Having Significant Infrared Or Ultraviolet Property Patents (Class 359/350)
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Patent number: 7180652Abstract: The specification describes an improved Moving Anti-Reflection Switch (MARS) device structure that largely eliminates charge build up on the movable membrane, and reduces stresses that cause curling of the membrane. The improved device uses a movable membrane made of single crystal silicon.Type: GrantFiled: February 18, 2005Date of Patent: February 20, 2007Assignees: Lucent Technologies Inc., Agere Systems Inc.Inventors: David John Bishop, Keith Wayne Goossen, Dennis S. Greywall, James Albert Walker
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Patent number: 7170046Abstract: A color image capture element comprises a plurality of color component photoelectric conversion elements, each disposed with a color filter on a light receiving surface for respectively transmitting different color components, for receiving incoming light and selectively outputting respective color signals corresponding to the intensity of the different color components, and an infrared component photoelectric conversion element, disposed with an infrared transmitting filter on a light receiving surface for transmitting an infrared component, for selectively outputting an infrared signal. This enables the infrared component included in at least one of a plurality of color signals to be corrected, thereby improving the sensitivity of a color image capture apparatus.Type: GrantFiled: December 22, 2004Date of Patent: January 30, 2007Assignee: Sanyo Electric Co., Ltd.Inventor: Yoshihito Higashitsutsumi
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Patent number: 7125128Abstract: Actuator arrays for use in adaptive-optical elements and optical systems containing at least one such element are disclosed. The actuator arrays provide more precise control of the shape of the adaptive-optical surface while utilizing fewer actuators than conventional systems. An adaptive-optical system of an embodiment includes an array of force devices coupled to a deformable optical surface. The force devices of the array are arranged in braking groups and force-altering groups such that each force device belongs to a respective combination of braking group and force-altering group. A respective force controller is coupled to the force devices of each force-altering group, and a respective braking controller is coupled to the force devices of each braking group.Type: GrantFiled: January 26, 2004Date of Patent: October 24, 2006Assignee: Nikon CorporationInventor: W. Thomas Novak
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Patent number: 7122134Abstract: A novel optical member is disclosed.Type: GrantFiled: March 27, 2003Date of Patent: October 17, 2006Inventor: Hiroki Sasaki
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Patent number: 7116473Abstract: An antireflection film includes alternately deposited high-refractive-index layers and low-refractive-index layers. The refractive indexes and extinction coefficients of the layers are such that the antireflection film exhibits sufficient antireflection characteristics even if the geometrical thickness thereof is small. An optical element having the antireflection film on a substrate exhibits high transmittance and has excellent optical characteristics.Type: GrantFiled: January 11, 2006Date of Patent: October 3, 2006Assignee: Canon Kabushiki KaishaInventors: Hidehiro Kanazawa, Kenji Ando, Koji Teranishi
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Patent number: 7104659Abstract: A method and apparatus for control of optical trap arrays and formation of particle arrays using light that is in the visible portion of the spectrum. The method and apparatus provides a laser and a time variable diffractive optical element to allow dynamic control of optical trap arrays and consequent control of particle arrays and also the ability to manipulate singular objects using a plurality of optical traps. By avoiding wavelengths associated with strong absorption in the underlying material, creating optical traps with a continuous-wave laser, optimizing the efficiency of individual traps, and trapping extended samples at multiple points, the rate of deleterious nonlinear optical processes can be minimized.Type: GrantFiled: December 10, 2004Date of Patent: September 12, 2006Assignee: University of ChicagoInventors: David G. Grier, Eric R. Dufresne, Jennifer E. Curtis, Brian A. Koss
