Abstract: A data sensing circuit includes: a current source configured to supply a reference current to an output line; a switching precharging unit configured to couple an input line with the output line during a precharge operation of the input line; and a current sinking unit configured to sink a current from the output line in response to a voltage level of the input line.

Abstract: To provide a signal processing circuit including a nonvolatile memory circuit with a novel structure, the signal processing circuit includes an arithmetic portion, a memory, and a control portion for controlling the arithmetic portion and the memory. The control portion includes a set of a volatile memory circuit and a first nonvolatile memory circuit for storing data held in the volatile memory circuit, the memory includes a plurality of second nonvolatile memory circuits, and the first nonvolatile memory circuit and the second nonvolatile memory circuit each include a transistor having a channel in an oxide semiconductor layer and a capacitor in which one of a pair of electrodes is electrically connected to a node which is set in a floating state when the transistor is turned off.

Abstract: A semiconductor device includes a word line, a bit line, a power supply node, a memory element that includes at least first and second regions that form a PN junction between the bit lie and the power supply node, and a third region that forms a PN junction with the second region and a capacitor that includes a first electrode provided independently from the second region of the memory element and electrically connected to the second region of the memory element, and a second electrode connected to the word line.

Abstract: A ferroelectric memory having a plurality of ferroelectric memory cells, each ferroelectric memory cell including a ferroelectric capacitor is disclosed. The ferroelectric memory includes read and write lines and a plurality of ferroelectric memory cell select buses, one select bus corresponding to each of the ferroelectric memory cells. Each of the ferroelectric memory cells includes first and second gates for connecting the ferroelectric memory cell to the read line and the write line, respectively, in response to signals on the ferroelectric memory cell select bus corresponding to that ferroelectric memory cell. A write circuit causes a charge to be stored in the ferroelectric capacitor of the ferroelectric memory cell currently connected to the write line, the charge having a value determined by a data value having at least three states.

Abstract: A semiconductor storage device which stops and resumes the supply of power supply voltage without the necessity of saving and returning a data signal between a volatile storage device and a nonvolatile storage device is provided. In the semiconductor storage device, data is held in a data holding portion connected to a transistor including a semiconductor layer containing an oxide semiconductor and a capacitor. The potential of the data held in the data holding portion is controlled by a data potential holding circuit and a data potential control circuit. The data potential holding circuit can output data without leaking electric charge, and the data potential control circuit can control the potential of the data held in the data holding portion without leaking electric charge by capacitive coupling through the capacitor.

Abstract: A memory cell and method for operating a memory cell including a bidirectional access device and memory element electrically coupled in series. The bidirectional access device includes a tunneling capacitance. The memory element programmable to a first and second state by application of a first and second write voltage opposite in polarity to one another. The memory element has a lower capacitance in the first state than the second state. A read unit senses a transient read current due to a voltage drop upon application of a read voltage. Determining if the memory element is the first or second state is based on whether the read current is greater or less than a sense threshold. The sense threshold is based on a capacitance ratio between the first and second state.

Abstract: In a semiconductor device performing pipeline processing with the use of a reading portion reading an instruction and an arithmetic portion performing an operation in accordance with the instruction, the instruction held in the reading portion is transmitted from the flip-flop to the memory when branch prediction turns out to be wrong. Note that the arithmetic portion controls transmission and reception of the instruction between the flip-flop and the memory which are included in the reading portion. This enables elimination of redundant operations in the reading portion in the case where an instruction read by the reading portion after the branch prediction turns out to be wrong is a subroutine, or the like. That is, the instruction held in the memory is transmitted back to the flip-flop without rereading of the same instruction by the reading portion, whereby the instruction can be output to the arithmetic portion.

Abstract: A semiconductor device that has a simple peripheral circuit configuration, is unlikely to deteriorate due to repetitive data writing operations, and is used as a nonvolatile switch. Even when supply of a power supply voltage is stopped, data on a conduction state is held in a data retention portion connected to a thin film transistor including an oxide semiconductor layer having a channel formation region. The data retention portion is connected to a gate of a field-effect transistor in a current amplifier circuit (in which the field-effect transistor and a bipolar transistor are connected as a Darlington pair), and thus the conduction state is controlled without leaking charge in the data retention portion.

