Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.

Abstract: A method of manufacturing burr-edged reflecting tile elements for a mosaic X-ray lens configured for forming an X-ray beam comprises steps of: (a) providing a single crystal having first and second faces thereof being parallel therebetween; single crystal having crystallographic planes thereof being parallel to first and second faces of the single crystal; the first face dedicated for reflecting an X-ray beam to be incident thereto; (b) cutting the single crystal by means of a wire electrical discharging machine normally to the main faces. The step of cutting the single crystal comprises moving a wire within a cut in direction from the second face to the first face; such that burrs configured for reflecting the X-ray beam to be incident thereto are formed on edges of the cut.

Abstract: An X-ray scattering apparatus having a sample holder for aligning and/or orienting a sample to be analyzed by X-ray scattering, a first X-ray beam delivery system having a first X-ray source, and a first monochromator being arranged upstream of the sample holder for generating and directing a first X-ray beam along a beam path in a propagation direction towards the sample holder is disclosed. A distal X-ray detector arranged downstream of the sample holder and being movable, in particular in a motorized way, along the propagation direction as to detect the first X-ray beam and X-rays scattered at different scattering angles from the sample as the first X-ray beam delivery system is configured to focus the first X-ray beam onto a focal spot on or near the distal X-ray detector when placed at its largest distance from the sample holder is also disclosed.

Abstract: A mask member is provided at an entrance opening of a mirror unit. Of a first diffraction grating and a second diffraction grating, when the second diffraction grating is used, the mask member masks preceding mirrors. With this process, aberration caused by reflective X-ray is suppressed. When the first diffraction grating is used, the mask member does not function. Alternatively, the mask member and another mask member may be selectively used.

Abstract: An exemplary mounting structure can be provided for interferometric imaging and an interferometric imaging apparatus comprising same. The mounting structure comprises at least one curved surface for receiving an interferometric grating to rest thereon. The surface can be provided having a plurality of apertures, whereas that the grating when so received, covers at least one of the apertures.

Abstract: The present invention relates to an illumination and imaging device for high-resolution X-ray microscopy with high photon energy, comprising an X-ray source (1) for emitting X-ray radiation and an area detector (4) for detecting the X-ray radiation. Moreover, the device comprises a monochromatizing and two-dimensionally focussing condenser-based optical system (2) arranged in the optical path of X-ray radiation with two reflective elements (6) being arranged side-by-side for focussing impinging X-ray radiation on an object to be imaged (5) and a diffractive X-ray lens (3) for imaging the object to be imaged (5) on the X-ray detector (4). Typically, the illumination and imaging device is used for performing radiography, tomography and examination of a micro-electronic component or an iron-based material.

Abstract: The present invention relates to handling misalignment in differential phase contrast imaging. In order to provide an improved handling of misalignment in X-ray imaging systems for differential phase contrast imaging, an X-ray imaging system (10) for differential phase contrast imaging is provided that comprises a differential phase contrast setup (12) with an X-ray source (14), an X-ray detector (16), and a grating arrangement comprising a source grating (18), a phase grating (20) and an analyzer grating (22). The source grating is arranged between the X-ray source and the phase grating, and the analyzer grating is arranged between the phase grating and the detector. Further, the system comprises a processing unit (24), and a measurement system (26) for determining a misalignment of at least one of the gratings. The X-ray source and the source grating are provided as a rigid X-ray source unit (28). The phase grating, the analyzer grating and the detector are provided as a rigid X-ray detection unit (30).

Abstract: A method for assembling a phase contrast x-ray imaging system includes fabricating a phase grating and an absorption grating according to a preselected pitch of the gratings. The actual obtained pitches are measured and a source grating is then fabricated according to a desired design point of the imaging system.

Abstract: An assembly for Kratky collimator is provided. The assembly may be used for a small angle x-ray camera or system requiring such filtering. The assembly may include a first block with a first working surface and a second block with a second working surface. The first and second blocks may be aligned with the first working surface pointing an opposite direction of the second working surface and the first working surface being aligned in a common plane with the second working surface. In some implementations, the first block may comprise a crystal material. In some implementations, an extension may of the first block may be configured position a beamstop.

