Gas Patents (Class 372/55)
  • Patent number: 7480323
    Abstract: A laser device is provided. The laser device includes a laser tube, oscillator circuitry, and a compensating reactive component that is arranged in parallel with the laser tube.
    Type: Grant
    Filed: May 17, 2007
    Date of Patent: January 20, 2009
    Assignee: Synrad, Inc.
    Inventor: Michael W. Murray
  • Publication number: 20090016393
    Abstract: It is an object to provide a laser apparatus, a laser irradiating method and a manufacturing method of a semiconductor device that make laser energy more stable. To attain the object, a part of laser beam emitted from an oscillator is sampled to generate an electric signal that contains as data energy fluctuation of a laser beam. The electric signal is subjected to signal processing to calculate the frequency, amplitude, and phase of the energy fluctuation of the laser beam.
    Type: Application
    Filed: December 18, 2007
    Publication date: January 15, 2009
    Applicant: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Hidekazu Miyairi, Akihisa Shimomura, Tamae Takano, Masaki Koyama, Koichiro Tanaka
  • Patent number: 7471708
    Abstract: A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loop; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: December 30, 2008
    Assignee: Cymer, Inc.
    Inventors: Herve A. Besaucele, Igor V. Fomenkov, William N. Partlo, Fedor B. Trintchouk, Hao Ton That
  • Patent number: 7469000
    Abstract: Gas lasers including nanoscale catalysts and methods for producing such lasers are disclosed herein. In one embodiment, a gas laser includes a gas containment structure having a gas discharge region and a laser gas medium in the gas discharge region. The gas laser also includes a plurality of optical elements spaced apart from each other at opposite ends of the gas discharge region to form a laser resonator. The gas laser further includes a nanoscale catalyst proximate to and in communication with the gas discharge region to modify oxidation and/or decomposition processes of selected components of the laser gas medium. In one embodiment, the nanoscale catalyst can include a metal-oxide support substrate carrying a plurality of nanoscale particulates. The nanoscale particulates can be composed of one or more of the following: gold, silver, or platinum, and have an average size of about 1-50 nm.
    Type: Grant
    Filed: November 22, 2006
    Date of Patent: December 23, 2008
    Assignee: Universal Laser Systems, Inc.
    Inventors: Yefim P. Sukhman, Vladimir M. Cherezov, Patrick R. Thornton, Stefano J. Noto
  • Publication number: 20080291962
    Abstract: Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.
    Type: Application
    Filed: July 9, 2008
    Publication date: November 27, 2008
    Inventors: Sergei V. Govorkov, Alexander O.W. Weissner, Timur V. Misyuryaev, Alexander Jacobson, Gongxue Hua, Rainer Paetzel, Thomas Schroeder, Hans-Stephan Albrecht
  • Publication number: 20080285613
    Abstract: A Colpitts oscillator that includes an RF-excited gas discharge laser tube as the feedback pi-network of the Colpitts oscillator.
    Type: Application
    Filed: May 17, 2007
    Publication date: November 20, 2008
    Applicant: Synrad, Inc.
    Inventor: Michael W. Murray
  • Patent number: 7453918
    Abstract: An improved laser system includes a sealed-off, RF excited, diffusion cooled, high pressure, short pulsed, high peak power waveguide and slab CO2 laser that avoids problems typically associated with obtaining a diffused discharge at high gas pressures, without arcing and without corona, while maintaining the unsaturated gain and gas temperature experienced at low pressures and scaling to higher pressures. Such a system has a long operating life-time, and is capable of operation at high gas pressures to obtain relative fast rise and fall time pulses. The system emits relatively short pulse widths, with pulse energies up to and exceeding 30 mJ, with reasonably high pulse repetition rates. The system also has a low pulsed RF power duty cycle, thereby enabling the generation of high peak power pulses, as well as reasonable average power and reasonably high peak powers.
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: November 18, 2008
    Assignee: Coherent, Inc.
