Oxygen Containing Patents (Class 423/325)
  • Patent number: 12100848
    Abstract: The present invention provides a fiber-reinforced aerogel material which can be used as insulation. The fiber-reinforced aerogel material is highly durable, flexible, and has a thermal performance that exceeds the insulation materials currently used. The fiber-reinforced aerogel insulation material can be as thin as 1 mm or less, and can have a thickness variation as low as 2% or less. Also provided is a method for improving the performance of a battery by incorporating a reinforced aerogel material into the battery. Further provided is a casting method for producing thin fiber-reinforced aerogel materials.
    Type: Grant
    Filed: December 4, 2023
    Date of Patent: September 24, 2024
    Assignee: Aspen Aerogels, Inc.
    Inventors: Owen Evans, Nicholas Zafiropoulos, Shannon White, Wenting Dong, Wendell Rhine
  • Patent number: 12023654
    Abstract: The present disclosure discloses a catalyst and a method for preparing 2-ethoxyphenol by catalytic depolymerization of lignin. The catalyst comprises sepiolite as a carrier and tungsten, nickel and molybdenum as active components supported on sepiolite. The catalyst for preparing 2-ethoxyphenol by catalytic depolymerization of lignin in the present disclosure can catalytically depolymerize lignin, realize the directional preparation of 2-ethoxyphenol from lignin, and co-produce lignin oil. It has a comparatively high selectivity for 2-ethoxyphenol and can achieve a lignin conversion rate of more than 95%, a 2-ethoxyphenol selectivity of more than 20% in a liquid product, and a yield of more than 100 mg/g of lignin.
    Type: Grant
    Filed: April 26, 2021
    Date of Patent: July 2, 2024
    Assignee: Anhui University of Science & Technology
    Inventors: Yishuang Wang, Mingqiang Chen, Jingjing Shi, Zhiyuan Tang, Zhonglian Yang, Jun Wang, Han Zhang
  • Patent number: 12024674
    Abstract: The present disclosure provides methods for inhibiting scale formation in subterranean reservoirs. The methods may include depositing silica-based nanoparticles on a surface of the subterranean reservoir and transporting a scale inhibitor to the surface of the subterranean reservoir. The scale inhibitor may adhere to the silica-based nanoparticles through a chemical interaction. The silica-based nanoparticles may adhere to one or more surfaces within the subterranean reservoir.
    Type: Grant
    Filed: January 5, 2022
    Date of Patent: July 2, 2024
    Assignee: ChampionX LLC
    Inventors: Manojkumar Ramnikalal Bhandari, Renaldo Christmas, Ian Littlehales
  • Patent number: 12024437
    Abstract: In a method for continuously generating silicon monoxide (SiO) gas, wherein a silicon monoxide gas-generating raw material in a raw material supply unit is continuously charged into a reaction chamber RM, an inert gas is flowed through the raw material supply unit so as to be directed toward the charging direction of the silicon monoxide gas-generating raw material. The method for continuously generating silicon monoxide gas prevents a decrease in yield of the silicon monoxide (SiO) gas-generating raw material.
    Type: Grant
    Filed: December 28, 2021
    Date of Patent: July 2, 2024
    Assignee: OSAKA Titanium technologies Co., Ltd.
    Inventor: Yusuke Kashitani
  • Patent number: 11987740
    Abstract: Provided are a silicon nitride film etching composition, a method of etching a silicon nitride film using the same, and a manufacturing method of a semiconductor device. Specifically, a silicon nitride film may be highly selectively etched as compared with a silicon oxide film, and when the composition is applied to an etching process at a high temperature and a semiconductor manufacturing process, not only no precipitate occurs but also anomalous growth in which the thickness of the silicon oxide film is rather increased does not occur, thereby minimizing defects and reliability reduction.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: May 21, 2024
    Assignee: ENF Technology Co., Ltd.
    Inventors: Dong Hyun Kim, Hyeon Woo Park, Sung Jun Hong, Myung Ho Lee, Myung Geun Song, Hoon Sik Kim, Jae Jung Ko, Myong Euy Lee, Jun Hyeok Hwang
  • Patent number: 11978896
    Abstract: A negative electrode active material according to one embodiment of the present disclosure comprises: a composite oxide phase that contains Li, Si, Al and B; and Si particles that are dispersed in the composite oxide phase. Relative to the total number of moles of elements (excluding O) contained in the composite, oxide phase, the content of Li is from 5% by mole to 20% by mole (inclusive), the content of Si is from 50% by mole to 70% by mole (inclusive), the content of Al is from 12% by mole to 25% by mole (inclusive), and the content of B is from 12% by mole to 25% by mole (inclusive).