Abstract: A method for performing a holding operation to a semiconductor memory array having rows and columns of memory cells, includes: applying an electrical signal to buried regions of the memory cells, wherein each of the memory cells comprises a floating body region defining at least a portion of a surface of the memory cell, the floating body region having a first conductivity type; and wherein the buried region of each memory cell is located within the memory cell and located adjacent to the floating body region, the buried region having a second conductivity type.

Abstract: When a CPU provided with a latch memory is operated, a constant storage method or an end storage method is selected depending on what is processed by the CPU; thus, the CPU provided with a latch memory has low power consumption. When the CPU provided with a latch memory is operated, in the case where the number of times of turning on and off the power source is high, a constant storage method is employed and in the case where the number of times of turning on and off the power source is low, an end storage method is employed. Whether a constant storage method or an end storage method is selected is determined based on the threshold value set depending on power consumption.

Abstract: Techniques for providing a semiconductor memory device are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus including a first region and a second region. The apparatus may also include a body region disposed between the first region and the second region and capacitively coupled to a plurality of word lines, wherein each of the plurality of word lines is capacitively coupled to different portions of the body region.

Abstract: Memory devices comprise a lower layer that extends across a cell array region and across a peripheral region and that includes a flat outer surface from the cell array region to the peripheral region. A signal transfer conductor layer extends in the cell array region beneath the flat outer surface of the lower layer and extends in the peripheral region above the flat outer surface of the lower layer. An insulating layer is provided on the lower layer, including a flat outer surface from the cell array region to the peripheral region. A flat stopper layer is provided on the flat outer surface of the insulating layer and extending across the cell array region and the peripheral region. Related methods are also provided.

Abstract: Large capacity memory systems are constructed using multiple groups of memory integrated circuits or chips. The memory system includes one or more interface circuits for interfacing between the multiple groups of memory integrated circuits and a memory controller. The interface circuit may detect and/or recover failed data using error-checking information stored in a memory integrated circuit.

Abstract: A semiconductor device which stores data by using a transistor whose leakage current between source and drain in an off state is small as a writing transistor. In a matrix including a plurality of memory cells in which a drain of the writing transistor is connected to a gate of a reading transistor and the drain of the writing transistor is connected to one electrode of a capacitor, a gate of the writing transistor is connected to a writing word line; a source of the writing transistor is connected to a writing bit line; and a source and a drain of the reading transistor are connected to a reading bit line and a bias line. In order to reduce the number of wirings, the writing bit line or the bias line is substituted for the reading bit line in another column.

Abstract: A method of reducing leakage current in a memory circuit is disclosed (FIG. 8A). The method includes connecting a first supply voltage terminal (VDD) to a bulk terminal of a transistor in an active mode of operation. The method further includes detecting a low power mode (SLEEP) of operation of the transistor and disconnecting the first supply voltage terminal from the bulk terminal in response to the step of detecting.

Abstract: An object is to provide a semiconductor device having a novel structure. A first wiring; a second wiring; a third wiring, a fourth wiring; a first transistor including a first gate electrode, a first source electrode, and a first drain electrode; a second transistor including a second gate electrode, a second source electrode, and a second drain electrode are included. The first transistor is provided over a substrate including a semiconductor material and a second transistor includes an oxide semiconductor layer.

Abstract: Disclosed embodiments may include an apparatus having a segment wordline enable coupled to logic to selectively disable ones of a number of segment wordline drivers. The logic may partition a page of the apparatus to reduce power consumed through activation of the disabled ones of the number of segment wordlines. Other embodiments may be disclosed.

Abstract: With a combination of a transistor including an oxide semiconductor material and a transistor including a semiconductor material other than an oxide semiconductor, a semiconductor device with a novel structure in which data can be retained for a long time and does not have a limitation on the number of writing can be obtained. When a connection electrode for connecting the transistor including a semiconductor material other than an oxide semiconductor to the transistor including an oxide semiconductor material is smaller than an electrode of the transistor including a semiconductor material other than an oxide semiconductor that is connected to the connection electrode, the semiconductor device with a novel structure can be highly integrated and the storage capacity per unit area can be increased.

