Abstract: A device for coating a film with more than two kinds of thickness, including a turntable, a mask and a coating source. The turntable spins regularly. The shape of the mask depends on the thickness of the film and the mask is set close to the substrate. The coating source is set opposite to the turntable, and the mask is set between the coating source and the turntable. The invention also discloses a method for coating a film with more than two kinds of thickness. The method including setting a substrate on a turntable that spins regularly, setting a mask close to the substrate and coating a film on the substrate by a coating source.

Abstract: In a method of coating a CMC fiber, the fiber is passed through a reaction zone along a path substantially parallel to a longitudinal axis of the zone, a flow of fiber coating reactant is passed though the reaction zone, at least a portion of the flow of reactant is disrupted from a path substantially parallel to the fiber path to create a mixing flow adjacent the fiber. A coating reactor includes a reactor chamber to accommodate a fiber passing along a path substantially parallel to a longitudinal axis of the chamber and a flow of fiber coating reactant. The reactor chamber further includes a flow disrupter located within the reactor chamber to disrupt at least a portion of the flow of reactant from a path substantially parallel to the fiber path to create a mixing flow adjacent the fiber.

Abstract: A substrate processing device in which a film is formed on a substrate while a magnetic field, by a magnet arranged in the periphery of a substrate holder, is imparted on to the surface of a substrate mounted on the substrate holder while the substrate holder is rotated, wherein a rotation mechanism for the magnet and a rotation mechanism for the substrate holder are independently provided and controlled and, furthermore, in that it is provided with a device for detection of the magnetic field orientation, a device for detection of the prescribed orientation of the substrate, and a mechanism which, using the output of said two detection devices, affords rotation in which the prescribed direction of the substrate and the direction of the magnetic field are aligned within a prescribed angle.

Abstract: A solid composition having a solid state film forming substance mixed with an inert carrier. The composition is heated in a vacuum chamber to evaporate the film forming substance by sublimation to form a molecular beam of amphiphilic molecules which settle on a substrate surface within the chamber and bond thereto while self-assembling into a thin film.

Abstract: A new fluidized bed particle coating method is disclosed by the use of which coatings can be uniformly and conveniently deposited on the surfaces of fluidized particulate materials by vapor deposition processes at temperatures lower than those of the heated coating precursor transport lines. By this method, particle materials with relatively low surface temperatures may be brought into close proximity with a coating precursor containing gas stream characterized by a substantially higher gas volume temperature in such a way that the vaporized precursor molecules are caused to adsorb or condense on the relatively cold particle surfaces without also condensing on any other surface. Further, if the adsorbed precursor molecules are capable of reacting or polymerizing on the relatively cold particle surfaces, thus forming substantially continuous coatings on those surfaces, they may do so without also depositing such coatings on any other surfaces.

Abstract: A process for depositing an antimony-containing coating upon a surface of a heated glass substrate includes dissolving an antimony halide in an organic solvent to form an antimony halide containing solution. This solution is then vaporized to form a gaseous antimony precursor. The gaseous antimony precursor is then directed toward and along the surface of the heated glass substrate. The antimony precursor is reacted at or near the surface to form an antimony containing coating.

Abstract: Methods and systems are provided for making a coated plastic container, such as for packaged beverages, possessing a gas barrier and having enhanced resistance to loss in barrier due to handling abuses expansion of walls of the container. The system comprises a vacuum cell, a coating source in the vacuum cell for supplying a coating vapor to an external surface of a plastic container positioned within the vacuum cell, and gas feeds for supplying one or more process gases into an interior space of the vacuum cell. The coating source heats and evaporates an inorganic coating material, such as metal or silicon, to form a coating vapor, which is energized to form a plasma. The process gases include a carbon-containing gas, such as acetylene.

Abstract: A method for depositing a functionally gradient thin film of the present invention includes the steps of: introducing two or more types of material gases into a process chamber which includes a cylindrical rotary electrode provided so as to be opposed to a substrate on which a thin film is deposited, the cylindrical rotary electrode being rotated by applying a high-frequency power thereto; and sliding the substrate into the process chamber while maintaining the rotation of the cylindrical rotary electrode so as to create plasma between the cylindrical rotary electrode arid the substrate for depositing the thin film.