Abstract: The X-ray focusing device includes a point/parallel type multi-capillary X-ray lens (MCX) and a point/parallel type single capillary X-ray lens (SCX). MCX and SCX are positioned so that the end face of the parallel end of SCX is positioned closed to the focal point position on the converging end of MCX so that the optical axes of the two coincide. X-rays that are efficiently collected by MCX are emitted from the converging end and become incident to the end face of parallel end of SCX so that the X-rays are efficiently incorporated into SCX. The X-rays are then irradiated from the converging end of SCX onto focal point having a small diameter. This allows taking advantages of MCX and SCX while compensating for their disadvantages.

Abstract: An X-ray optical device includes a crystal containing a channel, which passes through the crystal and has multiple internal faces. A mount is configured to hold the crystal in a fixed location relative to a source of an X-ray beam and to shift the crystal automatically between two predefined dispositions: a first disposition in which the X-ray beam passes through the channel while diffracting from one or more of the internal faces, and a second disposition in which the X-ray beam passes through the channel without diffraction by the crystal.

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract: The present invention is directed toward an X-ray scanner that has an electron source and an anode. The anode has a target surface with a series of material areas spaced along it in a scanning direction. The material areas are formed from different materials. The electron source is arranged to direct electrons at a series of target areas of the target surface, in a predetermined order, so as to generate X-ray beams having different energy spectra.

Abstract: A method and an ultrahigh-resolution spectrometer including a precision mechanical structure for positioning inelastic X-ray scattering optics are provided. The spectrometer includes an X-ray monochromator and an X-ray analyzer, each including X-ray optics of a collimating (C) crystal, a pair of dispersing (D) element crystals, anomalous transmission filter (F) and a wavelength (W) selector crystal. A respective precision mechanical structure is provided with the X-ray monochromator and the X-ray analyzer. The precision mechanical structure includes a base plate, such as an aluminum base plate; positioning stages for D-crystal alignment; positioning stages with an incline sensor for C/F/W-crystal alignment, and the positioning stages including flexure-based high-stiffness structure.

Abstract: An X-ray imaging system is provided with an X-ray source (11), first and second absorption gratings (31, 32), and a flat panel detector (FPD) (30), and obtains a phase contrast image of an object H by performing imaging while moving the second absorption grating (32) in x direction relative to the first absorption grating (31). The following mathematical expression is satisfied where p1? denotes a period of a first pattern image at a position of the second absorption grating (32), and p2? denotes a substantial grating pitch of the second absorption grating (32), and DX denotes a dimension, in the x-direction, of an X-ray imaging area of each pixel of the FPD (30). Here, “n” denotes a positive integer.

Abstract: To cover a wide wavelength bandwidth, a spectroscopic apparatus uses three varied line spacing concave diffraction gratings G1 to G3, the corresponding energy ranges for G1, G2, and G3 being 50 to 200, 155 to 350, and 300 to 2200 eV, respectively. In the respective wavelength ranges, the diffraction conditions are satisfied. To provide a high throughput and a high resolution in the respective wavelength regions, the incident angles ?1 to ?3 for G1 to G3 measured from the normal line of the diffraction grating are specified to be ?1<?2<?3. Presupposing the normal lines of all diffraction gratings are superposed upon a common normal line, in order to meet ?1<?2<?3, the center positions ?1 to ?3 for G1 to G3 are set on the normal line (as ?1<?2<?3). From G1 to G3, one diffraction grating can be selected.

Abstract: Systems and methods for detecting an image of an object using a multi-beam imaging system from an x-ray beam having a polychromatic energy distribution are disclosed. According to one aspect, a method can include generating a first X-ray beam having a polychromatic energy distribution. Further, the method can include positioning a plurality of monochromator crystals in a predetermined position to directly intercept the first X-ray beam such that a plurality of second X-ray beams having predetermined energy levels are produced. Further, an object can be positioned in the path of the second X-ray beams for transmission of the second X-ray beams through the object and emission from the object as transmitted X-ray beams. The transmitted X-ray beams can each be directed at an angle of incidence upon one or more crystal analyzers. Further, an image of the object can be detected from the beams diffracted from the analyzer crystals.

Abstract: A microstructure manufacturing method includes: preparing a mold having on a front side thereof a plurality of fine structures, with conductivity being imparted to a bottom portion between the plurality of fine structures; forming a first plating layer between the plurality of fine structures by plating the bottom portion; and forming a second plating layer of larger stress than the first plating layer on the first plating layer between the plurality of fine structures, wherein the stress of the second plating layer is used to curve a back side surface of the mold.

