Abstract: An X-ray optical system with two X-ray mirrors (A,B) for imaging an X-ray source (S) on a target region is characterized in that the X-ray mirrors (A,B) are mutually tilted by an angle other than 90° such that the combined region of acceptance of the X-ray mirror (A,B) is adjusted to the shape of the X-ray source (S) and/or the target region. This increases the intensity of the focused X-ray radiation on the sample for a given emission of the X-ray source (S) power using a few, technically simple modifications.

Abstract: A method for testing a surface includes finding respective first and second critical angles for total external reflection of radiation from an area of the surface at first and second wavelengths. The first and second critical angles are compared to determine an orientation of a tangent to the surface in the area.

Abstract: A lithographic projection apparatus includes a radiation system configured to form a beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the beam provides the beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract: Apparatus for X-ray analysis has a combination of a rotating target X-ray tube and a composite monochromator. The composite monochromator has a first and a second elliptic monochromators joined with each other side by side. Each of the elliptic monochromators has a first focal point at which an X-ray focal spot on a target of the X-ray tube is disposed. Each of the elliptic monochromators has a synthetic multilayered thin film whose d-spacing varies continuously along an elliptic-arc. The shortest distance between the X-ray focal spot and the composite monochromator is set to 40 to 100 mm. Under the shortest distance condition, the effective focal spot size on the target is set to 40 to 100 micrometers to obtain the maximum X-ray intensity on a sample to be analyzed.

Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.

Abstract: A lithographic projection apparatus includes a radiation system configured to form a projection beam of radiation from radiation emitted by a radiation source, as well as a support configured to hold a patterning device, which when irradiated by the projection beam provides the projection beam with a pattern. A substrate table is configured to hold a substrate, and a projection system is configured to image an irradiated portion of the patterning device onto a target portion of the substrate. The radiation system further includes an aperture at a distance from the optical axis, a reflector which is placed behind the aperture when seen from the source and a structure placed in a low radiation intensive region behind the aperture.

Abstract: An X-ray optical system with an X-ray source, an element that focuses the X-rays and an element that reflects them. In order to generate parallel X-radiation with small beam cross-section and high photon density, the X-radiation of the X-ray source is directed with its focusing element to the convex, parabolic and reflecting surface of the reflecting element. The X-ray optical system is useful for X-ray analysis, e.g., in X-ray diffractometry, reflectometry and/or fluorescence analysis.

Abstract: A method for producing microstructures for use for x-ray lenses using extrusion techniques and a variable focus x-ray lens assembly are provided. An elongated strip of multiple x-ray lenses and cavities of arbitrary cross-section are produced by an extrusion step. A predefined lens profile of the multiple x-ray lenses has, for example, a parabolic profile for x-ray focusing. The elongated strip of multiple cylindrical compound x-ray lenses can be cut into multiple uniform small lengths, for example, 50 mm lengths, and positioned within a support member. Cutting the assembled support member and x-ray lenses at a selected angle provides a variable focus x-ray lens assembly.

Abstract: This invention relates to a portable apparatus for carrying out X-ray fluorescence spectrometry on specimen materials at a distance from the apparatus. The apparatus comprises an X-ray generating tube, such as a microfocus tube, and two paraboloidal X-ray reflecting mirrors. The first collecting mirror is positioned in close coupled arrangement adjacent to the exit window of the tube, such that it emits parallel X-ray radiation to the second focusing mirror, which is aligned on the axis of and spaced apart from the first mirror (11). The second mirror (12) collects the parallel X-ray radiation at its end closest to the first mirror and emits X-ray radiation in a focused beam onto the specimen. The distance between the first and second mirrors is adjusted to suit the distance from the X-ray tube to the specimen. Focal spots on the specimen of diameter less than 15 microns (590.55 microinches) are possible, enabling precise analysis of small areas of the specimen.

Abstract: A method for producing microstructures for use for x-ray lenses using extrusion techniques and a variable focus x-ray lens assembly are provided. An elongated strip of multiple x-ray lenses and cavities of arbitrary cross-section are produced by an extrusion step. A predefined lens profile of the multiple x-ray lenses has, for example, a parabolic profile for x-ray focusing. The elongated strip of multiple cylindrical compound x-ray lenses can be cut into multiple uniform small lengths, for example, 50 mm lengths, and positioned within a support member. Cutting the assembled support member and x-ray lenses at a selected angle provides a variable focus x-ray lens assembly.

