Abstract: The present application provides a method of determining an overlay error during a semiconductor fabrication. The method includes steps of forming a first structural layer comprising a target feature over a wafer; forming a second structural layer comprising a first axis, a second axis and a pair of alignment features over the first structural layer, wherein the pair of alignment features are disposed at the first and the second axes, respectively; and determining a relative displacement of the first and second structural layers using a position of the first axis relative to the target feature and a position of the second axis relative to the target feature.

Abstract: Disclosed are a method and system for overlay error compensation and a storage medium. The method includes that N wafer groups are provided, wherein each wafer group includes M wafers each including a present and previous layer, and N and M are positive integers greater than or equal to 2; for each wafer, a first overlay error is determined according to device structures of the present and previous layers, and a photoetching compensation value is calculated according to the first overlay error; for each wafer group, a first average compensation value is calculated according to photoetching compensation values; a second average compensation value of the N wafer groups is calculated according to first average compensation values; and in response to that the second average compensation value is within a preset range, the second average compensation value is fed to a batch control system to compensate an (N+1)th wafer group.

Abstract: A detection device for detecting a workpiece with multiple surfaces includes a rotary table carrying the workpiece and moving the workpiece by rotation and a plurality of photographing devices arranged at a plurality of different positions around the rotary table. Each photographing device has an image capture device capturing an image of a corresponding surface of the workpiece that is moved to the image capture device. An orientation of the image capture device is defined by a first offset angle and a second offset angle when the image capture device captures the image of the corresponding surface of the workpiece.

Abstract: According to one embodiment, there is provided a semiconductor manufacturing apparatus including a rotatable substrate stage, a first measuring mechanism and a second measuring mechanism. On the rotatable substrate stage, a laminated substrate used for manufacturing a semiconductor device is placed. The laminated substrate is formed by a first substrate and a second substrate to be laminated to each other. The first measuring mechanism measures an edge of the first substrate and an edge of the second substrate from a first direction. The second measuring mechanism measures the edge of the first substrate and the edge of the second substrate from a second direction. The second direction is a direction different from the first direction in an angle to a normal of the first substrate.

Abstract: There are provided a line sensor (110) including two first sensor pixel rows (111a, 111b) and a second sensor pixel row (112a); an image obtaining unit (140) to obtain, from electrical signals obtained by scanning an original in a sub-scanning direction with the two first sensor pixel rows (111a, 111b), two first read image data items, and obtain, from electrical signals obtained by scanning the original in the sub-scanning direction with the second sensor pixel row (112a), a second read image data item; and an image processor (150) to incorporate one or more pixel data items of one or more pixels included in an interval between the two first sensor pixel rows (111a, 111b) out of the second read image data item into the two first read image data items, thereby generating a line image data item in which the one or more pixels in the interval are not vacant.

Abstract: The present disclosure relates to devices, apparatus and methods of improving the accuracy of image-based assay, that uses imaging system having uncertainties or deviations (imperfection) compared with an ideal imaging system. One aspect of the present invention is to add the monitoring marks on the sample holder, with at least one of their geometric and/optical properties of the monitoring marks under predetermined and known, and taking images of the sample with the monitoring marks, and train a machine learning model using the images with the monitoring mark.

Abstract: An image reading apparatus including: a conveyance path; a light transmitting member; a first reading unit; a second reading unit; a first roller disposed opposite to the first reading unit; a second roller disposed opposite to the second reading unit; a holding member configured to hold the first roller and the second roller; a plurality of first abutment portions provided on both end portion sides in a width direction of the first roller and forming a gap between the light transmitting member and the first roller by abutting on the light transmitting member; a plurality of second abutment portions provided on both end portion sides in the width direction of the second roller and forming a gap between the light transmitting member and the second roller by abutting on the light transmitting member; and an urging member urges the holding member against the light transmitting member.

Abstract: Apparatus and methods for determining wafer characters are disclosed. In one example, an apparatus is disclosed. The apparatus includes: a processing tool configured to process a semiconductor wafer; a device configured to read an optical character disposed on the semiconductor wafer while the semiconductor wafer is located at the apparatus for wafer fabrication; and a controller configured to determine whether the optical character matches a predetermined character corresponding to the semiconductor wafer based on the optical character read in real-time at the apparatus.