Abstract: Disclosed is a method for producing semiconductor fine particles comprising a step of preparing two or more solutions each containing at least one element selected from Group II to Group VI and feeding the solutions to an addition tank with mixing the two or more solutions fed to the addition tank by stirring to produce fine particles. In this production method, (1) flows of different rotational directions are formed by stirring the two or more solutions fed to the addition tank, and/or (2) a solvent is introduced into the addition tank beforehand, a mixing chamber having an opening is disposed below liquid surface of the solvent in the addition tank, and the two or more solutions are fed to the mixing chamber with controlling flow rates of the solutions. According to this production method, semiconductor fine particles having uniform grain sizes can be produced in a simple and convenient manner.

Abstract: A whole organic EL display fabricating apparatus is provided inside a vacuum chamber. In this case, a first patterning unit B through a third patterning unit D for sequentially forming luminescent layer patterns of GREEN, BLUE, and RED on an anode pattern on a strip-shaped flexible substrate 1, and a fourth patterning unit E for forming a cathode pattern on the subsequent stage are provided. The first patterning unit B is provided with a first cooling can 21 and a vacuum vapor deposition unit below for forming the luminescent layer pattern of GREEN. The structures of the second patterning unit through the fourth patterning unit are similar to that of the first patterning unit. In fabricating a display, the substrate 1 is caused to travel from the first cooling can 21 toward a fourth cooling can 64 by the roll-to-roll system.

Abstract: The disclosure herein relates to a high throughput system for thin film deposition on substrates which can be used in applications such as optical disks, and in particular DVD disks, chip-scale packaging, and plastic based display, for example. An apparatus useful in the production of products of the kind described above includes: (a) a continuously moving web for simultaneously transporting a number of substrates to which a thin film of material is to be applied, wherein the moving web is a roll-to-roll moving web; (b) a central processing chamber which is maintained under vacuum and through which at least a portion of said continuously moving web travels; and, (c) at least one deposition device which is located within said central processing chamber, where at least a portion of said continuously moving web is exposed to material deposited from said deposition device. Typically the deposition device is a magnetron sputtering device.

Abstract: Barrier film with a high colorless transparency comprising a flexible plastic substrate. A barrier layer is formed on the surface and has a thickness ranging from approximately 50 to less than 200 Angstroms and is formed of a material selected from the group of aluminum oxide, tin oxide and yttrium oxide. An additional barrier layer formed of silicon dioxide may also be formed on the barrier layer.

Abstract: The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method.

Abstract: A multiple nozzle thermal evaporation source includes a plurality of nozzles having a tapered shape. The nozzles may be coated with a thermally conductive material with a low emissivity material.

Abstract: A physical vapor deposition apparatus and process are provided for providing a highly smooth shiny coating to a substrate. The apparatus includes a chamber with a fixture for mounting the components to be coated. The fixture is arranged such that the surfaces to be coated define a “dark side” that faces away from the source of ion bombardment. With this arrangement, heavier multiple ions will travel past the surface to be coated. Lighter single ions will be drawn more readily to the oppositely charged surface to be coated, and hence will undergo a non-linear travel path for deposition onto the component.

Abstract: An apparatus for depositing a material by evaporation on a substrate having a large surface. The apparatus includes an enclosure in which are placed a number of material evaporation sources. It also includes a device for channeling or piping of vapors emitted by the sources toward the substrate during evaporation. This is formed by walls or covers which define compartments within the enclosure, each evaporation source being placed in a compartment. The apparatus can also utilize a device for moving the substrate in order to improve the uniformity of the deposit.

Abstract: A method for forming metallic nanoclusters upon a substrate includes moving the substrate through a deposition chamber at a predetermined uniform velocity and depositing metallic precursor compounds onto the substrate. The metallic precursor compounds are subsequently bombarded with an ultrasonic jet of atomic hydrogen to form the metallic nanoclusters.

Abstract: An epitaxial growth system is provided with a susceptor driving mechanism for rotationally driving a susceptor in a process chamber and this susceptor driving mechanism has a support shaft coupled to the susceptor, a driven portion, and an annular member with a plurality of permanent magnets arranged outside the driven portion. The driven portion is constructed in such structure that a coating for corrosion prevention consisting of a nickel coating, a chromium coating, and a metal oxide film formed by a passivation treatment with ozone is provided on a surface of a magnetic member.

