Having Significant Infrared Or Ultraviolet Property Patents (Class 359/350)
  • Patent number: 7180652
    Abstract: The specification describes an improved Moving Anti-Reflection Switch (MARS) device structure that largely eliminates charge build up on the movable membrane, and reduces stresses that cause curling of the membrane. The improved device uses a movable membrane made of single crystal silicon.
    Type: Grant
    Filed: February 18, 2005
    Date of Patent: February 20, 2007
    Assignees: Lucent Technologies Inc., Agere Systems Inc.
    Inventors: David John Bishop, Keith Wayne Goossen, Dennis S. Greywall, James Albert Walker
  • Patent number: 7170046
    Abstract: A color image capture element comprises a plurality of color component photoelectric conversion elements, each disposed with a color filter on a light receiving surface for respectively transmitting different color components, for receiving incoming light and selectively outputting respective color signals corresponding to the intensity of the different color components, and an infrared component photoelectric conversion element, disposed with an infrared transmitting filter on a light receiving surface for transmitting an infrared component, for selectively outputting an infrared signal. This enables the infrared component included in at least one of a plurality of color signals to be corrected, thereby improving the sensitivity of a color image capture apparatus.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: January 30, 2007
    Assignee: Sanyo Electric Co., Ltd.
    Inventor: Yoshihito Higashitsutsumi
  • Patent number: 7125128
    Abstract: Actuator arrays for use in adaptive-optical elements and optical systems containing at least one such element are disclosed. The actuator arrays provide more precise control of the shape of the adaptive-optical surface while utilizing fewer actuators than conventional systems. An adaptive-optical system of an embodiment includes an array of force devices coupled to a deformable optical surface. The force devices of the array are arranged in braking groups and force-altering groups such that each force device belongs to a respective combination of braking group and force-altering group. A respective force controller is coupled to the force devices of each force-altering group, and a respective braking controller is coupled to the force devices of each braking group.
    Type: Grant
    Filed: January 26, 2004
    Date of Patent: October 24, 2006
    Assignee: Nikon Corporation
    Inventor: W. Thomas Novak
  • Patent number: 7122134
    Abstract: A novel optical member is disclosed.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: October 17, 2006
    Inventor: Hiroki Sasaki
  • Patent number: 7116473
    Abstract: An antireflection film includes alternately deposited high-refractive-index layers and low-refractive-index layers. The refractive indexes and extinction coefficients of the layers are such that the antireflection film exhibits sufficient antireflection characteristics even if the geometrical thickness thereof is small. An optical element having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics.
    Type: Grant
    Filed: January 11, 2006
    Date of Patent: October 3, 2006
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hidehiro Kanazawa, Kenji Ando, Koji Teranishi
  • Patent number: 7104659
    Abstract: A method and apparatus for control of optical trap arrays and formation of particle arrays using light that is in the visible portion of the spectrum. The method and apparatus provides a laser and a time variable diffractive optical element to allow dynamic control of optical trap arrays and consequent control of particle arrays and also the ability to manipulate singular objects using a plurality of optical traps. By avoiding wavelengths associated with strong absorption in the underlying material, creating optical traps with a continuous-wave laser, optimizing the efficiency of individual traps, and trapping extended samples at multiple points, the rate of deleterious nonlinear optical processes can be minimized.
    Type: Grant
    Filed: December 10, 2004
    Date of Patent: September 12, 2006
    Assignee: University of Chicago
    Inventors: David G. Grier, Eric R. Dufresne, Jennifer E. Curtis, Brian A. Koss
  • Patent number: 7102814
    Abstract: A system shields IR emissions from remote sensors and has a flexible outer metallic layer extending to cover objects emitting IR energy on the covered ground. The outer layer is conductive of heat energy and faces upward. A flexible inner metallic layer coextensively extends adjacent to the outer metallic layer. The inner layer is conductive of heat energy and faces downward. Spaced-apart thermo electric chips are between and in contact with the outer and inner layers. The chips transfer heat energy between the outer and inner layers. A sensor of IR radiation on ambient ground provides signals representative of the thermal signature of the ambient ground. A controller couples signals to the chips in response to the representative ambient ground thermal signals for controlling the heat energy radiated from the outer layer to match the radiated IR signature from the outer layer to the IR signature of the ambient ground.
