Abstract: A prism includes a prism base member having first and second faces intersecting with each other and including calcium fluoride, an antireflection film for oblique incidence formed on the first face of the prism base member, and an antireflection film for 0° incidence formed on the second face of the prism base member. Each of the antireflection film for oblique incidence and the antireflection film for 0° incidence includes a high-refractive-index layer with a relatively high refractive index, and a low-refractive-index layer with a relatively low refractive index. The high-refractive-index layer includes thorium fluoride and the low-refractive-index layer includes aluminum fluoride.

Abstract: A window has at least two surfaces oriented relative to each other at an angle greater than zero. A conductive path is disposed across the two surfaces and renders the window reflective or absorptive to a second predetermined bandwidth of energy, which can be radio frequency energy. The window utilizes window geometry, surface treatments, and bonding techniques to maintain electrical continuity across the surface. The window can be constructed from multiple segmented elements, such as sapphire, or from a unitary body. The window is transmissive to a desired wavelength of energy for the sensor while being reflective, refractive, or absorptive to a desired RF bandwidth of energy. The window provides RF signature management coupled with a substantial sensor Field of Regard and allows for full-time use of an embedded sensor.

Abstract: An exposure device with a higher resolution, comprising a light source(1), an illumination optical system(3) for illuminating a pattern on a projection reticle(R) by a light beam from the light source(1), and a projection optical system(4) for projecting the image of the pattern on a photosensitive surface on a photosensitive wafer(W), wherein the light source(1) supplies light whose wavelength is shorter than 193 nm, a band narrowing device(2) which narrows the bandwidth of the spectrum of the light supplied by the light source(1), is provided, and the projection optical system includes a plurality of refractive optical devices all made of CaF2.

Abstract: An antistatic pellicle for use with deep-ultraviolet light. The pellicle is coated with a thin metal oxide layer that has high transmissivity for deep-ultraviolet light and an electrical resistivity low enough to minimize electrostatic discharge. The metal oxide layer may be produced by a sol-gel process using a reactive polyvalent metal sol-precursor. The sol-precursor is converted to a sol, the sol is applied to a membrane so that it produces a gel on a surface of the membrane, and then the gel is dried to a coating.

Abstract: A method and apparatus for control of optical trap arrays and formation of particle arrays using light that is in the visible portion of the spectrum. The method and apparatus provides a laser and a time variable diffractive optical element to allow dynamic control of optical trap arrays and consequent control of particle arrays and also the ability to manipulate singular objects using a plurality of optical traps. By avoiding wavelengths associated with strong absorption in the underlying material, creating optical traps with a continuous-wave laser, optimizing the efficiency of individual traps, and trapping extended samples at multiple points, the rate of deleterious nonlinear optical processes can be minimized.

Abstract: An infrared transparent optical element of the invention is for use as an optical window for an infrared imaging camera. The optical element includes an infrared transparent substrate, an antireflection film, and a protective film made of a polymer material. The infrared transparent substrate has first and second major surfaces opposite to each other, and the antireflection film is formed on each of the first and second major surfaces of the substrate. The protective film is formed on an outer surface of the antireflection film on the first major surface of the substrate.

Abstract: A band-gap spectral filter is made of a nanochannel glass structure having a two-dimensional array of parallel dielectric rods arranged in a matrix material. The materials for the dielectric rods and the matrix material are selected so that the difference between the refractive index of the dielectric rods and the refractive index of the matrix material is equal to or less than about 0.5.

Abstract: An optical system for integrated circuit fabrication comprises optical members made of synthetic quartz glass and fluorite, wherein: an optical member disposed in a position through which laser light is transmitted at a high light energy density, is made of single crystal fluorite; and an optical member in a position through which laser light is transmitted at a low light energy density, is made of synthetic quartz glass containing approximately such a hydrogen molecule concentration as can be doped under atmospheric pressure.

Abstract: A microscope includes a first light source to emit a first light to excite a molecule of a sample to a higher energy level vibration state which belongs to a lowest energy level electron state from the ground state, a second light source to emit a second light source to excite the molecule to a higher energy level quantum state from the higher energy vibration state, an optical system to overlap the first light and the second light partially on the sample, and an optical detector to detect a given fluorescence from the irradiated region of the first light and the second light on the sample.

Abstract: A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (&Dgr;n) in a plane orthogonal to the optical axis is up to about 1×10−6, the distribution of refractive index (&Dgr;n) in a plane parallel to the optical axis is up to about 5×10−6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2×1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.

