Abstract: Disclosed are compositions comprising a compound having the formula CF3(CF2)xCF?CFCF(OR)(CF2)yCF3, wherein R is CH3 or C2H5 or mixtures thereof, and wherein x and y are independently 0, 1, 2 or 3, and wherein x+y=1, 2 or 3. Also disclosed are unsaturated fluoroethers selected from the group consisting of CF3(CF2)xCF?CFCF(OR)(CF2)yCF3, CF3(CF2)xC(OR)?CFCF2(CF2)yCF3, CF3CF?CFCF(OR)(CF2)x(CF2)yCF3, CF3(CF2)xCF?C(OR)CF2(CF2)yCF3, and mixtures thereof, wherein R can be either CH3, C2H5 or mixtures thereof, and wherein x and y are independently 0, 1, 2 or 3, and wherein x+y=0, 1, 2 or 3. Also disclosed herein are novel methods of using a composition comprising at least one of the compounds described above as novel solvents, carrier fluids, dewatering agents, degreasing solvents or defluxing solvents.

Abstract: Porous films with straight pores oriented normal to the plane of the films are produced through solution processing techniques. The production takes advantage of inorganic-surfactant or inorganic-polymer co-assembly and a patterned substrate. The patterned substrate, which is also produced via solution phase self-assembly, forces vertical orientation in a hexagonal cylinder system with no practical limits in substrate size or type. This provides a route to vertically oriented inorganic pores with a pitch ranging from 3 nm to over 15 nm and pore sizes ranging from 2 nm to over 12 nm. The size is tuned by choice the choice of organic templating agents and the deposition conditions. The pores can be produced with or without a capping layer which can be used to seal the nanopores.

Abstract: A zero-valent metal polymeric complex supporter (ZVM-PCS) is disclosed. The PCS possesses porous surface and internal coralloid-like channel structure that can accommodate high amount of iron-containing materials and derivatives thereof. The surface pore size, porosity, hydrophilicitv, and internal coralloid-like channel structure of PCS can be tailored through the manufacturing process, with which PCS can be functioned as a regulator for the releasing of produced hydrogen, and also control the adsorption and reactions toward heavy metals and chlorinated volatile organic compounds in water. The hydrogen released from the ZVM-PCS can be applied to anaerobic bioremediation. Moreover, the ZVM-PCS can be filter materials that can be installed in a column or any storage for water and wastewater treatment, or even in a groundwater cut-off barrier for the cleanup of contamination.

Abstract: To provide a substrate treatment apparatus capable of suppressing adherence of dust to a film coated on a substrate. As an aspect of the present invention is a substrate treatment apparatus provided with a spin-coating treatment chamber 4a for coating a film on the substrate by spin-coating, a first air-conditioning mechanism that regulates an amount of dust in the air in the spin-coating treatment chamber, an annealing treatment chamber 7a for performing lamp annealing treatment on the film coated on the substrate, a conveying chamber 2a that is connected to each of the spin-coating treatment chamber and the annealing treatment chamber and is for conveying the substrate between the spin-coating treatment chamber and the annealing treatment chamber each other, and a second air-conditioning mechanism that regulate an amount of dust in the air in the conveying chamber.

Abstract: In one embodiment, a method for treating a textile with an antimicrobial composition includes preparing an antimicrobial composition that includes water, an organic acid, chitosan, and one or more heterocyclic N-halamine compounds, preparing an aqueous solution that comprises the antimicrobial composition, applying the aqueous solution to a textile, and heating the textile to cure the antimicrobial composition.

Abstract: The present invention relates to a method the synthesis and utilization of random, cross-linked, substituted polystyrene copolymers as polymeric cross-linked surface treatments (PXSTs) to control the orientation of physical features of a block copolymer deposited over the first copolymer. Such methods have many uses including multiple applications in the semi-conductor industry including production of templates for nanoimprint lithography.

Abstract: A transfer flow is produced in accordance with a process recipe of a process to be carried out. In the transfer flow, a type of modules listed in accordance with a substrate transfer order is associated with a necessary staying time from when the substrate is transferred into a module by a substrate transfer unit to when the substrate is ready to be transferred back to the substrate transfer unit after the corresponding process is finished. A cycle limiting time is determined to be the longest necessary transfer cycle time among those obtained by dividing the necessary staying time by the number of the modules mounted in the coater/developer. The number of the modules to be used is determined to be a value obtained by dividing the necessary staying time by the cycle limiting time or a nearest integer to which the value is raised.