Abstract: A condenser for a photolithography system, in which a mask image from a mask is projected onto a wafer through a camera having an entrance pupil, includes a source of propagating radiation, a first mirror illuminated by the radiation, a mirror array illuminated by the radiation reflected from said first mirror, and a second mirror illuminated by the radiation reflected from the array. The mirror array includes a plurality of micromirrors. Each of the micromirrors is selectively actuatable independently of each other. The first mirror and the second mirror are disposed such that the source is imaged onto a plane of the mask and the mirror array is imaged into the entrance pupil of the camera.

Abstract: An x-ray apparatus and method are presented for controlling x-rays to analyze combinatorial libraries for the rapid screening of different materials and different conditions. The apparatus includes a laboratory x-ray source, one or more x-ray optics, a combinatorial library, and a detector such as an x-ray detector or an electron energy detector. The apparatus can be used to perform analytical measurements on individual members of the library, where the measurements may comprise x-ray fluorescence, x-ray diffraction, total reflection x-ray fluorescent spectrometry, and/or extended x-ray absorption fine structure.

Abstract: A system includes substantial focus of radiation on a focal area, the focused radiation following a radiation path from a lens to the focal area, and projection of light on a surface so as to substantially indicate an intersection of the radiation path with the surface. In some aspects, the light projected on the surface substantially indicates a distance between the surface and the focal area.

Abstract: An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.

Abstract: Disclosed are methods and apparatus for simultaneously flooding a sample (e.g., a semiconductor wafer) to control charge and inspecting the sample. The apparatus includes a charged particle beam generator arranged to generate a charged particle beam substantially towards a first portion of the sample and a flood gun for generating a second beam towards a second portion of the sample. The second beam is generated substantially simultaneously with the inspection beam. The apparatus further includes a detector arranged to detect charged particles originating from the sample portion. In a further implementation, the apparatus further includes an image generator for generating an image of the first portion of the sample from the detected particles. In one embodiment, the sample is a semiconductor wafer. In a method aspect, a first area of a sample is flooded with a flood beam to control charge on a surface of the sample. A second area of the sample is inspected with an inspection beam.

Abstract: An x-ray generation apparatus includes an x-ray reflecting mirror and x-ray generation part. The x-ray reflecting mirror is formed on an inner surface of a concave aspheric surface. The x-ray generation part receives at least one incident energy beam. The x-ray generation part is arranged near a focal point including a focal point of a paraboloid, and the x-ray reflecting mirror has at least one aperture formed in a position except for a part of the concave aspheric surface crossing an axis including the focal point of the concave aspheric surface, and an incident energy beam irradiates the x-ray generation part through the aperture.

Abstract: A novel dual beam low energy electron microscope (LEEM) apparatus for inspecting semiconductor circuits or masks. Direct imaging records many pixels in parallel, offering higher inspection rates than prior art scanning methods. A low energy flood beam is superimposed with a second, higher energy flood beam. The use of two beams avoids charging effects upon insulating or partially insulating substrates. Under appropriate conditions, the net charging flux to each image element can be balanced on a pixel by pixel, as well as global basis. Either the low energy or the higher energy beam may be used to form an image of the surface. An electron optical apparatus and configuration for this dual beam LEEM is described.

Abstract: A reflective lens with at least one curved surface formed of polycrystalline material. In one embodiment, a lens structure includes a substrate having a surface of predetermined curvature and a film formed along a surface of the substrate with multiple individual members each having at least one similar orientation relative to the portion of the substrate surface adjacent the member such that collectively the members provide predictable angles for diffraction of x-rays generated from a common source. A system is also provided for performing an operation with x-rays. In one embodiment, a system includes a source for generating the x-rays, a polycrystalline surface region having crystal spacing suitable for reflecting a plurality of x-rays at the same Bragg angle along the region, and transmitting the reflected x-rays to a reference position.

Abstract: X-ray diagnostic system. The system includes a source of x-rays which communicates with an x-ray beam concentrator spaced apart from the x-ray source and disposed for receiving x-rays from the x-ray source. An x-ray spectrometer is disposed for receiving x-rays from the concentrator. In a preferred embodiment, the concentrator is formed of a cylindrical spiral of a metal-coated plastic material having a surface for reflecting x-rays. In another embodiment, the concentrator includes a plurality of concentric nested cylinders of a metal-coated plastic material for reflecting x-rays. In yet another embodiment, the concentrator is a glass capillary bundle. The concentrator allows the spectrometer to be spaced away from the source of x-rays such as scanning electron microscope.