Abstract: The memory capacity of a DRAM is enhanced. A semiconductor memory device includes a driver circuit including part of a single crystal semiconductor substrate, a multilayer wiring layer provided over the driver circuit, and a memory cell array layer provided over the multilayer wiring layer. That is, the memory cell array overlaps with the driver circuit. Accordingly, the integration degree of the semiconductor memory device can be increased as compared to the case where a driver circuit and a memory cell array are provided in the same plane of a substrate containing a singe crystal semiconductor material.

Abstract: An integrated circuit which can be switched to a resting state and can be returned from the resting state rapidly is provided. An integrated circuit whose power consumption can be reduced without the decrease in operation speed is provided. A method for driving the integrated circuit is provided. The integrated circuit includes a first flip-flop and a second flip-flop including a nonvolatile memory circuit. In an operating state in which power is supplied, the first flip-flop retains data. In a resting state in which supply of power is stopped, the second flip-flop retains data. On transition from the operating state into the resting state, the data is transferred from the first flip-flop to the second flip-flop. On return from the resting state to the operating state, the data is transferred from the second flip-flop to the first flip-flop.

Abstract: A memory device with low power consumption is provided. A memory device includes a first logic element generating an output potential by inverting a polarity of a potential of a signal including data in accordance with a first clock signal; second and third logic elements holding the output potential generated by the first logic element; a switching element including a transistor; and a capacitor storing the data by being supplied with the output potential of the first logic element which is held by the second and third logic elements via the switching element. The second logic element generates an output potential by inverting a polarity of an output potential of the third logic element in accordance with a second clock signal different from the first clock signal, and the third logic element generates an output potential by inverting a polarity of the output potential of the second logic element.

Abstract: Memory devices and methods of operating memory devices are shown. Configurations described include a memory cell string having an elongated n type body region and having select gates with p type bodies. Configurations and methods shown can provide a reliable bias to a body region for memory operations such as erasing.

Abstract: A dynamic random access memory (DRAM) device has a hierarchical bitline structure with local bitlines and global bitlines formed on different metal layers. The local bitlines are separated into a plurality of local bitline sections, and bitline isolation switches are configured to connect or disconnect the local bitline sections to or from the global bitlines. As a result, the local bitlines with higher per-length capacitance can be made shorter, since the global bitline with lower per-length capacitance is used to route the signal from the cell capacitances of the memory cells to the remote sense amplifiers.

Abstract: This description is directed to a dynamic random access memory (DRAM) array having a plurality of rows and a plurality of columns. The array further includes a plurality of cells, each of which are associated with one of the columns and one of the rows. Each cell includes a capacitor that is selectively coupled to a bit line of its associate column so as to share charge with the bit line when the cell is selected. There is a segmented word line circuit for each row, which is controllable to cause selection of only a portion of the cells in the row.

Abstract: Provided is a memory device in which memory capacity per unit area is increased without making the manufacturing process complicated. The memory device includes a plurality of memory cells, a plurality of word lines, and a plurality of bit lines. Each of the plurality of memory cells includes a switching element and a capacitor including a first electrode and a second electrode. In at least one of the plurality of memory cells, in accordance with a potential applied to one of the plurality of word lines, the switching element controls a connection between one of the plurality of bit lines and the first electrode, and the second electrode is connected to another one of the plurality of word lines.

Abstract: At least one example embodiment discloses a semiconductor device. The semiconductor device includes a first sense amplifier selectively connected between a first bit line and a second bit line, a second sense amplifier selectively connected between the first bit line and the second bit line, a first power supply circuit configured to provide a power supply voltage to the first sense amplifier in response to a first control signal, a second power supply circuit configured to provide a ground voltage to the second sense amplifier in response to a second control signal, and a switching circuit configured to selectively connect the first power supply circuit with the second power supply circuit in response to a third control signal.

Abstract: A system on chip (SoC) provides a memory array of nonvolatile bitcells. Each bit cell includes two ferroelectric capacitors connected in series between a first plate line and a second plate line, such that a node Q is formed between the two ferroelectric capacitors. The first plate line and the second plate line are configured to provide a voltage approximately equal to first voltage while the bit cell is not being accessed. A clamping circuit is coupled to the node Q and is operable to clamp the node Q to a voltage approximately equal to first voltage while the bit cell is not being accessed.