    Type: Grant
    Filed: August 1, 2019
    Date of Patent: May 7, 2024
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Toshiyuki Nakamori, Yasunobu Iwami, Mai Yokoi, Yohei Uchiyama
  • Patent number: 11870084
    Abstract: The present invention provides a fiber-reinforced aerogel material which can be used as insulation in thermal battery applications. The fiber-reinforced aerogel material is highly durable, flexible, and has a thermal performance that exceeds the insulation materials currently used in thermal battery applications. The fiber-reinforced aerogel insulation material can be as thin as 1 mm less, and can have a thickness variation as low as 2% or less. Also provided is a method for improving the performance of a thermal battery by incorporating a reinforced aerogel material into the thermal battery. Further provided is a casting method for producing thin fiber-reinforced aerogel materials.
    Type: Grant
    Filed: January 27, 2023
    Date of Patent: January 9, 2024
    Assignee: Aspen Aerogels, Inc.
    Inventors: Owen Richard Evans, Nicholas Anthony Zafiropoulos, Shannon Olga White, Wenting Dong, Wendell E. Rhine
  • Patent number: 11784306
    Abstract: A negative electrode includes a current collector and an active substance layer arranged on the current collector, and an ionic conductivity of the active substance layer is 0.01 S/m to 1 S/m. The ionic conductivity of the active substance layer is defined as 0.01 S/m to 1 S/m, so that the electrochemical device can meet requirements for fast charging, and meanwhile, lithium plating on a surface of the negative electrode of the electrochemical device can be inhibited in a fast-charging condition, ensuring safety performance of the electrochemical device.
    Type: Grant
    Filed: March 29, 2021
    Date of Patent: October 10, 2023
    Assignee: Ningde Amperex Technology Limited
    Inventors: Bing Jiang, Kefei Wang
  • Patent number: 11757090
    Abstract: Anode active materials for lithium secondary batteries are provided. According to embodiments of the present disclosure, an anode active material includes: i) a first composite including at least two active silicon materials having different crystal sizes and a silicon oxide (SiOx) material (wherein 0<x?2); ii) a second composite including an active silicon material having a crystal size of about 24 nm or greater and a silicon oxide (SiOx) material(wherein 0<x?2), mixed with a carbonaceous material; or a mixture or combination of (i) and (ii). A lithium secondary battery is provided including an anode including any one of the anode active materials.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: September 12, 2023
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Deokhyun Kim, Jaehyuk Kim, Jaemyung Kim, Soonsung Suh, Hana Yoo, Yungu Cho, Heeyoung Chu
  • Patent number: 11732355
    Abstract: The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: August 22, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Vishwas Kumar Pandey, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Agus Sofian Tjandra, Tobin Kaufman-Osborn, Taewan Kim, Hansel Lo
  • Patent number: 11702592
    Abstract: A ?-sialon phosphor that is a solid solution of europium, in which D50 is 7.0 ?m or more and 20.0 ?m or less and (D50?D10)/D50 is 0.60 or less, where D50 is a 50% area diameter of primary particles of the ?-sialon phosphor, and D10 is a 10% area diameter of the primary particles of the ?-sialon phosphor. Primary particles are defined as single-crystal particles distinguished for each crystal orientation by identifying the crystal orientation of individual particles of the ?-sialon phosphor by an electron backscatter diffraction image method. D50 and D10 are obtained by image analysis of the cross-sectional area of the primary particles.
    Type: Grant
    Filed: November 7, 2019
    Date of Patent: July 18, 2023
    Assignee: DENKA COMPANY LIMITED
    Inventors: Manabu Kobayashi, Keita Kobayashi, Tomohiro Nomiyama, Shintaro Watanabe
  • Patent number: 11697875
    Abstract: The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.
    Type: Grant
    Filed: October 24, 2019
    Date of Patent: July 11, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Vishwas Kumar Pandey, Eric Kihara Shono, Kartik Shah, Christopher S. Olsen, Agus Sofian Tjandra, Tobin Kaufman-Osborn, Taewan Kim, Hansel Lo
  • Patent number: 11673113
    Abstract: The present invention relates to a radionuclide adsorbent, which includes a hollow space (specifically, an area which is entirely empty or in which transition metal oxide particles are present); and a transition metal-ferrocyanide shell (specifically, a transition metal-ferrocyanide shell having a structure in which a plurality of two-dimensional nano flakes overlap or a transition metal-ferrocyanide shell having a structure in which a plurality of three-dimensional nano polyhedrons agglomerate) formed on the space surface, a preparation method thereof, and a method of removing a radionuclide using the same.