Abstract: An X-ray optical system with two X-ray mirrors (A,B) for imaging an X-ray source (S) on a target region is characterized in that the X-ray mirrors (A,B) are mutually tilted by an angle other than 90° such that the combined region of acceptance of the X-ray mirror (A,B) is adjusted to the shape of the X-ray source (S) and/or the target region. This increases the intensity of the focused X-ray radiation on the sample for a given emission of the X-ray source (S) power using a few, technically simple modifications.

Abstract: A channel-cut monochromator has at least two kinds of reflecting surface pairs processed on a common single crystal block. Each reflecting surface pair has a first and a second reflecting surfaces between which X-rays are reflected even-number times. The channel-cut monochromator can be rotated around an axis of rotation perpendicular to a reference plane so as to switch the reflecting surface pair which reflects X-rays. An X-ray beam incident on any reflecting surface pair or its extension line is tangent to a common imaginary circle whose center coincides with the axis of rotation. With this structure, the switchover of the reflecting surface pair is accomplished by only the rotation of the channel-cut monochromator around its axis of rotation, so that various X-ray beams reflected by various Miller indices can be taken out selectively. The channel-cut monochromator may have a direct path through which an X-ray beam passes in no contact with any reflecting surface.

Abstract: A classification system for systems of n mirrors, whereby systems of mirrors are classified by a number C, is defined as follows: C = ∑ i = 1 n ⁢ a i · 2 ( n - i ) ⁢ ( M &LeftBracketingBar; M &RightBracketingBar; ) where: ai=1 if the angle of incidence of the chief ray at mirror i is negative, ai=0 if the angle of incidence of the chief ray at mirror i is positive, M is the magnification of the projection system, and index i numbers the mirrors of the system in series.

Abstract: Microlithography apparatus and methods are disclosed for achieving high-resolution pattern transfer of a pattern onto a substrate, such as a semiconductor wafer, using extreme ultraviolet (EUV, also termed soft X-ray) radiation. The apparatus include an imaging-optical system (projection-optical system) capable of receiving pattern-encoding EUV light from a mask and forming an image of the pattern on the substrate. The desired wavelength of the EUV light is 20 nm to 50 nm, and the imaging-optical system includes multiple reflective mirrors having aspherical surficial profiles and multilayer-film reflective surfaces. The apparatus are configured especially to achieve a pattern-element resolution, of the projected image, of 70 nm or finer.

Abstract: A grating that includes a multilayer structure that has alternating layers of materials, a plurality of grooves formed between a plurality of lands, wherein at least one structural parameter of the plurality of grooves and plurality of lands is formed randomly in the multilayer structure.

Abstract: A multilayer mirror 1 that has elliptical reflection faces and provides a divergent angle &dgr; of X-rays, is included. The elliptical reflection faces of the multilayer mirror 1 have two focal points. When an X-ray source 2 is arranged at one focal point A, and X-rays that are diverged from the X-ray source 2 are reflected at the multilayer mirror 1, the reflected X-rays converge on another focal point B. The X-ray source 2 is arranged at one focal point A of the multilayer mirror 1. Additionally, a distance L2 from the center of the reflection faces of the multilayer mirror 1 to another focal point B (in other words, convergent point of reflected X-rays) is set to make a convergent angle &thgr;c of X-rays at the focal point B nearly twice as great as the divergent angle &dgr;. With the above-noted configuration, both small angle resolution and intensity of incident X-rays to a sample may be optimized, and small angle scattering may be performed with high precision.

Abstract: An X-ray focusing apparatus comprises a waveguide (3) closely coupled to an X-ray focusing mirror (5). The mirror comprises an interior reflecting surface having a rotational axis of symmetry. The waveguide may comprise a tapered polycapillary lens.

Abstract: An x-ray system using a slot-shaped detector having n rows and m columns of pixels, where n<<m, and providing a variety of relative motions between a patient table and a source-detector unit, including translation along the length of the table, translation across the table, and rotation about the focal spot, and processing the pixel values in a variety of ways to produce information such a shadow graphic x-ray images, tomosynthetic images of surfaces that need not be planar, and bone density estimates. In another embodiment, tomographic images can be obtained directly, using a post-patient collimator that passes nearly all of the primary beam to the imager while eliminating nearly all of the scatter. A feedback loop can equalize the exposure for selected parts of the image substantially in real time.

