Abstract: An apparatus for processing microelectronic topographies, a method of use of such an apparatus, and a method for passivating hardware of microelectronic processing chambers are provided. The apparatus includes a substrate holder configured to support a microelectronic topography and a rotatable case with sidewalls arranged on opposing sides of the substrate holder. The method of using such an apparatus includes positioning a microelectronic topography upon a substrate holder of a processing chamber, exposing the microelectronic topography to a fluid within the processing chamber, and rotating a case of the processing chamber. The rotation is sufficient to affect movement of the fluid relative to the surface of the microelectronic topography. A method for passivating hardware of a microelectronic processing chamber includes exposing the hardware to an organic compound and subsequently exposing the hardware to an agent configured to form polar bonds with the organic compound.

Abstract: Methods for forming anisotropic nanotube fabrics are disclosed. In one aspect, a nanotube application solution is rendered into a nematic state prior to its application over a substrate. In another aspect, a pump and narrow nozzle assembly are employed to realize a flow induced alignment of a plurality of individual nanotube elements as they are deposited onto a substrate element. In another aspect, nanotube adhesion promoter materials are used to form a patterned nanotube application layer, providing narrow channels over which nanotube elements will self align during an application process. Specific dip coating processes which are well suited for aiding in the creation of anisotropic nanotube fabrics are also disclosed.

Abstract: Methods for forming anisotropic nanotube fabrics are disclosed. In one aspect, a nanotube application solution is rendered into a nematic state prior to its application over a substrate. In another aspect, a pump and narrow nozzle assembly are employed to realize a flow induced alignment of a plurality of individual nanotube elements as they are deposited onto a substrate element. In another aspect, nanotube adhesion promoter materials are used to form a patterned nanotube application layer, providing narrow channels over which nanotube elements will self align during an application process. Specific dip coating processes which are well suited for aiding in the creation of anisotropic nanotube fabrics are also disclosed.

Abstract: A method of preparing a coating solution, comprising the steps of providing a first solution comprising a lower alcohol; a polyethylene glycol; a complexing agent; and water; providing a second solution comprising a higher alcohol; and at least one metal alkoxide, wherein the metal in said at least one metal alkoxide is selected from the group consisting of zirconium, aluminium, titanium, tantalum and yttrium; forming a sol-gel solution by mixing said first and second solutions and thereby hydrolyzing said at least one metal alkoxide to a metal oxide and an alcohol; forming a concentrated solution by removing said lower alcohol and the alcohol resulting from the hydrolysis of said at least one metal alkoxide; and forming a coating solution by adding a medium alcohol to said concentrated solution.

Abstract: There is provided an apparatus including: a processing cup having an opening opened upward to allow a substrate to be loaded and unloaded, an exhaust port for exhausting an unnecessary atmosphere produced in forming a film applied on the substrate, and an aspiration port for aspirating external air; and an aspiration device aspirating the unnecessary atmosphere through the exhaust port, wherein when the substrate is accommodated in the opening of the processing cup, the substrate has a perimeter spaced from the opening by a predetermined gap, and below the substrate accommodated in the processing cup there is formed an exhaust flow path extending from the aspiration port to the exhaust port.

Abstract: This invention provides a photoresist coating liquid supplying apparatus and a photoresist coating liquid supplying method, for supplying a photoresist coating liquid having a low particle content to a photoresist coating apparatus, and a photoresist coating apparatus using such a photoresist coating liquid supplying apparatus, which can realize coating without causing significant defects in a cost-effective manner. The photoresist coating liquid supplying apparatus comprises a buffer vessel for a photoresist coating liquid, a circulation filtering apparatus for drawing a part of the coating liquid from the buffer vessel, filtering the coating liquid, and then returning the filtered coating liquid to the buffer vessel, and a pipe for supplying the coating liquid from the buffer vessel or the circulation apparatus to a coating apparatus. The photoresist coating liquid supplying method uses the photoresist coating liquid supplying apparatus.