    Type: Grant
    Filed: August 30, 2004
    Date of Patent: September 5, 2006
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventor: Robert Hughes
  • Patent number: 7083847
    Abstract: Birefringent optical films have a Brewster angle (the angle at which reflectance of p-polarized light goes to zero) which is very large or is nonexistent. This allows for the construction of multilayer mirrors and polarizers whose reflectivity for p-polarized light decreases slowly with angle of incidence, are independent of angle of incidence, or increase with angle of incidence away from the normal. As a result, multilayer films having high reflectivity (for both planes of polarization for any incident direction in the case of mirrors, and for the selected direction in the case of polarizers) over a wide bandwidth, can be achieved.
    Type: Grant
    Filed: September 2, 2003
    Date of Patent: August 1, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: James M. Jonza, Michael F. Weber, Andrew J. Ouderkirk, Carl A. Stover
  • Patent number: 7081978
    Abstract: A system and method for combining a predetermined number of laser beams. The system (30) includes a collimating lens (34) for receiving and collimating the laser beams and a holographic device (36) positioned to receive beams from the collimating lens (34) and output beams which are co-aligned. The holographic device (36) includes a predetermined number of holographic optical elements (46, 48, 50), wherein each holographic optical element (46, 48, 50) is designed for a particular wavelength of the laser beams. In the preferred embodiment, the holographic optical elements are volume holograms, and the system further includes a blazed grating (38) positioned between the collimating lens (34) and the holographic device (36) to account for variations in the wavelengths of the laser beams due to environmental conditions.
    Type: Grant
    Filed: March 17, 2003
    Date of Patent: July 25, 2006
    Assignee: Raytheon Company
    Inventor: Chungte W. Chen
  • Patent number: 7079334
    Abstract: An infrared sight glass for aftermarket fitment around an opening of an enclosure which enables thermal inspection of electrical equipment within the enclosure. The mounting of the sight glass is performed externally which avoids having to access the interior of the enclosure. The infrared sight glass comprises an infrared transmitting medium to facilitate use of an external infrared thermal imaging camera for monitoring the electrical equipment. A removable protective cover is locked into a closed position by security key screws and is easily removed by a slight twist when the key screws are loosened.
    Type: Grant
    Filed: January 28, 2004
    Date of Patent: July 18, 2006
    Inventors: Graham R. Holliday, Antony J. Holliday
  • Patent number: 7050223
    Abstract: A DUV-capable dry objective for microscopes comprises lens groups made of quartz glass, fluorite, and in some cases also lithium fluoride. It possesses a DUV focus for a DUV wavelength region ?DUV±??, where ??=8 nm, and additionally a parfocal IR focus for an IR wavelength ?IR, where 760 nm??IR?920 nm. For that purpose, the penultimate element is of concave configuration on both sides, and its object-side outer radius is much smaller than its image-side outer radius. The DUV objective is IR autofocus-capable.
    Type: Grant
    Filed: June 21, 2000
    Date of Patent: May 23, 2006
    Assignee: Leica Microsystems Semiconductor GmbH
    Inventor: Gerhard Hoppen
  • Patent number: 7046444
    Abstract: The present invention provides a wave plate capable of obtaining preferable phase conversion characteristic over a wide wavelength range. The wave plate includes an aluminum oxide film having linear grating groove patterns. The period L (?m) and the duty ratio De of the grating groove patterns are set at values within the first range specified by the following four formulas: L?0.65 L?2×10?14e31.263De L?6.0317De2?10.352De+5.0516 (De?0.85)2/0.442+(L?0.41)2/0.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: May 16, 2006
    Assignee: Sanyo Electric Oc., Ltd.
    Inventors: Kazushi Mori, Shingo Kameyama, Hitoshi Hirano, Koutarou Furusawa, Koji Tominaga, Masayuki Shono
  • Patent number: 7034308
    Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: April 25, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Ralph Kurt, Frank Jeroen Pieter Schuurmans, Yurii Victorovitch Sidelnikov
  • Patent number: 7034998
    Abstract: In a method of connecting a multiplicity of optical elements (9) to a basic body (8), in particular for producing a faceted mirror (1), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements (9) are positioned on the basic body (8, 14) and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure (11) and the optical elements (9) are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure (14) as the basic body.