Abstract: The invention relates to an improved EUV generating device having a contamination captor for “catching” contamination and/or debris caused by corrosion or otherwise unwanted reactions of the tin bath.

Abstract: An X-ray optical configuration for irradiation of a sample (1) with an X-ray beam having a line-shaped cross-section, wherein the configuration contains an X-ray source (2) and a beam-conditioning X-ray optics, is characterized in that the X-ray source (2) comprises a brilliant point source (4) and the X-ray optics comprises an X-ray optical element (3) which conditions X-ray light emitted by the point source in such a fashion that the X-ray beam is rendered parallel in one direction perpendicular to the beam propagation direction and remains divergent in a direction which is perpendicular thereto and also to the beam propagation direction. An X-ray optical element of this type enables use of both point-shaped and line-shaped beam geometries without complicated and time-consuming conversion work.

Abstract: Provided is a technique for X-ray reflection, such as an X-ray reflecting mirror, capable of achieving a high degree of smoothness of a reflecting surface, high focusing (reflecting) performance, stability in a curved surface shape, and a reduction in overall weight. A silicon plate (silicon wafer) is subjected to thermal plastic deformation to form an X-ray reflecting mirror having a reflecting surface with a stable curved surface shape. The silicon wafer can be deformed to any shape by applying a pressure thereto in a hydrogen atmosphere at a high temperature of about 1300° C. The silicon plate may be simultaneously subjected to hydrogen annealing to further reduce roughness of a silicon surface to thereby provide enhanced reflectance.

Abstract: A X-ray scattering measurement device and measurement method can measure, with high resolution, the intensity of X-rays which have undergone small-angle scattering and diffraction with reflection geometry and can easily and accurately measure a microstructure on the surface of a sample. The X-ray scattering measurement device is suitable for microstructural measurement on the surface of a sample includes an X-ray source that generates an X-ray; a first mirror and a second mirror that continuously reflect the generated X-ray; a sample stage that supports the sample; and a two-dimensional detector that detects the X-ray scattered on the surface of the sample. The first mirror focuses the generated X-ray onto the two-dimensional detector within a plane parallel to the surface of the sample, and the second mirror focuses the X-ray reflected by the first mirror onto the surface of the sample within a plane perpendicular to the surface of the sample.

Abstract: Systems, assemblies and methods for thermally managing a grazing incidence collector (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a GIC mirror shell interfaced with a jacket to form a sealed chamber. An open cell, heat transfer (OCHT) material is disposed within the metal chamber and is thermally and mechanically bonded with the GIC mirror shell and jacket. A coolant is flowed in an azimuthally symmetric fashion through the OCHT material between input and output plenums to effectuate cooling when the GIC thermal management assembly is used in a GIC mirror system configured to receive and form collected EUV radiation from an EUV radiation source.

Abstract: Evaporate thermal management systems for and methods of grazing incidence collectors (GICs) for extreme ultraviolet (EUV) lithography include a GIC shell interfaced with a jacket to form a structure having a leading end and that defines a chamber. The chamber operably supports at least one wicking layer. A conduit connects the wicking layer to a condenser system that support cooling fluid in a reservoir. When heat is applied to the leading end, the cooling fluid is drawn into the chamber from the condenser unit via capillary action in the wicking layer and an optional gravity assist, while vapor is drawn in the opposite direction from the chamber to the condenser unit. Heat is removed from the condensed vapor at the condenser unit, thereby cooling the GIC mirror shell.

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract: The invention relates to X-ray spectral analysis and can be used for control of radiation spectra of X-ray generators as well as for analysis of elemental chemical composition and atomic structure of the specimens by measuring their absorption spectra. The X-ray spectrometer comprises at least one dispersing prism element, means of translation of the dispersing element relative to an X-ray beam, a refracted radiation detector and measuring tools for angle positioning of the dispersing element and the refracted radiation detector. The main distinction of the claimed spectrometer is that it contains an additional radiation detector, means to install it downstream the radiation reflected from the refracting surface of the dispersing element and measuring tools for its angle position in relation to the primary X-ray beam. The dispersing element is made of diamond, or beryllium, lithium hydride or boron carbide.