    Inventors: Lanny Laughman, Vernon Seguin, Peter P. Chenausky, Robert Henschke, Eric R. Mueller
  • Patent number: 7453917
    Abstract: A continuous wave laser based on the electronic I*(2P½)?I(2P 3/2) transition of atomic iodine at 1.315 microns from the NCl(a1?)+I(2P 3/2) energy transfer reaction using a transverse flow device having gas flow from an upstream subsonic combustor section through a converging-diverging supersonic slit nozzle to a downstream supersonic section and an intersecting optical resonator. Laser operation is achieved through the transformation of the gas phase chemical reagents, D2 (deuterium), F2 (fluorine), NF3 (nitrogen trifluoride), DCl (deuterium chloride) HI (hydrogen iodide) in the subsonic section and HN3 (hydrogen azide) in the supersonic section.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: November 18, 2008
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Christopher B. Cooper, Gerald C. Manke, Gordon D. Hager, Timothy J. Madden
  • Patent number: 7447249
    Abstract: A lighting system includes a microwave resonator (2) for generating a standing microwave in the internal space, and a gas cell (6) enclosing a medium is disposed in the internal space of the microwave resonator 2. The lighting system excites the medium in the gas cell (6) by the standing microwave to generate light. The gas cell (6) is replaceably mounted on the microwave resonator (2). The generated light is output to the outside of the microwave resonator (2) through a light lead-out hole (26). Thereby, it is possible to provide a lighting system (including a gas laser) capable of emitting light efficiently with a compact and inexpensive device configuration and of achieving a long life. Moreover, it can also be used as a lighting system in the THz-wave region by enclosing the medium for generating light in the far-infrared region in the gas cell (6).
    Type: Grant
    Filed: August 14, 2006
    Date of Patent: November 4, 2008
    Assignee: Stanley Electric Co., Ltd.
    Inventors: Takahiro Matsumoto, Masayuki Kanechika
  • Publication number: 20080267241
    Abstract: An apparatus/method which may comprise: a very high power line narrowed lithography laser light source which may comprise: a solid state seed laser system which may comprise: a pre-seed laser providing a pre-seed laser output; a fiber amplifier receiving the pre-seed laser output and providing an amplified seed laser pulse which may comprise: a pulse having a nominal wavelength outside of the DUV range; a frequency converter converting to essentially the wavelength of the amplifier gain medium; a first and a second gas discharge laser amplifier gain medium operating at different repetition rates from that of the seed laser output; a beam divider providing the amplifier gain mediums with output pulses from the seed laser; a beam combiner combining the outputs of each respective amplifier gain medium to provide a laser output light pulse beam having the pulse repetition rate of the solid state seed laser system.
    Type: Application
    Filed: October 31, 2007
    Publication date: October 30, 2008
    Applicant: Cymer, Inc.
    Inventors: Daniel J.W. Brown, William N. Partlo, Richard L. Sandstrom
  • Patent number: 7439530
    Abstract: An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 ?m at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: October 21, 2008
    Assignee: Cymer, Inc.
    Inventors: Alexander I. Ershov, Alexander N. Bykanov, Oleh Khodykin, Igor V. Fomenkov
  • Patent number: 7436872
    Abstract: A high-frequency discharge excited gas laser oscillator receiving power from a laser power supply controlled by a pulse command, the high-frequency discharge excited gas laser oscillator provided with a power detecting section for detecting supply power from the laser power supply to a discharge tube and a pulse command control section positioned at an upstream side of the laser power supply, comparing an allowable upper limit value of supply power found from a relationship between a discharge tube temperature and supply power and an actual supply power detected by the power detecting section, stopping the pulse command value to the discharge tube when the supply power is higher than the allowable upper limit value, and setting a pulse command value based on the allowable upper limit value.
    Type: Grant
    Filed: August 24, 2006
    Date of Patent: October 14, 2008
    Assignee: Fanuc Ltd
    Inventors: Akira Egawa, Minoru Ando, Hajime Ikemoto
  • Publication number: 20080232408
    Abstract: According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.
    Type: Application
    Filed: April 9, 2008
    Publication date: September 25, 2008
    Applicant: CYMER, INC.