Abstract: A method for fabricating an organic light emitting diode. The method forms an anode, an organic emitting layer and a cathode sequentially on a substrate. When the interface between the anode and the organic emitting layer is forming, the depositional rate of the anode on the substrate is decreasing and the deposition rate of the organic emitting layer on the substrate is increasing. When the interface between the organic emitting layer and the cathode is forming, the deposition rate of the organic emitting layer on the substrate is decreasing, and the deposition rate of the cathode on the substrate is increasing. This method can form a hazy heterojunction between the anode, the organic emitting layer and the cathode, thus forming an organic light emitting diode with a hazy heterojunction.

Abstract: A differentially pumped deposition system is described that includes a deposition source, such as a magnetron sputtering source, that is positioned in a first chamber. The deposition source generates deposition flux comprising neutral atoms and molecules. A shield that defines an aperture is positioned in the path of the deposition flux. The shield passes the deposition flux though the aperture and substantially blocks the deposition flux from propagating past the shield everywhere else. A substrate support is positioned in the second chamber adjacent to the shield. The pressure in the second chamber is lower than a pressure in the first chamber. A dual-scanning system scans the substrate support relative to the aperture with a first and a second motion, thereby improving uniformity of the deposited thin fill.

Abstract: A method for forming a thin film includes the steps of: supplying a deposition material in the form of a liquid onto a heated surface; heating and vaporizing the deposition material on the heated surface while the deposition material is undergoing movement; and depositing the deposition material onto a deposition surface. The deposition material is supplied onto a position of the heated surface where the vaporized deposition material does not reach the deposition surface.

Abstract: A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for moving the substrate through the muffle and chamber. The belt 105 has an oxidation-resistant coating 175 to reduce formation of deposits thereon. The coating 175 is particularly useful for resisting formation of chromium oxides on belts made from a chromium-containing alloy. In one embodiment, the oxidation-resistant coating 175 comprises a securely-adhered oxide layer 185 that is substantially free of transition metals. Preferably, the oxidation-resistant coating 175 comprises aluminum oxide. More preferably, the coating 175 comprises an aluminum oxide layer 185 securely adhered over a nickel aluminide layer 180.

Abstract: A system and method for coating substrates. The coating process includes an improved capacity and uniformity through the addition of a second motion component in which the substrates move in a closed path. A major portion of the path is linear and the configuration of the coating machine is such that all substrates follow the same trajectory with respect to the machine during the coating process, resulting in a coating which is substantially the same for all substrates.

Abstract: The invention relates to a method of producing an antifriction element (6), by means of which a coating is applied to at least one surface (10) of the antifriction element (6) under vacuum, by guiding the antifriction element (6) through a particle flow (4), which at least partially forms the coating, in a rotary motion about an axis perpendicular to the particle flow longitudinal median axis (5) or parallel with a length of a device containing the coating substance (2).

Abstract: A method and apparatus for reducing particle contamination in a substrate processing chamber during deposition of a film having at least two layers. The method of the present invention includes the steps of introducing a first process gas into a chamber to deposit a first layer of the film over a wafer at a first selected pressure, introducing a second process gas into the chamber to deposit a second layer of the film over the wafer, and between deposition of said first and second layers, maintaining pressure within the chamber at a pressure that is sufficiently high that particles dislodged by introduction of the second process do not impact the wafer.

Abstract: A vacuum lubricant deposition station coats a lubricant onto the back side of a moving web prior to coating the front side with emulsions. The deposition station has a sidewall creating a chamber containing a heat source along its bottom and an evaporating tray above the heater which holds the lubricant to be vacuum vapor deposited on the web. A water cooled jacket fits about the top of the sidewall and receives the film through a narrow slot between its top and bottom plates to expose the back side of the film to a vapor cloud of lubricant in the chamber. Lubricant from the cloud deposits on the back side of the web. Stray lubricant from the cloud condenses on the bottom plate which receives cooling water through an inlet. The cooling water traverses the length of the bottom plate, enters the top plate through a water loop connecting the top and bottom plates, and exits through the top plate. The vapor cloud condenses on the bottom plate before reaching the front side of the film.