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Patent number: 7102814Abstract: A system shields IR emissions from remote sensors and has a flexible outer metallic layer extending to cover objects emitting IR energy on the covered ground. The outer layer is conductive of heat energy and faces upward. A flexible inner metallic layer coextensively extends adjacent to the outer metallic layer. The inner layer is conductive of heat energy and faces downward. Spaced-apart thermo electric chips are between and in contact with the outer and inner layers. The chips transfer heat energy between the outer and inner layers. A sensor of IR radiation on ambient ground provides signals representative of the thermal signature of the ambient ground. A controller couples signals to the chips in response to the representative ambient ground thermal signals for controlling the heat energy radiated from the outer layer to match the radiated IR signature from the outer layer to the IR signature of the ambient ground.Type: GrantFiled: August 30, 2004Date of Patent: September 5, 2006Assignee: The United States of America as represented by the Secretary of the NavyInventor: Robert Hughes
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Patent number: 7083847Abstract: Birefringent optical films have a Brewster angle (the angle at which reflectance of p-polarized light goes to zero) which is very large or is nonexistent. This allows for the construction of multilayer mirrors and polarizers whose reflectivity for p-polarized light decreases slowly with angle of incidence, are independent of angle of incidence, or increase with angle of incidence away from the normal. As a result, multilayer films having high reflectivity (for both planes of polarization for any incident direction in the case of mirrors, and for the selected direction in the case of polarizers) over a wide bandwidth, can be achieved.Type: GrantFiled: September 2, 2003Date of Patent: August 1, 2006Assignee: 3M Innovative Properties CompanyInventors: James M. Jonza, Michael F. Weber, Andrew J. Ouderkirk, Carl A. Stover
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Patent number: 7081978Abstract: A system and method for combining a predetermined number of laser beams. The system (30) includes a collimating lens (34) for receiving and collimating the laser beams and a holographic device (36) positioned to receive beams from the collimating lens (34) and output beams which are co-aligned. The holographic device (36) includes a predetermined number of holographic optical elements (46, 48, 50), wherein each holographic optical element (46, 48, 50) is designed for a particular wavelength of the laser beams. In the preferred embodiment, the holographic optical elements are volume holograms, and the system further includes a blazed grating (38) positioned between the collimating lens (34) and the holographic device (36) to account for variations in the wavelengths of the laser beams due to environmental conditions.Type: GrantFiled: March 17, 2003Date of Patent: July 25, 2006Assignee: Raytheon CompanyInventor: Chungte W. Chen
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Patent number: 7079334Abstract: An infrared sight glass for aftermarket fitment around an opening of an enclosure which enables thermal inspection of electrical equipment within the enclosure. The mounting of the sight glass is performed externally which avoids having to access the interior of the enclosure. The infrared sight glass comprises an infrared transmitting medium to facilitate use of an external infrared thermal imaging camera for monitoring the electrical equipment. A removable protective cover is locked into a closed position by security key screws and is easily removed by a slight twist when the key screws are loosened.Type: GrantFiled: January 28, 2004Date of Patent: July 18, 2006Inventors: Graham R. Holliday, Antony J. Holliday
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Patent number: 7050223Abstract: A DUV-capable dry objective for microscopes comprises lens groups made of quartz glass, fluorite, and in some cases also lithium fluoride. It possesses a DUV focus for a DUV wavelength region ?DUV±??, where ??=8 nm, and additionally a parfocal IR focus for an IR wavelength ?IR, where 760 nm??IR?920 nm. For that purpose, the penultimate element is of concave configuration on both sides, and its object-side outer radius is much smaller than its image-side outer radius. The DUV objective is IR autofocus-capable.Type: GrantFiled: June 21, 2000Date of Patent: May 23, 2006Assignee: Leica Microsystems Semiconductor GmbHInventor: Gerhard Hoppen
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Patent number: 7046444Abstract: The present invention provides a wave plate capable of obtaining preferable phase conversion characteristic over a wide wavelength range. The wave plate includes an aluminum oxide film having linear grating groove patterns. The period L (?m) and the duty ratio De of the grating groove patterns are set at values within the first range specified by the following four formulas: L?0.65 L?2×10?14e31.263De L?6.0317De2?10.352De+5.0516 (De?0.85)2/0.442+(L?0.41)2/0.Type: GrantFiled: August 27, 2004Date of Patent: May 16, 2006Assignee: Sanyo Electric Oc., Ltd.Inventors: Kazushi Mori, Shingo Kameyama, Hitoshi Hirano, Koutarou Furusawa, Koji Tominaga, Masayuki Shono