    Type: Grant
    Filed: September 4, 2020
    Date of Patent: June 13, 2023
    Assignee: KOREA ATOMIC ENERGY RESEARCH INSTITUTE
    Inventors: Hee Man Yang, Chan Woo Park, Kune Woo Lee, Il Gook Kim, In Ho Yoon
  • Patent number: 11530135
    Abstract: A method of applying a hierarchical porous ZrO2 includes: dissolving a triblock copolymer in an organic solvent to obtain a solution A, dissolving a tannin extract in distilled water to obtain a solution B, mixing the solution A and the solution B and stirring to obtain a mixed solution; adding a zirconium salt to the mixed solution and stirring; heating the mixed solution in an oven to obtain ZrO2, promoting the conversion of the crystal form of ZrO2; calcining ZrO2 at a high temperature to obtain the hierarchical porous ZrO2; mixing the hierarchical porous ZrO2 with a solution containing a lysozyme protein; and absorbing the lysozyme protein to the hierarchical porous ZrO2.
    Type: Grant
    Filed: March 1, 2022
    Date of Patent: December 20, 2022
    Assignee: XI'AN TAIKOMED PHARMACEUTICAL TECHNOLOGY CO., LTD.
    Inventors: Yonghong Tang, Huafeng Qi, Peiyu Zhou, Taotao Qiang, Lei Tian, Lu Chen
  • Patent number: 11527759
    Abstract: A dual porosity cathode for a lithium-air battery made from porous nanographene sponge molded to form a multitude of pores embedded in a polymer layer. The first level of porosity is the interior surface area of the molded pores. The second level of porosity is the interior surface area within the micropores within the porous nanographene sponge material. The dual porosity cathode is useful for a lithium-air battery because of the greatly increased cathode surface area created by the micropores and the very small localized quantities of LiO2 that form in the micropores from the reaction between Li+ and oxygen.
    Type: Grant
    Filed: May 23, 2022
    Date of Patent: December 13, 2022
    Inventor: Slobodan Petrovic
  • Patent number: 11485892
    Abstract: Provided is a method for producing a silica aerogel blanket having high thermal insulation and high strength, wherein an acicular metal-silica composite is added to a step of preparing a silica precursor solution during the production of the silica aerogel blanket to produce a silica aerogel blanket having characteristics of high thermal insulation, high strength, high thermal resistance and low dust.
    Type: Grant
    Filed: August 29, 2018
    Date of Patent: November 1, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Tae Gyeong Kang, Je Kyun Lee, Kyoung Shil Oh, Hyun Woo Jeon
  • Patent number: 11332578
    Abstract: The present invention is directed to a polyimide resin comprising a structural unit A derived from a tetracarboxylic dianhydride and a structural unit B derived from a diamine, wherein the structural unit A contains a structural unit (A-1) derived from 4,4?-(hexafluoroisopropylidene)diphthalic anhydride, and the structural unit B contains a structural unit derived from an aliphatic diamine, a polyimide resin composition comprising the polyimide resin and inorganic nanoparticles, and a polyimide film comprising the polyimide resin or the polyimide resin composition. Provided are a polyimide resin and a polyimide resin composition, each of which can form a film having not only a heat resistance, and colorlessness and transparency but also low water absorption properties, and a polyimide film.
    Type: Grant
    Filed: May 1, 2017
    Date of Patent: May 17, 2022
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Yohei Abiko, Shuya Suenaga, Shinji Sekiguchi
  • Patent number: 11299400
    Abstract: A method for preparing a hierarchical porous ZrO2 includes the following steps: S1, dissolving a triblock copolymer in an organic solvent to obtain a solution A, dissolving a tannin extract in distilled water to obtain a solution B, mixing the solution A and the solution B and stirring to obtain a mixed solution; S2, adding a zirconium salt to the mixed solution obtained in step S1 and stirring; S3, heating the mixed solution obtained in step S2 in an oven to obtain ZrO2, promoting the conversion of the crystal form of ZrO2; S4, calcining ZrO2 at a high temperature to obtain the hierarchical porous ZrO2.
    Type: Grant
    Filed: March 20, 2020
    Date of Patent: April 12, 2022
    Assignee: SHAANXI UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Taotao Qiang, Lei Tian, Runtong Zhu, Lu Chen
  • Patent number: 10794882
    Abstract: An embodiment provides a method for measuring fluoride concentration in an aqueous solution, including: preparing a polyethylene glycol (PEG) monomethyl ether to produce an ester; reacting the ester in the presence of ammoniated tetrahydrofuran to produce an amino polyethylene glycol; placing, in a solution comprising a benzaldehyde species with a phenol functional group and a carboxylic acid functional group, a 2,3,3-trimethylindolenine derivative to produce a hemicyanine with a phenol functional group and a carboxylic acid functional group; combining, in a polar aprotic solvent, the hemicyanine with the phenol functional group and carboxylic acid functional group with a 1,1-carbonyldiimidazole (CDI) and adding the amino-PEG to produce a hemicyanine-PEG; and creating a fluoride sensitive hemicyanine species by reacting the hemicyanine-PEG that contains a phenol functional group with a SiR3 species. Other embodiments are described and claimed.