Abstract: A semiconductor device includes an equalizing circuit and a control circuit. The equalizing circuit executes an operation of pre-charging the signal input/output line pair used for data inputting/outputting and an operation of equalizing it independently of each other. In case a plurality of data write operations occur in succession, the control circuit halts pre-charge control in the equalizing circuit in the course of consecutive write operations.

Abstract: In a semiconductor device which conducts multilevel writing operation and a driving method thereof, a signal line for controlling on/off of a writing transistor for conducting a writing operation on a memory cell using a transistor including an oxide semiconductor layer is disposed along a bit line, and a multilevel writing operation is conducted with use of, also in a writing operation, a voltage which is applied to a capacitor at a reading operation. Because an oxide semiconductor material that is a wide gap semiconductor capable of sufficiently reducing off-state current of a transistor is used, data can be held for a long period.

Abstract: To provide a memory device which can perform verification operation for detecting a memory cell whose data holding time is shorter than a predetermined length, accurately in a short time. Each memory cell includes at least a first capacitor, a second capacitor, and a transistor which functions as a switching element for controlling supply, storage, and release of charge in the first capacitor and the second capacitor. The capacitance of the first capacitor is thousand or more times the capacitance of the second capacitor, preferably ten thousand or more times the capacitance of the second capacitor. In normal operation, charge is stored using the first capacitor and the second capacitor. In performing verification operation for detecting a memory cell whose data holding time is shorter than a predetermined length, charge is stored using the second capacitor.

Abstract: A complementary metal-oxide-semiconductor (CMOS) dynamic random access memory (DRAM) cell with sense amplifier is described. In one embodiment, the DRAM cell includes an n-type field-effect transistor (NFET), a p-type field-effect transistor (PFET), and a storage capacitor accessed through both the NFET and the PFET. A pair of bit lines is coupled to the DRAM cell. A sense amplifier with a single-ended read path reads data in the DRAM cell through only one of the bit lines and a data-dependent write-back path writes back data to the DRAM cell through either one of the bit lines. The bit line used by the sense amplifier to write back the data to the DRAM cell depends on the logical value of the data.

Abstract: To supply a signal in which the occurrence of delays is prevented to a storage circuit. To provide a novel semiconductor device in which a load applied to a logic circuit is low. The following structure is completed: a storage circuit to which a plurality of data signals and a selection signal are supplied connects two combination circuits, and a storage circuit has a function of selecting one of a plurality of data signals in accordance with the selection signal. A selection circuit is not necessarily provided between the storage circuit and the combination circuit. As a result, the combination circuit can supply a signal in which the occurrence of delays is prevented to the storage circuit.

Abstract: Semiconductor memory having both volatile and non-volatile modes and methods of operation. A semiconductor storage device includes a plurality of memory cells each having a floating body for storing, reading and writing data as volatile memory. The device includes a floating gate or trapping layer for storing data as non-volatile memory, the device operating as volatile memory when power is applied to the device, and the device storing data from the volatile memory as non-volatile memory when power to the device is interrupted.

Abstract: A memory device which can keep a stored logic state even when the power is off is provided. A signal processing circuit including the memory device, which achieves low power consumption by stopping supply of power, is provided. A memory device includes a logic circuit including a first node and a second node, a first memory circuit connected to the first node, a second memory circuit connected to the second node, and a precharge circuit connected to the first node, the second node, the first memory circuit, and the second memory circuit. When reading data is performed, the precharge circuit outputs a precharge potential to the first node and the second node. The first memory circuit and the second memory circuit each include a transistor in which a channel is formed in an oxide semiconductor film.

Abstract: A memory cell includes a metal oxide semiconductor (MOS) capacitor including a gate coupled to a storage node and an electrode coupled to a synchronization control line. The MOS capacitor adds a coupling voltage to the gate based on a change in voltage on the synchronization control line. The coupling voltage may maintain the storage node within a predetermined range.

Abstract: A memcapacitor device includes a memcapacitive matrix interposed between a first electrode and a second electrode. The memcapacitive matrix includes deep level dopants having a first decay time constant and shallow level dopants having a second decay time constant. The second decay time constant is substantially shorter than the first decay time constant. The capacitance of the memcapacitor device depends upon an initial voltage applied across the memcapacitive matrix and a time dependent change in capacitance of the memcapacitor device depends upon the first decay time constant. A method for forming a memcapacitive device is also provided.