Abstract: A line-type film-forming method for sequentially forming aluminum metallized films and silicone plasma polymerized protective films on a plurality of synthetic-resin base materials. The films are formed by moving a case, which houses the synthetic-resin base materials, successively in line through an aluminum metallizing chamber and a plasma polymerized film forming chamber so as to form a reflector that can be mounted in a discharge headlamp.

Abstract: A method and apparatus are described for transferring processing structures between first and second processing environments. The apparatus includes a first apparatus compartment configured to provide the first processing environment and a second apparatus compartment configured to provide the second processing environment. The apparatus is preferably configured for transferring wafer structures between the processing environments. The first and second processing environments are coupled together through a transfer passage that is opened and closed in order to isolate the wafer in a small transfer volume between the processing environments. Preferably, the transfer passage is opened and closed with first and second movable tables to create the small volume transfer cavity.

Abstract: A method for producing a laminated metal ribbon comprises the steps of (a) vapor-depositing a third metal layer on at least one welding surface of a first metal ribbon 4 and a second metal ribbon 5 in a vacuum chamber 1, the third metal being the same as or different from a metal or an alloy of the first and second metal ribbons 4, 5; (b) pressure-welding the first metal ribbon 4 to the second metal ribbon 5; and (c) subjecting the resultant laminate 9 to a heat treatment for thermal diffusion.

Abstract: A process for producing antiadhesive layers on a web-form material, characterized in that the antiadhesive layers are applied to the web-form material by means of low pressure plasma polymerization by guiding the web-form material continuously through a plasma zone containing a low pressure plasma.

Abstract: An improved method and apparatus for applying discrete area holograms or other optical devices directly onto documents or other substrates in a continuous process analogous to the operation of a printing press. The continuous process is carried out in a vacuum chamber in which at least two process steps are performed in sequence: the formation of a micro-grooved discrete resin area and a localized coating of it with a reflective or refractive material layer. The formation of the micro-grooved resin area can be accomplished by electron beam curing of the resin. The localized coating of the micro-grooved resin can be done by sputtering. One or more other steps, including pre-coating, post-coating and partial removal of the reflective or refractive layer, may also be carried out as part of the continuous process within the vacuum chamber.

Abstract: The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: A system and method for controlling a circumferential deposition thickness distribution on a substrate includes a motor that rotates the substrate and a position sensor that senses a position of the substrate. At least one deposition thickness sensor senses the deposition thickness of the substrate at multiple positions on a circumference of a circle centered about an axis of rotation of the substrate. At least one controller drives a vapor source used to emit material for a deposition on a substrate. The at least one controller is coupled to the position sensor and the deposition thickness sensor. The controller synchronously varies an emission rate of material from the vapor source with respect to the position of the substrate to control the circumferential deposition thickness distribution.

Abstract: A method and article are disclosed wherein a substrate is provided with a photocatalytically-activated self-cleaning surface by forming a photocatalytically-activated self-cleaning coating on the substrate by spray pyrolysis chemical vapor deposition or magnetron sputter vacuum deposition. The coating has a thickness of at least about 500 Angstroms to limit sodium-ion poisoning to a portion of the coating facing the substrate. Alternatively, a sodium ion diffusion barrier layer is deposited over the substrate prior to the deposition of the photocatalytically-activated self-cleaning coating to prevent sodium ion poisoning of the photocatalytically-activated self-cleaning coating. The substrate includes glass substrates, including glass sheet and continuous float glass ribbon.

Abstract: Pyrolytic carbon of extremely uniform crystalline characteristics and essentially free of discontinuities is obtained in a fluidized bed coater by creating an asymmetric recirculation of the fluidized bed within the high temperature coating chamber. Through the use of any of a variety of gas injection schemes, fluidizing/coating gas mixtures are injected through the three-dimensionally curved concave bottom surface of the coater to create a pattern where the fluidized bed ascends within about one-half of the volume of the coater and then spills over to become a descending bed in the other half.