Abstract: An illuminating apparatus is disclosed which comprises a light source, an optical system for condensing light emitted from the light source and illuminating an object with the condensed light, and an optical member which absorbs light having wavelengths from 260 to 340 nm among the light emitted from the light source, wherein the optical member is made of glass or crystalline material to which metal is doped.

Abstract: A carrier assembly for a storage device includes a body portion for mounting to the storage device, a side extension of the body portion extending laterally beyond the first lateral side of the storage device, and a light conduit provided on the side extension. The light conduit is adapted to transmit light signals from a first end of the light conduit to a second end of the light conduit. The first end of the light conduit positioned to receive the light signals from a light source positioned laterally adjacent to the first lateral side of the storage device.

Abstract: A silica glass optical material for projection lens to be used in vacuum ultraviolet radiation lithography using radiation from 155 to 195 nm in wavelength, wherein, said silica glass optical material is of ultrahigh purity, contains from 1 to 10 wtppm of OH groups, from 100 to 10,000 wtppm of F, and from 1×1017 to 1×1019 molecules/cm3 of H2, and has a distribution in concentration of F that is axially symmetrical to the central axis.

Abstract: A filter for visual display terminals (VDT), comprising a substrate film having on one surface a deposition layer of indium-tin oxide (ITO) and on the other surface a flexible resin layer comprising a photopolymerized coating derived from a monomeric mixture of at least one of diallyl phthalate, diallyl isophthalate, and diallyl terephthalate, and pentaerythritol tetra(3-mercaptopropionate) in an equivalent ratio of 2:1 to 1:3, and further containing a photopolymerization initiator.

Abstract: An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm.

Abstract: The invention concerns a microscope with a capability for switching between the deep ultra-violet and the visible spectral region having a displaceable tube lens changer (16) with at least one tube lens (17a) for the UV light region and at least one tube lens (17b) for the visible light region and additionally having a reflector carrier having multiple reflectors (12) arranged shiftably in the illuminating beam path on said reflector carrier (13). The reflector carrier (13) on the one hand and the tube lens changer (16) on the other hand are mechanically coupled to one another in such a way that shifting the reflector carrier (13) in the illuminating beam path to a specific reflector (12) automatically displaces the tube lens changer (16) in such a way that the latter arranges in the optical axis (15) a tube lens (17) corresponding to the reflector (12).

Abstract: An anti-reflective structure is formed on a surface to transmit incident light with minimal losses. The anti-reflective surface has a plurality of protrusions having a feature size smaller than the wavelength of incident light. The protrusions increase in height in either a sloped linear manner or in a curvilinear manner, and the protrusions repeat across the surface in at least one dimension to transmit the incident light. Gray scale lithography may be used to produce these patterns of protrusions in photoresist layers. High fidelity transfer of the protrusion patterns into the surfaces is accomplished by utilizing, for example, an electron cyclotron resonance plasma. Transmission values at such patterned surfaces maybe as high as 99.3%.

Abstract: Single crystals of (NH4)2Ni(SO4)2.6H2O represent an excellent material for filtering UV light and in an enclosed system will not deteriorate at temperatures as high as 125° C. They are particularly useful in solar-blind optical systems and sensing devices, which seek to identify the presence of UV light sources in the UV missile warning band.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: An optical element, optical control device and optical control method are provided which demonstrate a large, rapid optical response using a laser light of low output as a control light. A signal light 1 is emitted from an optical source 1. A signal light 2 emitted from an optical source 2. A control light and the signal light are converged by a condenser lens 7, and irradiate an optical element 8. Only the signal light is detected by a photodetector 22 through a light receiving lens 9 and a wavelength selection filter 20. A thermal lens is formed reversibly in the optical element and switching the control light ON and OFF modulates the intensity of the signal light.

Abstract: An exposure apparatus (PE1) and exposure method for use in photolithographically manufacturing devices such as semiconductor devices, image pickup devices, liquid crystal display devices and thin film magnetic heads. The apparatus is capable of transferring onto a substrate (W) the image of a pattern on a reticle (R) and includes a light source (2) capable of supplying an exposure energy beam (IL) with a wavelength under 200 nm, and an illumination optical system arranged to receive the exposure energy beam from said light source. The illumination optical system is designed to guide the exposure energy beam to the reticle. The apparatus also includes a projection optical system (PL) arranged between the reticle and the substrate. The projection optical system is capable of forming an image of the reticle pattern onto the substrate based on the exposure energy beam passing through the reticle.

Abstract: Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.