    Type: Grant
    Filed: June 21, 2001
    Date of Patent: April 25, 2006
    Assignee: Carl Zeiss Smt AG
    Inventors: Frank Melzer, Ulrich Bingel
  • Patent number: 7029758
    Abstract: The present invention relates to the use of water soluble melanin in solid plastic films of polyvinyl alcohol to be used in conjunction with other plastics to make laminated sheets or lenses. Such laminates will be used as filters to protect against photochemical damage from electromagnetic radiation.
    Type: Grant
    Filed: September 30, 2002
    Date of Patent: April 18, 2006
    Inventors: James Gallas, Melvin Eisner
  • Patent number: 7012753
    Abstract: An optical device reflecting a range of wavelengths comprised between 10 nm and 20 nm comprises alternate superposed first and second layers. The first layers are made of metal or metallic compound and the second layers are formed by an amorphous silicon compound chosen from a-Si—Hx, a-Si—CHx, a-Si—Cx, a-Si—OHx, a-Si—Fx, a-Si—FHx, a-Si—Nx, a-Si—NHx, x being comprised between 0.01 and 0.3. The use of second layers of amorphous silicon compound enables the mechanical stresses of the optical device to be stabilized up to at least 200° C. The optical device is preferably used as reflector for a lithography mask in the extreme ultraviolet (EUV).
    Type: Grant
    Filed: March 18, 2004
    Date of Patent: March 14, 2006
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Etienne Quesnel
  • Patent number: 7006284
    Abstract: An imaging apparatus for DUV beams is provided which includes a lens for receiving a DUV beam and producing an image of the DUV beam, wherein the lens has an aplanatic surface and a hemispheric surface, and wherein at least the aplanatic surface is made from or otherwise has a down-converting medium for producing a down-converted beam; an image sensing member for viewing an image of the down-converted beam; and optics for relaying the image of the down-converted beam from the lens to the image sensing member. A processor can be communicated with the image sensing member for analyzing the image of the DUV beam.
    Type: Grant
    Filed: May 17, 2004
    Date of Patent: February 28, 2006
    Inventor: William C. Fricke
  • Patent number: 7005176
    Abstract: An optical adhesive polyester film comprising (A) a polyester film layer containing an aromatic polyester and an ultraviolet absorber and (B) a coating formed on at least one surface of the polyester film (A). The coating (B) contains at least one polymer selected from the group consisting of a coating polyester having a glass transition point of 40 to 100° C. and an acryl polymer having a glass transition point of 20 to 80° C. in an amount of 50 to 95% by weight based on the coating. The optical adhesive polyester film is disposed on the front of a plasma display so as to block externally incoming ultraviolet light.
    Type: Grant
    Filed: December 5, 2002
    Date of Patent: February 28, 2006
    Assignee: Teijin Dupont Films Japan Limited
    Inventors: Mitsuo Tojo, Koji Kubo, Shinji Yano, Tetsuo Ichihashi
  • Patent number: 6994444
    Abstract: An apparatus and method of maintaining a time-constant heat load on a lithography mirror. The mirror includes a resistive layer formed on a substrate, contacts for coupling a power supply to the resistive layer, an insulating sublayer formed on the resistive layer, a polished layer formed on the insulating layer, and a reflective layer formed on the polished layer. The time-constant heat load on the lithography mirror is maintained by placing an additional electrical heat load on the mirror according to the actinic heat load transmitted by the mask. Maintaining the time-constant heat load can reduce or eliminate variation in image distortion that occurs as a result of changes in actinic heat load on the lithography mirror. Independent temperature control can be used to mitigate “cold-edge effect.
    Type: Grant
    Filed: June 14, 2002
    Date of Patent: February 7, 2006
    Assignee: ASML Holding N.V.
    Inventor: Santiago del Puerto
  • Patent number: 6992753
    Abstract: Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values HD for lenses and at least one lens made of a material having a characteristic transition point TRC after exposure to a given amount of radiation, wherein, for instance, TRC<0.8. HD among other relationships and/or characteristics of the lenses.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: January 31, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Daniel Krähmer, Eric Eva
  • Patent number: 6972419
    Abstract: An extreme (EUV) lithography system includes optical elements which vary the wavelengths of radiation as a function of the angle of incidence on a mask to maximize the reflected radiation intensity.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: December 6, 2005
    Assignee: Intel Corporation
    Inventor: Edita Tejnil
  • Patent number: 6967771
    Abstract: Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: November 22, 2005
    Assignee: Carl Zeiss SMT AG
    Inventors: Ralf Kuschnereit, Hans-Jochen Paul
  • Patent number: 6968399
    Abstract: Information on the protocols supported by a target device and the address thereof are acquired by a simple operation, and communication is performed using a supported protocol. A device (1) 1 includes: a non-contact IC interface 2, which requests supported protocol information 8 of a device (2) 4 within a predetermined communication area in a network, and which acquires supported protocol information 8 from the device (2) 4; an IEEE 802.11b interface 3, which performs transmission signal processing and reception signal processing; test communication element, which performs test communication using the IEEE 802.11b interface 3; and communication element which, when test communication using the test communication element is possible, performs communication using a protocol of the protocol information 8 acquired by the protocol acquisition element.