    Type: Grant
    Filed: April 12, 2018
    Date of Patent: October 6, 2020
    Assignee: HACH COMPANY
    Inventors: Darren Kent MacFarland, Angella Nicholle Greenawalt
  • Patent number: 10613098
    Abstract: The invention relates to a material, process and method for the selective analysis of small molecules. Particularly the invention provides a material and a technique for the analysis of small molecules excluding other large molecular weight (MW) analytes. The process involves selective detection of low molecular weight molecules from a sample comprising the steps of placing said sample with SBA-15 particles; and subjecting the same to desorption ionization mass spectrometry, wherein low molecular weight molecules are selectively detected over the higher molecular weight molecules. A kit for the selective analysis of small molecules is also provided.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: April 7, 2020
    Assignees: Council of Scientific and Industrial Research, Jawaharlal Nehru University
    Inventors: Dipankar Ghosh, Venkateswarlu Panchagnula, Deepika Dhaware
  • Patent number: 10541407
    Abstract: The present disclosure provides a method of producing high purity SiOx nanoparticles with excellent volatility and an apparatus for producing the same, which enables mass production of SiOx nanoparticles by melting silicon through induction heating and injecting gas to a surface of the molten silicon. The apparatus includes a vacuum chamber, a graphite crucible into which raw silicon is charged, the graphite crucible being mounted inside the vacuum chamber, an induction melting part which forms molten silicon by induction heating of the silicon material received in the graphite crucible, a gas injector which injects a gas into the graphite crucible to be brought into direct contact with a surface of the molten silicon, and a collector disposed above the graphite crucible and collecting SiOx vapor produced by reaction between the molten silicon and the injected gas.
    Type: Grant
    Filed: August 6, 2013
    Date of Patent: January 21, 2020
    Assignee: KOREA INSTITUTE OF ENERGY RESEARCH
    Inventors: Bo-Yun Jang, Jin-Seok Lee, Joon-Soo Kim
  • Patent number: 10519371
    Abstract: A luminescent material may include the formula (MB) (TA)3?2x(TC)1+2xO4?4xN4x:E where 0<x<0.875. —TA may be selected from a group of monovalent metals, such as Li, Na, Cu, Ag, and combinations thereof. —MB may be selected from a group of divalent metals including Mg, Ca, Sr, Ba, Zn, and combinations thereof. —TC may be selected from a group of trivalent metals including B, Al, Ga, In, Y, Fe, Cr, Sc, rare earth metals, and combinations thereof. —E may be selected from a group including Eu, Mn, Ce, Yb, and combinations thereof.
    Type: Grant
    Filed: November 10, 2017
    Date of Patent: December 31, 2019
    Assignee: OSRAM OPTO SEMICONDUCTORS GMBH
    Inventors: Markus Seibald, Dominik Baumann, Thorsten Schroeder, Stefan Lange, Gregor Hoerder, Gina Maya Achrainer, Hubert Huppertz, Simon Peschke, Alexey Marchuk, Philipp Schmid, Franziska Hummel, Stephanie Dirksmeyer
  • Patent number: 10508175
    Abstract: A composition including a polyamideimide precursor modified with an alkoxysilane group and an oligosilica compound, wherein the oligosilica compound is a condensation reaction product of an organosilane diol and an alkoxysilane compound.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: December 17, 2019
    Assignees: SAMSUNG ELECTRONICS CO., LTD., SAMSUNG SDI CO., LTD.
    Inventors: Sungwon Choi, Chanjae Ahn, Hyunjeong Jeon, Sang Soo Jee, Byunghee Sohn, Won Suk Chang
  • Patent number: 10000514
    Abstract: An object of the present invention is to provide a method for producing tetraalkoxysilane while saving energy at a high yield. Tetraalkoxysilane can be produced while saving energy at a high yield by the method including a first step of reacting alcohol with carbon dioxide in the presence of a dehydrating agent and/or in a reactor provided with a dehydrating means, and a second step of reacting a reaction mixture obtained in the first step with silicon oxide.
    Type: Grant
    Filed: April 30, 2015
    Date of Patent: June 19, 2018
    Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Norihisa Fukaya, Seong-Jib Choi, Jun-Chul Choi, Toshio Horikoshi, Kazuhiko Sato, Hiroyuki Yasuda
  • Patent number: 9862863
    Abstract: Embodiments of the invention provide a polishing composition including colloidal silica having an average particle size of 5 to 200 nm and pulverized wet-process silica particles having an average particle size of 0.1 to 1.0 ?m, wherein a value of the ratio of the average particle size of the wet-process silica particles to that of the colloidal silica is from 2.0 to 30.0. The polishing composition, according to various embodiments, achieves a high polishing rate and has a good surface smoothness, without the use of alumina particles.