Abstract: An optical component with a low reflectance for ultraviolet light in a wavelength range between approx. 180 nm and approx. 370 nm, in particular approx. 248 nm, and for a high angle of incidence up to at least approx. 40° has a substrate and a multilayer antireflection system arranged on at least one surface of said substrate to provide reflection reduction. The multilayer system distinguishes itself in that the layer adjacent to the substrate does not consist of magnesium fluoride and that none of the layers has a thickness of more than half of the working wavelength. In particular, the layer thicknesses of the low refractive materials should not exceed 1/3 the working wavelength. By adhering to these boundary conditions, antireflective coatings can be produced that provide both permanent laser resistance as well as a high resistance against inner layer stress and thermal stress.

Abstract: The invention features an optical medium for calibrating UV absorbance detectors, methods for making such an optical medium, and methods for calibrating UV absorbance detectors using such a medium. The optical calibration medium includes a gel-sol silica glass monolith with a rare-earth dopant therein. The rare-earth dopant exhibits at least one spectral feature in at least the far UV range. The constituents of the gel-sol silica glass monolith are selected so the rare-earth doped sol-gel glass monolith exhibits a transmittance in the far UV range so each distinct spectral feature of the rare-earth dopant in the far UV range is discernable.

Abstract: An infrared data communication module (A) includes a substrate (1) having a surface (1a) for mounting a group (E) of components including a light emitting element (2), a light receiving element (3) and an IC element (4), and a molded body (5) formed of a molding resin to cover the entire surface (1a) of the substrate (1) for sealing the group (E) of components. The surface (1a) of the substrate (1) is formed with one or a plurality of jumper pads (11a, 11b) formed by plating a conductive film with gold. Each jumper pad (11a, 11b) is partially or entirely spaced from an edge of the substrate.

Abstract: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 &mgr;m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ, greater than 0.

Abstract: An optical filter comprising: a laminate (A) comprising: a first transparent support; and at least one of an antireflection layer, an antiglare layer, a soil-resistant layer, a hard coat layer and an antistatic layer; a transparent support (B); and at least one of a visible light absorption layer and an infrared shield layer, the infrared shield layer absorbing near infrared rays having a wavelength of 750 nm to 1200 nm, wherein the at least one of a visible light absorption layer and an infrared shield layer is provided on the first transparent support at the opposite side to that the at least one of an antireflection layer, an antiglare layer, a soil-resistant layer, a hard coat layer and an antistatic layer are provided, or on the transparent support (B).

Abstract: An infrared shielding film comprising a transparent substrate film having, on one face thereof, at least an infrared shielding layer comprising a cured product of a coating layer which comprises (A) an ionizing radiation curing resin and (B) an infrared shielding agent comprising lanthanum in an amount of 0.1 to 20 parts by weight per 100 parts by weight of the ionizing radiation curing resin. The infrared shielding film maintains excellent transmission of visible light, effectively suppresses transmission of the sunlight and exhibits excellent scratch resistance, light resistance, durability and antifouling property.

Abstract: There is provided an optical low pass filter passing only a lower spatial frequency using a phase grating and the structure of the grating. The optical low pass filter utilizes the two-dimensionally arranged phase grating for the purpose of removing an image with a higher spatial frequency in an imaging system employing a semiconductor solid-state imaging device such as CCD image sensor or CMOS image sensor, The optical low pass filter which suppresses a spatial frequency component higher than a specific frequency and passes a component lower than the specific frequency in an imaging system sensing input images includes a grating generating the phase shift of 0, a grating generating the phase shift of &phgr;, arranged at the right and bottom of the 0-phase shift grating, and a grating generating the phase shift of 2&phgr;, arranged at the diagonal side of the 0-phase shift grating.

Abstract: A UV-absorbing filter absorbs a UV component of incoming light to reduce an amount of the UV component of transmitted light. The UV-absorbing filter comprises a transparent UV-absorbing glass plate which contains a UV-absorbing substance; a transparent first and second heat-resistant glass plates which face respective surfaces of the UV-absorbing glass plate; a first and second distance pieces which are made of heat-resistant resin and which are respectively interposed between the UV-absorbing glass plate and the first and second heat-resistant glass plates, in the vicinity of an outer edge of the UV-absorbing glass plate, so as to form a space between them.

Abstract: An infrared-transparent structure includes a first infrared-transparent element that is transparent to infrared radiation in the 3.6-7 micrometer wavelength range, preferably coated with a zinc-sulfide antireflective coating, and a layer of a solvent-free, infrared-transparent polymer transparent on the first infrared-transparent element. The polymer is formed of an addition-cured silicone, such as addition-cured dimethyl silicone, and a small amount of an adhesion promoter, such as 3-glycidoxypropyltrimethoxysilane. The polymer layer may either be a surface layer, or it may be used as an adhesive between the first infrared-transparent element and a second infrared-transparent element.