    Type: Grant
    Filed: October 16, 2002
    Date of Patent: November 22, 2005
    Assignee: Sony Corporation
    Inventors: Takuro Noda, Makoto Sato, Tatsuya Igarashi
  • Patent number: 6960381
    Abstract: A pellicle is used for a photolithographic patterning process using a light having a wavelength of from 100 to 200 nm. The pellicle contains a pellicle membrane containing (A) a substantially linear fluoropolymer which has an alicyclic structure in its main chain, the main chain being a chain of carbon atoms, and the fluropolymer satisfying the following requirements (1) the carbon atoms in the main chain of the fluoropolymer contain a carbon atom having at least one hydrogen atom bonded thereto and a carbon atom having no hydrogen atom bonded thereto; and (2) in the measurement of a high resolution proton magnetic resonance spectrum of the fluoropolymer, a number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm, is at most 6 mol % based on a total number of hydrogen atoms.
    Type: Grant
    Filed: August 6, 2003
    Date of Patent: November 1, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Ikuo Matsukura, Naoko Shirota, Nana Tsushima, Kiyoshi Yamamoto, Reiko Kakita
  • Patent number: 6956694
    Abstract: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 ?m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.
    Type: Grant
    Filed: November 6, 2001
    Date of Patent: October 18, 2005
    Assignee: KLA-Tencor Technologies Corp.
    Inventors: David R. Shafer, Yung-Ho Chuang, Bin-Ming B. Tsai
  • Patent number: 6954257
    Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.
    Type: Grant
    Filed: August 26, 2003
    Date of Patent: October 11, 2005
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Ralph Kurt, Andrei Evgenuevich Iakchine Yakshin
  • Patent number: 6946416
    Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser. The articles also exhibit improved off-axis refractive index homogeneity.
    Type: Grant
    Filed: December 13, 2002
    Date of Patent: September 20, 2005
    Assignee: Corning Incorporated
    Inventors: John E. Maxon, Christine E. Heckle
  • Patent number: 6927899
    Abstract: An optical element, such as a lens, is described that provides good transmission of radiation in the infrared portion of the electromagnetic spectrum, that can be molded using an injection molding technique. The optical element comprises a moldable matrix in which is distributed a plurality of particles. The material comprising the matrix is selected so as to have a relatively low absorption of radiation in the infrared portion of the electromagnetic spectrum, and the material comprising the particles is selected to have a relatively high transmissivity of radiation in the infrared portion of the electromagnetic spectrum, and both materials are selected so as to have approximately the same index of refraction. The optical element comprising the matrix/particle composite is formed to provide surfaces having the contours that are required to provide the desired optical properties.
    Type: Grant
    Filed: December 19, 2002
    Date of Patent: August 9, 2005
    Assignee: Optical Alchemy, Inc.
    Inventor: Marc Daigle
  • Patent number: 6921580
    Abstract: The present invention relates to a polyester film for display comprising: a polyester film substrate containing an ultraviolet light absorber; and a coating layer formed on at least one surface of said polyester film substrate, said polyester film having a haze of not more than 2.0% and a light transmittance at 380 nm of not more than 5.0%.