    Type: Grant
    Filed: September 28, 2016
    Date of Patent: January 9, 2018
    Assignee: YAMAGUCHI SEIKEN KOGYO CO., LTD.
    Inventors: Toru Iwata, Akira Sugawa
  • Patent number: 9801908
    Abstract: The present disclosure relates to treatment of chitin-containing microorganism infection or colonization on an aquatic animal. The methods, systems, and kits provided herein facilitate termination and/or inhibition of proliferation of chitin-containing microorganisms (e.g., Saprolegnia and sea lice).
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: October 31, 2017
    Assignee: BENCHMARK ANIMAL HEALTH LIMITED
    Inventors: Shimaa E. Ali, Even Thoen, Ida Skaar, Øystein Evensen
  • Patent number: 9790095
    Abstract: A silicon oxide deposit is continuously prepared by feeding a powder feed containing silicon dioxide powder to a reaction chamber, heating the feed at 1,200-1,600° C. to produce a silicon oxide vapor, delivering the vapor to a deposition chamber through a transfer line which is maintained at or above the temperature of the reaction chamber, for thereby causing silicon oxide to deposit on a cool substrate, and removing the silicon oxide deposit from the deposition chamber. Two deposition chambers are provided, and the step of delivering the vapor is alternately switched from one to another deposition chamber.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: October 17, 2017
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masanobu Nishimine, Hirofumi Fukuoka
  • Patent number: 9708531
    Abstract: A fluorescent substance is provided having excellent temperature properties and capable of being excited by light in the region from near ultraviolet to short-wavelength visible light to emit light of yellow to red color. A process for producing the fluorescent substance, and a light emitting device using the fluorescent substance is also provided. The fluorescent substance includes M which is at least one group II element selected from Ca, Sr, and Ba, and Al, Si, O, and N, and activated with Eu. The fluorescent substance has an X-ray diffraction pattern using CuK? radiation, in which the intensity of the diffraction peak in the Bragg angle range of 17.9° to 18.5° is taken as 100%, the relative intensity of the diffraction peak is 150% to 310% in a Bragg angle range of 24.5° to 25.1° , and is 320% to 550% in a Bragg angle range of 34.8° to 35.4°.
    Type: Grant
    Filed: February 26, 2010
    Date of Patent: July 18, 2017
    Assignee: NICHIA CORPORATION
    Inventors: Takayuki Shinohara, Shoji Hosokawa
  • Patent number: 9704713
    Abstract: In one aspect, the present invention provides undoped and doped siloxanes, germoxanes, and silagermoxanes that are substantially free from carbon and other undesired contaminants. In a second aspect, the present invention provides methods for making such undoped and doped siloxanes, germoxanes, and silagermoxanes. In still another aspect, the present invention provides compositions comprising undoped and/or doped siloxanes, germoxanes, and silagermoxanes and a solvent, and methods for forming undoped and doped dielectric films from such compositions. Undoped and/or doped siloxane compositions as described advantageously provide undoped and/or doped dielectric precursor inks that may be employed in forming substantially carbon-free undoped and/or doped dielectric films.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: July 11, 2017
    Assignee: Thin Film Electronics ASA
    Inventors: Wenzhuo Guo, Brent Ridley, Joerg Rockenberger
  • Patent number: 9512371
    Abstract: A support for hydrocracking catalyst of hydrocarbon oil, which comprises a modified zeolite obtained by incorporating titanium into a faujasite-type zeolite, wherein the modified zeolite satisfies conditions (a) to (e) as described, and to a hydrocracking catalyst employing the support and a method for hydrocracking of hydrocarbon oil containing aromatics using the catalyst.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: December 6, 2016
    Assignee: COSMO OIL CO., LTD.
    Inventors: Masaki Abe, Akira Takaya, Hiroshi Munakata
  • Patent number: 9441095
    Abstract: A method of producing hollow silica microparticles that suppress whitening of a transparent coating film and show excellent abrasion resistance and adhesiveness. The method includes preparation of an organosol in which hollow silica microparticles are dispersed with the silica concentration of 1 to 70 W % and addition of a silane compound and an alkali catalyst to the organosol at a temperature in the range from 30° C. to 300° C. to react the silane compound to the hollow silica microparticles under the condition where a quantity of water against the added silica (the hollow silica microparticles) is in the range from 0.1 to 50 W %.
    Type: Grant
    Filed: January 18, 2012
    Date of Patent: September 13, 2016
    Assignee: JGC CATALYSTS AND CHEMICALS LTD.