Abstract: The capacitance of a capacitor that is required in a DRAM is reduced, whereby a highly integrated DRAM is provided. In a divided bit line type DRAM, a sub bit line is formed below a word line and a bit line is formed above the word line. The parasitic capacitance of the sub bit line is reduced by employing the divided bit line method, and further, the off resistance of a cell transistor is set high according to need; thus, the capacitance can be one tenth or less of that of a conventional DRAM. Accordingly, even when a stacked capacitor is employed, the height of the capacitor can be one tenth or less of that of a conventional one, so that a bit line can be easily provided thereover. Further, by devising a structure of the cell transistor, the area per memory cell can be reduced to 4 F2.

Abstract: A high density, low voltage, and low-power one time programmable (OTP) memory is based on core cells with a one transistor design. A CLEAN pulse is directed to a single shunt device at the output of the column decoder so spurious charges that may have been stored in the floating nodes can be cleaned up. Such arrangement also allows for the simultaneous initialization of bit lines, data lines, and sensing lines to zero. Core area layout size is substantially reduced, and operational power requirements are exceeding low making these particularly suitable in HF and UHF RFID applications.

Abstract: A semiconductor device has a non-volatile memory cell including a write transistor which includes an oxide semiconductor and has small leakage current in an off state between a source and a drain, a read transistor including a semiconductor material different from that of the write transistor, and a capacitor. Data is written or rewritten to the memory cell by turning on the write transistor and applying a potential to a node where one of a source electrode and drain electrode of the write transistor, one electrode of the capacitor, and a gate electrode of the read transistor are electrically connected to one another, and then turning off the write transistor so that the predetermined amount of charge is held in the node.

Abstract: A system for charging a low voltage power domain in a low power DRAM includes: a first capacitor, for providing a local domain power voltage supply; a first transistor, coupled to the first capacitor and a voltage supply and turned on by a powerdown signal, the first transistor for decoupling the first capacitor during powerdown mode, and charging the capacitor to provide the local domain power voltage supply when exiting powerdown mode; a second capacitor selectively coupled to the voltage supply or the local domain voltage power supply; and a second transistor, coupled to the second capacitor, the powerdown signal, and the local domain power voltage supply, for decoupling the second capacitor from the local domain power voltage supply during powerdown mode and coupling the second capacitor to the local domain power voltage supply when exiting powerdown mode.

Abstract: A multi-level dynamic random-access memory (MLDRAM) represents an original bit combination of more than one bit using a cell voltage stored in a single memory cell. The cell voltage is in one of a number of discrete analog voltage ranges each corresponding to a respective one of the possible values of the bit combination. In reading a selected memory cell, stored charge is conveyed via a local bitline to a preamplifier. The preamplifier amplifies the signal on the local bitline and drives a global bitline with an analog signal representative of the stored voltage. A digitizer converts the analog signal on the global bitline into a read bit combination. The read bit combination is then moved to a data cache over the global bitline. The data cache writes an analog voltage back to the memory cell to write a new value or restore data destroyed in reading the cell.

Abstract: The present invention provides a memory circuit in which, while the power is not supplied, a data signal that has been held in a memory section corresponding to a volatile memory can be held in a capacitor in a memory section corresponding to a nonvolatile memory. In the nonvolatile memory section, a transistor whose channel is formed in an oxide semiconductor layer allows a signal to be held in the capacitor for a long period. Thus, the memory circuit can hold a logic state (data signal) even while the power supply is stopped. A potential applied to a gate of the transistor whose channel is formed in an oxide semiconductor layer is raised by a booster circuit provided between a wiring for carrying power supply potential and the gate of the transistor, allowing a data signal to be held even by one power supply potential without malfunction.

Abstract: A semiconductor device in which stored data can be held even when power is not supplied and there is no limitation on the number of writing operations is provided. A semiconductor device is formed using a material which can sufficiently reduce the off-state current of a transistor, such as an oxide semiconductor material that is a wide-gap semiconductor. When a semiconductor material which can sufficiently reduce the off-state current of a transistor is used, the semiconductor device can hold data for a long period. In addition, by providing a capacitor or a noise removal circuit electrically connected to a write word line, a signal such as a short pulse or a noise input to a memory cell can be reduced or removed. Accordingly, a malfunction in which data written into the memory cell is erased when a transistor in the memory cell is instantaneously turned on can be prevented.