Abstract: A composite hybrid coating having a thick highly transparent hard coating with excellent barrier properties is described. The hybrid coating is the gelled dispersion of nanoparticles in a sol with least one hydrolyzable silane and at least one hydrolyzable metal oxide precursor. In one embodiment a composite hybrid coating is formed by the curing of a dispersion formed by the addition of a suspension of boehmite nanoplatelets in a sol prepared by the hydrolysis of tetraethoxysilane, ?-glycidoxypropyltrimethoxysilane and titanium tetrabutoxide in ethanol. A plastic substrate can be coated with the dispersion and the dispersion gelled to a thickness of at least 5 ?m with heating to less than 150° C.

Abstract: A method for forming functional ceramic films on ceramic materials, to enhance mechanical properties, chemical stability, and/or biological properties of the materials. The functional ceramic film comprises at least about 10 weight percent pure zirconia, with phase transformation at tetragonal/cubic phases at high temperature to monoclinic phase at room temperature, leading to volume expansion and compressive stress. The compressive stress enhances mechanical strength, wear resistance, hardness and other properties, and also tends to eliminate cracks and flaws in the ceramic material. The functional film may also include bioactive materials, and may include a structure for eluting drugs so as to serve as a drug delivery vehicle. The functional ceramic films may be centered on the base ceramic, or the materials may be co-centered. Devices having the ceramic materials with functional films may be used, for various medical or dental purposes.

Abstract: The present invention relates to an artificial leather and a method for manufacturing the same. According to the method of the invention, an elastic layer is disposed on a surface of a base material, a color pattern layer is disposed on an uneven surface of the elastic layer and a cover layer covers the color pattern layer, so as to form the artificial leather. The elastic layer includes a plurality of sparkling materials. By utilizing the sparkling materials, the color pattern layer and the uneven surface, the artificial leather has a sparkling effect at various angles by showing the gradation of the stacking particles (sparkling materials). In addition, the cover layer can protect the color pattern layer on the elastic layer, so that the color pattern layer has excellent sturdiness against peeling and light.

Abstract: The present invention provides for nanostructures grown on a conducting or insulating substrate, and a method of making the same. The nanostructures grown according to the claimed method are suitable for interconnects and/or as heat dissipators in electronic devices.

Abstract: The present invention provides nanocomposite materials comprising carbon nanotubes and oligo(p-phenylenevinylene) (OPV). Dispersion of CNT in the solution of solution of oligo(p-phenylenevinylene) (OPV) in organic solvent results in the formation of nanocomposite material. The ?-? interaction between CNT and OPV molecule were shown by spectroscopic and microscopic techniques. The nanocomposite solution can be drop casted over glass or metallic surface for the preparation of superhydrophobic coating. The resultant composite surface shows superhydrophobic nature even with corrosive liquids and its contact angle is almost constant even after prolonged contact with water.

Abstract: Disclosed are new semiconductor materials prepared from naphthalene-imide copolymers. Such polymers can exhibit desirable electronic properties and can possess processing advantages including solution-processability and/or good stability at ambient conditions.

Abstract: A method for preparing and forming a thick coating of lead-zirconate-titanate (PZT) on a substrate, includes preparing a first solution by dissolving a lead precursor in a mixed solvent of acid and diol and stirring the resultant, preparing a second solution by dissolving a zirconium precursor and a titanium precursor in a mixed solvent of acid and diol and stirring the same, mixing the first and second solutions to prepare a PZT stock solution, spin-coating the PZT solution on the substrate to form a coated assembly, and heat-treating the coated assembly.

Abstract: A method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. Also, a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolysable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water contact within the organic solvent solution is either set or maintained within a predetermined range.

Abstract: The present invention relates to a method of manufacturing an optical information recording medium, which forms a light-transmitting layer made of a radiation curing resin on a substrate having a signal recording layer, a liquid foundation is formed by coating the radiation curing resin in a first coating step. Next, a radiation curing resin is further coated on the foundation in a second coating step. After this, a curing step is performed. By separating the dropping and spreading of the radiation curing resin into two steps, not only the manufacturing time can be reduced, but also the volume of the used radiation curing resin can be reduced.

Abstract: The present invention relates to the preparation of storage-stable and water-compatible inorganic/organic sols suitable for the surface functionalization of a wide variety of substrates.