    Inventors: Ryota Sueyoshi, Ryo Maruguchi, Masayuki Matsuda, Mitsuaki Kumazawa, Toshiharu Hirai
  • Patent number: 9293763
    Abstract: Particulate silicon oxide having a Cu content of 100-20,000 ppm, an Fe content of 20-1,000 ppm, an Al content of up to 1,000 ppm, an average particle size of 0.1-30 ?m, and a BET specific surface area of 0.5-30 m2/g is used as negative electrode material in constructing a nonaqueous electrolyte secondary battery. The secondary battery is improved in cycle performance while maintaining the high battery capacity and low volume expansion of silicon oxide.
    Type: Grant
    Filed: October 22, 2013
    Date of Patent: March 22, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hirofumi Fukuoka, Mitsugu Saito, Susumu Ueno, Tetsuya Inukai
  • Patent number: 9260313
    Abstract: The present invention relates to a process for the preparation of a silicate compound, comprising (1) providing at least one layered silicate; and (2) mixing said layered silicate with water and at least one silicon containing compound according to formula R4-mSi[—(SiR2)n—R]m wherein at least one residue R is a leaving group and none of the residues R contains Si; m is 0, 1, 2, 3, or 4; and n is an integer greater than or equal to 0.
    Type: Grant
    Filed: March 3, 2010
    Date of Patent: February 16, 2016
    Assignees: BASF SE, Tokyo Institute of Technology
    Inventors: Bilge Yilmaz, Ulrich Müller, Feng-Shou Xiao, Hermann Gies, Takashi Tatsumi, Dirk de Vos, Xinhe Bao, Weiping Zhang
  • Patent number: 9234098
    Abstract: The present invention relates to a process for producing a nanocomposite material from a) at least one inorganic or organometallic metal phase; and b) an organic polymer phase; comprising the polymerization of at least one monomer M which have at least one first polymerizable monomer unit A which has a metal or semimetal M, and at least one second polymerizable organic monomer unit B which is joined to the polymerizable unit A via a covalent chemical bond, under polymerization conditions under which both the polymerizable monomer unit A and the polymerizable unit B polymerize with breakage of the bond between A and B, the monomers M to be polymerized comprising a first monomer M1 and at least one second monomer M2 which differs at least in one of the monomer units A and B from the monomer M1 (embodiment 1), or the monomers to be polymerized comprising, as well as the at least one monomer M, at least one further monomer other than the monomers M, i.e.
    Type: Grant
    Filed: April 1, 2010
    Date of Patent: January 12, 2016
    Assignee: BASF SE
    Inventors: Hannah Maria König, Hans-Joachim Hähnle, Arno Lange, Samira Nozari, Gerhard Cox, Rainer Dyllick-Brenzinger, Stefan Spange, Tina Löschner
  • Patent number: 9193597
    Abstract: The present invention provides a method for obtaining high purity chlorosilanes from chlorosilanes containing boron impurities and phosphorus impurities. On the basis of the finding that solid by-product formation in the purification of chlorosilanes by adding an aromatic aldehyde results from a catalytic reaction by iron ions or rust-like iron, a Lewis base having a masking effect is added to chlorosilanes. Examples of the Lewis base include a divalent sulfur-containing compound and an alkoxysilane. The divalent sulfur-containing compound is preferably a compound represented by the formula: R—S—R? (wherein R is a hydrocarbon group or a carbonyl group; and the sum of the carbon atoms in R and R? is 7 or more), and the alkoxysilane is preferably a compound represented by the formula: RxSi(OR?)4-x (wherein R and R? are each an alkyl group having 1 to 20 carbon atoms).
    Type: Grant
    Filed: July 7, 2010
    Date of Patent: November 24, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Nagai, Takaaki Shimizu, Katsuhiro Uehara, Tohru Kubota
  • Publication number: 20150119569
    Abstract: The present invention relates to a full-Si molecular sieve, wherein the full-Si molecular sieve has a Q4/Q3 of (10-90):1.
    Type: Application
    Filed: October 29, 2014
    Publication date: April 30, 2015
    Inventors: Xingtian SHU, Changjiu XIA, Min LIN, Bin ZHU, Xinxin PENG, Aiguo ZHENG, Mudi XIN, Yanjuan XIANG, Chunfeng SHI
  • Publication number: 20150110699
    Abstract: Disclosed is an apparatus and method for manufacturing SiO, which may lower a manufacturing cost of SiO by collecting SiO continuously. The apparatus for manufacturing SiO includes a reaction unit configured to receive a SiO-making material and bring the received material into reaction by heating to generate a SiO gas; and a collecting unit configured to maintain an internal temperature lower than an internal temperature of the reaction unit, the collecting unit including a rotating member in an inner space thereof, wherein the collecting unit collects a SiO deposit by introducing the SiO gas generated by the reaction unit through an inlet formed at least at one side thereof and allowing the introduced SiO gas to be deposited to a surface of the rotating member.