Abstract: When a normal inspection and an inspection through deep learning processing is applicable, high inspection accuracy is obtained while reducing a processing time. The normal inspection processing is applied to a newly acquired inspection target image, the non-defective product determination or the defective product determination is confirmed for the inspection target image having the characteristic amount with which the non-defective product determination or the defective product determination is executable based on the characteristic amount within the inspection target image and the threshold for confirming the non-defective product determination or the threshold for confirming the defective product determination.

Abstract: There are provided techniques for characterizing and testing a cable routing connection configuration connection arrangement comprising a plurality of optical fiber links connected between at least a first connection device at a first end and a second multi-fiber connection device at a second end. Test light is injected into one or more of the optical fiber links via corresponding optical fiber ports of the first connection device. At least one image of the second multi-fiber connection device is captured. Test light exiting the optical fiber link(s) through optical fiber port(s) of the second multi-fiber connection device is imaged as light spot(s) in the captured image. Positions on the second multi-fiber connection device that corresponds to the optical fiber port(s) are determined based on a pattern of the light spot(s) in the captured image. In some implementations, the provided techniques allow detection or verification of cable routing connection configurations at multi-fiber distribution panels.

Abstract: An object checking device includes an area specifying unit, an image generator, and a difference specifying unit. The area specifying unit is configured to, based on a feature part extracted from captured image data obtained by capturing an object, specify an area corresponding to the captured image data in 3D model data of the object. The image generator is configured to generate image data of the specified area from the 3D model data. The difference specifying unit is configured to specify a part in which there is a difference between the captured image data and the image data.

Abstract: An apparatus is disclosed for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. The apparatus may incorporate a laser for generating a laser beam, and a tunable mask for receiving the laser beam which has an optically dispersive element. The mask splits the laser beam into a plurality of emergent beams each having a subplurality of beamlets of varying or identical intensity, with each beamlet emerging from a unique subsection of illuminated regions of the mask. A collimator collimates at least one of the emergent beams to form a collimated beam. One or more focusing elements focuses the collimated beam into a focused beam which is projected as a focused image plane on or within the resist material. The focused beam simultaneously illuminates a layer of the resist material to process an entire layer in a parallel fashion.

Abstract: A method of inspection and an inspection system for the film deposition process for substrates that includes glass and wafer are disclosed. The inspection system includes multiple camera modules positioned in a load lock unit of a process chamber, such as the camera modules that can capture images of the substrate in the load lock. The images are analyzed by a control unit of the inspection system to determine the accuracy of robots in handling the substrate, calibration of the robots based on the analysis, and defects in the substrate caused during the handling and deposition process.

Abstract: Disclosed is a data processing system to receive a processing graph of an application. A compile time logic is configured to modify the processing graph and generate a modified processing graph. The modified processing graph is configured to apply a post-padding tiling after applying a cumulative input padding that confines padding to an input. The cumulative input padding pads the input into a padded input. The post-padding tiling tiles the padded input into a set of pre-padded input tiles with a same tile size, tiles intermediate representation of the input into a set of intermediate tiles with a same tile size, and tiles output representation of the input into a set of non-overlapping output tiles with a same tile size. Runtime logic is configured with the compile time logic to execute the modified processing graph to execute the application.

Abstract: The disclosure provides a method for verifying training data, a training system, and a computer program produce. The method includes: receiving a labelled result with a plurality of bounding regions, wherein the labelled result corresponds to an image, the bounding regions are labelled by a plurality of annotators, the annotators comprises a first annotator and a second annotator, and the bounding region comprises a first bounding region labelled by the first annotator and a second bounding region labelled by the second annotator; and determining the first bounding region and the second bounding region respectively corresponds to different two target objects or corresponds to one target object according to a similarity between the first bounding region and the second bounding region.

Abstract: The present disclosure provides a binding device, a display panel, a binding system and an operating method thereof. The binding system includes the binding device and the display panel. The binding device includes a binding head, a support platform, a light emitter and a light receiver. Through a first alignment hole in the binding head, an alignment mark on the display panel and a second alignment hole in the support platform, the binding system monitors in real time a position and/or posture of the binding head, a position and/or flatness of a binding region of the display panel and an alignment degree between the binding head and the display panel using the light emitter and the light receiver.