Abstract: An inkjet head having a hydrophobic coating layer and a method of forming the hydrophobic coating layer on a surface of a nozzle plate of the inkjet head. The method includes filling a wax into a plurality of nozzles formed in the nozzle plate while coating the surface of the nozzle plate with wax, removing the wax from the surface of the nozzle plate, forming a hydrophobic coating layer on the surface of the nozzle plate, melting the wax filled in the nozzles, and removing portions of the hydrophobic coating layer covering the nozzles by discharging the melted wax through the nozzles using heat and/or pressure. Therefore, the hydrophobic coating layer is uniformly formed only on an outer surface of the nozzle plate, without forming the hydrophobic coating layer in an inner surface of the nozzles, thereby improving an ink ejecting performance of the nozzles.

Abstract: A gas turbine engine component has a metallic substrate. A coating is on the substrate. A barrier coat is applied while varying a speed of the component rotation so as to provide a corresponding microstructure to the barrier coat.

Abstract: that are made up of oriented polymer chains are provided. Chains of polymer may be oriented or substantially aligned in one or more directions exhibiting enhanced thermal conductivity along the direction of orientation. Orientation of polymers within sheets may lead to a wide range of thermally relevant applications.

Abstract: A hydrophilic coating can be applied to virtually any surface to produce a long-lasting, durable antifog effect. The coating includes a molecular-level blend of hydrophilic polymers. The coating can be assembled using a layer-by-layer assembly process.

Abstract: The present invention provides a method for fabricating a ceramic film on a copper foil. The method comprises applying a layer of a sol-gel composition onto a copper foil. The sol-gel composition comprises a precursor of a ceramic material suspended in 2-methoxyethanol. The layer of sol-gel is then dried at a temperature up to about 250° C. The dried layer is then pyrolyzed at a temperature in the range of about 300 to about 450° C. to form a ceramic film from the ceramic precursor. The ceramic film is then crystallized at a temperature in the range of about 600 to about 750° C. The drying, pyrolyzing and crystallizing are performed under a flowing stream of an inert gas. In some embodiments an additional layer of the sol-gel composition is applied onto the ceramic film and the drying, pyrolyzing and crystallizing steps are repeated for the additional layer to build up a thicker ceramic layer on the copper foil. The process can be repeated one or more times if desired.

Abstract: The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rinsing method of rinsing a substrate processed by a developing process for developing an exposed pattern comprises the steps of discharging a rinsing liquid onto a central part of the substrate processed by the developing process and coated with a developer puddle while the substrate is stopped or rotated (step 5), stopping discharging the rinsing liquid in a state where the developer puddle remains at least in a peripheral part of the substrate (step 6), and rotating the substrate at a high rotating speed to shake the developer remaining on the substrate off the substrate together with the rinsing liquid (step 7).

Abstract: Disclosed are new semiconductor materials prepared from perylene-imide copolymers. Such polymers can exhibit high n-type carrier mobility and/or good current modulation characteristics. In addition, the compounds of the present teachings can possess certain processing advantages such as solution-processability and/or good stability at ambient conditions.

Abstract: Disclosed herein is a method for aluminiding an internal passage of a metal substrate comprising injecting a slurry composition that comprises a powder comprising aluminum, a binder selected from the group consisting of colloidal silica, an organic resin, and a combination thereof, into the internal passage; applying compressed air to the internal passage to facilitate distribution of the slurry composition throughout the internal passage; and, heat treating the slurry composition under conditions sufficient to remove volatile components from the composition, and to cause diffusion of aluminum into a surface of the internal passage.

Abstract: Aluminophosphate compounds and compositions as can be used for substrate or composite films and coating to provide or enhance, without limitation, planarization, anti-biofouling and/or anti-microbial properties.

Abstract: A method of measuring a coating deposits a layer of coating on an object. A laser beam is projected on the layer of the coating. A reflection of the project laser beam is received by the laser sensor. From this information, the thickness of the layer of the coating on the object is determined. A value related to the thickness of the layer of the coating may then be compared to a desired value.

Abstract: A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then decelerates the rotation of the substrate to a second rotational speed lower than the first rotational speed, or until rotational halt, makes the deceleration smaller in the deceleration step as the rotational speed becomes closer to the second rotational speed or the rotational halt, and accelerates the rotation of the substrate to a third rotational speed higher than the second rotational speed to spin off a residue of the resist solution.