    Inventors: Kevin M. O'Brien, Robert N. Jacques
  • Patent number: 7426229
    Abstract: A line narrowing module includes an elliptical mirror, a diffraction grating disposed at a first focus of the mirror for separating an incident beam into different lines, and a laser beam dispersion and extraction unit. The laser beam dispersion and extraction unit disperses incident laser over the diffraction grating and selectively extract from the resulting lines a laser beam having a desired narrowed bandwidth. A light source that employs the line narrowing module also includes a laser oscillator for generating the beam, and a light returning unit that returns one fraction of the beam extracted from the laser oscillator back to the laser oscillator. Another fraction of the beam is extracted from the laser oscillator through a front window of the laser oscillator, and undergoes line narrowing in the module. The laser beam having the narrowed bandwidth is immediately output as the exposure light from the module.
    Type: Grant
    Filed: June 2, 2006
    Date of Patent: September 16, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jang-Sun Kim
  • Publication number: 20080219317
    Abstract: A gas-purged laser system and method of gas-purging a laser system are disclosed. One embodiment of the laser system comprises an excimer refractive surgical laser system having a laser beam optical path configured to allow purging of a portion of a volume enclosing the laser beam optical path with a gas, and a gas generator, operable to generate the purging gas and provide the gas to the volume portion. The portion of the volume can be the entire volume enclosing the laser beam optical path or a selected portion thereof. The gas can be nitrogen gas and the gas generator can be a self-contained nitrogen generator as will be known to those having skill in the art. Embodiments can further comprise a controller for controlling the flow of purging gas in response to received signals representative of various parameters, such as temperature, oxygen level, pressure, humidity and flow rate.
    Type: Application
    Filed: March 4, 2008
    Publication date: September 11, 2008
    Inventors: George H. Pettit, George Richard Downes, Steven E. Bott
  • Publication number: 20080210545
    Abstract: In producing discharges in a load element such as a magnetron sputtering device, electric pulses are provided from different electric pulse sources, e.g. three or more electric pulse sources. The pulse sources are controlled by a control and monitoring unit to give the element electric pulses different heights and start and end times. The element electric pulses are summed, such as by connecting the pulse sources in parallel to the load, to form resulting, relatively long electric pulses. Each of the resulting electric pulses can have a portion that has a substantially constant level and then the substantially constant level is formed from at least two element electric pulses having the same pulse height. The resulting electric pulses are applied to electrodes in the load. The element electric pulses can have the same polarity such as being half a period of a sinusoid oscillation of a single frequency.
    Type: Application
    Filed: November 2, 2005
    Publication date: September 4, 2008
    Inventor: Vladimir Kouznetsov
  • Publication number: 20080205475
    Abstract: Through the use of a relatively inexpensive third mirror on a novel folded hybrid unstable resonator configuration, the optimum output coupling for a given laser design can be explored quickly and easily with a minimum of intracavity mirror alignment. No changes in either the radii of curvature of the three cavity optics or their spacing are required for this exploration. In addition to providing techniques for purposefully and systematically introducing mirror edge effects or avoiding edges effects altogether, the invention provides that output beams of different width can be advantageously explored in a relatively simple and straightforward manner. The invention provides that higher geometric magnification cavity designs may be made compatible with low diffraction output coupling in a configuration that uses only three totally reflecting optics.
    Type: Application
    Filed: February 19, 2008
    Publication date: August 28, 2008
    Inventors: Peter P. Chenausky, Lanny Laughman, Eric R. Mueller, Leon A. Newman, Vernon A. Seguin, Christian J. Shackleton
  • Patent number: 7418022
    Abstract: Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplification bandwidth of the power oscillator is relatively broad compared to that of the output of the master oscillator, but narrower than would be the case without the bandwidth limiting arrangements. The bandwidth narrowing arrangements of the power oscillator function primarily to restrict the bandwidth of amplified spontaneous emission generated by the power oscillator.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: August 26, 2008
    Assignee: Coherent, Inc.