Abstract: A method and an ultrahigh-resolution spectrometer including a precision mechanical structure for positioning inelastic X-ray scattering optics are provided. The spectrometer includes an X-ray monochromator and an X-ray analyzer, each including X-ray optics of a collimating (C) crystal, a pair of dispersing (D) element crystals, anomalous transmission filter (F) and a wavelength (W) selector crystal. A respective precision mechanical structure is provided with the X-ray monochromator and the X-ray analyzer. The precision mechanical structure includes a base plate, such as an aluminum base plate; positioning stages for D-crystal alignment; positioning stages with an incline sensor for C/F/W-crystal alignment, and the positioning stages including flexure-based high-stiffness structure.

Abstract: An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced having a characteristic first energy, and bremsstrahlung energy; a first x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam; and a second x-ray optic receives the diverging x-ray beam and directs the beam toward the sample spot, while monochromating the beam to a second energy. The first x-ray optic may monochromate characteristic energy from the source spot, and the second x-ray optic may monochromate bremsstrahlung energy from the source spot. The x-ray optics may be curved diffracting optics, for receiving the diverging x-ray beam from the x-ray tube and focusing the beam at the sample spot. Detection is also provided to detect and measure various toxins in, e.g., manufactured products including toys and electronics.

Abstract: To cover a wide wavelength bandwidth, a spectroscopic apparatus uses three varied line spacing concave diffraction gratings G1 to G3, the corresponding energy ranges for G1, G2, and G3 being 50 to 200, 155 to 350, and 300 to 2200 eV, respectively. In the respective wavelength ranges, the diffraction conditions are satisfied. To provide a high throughput and a high resolution in the respective wavelength regions, the incident angles ?1 to ?3 for G1 to G3 measured from the normal line of the diffraction grating are specified to be ?1<?2<?3. Presupposing the normal lines of all diffraction gratings are superposed upon a common normal line, in order to meet ?1<?2<?3, the center positions ?1 to ?3 for G1 to G3 are set on the normal line (as ?1<?2<?3). From G1 to G3, one diffraction grating can be selected.

Abstract: A spectrometer includes a rigid body having a first planar face with an orientation and a second planar face with a different orientation than the first planar face. The first and second planar faces are configured to position Bragg diffraction elements, and the orientation of the first planar face and the different orientation of the second planar face are arranged to convey a predetermined spectral range of the electromagnetic radiation to non-overlapping regions of the sensor location via the diffraction elements.

Abstract: A high-precision water-cooled, small offset, double crystal monochromator has been developed for use with beamline. The design incorporates the supports and gravity feed water cooling of two diamond or silicon crystals correctly positioned about a common rotation axis so that the incident and diffracted beam do not walk off the edges of the crystals within the energy range 6-15 KeV (30°<q<11.6°). In the 34ID implementation, the first crystal sees unfocussed pink beam from an undulator. The second crystal has a ±5° motorized tilt motion around an axis parallel to its face and around the beam direction.

Abstract: The invention refers to an X-ray beam device for X-ray analytical applications, comprising an X-ray source designed such as to emit a divergent beam of X-rays; and an optical assembly designed such as to focus said beam onto a focal spot, wherein said optical assembly comprises a first reflecting optical element, a monochromator device and a second reflecting optical element sequentially arranged between said source and said focal spot, wherein said first optical element is designed such as to collimate said beam in two dimensions towards said monochromator device, and wherein said second optical element is designed such as to focus the beam coming from said monochromator device in two dimensions onto said focal spot.

Abstract: An x-ray optical system includes a multiple corner optic assembly including an adjustable aperture assembly located in close proximity to the optic assembly. The adjustable aperture assembly enables a user to easily and effectively adjust the convergence of an incident beam of x-rays or the optic focal spot size. The adjustable aperture assembly may further enable a user to condition x-rays of one wavelength and block x-rays of another wavelength and thereby reduce the amount of background radiation exhibited from x-rays of more than one wavelength.

Abstract: Semiconductor substrates with high aspect ratio recesses formed therein are described. The high aspect ratio recesses have bottom surface profile characteristics that promote formation of initial growth sites of plated metal as compared to the side surfaces of the recesses. Processes for making and plating the recesses are also disclosed. The metal-plated high aspect ratio recesses can be used as X-ray gratings in Phase Contrast X-ray imaging apparatuses.

