Centrifugal Force Utilized Patents (Class 427/240)
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Publication number: 20110242219Abstract: A method of forming a nozzle plate of a fluid ejection device includes etching a bore in the first side of the multi-layer substrate, depositing a liner in the bore, removing a layer from a second side of the multi-layer substrate, wherein the removing exposes a closed end of the liner, applying a non-wetting coating to the closed end of the liner and an area surrounding the closed end of the liner, and removing the closed end of the liner, wherein removing the closed end of the liner opens a nozzle.Type: ApplicationFiled: March 31, 2010Publication date: October 6, 2011Inventors: Mark Nepomnishy, Gregory De Brabander, Andreas Bibl
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Publication number: 20110240108Abstract: Systems and methods are provided for the fabrication and manufacture of efficient, low-cost p-n heterojunction pyrite solar cells. The p-n heterojunction pyrite solar cells can include a pyrite thin cell component, a window layer component, and a top surface contact component. The pyrite thin cell component can be fabricated from nanocrystal paint deposited onto metal foils or microcrystalline pyrite deposited onto foil by chemical vapor deposition. A method of synthesizing colloidal pyrite nanocrystals is provided. Methods of manufacturing the efficient, low-cost p-n heterojunction pyrite solar cells are also provided.Type: ApplicationFiled: April 4, 2011Publication date: October 6, 2011Inventors: Matt Law, Sean Seefeld, James Puthussery
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Publication number: 20110244126Abstract: Methods for removing hydrogen from molecules are disclosed. In one embodiment, hydrogen-containing molecules are deposited on a solid substrate and are bombarded with hydrogen projectile particles. The particles may have energies of 5-100 eV, or more preferably 10-50 eV. The hydrogen projectile particles remove hydrogen atoms from the deposited molecules while they are on the substrate, without removing other atoms from the molecules. Dangling bonds are created by the loss of hydrogen and can be used to cross-link the molecules. The resulting product can be a nanometer-thick dense film.Type: ApplicationFiled: June 10, 2011Publication date: October 6, 2011Applicant: THE CHINESE UNIVERSITYInventors: R. W. M. KWOK, W. M. Lau
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Publication number: 20110237488Abstract: This invention relates to cleaning compositions comprising unsaturated fluorinated hydrocarbons. The invention further relates to use of said cleaning compositions in methods to clean, degrease, deflux, dewater, and deposit fluorolubricant. The invention further relates to novel unsaturated fluorinated hydrocarbons and their use as cleaning compositions and in the methods listed above.Type: ApplicationFiled: June 6, 2011Publication date: September 29, 2011Applicant: E.I.DU PONT DE NEMOURS AND COMPANYInventors: Mario Joseph Nappa, Melodie A. Schweitzer, Allen Capron Sievert, Ekaterina N. Swearingen
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Publication number: 20110227002Abstract: Disclosed herein are an aromatic imide-based dispersant for CNTs and a carbon nanotube composition comprising the same. Having an aromatic ring structure advantageously realizing adsorption on carbon nanotubes, the dispersant, even if used in a small amount, can disperse a large quantity of carbon nanotubes.Type: ApplicationFiled: June 3, 2011Publication date: September 22, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Hyo Sug LEE, Jae Young CHOI, Seon Mi YOON, Hyuk Soon CHOI, Kwang Hee KIM
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Publication number: 20110223329Abstract: A method of producing a film coated onto a substrate by dissolving a metal or metalloid containing compound having hydrolysable groups in a solvent to form a precursor solution. The precursor solution is coated onto the substrate as a continuous liquid phase. The precursor solution is then cured to produce a continuous, interconnected, nano-porous network.Type: ApplicationFiled: March 16, 2011Publication date: September 15, 2011Inventors: Paul Meredith, Michael Harvey, Robert Vogel