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Patent number: 7034308Abstract: A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.Type: GrantFiled: June 23, 2004Date of Patent: April 25, 2006Assignee: ASML Netherlands B.V.Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Ralph Kurt, Frank Jeroen Pieter Schuurmans, Yurii Victorovitch Sidelnikov
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Patent number: 7034998Abstract: In a method of connecting a multiplicity of optical elements (9) to a basic body (8), in particular for producing a faceted mirror (1), for example for beam mixing and field imaging for an EUV lighting system, the individual optical elements (9) are positioned on the basic body (8, 14) and subsequently connected to one another by an galvanoplastic process. Alternatively, the multiplicity of optical elements are aligned on an auxiliary structure (11) and the optical elements (9) are subsequently made to grow up galvanoplastically on their rear sides, forming a supporting structure (14) as the basic body.Type: GrantFiled: June 21, 2001Date of Patent: April 25, 2006Assignee: Carl Zeiss Smt AGInventors: Frank Melzer, Ulrich Bingel
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Patent number: 7029758Abstract: The present invention relates to the use of water soluble melanin in solid plastic films of polyvinyl alcohol to be used in conjunction with other plastics to make laminated sheets or lenses. Such laminates will be used as filters to protect against photochemical damage from electromagnetic radiation.Type: GrantFiled: September 30, 2002Date of Patent: April 18, 2006Inventors: James Gallas, Melvin Eisner
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Patent number: 7012753Abstract: An optical device reflecting a range of wavelengths comprised between 10 nm and 20 nm comprises alternate superposed first and second layers. The first layers are made of metal or metallic compound and the second layers are formed by an amorphous silicon compound chosen from a-Si—Hx, a-Si—CHx, a-Si—Cx, a-Si—OHx, a-Si—Fx, a-Si—FHx, a-Si—Nx, a-Si—NHx, x being comprised between 0.01 and 0.3. The use of second layers of amorphous silicon compound enables the mechanical stresses of the optical device to be stabilized up to at least 200° C. The optical device is preferably used as reflector for a lithography mask in the extreme ultraviolet (EUV).Type: GrantFiled: March 18, 2004Date of Patent: March 14, 2006Assignee: Commissariat a l'Energie AtomiqueInventor: Etienne Quesnel
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Patent number: 7006284Abstract: An imaging apparatus for DUV beams is provided which includes a lens for receiving a DUV beam and producing an image of the DUV beam, wherein the lens has an aplanatic surface and a hemispheric surface, and wherein at least the aplanatic surface is made from or otherwise has a down-converting medium for producing a down-converted beam; an image sensing member for viewing an image of the down-converted beam; and optics for relaying the image of the down-converted beam from the lens to the image sensing member. A processor can be communicated with the image sensing member for analyzing the image of the DUV beam.Type: GrantFiled: May 17, 2004Date of Patent: February 28, 2006Inventor: William C. Fricke
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Patent number: 7005176Abstract: An optical adhesive polyester film comprising (A) a polyester film layer containing an aromatic polyester and an ultraviolet absorber and (B) a coating formed on at least one surface of the polyester film (A). The coating (B) contains at least one polymer selected from the group consisting of a coating polyester having a glass transition point of 40 to 100° C. and an acryl polymer having a glass transition point of 20 to 80° C. in an amount of 50 to 95% by weight based on the coating. The optical adhesive polyester film is disposed on the front of a plasma display so as to block externally incoming ultraviolet light.Type: GrantFiled: December 5, 2002Date of Patent: February 28, 2006Assignee: Teijin Dupont Films Japan LimitedInventors: Mitsuo Tojo, Koji Kubo, Shinji Yano, Tetsuo Ichihashi
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Patent number: 6994444Abstract: An apparatus and method of maintaining a time-constant heat load on a lithography mirror. The mirror includes a resistive layer formed on a substrate, contacts for coupling a power supply to the resistive layer, an insulating sublayer formed on the resistive layer, a polished layer formed on the insulating layer, and a reflective layer formed on the polished layer. The time-constant heat load on the lithography mirror is maintained by placing an additional electrical heat load on the mirror according to the actinic heat load transmitted by the mask. Maintaining the time-constant heat load can reduce or eliminate variation in image distortion that occurs as a result of changes in actinic heat load on the lithography mirror. Independent temperature control can be used to mitigate “cold-edge effect.Type: GrantFiled: June 14, 2002Date of Patent: February 7, 2006Assignee: ASML Holding N.V.Inventor: Santiago del Puerto