Abstract: An ultraviolet microscope optical system includes a light source emitting light in a region of wavelengths shorter than 300 nm; an illumination optical system; an objective lens system; an imaging optical system; and a photographing device.

Abstract: An optical article, which is a preform for an optical lens, which is an isotropically miniaturized, amorphous monolithic aerogel, consisting essentially of silicon oxide or silicon oxide in combination with one or more oxides of elements belonging to Groups III to VI of the Periodic Table, the article having a surface having a dimensional precision which has tolerance to surface roughness and profilometric accuracy required in the spectral interval of 200-800 nm of the electromagnetic spectrum, the tolerance being between one-half and one-tenth wavelength corresponding to the range of about 0.350-0.02 &mgr;m.

Abstract: A portal-based system for ultraviolet disinfection (UV) of containers and appliances, the system including a container with a housing having at least one portal for receiving UV light input for transmission into the container. The portal is designed such that a fiber optic transmission line is removably connectable to it. This system may include at least one portal optical component positioned between the portal and the interior of the appliance, thereby producing an enhanced sterilization of microorganisms within the container and/or appliance.

Abstract: An amorphous diamond coating applied onto mirrored optics in an infrared motion sensor to block specific wavelengths of energy from a “white light” source like a halogen lamp, without reducing the reflectivity of the mirror surface in the Mid-Infrared wavelengths. A specific thickness of diamond-like-coating is applied on top of the reflective metal surface of a mirrored part, thereby reducing the mirror's reflectivity at visible and near-Infrared wavelengths known to be problematic for IR motion sensors, such as those emitted from halogen lamps. The coating has no significant detrimental effect on mid-infrared reflectivity, so the IR motion sensor's performance is otherwise unaffected.

Abstract: An optical system is provided in a projection exposure apparatus for processing an excimer laser beam. The optical system includes at least one optical member made of silica glass having a chlorine concentration of about 1 ppm or less, and at least one optical member made of silica glass having a chlorine concentration of about 1 ppm to about 200 ppm.

Abstract: In a projection optical system having at least two silica glass optical members, a birefringence value is measured at each of points in a plane normal to the optical axis with the center at an intersection of each optical member with the optical axis, a distribution of signed birefringence values in each optical member is obtained by assigning a positive sign to each birefringence value when a direction of the fast axis thereof is a radial direction to the intersection with the optical axis and assigning a negative sign to each birefringence value when the direction of the fast axis thereof is normal to the radial direction, and the optical members are combined with each other so as to satisfy such a placement condition that a signed birefringence characteristic value of the entire projection optical system calculated based on the distributions of signed birefringence values is between −0.5 and +0.5 nm/cm both inclusive.

Abstract: An infrared imaging microscope, particularly of the type used to carry out FT-IR measurements, is provided with an assembly (40) which can be moved into or out of the beam propagating to the microscope detector (32) in order to change the magnification provided by the optical elements of the microscope. The assembly (40) can be located between the objective Cassegrain mirror (18) and the intermedite focus position (42) of that mirror. In one example the assembly includes first and second spherical mirrors (44, 45). The assembly can be mounted so as to be rotatably movable between its positions in or out of the beam.

Abstract: The invention concerns a UV-reflecting interference layer system for transparent substrates with broadband antireflection coating in the visible wavelength region. The invention is characterized by the fact that the interference layer system has at least four individual layers. The sequential layers have different indices of refraction and the individual layers have inorganic materials that are stable to UV and temperature.

Abstract: The invention relates to a transparent substrate, in particular made of glass, provided with a thin-film stack including at least one metallic layer with infrared reflection properties, in particular a low-emission layer, arranged between two dielectric-based coatings. According to the invention, the dielectric-based coating above the metallic layer has the following sequence of layers deposited in this order: a) layer(s) with material(s) with refractive index ni-2 of at most 2.2; b) layer(s) with material(s) with refractive index ni-1 at least 0.3 less than that of the last layer(s) ni; c) last layer(s) with material(s) with refractive index ni substantially equal to ni-2.

Abstract: An ultraviolet microscope optical system includes a light source emitting light in a region of wavelengths shorter than 300 nm; an illumination optical system; an objective lens system; an imaging optical system; and a photographing device. The ultraviolet microscope optical system further includes a wavelength selective device, which satisfies the following condition: (To·&dgr;)/(Tm·&Dgr;)>2 where To is a transmittance at the center of a selected wavelength region, &dgr; is a half width at full maximum expressed in nanometers, Tm is an average transmittance in the region of wavelengths longer than 300 nm, and &Dgr; is a sensitive wavelength region of the photographing device, expressed in nanometers, in the region of wavelengths longer than 300 nm.