    Inventors: Sergei V. Govorkov, Alexander O. W. Wiessner, Timur V. Misyuryaev, Alexander Jacobson, Gongxue Hua, Rainer Paetzel, Thomas Schroeder, Hans-Stephan Albrecht
  • Patent number: 7415056
    Abstract: A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse along a laser system output pulse optical axis and diverting a portion of the output pulse into an optical delay having an optical delay path and which may comprise a plurality of confocal resonators in series aligned to deliver an output of the optical delay to the laser output pulse optical delay initiating optic; an optical axis alignment mechanism comprising an radial mirror positioning mechanism operable to position the output of the optical delay to the align with the portion of the laser output pulse transmitted along the optical axis of the portion of the laser system output pulse transmitted by the laser output pulse optical delay initiating optic.
    Type: Grant
    Filed: March 31, 2006
    Date of Patent: August 19, 2008
    Assignee: Cymer, Inc.
    Inventors: Palash P. Das, Thomas Hofmann, Gang Lei
  • Patent number: 7411989
    Abstract: A CO2 laser has a resonator mirror that oscillates about an axis perpendicular to the resonator axis through an angular range of oscillation sufficient that the resonator is only able to deliver radiation for a fraction of an oscillation period of the mirror. In one example of the laser, the oscillating mirror is an end-mirror of the resonator. In another example, the oscillating mirror is a fold mirror of the resonator.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: August 12, 2008
    Assignee: Coherent, Inc.
    Inventors: Luis A. Spinelli, Anthony J. DeMaria, Vernon Seguin
  • Patent number: 7397828
    Abstract: A laser system comprises a reflective chamber capable of housing a laser medium and at least two laser diodes emitting light at different respective wavelengths into the reflective chamber. The wavelength of each respective laser diode may be selected to minimize fluctuations in absorption by the laser medium of light emitted by the diode bars as the wavelength of each respective laser diode changes due to changes in an operating temperature of the laser system. The wavelength of each respective laser diode may be selected such that absorption by the laser medium of the wavelength of light emitted by one laser diode increases and absorption by the laser medium of the wavelength of light emitted by another laser diode decreases as the operating temperature changes within a predefined range.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: July 8, 2008
    Assignee: Northrop Grumman Corporation
    Inventors: Christopher M. DePriest, Mark A. Decker, Matthew D. Hawk, Steven J. Lindauer, Laurance S. Lingvay, Gary D. Ross, Douglas P. Stanley
  • Publication number: 20080130700
    Abstract: A laser arrangement exhibits a laser rod or a laser tube (3) as well as a high-voltage connection (19) for generating the laser beam. This laser arrangement has, in addition to the high-voltage connection, at least one electromagnetic radiation source (25) in the region of the laser rod or laser tube, which is provided for initiating the laser. The laser exhibits the special function that it can be initiated by means of additional radiation source. Essential features are: initiation by action of external electromagnetic radiation source, for example light, x-rays, microwaves or other electromagnetic waves. What is more, the laser exhibits the special feature that in the case of a so-called mixed-light, white-light or mixed-frequency laser or maser, what is emitted in the emission of the laser or also maser is not the full spectrum but only the radiation excited by the additional radiation source.
    Type: Application
    Filed: April 30, 2007
    Publication date: June 5, 2008
    Inventors: Patrick Linder, Adrian Haldimann
  • Publication number: 20080130701
    Abstract: A gas discharge laser apparatus is disclosed. In an embodiment, the gas discharge laser apparatus includes a gas laser provided with a discharge chamber, and a gas storage chamber in controllable fluid communication with the discharge chamber via a valve member, the gas storage chamber configured to have a pressure lower therein than in the discharge chamber such that, when the valve member is controlled to bring the gas storage chamber into fluid communication with the discharge chamber, gas is removed from the discharge chamber.
    Type: Application
    Filed: December 5, 2006
    Publication date: June 5, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Mayk Van Den Hurk
  • Patent number: 7382815
    Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.
    Type: Grant
    Filed: August 9, 2004
    Date of Patent: June 3, 2008
    Assignee: Cymer, Inc.
    Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
  • Publication number: 20080123712
    Abstract: Low concentrations of water vapor in a gas stream can be detected and quantified using absorption spectroscopy in the infrared spectral region. Absorption spectra can recorded using tunable diode lasers as the light source. Modulation of the laser signal and demodulation of the resultant detector response yields dependable measurements that may be conducted with very little maintenance in demanding environments.