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Patent number: 6992753Abstract: Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values HD for lenses and at least one lens made of a material having a characteristic transition point TRC after exposure to a given amount of radiation, wherein, for instance, TRC<0.8. HD among other relationships and/or characteristics of the lenses.Type: GrantFiled: December 24, 2003Date of Patent: January 31, 2006Assignee: Carl Zeiss SMT AGInventors: Daniel Krähmer, Eric Eva
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Patent number: 6972419Abstract: An extreme (EUV) lithography system includes optical elements which vary the wavelengths of radiation as a function of the angle of incidence on a mask to maximize the reflected radiation intensity.Type: GrantFiled: February 24, 2003Date of Patent: December 6, 2005Assignee: Intel CorporationInventor: Edita Tejnil
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Patent number: 6967771Abstract: Antireflection multilayer coatings with only three or four layers are proposed for the production of laser resistant optical components with minimal residual reflection and high transparency for UV light in a wavelength range approx. 150 nm to approx. 250 nm at large angles of incidence in the range of approx. 70° to approx. 80°, particularly in the range between approx. 72° and approx. 76°. For incident p-polarized UV light three-layer systems can be used, in which a layer of low refractive material, in particular magnesium fluoride is arranged between two layers of high refractive material and, in the case of the specified wavelength, of minimally absorbent material, in particular of hafnium oxide or aluminum oxide. For example, this allows a residual reflection of perceptibly less than 1% to be achieved in the case of a wavelength of 248 nm at angles of incidence in the range between approx. 72° and approx. 76°.Type: GrantFiled: February 2, 2004Date of Patent: November 22, 2005Assignee: Carl Zeiss SMT AGInventors: Ralf Kuschnereit, Hans-Jochen Paul
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Patent number: 6968399Abstract: Information on the protocols supported by a target device and the address thereof are acquired by a simple operation, and communication is performed using a supported protocol. A device (1) 1 includes: a non-contact IC interface 2, which requests supported protocol information 8 of a device (2) 4 within a predetermined communication area in a network, and which acquires supported protocol information 8 from the device (2) 4; an IEEE 802.11b interface 3, which performs transmission signal processing and reception signal processing; test communication element, which performs test communication using the IEEE 802.11b interface 3; and communication element which, when test communication using the test communication element is possible, performs communication using a protocol of the protocol information 8 acquired by the protocol acquisition element.Type: GrantFiled: October 16, 2002Date of Patent: November 22, 2005Assignee: Sony CorporationInventors: Takuro Noda, Makoto Sato, Tatsuya Igarashi
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Patent number: 6960381Abstract: A pellicle is used for a photolithographic patterning process using a light having a wavelength of from 100 to 200 nm. The pellicle contains a pellicle membrane containing (A) a substantially linear fluoropolymer which has an alicyclic structure in its main chain, the main chain being a chain of carbon atoms, and the fluropolymer satisfying the following requirements (1) the carbon atoms in the main chain of the fluoropolymer contain a carbon atom having at least one hydrogen atom bonded thereto and a carbon atom having no hydrogen atom bonded thereto; and (2) in the measurement of a high resolution proton magnetic resonance spectrum of the fluoropolymer, a number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm, is at most 6 mol % based on a total number of hydrogen atoms.Type: GrantFiled: August 6, 2003Date of Patent: November 1, 2005Assignee: Asahi Glass Company, LimitedInventors: Ikuo Matsukura, Naoko Shirota, Nana Tsushima, Kiyoshi Yamamoto, Reiko Kakita
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Patent number: 6956694Abstract: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 ?m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ. greater than 0.Type: GrantFiled: November 6, 2001Date of Patent: October 18, 2005Assignee: KLA-Tencor Technologies Corp.Inventors: David R. Shafer, Yung-Ho Chuang, Bin-Ming B. Tsai
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Patent number: 6954257Abstract: An optical element of a lithographic projection apparatus includes a Si/Mo multilayer structure, an outer capping layer and an interlayer positioned between the multilayer structure and the outer capping layer. The interlayer has a thickness of between 0.3 and 0.7 times the wavelength of the incident radiation. The interlayer may be C or Mo and has a thickness of between 6.0 and 9.0 nm. The interlayer may include an inner interlayer including Mo next to the multilayer structure and an outer interlayer including C next to the capping layer. The outer interlayer is at least 3.4 nm thick and the capping layer is Ru and at least 2.0 nm thick.Type: GrantFiled: August 26, 2003Date of Patent: October 11, 2005Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Ralph Kurt, Andrei Evgenuevich Iakchine Yakshin