    Type: Application
    Filed: December 31, 2014
    Publication date: April 23, 2015
    Inventors: Sang-Yun JUNG, Han-Nah JEONG, Cheol-Hee PARK, Chee-Sung PARK, Jae-Hyun KIM
  • Publication number: 20150098887
    Abstract: A polishing liquid comprising an abrasive grain, an additive, and water, wherein the abrasive grain includes a hydroxide of a tetravalent metal element, produces absorbance of 1.00 or more and less than 1.50 for light having a wavelength of 400 nm in an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass %, and produces absorbance of 0.035 or more for light having a wavelength of 400 nm in a liquid phase obtained when centrifuging an aqueous dispersion having a content of the abrasive grain adjusted to 1.0 mass % for 50 minutes at a centrifugal acceleration of 1.59×105 G.
    Type: Application
    Filed: March 26, 2013
    Publication date: April 9, 2015
    Inventors: Tomohiro Iwano, Hisataka Minami, Toshiaki Akutsu, Koji Fujisaki
  • Publication number: 20150079398
    Abstract: Embodiments of a layered-substrate comprising a substrate and a layer disposed thereon, wherein the layered-substrate is able to withstand fracture when assembled with a device that is dropped from a height of at least 100 cm onto a drop surface, are disclosed. The layered-substrate may exhibit a hardness of at least about 10 GPa or at least about 20 GPa. The substrate may include an amorphous substrate or a crystalline substrate. Examples of amorphous substrates include glass, which is optionally chemically strengthened. Examples of crystalline substrates include single crystal substrates (e.g. sapphire) and glass ceramics. Articles and/or devices including such layered-substrate and methods for making such devices are also disclosed.
    Type: Application
    Filed: September 10, 2014
    Publication date: March 19, 2015
    Inventors: Jaymin Amin, Alexandre Michel Mayolet, Charles Andrew Paulson, James Joseph Price, Kevin Barry Reiman
  • Patent number: 8961918
    Abstract: A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiOx.
    Type: Grant
    Filed: February 10, 2012
    Date of Patent: February 24, 2015
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Shih-Wei Chang, Jeffrey D. Weinhold, Phillip D. Hustad, Peter Trefonas
  • Publication number: 20150023860
    Abstract: A facile method to produce covalently bonded graphene-like network coated on various solid substrates is disclosed in the present invention. According to one embodiment, a combination of chemical vapor deposition (CVD) of carbon sources and a silicon compound with or without a metal containing compound under an inert gas flow is processed at high temperatures to produce covalent carbide bonding among graphene-like structures and between graphene-like structures and substrate surface.
    Type: Application
    Filed: July 18, 2014
    Publication date: January 22, 2015
    Inventors: LYJames Lee, Jianfeng Yu, Ying-Chieh Yen
  • Patent number: 8932548
    Abstract: A silicon oxide for use as a negative electrode active material of a lithium-ion secondary battery is characterized by: a g-value measured by an ESR spectrometer is in the range of not less than 2.0020 to not more than 2.0050; and given that A, B, and C are the area intensities of peaks near 420 cm?1, 490 cm?1 and 520 cm?1 respectively in a Raman spectrum measured by a Raman spectroscopy, A/B is not less than 0.5 and C/B is not more than 2. The lithium-ion secondary battery has excellent cycle characteristic and initial efficiency in addition to high capacity. The silicon oxide preferably has a spin density in the range of not less than 1×1017 spins/g to not more than 5×1019 spins/g. A negative electrode material for the lithium-ion secondary battery contains not less than 20% by mass of this silicon oxide as a negative electrode active material.
    Type: Grant
    Filed: April 21, 2010
    Date of Patent: January 13, 2015
    Assignee: OSAKA Titanium technologies Co., Ltd.
    Inventor: Shingo Kizaki
  • Patent number: 8906973
    Abstract: Disclosed and claimed herein are hybrid silica aerogels containing non-polymeric, functional organic materials covalently bonded at one or both ends to the silica network of the aerogels through a C—Si bond between a carbon atom of the organic material and a silicon atom of the aerogel network. Methods of their preparation are also disclosed.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: December 9, 2014
    Assignee: Aspen Aerogels, Inc.
    Inventors: Wendell E Rhine, Decio Coutinho, Kiranmayi Deshpande
  • Publication number: 20140349190
    Abstract: Provided is a silicon oxide for an anode of a secondary battery, having a good mechanical lifespan and electrical properties, and a method for preparing the same and an anode of a secondary battery using the silicon oxide. According to the method, a mixture is prepared by mixing SiCl4 and ethylene glycol, a gel is manufactured by stirring the mixture, and the gel is heat treated to prepare silicon oxide for an anode of a secondary battery.