Abstract: A method of coating a liquid or solid particulate core involves dropping or suspending the particulate core in an atmosphere and then applying a liquid coating while the particulate core is dropped or suspended, the applying of the liquid coating being done by either (a) spraying the liquid coating onto the particulate core with an ink jet or (b) moving the particulate core through a fog of the liquid coating.

Abstract: The present invention is a method of depositing a lubricating layer on an imaging element. The method includes providing a polymer or a wax selected from the group consisting of polytetrafluoroethylene (PTFE), fluorinated ethylene propylene (FEP), fluorinated ethylene copolymers, polyethylenes, high density polyethylene, natural waxes such as Carnauba wax, synthetic waxes, and silicone waxes in a deposition chamber. The chamber is evacuated to a pressure of 10−1 Torr or less. A carrier gas, preferably selected from N2, O2, Ar, is bled into the chamber while maintaining the pressure in the chamber to 100 mTorr or less. The polymer or wax is heated to a temperature sufficient to vaporize the polymer or wax, and the imaging element is continuously moved through the chamber depositing the polymer or wax on the imaging element to form the lubricating layer.

Abstract: Chemical vapor deposition coating is carried out in a cylindrical cavity. The fibers are heated by a microwave source that is uses a TM0N0 mode, where O is an integer, and produces a field that depends substantially only on radius. The fibers are observed to determine their heating, and their position can be adjusted. Once the fibers are uniformly heated, a CVD reagent is added to process the fibers.

Abstract: A plasma treatment method comprising exhausting a process chamber so as to decompress the process chamber, mounting a wafer on a suscepter, supplying a process gas to the wafer through a shower electrode, applying high frequency power, which has a first frequency f1 lower than an inherent lower ion transit frequencies of the process gas, to the suscepter, and applying high frequency power, which has a second frequency f2 higher than an inherent upper ion transit frequencies of the process gas, whereby a plasma is generated in the process chamber and activated species influence the wafer.

Abstract: Methods and apparatuses for coating medical devices and the devices thereby produced are disclosed. In one embodiment, the invention includes a method comprising the steps of suspending the medical device in an air stream and introducing a coating material into the air stream such that the coating material is dispersed therein and coats at least a portion of the medical device. In another embodiment, the medical devices are suspended in an air stream and a coating apparatus coats at least a portion of the medical device with a coating material. The coating apparatus may include a device that utilizes any number of alternative coating techniques for coating the medical devices. This process is used to apply one or more coating materials, simultaneously or in sequence. In certain embodiments of the invention, the coating materials include therapeutic agents, polymers, sugars, waxes, or fats.

Abstract: The subject of the invention is a glazing panel comprising a transparent substrate (1) especially one made of glass, provided with at least one functional, conductive and/or low-emissivity, transparent thin film (3). In order to improve the optical and especially the calorimetric appearance of the glazing panel, at least one intermediate film (2) is placed between the substrate (1) and the functional film (3), this at least one intermediate film having a refractive index gradient decreasing through its thickness. The invention also relates to the device intended for manufacturing this type of glazing panel.

Abstract: A method for lubricating a thin film magnetic media is disclosed wherein the magnetic media is lubricated only at the head-disc interface zone. The method comprises the steps of vaporizing the lubricant, mixing the lubricant with a carrier gas stream, and depositing a film of the lubricant on at the loading zone on the surface of the magnetic media. The lubricant film can be selectively deposited on the surface of the magnetic disc at any location and at any thickness. In one embodiment of the invention, the lubricant film forms a radial band on the surface of the magnetic disc located near the outside diameter of the magnetic disc.

Abstract: To provide a deposited-film forming process and a deposited-film forming apparatus that may cause no scratches on the film forming surface to improve yield and enable stable discharge to thereby continuously form deposited films having uniform quality and uniform thickness, deposited films are formed by lengthwise continuously transporting a belt-like substrate so as to form a part of a discharge space, wherein the substrate is transported while bringing the transverse sectional shape of the substrate which forms a part of the discharge space into a curved shape by a roller.

Abstract: Computer controlled fiber coating chemical vapor deposition system and method for generating substantially uniform coated fibers by maintaining chemical vapor deposition reactor temperature in real time. Reactor temperature is monitored by in situ temperature sensors. Reactor temperature is sensitive to oxygen levels and oxygen levels within the reactor are varied in response to temperature sensor data. Closed loop process control software maintains reactor temperature at a preselected value resulting in predictable fiber coatings of a preselected thickness, crystallinity and chemistry.