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Patent number: 6946416Abstract: Fused silica articles exhibiting improved internal transmission and decreased absorption change when irradiated with a laser when compared with fused silica articles containing lower levels of aluminum. The articles also exhibit induced transmission when irradiated with a laser. The articles also exhibit improved off-axis refractive index homogeneity.Type: GrantFiled: December 13, 2002Date of Patent: September 20, 2005Assignee: Corning IncorporatedInventors: John E. Maxon, Christine E. Heckle
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Patent number: 6927899Abstract: An optical element, such as a lens, is described that provides good transmission of radiation in the infrared portion of the electromagnetic spectrum, that can be molded using an injection molding technique. The optical element comprises a moldable matrix in which is distributed a plurality of particles. The material comprising the matrix is selected so as to have a relatively low absorption of radiation in the infrared portion of the electromagnetic spectrum, and the material comprising the particles is selected to have a relatively high transmissivity of radiation in the infrared portion of the electromagnetic spectrum, and both materials are selected so as to have approximately the same index of refraction. The optical element comprising the matrix/particle composite is formed to provide surfaces having the contours that are required to provide the desired optical properties.Type: GrantFiled: December 19, 2002Date of Patent: August 9, 2005Assignee: Optical Alchemy, Inc.Inventor: Marc Daigle
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Patent number: 6921580Abstract: The present invention relates to a polyester film for display comprising: a polyester film substrate containing an ultraviolet light absorber; and a coating layer formed on at least one surface of said polyester film substrate, said polyester film having a haze of not more than 2.0% and a light transmittance at 380 nm of not more than 5.0%.Type: GrantFiled: June 10, 2003Date of Patent: July 26, 2005Assignee: Mitsubishi Polyester Film CorporationInventors: Kazuyuki Akatsu, Kanae Shinjo
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Patent number: 6919988Abstract: A system and method for simultaneous imaging of both infrared and millimeter wave radiation. The novel optical system (10) includes a primary mirror (20), a Mangin secondary mirror (30) positioned to receive energy reflected from the primary mirror (20), and an immersion lens (40) for focusing energy received from the Mangin mirror (30). In the illustrative embodiment, the primary mirror (20) and Mangin mirror (30) are arranged in a Cassegrain configuration. Central to this invention is the use of a negative power refractive Mangin mirror (30) as the Cassegrain secondary mirror, so that the field curvature of the secondary mirror (30) and immersion lens (40) can be made to cancel. The immersion lens (40) effectively decreases the wavelength of the millimeter wave radiation, allowing a smaller detector to collect the same amount of radiation as would a larger detector in air.Type: GrantFiled: May 6, 2002Date of Patent: July 19, 2005Assignee: Raytheon CompanyInventor: Lacy G. Cook
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Patent number: 6914723Abstract: A mask blank inspection tool includes an AFO having a diffractive lens and a refractive lens formed on a common substrate. The diffractive lens is a Fresnel zone plate and the refractive lens is a refractive Fresnel lens. The AFO is used to image light from a defect particle on a multilayer mask blank or the surface of the multilayer mask blank to a detector.Type: GrantFiled: April 29, 2003Date of Patent: July 5, 2005Assignee: Xradia, Inc.Inventors: Wenbing Yun, Yuxin Wang
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Patent number: 6909539Abstract: A single sensor that can operate in multiple bands and display either one radiation band alone or multiple overlaid bands, using an appropriate color choice to distinguish the bands. The multiple-band sensor allows the user to look through at least one eyepiece and with the use of a switch, see scenes formed via the human eye under visible light, an II sensor, an MWIR sensor, or an LWIR sensor, either individually or superimposed. The device is equipped with multiple switching mechanisms. The first, for allowing the user to select between radiation bands and overlays, and the second, as with most thermal imaging sensors, for allowing the user to switch between “white-hot/black-hot” i.e., a polarity switch.Type: GrantFiled: June 16, 2003Date of Patent: June 21, 2005Assignee: Science Applications International CorporationInventors: Ronald James Korniski, William Henry Dyer, Peter Spiro Paicopolis