    Type: Grant
    Filed: June 10, 2003
    Date of Patent: July 26, 2005
    Assignee: Mitsubishi Polyester Film Corporation
    Inventors: Kazuyuki Akatsu, Kanae Shinjo
  • Patent number: 6919988
    Abstract: A system and method for simultaneous imaging of both infrared and millimeter wave radiation. The novel optical system (10) includes a primary mirror (20), a Mangin secondary mirror (30) positioned to receive energy reflected from the primary mirror (20), and an immersion lens (40) for focusing energy received from the Mangin mirror (30). In the illustrative embodiment, the primary mirror (20) and Mangin mirror (30) are arranged in a Cassegrain configuration. Central to this invention is the use of a negative power refractive Mangin mirror (30) as the Cassegrain secondary mirror, so that the field curvature of the secondary mirror (30) and immersion lens (40) can be made to cancel. The immersion lens (40) effectively decreases the wavelength of the millimeter wave radiation, allowing a smaller detector to collect the same amount of radiation as would a larger detector in air.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: July 19, 2005
    Assignee: Raytheon Company
    Inventor: Lacy G. Cook
  • Patent number: 6914723
    Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.
    Type: Grant
    Filed: April 29, 2003
    Date of Patent: July 5, 2005
    Assignee: Xradia, Inc.
    Inventors: Wenbing Yun, Yuxin Wang
  • Patent number: 6909539
    Abstract: A single sensor that can operate in multiple bands and display either one radiation band alone or multiple overlaid bands, using an appropriate color choice to distinguish the bands. The multiple-band sensor allows the user to look through at least one eyepiece and with the use of a switch, see scenes formed via the human eye under visible light, an II sensor, an MWIR sensor, or an LWIR sensor, either individually or superimposed. The device is equipped with multiple switching mechanisms. The first, for allowing the user to select between radiation bands and overlays, and the second, as with most thermal imaging sensors, for allowing the user to switch between “white-hot/black-hot” i.e., a polarity switch.
    Type: Grant
    Filed: June 16, 2003
    Date of Patent: June 21, 2005
    Assignee: Science Applications International Corporation
    Inventors: Ronald James Korniski, William Henry Dyer, Peter Spiro Paicopolis
  • Patent number: 6906857
    Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: June 14, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Richard M. Fischer, Jr., Bradley D. Guth, Warren D. Ketola, James W. Riley
  • Patent number: 6903036
    Abstract: An infrared absorption filter consisting of 70 to 98 mol % of SiO2, 1 to 12 mol % of CuO and 1 to 18 mol % of a network modifier oxide than CuO or CdO is provided. A process of fabricating an infrared absorption filter is also provided. The process comprises introducing a divalent copper compound and a compound of a metal species acting as a network modifier oxide in the form of metal ions into a wet gel. The wet gel can be dipped in a dipping solution to precipitate the divalent copper compound and the compound of a metal species acting as the network modifier oxide in the wet gel. The wet gel can be dried and heated, thereby obtaining an infrared absorption glass. The infrared absorption glass can be cut and polished, thereby fabricating a filter.
    Type: Grant
    Filed: December 31, 2002
    Date of Patent: June 7, 2005
    Assignee: Olympus Corporation
    Inventors: Yoshinobu Akimoto, Hiroaki Kinoshita
  • Patent number: 6898890
    Abstract: A night-vision optical device of the invention with controlled life expectancy contains a time measuring device built into the housing of the aforementioned device for measuring the accumulated time of active work of the device. In application to a night scope for a firearm, the device also contains a sensor, which is interlocked with activation of the scope and reacts on the shots produced from the firearm in general and separately on those shots produced during active work of the night-vision optics at nighttime. The aforementioned shots of both types are counted and stored in separate memory units. The night-time shots affects the life expectancy of the night-vision optics because of muzzle flashes which cause such devices as an image intensifier to work with an increased light load. The information obtained from the time measuring device and the shot counter makes it possible to timely receive a warning signal about the fact that the night optics or the entire firearm must be replaced.
    Type: Grant
    Filed: March 28, 2003
    Date of Patent: May 31, 2005
    Assignee: American Technologies Network Corp.