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Publication number: 20110214284Abstract: Domain segregation of polymer blends or block copolymers in the presence of thermal conducting high aspect ratio nanocrystals leads to preferential placement of conductive filler either inside one domain, which promote the self-assembly of a thermal and/or electrical conducting pathway composed of high aspect ratio filler. The self-assembly of such thermal and/or electrical conducting pathway effectively enhances the thermal and/or electrical conductivity of the composite with significantly less amount of filler.Type: ApplicationFiled: September 9, 2010Publication date: September 8, 2011Applicant: Pixelligent Technologies, LLCInventors: Wei Xu, Jun Xu, Zehra Serpil Gonen-Williams, Gregory D. Cooper
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Publication number: 20110212323Abstract: The present invention relates to a method for preparing oxide thin films with high sensitivity and reliability, which can be advantageously used in the fabrication of articles such as gas sensors. The present invention establishes a high reliability process for preparing large area microsphere templates which may be applicable to silicone semiconductor processes by simple plasma surface treatment and spin coating. The present invention achieves remarkably enhanced sensitivities of thin films of gas sensors by controlling the nanostructure shapes of hollow hemisphere oxide thin films by using simple plasma treatment. In particular, the gas sensor based on the nanostructured TiO2 hollow hemisphere according to the present invention exhibits higher sensitivity, faster response and recovery speed to CO gas over conventional TiO2 gas sensors.Type: ApplicationFiled: September 1, 2010Publication date: September 1, 2011Inventors: Ho Won Jang, Seok-Jin Yoon, Jin Sang Kim, Chong Yun Kang, Ji-Won Choi, Hi Gyu Moon
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Patent number: 8007862Abstract: Provided are a method of preparing a nanowire grid polarizer, and a nanowire grid polarizer prepared using the same. The method includes: mixing a surfactant and a silica precursor to prepare a mesoporous film composition; coating the mesoporous film composition on a substrate; aging the coated product to form a silica template composite; removing the surfactant inside the silica template composite to prepare a mesoporous material having channels; and filling the channels of the mesoporous material with metal. The method is suitable for the formation of a nanowire having a stable structure, mass production, and large-area production.Type: GrantFiled: March 28, 2008Date of Patent: August 30, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Su-mi Lee, Dong-mok Whang, Moon-gyu Lee, Yoon-sun Choi, Sun-hwak Woo
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Patent number: 8007868Abstract: A method of controlling the morphology of silica or silica-like films formed by coating a precursor formulation of hydrolysable silicate oligomer onto a substrate and curing in a vaporous environment that comprises a base, water and a retarder that retards the hydrolysis of the oligomer.Type: GrantFiled: May 31, 2006Date of Patent: August 30, 2011Assignee: Xerocoat Inc.Inventors: Michael Harvey, Paul Meredith
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Publication number: 20110206925Abstract: Provided are polymer-aerogel composite coatings, devices and articles including polymer-aerogel composite coatings, and methods for preparing the polymer-aerogel composite. The exemplary article can include a surface, wherein the surface includes at least one region and a polymer-aerogel composite coating disposed over the at least one region, wherein the polymer-aerogel composite coating has a water contact angle of at least about 140° and a contact angle hysteresis of less than about 1°. The polymer-aerogel composite coating can include a polymer and an ultra high water content catalyzed polysilicate aerogel, the polysilicate aerogel including a three dimensional network of silica particles having surface functional groups derivatized with a silylating agent and a plurality of pores.Type: ApplicationFiled: June 30, 2009Publication date: August 25, 2011Inventors: David J. Kissel, Charles Jeffrey Brinker
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Publication number: 20110203714Abstract: Sol-gel chemistry is used to prepare igniters comprising energetic multilayer structures coated with energetic materials. These igniters can be tailored to be stable to environmental aging, i.e., where the igniters are exposed to extremes of both hot and cold temperatures (?30 C to 150 C) and both low (0%) and high relative humidity (100%).Type: ApplicationFiled: May 3, 2011Publication date: August 25, 2011Inventors: Troy W. Barbee, JR., Randall L. Simpson, Alexander E. Gash, Joe H. Satcher, JR.