    Type: Application
    Filed: February 10, 2012
    Publication date: November 27, 2014
    Applicant: Yeil Electronics Co., Ltd.
    Inventor: Yun-Kyu Kang
  • Publication number: 20140336274
    Abstract: The present invention is directed to a process for producing inorganic particulate material, the material obtainable by such process, a modified release delivery system comprising the material and the use of the material for the administration of a bioactive agent.
    Type: Application
    Filed: April 25, 2012
    Publication date: November 13, 2014
    Applicant: MERCK PATENT GMBH
    Inventors: Mario Maio, Eugenia Breininger, Karin Cabrera Perez, Ulrich Lang, Benjamin Peters, Thomas Puchert, Christoph Saal, Michael Schulz
  • Publication number: 20140322546
    Abstract: A thermally oxidized heterogeneous composite substrate provided with a single crystal silicon film on a handle substrate, said heterogeneous composite substrate being obtained by, prior to a thermal oxidization treatment at a temperature exceeding 850° C., conducting an intermediate heat: treatment at 650-850° C. and then conducting the thermal oxidization treatment at a temperature exceeding 850° C. According to the present invention, a thermally oxidized heterogeneous composite substrate with a reduced number of defects after thermal oxidization can be obtained.
    Type: Application
    Filed: January 11, 2013
    Publication date: October 30, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Shoji Akiyama, Yuji Tobisaka, Kazutoshi Nagata
  • Publication number: 20140308193
    Abstract: A silicon oxide deposit is continuously prepared by feeding a powder feed containing silicon dioxide powder to a reaction chamber, heating the feed at 1,200-1,600° C. to produce a silicon oxide vapor, delivering the vapor to a deposition chamber through a transfer line which is maintained at or above the temperature of the reaction chamber, for thereby causing silicon oxide to deposit on a cool substrate, and removing the silicon oxide deposit from the deposition chamber. Two deposition chambers are provided, and the step of delivering the vapor is alternately switched from one to another deposition chamber.
    Type: Application
    Filed: February 28, 2013
    Publication date: October 16, 2014
    Inventors: Masanobu Nishimine, Hirofumi Fukuoka
  • Publication number: 20140286846
    Abstract: A process for preparing a mesoporous metal oxide, i.e., transition metal oxide, Lanthanide metal oxide, a post-transition metal oxide and metalloid oxide. The process comprises providing a micellar solution comprising a metal precursor, an interface modifier, a hydrotropic ion precursor, and a surfactant; and heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous metal oxide. A mesoporous metal oxide prepared by the above process. A method of controlling nano-sized wall crystallinity and mesoporosity in mesoporous metal oxides. The method comprises providing a micellar solution comprising a metal precursor, an interface modifier, a hydrotropic ion precursor, and a surfactant; and heating the micellar solution at a temperature and for a period of time sufficient to control nano-sized wall crystallinity and mesoporosity in the mesoporous metal oxides. Mesoporous metal oxides and a method of tuning structural properties of mesoporous metal oxides.
    Type: Application
    Filed: September 25, 2013
    Publication date: September 25, 2014
    Applicant: UNIVERSITY OF CONNECTICUT
    Inventors: Steven L. Suib, Altug Suleyman Poyraz
  • Patent number: 8834600
    Abstract: The present invention relates to a zero-waste process for extraction of alumina from different types of bauxite ores and red mud residues and of titanium dioxide from ilmenite. Iron oxide is first reduced to metallic iron above the melting point of C-saturated cast iron alloy which yields a high-C iron alloy and an Al and Ti metal oxide rich slag which is then treated with alkali carbonate to form alkali aluminates and titanates. The alkali aluminates are separated by water leaching from which the hydroxide of alumina is precipitated by bubbling C02. The residue from water leaching is treated with sulphuric acid and Ti02 is precipitated via a hydrolysis route. The process recovers most of the metal values and generates only small quantities of silicious residues at pH 4-5 which can be used for soil conditioning.
    Type: Grant
    Filed: June 11, 2004
    Date of Patent: September 16, 2014
    Assignee: The University of Leeds
    Inventors: Animesh Jha, Pailo Antony Malpan, Vilas Dattatray Tathavadkar
  • Publication number: 20140241972
    Abstract: A process for preparing structures of crosslinked silicon oxide which are mesoporous structures wherein, a portion of the materials used in the preparation of the structures are recycled for use in the preparation of additional structures.
    Type: Application
    Filed: November 19, 2012
    Publication date: August 28, 2014
    Inventors: Beata A. Kilos, Cathy L. Tway, Scott T. Matteucci, Anne M. Kelly-Rowley