the substrate, thereby alleviating performance deterioration that is caused by heat expansion and the like due to environmental changes and enabling a large angle of view and cost reduction due to the simple construction. Further, a diffractive optical element using the diffraction grating, and an optical system using the diffractive optical element, are also obtained.

Abstract: In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

Abstract: An optical device (10) is disclosed which is mountable to a scope (S) having an objective lens OL and an eyepiece EP. The optical device (10) has a light intensifying module (11), an eyepiece (12), an objective lens unit (14), and an elastic, tubular collar (21). The collar (21) has a first end (22) adapted to be stretchably coupled with the scope eyepiece and second end (23) adapted to be stretchably coupled to the optical device objective lens unit (14) to provide air tight seals.

Abstract: A system and method for minimizing critical dimension errors on imaged wafers is described. After imaging and processing one or more wafers, the various critical dimensions are determined across the imaged exposure field and compared with the target critical dimensions to ascertain average critical dimension errors. The critical dimension error distribution across the field is modeled and the necessary exposure dose corrections are calculated to compensate the critical dimension errors. A pellicle is formed with light intensity modifying regions corresponding to the calculated local dose corrections. These regions alter the amount of light which is transmitted from a light source through a semiconductor mask onto the exposure fields of the wafers. As a consequence, the critical dimensions of the printed features are altered as well. The light intensity modifying region may be formed by depositing, such as by sputtering, particles which reflect or absorb light.

Abstract: The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thickness—i.e. constant partition ratio—multilayer stacks commonly designed and, fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), we have observed peak reflectivity enhancements of up to 5% for a single reflector compared to a standard unoptimized stack. The additional materials used are: Rb, RbCl, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be.

Abstract: Optical amplifiers and other optical network equipment is provided for use in fiber-optic communications networks. The equipment may include dynamic spectral filters and optical channel monitors. Temperature controllers may be used to control the temperatures of the dynamic spectral filters, optical channel monitors, and other components such as erbium-doped fiber coils in optical gain stages. Control units in the equipment may provide alarms based on status information and data from the dynamic spectral filters, optical channel monitors, temperature sensors, and other components.

Abstract: An infrared microscope includes a light source emitting infrared light, an objective optical system forming an image of a specimen, and a path switching member switching an optical path from a visual observation optical path in which an infrared-light blocking member is placed, to another optical path to introduce light from the objective optical system thereinto. The infrared microscope is constructed so that an image which is free of aberration due to infrared light and has no unnatural hue due to a large amount of light with long wavelengths can be obtained without moving an element for blocking the infrared light.

Abstract: The infrared absorption filter of the present invention has a transmittance of not higher than 30% in the near-infrared region in the wavelength range of 800 to 1100 nm; a difference of 10% or less between a maximum value and a minimum value of transmittance in the visible light region in the wavelength range of 450 to 650 nm; and a transmittance of not lower than 50% at a wavelength of 550 nm, the filter being so excellent in environmental stability that after being left to stand in the air atmosphere at a temperature of 60° C. and a humidity of 95% for 1000 hours, the filter can maintain said spectral property in said range. Consequently, when used for a plasma display or the like, the filter can absorb the unwanted infrared rays radiated from the display, resulting in preventing erroneous operation of a remote control using infrared radiation even in such a high-temperature and high-humidity environment.

Abstract: A microscope having switchable illumination in at least two spectral regions; having a common illumination beam path, proceeding from at least one light source, preferably a broad-band light source, for the at least two spectral regions; and having a narrow-band wavelength-selective filter (for example, in the IR or UV wavelength region) that can be inserted into the illumination beam path in order to achieve a wavelength-selective illumination in a first of the at least two spectral regions. A broad-band light protection filter, which can be inserted into the illumination beam path alternatively to the wavelength-selective filter, is associated with the illumination beam path. An apparatus for illumination switchover for a microscope of this kind, having switchable illumination in at least two spectral regions, comprises a mechanical positive coupling of the opposite-direction insertion motions of the wavelength-selective filter and/or of the light protection filter.

Abstract: An antireflection substrate comprising a substrate which is transparent to ultraviolet and vacuum ultraviolet rays in the wavelength region from 155 nm to 200 nm and a mono-, bi- or tri-layer antireflection film formed on at least one side of the substrate, wherein the refractive index and the physical thickness of the antireflection film at the center wavelength &lgr;0 of the wavelength region of ultraviolet or vacuum ultraviolet light which needs antireflection satisfy particular conditions, and an optical component for a semiconductor manufacturing apparatus and a substrate for a low-reflection pellicle which is the ultraviolet and vacuum ultraviolet antireflection substrate

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: The present invention relates to an infrared filter comprising a biaxially oriented co-extruded film having at least three polyester layers comprising an intermediate polyester layer and the surface polyester layers on both sides of the said intermediate layer,

Abstract: A bright wide-angle infrared lens, suitable for a wavelength band of 8 to 12 &mgr;m, having favorable imaging performances comprises, successively from the object side, a first lens L1 made of a positive meniscus lens having a convex surface directed onto the object side and an image-side surface formed aspheric, a second lens L2 made of a negative meniscus lens having a convex surface directed onto the object side, and a third lens L3 having a positive refracting power with a convex surface directed onto the object side.