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Patent number: 8003509Abstract: A plated film having a uniform film thickness is formed on a surface of a substrate. A semiconductor manufacturing apparatus includes: a holding mechanism for holding a substrate rotatably; a nozzle for supplying a processing solution for performing a plating process on a processing target surface of the substrate; a substrate rotating mechanism for rotating the substrate held by the holding mechanism in a direction along the processing target surface; a nozzle driving mechanism for moving the nozzle in a direction along the processing target surface at a position facing the processing target surface of the substrate held by the holding mechanism; and a control unit for controlling the supply of the processing solution by the nozzle and the movement of the nozzle by the nozzle driving mechanism.Type: GrantFiled: March 17, 2009Date of Patent: August 23, 2011Assignee: Tokyo Electron LimitedInventors: Kenichi Hara, Mitsuaki Iwashita, Takashi Tanaka, Takayuki Toshima, Takehiko Orii
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Publication number: 20110195183Abstract: There is provided a method for spin coating, by which a resist is coated on a surface of a circular disc with a hole formed in its center. A method for spin coating coats a film-forming material discharged from a nozzle to an upper surface of a circular disc substrate with a through hole formed in a center while rotating the substrate. At an initial discharging stage where a discharge amount fluctuates, an inner diameter center of the nozzle is located at an initial discharge radius position apart from a position corresponding to a coat boundary of the disc substrate at an outer radial side. At a subsequent stage of stabilized discharging amount, the inner diameter center of the nozzle is moved from the initial discharge radius position to a stabilized discharge radius position around the coat boundary to further discharge the film-forming material.Type: ApplicationFiled: February 7, 2011Publication date: August 11, 2011Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Naoaki YAMASHITA, Kyoichi MORI, Takayuki ISHIGURO, Noritake SHIZAWA, Shinjiro ISHII, Masashi AOKI
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Publication number: 20110183130Abstract: This provides a fabrication method for fabricating a ferrite-provided body comprising a base member 3 and a ferrite film provided on the base member 3. The fabrication method includes: supporting the base member 3 with a space kept on a back of the base member 3, the space being 100 ?m or more; supplying a reaction solution and an oxidizing solution for a front of the base member 3 from a reaction solution nozzle 1 and an oxidizing solution nozzle 2, the reaction solution containing at least ferrous ions (Fe2+ ions), the oxidizing solution containing at least an oxidizing agent; and applying, to the reaction solution and the oxidizing solution, acceleration of 2˜150 m/s2 which comes from a cause other than gravity.Type: ApplicationFiled: July 29, 2009Publication date: July 28, 2011Applicant: NEC Tokin CorporationInventors: Koichi Kondo, Hiroshi Ono, Yukihiro Numata
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Patent number: 7985448Abstract: A process system includes a plurality of processing modules each processing a substrate with a process liquid. There is disposed a dispensing mechanism that dispenses the process liquid to the vertically arranged modules. The dispensing mechanism is provided with a process liquid supply source, and pumps corresponding to the respective processing modules. Each pump temporarily stores therein the process liquid which has been pressure-fed through a riser piping from the process liquid supply source by a pressing apparatus, and delivers the process liquid from an outlet. There are disposed nozzles each having a discharge port and discharging the process liquid to the corresponding processing module. Delivery pipings connecting the outlets of the pumps with the discharge ports of the corresponding nozzles have identical length to each other.Type: GrantFiled: January 20, 2010Date of Patent: July 26, 2011Assignee: Tokyo Electron LimitedInventors: Yoshio Kimura, Takahiro Okubo
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Patent number: 7985454Abstract: The present invention is directed to compositions of matter, systems, and methods to manufacture nanowires. In an embodiment, a method to produce a catalytic-coated nanowire growth substrate for nanowire growth is disclosed which comprises: (a) depositing a buffer layer on a substrate; (b) treating the buffer layer with boiled water or steam to enhance interactions between the buffer layer and catalyst particles; and (c) depositing catalytic particles on a surface of the buffer layer. Methods to develop and use this catalytic-coated nanowire growth substrate are disclosed.Type: GrantFiled: September 23, 2008Date of Patent: July 26, 2011Assignee: Nanosys, Inc.Inventors: Chunming Niu, Jay L. Goldman, Xiangfeng Duan, Vijendra Sahi
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Publication number: 20110174094Abstract: A swash plate 3 includes an substrate 11 made of an iron-based material, a hard first resin layer 12 provided to coat an end surface of the substrate 11, and a soft second resin layer 13 provided to coat the first resin layer 12. A spiral annular groove 12A is formed in a surface of the first resin layer 12, and the second resin layer 13 is provided to match a sectional shape of the first resin layer 12. With the soft second resin layer 13 on a sliding surface 3A of the swash plate 3, the swash plate 3 having a good fit in an initial stage of sliding can be provided. When the second resin layer 13 partially wears, a protrusion 12 of the first resin layer 12 of hard resin is exposed, and thus the swash plate 3 having good wear resistance can be provided. The swash plate 3 having good sliding properties can be provided.Type: ApplicationFiled: October 27, 2009Publication date: July 21, 2011Inventors: Masanori Akizuki, Shingo Gotou, Hiroshi Kanemitsu