Abstract: The present invention concerns a method for an artificial neural network to confirm the recognition of handwritten characters produced by a user. The method comprising: training the artificial neural network with a training data set comprising a first set of characters; collecting handwritten characters of a second set of characters produced by the user; and analysing the collected characters of the second set of characters by using the artificial neural network to obtain a first set of probability values comprising character specific probability values for the collected characters, each character specific probability value indicating the probability that the collected character has been correctly interpreted. The analysis considers at least the manner how the collected characters are handwritten and the appearance of the collected characters to obtain the character specific probability values. The invention also relates to a corresponding data processing apparatus.

Abstract: An object characteristic locating device is provided, which includes a camera module and a processing module. The camera module is configured to capture an image from a front scene. The processing module is configured to perform the following operations: locating a position of an image object in the captured image, and determining a framing range with the image object from the captured image; and preforming image processing on the framing range according to a characteristic of the image object, so as to locate the position of an image characteristic portion of the image object in the captured image.

Abstract: Apparatus for inspection includes an imaging assembly, including a plurality of cameras, which are mounted in different, respective locations in the imaging assembly and are configured to capture respective images of a sample. A motion assembly is configured to move at least one of the imaging assembly and the sample so as to cause the imaging assembly to scan the sample with a scan accuracy that is limited by a predetermined position tolerance. An image processor is coupled to receive and process the images captured by the cameras so as to locate a defect in the sample with a position accuracy that is finer than the position tolerance.

Abstract: In a component mounter including a component holding tool configured to hold lead of a lead component, a position of mark given to the component holding tool and a position of a distal end of the lead are calculated based on captured image data, and when a distance between the position of the mark and the position of the distal end of the lead is smaller than a threshold, mounting work is performed, whereas when the distance is equal to or greater than the threshold, the mounting work is not performed. As a result, for example, mounting work on a lead component having a lead which is greatly bent can be avoided, thereby ensuring proper mounting work.

Abstract: An auto-rotation module having a single-layer neural network on a user device can convert a document image to a monochrome image having black and white pixels and segment the monochrome image into bounding boxes, each bounding box defining a connected segment of black pixels in the monochrome image. The auto-rotation module can determine textual snippets from the bounding boxes and prepare them into input images for the single-layer neural network. The single-layer neural network is trained to process each input image, recognize a correct orientation, and output a set of results for each input image. Each result indicates a probability associated with a particular orientation. The auto-rotation module can examine the results, determine what degree of rotation is needed to achieve a correct orientation of the document image, and automatically rotate the document image by the degree of rotation needed to achieve the correct orientation of the document image.

Abstract: An overlay mark includes a first feature extending in an X-direction, wherein the first feature is a first distance from a substrate. The overlay mark further includes a second feature extending in a Y-direction perpendicular to the X-direction, wherein the second feature is a second distance from the substrate, and the second distance is different from the first distance. The overlay mark further includes a third feature extending in the X-direction and the Y-direction, wherein the third feature is a third distance from the substrate, and the third distance is different from the first distance and the second distance.

Abstract: A device for time delay and integration imaging comprises: an array of pixels being arranged in rows and columns extending in a first and second direction, respectively. Pixels may accumulate generated charges in response to received electro-magnetic radiation along each column. The rows comprise at least one lateral charge shifting row to selectively shift accumulated charges in a column to an adjacent column and a controller configured to receive at least two angle correction input values. Each angle correction input value is based on a received intensity of electro-magnetic radiation on a measurement line, wherein the at least two angle correction input values are acquired by measurement lines extending in directions defining different angles in relation to the second direction, wherein the controller is configured to, based on the received at least two angle correction input values, control activation of the at least one lateral charge shifting row.

Abstract: Disclosed are a method and apparatus for adaptively constructing a three-dimensional indoor scenario, the method including: establishing an object association map corresponding to different scenario categories according to an annotated indoor layout; selecting a corresponding target indoor object according to room information inputted by a user and the object association map; generating a target indoor layout according to preset room parameters inputted by the user and the annotated indoor layout; and constructing a three-dimensional indoor scenario according to the target indoor object and the target indoor layout. The disclosed method and apparatus help improving the efficiency in constructing the three-dimensional scenario.

Abstract: Apparatus and methods for determining wafer characters are disclosed. In one example, an apparatus is disclosed. The apparatus includes: a processing tool configured to process a semiconductor wafer; a device configured to read an optical character disposed on the semiconductor wafer while the semiconductor wafer is located at the apparatus for wafer fabrication; and a controller configured to determine whether the optical character matches a predetermined character corresponding to the semiconductor wafer based on the optical character read in real-time at the apparatus.