Abstract: A method of manufacturing an optical information recording medium to/from which signals can optically be recorded and reproduced. The recording medium includes a signal substrate (100), a signal recording layer (110), and a transparent cover layer (125) having a first transparent layer (115) and a second transparent layer (120), which is harder than the first transparent layer (115). Signals can be recorded and reproduced to and from the recording medium by a light transmitted to the signal recording layer through the transparent cover layer (125). The first transparent layer is formed so as to have a first predetermined distribution of thickness. The second transparent layer is formed so as to have a second predetermined distribution of thickness to make the total thickness of the transparent cover layer (125) uniform. The first transparent layer (115) may be made of a plurality of thin laminated transparent layers.

Abstract: The present disclosure relates generally to semiconductor, integrated circuits, and particularly, but not by way of limitation, to centrifugal methods of filling high-aspect ratio vias and trenches with powders, pastes, suspensions of materials to act as any of a conducting, structural support, or protective member of an electronic component.

Abstract: The invention features methods of making devices, or “platens”, having a high-density array of through-holes, as well as methods of cleaning and refurbishing the surfaces of the platens. The invention further features methods of making high-density arrays of chemical, biochemical, and biological compounds, having many advantages over conventional, lower-density arrays. The invention includes methods by which many physical, chemical or biological transformations can be implemented in serial or in parallel within each addressable through-hole of the devices. Additionally, the invention includes methods of analyzing the contents of the array, including assaying of physical properties of the samples.

Abstract: A method of silylating porous silica films comprises: preparing a porous silica film; and grafting the film with a hydrophobic functional group while annealing the film. The porous silica film is a sol-gel silica film, a mesoporous silica film, in situ crystallized polycrystalline pure-silica zeolite (PSZ), spin-on PSZ, and spin-on PSZ MEL (or PSZ MEL-structural type) films. The hydrophobic functional group is trimethylchlorosilane (TMCS); dimethyldichlorosilane; methyltrichlorosilane; alkylchlorosilanes, such as (CH3(CH2)n)xSiCl4-x, where x is 1, 2, or 3; alkoxychlorosilanes; hexamethyldisilazane (HMDS), and/or aminosilanes. In addition, the steps of grafting and annealing the film are performed simultaneously, which imparts hydrofluoric acid resistance and reduces moisture adsorption to the film.

Abstract: An aspect of the present invention, there is provided a method for providing a coating-type film, including, coating a solution including an organic metal compound on a surface of a substrate including a semiconductor substrate to form a coating film, heating the coating film to volatize a solvent in the coating film, and performing a treatment including at least one of a heat treatment, an ozone treatment and a moisture treatment to remove impurities from the coating film.

Abstract: A substrate treatment apparatus includes: a substrate holding unit which horizontally holds a substrate; a substrate rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; a treatment liquid supplying unit which supplies a treatment liquid to an upper surface of the substrate held by the substrate holding unit; an opposing member to be located in opposed spaced relation to the upper surface of the substrate held by the substrate holding unit in contact with a film of the treatment liquid formed on the upper surface of the substrate so as to receive a lift force from the liquid film; a support member which supports the opposing member; and an opposing member holding mechanism which causes the support member to hold the opposing member in a vertically relatively movable manner.

Abstract: A method for controlled deposition and orientation of molecular sized nanoelectromechanical systems (NEMS) on substrates is disclosed. The method comprised: forming a thin layer of polymer coating on a substrate; exposing a selected portion of the thin layer of polymer to alter a selected portion of the thin layer of polymer; forming a suspension of nanostructures in a solvent, wherein the solvent suspends the nanostructures and activates the nanostructures in the solvent for deposition; and flowing a suspension of nanostructures across the layer of polymer in a flow direction; thereby: depositing a nanostructure in the suspension of nanostructures only to the selected portion of the thin layer of polymer coating on the substrate to form a deposited nanostructure oriented in the flow direction. By selectively employing portions of the method above, complex NEMS may be built of simpler NEMSs components.