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Patent number: 6906857Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.Type: GrantFiled: March 17, 2004Date of Patent: June 14, 2005Assignee: 3M Innovative Properties CompanyInventors: Richard M. Fischer, Jr., Bradley D. Guth, Warren D. Ketola, James W. Riley
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Patent number: 6903036Abstract: An infrared absorption filter consisting of 70 to 98 mol % of SiO2, 1 to 12 mol % of CuO and 1 to 18 mol % of a network modifier oxide than CuO or CdO is provided. A process of fabricating an infrared absorption filter is also provided. The process comprises introducing a divalent copper compound and a compound of a metal species acting as a network modifier oxide in the form of metal ions into a wet gel. The wet gel can be dipped in a dipping solution to precipitate the divalent copper compound and the compound of a metal species acting as the network modifier oxide in the wet gel. The wet gel can be dried and heated, thereby obtaining an infrared absorption glass. The infrared absorption glass can be cut and polished, thereby fabricating a filter.Type: GrantFiled: December 31, 2002Date of Patent: June 7, 2005Assignee: Olympus CorporationInventors: Yoshinobu Akimoto, Hiroaki Kinoshita
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Patent number: 6898890Abstract: A night-vision optical device of the invention with controlled life expectancy contains a time measuring device built into the housing of the aforementioned device for measuring the accumulated time of active work of the device. In application to a night scope for a firearm, the device also contains a sensor, which is interlocked with activation of the scope and reacts on the shots produced from the firearm in general and separately on those shots produced during active work of the night-vision optics at nighttime. The aforementioned shots of both types are counted and stored in separate memory units. The night-time shots affects the life expectancy of the night-vision optics because of muzzle flashes which cause such devices as an image intensifier to work with an increased light load. The information obtained from the time measuring device and the shot counter makes it possible to timely receive a warning signal about the fact that the night optics or the entire firearm must be replaced.Type: GrantFiled: March 28, 2003Date of Patent: May 31, 2005Assignee: American Technologies Network Corp.Inventor: Leonid Gaber
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Patent number: 6897434Abstract: A source and/or method of generating quantum-correlated and/or entangled photon pairs using parametric fluorescence in a fiber Sagnac loop. The photon pairs are generated in the 1550 nm fiber-optic communication band and detected by a detection system including InGaAs/InP avalanche photodiodes operating in a gated Geiger mode. A generation rate>103 pairs/s is observed, a rate limited only by available detection electronics. The nonclassical nature of the photon correlations in the pairs is demonstrated. This source, given its spectral properties and robustness, is well suited for use in fiber-optic quantum communication and cryptography networks. The detection system also provides high rate of photon counting with negligible after pulsing and associated high quantum efficiency and also low dark count rate.Type: GrantFiled: February 28, 2003Date of Patent: May 24, 2005Assignee: Northwestern UniversityInventors: Prem Kumar, Marco Florentino, Paul L. Voss, Jay E. Sharping
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Patent number: 6882475Abstract: There is provided a polarizing member having a sheet-like member formed so that linearly polarized light can be obtained as transmitted light through the sheet-like member after natural light is incident on a rear surface of the sheet-like member, wherein the sheet-like member exhibits a transmittance difference of not larger than 6% between transmitted light components within a 20 nm-wide wavelength region in a transmission spectrum of light in a wavelength range of from 520 to 640 nm when natural light is incident on the sheet-like member at any angle ranging from an angle viewing from a line normal to a surface of the sheet-like member to an elevation angle of 80 degrees. There is provided an illuminator having a planar light source including a reflection layer on a rear surface side of the planar light source, and a polarizing member defined above and disposed on a front surface side of the planar light source.Type: GrantFiled: February 7, 2002Date of Patent: April 19, 2005Assignee: Nitto Denko CorporationInventors: Ikuo Kawamoto, Hironori Motomura, Miki Shiraogawa