Abstract: The present disclosure provides a method of leveling a wafer in an exposure process. The wafer includes a plurality of regions. The wafer is loaded to an exposure system. The exposure system includes a control unit and a leveling module. The control unit of the exposure system obtains layout information of the reticle. The control unit of the exposure system assigns critical regions and non-critical regions to the regions on the wafer according to the layout information of the reticle.

Abstract: A method of determining positions of marks, the marks comprising periodic structures, at least some of the structures comprising periodic sub-structures, the sub-structures having a smaller period than the structures, the marks formed with positional offsets between the sub-structures and structures, the positional offsets caused by a combination of both known and unknown components, the method comprising illuminating a plurality of the marks with radiation having different characteristics, detecting radiation diffracted by the marks using one or more detectors which produce output signals, discriminating between constituent parts of the signals, the discriminating based on a variation of the signals as a function of spatial positions of the marks on a substrate, selecting at least one of the constituent parts of the signals, and using the at least one selected constituent part, and information relating to differences between the known components, to calculate a corrected position of at least one mark.

Abstract: A semiconductor wafer includes an alignment mark contained within in a kerf region of the semiconductor wafer. The alignment mark includes a groove vertically extending from a main surface of the semiconductor wafer to a bottom surface of the groove, and at least one tin protruding from the bottom surface of the groove. The groove has a rectangular shape with four sidewalls and four inside corners, with each of the four inside corners facing the at least one fin. A minimum distance between the at least one fin and a nearest one of the four inside corners is at least 25 ?m.

Abstract: The invention relates to a method for manufacturing a first support (100) for forming, in particular with a functionalised second support (200), an optoelectronic component (1), the first support (100) comprising a semiconductor layer (110) and an alignment mark (140) provided on said semiconductor layer (110). The manufacturing method includes in particular a step of forming an aperture (141) in a semiconductor layer (110) comprising cadmium, a step of diffusing cadmium in a second location (142) of the aperture (141) and a cadmium sensitive etching step for promoting etching of one from the second location (142) which is rich in cadmium and the rest of a surface (110B) of the semiconductor layer (110). The invention also relates to a first support (100).

Abstract: A robot setting apparatus includes a positioning unit that adjusts a position and an attitude of a workpiece model, and a grip position specifying unit that specifies a grip position at which the workpiece model is gripped by an end effector for at least one fundamental direction image in a state of displaying at least three height images in which the workpiece model positioned by the positioning unit on the virtual three-dimensional space is viewed from respective axis directions of three axes orthogonal to each other on the display unit as fundamental direction images.

Abstract: A blade pitch measuring device of an un-ducted fan of a turbomachine, the fan including a hub, at least one platform rotatable with respect to the hub and at least one blade mounted on the platform, the device includes at least one first visual marker attached to the platform, at least one second visual marker attached to the hub, the first and the second visual marker forming a pattern which evolves depending on the pitch of the blade, and at least one optical acquisition device, the optical acquisition device being configured to capture an image of the pattern so as to deduce from it the pitch of the blade.

Abstract: A pattern evaluation device has measurement or inspection conditions, supplied for the measurement and inspection of a replica produced by transferring a pattern for a semiconductor wafer or the like, which can be easily set, and with which recipes can be easily generated, when measurement and inspection conditions for the semiconductor wafer or the like and recipes in which these conditions are stored have been prepared in advance. The pattern evaluation device in which a pattern formed on the semiconductor wafer is evaluated on the basis of image data or signal waveforms obtained on the basis of beam irradiation or probe scanning of the semiconductor wafer, wherein the device conditions for evaluating the semiconductor wafer are converted to device conditions for evaluating a replica obtained by transferring a part of a pattern of the semiconductor wafer, and the converted device conditions are used to evaluate the replica.

Abstract: A metrology system includes a controller coupled to a detector to image a sample based on the light captured by an objective lens, where an object plane of the detector with respect to the sample is adjustable. The controller may direct the detector to generate reference images of an overlay target on the sample at multiple object planes including at least a first reference image at a first sample layer and a second reference image at a second sample layer. The controller may further determine a reference overlay between the first layer and the second layer at the overlay target based on the first reference image and the second reference image. The controller may further select a measurement object plane for single-image overlay determination that corresponds to the reference overlay within a selected tolerance. The controller may further determine overlay for additional overlay targets at the measurement plane.