Abstract: The invention relates to an X-ray optics arrangement having an X-ray source, one element focussing X-rays and one element reflecting X-rays for the generation of a parallel X-radiation having a small beam cross section of high photon flux density. To solve this problem the X-radiation of the X-ray source is directed with the focussing element upon the convex, parabolic and reflecting surface of the reflecting element, and allowed to be advantageously employed in the X-ray analysis, e.g. with the X-ray diffraction measurement, reflectometry and/or fluoro-chemical analysis.

Abstract: Ana analyzer that includes a first multilayer structure, a spacer material deposited on the first multilayer structure and a second multilayer structure deposited on the spacer material.

Abstract: A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

Abstract: An X-ray illumination optical system for an X-ray reduction projection exposure apparatus includes an oblique projection reflection integrator having a reflection surface provided by a plurality of small cylindrical surfaces arrayed in parallel, to perform Koehler illumination of a region of arcuate shape. It enables X-ray illumination of only ah arcuate region and reduces loss of light quantity and exposure time.

Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.

Abstract: The invention relates to an apparatus for total reflection X-ray fluorescence analysis, which allows a faster and more precise detection of the X-ray fluorescence spectrums of a sample. DRIFT detectors are used in the transducer of the apparatus in which charge carriers created can be accelerated towards a collecting anode of a very small design by a radial component of the electrical field generated by annular electrodes. A faster and more precise measurement of the charge carriers generated in the detector interior is possible due to the low capacitance of the collecting anode. The X-ray fluorescence of a sample can be measured in high-sensitive resolution by an array comprising such DRIFT detectors. The surface concentrations of the different foreign atoms in the sample can be determined in high-sensitivity resolution from the X-ray fluorescence spectrums obtained.

Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.

Abstract: A parallel nanotomography imaging system is provided having an x-ray source, which is preferably a laser-based x-ray source that generates x-rays that are collected using a collector optic and are received in a composite objective assembly. The composite objective assembly includes plural micro-objectives, each imaging the target. The x-ray image is received by an x-ray image formation and acquisition apparatus, and processed and/or displayed.

Abstract: A microfocus x-ray system for producing a quasi-parallel x-ray beam is disclosed which includes an x-ray source, a polycapillary optic and a monochromator. The x-ray system achieves a high rate of x-ray flux, and the angular divergence of the x-ray beam has been reduced. The x-ray system is particularly well suited for use on small macromolecular crystals.

Abstract: An optical sample X-ray testing apparatus including an X-ray source which is configured to radiate X-rays including a group of line spectra. At least one line spectrum selecting device is provided between the X-ray source and an optical sample and configured to direct substantially one line spectrum among the group of line spectra from the X-ray source toward the optical sample. An optical characteristics finding device is configured to find optical characteristics of the optical sample based on radiation of the substantially one line spectrum through the line spectrum selecting device onto the optical sample.

Abstract: A channel-cut monochromator has at least two kinds of reflecting surface pairs processed on a common single crystal block. Each reflecting surface pair has a first and a second reflecting surfaces between which X-rays are reflected even-number times. The channel-cut monochromator can be rotated around an axis of rotation perpendicular to a reference plane so as to switch the reflecting surface pair which reflects X-rays. An X-ray beam incident on any reflecting surface pair or its extension line is tangent to a common imaginary circle whose center coincides with the axis of rotation. With this structure, the switchover of the reflecting surface pair is accomplished by only the rotation of the channel-cut monochromator around its axis of rotation, so that various X-ray beams reflected by various Miller indices can be taken out selectively. The channel-cut monochromator may have a direct path through which an X-ray beam passes in no contact with any reflecting surface.

Abstract: An x-ray analysis system including a focusing optic for focusing an x-ray beam to a focal point, a first slit optically coupled to the focusing optic, a second slit optically coupled to the first slit, and an x-ray detector, where the focal point is located in front of the detector.

Abstract: A three-dimensional imaging device comprising a stationary monochromatic beam source projecting a beam onto a plurality of reflective mosaic crystals, wherein the plurality of mosaic crystals reflect the beam through a stationary object onto a stationary detector. A way for scanning the object includes moving the entire set of the mosaic crystals linearly along a line in the plane of the crystals, and rotating the entire plurality of crystals about an axis through the stationary beam source while maintaining the plurality of crystals in a fixed relative orientation. A potential application of the invention is to improve the accuracy of mammography in the diagnosis of breast cancer.