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Patent number: 7981468Abstract: An apparatus (10) for surface treating particulate material (M) with surface treatment particles (S) includes a substantially cylindrical body (12) having a top (18), bottom (16) and sidewall (14). A mixing chamber (42) is defined within the body (12). At least one injector inlet (36) and at least one process air inlet (32) are in communication with the mixing chamber (42). At least one outlet (34) is in fluid communication with the mixing chamber (42).Type: GrantFiled: November 16, 2009Date of Patent: July 19, 2011Assignee: Eastman Kodak CompanyInventors: Stewart W. Blair, Tomas G. P. McHugh, Greg Munro
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Patent number: 7976896Abstract: A spin chuck rotatably holds a semiconductor wafer, while resist is dropped on a surface of the semiconductor wafer through a resist application nozzle and thus applied thereon, and before the resist applied on the wafer dries, a cleaning liquid is supplied through a bevel cleaning nozzle to a portion of the wafer located at a peripheral portion thereof in a vicinity of a beveled portion to remove the resist adhering to the beveled portion. Thereafter, a film of the resist that is formed on the surface of the wafer is dried.Type: GrantFiled: October 2, 2006Date of Patent: July 12, 2011Assignee: Tokyo Electron LimitedInventors: Yoshiteru Fukuda, Nobuhiro Ogata, Takayuki Ishii, Keiji Tanouchi
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Patent number: 7972654Abstract: A planarizing coating method for filling a step between patterns formed on a board surface, includes the steps of: preparing at least two types of coating liquids different in non-volatile matter densities, first coating one of the coating liquids higher in density on the board surface, rotating the board so as to leave the one coating liquid inside the step and such that, at the same time, substantially none of the one coating liquid is left on a pattern crest of the patterns, subsequently coating another of the coating liquids lower in non-volatile matter density on the board surface, and rotating the board so that the coating liquid lower in density is left on a coating film comprising the one coating liquid higher in density and such that, at the same time, substantially none of the other coating liquid lower in density left on the pattern crest.Type: GrantFiled: November 8, 2007Date of Patent: July 5, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventor: Akihiko Nakamura
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Publication number: 20110155355Abstract: A heat-dissipation unit coated with oxidation-resistant nano thin film includes a metal main body having a heat-absorbing portion and a heat-dissipating portion, both of which are coated with at least a nano metal compound thin film. To form the nano metal compound thin film on the heat-dissipation unit, first form at least a nano compound coating on an outer surface of the heat-dissipation unit, and then supply a reduction gas into a high-temperature environment to perform a heat treatment and a reduction process on the heat-dissipation unit and the nano compound coating thereof, and finally, a nano metal compound thin film is formed on the surface of the heat-dissipation unit after completion of the heat treatment and the reduction process. With the nano metal compound thin film, the heat-dissipation unit is protected against formation of oxide on its surface and accordingly against occurrence of increased thermal resistance thereof.Type: ApplicationFiled: November 2, 2010Publication date: June 30, 2011Inventor: Ying-Tung Chen
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Publication number: 20110146905Abstract: A method for forming a patterned layer on the substrate structure, comprising the steps of providing a substrate structure, a plurality of banks formed on the substrate, the banks and the substrate cooperatively defining a plurality of accommodating rooms, jetting ink into the accommodating rooms using an ink jet device, and solidifying the ink in the accommodating rooms to form the patterned layer on the substrate structure.Type: ApplicationFiled: March 4, 2011Publication date: June 23, 2011Applicant: HON HAI PRECISION INDUSTRY CO., LTD.Inventors: CHING-YU CHOU, YEN-HUEY HSU, WEI-YUAN CHEN
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Publication number: 20110146764Abstract: This invention relates to compounds and compositions used to prepare semiconductor and optoelectronic materials and devices. This invention provides a range of compounds, compositions, materials and methods directed ultimately toward photovoltaic applications, as well as devices and systems for energy conversion, including solar cells. In particular, this invention relates to molecular precursor compounds, precursor materials and methods for preparing photovoltaic layers.Type: ApplicationFiled: September 17, 2010Publication date: June 23, 2011Applicant: PRECURSOR ENERGETICS, INC.Inventors: Kyle L. Fujdala, Wayne A. Chomitz, Zhongliang Zhu, Matthew C. Kuchta