    Inventor: Leonid Gaber
  • Patent number: 6897434
    Abstract: A source and/or method of generating quantum-correlated and/or entangled photon pairs using parametric fluorescence in a fiber Sagnac loop. The photon pairs are generated in the 1550 nm fiber-optic communication band and detected by a detection system including InGaAs/InP avalanche photodiodes operating in a gated Geiger mode. A generation rate>103 pairs/s is observed, a rate limited only by available detection electronics. The nonclassical nature of the photon correlations in the pairs is demonstrated. This source, given its spectral properties and robustness, is well suited for use in fiber-optic quantum communication and cryptography networks. The detection system also provides high rate of photon counting with negligible after pulsing and associated high quantum efficiency and also low dark count rate.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: May 24, 2005
    Assignee: Northwestern University
    Inventors: Prem Kumar, Marco Florentino, Paul L. Voss, Jay E. Sharping
  • Patent number: 6882475
    Abstract: There is provided a polarizing member having a sheet-like member formed so that linearly polarized light can be obtained as transmitted light through the sheet-like member after natural light is incident on a rear surface of the sheet-like member, wherein the sheet-like member exhibits a transmittance difference of not larger than 6% between transmitted light components within a 20 nm-wide wavelength region in a transmission spectrum of light in a wavelength range of from 520 to 640 nm when natural light is incident on the sheet-like member at any angle ranging from an angle viewing from a line normal to a surface of the sheet-like member to an elevation angle of 80 degrees. There is provided an illuminator having a planar light source including a reflection layer on a rear surface side of the planar light source, and a polarizing member defined above and disposed on a front surface side of the planar light source.
    Type: Grant
    Filed: February 7, 2002
    Date of Patent: April 19, 2005
    Assignee: Nitto Denko Corporation
    Inventors: Ikuo Kawamoto, Hironori Motomura, Miki Shiraogawa
  • Patent number: 6879438
    Abstract: The present invention relates to an infrared filter comprising a biaxially oriented co-extruded film having at least three polyester layers comprising an intermediate polyester layer and the surface polyester layers on both sides of the said intermediate layer, said intermediate layer containing a near infrared absorber having an absorption peak at 800 to 1,100 nm in an amount of 0.1 to 10% by weight based on the weight of the intermediate layer, the light transmittance of said film being not higher than 30% at 950 nm, and the average center line roughness (Ra) of the film surface on at least one side being 10 to 30 nm.
    Type: Grant
    Filed: March 20, 2002
    Date of Patent: April 12, 2005
    Assignee: Mitsubishi Polyester Film Corporation
    Inventor: Narihiro Masuda
  • Patent number: 6872471
    Abstract: The present invention includes infrared emitting materials and infrared emitting devices. The present invention demonstrates 1.54 micron infrared PL and EL emission from an organic complex. This provides a very simple way to obtain a light source at 1.54 micron wavelength that may be both optically and electrically pumped.
    Type: Grant
    Filed: March 5, 2001
    Date of Patent: March 29, 2005
    Assignee: The Ohio State University Research Foundation
    Inventors: Arthur J. Epstein, Qianbing Zheng, Run G. Sun
  • Patent number: 6871337
    Abstract: A method and apparatus for microlithography. The method and apparatus include optimizing illumination modes based on characteristics of a specific mask pattern. The illumination is optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic. By elimination of parts of the illumination pattern which have no influence on modulation, excess DC light can be reduced, thereby improving depth of focus. Optimization of mask patterns includes addition of sub-resolution features to reduce pitches and discretize the probability density function of the space width.
    Type: Grant
    Filed: February 22, 2002
    Date of Patent: March 22, 2005
    Assignee: ASML Netherlands B.V.
    Inventor: Robert John Socha
  • Patent number: 6863842
    Abstract: An optical component formed of a material that blocks noise-causing visible and near-infrared rays selectively or as a whole while transmitting far-infrared rays to the extent possible, and a method for producing the component. The component is produced by adding at least one additive that blocks visible and near-infrared rays to a ceramic material of ZnS, ZnSe, or Ge. The component is most suitable for a particular purpose or use of an optical component, such as a window or lens to be used in a high-performance infrared apparatus, because noise-causing visible and near-infrared rays are blocked.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: March 8, 2005
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventor: Masato Hasegawa
  • Patent number: 6858306
    Abstract: A glass article having a solar control coating is disclosed for use in producing heat reducing glass especially for use in architectural windows. The coated article includes a glass substrate, a coating of an antimony doped tin oxide deposited on and adhering to the glass substrate and a coating of fluorine doped tin oxide deposited on and adhering to the surface of the coating of antimony doped tin oxide. The low emittance of the coated glass article, when combined with the surprisingly selective solar absorption of the multilayer stack provides improved heat rejection in summer and heat retention in winter, while permitting the transmittance of a relatively high degree of visible light.