Abstract: Provided may be a method of manufacturing a silicon (Si) film by using a Si solution process. According to the method of manufacturing the Si film, the Si film may be manufactured by preparing a Si forming solution. The ultraviolet rays (UV) may be irradiated on the prepared Si forming solution. The Si forming solution may be coated on a substrate and a solvent in the Si forming solution may be coated on the substrate. An electron beam may be irradiated on the Si forming solution from which the solvent is removed.

Abstract: The present invention discloses diblock copolymer systems that self-assemble to produce very small structures. These co-polymers consist of one block that contains silicon and another block comprised of an oligosaccharide that are coupled by azide-alkyne cycloaddition.

Abstract: The present invention relates to a silver complex obtained by reacting at least one silver compound represented by the formula 2 below with at least one ammonium carbamate compound or ammonium carbonate compound represented by the formula 3, 4 or 5 below:

Abstract: A composite epoxy resin consisting in a SU-8 epoxy resin, a solvent, with or without photoinitiator and carbon nanotubes in powder. When the resin is combined with the carbon nanotubes, the mechanical, thermal and electrical properties of the nanocomposite are enhanced. That offers a wide range of composites which can be used with different micro-fabrication techniques, such as: lamination, spin-coating, spraying and screening for assembly, interconnect and packaging applications.

Abstract: The present disclosure relates to methods and systems for synthesis of bridged-hydropentacene, hydroanthracene and hydrotetracene from the precursor compounds pentacene derivatives, tetracene derivatives, and anthracene derivatives. The invention further relates to methods and systems for forming thin films for use in electrically conductive assemblies, such as semiconductors or photovoltaic devices.

Abstract: A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

Abstract: This invention pertains to method for imparting a durable antimicrobial activity to substrates, particularly textiles. An acetate-free metal and peroxide antimicrobial treatment formulation is prepared by adjusting the pH of a mixture of a metal salt in aqueous hydrogen peroxide to about 7.5. The substrate is treated with the composition and dried to afford the treated substrate with antimicrobial activity. Zinc salts, ions, or complexes are preferred.

Abstract: The invention is a coating apparatus including: a substrate-holding part that holds a substrate horizontally; a chemical nozzle that supplies a chemical to a central portion of the substrate horizontally held by the substrate-holding part; a rotation mechanism that causes the substrate-holding part to rotate to thereby spread out the chemical on a surface of the substrate by centrifugal force, for coating the whole surface with the chemical; a gas-flow-forming unit that forms a down flow of an atmospheric gas on the surface of the substrate horizontally held by the substrate-holding part; a gas-discharging unit that discharges an atmosphere around the substrate; and a gas nozzle that supplies a laminar-flow-forming gas to the surface of the substrate, the laminar-flow-forming gas having a coefficient of kinematic viscosity larger than that of the atmospheric gas; wherein the atmospheric gas or the laminar-flow-forming gas are supplied to the central portion of the substrate.

Abstract: A method and associated structure. A substrate is provided. The substrate has an energetically neutral corrugated surface layer. A film is formed on the corrugated surface layer. The film includes a combination of a di-block copolymer and a stiffening compound. The di-block copolymer includes lamellar microdomains of a first polymer block and lamellar microdomains of a second polymer block. The stiffening compound is dissolved within the first polymer block. At least one lamellar microdomain is removed from the film such that an oriented structure remains on the surface layer.

Abstract: A method is disclosed for spin coating a stent. The method comprises conducting the following acts at the same time: applying a coating substance to the stent; rotating the stent about a first axis of rotation; and rotating the stent about a second axis of rotation.

Abstract: A printing device (10) including a substrate (22) having an aperture (20) extending therethrough, wherein the aperture includes a side wall and defines a liquid ink flow path, an ink firing chamber (24) fluidically connected to the aperture, and a coating positioned on the side wall of the aperture, the coating being impervious to etching by liquid ink, and wherein the coating is chosen from one of silicon dioxide, aluminum oxide, hafnium oxide and silicon nitride.

Abstract: The present invention provides nanocomposite materials comprising carbon nanotubes and oligo(p-phenylenevinylene) (OPV). Dispersion of CNT in the solution of solution of oligo(p-phenylenevinylene) (OPV) in organic solvent results in the formation of nanocomposite material. The ?-? interaction between CNT and OPV molecule were shown by spectroscopic and microscopic techniques. The nanocomposite solution can be drop casted over glass or metallic surface for the preparation of superhydrophobic coating. The resultant composite surface shows superhydrophobic nature even with corrosive liquids and its contact angle is almost constant even after prolonged contact with water.

Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.

Abstract: The present invention includes: a first step of discharging a coating solution from a nozzle to a center portion of the substrate to apply the coating solution on a surface of the substrate while rotating the substrate; a second step of decelerating, after the first step, the rotation of the substrate and continuously rotating the substrate; and a third step of accelerating, after the second step, the rotation of the substrate to dry the coating solution on the substrate, wherein: the substrate is rotated at a fixed speed of a first speed immediately before the first step; and in the first step, the rotation of the substrate which is at the first speed before start of the first step is gradually accelerated after the start of the first step so as to make the speed continuously change, and the acceleration of the rotation of the substrate is gradually decreased so as to make the speed of the rotation of the substrate converge in a second speed higher than the first speed at end of the first step.

Abstract: Spin coating method for a recording medium having a hole in the center, including moving a tip of a feeding nozzle to an initial position at a distance X above a recording surface and a distance A radially apart from a periphery of the hole, feeding a coating liquid onto the recording surface for a predetermined period of time while rotating the recording medium at a predetermined speed, and moving the tip from the initial position along a radial direction towards an outer periphery of the recording medium while keeping the tip above the recording surface at the distance X. X satisfies X?2 [3 r ?/(2 g C)]1/3, where ? and C respectively are surface tension and density of the coating liquid, r is the outer radius of the feeding nozzle, and g is the acceleration of gravity. A satisfies A?r+X/3.

Abstract: The application discloses an apparatus and method for processing biological material, including a suspension of cells.

Abstract: There is provided a coating method which can efficiently apply a coating liquid, such as a liquid resist, to the entire surface of a wafer even when the coating liquid is supplied in a smaller amount than a conventional one, and can therefore reduce the consumption of the coating liquid. The coating method includes: a first step of rotating the substrate at a first rotating speed while supplying the coating liquid onto approximately the center of the rotating substrate; a second step of rotating the substrate at a second rotating speed which is lower than the first rotating speed; a third step of rotating the substrate at a third rotating speed which is higher than the second rotating speed; and a fourth step of rotating the substrate at a fourth rotating speed which is higher than the second rotating speed and lower than the third rotating speed.

Abstract: A device and a method which is capable of uniformly coating, without waste, any flow passages formed in a raw material with a slurry even if a slurry having high viscosity is fed thereto by an amount required for the use of coating without excess and shortage. When the slurry (S) fed to one end of the base material (M) in which a large number of flow passages (2 . . . ) are formed parallel with each other is forced into the flow passages (2 . . . ) by an air pressure to coat the inner walls (2w) of the flow passages, the slurry (S) is fed from a slurry feeding device (6) by a required amount to a slurry storage part (5) formed at the upper surface part of the base material (M) disposed so that both ends of the flow passages (2 . . . ) can be opened in the upper and bottom surfaces thereof. Then, before the slurry (S) is forced into the flow passages (2 . . .

Abstract: A spin-coating method according to the present invention includes a uniforming step of rotating a substrate at a predetermined main rotation speed for a predetermined main rotation time so as to primarily make a resist film thickness uniform, and a subsequent drying step of rotating the substrate at a predetermined drying rotation speed for a predetermined drying rotation time so as to primarily dry the uniform resist film. In the present invention, a contour map, for example, of film thickness uniformity within an effective region (critical area) shown in FIG. 3A is determined (generated), and resist-coating is performed by selecting a condition within the optimum region in this contour map in which the film thickness uniformity (within an effective region) can be the maximum, or within the region in which the film thickness uniformity (within an effective region) can be high enough for a desirably specified.

Abstract: There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an aspiration device aspirating the unnecessary atmosphere through the exhaust port, wherein when the substrate is accommodated in the opening of the processing cup, the substrate has a perimeter spaced from the opening by a predetermined gap, and below the substrate accommodated in the processing cup there is formed an exhaust flow path extending from the aspiration port to the exhaust port.

Abstract: A method for spin coating a surface of an optical article, includes the steps of: selecting as the optical article an article (10) with a concave face (12) able to adopt a facing up position in which its uppermost portion is an edge (15) and selecting the concave face as the surface to be coated; dispensing a predetermined volume of a coating solution (18) on the concave face (12) along the edge (15), the concave face (12) facing up and the solution being dispensed in a top down manner; waiting with no motion of the article (10) for the solution to flow on the concave face (12) until it collects centrally; and spinning the article (10) to force the solution back to the edge (15) of the concave face (12).