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Patent number: 7964659Abstract: To provide an antireflection coating composition having a low surface tension and excellent coating properties and capable of forming an antireflection film with a low refractive index, without use of PFOS nor PFOA having 7 or more carbon atoms. An antireflection coating composition which contains a fluorinated surfactant (A) containing a compound (A1) represented by the following formula (I), a water-soluble polymer (B) and an aqueous medium (C): R1—O—(R2—O)n—R3—X1??(I) wherein R1 is a linear or branched perfluoroalkyl group of which the terminal fluorine atom may be substituted by a hydrogen atom or a chlorine atom, each of R2 and R3 which are independent of each other, is a linear or branched perfluoroalkylene group, provided that the total number of carbon atoms in R1, R2 and R3 is at most 5, n is 0 or an integer of at least 1, X1 is —COOH or —C(CF2Z1)(CF2Z2)OH, which may form a salt, and each of Z1 and Z2 is a hydrogen atom, a fluorine atom, a chlorine atom or a trifluoromethyl group.Type: GrantFiled: August 20, 2009Date of Patent: June 21, 2011Assignee: Asahi Glass Company, LimitedInventor: Nobuyuki Otozawa
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Publication number: 20110139586Abstract: Provided are media vacuum transport systems including media vacuum transport members, methods of making media vacuum transport members, and method of transporting media. In accordance with various embodiments, there is a media vacuum transport system including a vacuum plenum one or more transport members configured to rotate around the vacuum plenum and wherein at least one of the one or more transport members can include a substrate, the substrate comprising a plurality of holes extending from a first side proximate to the vacuum plenum to a second side proximate to the media, and a top coat layer disposed over the substrate, wherein the top coat layer can include a plurality of particles dispersed in a resin to provide an average surface roughness Ra of about 2 ?m to about 100 ?m.Type: ApplicationFiled: December 14, 2009Publication date: June 16, 2011Applicant: Xerox CorporationInventors: Liang-Bih LIN, Brian P. GILMARTIN, Ruddy CASTILLO, Elias PANIDES, James L. GIACOBBI, Linn C. HOOVER, Gary A. BATT
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Publication number: 20110139584Abstract: Provided are media vacuum transport systems including media vacuum transport members, methods of making media vacuum transport members, and method of transporting media. In accordance with various embodiments, there is a media vacuum transport system including a vacuum plenum one or more transport members configured to rotate around the vacuum plenum and wherein at least one of the one or more transport members can include a substrate, the substrate comprising a plurality of holes extending from a first side proximate to the vacuum plenum to a second side opposite the first side, and a top coat layer disposed over the substrate, wherein the top coat layer can include a plurality of particles dispersed in a polymer blend to provide an average surface roughness Ra of about 2 ?m to about 100 ?m.Type: ApplicationFiled: February 22, 2010Publication date: June 16, 2011Applicant: XEROX CORPORATIONInventors: Brian P. GILMARTIN, Liang-Bih LIN
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Publication number: 20110139747Abstract: A substrate section for a flexible display device is disclosed. The substrate section includes: a first substrate, a second substrate disposed above a center region of the first substrate, a reinforcing layer disposed between the first and second substrates, configured to reinforce adhesion between the first and second substrates, and a barrier layer disposed above the second substrate and surrounding side surfaces of the second substrate and of the reinforcing layer.Type: ApplicationFiled: April 21, 2010Publication date: June 16, 2011Applicant: SAMSUNG MOBILE DISPLAY CO., LTD.Inventor: Dong-Beom Lee
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Publication number: 20110136669Abstract: The invention relates to continuous fiber layers comprising an active substance on the basis of bio-polymers, comprising a fibrous, bio-polymer active substance carrier, and at least one active substance associated with the carrier and releasable from the continuous fiber layer; to formulations comprising an active substance, said formulations comprising such continuous fiber layers; to the use of continuous fiber layers comprising an active substance for the production of formulations comprising an active substance; and to a method for the production of continuous fiber layers comprising an active substance. The invention further relates to corresponding continuous fiber layers comprising an active substance and to the use thereof for the production of wound treatment and hygiene products, and to the respectively produced wound treatment and hygiene products.Type: ApplicationFiled: August 7, 2009Publication date: June 9, 2011Applicant: BASF SEInventors: Burghard Liebmann, Evgueni Klimov