Abstract: An X-ray optical configuration (1), comprising a position for an X-ray source (2), a position for a sample (3), a first focusing element (4) for directing X-ray radiation from the position of the X-ray source (2) via an intermediate focus (5) onto the position of the sample (3), and an X-ray detector (6) that can be moved on a circular arc (7) of radius R around the position of the sample (3), is characterized in that the configuration also comprises a second focusing element (8) for directing part of the X-ray radiation emanating from the intermediate focus (5) onto the position of the sample (3), and an aperture system (9) for selecting between illumination of the position of the sample (3) exclusively and directly from the intermediate focus (5) (=first optical path (10?)), or exclusively via the second focusing element (8) (=second optical path (10?)).

Abstract: In an X-ray diffraction method, an X-ray parallel beam is incident on a sample, and diffracted X-rays from the sample are reflected at a mirror and thereafter detected by an X-ray detector. The reflective surface of the mirror is a combination of plural flat reflective surfaces, the respective centers of which are located on an equiangular spiral having a center that is located on a surface of the sample. The X-ray detector is one-dimensional position-sensitive in a plane parallel to the diffraction plane. X-rays that have been reflected at different flat reflective surfaces reach different points on the X-ray detector respectively. A correction is performed for separately recognizing different reflected X-rays that may have been reflected at the different flat reflective surfaces, and might be mixed with each other on the same detecting region of the X-ray detector.

Abstract: A source grating for X-rays and the like which can enhance spatial coherence and is used for X-ray phase contrast imaging is provided. The source grating for X-rays is disposed between an X-ray source and a test object and is used for X-ray phase contrast imaging. The source grating for X-rays includes a plurality of sub-gratings formed by periodically arranging projection parts each having a thickness shielding an X-ray at constant intervals. The plurality of sub-gratings are stacked in layers by being shifted.

Abstract: Systems and methods for detecting an image of an object by use of X-ray beams generated by multiple small area sources are disclosed. A plurality of monochromator crystals may be positioned to intercept the plurality of first X-ray beams such that a plurality of second X-ray beams each having predetermined energy levels is produced. Further, an object to be imaged may be positioned in paths of the second x-ray beams for transmission of the second X-ray beams through the object and emitting from the object a plurality of transmission X-ray beams. The X-ray beams may be directed at angles of incidence upon a plurality of analyzer crystals for detecting an image of the object.

Abstract: A radiographic apparatus includes a guide housing, a first grating unit, a radiological image detector and a grating pattern unit. The guide housing houses a first grating unit, the grating pattern unit, and a radiological image detector and supports a subject to which radiation is irradiated. The grating pattern unit includes a periodic form having a period and masks a radiological image formed by the radiation having passed through the first grating. The radiological image detector detects a masked radiological image which is formed by masking the radiological image by the grating pattern unit. The first grating unit and the grating pattern unit are supported by the guide housing with a buffer material being interposed between the first grating unit and the grating pattern unit and an inner wall of the guide housing.

Abstract: The present invention relates to phase-contrast imaging which visualizes the phase information of coherent radiation passing a scanned object. Focused gratings are used which reduce the creation of trapezoid profile in a projection with a particular angle to the optical axis. A laser supported method is used in combination with a dedicating etching process for creating such focused grating structures.

Abstract: The invention relates to gratings for X-ray differential phase-contrast imaging, a focus detector arrangement and X-ray system for generating phase-contrast images of an object and a method of phase-contrast imaging for examining an object of interest. In order to provide gratings with a high aspect ratio but low costs, a grating for X-ray differential phase-contrast imaging is proposed, comprising a first sub-grating (112), and at least a second sub- grating (114; 116; 118), wherein the sub-gratings each comprise a body structure (120) with bars (122) and gaps (124) being arranged periodically with a pitch (a), wherein the sub-gratings (112; 114; 116; 118) are arranged consecutively in the direction of the X-ray beam, and wherein the sub-gratings (112; 114; 116; 118) are positioned displaced to each other perpendicularly to the X-ray beam.

Abstract: A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region.

Abstract: An x-ray optical system includes a multiple corner optic assembly including an adjustable aperture assembly located in close proximity to the optic assembly. The adjustable aperture assembly enables a user to easily and effectively adjust the convergence of an incident beam of x-rays or the optic focal spot size. The adjustable aperture assembly may further enable a user to condition x-rays of one wavelength and block x-rays of another wavelength and thereby reduce the amount of background radiation exhibited from x-rays of more than one wavelength.