Abstract: A processing data generation program, a processing data generation system, and a processing data generation method are provided for enabling printed matters having various shapes and sizes. A processing data generation apparatus is configured to display a preview image of a template for print data (S121), contain templates for respective pieces of print data of multiple images having designs identical to each other and different sizes, receive designation of a template selected from a group of templates preview images of which are displayed at S121 (S122), identify cut data indicating a size of a cut area that matches the size of an image in the print data corresponding to the template the designation of which has been received at S122, and generate POP data including the cut data and print data created from the print data corresponding to the template the designation of which has been received at S122.

Abstract: Provided are a panel adsorption device and an automatic adsorption method using the same. A position of a liquid crystal panel on a platform is determined by providing a plurality of image capture devices above the platform, and then correspondingly sets the vacuum adsorption hole to a negative pressure state to firmly locate the liquid crystal panel on the platform. Meanwhile, the platform can be compatible with panels of various models and sizes.

Abstract: An encoder includes a base portion, a scale portion that is provided to be relatively movable or rotatable with respect to the base portion, and has three or more marks which are different from each other, an imaging element that is disposed in the base portion, and images the marks, and an estimation portion that selects at least one reference image from among three or more reference images, performs template matching on a captured image in the imaging element by using the reference image, so as to detect positions of the marks, and estimates a movement state or a rotation state of the scale portion with respect to the base portion, in which the estimation portion predicts a reference image to be used for post-template matching on the basis of a result of pre-template matching, and performs the post-template matching by using the predicted reference image.

Abstract: An image comparison method constituted of: receiving images; point matching the images to identify tentatively corresponding points; responsive to the identified points, defining a plurality of first image tiles within the first image; defining a plurality of second image tiles within the second image, each corresponding to a respective first image tile; adjusting the intensity of a set of pixels responsive to the cumulative relative frequency of the respective pixel intensity within the respective tile; for each tile, applying a plurality of non-linear functions; for each function, separately determining a moment of the outcome of the respective non-linear function for each axis of the respective tile; for each first image tile and corresponding second image tile, determining a distance between the subspaces spanned by moment vectors; and responsive to determined distances, determining whether respective first and second image tiles comprise observations of the same portion.

Abstract: Font recognition and similarity determination techniques and systems are described. In a first example, localization techniques are described to train a model using machine learning (e.g., a convolutional neural network) using training images. The model is then used to localize text in a subsequently received image, and may do so automatically and without user intervention, e.g., without specifying any of the edges of a bounding box. In a second example, a deep neural network is directly learned as an embedding function of a model that is usable to determine font similarity. In a third example, techniques are described that leverage attributes described in metadata associated with fonts as part of font recognition and similarity determinations.

Abstract: On the basis of received first region information indicating a first region, which is a region designated for an acquired picked-up image of a plurality of target objects, and second region information indicating a second region different from the first region, a robot control device causes a robot to grip the target object for which the second region not overlapping the first region of another of the target objects is designated and does not cause the robot to grip the target object, the second region for which overlaps the first region of the other target object.

Abstract: An object inspection system enabling a quick and easy registering of a master image and an inspection image when there is a displacement between the master image and the inspection image. The object inspection system includes an imaging section, a movement machine configured to move a first object or a second object and an imaging section relative to each other, a positional data acquisition section configured to acquire positional data of the movement machine when the movement machine disposes the first object or the second object and the imaging section at a relative position, an image data acquisition section configured to acquire a first image of the first object and a second image of the second object, and an image registering section configured to register the first image and the second image.

Abstract: To each of points at a position corresponding to each of candidate points extracted from a target object image in a layer upper than a target object image, an area including the point at the position corresponding to the candidate point and an area threshold are set. As a result of predicting a degree of similarity, in a case where the degree of similarity has a value smaller than the area threshold, calculation of the degree of similarity is terminated in the middle. In a case where the degree of similarity has a value equal to or greater than the area threshold, calculation of the degree of similarity is continued, and in a case where the degree of similarity has a value greater than the area threshold when calculation of the degree of similarity is completed, a next area threshold is updated with a value greater than the area threshold.