    Type: Grant
    Filed: July 26, 2000
    Date of Patent: February 22, 2005
    Assignees: Pilkington North America Inc., Pilkington PLC
    Inventors: David A. Strickler, Kevin D. Sanderson, Srikanth Varanasi, Ronald D. Goodman
  • Patent number: 6859309
    Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: February 22, 2005
    Assignee: 3M Innovative Properties Company
    Inventors: Richard M. Fischer, Jr., Bradley D. Guth, Warren D. Ketola, James W. Riley
  • Patent number: 6859311
    Abstract: A UV-transmissable window assembly for a DMD device includes a UV-transmissable glass window provided in a frame. The window and frame are bonded together to preferably effect a hermetic seal therebetween. Optical coatings specific to the intended wavelength of light transmission are applied to the inner and outer surfaces of the glass window to reduce reflection and increase light transmission therethrough. The window assembly, and DMD provided with the same, is adapted for excellent transmission of ultraviolet light, even at the deep ultraviolet portion of the spectrum. The DMD window assembly has application in the medical arts, both surgery and device manufacture, in the production of integrated circuits (IC), and in other optical lithography applications, among other fields.
    Type: Grant
    Filed: March 24, 2003
    Date of Patent: February 22, 2005
    Assignee: Memphis Eye & Cataract Associates Ambulatory Surgery Center
    Inventors: Roy E. Williams, Brian M. Callies, David E. Thomas
  • Patent number: 6833949
    Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.
    Type: Grant
    Filed: September 9, 2002
    Date of Patent: December 21, 2004
    Assignee: Corning Incorporated
    Inventors: Robert L. Maier, Lisa A. Moore, Charlene M. Smith
  • Publication number: 20040252368
    Abstract: An infrared ray irradiation apparatus for a night vision system which is operated easily and selectively in a visible and infrared ray irradiation mode and an infrared ray irradiation mode, and irradiates infrared rays emitted from a lamp toward an area in front of a car by means of one transmission step (by a tube) and one reflection step (by a reflector), thus irradiating the infrared rays without deterioration in brightness.
    Type: Application
    Filed: December 30, 2003
    Publication date: December 16, 2004
    Inventor: Jang-Don Choi
  • Publication number: 20040252369
    Abstract: A beamsplitter includes a first fluoride prism and a second fluoride prism. A coating interface is between the first and second fluoride prisms, wherein an overall R(s)*T(p) function of the beamsplitter varies no more than ±2.74% in the range of 40-50 degrees of incidence.
    Type: Application
    Filed: June 11, 2003
    Publication date: December 16, 2004
    Applicant: ASML Holding N.V.
    Inventor: Ronald A. Wilklow
  • Patent number: 6825988
    Abstract: An extreme ultraviolet (EUV) lithography system may include a spectral purity filter including diffractive gratings. The diffractive gratings may be formed in a silicon substrate using anisotropic etching techniques to produce smooth, flat facets defined by (111) crystallographic planes.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: November 30, 2004
    Assignee: Intel Corporation
    Inventor: Robert Bristol
  • Patent number: 6825975
    Abstract: The present invention is directed to a transparent medium incorporating the oxidative polymerization of 3-hydroxykynurenine, a synthetic version of the yellow-to-brown pigment that occurs in the ocular crystalline lens with age. Because this coloration in the ocular lens is believed to offer photoprotection to the retina, it may represent an ideal sun lens filter with an optical transmission spectrum that is compatible with the psychophysical and neuro-physiological characteristics of the vision system.
    Type: Grant
    Filed: August 27, 2002
    Date of Patent: November 30, 2004
    Assignee: Photoprotective Technologies, Inc.
    Inventor: James Gallas
  • Patent number: 6825976
    Abstract: An optical component with a low reflectance for ultraviolet light in a wavelength range between approx. 180 nm and approx. 370 nm, in particular approx. 248 nm, and for a high angle of incidence up to at least approx. 40° has a substrate and a multilayer antireflection system arranged on at least one surface of said substrate to provide reflection reduction. The multilayer system distinguishes itself in that the layer adjacent to the substrate does not consist of magnesium fluoride and that none of the layers has a thickness of more than half of the working wavelength. In particular, the layer thicknesses of the low refractive materials should not exceed ⅓ the working wavelength. By adhering to these boundary conditions, antireflective coatings can be produced that provide both permanent laser resistance as well as a high resistance against inner layer stress and thermal stress.
    Type: Grant
    Filed: January 7, 2002
    Date of Patent: November 30, 2004
    Assignee: Carl Zeiss SMT AG
    Inventors: Hans-Jochen Paul, Matthias Heller