    Type: Application
    Filed: June 14, 2007
    Publication date: May 29, 2008
    Inventors: Xin Zhou, Gregory M. Sanger
  • Patent number: 7379487
    Abstract: A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant.
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: May 27, 2008
    Assignee: Neumann Information Systems, Inc.
    Inventors: William Edward McDermott, David Kurt Neumann, Thomas Lee Henshaw
  • Patent number: 7372887
    Abstract: To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the laser gas in the laser chamber is partially exchanged in a gas exchange quantity that maintains the quantity of impurities in the laser chamber at or below a fixed level. Also, the gas exchange quantity is obtained using the total quantity of output light energy reduction A, the total gas pressure in the laser chamber P, and output light energy reduction quantity per unit time k, for the case where partial gas exchange is repeated infinitely in the laser chamber.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: May 13, 2008
    Assignees: Komatsu Ltd., Ushio Inc.
    Inventors: Takashi Matsunaga, Toru Abe
  • Patent number: 7369596
    Abstract: A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.
    Type: Grant
    Filed: June 5, 2006
    Date of Patent: May 6, 2008
    Assignee: Cymer, Inc.
    Inventors: Thomas D Steiger, William N. Partlo
  • Publication number: 20080101430
    Abstract: An RF excited gas laser including an offset V-shaped laser cavity. The laser includes a first and second ceramic body portions with the laser cavity at least partially defined by the ceramic body portions. At least one internal gas reservoir is also at least partially defined by the first and second body portions, with the internal gas reservoir being in gas communication with laser cavity by way of at least one gas communication slot. The RF laser further includes at least two electrode slots formed in the exterior of the ceramic body portions and an electrode at least partially received in the electrode slots.
    Type: Application
    Filed: January 3, 2006
    Publication date: May 1, 2008
    Inventor: Clifford Morrow
  • Patent number: 7366213
    Abstract: The relative timing delay between channels of a discharge circuit can be adjusted through application of appropriate control voltages. A control voltage of relatively long duration and relatively small voltage, with respect to a common system pulse, can be applied to any channel in order to adjust the relative timing delay. This control voltage can be, for example, a magnetization pre-pulse voltage applied to an indictor for a channel in order to adjust a hold-off time. A synchronization control unit and feedback loop can be used to monitor the timing, such that the syncronization control unit can apply a control voltage when a delay change exceeds a timing adjustment threshold value, and can apply a pre-ionization voltage when the delay change is less than the adjustment threshold value. Using both a control voltage and a pre-ionization voltage provides for both coarse and fine adjustment of the delay.
    Type: Grant
    Filed: May 17, 2004
    Date of Patent: April 29, 2008
    Assignee: Lambda Physik AG
    Inventors: Sergei V. Govorkov, Andriy N. Knysh, Alexander O. Wiessner
  • Patent number: 7366219
    Abstract: A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive center wavelength selection optic moveably mounted within an optical path of the line narrowing module, selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on the dispersive wavelength selection optic; a first tuning mechanism operative in part to select the angle of incidence of the laser light pulse beam containing the respective pulse upon the dispersive center wavelength selection optic, by selecting an angle of transmission of the laser light pulse beam containing the pulse toward the dispersive center wavelength selection optic; a second tuning mechanism operative in part to select the angle of incidence of the laser light pu
    Type: Grant
    Filed: November 30, 2004
    Date of Patent: April 29, 2008
    Assignee: Cymer, Inc.
    Inventors: J. Martin Algots, Robert A. Bergstedt, Walter D. Gillespie, Vladimir A. Kulgeyko, William N. Partlo, German E. Rylov, Richard L. Sandstrom, Brian Strate, Timothy S. Dyer
  • Patent number: 7346093
    Abstract: A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
    Type: Grant
    Filed: March 23, 2004
    Date of Patent: March 18, 2008
    Assignee: Cymer, Inc.