Abstract: An apparatus and process operate to impose sonic pressure upon a spin-on film liquid mass that exhibits a liquid topography and in a solvent vapor overpressure to alter the liquid topography. Other apparatus and processes are disclosed.

Abstract: There is provided a coating and processing apparatus including a spin chuck horizontally holding a quadrangular substrate and rotating the substrate in a horizontal plane, a coating solution nozzle for supplying a coating solution to a front surface of the substrate horizontally held by the spin chuck, and a solvent supply mechanism provided in the spin chuck for supplying a solvent to a back surface of the substrate, in which the solvent supplied to the back surface of the substrate is allowed to reach the back surface and side surface of each of corners of the substrate by centrifugal force, thereby removing the coating solution attached.

Abstract: Novel compositions for use in image forming apparatus and fuser members. In particular, the novel composition is a hybrid networked material comprising fluorocarbon chains connected via silane linkages. The novel composition may be used in fuser members comprising a substrate and a top-coat layer disposed over the substrate.

Abstract: A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.

Abstract: The use of a photocurable perfluoropolyether (PFPE) material for fabricating a solvent-resistant PFPE-based microfluidic device, methods of flowing a material and performing a chemical reaction in a solvent-resistant PFPE-based microfluidic device, and the solvent-resistant PFPE-based microfluidic devices themselves are described. In an embodiment, a method is described for preparing a patterned layer of a photocured perfluoropolyether, the method comprising: (a) providing a substrate, wherein the substrate comprises a patterned surface; (b) contacting a perfluoropolvether precursor with the patterned surface of the substrate; and (c) photocuring the perfluoropolyether precursor to form a patterned layer of a photocured perfluoropolyether.

Abstract: A heat-dissipating unit having a hydrophilic compound film and a method for depositing a hydrophilic compound film are disclosed. The heat-dissipating unit includes a metallic body having a chamber and a working fluid. The chamber has a liquid-guiding structure constituted of an evaporating portion, a condensing portion and a connecting portion. At least one hydrophilic compound film is coated on surfaces of the chamber and the liquid-guiding structure. By this arrangement, the flowing of the working fluid in the heat-dissipating unit is enhanced to improve the heat-conducting efficiency of the heat-dissipating unit.

Abstract: A labyrinth seal for sealing a sealing region between a rotor and stator of a rotary machine includes, a base, and a plurality of sealing rings. The sealing rings are formed on the base, project into the sealing region and form, between them labyrinth valleys bounded, laterally, by the sealing rings and, in the floor of the valleys, by the base. The sealing rings, in at least one region, include at least one material which is different from that of the base.

Abstract: Disclosed herein is a primer composition comprising an inorganic UV absorbing agent and a polymer selected from (i) a copolycarbonate, and (ii) a polyurethane obtained by reaction of a polyisocyanate and a copolycarbonate diol. Also disclosed is a coated article comprising a polymeric substrate, a primer layer disposed on at least one surface of said substrate, and an abrasion-resistant layer disposed on said primer layer, where the primer layer is made from the primer composition of the invention.

Abstract: A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.

Abstract: Spin coating a mixture of graphene oxide platelets, water, and an organic solvent by placing a drop of the mixture on a spinning substrate while blowing a drying gas onto the substrate and allowing the water and the organic solvent on the substrate to evaporate; and repeating the spin coating one or more times to form a graphene oxide film in contact with the substrate. An about 1-100 nm thick film of overlapping platelets of reduced graphene oxide.

Abstract: A nano-coating comprises multiple alternating layers of a first layer comprising a first nanoparticle having an aspect ratio greater than or equal to 10 and having a positive or negative charge, and a second layer comprising a second nanoparticle having an aspect ratio greater than or equal to 10 and having a positive or negative charge opposite that of the first nanoparticle, wherein the nano-coating is disposed on a surface of a substrate. An article comprising the nano-coating, and a method of forming the nano-coating, are each disclosed.

Abstract: Embodiments of the invention provide methods and systems for depositing a viscous material on a substrate surface. In one embodiment, the invention provides a method of depositing a viscous material on a substrate surface, the method comprising: applying a pre-wet material to a surface of a substrate; depositing a viscous material atop the pre-wet material; rotating the substrate about an axis to spread the viscous material along the surface of the substrate toward a substrate edge; and depositing additional pre-wet material in a path along the surface and adjacent the spreading viscous material.