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Publication number: 20110135820Abstract: After a solvent is discharged onto a substrate in a period from a time point t0 to a time point t1, rotation of the substrate is started at a time point t2. A resist liquid is discharged onto a center portion of a target surface of the substrate at a time point t3. A rotation speed of the substrate starts to decrease at a time point t4, and attains a first speed after a certain period of time. The discharge of the resist liquid is stopped at a time point t5. The rotation of the substrate is accelerated in a period from a time point t6 to a time point t7, and the rotation speed of the substrate attains a second speed at the time point t7. The rotation of the substrate is decelerated in a period from the time point t7 to a time point t8, and the rotation speed of the substrate attains a third speed at the time point t8.Type: ApplicationFiled: October 6, 2010Publication date: June 9, 2011Inventors: Masanori IMAMURA, Akihiro HISAI, Hidetoshi SAGAWA
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Publication number: 20110135945Abstract: The invention relates to a structure comprising: at least one mesostructured layer, prepared by a sol/gel method from at least one specific metallic molecular precursor in the presence of a specific texturing agent and a metal substrate. The invention further relates to the method for production and use thereof in aeronautics and aerospace.Type: ApplicationFiled: April 3, 2009Publication date: June 9, 2011Applicants: EURO. AERONAUTIC DEFENCE AND SPACE CO. EADS FRANCE, UNIVERSITE PARIS 6 PIERRE ET MARIE CURIE, CENTRE NATIONAL DE LA RECHERCHE SCI. (CNRS)Inventors: Sophie Monredon-Senani, Elisa Campazzi, Clement Sanchez, Lionel Nicole, Francois Ribot
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Publication number: 20110135847Abstract: A spin-on dielectric of novel composition formed as a sol comprising an a source of silicon such as an orthosilicate ester, alone or in combination with an alkylated orthosilicate ester, a polar solvent, water, an acid catalyst, which may be a strong acid catalyst, and an amphiphilic block copolymer surfactant, optionally including an organic acid, a co-solvent and/or a reactive solvent. Also provided is a method of formulating the sol, a film made from the spin-on dielectric that has desirable electrical and mechanical properties, methods for treating the film described to optimize the film's electrical and mechanical performance, and methods for depositing the film onto silicon, steel or other surfaces.Type: ApplicationFiled: January 20, 2011Publication date: June 9, 2011Inventors: Mark L. F. Phillps, Travis P.S. Thoms
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Patent number: 7955644Abstract: A method is provided for creating composites by combining pre-fabricated nanoscale structures (nanostructures) and other materials in which the nanostructures are anchored. This method results in anchored nanostructures with their base held and encased within the anchoring material to a specified depth and with a specified length of protrusion of the nanostructures from the anchoring material. This represents a major advance over previous methods of creating composites containing nanostructures which were limited to fully embedded nanostructures or, at best, very limited and uncontrolled protrusion of nanostructures. In summary, the current method involves bringing nanostructures and anchoring materials into physical contact in a controlled fashion and optionally conducting a treatment step to complete the anchoring process.Type: GrantFiled: July 10, 2007Date of Patent: June 7, 2011Assignee: California Institute of TechnologyInventors: Elijah Sansom, Derek Rinderknecht, Morteza Gharib
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Publication number: 20110129601Abstract: PBI compositions include solutions comprising PBI and acrylate monomer and coatings comprising PBI and polyacrylate. The solutions may also include polymerization initiator, solvent, co-polymers. The coatings are thermally resistant, electrically insulating (dielectric), and adhesive. The PBI compositions are used in the manufacture of microelectronics and related products. Methods for applying the PBI compositions are also discussed.Type: ApplicationFiled: December 1, 2010Publication date: June 2, 2011Inventors: John C. Moore, Gregory S. Copeland, Michael Gruender
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Patent number: 7947325Abstract: In a flexible transfer body employing curable resin as a transfer material, thickness unevenness in a substrate and a transfer layer is reduced and the thickness of the transfer layer is made to be uniform. Liquid curable resin is coated onto a rotation center or the vicinity of the rotation center of a mold, which is a rotator having a functional form on a surface thereof. A flexible film is brought into contact with a surface of the coated curable resin in a liquid state and the curable resin is spread to the circumferential edge of the mold by a centrifugal force. And the curable resin is cured by supplying chemical or thermal energy thereto and the curable resin is separated from the mold, thereby obtaining a flexible transfer body in which the curable resin is transferred to the film.Type: GrantFiled: February 28, 2006Date of Patent: May 24, 2011Assignee: Ricoh Company, Ltd.Inventors: Shozo Murata, Shinji Aoki
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Patent number: 7939131Abstract: The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.Type: GrantFiled: August 16, 2004Date of Patent: May 10, 2011Assignee: Molecular Imprints, Inc.Inventors: Frank Y. Xu, Christopher J. Mackay, Pankaj B. Lad, Ian M. McMackin, Van N. Truskett, Wesley D. Martin, Edward B. Fletcher, David C. Wang, Nicholas A. Stacey, Michael P. C. Watts