    Inventors: Richard L. Sandstrom, John Martin Algots, Joshua C. Brown, Raymond F. Cybulski, John Dunlop, James K. Howey, Richard G. Morton, Xiaojiang Pan, William N. Partlo, Firas F. Putris, Tom A. Watson, Thomas A. Yager
  • Patent number: 7342948
    Abstract: In an laser oscillator (100), a blower (10, 20, 120) for circulating a laser medium between an electric discharge tube (102) and a circulating passage (104) includes: a casing (12) having a suction port (12a) and an exhaust port (12b); and a blade (18) pivotally supported in the casing (12) so that the blade (18) can face the suction port (12a) and the exhaust port (12b). The blade (18) is formed into a shape in which a diameter of the blade (18) is different at a position on a cross section perpendicular to a rotary central line (O), and a gap (Go) between a portion, in which a diameter of the blade (18) is relatively large, and the casing is larger than a gap (Gi) between a portion, in which a diameter of the blade (18) is relatively small, and the casing. Due to the foregoing, a highly reliable blower used for a laser oscillator, the reduction of the blower efficiency of which is suppressed to be as small as possible, can be provided.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: March 11, 2008
    Assignee: Fanuc Ltd
    Inventors: Kazuya Ohta, Michinori Maeda, Akira Egawa
  • Patent number: 7339972
    Abstract: An apparatus includes a gas chamber comprising a gas feed nozzle, an exhaust nozzle, and a window. The apparatus also includes a first partial reflector, in the gas chamber, sharing an optical path with the exhaust nozzle, and the window. Optionally, The apparatus includes a gas source communicating with the gas feed nozzle. Optionally, the gas source includes a gas having an ionization potential higher than air and a nonlinear index of refraction lower than air.
    Type: Grant
    Filed: June 27, 2005
    Date of Patent: March 4, 2008
    Assignee: United States of America as represented by the Secretary of the Navy
    Inventors: Daniel Gordon, Antonio Ting, Eldridge Briscoe
  • Patent number: 7339973
    Abstract: Fluorine gas discharge laser electrodes and electrode systems that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition electrodes may comprise a first discharge shaping magnet mounted in a first elongated gas discharge electrode and a second discharge shaping magnet mounted in a second elongated gas discharge electrode. Also is an electrode may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the electrode and a pair of elongated high erosion regions on either side of the crown comprising a second material with a relatively higher erosion rate during gas discharge than that of the first material.
    Type: Grant
    Filed: September 26, 2003
    Date of Patent: March 4, 2008
    Assignee: Cymer, Inc.
    Inventors: Richard G. Morton, Bryan Moosman, Timothy S. Dyer, James A. Carmichael, Jiping Zhang
  • Publication number: 20080019411
    Abstract: An excimer laser is disclosed in which a gas-discharge is formed for exciting an excimer-forming lasing-gas mixture. The gas discharge is formed between an elongated anode electrode and a elongated cathode electrode. The anode is in contact with a dielectric surface and the cathode is supported above the dielectric surface, laterally spaced from and parallel to the anode. The gas-discharge has a surface-discharge or sliding discharge portion extending from the anode over the dielectric surface, and a volume-discharge portion connecting the sliding-discharge portion to the cathode. The volume-discharge excites the lasing-gas mixture. A laser resonator is arranged to generate laser radiation from the excited gas mixture. The sliding-discharge has homogeneous, stable characteristics that are inherited by the volume-discharge. An ion-wind generator provides circulation of the lasing-gas mixture through the volume-discharge.
    Type: Application
    Filed: July 20, 2006
    Publication date: January 24, 2008
    Inventors: Norbert Niemoeller, Igor Bragin, Rainer Paetzel, Rustem Osmanow, Juergen Witt
  • Patent number: 7321607
    Abstract: A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an first optical element sensitive to chamber vibration positioned at a first end of the laser chamber mounted on the mounting table; the laser chamber support structure being without connection to the first optical element. The apparatus and method may also comprise a second optical element sensitive to chamber vibration positioned at the second end of the laser chamber mounted on the mounting table; the laser chamber support structure being without connection to the second optical element. The first optical element may comprise a line narrowing optical arrangement and the second optical element comprising an output coupler.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: January 22, 2008
    Assignee: Cymer, Inc.