Abstract: A wet processing system detects a globule of a process solution in a drippy or dripping state from the tip of any one of process solution pouring nozzles being moved to a pouring position for pouring the process solution onto a substrate by obtaining image data on the process solution pouring nozzle, and takes proper measures to prevent the process solution from dripping. A wet processing system 1 pours a process solution, such as a resist solution, through one of process solution pouring nozzles 10 onto a surface of a substrate, such as a wafer W, held substantially horizontally by a substrate holding device 41 surrounded by a cup 5 to process the surface by a wet process. A nozzle carrying mechanism 10a carries the process solution pouring nozzles 10 between a home position on a nozzle bath 14 and a pouring position above the substrate held by the substrate holding device 41. An optical image of the tips of the process solution pouring nozzles 10 is obtained by an image pickup means, such as a camera 17.

Abstract: A method and device for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm.

Abstract: A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed.

Abstract: A method of forming on a substrate an amorphous silica-based coating film having a low dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, which comprises, as a typical one, the steps of; (a) coating on the substrate a liquid composition containing hydrolysate of an organic silicon compound or compounds hydrolyzed in the presence of tetraalkylammonium hydroxide (TAAOH); (b) setting the substrate in a chamber and then drying a coating film formed on the substrate at a temperature in the range from 25 to 340° C.; (c) heating the coating film at a temperature in the range from 105 to 450° C. with introduction of a superheated steam having such a temperature into the chamber, and (d) curing the coating film at a temperature in the range from 350 to 450° C. with introduction of a nitrogen gas into the chamber.

Abstract: A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then reduces a rotational speed of the target substrate to a second rotational speed lower than the first rotational speed, reduces the rotational speed of the target substrate to a third rotational speed lower than the second rotational speed or until rotational halt to adjust the film thickness of the resist solution, and accelerates the rotation of the target substrate to a fourth rotational speed higher than the third rotational speed to spin off a residue of the resist solution.

Abstract: A process in which a self-sealing pneumatic tire consisting of a pneumatic tire after vulcanization molding furnished with a sealant layer being uniform without thickness irregularity and a cover sheet layer therefore is produced without the use of an organic solvent and expensive apparatus; and an apparatus therefore.

Abstract: Techniques for arranging materials on a substrate are provided. In one embodiment, a system may comprise a driver for providing a rotational force, an outer body having an inner surface, and an inner body having an outer surface and disposed within the outer body in a concentric relationship therewith. The inner body may be coupled to the driver to be rotated by the rotational force. The system may further comprise a coupler attached to the outer body in order to retain a substrate, which forms at least one patterned groove therein. A fluid channel, which may be defined between the inner and outer bodies, may be filled with a fluid medium containing materials such as nano materials. When the inner body rotates via the rotational force, the materials contained in the fluid medium may be arranged in the patterned groove of the substrate.

Abstract: A method for making a layered material can include providing a substrate having a surface with at least one region having a charge and forming layers by sequentially contacting the at least one region with a first solution and a second solution. The first solution comprises a first layering material in an ionic liquid and the second solution comprises a second layering material in a second ionic solution. The first and second layering materials can have a chemical affinity to each other. The first layering material and/or the second layering material can include polyelectrolytes, polymers, carbon nanotubes, or combinations thereof.

Abstract: A method for making a conductive film of carbon nanotubes includes the steps of: a) preparing a carbon nanotube solution having a viscosity ranging from 1 to 50 c.p. at room temperature and containing a plurality of multi-walled carbon nanotubes; b) atomizing the carbon nanotube solution to form a plurality of atomized particles including the carbon nanotubes; c) providing a carrier gas to carry the atomized particles to a substrate disposed on a spin coating equipment; and d) spin coating the atomized particles on the substrate to form a conductive film of carbon nanotubes on a surface of the substrate.

Abstract: Disclosed are methods for manufacturing bio-based epoxy resins. The raw materials of the resins include lignin, polyol, solvent, catalyst, acid anhydride, and multi-epoxy compound. The methods of manufacturing the resins include evenly mixing the lignin, the polyol, the catalyst, and the solvent together to form a mixture. The acid anhydride is added to the mixture to process esterification for forming an intermediate product. The multi-epoxy compound is added to the intermediate product to process epoxidation for forming the bio-based epoxy resins. The bio-based epoxy resin has excellent compatibility with the solvent, such that the solvent can be added to the bio-based epoxy resins to form coatings having a tunable solid content. As a result, the coating can be applied to the surfaces of every type of base material.