Abstract: A reflective lens with at least one curved surface formed of polycrystalline material. In an example embodiment a lens structure includes a substrate having a surface of predetermined curvature and a film formed along a surface of the substrate with multiple individual members each having at least one similar orientation relative to the portion of the substrate surface adjacent the member such that collectively the members provide predictable angles for diffraction of x-rays generated from a common source.

Abstract: A multi-layered mirror has a substrate, a first layer of a first substance, a second layer of a second substance. The refractive index of the first substance in a utilized wavelength region is different from that of the second substance. The first and second layers are laminated alternately on the substrate. To obtain a high reflectivity and superior optical characteristics, a multi-layered structure is formed within either the first layer or the second layer using at least two substances whose real parts of the complex indices of refraction in the utilized wavelength region are approximately the same. Alternatively, a layer surface is smoothed before forming a next layer thereon. An exposure apparatus that uses multi-layered mirrors of the present invention uses light with higher efficiency.

Abstract: The invention describes a method and a device for the focussing of X-rays by means of glass capillary optics and serves, in particular, the purpose of realization of X-ray-zoom-optics. The method is based on the fact that, by means of the alteration of the distances of two semi-lenses arranged opposite each other, the focal lengths can be adjustably set.

Abstract: Condenser system, for use with a ringfield camera in projection lithography, employs quasi grazing-incidence collector mirrors that are coated with a suitable reflective metal such as ruthenium to collect radiation from a discharge source to minimize the effect of contaminant accumulation on the collecting mirrors.

Abstract: An amplitude-type Fresnel zone plate for focusing incident X-rays is formed in a single-crystal layer. For incident X-rays that are above a threshold energy level and that are directed at the zone plate at a specified angle, Bragg reflection occurs from crystallographic planes within the elements of the zone plate even when the layer is exceedingly thin. Accordingly, zone plates with extremely narrow elements may be fabricated. In turn, this allows the realization of zone plates capable of focusing X-rays to very small spot sizes.

Abstract: An incident monochromator and a microfocus X-ray source with an apparent focal spot size of less than 30 micrometers are combined so that the X-ray source can be close to the monochromator and the intensity of X-rays focused on a sample is greatly increased. A side-by-side composite monochromator is arranged between the X-ray source and the sample. The composite monochromator has a first and a second elliptic monochromators each having a synthetic multilayered thin film with graded d-spacing. The first elliptic monochromator has one side which is connected to one side of the second elliptic monochromator. A preferable apparent focal spot size D of the X-ray source may be 10 micrometers. Because the invention provides a high focusing efficiency for X-rays, it is not required to use a high-power X-ray tube. The X-ray tube according to the invention, moreover, may have a stationary-anode, whose power may be about 7 Watts.

Abstract: A diffractor for electromagnetic radiation with a spherical stepped geometry constructed under the constant step width conditions (here defined as pseudo-spherical geometry). The diffractor consists of a plurality of spherically curved dispersive elements (oriented monocrystals, crystal surfaces or gratings) that are located on a focal circle. The location on the focal circle of each element is made to guarantee the same Bragg angle for the incident radiation. Thus a diffractor is an array of diffracting elements (“steps”) each one contributing to the total solid angle of the diffractor, that increase the spectral output of the device without decreasing the resolution. Because the steps are spherically curved, they are curved also in the direction perpendicular to the focal circle in order to satisfy Bragg's law for diffraction over a maximum area of the diffractor.

Abstract: An interferometer that uses plane mirrors at grazing incidence to create interference fringes in the extreme ultraviolet and x-ray portions of the spectrum. X-ray interferometry has historically been implemented through narrow band, diffractive systems that split the wavefront. By using two separate optical channels at grazing incidence to create interference from two areas of the wavefront, this system has broad band response and much higher efficiency. The interferometer has applications to telescopes, microscopes and spectrometers in the extreme ultraviolet and x-ray, and high contrast imaging in the visible.

Abstract: An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask.

Abstract: X-ray-reflecting mirrors are disclosed that exhibit reduced internal stress without any significant reduction in reflectance to X-rays. The mirrors comprise a substrate on a surface of which a multi-layer structure is formed. The multi-layer structure is formed by alternately and superposedly layering, on a surface of the substrate, a first material (e.g., molybdenum) and a second material (silicon with a dopant such as boron). Net internal stress of the multi-layer structure is controllably reduced by controlling the amount of diffused dopant in the second material.