    Inventor: David DiSorbo
  • Publication number: 20080002751
    Abstract: A thin film polarizer (TFP) and a half-wave CdTe electro-optical crystal are utilized to achieve a higher damage threshold in Q-switching CO2 lasers for material processing applications. Half-wave CdTe electro-optical modulators can be used without the arcing and corona problems typically associated with the higher drive voltage by placing low dielectric constant insulators (such as BeO) around the CdTe crystal. Doubling the voltage placed across a CdTe crystal enables the crystal to function as a half-wave phase retarder EO switch with the same dimensions as a crystal functioning as a quarter-wave EO modulator. These half-wave EO switches can be used with TFPs to shape the output pulses, as well as to direct alternate pulses of repetitively pulsed super pulsed slab lasers to alternate scanners, thereby doubling the output of laser hole drilling systems.
    Type: Application
    Filed: July 6, 2006
    Publication date: January 3, 2008
    Inventors: Gongxue Hua, Vernon Seguin, Leon A. Newman, Eric R. Mueller
  • Patent number: 7315561
    Abstract: Flow laminators are attached to gas introducing parts installed in a laser generator preventing impurities from attaching to surfaces of a translucent mirror and a condensing lens. The flow laminators prevent airflow from producing a turbulent flow and air on the surface of the mirror and the lens are cleaned up, therewith reducing attachment of impurities further.
    Type: Grant
    Filed: November 16, 2004
    Date of Patent: January 1, 2008
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Nobuyuki Haji, Satoshi Eguchi, Atsuki Yamamoto, Nobuo Shinno
  • Patent number: 7308013
    Abstract: A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
    Type: Grant
    Filed: November 3, 2003
    Date of Patent: December 11, 2007
    Assignee: Lambda Physik AG
    Inventors: Dirk Basting, Sergei Govorkov, Rainer Paetzel, Igor Bragin, Andreas Targsdorf
  • Publication number: 20070280323
    Abstract: A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.
    Type: Application
    Filed: June 5, 2006
    Publication date: December 6, 2007
    Applicant: Cymer, Inc.
    Inventors: Thomas D. Steiger, William N. Partlo
  • Publication number: 20070274363
    Abstract: A gas discharge laser includes elongated discharge electrodes having an active surface width that varies along the length of the resonator. In one example each of the electrodes is formed by a row of pins having a circular active surface. The pins are diametrically aligned with the active surfaces generally coplanar.
    Type: Application
    Filed: May 21, 2007
    Publication date: November 29, 2007
    Inventors: Igor Bragin, Vadim Berger
  • Patent number: 7301980
    Abstract: A gas discharge laser includes a laser chamber containing a halogen laser gas, two electrode elements defining a cathode and an anode, each having a discharge receiving region defining two longitudinal edges and having a region width defining a width of an electric discharge between the electrode elements in the laser gas. The anode comprising a first anode portion comprising a first anode material defining a first anode material erosion rate, located entirely within the discharge receiving region, a pair of second anode portions comprising a second anode material defining a second anode material erosion rate, respectively located on each side of the first anode portion and at least partially within the discharge receiving region; an electrode center base portion integral with the first anode portion; and wherein each of the respective pair of second anode portions is mechanically bonded to the center base portion.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: November 27, 2007
    Assignee: Cymer, Inc.
    Inventors: Thomas D. Steiger, Richard C. Ujazdowski, Timothy S. Dyer, Thomas P. Duffey, Walter D. Gillespie, Bryan G. Moosman, Richard G. Morton, Brian D. Strate
  • Patent number: 7298770
    Abstract: An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond.
    Type: Grant
    Filed: August 5, 2004
    Date of Patent: November 20, 2007
    Assignee: Cymer, Inc.