Abstract: A vacuum deposition system has been designed to produce thin film based demultiplexers with high throughput and production yields of greater than 25% for use in Dense Wavelength Division Multiplexer (DWDM) systems. The system employs a dense array of high yield fixtures and an ion assisted movable dual electron beam evaporation system. The fixture array increases acceptable yields of narrow band pass filters to 25-75% compared to less than 5% in conventional coating systems used for DWDM. The movable e-beam system allows critical symmetry to be maintained while eliminating significant delays resulting from deposition of two materials from a single electron gun. The vacuum deposition system will enable production of more than 15,000 50-200 GHZ filters which meet specifications for DWDM demultiplexers every 48 hours.

Abstract: A film forming method is described using an apparatus with a plurality of vacuum chambers which communicate with each other via a connection, where the apparatus has one or more detachable treatment rooms and where the method includes continuously forming a plurality of films on a band-shaped substrate within the treatment rooms, while continuously moving the substrate through the treatment rooms. The treatment rooms within said desired vacuum chambers are replaced after forming the film for a predetermined period as a part of the film forming method.

Abstract: A thin film deposition apparatus and method are disclosed in this invention. The method includes a step of providing a vacuum chamber for containing a thin-film particle source for generating thin-film particles to deposit a thin-film on the substrates. The method further includes a step of containing a substrate holder in the vacuum chamber for holding a plurality of substrates having a thin-film deposition surface facing the thin-film particle source. The method further includes a step of providing a rotational means for rotating the substrate holder to rotate each of the substrates exposed to the thin-film particles for depositing a thin film thereon. And, the method further includes a step of providing a lateral moving means for laterally moving and controlling a duration of exposure time across a radial direction for each of the substrates for controlling thickness uniformity of the thin-film deposited on each of the substrates.

Abstract: The present invention relates to a process for electron cyclotron resonance plasma deposition of electron-emitting carbon films, in which by injecting a microwave power into a plasma chamber incorporating an electron cyclotron resonance zone (9), ionization takes place of a gaseous mixture under a low pressure, the thus created ions and electrons diffusing along the magnetic field lines (6) to a substrate (3), the gaseous mixture comprising organic molecules and hydrogen molecules. Said process comprises the following stages: heating the substrate (3), creating a plasma from the ionized gaseous mixture, creating a potential difference between the plasma and the substrate, diffusion of the plasma up to the substrate (3) which, by heating, has reached a temperature such that said electron-emitting material is deposited on the substrate.

Abstract: In an air lock for continuous introduction into and/or removal of workpieces from spaces (1, 4) separated atmospherically, the individual substrates (3, 13) are transported through a transfer channel (24). At least one lock chamber (7a-7m) serving to accommodate the substrates (3, 13) is arranged movably in the transfer channel (24). During the substrate transport in the transfer channel (24), the lock chamber (7a-7m) is atmospherically separated both from the exterior (1) having normal pressure and from the coating chamber (4). The air lock (2) includes a carrousel lock which has a carrousel housing (24) and a lock chamber wheel (10). On the periphery in the lock chamber wheel (10) individual lock chambers (7a-7m) are provided, in which the workpieces (3, 13) to be brought into the chamber to be loaded (4) are inserted freely accessible on the normal pressure side.

Abstract: In a plasma CVD system comprises a reactor the inside of which can be evacuated, a substrate holding means provided in the reactor, a material gas feed means for feeding into the reactor a material gas for plasma CVD, a high-frequency power supply means for supplying to a plasma-producing high-frequency electrode a high-frequency power having an oscillation frequency in the range of from 30 MHz to 600 MHz, generated by a high-frequency power source, and an exhaust means for exhausting a gas remaining in the reactor after the reaction; the high-frequency power generated in the high-frequency power source being supplied to the plasma-producing high-frequency electrode to cause a plasma to take place across a substrate held by the substrate holding means and the plasma-producing high-frequency electrode to form a deposited film on the substrate; the phase of reflected power is adjusted on the plasma-producing high-frequency electrode at its part on the opposite side of the feeding point.