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Publication number: 20110104507Abstract: A layered structure including graphene, wherein a basal plane of the graphene is a (0001) plane; and a layer including an organic material having a conjugated system disposed on the graphene, wherein the layer comprising the organic material layer having the conjugated system is bound to the (0001) plane of the graphene by a ?-? interaction, and a method of preparing the same.Type: ApplicationFiled: November 1, 2010Publication date: May 5, 2011Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Jae-young CHOI, Do-hwan KIM, Soo-ghang IHN
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Patent number: 7927657Abstract: In a liquid processing apparatus for forming a coating film on a polygonal substrate by spin coating in an ambient with a descending clean air flow, a spin chuck includes a support plate for substantially horizontally supporting the substrate thereon. Air flow control members are provided on the spin chuck such that the air flow control member being disposed adjacent to a periphery of the polygonal substrate supported on the spin chuck, wherein the air flow control member is not provided near corner portions of the substrate supported on the spin chuck. The liquid processing apparatus may includes an air flow regulation ring which is provided with an air inlet having an opening surrounding an outer periphery of the air flow control member, wherein the air inlet communicates with the exhaust unit.Type: GrantFiled: June 26, 2009Date of Patent: April 19, 2011Assignee: Tokyo Electron LimitedInventors: Shinji Kobayashi, Tetsushi Miyamoto, Masahito Hamada
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Patent number: 7910161Abstract: This manufacturing device for an optical disc includes: a disc-supporting base on which a disc substrate is mounted; a pin-shaped member arranged at a center of the disc-supporting base, and is movable in the vertical in a center hole of the disc substrate; and a capping member which is slidably placed on a top of the pin-shaped member, and closes the center hole of the disc substrate, wherein when the capping member placed on the top of the pin-shaped member is lowered such that a back face of the capping member contacts an around of the center hole of the disc substrate mounted on the disc-supporting base, the capping member slides on the top of the pin-shaped member.Type: GrantFiled: October 18, 2007Date of Patent: March 22, 2011Assignee: Origin Electric Company, LimitedInventors: Hironobu Nishimura, Masahiro Nakamura
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Publication number: 20110064945Abstract: Provided are plastic substrates and methods of forming the same. The method includes applying a protective layer composition including reactive monomers on a organic substrate, and polymerizing the reactive monomers to form a protective layer.Type: ApplicationFiled: April 27, 2010Publication date: March 17, 2011Applicant: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Gi Heon KIM, Yong Hae Kim
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Patent number: 7906173Abstract: A resist coating method supplies a resist solution to substantially the center of a target substrate to be processed while rotating the target substrate at a first rotational speed, then reduces a rotational speed of the target substrate to a second rotational speed lower than the first rotational speed, reduces the rotational speed of the target substrate to a third rotational speed lower than the second rotational speed or until rotational halt to adjust the film thickness of the resist solution, and accelerates the rotation of the target substrate to a fourth rotational speed higher than the third rotational speed to spin off a residue of the resist solution.Type: GrantFiled: October 16, 2006Date of Patent: March 15, 2011Assignee: Tokyo Electron LimitedInventors: Kousuke Yoshihara, Tomohiro Iseki
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Patent number: 7906207Abstract: A coating composition comprises: a fluoro-aliphatic group-containing copolymer comprising a repeating unit A corresponding to a fluoro-aliphatic group-containing monomer, and a repeating unit B corresponding to at least one monomer, wherein each of the I/O values of said at least one monomer constituting the repeating unit B is 1.0 or less.Type: GrantFiled: September 26, 2005Date of Patent: March 15, 2011Assignee: Fujifilm CorporationInventor: Takato Suzuki
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Publication number: 20110059242Abstract: A method and device for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm.Type: ApplicationFiled: November 19, 2007Publication date: March 10, 2011Applicant: SEZ AGInventors: Michael Brugger, Alexander Schwarzfurtner
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Publication number: 20110052807Abstract: A substrate is rotated at a first rotation number (first step). The rotation of the substrate is decelerated to 1500 rpm that is a second rotation number and the substrate is rotated at the second rotation number for 0.5 seconds (second step). The rotation of the substrate is further decelerated to a third rotation number and the substrate is rotated at the third rotation number (third step). The rotation of the substrate is accelerated to a fourth rotation number and the substrate is rotated at the fourth rotation number (fourth step). A resist solution is continuously supplied to a center portion of the substrate from a middle of the first step to a middle of the third step.Type: ApplicationFiled: August 12, 2010Publication date: March 3, 2011Applicant: Tokyo Electron LimitedInventors: Katsunori Ichino, Koji Takayanagi, Tomohiro Noda