    Inventors: Ronald L. Spangler, Jacob P. Lipcon, John A. Rule, Robert N. Jacques, Armen Kroyan, Ivan Lalovic, Igor V. Fomenkov, John M. Algots
  • Patent number: 7295591
    Abstract: A long pulse pulse power system for gas discharge lasers. The system includes a sustainer capacitor for accepting a charge from a high voltage pulse power source. A peaking capacitor with a capacitance value of less than half the sustainer capacitance provides the high voltage for the laser discharge.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: November 13, 2007
    Assignee: Cymer, Inc.
    Inventors: Thomas Hofmann, Bruce D. Johanson
  • Patent number: 7292616
    Abstract: Systems and methods for stabilizing a CO2 laser are disclosed. The system includes a detector unit for measuring the power in a select portion of the output beam. The detector unit generates an electrical signal corresponding to the measured power. The modulation frequency of the signal used to modulate the relatively high-frequency radio-frequency (RF) pump signal is filtered from the electrical signal. The filtered electrical signal is then compared to a desired value for the output power in the output beam. Based on the comparison, a modulation control signal for modulating the RF pump signal is formed. The modulation control signal has a varying duty cycle that varies the amount of laser pump power to reduce or eliminate the measured variations in the output beam power. The result is an output beam power that remains stable over time.
    Type: Grant
    Filed: February 9, 2005
    Date of Patent: November 6, 2007
    Assignee: Ultratech, Inc.
    Inventors: Boris Grek, Michael Weitzel, Igor Landau
  • Patent number: 7286575
    Abstract: A method and apparatus is provided for producing near-diffraction-limited laser light, or amplifying near-diffraction-limited light, in diode pumped alkali vapor photonic-band-gap fiber lasers or amplifiers. Laser light is both substantially generated and propagated in an alkali gas instead of a solid, allowing the nonlinear and damage limitations of conventional solid core fibers to be circumvented. Alkali vapor is introduced into the center hole of a photonic-band-gap fiber, which can then be pumped with light from a pump laser and operated as an oscillator with a seed beam, or can be configured as an amplifier.
    Type: Grant
    Filed: June 5, 2006
    Date of Patent: October 23, 2007
    Assignee: The Regents of the University of California
    Inventors: Stephen A. Payne, Raymond J. Beach, Jay W. Dawson, William F. Krupke
  • Patent number: 7286574
    Abstract: An infrared laser has a seed laser with an optical seed output. A pump amplifier receives the optical seed output and has an amplified output. A molecular gas laser receives the amplified output and has an infrared optical output.
    Type: Grant
    Filed: October 19, 2004
    Date of Patent: October 23, 2007
    Assignee: Neumann Information Systems, Inc.
    Inventors: Jason Kenneth Brasseur, David Kurt Neumann, Charles Wesley Haggans
  • Patent number: 7283575
    Abstract: An electric discharge, narrow band gas laser with improvements in wavelength stability. Improvements result from reduced laser beam directional fluctuations or fast correction of those fluctuations. Applicant has discovered, using an extremely sensitive knife edge optical technique, that gas discharge laser windows in a trapezoidal configuration were causing slight wavelength perturbations when laser gas density varied during laser operation. The optical technique involves using test laser beam directed through the discharge region of the gas discharge laser, blocking a portion of the beam with a knife edge and measuring the non-blocked portion of the beam to monitor beam deflection. With this technique, Applicant can measure beams deflection with an accuracy of about 0.3 microradians and with a time response of about 1 microsecond.
    Type: Grant
    Filed: January 20, 2004
    Date of Patent: October 16, 2007
    Assignee: Cymer, Inc.
    Inventor: Zsolt Bor
  • Patent number: 7283576
    Abstract: Optically-pumped group IIB atomic vapor lasers emitting at discrete wavelengths shorter than 230 nm are disclosed. This laser device utilizes an active medium comprising a mixture of a group IIB atomic vapor and one or more buffer gases placed within a doubly-resonant optical cavity that enables the realization of a population inversion between the first 1P1 level and the 1S0 ground level of the group IIB atoms. The laser may operate in a pure continuous-wave mode, or in a high-repetition pulsed mode, at DUV wavelengths of ˜185 nm (mercury), ˜229 nm (cadmium) and ˜214 nm (zinc).
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: October 16, 2007
    Inventor: William F. Krupke