Abstract: An apparatus is disclosed for a memory cell having a floating body. A memory cell may include a transistor over an insulation layer, the transistor including a source, and a drain. The memory cell may also include a floating body including a first region positioned between the source and the drain, a second region positioned remote from each of the source and drain, and a passage extending through the insulation layer and coupling the first region to the second region. Additionally, the memory cell may include a bias gate at least partially surrounding the second region and configured for operably coupling to a bias voltage. Furthermore, the memory cell may include a plurality of dielectric layers, wherein each outer vertical surface of the second region has a dielectric layer of the plurality adjacent thereto.

Abstract: When the threshold voltage Vth of the transistor in the memory cell is within the allowable range is determined, a memory cell which does not have sufficient data retention characteristics is eliminated. In order to eliminate such a memory cell, the potential of a gate of the transistor is kept at an appropriate potential VGM and the potential of a drain of the transistor is set higher than or equal to VGM. When data is written to the memory cell in this state, the potential of a source of the transistor is expressed as a formula including the threshold voltage Vth, (VGM?Vth). By comparison between the level of the potential and the level of a reference potential, whether the threshold voltage Vth is within the allowable range can be determined.

Abstract: A ferroelectric memory having a plurality of ferroelectric memory cells, each ferroelectric memory cell including a ferroelectric capacitor is disclosed. The ferroelectric memory includes read and write lines and a plurality of ferroelectric memory cell select buses, one select bus corresponding to each of the ferroelectric memory cells. Each of the ferroelectric memory cells includes first and second gates for connecting the ferroelectric memory cell to the read line and the write line, respectively, in response to signals on the ferroelectric memory cell select bus corresponding to that ferroelectric memory cell. A write circuit causes a charge to be stored in the ferroelectric capacitor of the ferroelectric memory cell currently connected to the write line, the charge having a value determined by a data value having at least three states.

Abstract: A memory system includes a plurality of memory cells. Each memory cell includes a first storage cell including a first capacitor configured to store a first analog charge representing a first Boolean value, a second storage cell including a second capacitor configured to store a second analog charge representing a second Boolean value, and a charging path configured to apply, for a first time duration, a voltage to the first capacitor or the second capacitor during a write operation. Each memory cell includes a voltage comparator configured to output a Boolean value based upon a comparison of the first analog charge and the second analog charge during a read operation.

Abstract: A non-volatile memory cell with high bit density is disclosed. Embodiments include: providing a transistor having a wordline gate structure over a substrate, first and second floating gate structures proximate opposite sides of the wordline gate structure, and first and second diffusion regions in the substrate, wherein the wordline gate structure, the first floating gate structure, and the second floating gate structure are laterally between the first and second diffusion regions; and providing a capacitor having first, second, and third control gate structures over the substrate, a third floating gate structure between the first and second control gate structures, a fourth floating gate structure between the second and third control gate structures, and third and fourth diffusion regions in the substrate, wherein the first, second, and third control gate structures are laterally between the third and fourth diffusion regions.

Abstract: A semiconductor memory device including a plurality of memory blocks each including a first command generating circuit which generates a first command; a control circuit which controls the memory core based on the first command or based on a second command inputted via the input/output port; and an arbitration circuit which outputs a first delay signal to the control circuit of one memory block of the plurality of memory blocks, the first delay signal which delays a start of an execution of the first command, in a first case when the first command generated by the first command generating circuit of the one memory block and the second command inputted via the input/output port of another memory block of the plurality of memory blocks are overlapped.

Abstract: A semiconductor integrated circuit according to one aspect of the present invention may includes a plurality of driving circuits to drive a respective plurality of word lines with either a first voltage supplied from a first power supply or a second voltage supplied from a second power supply in accordance with a control signal, and a plurality of gate transistors in each of which a gate is connected to one of the plurality of word lines, and a connection state between a storage node and a bit line is changed based on the voltage provided to the word line connected to the gate. In the semiconductor integrated circuit, a gate oxide film of each of the plurality of gate transistors is thinner than a gate oxide film of each of transistors constituting the plurality of driving circuits.