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Patent number: 6879438Abstract: The present invention relates to an infrared filter comprising a biaxially oriented co-extruded film having at least three polyester layers comprising an intermediate polyester layer and the surface polyester layers on both sides of the said intermediate layer, said intermediate layer containing a near infrared absorber having an absorption peak at 800 to 1,100 nm in an amount of 0.1 to 10% by weight based on the weight of the intermediate layer, the light transmittance of said film being not higher than 30% at 950 nm, and the average center line roughness (Ra) of the film surface on at least one side being 10 to 30 nm.Type: GrantFiled: March 20, 2002Date of Patent: April 12, 2005Assignee: Mitsubishi Polyester Film CorporationInventor: Narihiro Masuda
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Patent number: 6872471Abstract: The present invention includes infrared emitting materials and infrared emitting devices. The present invention demonstrates 1.54 micron infrared PL and EL emission from an organic complex. This provides a very simple way to obtain a light source at 1.54 micron wavelength that may be both optically and electrically pumped.Type: GrantFiled: March 5, 2001Date of Patent: March 29, 2005Assignee: The Ohio State University Research FoundationInventors: Arthur J. Epstein, Qianbing Zheng, Run G. Sun
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Patent number: 6871337Abstract: A method and apparatus for microlithography. The method and apparatus include optimizing illumination modes based on characteristics of a specific mask pattern. The illumination is optimized by determining an appropriate illumination mode based on diffraction orders of the reticle, and the autocorrelation of the projection optic. By elimination of parts of the illumination pattern which have no influence on modulation, excess DC light can be reduced, thereby improving depth of focus. Optimization of mask patterns includes addition of sub-resolution features to reduce pitches and discretize the probability density function of the space width.Type: GrantFiled: February 22, 2002Date of Patent: March 22, 2005Assignee: ASML Netherlands B.V.Inventor: Robert John Socha
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Patent number: 6863842Abstract: An optical component formed of a material that blocks noise-causing visible and near-infrared rays selectively or as a whole while transmitting far-infrared rays to the extent possible, and a method for producing the component. The component is produced by adding at least one additive that blocks visible and near-infrared rays to a ceramic material of ZnS, ZnSe, or Ge. The component is most suitable for a particular purpose or use of an optical component, such as a window or lens to be used in a high-performance infrared apparatus, because noise-causing visible and near-infrared rays are blocked.Type: GrantFiled: November 29, 2001Date of Patent: March 8, 2005Assignee: Sumitomo Electric Industries, Ltd.Inventor: Masato Hasegawa
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Patent number: 6858306Abstract: A glass article having a solar control coating is disclosed for use in producing heat reducing glass especially for use in architectural windows. The coated article includes a glass substrate, a coating of an antimony doped tin oxide deposited on and adhering to the glass substrate and a coating of fluorine doped tin oxide deposited on and adhering to the surface of the coating of antimony doped tin oxide. The low emittance of the coated glass article, when combined with the surprisingly selective solar absorption of the multilayer stack provides improved heat rejection in summer and heat retention in winter, while permitting the transmittance of a relatively high degree of visible light.Type: GrantFiled: July 26, 2000Date of Patent: February 22, 2005Assignees: Pilkington North America Inc., Pilkington PLCInventors: David A. Strickler, Kevin D. Sanderson, Srikanth Varanasi, Ronald D. Goodman
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Patent number: 6859309Abstract: The present disclosure is directed to an optical filter that advantageously approximates sunlight that is both durable and stable for long periods of time when subject to harsh light intensity, thermal and moisture loads of accelerating weathering devices. The optical filter includes a glass having a lead content of between 0.5% and 50% by weight. In some examples, the filter can be constructed to have a thickness of 0.7 mm to 10 mm. In another aspect of the disclosure, the optical filter is part of an optical filter assembly suitable for manipulating spectral power distribution. The optical filter assembly includes a lead glass optical filter having a lead content of between 0.5% and 50% by weight and an ultraviolet transmissive optical filter. In one example, the ultraviolet transmissive optical filter is constructed from quartz glass. The ultraviolet transmissive optical filter can further include an infrared absorbing coating.Type: GrantFiled: December 19, 2001Date of Patent: February 22, 2005Assignee: 3M Innovative Properties CompanyInventors: Richard M. Fischer, Jr., Bradley D. Guth, Warren D. Ketola, James W. Riley