Abstract: The present invention is a method of making a lithography photomask and photomask blank. The method of making the lithography photomask and photomask blank includes providing a silicon oxyfluoride glass tube having an OH content less than 50 ppm. The method further includes cutting the silicon oxyfluoride glass tube, flattening the silicon oxyfluoride glass tube, and forming the flattened cut silicon oxyfluoride glass tube into a photomask blank having a planar surface. The present invention includes a glass lithography mask preform. The glass lithography mask preform is a longitudinal silicon oxyfluoride glass tube that has an OH content ≦10 ppm, a F wt. % concentration ≧0.5 wt. %.

Abstract: For realizing an optical member for vacuum ultraviolet with little absorption and with a low deliquescence nature and a low cleavage nature, a halide of an alkali metal such as Li, Na, Cs, or the like and a halide of any one of alkaline earth metals and other elements such as Ca, Sr, Ba, Mg, Zn, and the like are mixed in a ratio of 1:1, the mixture is sintered, and a fluoride crystal of AMF3 type perovskite structure is grown. The crystal is processed to fabricate a substrate of an optical member such as a lens, a mirror, a prism, or the like for excimer lasers. Alternatively, the crystal is used as an evaporation source to coat a substrate of an optical member therewith. It is thus feasible to obtain optical members with little absorption in the vacuum ultraviolet region and with an excellent durability.

Abstract: An optical-thin-film material comprising a metal oxide containing samarium and titanium, or having a compound represented by the following chemical formula: Sm1−xAl1+xO3 wherein −1<x<1 is disclosed. An optical device having an optical thin film formed of such a material is also disclosed. This optical-thin-film material does not cause any compositional deviation to enable continuous deposition when used as a vacuum deposition material, and does not cause any deterioration due to ultraviolet-light irradiation.

Abstract: An optical member for transmitting light of a wavelength less than about 200 nm including crystalline calcium fluoride with a potassium content less than about 0.5 ppm, wherein a degradation in a transmissivity of the optical member after an irradiation for a fixed period of time with the light of the wavelength of less than about 200 nm is less than about 5% of a transmissivity of the optical member before the irradiation.

Abstract: A polymeric front optical element blank is provided which may be laminated to a rear optical element blank. The polymeric front blank comprises an optical element having an exterior convex surface and an interior concave surface, with an edge between the exterior convex surface and the interior concave surface. The optical is provided with at least two projections which extend away from and higher than the edge on a side of the optical element having the concave surface. These projections assist in aligning an back optical element during lamination so that the two lenses will not move out of optical registry during lamination, especially where centrifugal forces are used to spread an adhesive between the front and rear lenses. It is preferred that there are at least three projections extending away from and higher than the edge on a side of the optical element having the concave surface.

Abstract: The present invention pertains to an optical shutter comprising an organic free compound, such as a radical cation or a radical anion, and a polydiacetylene compound, wherein the polydiacetylene compound is characterized by having a change in absorption in a wavelength region as a result of a photo-induced heat transfer from the free radical compound. The thermochromic change in absorption is reversed by thermal cooling or by a photo-induced reaction after the photo-induced heat transfer. Also provided is an optical shutter for use as an optical switch in fiber optic communications, and, alternatively, for use in a laser protection device, in a security protection system, or in an eyewear device.

Abstract: An ultra-compact, room-temperature, continuous-wave infrared source that can rapidly tune over a very wide spectral range. The targeted spectral overages are 3 &mgr;m to 4 &mgr;m, 4 &mgr;m to 6 &mgr;m, 6 &mgr;m to 8 &mgr;m, and 8 &mgr;m to 12 &mgr;m. The spectral width of the infrared idler is expected to be ˜10 MHz. In particular, the invention is a monolithically integrated device which requires no external pump lasers or bulk optics for its operation. The invention uses difference-frequency-generation in a highly nonlinear optical semiconductor waveguide with which high power semiconductor lasers are integrated to internally provide the tunable pump and signal waves.

Abstract: An optical filter comprises a transparent support and a filter layer. The filter layer contains a dye and a binder polymer. The dye is a methine dye in an aggregated form. The transparent support, the filter layer or an optional layer further contains a specific ultraviolet absorbing agent represented by the formula (I), (II), or (III).

Abstract: A low emissivity film which comprises: a substrate; and a coating of oxide and metallic films alternately formed on the substrate in a total of (2n+1) layers where n is an integer being equal to or more than 1, with the innermost layer being an oxide film, wherein the oxide film (B) formed on the outer side of the metallic film (A) being most apart from the substrate, has an internal stress which is equal to, or less than 1.1×1010 dyne/cm2.