Abstract: A Method for X-ray wavelength measurement and an X-ray wavelength measurement apparatus capable of determining absolute wavelength easily and carrying out wavelength measurement having high precision with a simple structure are provided. The present invention is a Method for X-ray wavelength measurement carried out by using a channel-cut crystal for wavelength measurement (20) in which two opposing cut planes are formed and the lattice constant of which is known, and the method diffracts X-ray in respective arrangements (?, +) and (+, ?) of the channel-cut crystal for wavelength measurement (20), to determine the absolute wavelength of the X-ray from the difference between crystal rotation angles in respective arrangements. This makes the alignment simpler, and, when only a channel-cut crystal suitable for measurement can be prepared, X-ray wavelength measurement can be carried out easily and with high precision.

Abstract: Systems and methods are disclosed herein for lenses based on crystal X-ray diffraction and reflection to be used to direct and energy filter X-ray beams.

Abstract: A radiation imaging system includes an X-ray source, first and second absorption gratings disposed in a path of X-rays emitted from the X-ray source, and an FPD. The second absorption grating is slid stepwise in an X direction relative to the first absorption grating. Whenever the second absorption grating is slid, the FPD captures a fringe image. From the captured plural fringe images, an intensity modulation signal of each pixel is obtained. A positional deviation detector calculates an amplitude value of the intensity modulation signal. The positional deviation detector compares a measurement of the amplitude value with predetermined first and second threshold values. If the measurement is less than the first threshold value, a warning signal is outputted. If the measurement is less than the second threshold value, an error signal is outputted.

Abstract: Described are optical apparatuses and methods for forming optical apparatuses. The optical apparatus includes a plurality of individually fabricated segments and a holder. Each of the plurality of individually fabricated segments include an inner annular surface and an outer contact surface opposite to the inner annular surface. Each of the inner annular reflecting surfaces define a longitudinal segment axis. The holder contacts each of the outer contact surfaces of the plurality of individually fabricated segments. Each of the longitudinal segment axes of the plurality of individually fabricated segments are linearly aligned.

Abstract: A high precision posture control method for sustaining the posture of an X-ray optical element constantly at 1 ?rad or less. A longitudinal condensation mirror and a lateral condensation mirror, each having a condensation plane band consisting of an elliptical reflective surface, are arranged perpendicularly to each other to form a K-B mirror arrangement. Fresnel mirrors are respectively constituted of a pair of planar reflective surfaces formed in the vicinities of the incident side end and the exit side end of the condensation plane band of each condensation mirror. Interference fringe by the Fresnel mirror of each condensation mirror is independently monitored at a position insusceptible to a condensation beam by the condensation plane band, and variation in interference fringe is detected electrically and its detection signal is used as a feedback signal for posture control of each condensation mirror.

Abstract: An x-ray system or method for exciting a sample under x-ray analysis, using a curved monochromating optic for directing a monochromatic x-ray beam from an x-ray source towards a first focal area. A second optic is positioned within, and receives, the monochromatic x-ray beam, and directs a focused x-ray beam towards a second focal area on the sample. A detector is positioned near the sample to collect radiation from the sample as a result of the focused x-ray beam. The curved monochromating optic produces a beam spot size at the first focal area larger than a beam spot size produced by the second optic at the second focal area, therefore, a beam spot size on the sample is thereby reduced using the second optic. Doubly-curved monochromating optics, and polycapillary optics, are disclosed as possible implementations of the optics.

Abstract: An X-ray imaging device and alignment/scanning system include at least one multilayer X-ray mirror mounted on a multi-axis adjustable mirror mount pivotable about a scanning axis. A mirror scanner is coupled with the mirror mount and synchronized with the X-ray source so that the mirror scanner moves the mirror mount about the scanning axis. The invention may include a plurality of mirrors, optionally in a stack, and preferably including first and second mirrors respectively adapted to reflect X-rays of first and second energies. A movable attenuation plate having a window selectively allows X-rays to be transmitted by one of the mirrors and blocks X-rays from the other mirror(s). Sets of the mirrors may be configured in blocks or interspersed. The mirror scanner may be operable at variable speeds to enable selective control of the scanning speed of the mirror.