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Patent number: 6859311Abstract: A UV-transmissable window assembly for a DMD device includes a UV-transmissable glass window provided in a frame. The window and frame are bonded together to preferably effect a hermetic seal therebetween. Optical coatings specific to the intended wavelength of light transmission are applied to the inner and outer surfaces of the glass window to reduce reflection and increase light transmission therethrough. The window assembly, and DMD provided with the same, is adapted for excellent transmission of ultraviolet light, even at the deep ultraviolet portion of the spectrum. The DMD window assembly has application in the medical arts, both surgery and device manufacture, in the production of integrated circuits (IC), and in other optical lithography applications, among other fields.Type: GrantFiled: March 24, 2003Date of Patent: February 22, 2005Assignee: Memphis Eye & Cataract Associates Ambulatory Surgery CenterInventors: Roy E. Williams, Brian M. Callies, David E. Thomas
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Patent number: 6833949Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.Type: GrantFiled: September 9, 2002Date of Patent: December 21, 2004Assignee: Corning IncorporatedInventors: Robert L. Maier, Lisa A. Moore, Charlene M. Smith
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Publication number: 20040252368Abstract: An infrared ray irradiation apparatus for a night vision system which is operated easily and selectively in a visible and infrared ray irradiation mode and an infrared ray irradiation mode, and irradiates infrared rays emitted from a lamp toward an area in front of a car by means of one transmission step (by a tube) and one reflection step (by a reflector), thus irradiating the infrared rays without deterioration in brightness.Type: ApplicationFiled: December 30, 2003Publication date: December 16, 2004Inventor: Jang-Don Choi
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Publication number: 20040252369Abstract: A beamsplitter includes a first fluoride prism and a second fluoride prism. A coating interface is between the first and second fluoride prisms, wherein an overall R(s)*T(p) function of the beamsplitter varies no more than ±2.74% in the range of 40-50 degrees of incidence.Type: ApplicationFiled: June 11, 2003Publication date: December 16, 2004Applicant: ASML Holding N.V.Inventor: Ronald A. Wilklow
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Patent number: 6825988Abstract: An extreme ultraviolet (EUV) lithography system may include a spectral purity filter including diffractive gratings. The diffractive gratings may be formed in a silicon substrate using anisotropic etching techniques to produce smooth, flat facets defined by (111) crystallographic planes.Type: GrantFiled: September 4, 2002Date of Patent: November 30, 2004Assignee: Intel CorporationInventor: Robert Bristol
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Patent number: 6825975Abstract: The present invention is directed to a transparent medium incorporating the oxidative polymerization of 3-hydroxykynurenine, a synthetic version of the yellow-to-brown pigment that occurs in the ocular crystalline lens with age. Because this coloration in the ocular lens is believed to offer photoprotection to the retina, it may represent an ideal sun lens filter with an optical transmission spectrum that is compatible with the psychophysical and neuro-physiological characteristics of the vision system.Type: GrantFiled: August 27, 2002Date of Patent: November 30, 2004Assignee: Photoprotective Technologies, Inc.Inventor: James Gallas
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Patent number: 6825976Abstract: An optical component with a low reflectance for ultraviolet light in a wavelength range between approx. 180 nm and approx. 370 nm, in particular approx. 248 nm, and for a high angle of incidence up to at least approx. 40° has a substrate and a multilayer antireflection system arranged on at least one surface of said substrate to provide reflection reduction. The multilayer system distinguishes itself in that the layer adjacent to the substrate does not consist of magnesium fluoride and that none of the layers has a thickness of more than half of the working wavelength. In particular, the layer thicknesses of the low refractive materials should not exceed ⅓ the working wavelength. By adhering to these boundary conditions, antireflective coatings can be produced that provide both permanent laser resistance as well as a high resistance against inner layer stress and thermal stress.Type: GrantFiled: January 7, 2002Date of Patent: November 30, 2004Assignee: Carl Zeiss SMT AGInventors: Hans-Jochen Paul, Matthias Heller