Abstract: A method for producing a high temperature-resistant article comprises an assembling step of foaming an assembly of a first substrate and a second substrate with an adhesive layer interposed therebetween and comprising paste of powder of at least one carbide of niobium carbide, hafnium carbide, tantalum carbide and tungsten carbide; and a bonding step of heating the assembly to bond the first substrate and the second substrate by sintering, thereby obtaining a high temperature-resistant article comprising the assembly after sintering.

Abstract: There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10?5 q? (mm) given with respect to a surface tension ? (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10?5 (m·sec/N).

Abstract: The invention includes a lower guide unit which obliquely extends downward to an outside from a position closely opposed to a peripheral edge portion of a rear surface of the substrate held on the substrate holding unit, and is formed in an annular shape in a circumferential direction of the substrate; and an upper guide unit which has an upper end surface located at a substantially same height as a front surface of the substrate held on the substrate holding unit, forms a lower annular flow path between the upper guide unit and the lower guide unit for guiding downward together with a gas flow a treatment solution scattering from the substrate, is formed in an annular shape opposed to the lower guide unit to surround an outside lower region of the substrate, and has an inner peripheral surface having a longitudinal-sectional shape curved to bulge outward and extending downward.

Abstract: This disclosure relates generally to polymeric networks of fullerene compounds, to methods of preparing precursors for such networks, and to their subsequent use as low dielectric constant materials in microelectronic devices.

Abstract: A coating and developing system that includes two rotating members having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism extended between the rotating members to form a carrying passage, and capable of moving along an orbital path to carry a wafer supported thereon, a sending-in transfer unit disposed at the upstream end of the carrying passage, a sending-out transfer unit disposed at the downstream end of the carrying passage, a developer pouring nozzle for pouring a developer onto the wafer, a cleaning nozzle for pouring a cleaning liquid onto the wafer, and a gas nozzle for blowing a gas against the wafer. The developer pouring nozzle, the cleaning nozzle, and the gas nozzle are arranged in a direction in which the wafer is carried along the carrying passage between the upstream and the downstream end of the carrying passage.

Abstract: The resist coating unit (COT) has a spin chuck (41) which holds the wafer to be supplied with a resist liquid, and a process cup (50) which accommodates the spin chuck (41) and exhaustes an atmosphere around the wafer W from a bottom thereof. The process cup (50) comprises a first cup (51) with an outer circumferential wall (61a), and an airflow control member (52) laid out close to the wafer W in the first cup (51) in such a manner as to surround the wafer W. The airflow control member (52) has a vertical cross section of an approximately rectangular shape defined by the upper ring portion (62a) having a cross section of an approximately triangular shape and protruding upward, and a lower ring portion (62b) having a cross section of an approximately triangular shape and protruding downward. An exhaust passage (55) for substantially exhausting the atmosphere around the wafer W is formed between the outer circumferential wall (61a) and the airflow control member (52).

Abstract: A multilayer film formed by a solution process. The multilayer film includes a plurality of basic film structures positioned in contiguous overlying relationship to form a common multilayer film. Each of the plurality of basic film structures includes one of: a first two-layer structure with a first layer including either a polymer material or an organic material and a second layer including a functionalized inorganic material; a second two-layer structure with a first layer including either a polymer material or an organic material and a second layer including either a polymer binder and/or an organic binder; and a three layer structure with a first layer including either a polymer material or an organic material, a second layer including a functionalized inorganic material, and a third layer including one of a polymer binder and/or an organic binder.

Abstract: The invention relates to a tool for coating an optical disc, and the tool includes: a coating section for spreading coating material; a restricting section for defining a coating area; and a support section for supporting the coating section and the restricting section. The coating section and the restricting section form a material accommodating space. Also, a method for coating an optical disc by using such tool and a method for fabricating an optical disc are disclosed.