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Patent number: 7897206Abstract: A method of manufacturing an optical data storage medium, comprising at least one substrate (11) and a plurality of layers deposited on the substrate (11) is described. The medium includes at least one of a transparent spacer layer and transparent cover layer (12). The layer (12) is provided by applying a liquid onto the rotating substrate (11) and rotating the substrate (11) further in order to spread out the liquid into a layer substantially uniformly between an inner radius ri and an outer radius ro, and solidifying the liquid layer (12) by means of exposure to UV radiation. After applying the liquid onto the rotating substrate the liquid layer (12) is heated by heating means (14) in such a way that the temperature rise of the liquid layer (12) at ri has a value dTri, while the temperature rise of the liquid layer (12) between ri and ro gradually increases, and the temperature rise of the liquid layer (12) at ro has a value dTro>dTri.Type: GrantFiled: November 4, 2003Date of Patent: March 1, 2011Assignee: Koninklijke Philips Electronics N.V.Inventors: Petrus Helena Gerardus Maria Vromans, Katerina Musialkova, Fransiscus Sophia Josepha Petronella Van De Kerkhof, Erik Jan Prins, Johannes Cornelis Hendricus Jacobs
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Patent number: 7897195Abstract: Various embodiments of methods and devices for coating stents are described herein.Type: GrantFiled: June 15, 2007Date of Patent: March 1, 2011Assignee: Abbott Cardiovascular Systems Inc.Inventors: David Rego, Kurt Kilchenmann, Sang joon Park, Mark Haight, Anthony S. Andreacchi, Yung-Ming Chen, Arnoldo M. Currlin, Antonio Garcia, Jason Van Sciver, Thomas David Esbeck, Bryan D. Glenn, Patrick A. Tuohy, Richard Baillargeon, Edward P. Garcia, Steven E. Lehner
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Patent number: 7891366Abstract: A liquid processing apparatus includes a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state; a rotary cup configured to surround the substrate held on the substrate holding member, to rotate along with the substrate, and to receive the process liquid thrown off from the substrate; a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member; and a liquid supply mechanism configured to supply a process liquid onto the substrate. The apparatus further includes an annular drain cup and an annular exhaust cup with an exhaust port connected thereto to discharge a collected gas component. A gas-flow adjusting mechanism is disposed between the exhaust cup and the exhaust port and configured to adjust a gas flow of the gas component to flow toward the exhaust port from essentially all around within the exhaust cup.Type: GrantFiled: June 13, 2007Date of Patent: February 22, 2011Assignee: Tokyo Electron LimitedInventor: Norihiro Ito
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Publication number: 20110040029Abstract: A mixture includes a polymer solution, especially a cellulose solution, a first additive in the form of an inorganic lubricant and/or stabilizer, for example graphite, and a second additive as an adsorbent, for example activated carbon. The inorganic lubricants and/or stabilizers do not weaken the positive properties of the adsorbent but can even improve them. The mixture can be used to produce fibers (7) or moldings.Type: ApplicationFiled: August 14, 2008Publication date: February 17, 2011Inventor: Josef Glaser
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Patent number: 7887879Abstract: Disclosed herein are a coating solution for the formation of a dielectric thin film and a method for the formation of a dielectric thin film using the coating solution. The coating solution comprises a titanium alkoxide, a ?-diketone or its derivative, and a benzoic acid derivative having an electron donating group. The method comprises spin coating the coating solution on a substrate to form a thin film and drying the thin film at a low temperature to crystallize the thin film. The titanium-containing coating solution is highly stable. In addition, the coating solution enables formation of a thin film, regardless of the kind of substrates, and can be used to form dielectric thin films in an in-line mode in the production processes of PCBs.Type: GrantFiled: May 8, 2009Date of Patent: February 15, 2011Assignee: Samsung Electro-Mechanics Co., Ltd.Inventors: Jun Hee Bae, Seung Hyun Kim, Yul Kyo Chung, Won Hoon Song, Sung Taek Lim, Hyun Ju Jin
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Patent number: 7884033Abstract: An apparatus for processing microelectronic topographies, a method of use of such an apparatus, and a method for passivating hardware of microelectronic processing chambers are provided. The apparatus includes a substrate holder configured to support a microelectronic topography and a rotatable case with sidewalls arranged on opposing sides of the substrate holder. The method of using such an apparatus includes positioning a microelectronic topography upon a substrate holder of a processing chamber, exposing the microelectronic topography to a fluid within the processing chamber, and rotating a case of the processing chamber. The rotation is sufficient to affect movement of the fluid relative to the surface of the microelectronic topography. A method for passivating hardware of a microelectronic processing chamber includes exposing the hardware to an organic compound and subsequently exposing the hardware to an agent configured to form polar bonds with the organic compound.Type: GrantFiled: November 11, 2009Date of Patent: February 8, 2011Assignee: Lam ResearchInventor: Igor C. Ivanov