Abstract: A method and apparatus for selecting multiple transport formats and transmitting multiple transport blocks (TBs) in a transmission time interval simultaneously with multiple hybrid automatic repeat request (H-ARQ) processes in a wireless communication system are disclosed. Available physical resources and H-ARQ processes associated with the available physical resources are identified and channel quality of each of the available physical resources is determined. Quality of service (QoS) requirements of higher layer data to be transmitted are determined. The higher layer data is mapped to at least two H-ARQ processes. Physical transmission and H-ARQ configurations to support QoS requirements of the higher layer data mapped to each H-ARQ process are determined. TBs are generated from the mapped higher layer data in accordance with the physical transmission and H-ARQ configurations of each H-ARQ process, respectively. The TBs are transmitted via the H-ARQ processes simultaneously.

Abstract: There is provided a system that uses a two-dimensional information code. The system administers an information code which is provided with a data recording region and an image region. The system is provided with a specific information acquisition section that acquires specific information of a subject or an object, as information recorded in the data recording region, or as information to be correlated to the information recorded in the data recording region. Further, the is provided with a unique image acquisition section that acquires a unique image of a subject or an object, or a unique image for specifying the subject or the object, as information indicated in the image region. Further, the system is provided with a registration section that registers specific information acquired by the specific information acquisition section, being correlated to a unique image acquired by the unique image acquisition section.

Abstract: A real-time messaging system platform receives from, a communication application installed on a first user communication device, a first user identifier, an indication that a messaging service message composed by the first user is being directed to a first destination associated with a second user, and an identification of data present in the messaging service message. The identification of the data and a message transmission history of the first user is used to enable selection of a message of a first entity. The selected message of the first entity is caused to be displayed by the communication application within a message framework that frames the first user messaging service message. The first entity message is caused to be included in the messaging service message transmitted to the second user device, wherein the first entity is not provided with access to the identity of the first user or the second user.

Abstract: A method of characterizing a deformation of a plurality of substrates is described. The method includes: measuring, for a plurality of n different alignment measurement parameters ? and for a plurality of substrates, a position of the alignment marks; determining a positional deviation as the difference between the n alignment mark position measurements and a nominal alignment mark position; grouping the positional deviations into data sets; determining an average data set; subtracting the average data set from the data sets to obtain a plurality of variable data sets; performing a blind source separation method on the variable data sets, thereby decomposing the variable data sets into a set of eigenwafers representing principal components of the variable data sets; and subdividing the set of eigenwafers into a set of mark deformation eigenwafers and a set of substrate deformation eigenwafers.

Abstract: Methods and apparatus for inspection of electronic parts such as semiconductor wafers, high-density circuit boards, multi-layer substrates, chrome on glass masks, and other fine line products which compensates for reference misalignment. Conductor linewidth and space measurements are performed along the entire length of every conductor to sub-camera pixel, sub-micron accuracy in real time as the part is scanned. Billions of metrology measurements are also performed in real time to sub-micron accuracy. A self-learning automated method to extract measurement values from Computer Aided Design (CAD) files is described. This method automatically determines locations to perform these billons of operations within defined allowed manufacturing tolerances.

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

Abstract: A scene presented by a headset is adjusted to correct for distortion from optical errors of an optics block in the headset. To correct for the distortion, the scene is pre-distorted when presented based on previously modeled distortion of the optics block, so distortion from the optics block corrects the pre-distortion. To model the distortion, the headset displays calibration image including features and images of the calibration image are captured from multiple positions. Differences between locations of features in the calibration images and locations of corresponding features in captured images of the calibration image are identified and a distortion correction is determined based on the differences.

Abstract: Methods are provided, which estimate a quality of a metrology target by calculating a noise metric of its ROI kernels, derived from application of a Fourier filter on the measured kernel with respect to a periodicity of the target's periodic structure(s); and using the calculated noise metric to indicate the target quality. An additional Fourier filter may be applied perpendicularly on the measured kernel with respect to a periodicity of a perpendicular segmentation of the periodic structure(s), and the (2D) noise metric may be derived by application of both Fourier filters. The estimated noise may be analyzed statistically to provide various types of information on the target.

Abstract: This invention provides a system and method for hand-eye calibration of a vision system using an object under manufacture having at least one feature. The feature can be a linear feature and the object moves in at least one degree of freedom in translation or rotation on a motion stage. The system further comprises at least a first vision system camera and vision processor. The first vision system camera is arranged to acquire an image of the first linear feature on the object under manufacture and to track motion of the first linear feature in response to moving of the motion stage in at least one degree of translation. The first linear feature is identified in at least two different positions along a plane. The system computes a mapping between pixel positions in a pixel coordinate system of the first camera and physical positions in a motion coordinate system based upon locations of the at least two positions.