Abstract: Disclosed are compositions comprising a compound having the formula CF3(CF2)xCF?CFCF(OR)(CF2)yCF3, wherein R is CH3 or C2H5 or mixtures thereof, and wherein x and y are independently 0, 1, 2 or 3, and wherein x+y=1, 2 or 3. Also disclosed are unsaturated fluoroethers selected from the group consisting of CF3(CF2)xCF?CFCF(OR)(CF2)yCF3, CF3(CF2)xC(OR)?CFCF2(CF2)yCF3, CF3CF?CFCF(OR)(CF2)x(CF2)yCF3, CF3(CF2)xCF?C(OR)CF2(CF2)yCF3, and mixtures thereof, wherein R can be either CH3, C2H5 or mixtures thereof, and wherein x and y are independently 0, 1, 2 or 3, and wherein x+y=0, 1, 2 or 3. Also disclosed herein are novel methods of using a composition comprising at least one of the compounds described above as novel solvents, carrier fluids, dewatering agents, degreasing solvents or defluxing solvents.

Abstract: There is provided a coating method which can efficiently apply a coating liquid, such as a liquid resist, to the entire surface of a wafer even when the coating liquid is supplied in a smaller amount than a conventional one, and can therefore reduce the consumption of the coating liquid. The coating method includes: a first step of rotating the substrate at a first rotating speed while supplying the coating liquid onto approximately the center of the rotating substrate; a second step of rotating the substrate at a second rotating speed which is lower than the first rotating speed; a third step of rotating the substrate at a third rotating speed which is higher than the second rotating speed; and a fourth step of rotating the substrate at a fourth rotating speed which is higher than the second rotating speed and lower than the third rotating speed.

Abstract: An object of the present invention is to provide a method for producing an organic thin film, which enables rapid film formation, and enables a dense organic thin film with minimal impurities to be formed stably, and in a plurality of consecutive repetitions. The present invention provides a method for producing an organic thin film in which an organic thin film is formed on the surface of a substrate, including a step (A) of bringing the substrate into contact with an organic solvent solution containing a metal-based surfactant having at least one hydrolyzable group, and a catalyst capable of interacting with the metal-based surfactant, wherein the water content within the organic solvent solution is either set or maintained within a predetermined range.

Abstract: One embodiment of a dielectric material may include a metal containing cation and a polyatomic anion.

Abstract: An edge-sealed, encapsulated environmentally sensitive device. The device includes an environmentally sensitive device, and at least one edge-sealed barrier stack. The edge-sealed barrier stack includes a decoupling layer and at least two barrier layers. The environmentally sensitive device is sealed between an edge-sealed barrier stack and either a substrate or another edge-sealed barrier stack. A method of making the edge-sealed, encapsulated environmentally sensitive device is also disclosed.

Abstract: A security device for the identification or authentication of valuable goods is described, including a thin material layer (22, 26) presenting a stochastic pattern including micro/submicrostructures, where the latter are arranged in blobs (2) each of which presents a complexity factor Cx = L 2 4 ? ? · A , where L is the perimeter of the blob and A its area, and wherein blobs having a Cx value greater than or equal to 2 cover at least 5%, preferably at least 15%, of the device surface. According to a preferred embodiment, the material layer may include a film including at least a first and a second polymers arranged respectively within a first and a second phases defining the micro/submicrostructures. Preferred processes of fabrication are also disclosed, as well as a method for securing a valuable good based on such a security device.

Abstract: There are provided a resin solution substantially applicable to thermal imprinting, a thin film thereof, and manufacturing methods of those. A thermal imprinting resin solution for forming a thin film used for thermal imprinting applications comprises a thermoplastic resin and greater than or equal to at least one kind of solvent which can dissolve the resin, and an containing amount of foreign particles having a grain diameter larger than or equal to 0.2 ?m is controlled to be less than 3000 particles/cm3. Moreover, remaining volatile compositions in a thin film are set to be less than or equal to 0.25% when the thin film is formed from the thermal imprinting resin solution.

Abstract: An evaporation-induced self-assembly method to prepare a porous, surfactant-templated, thin film by mixing a silica sol, a solvent, a surfactant, and an interstitial compound, evaporating a portion of the solvent to form a liquid, crystalline thin film mesophase material, and then removal of the surfactant template. Coating onto a substrate produces a thin film with the interstitial compound either covalently bonded to the internal surfaces of the ordered or disordered mesostructure framework or physically entrapped within the ordered or disordered mesostructured framework. Particles can be formed by aerosol processing or spray drying rather than coating onto a substrate. The selection of the interstitial compound provides a means for developing thin films for applications including membranes, sensors, low dielectric constant films, photonic materials and optical hosts.