Plasma Initiated Polymerization Patents (Class 427/488)
  • Patent number: 6613394
    Abstract: Described is a method of treating or coating homogeneously at least a portion of the surface of a material selected from metallic materials having a thickness of less than 100 &mgr;m and/or polymeric materials. The method of the present invention comprises exposing at least a portion of the surface of the material to an atmospheric plasma generated by an indirect plasmatron. In the method of the present invention, the surface of the material may undergo at least one of an increase in surface tension, a surface grafting, a surface cleaning and a surface sterilization.
    Type: Grant
    Filed: March 6, 2001
    Date of Patent: September 2, 2003
    Assignee: Wolff Walsrode AG
    Inventors: Christian Kuckertz, Sven Jacobsen, Rainer Brandt, Klaus Landes, Ralf Hartmann
  • Patent number: 6613393
    Abstract: A method for applying wear protection layers including the steps of depositing a wear protection matrix with the aid of a PECVD method, and incorporating optically functional inclusions in the form of particles or intermediate layers with the aid of a PVD process. The chemistry of the inclusion is influenced by the process gas of the PECVD deposition and/or the matrix layer. In an example embodiment of the present invention, the optical functionality consists in UV protection of plastics by dispersion, absorption, or reflection of the UV component of the light.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: September 2, 2003
    Assignee: Robert Bosch GmbH
    Inventors: Johannes Rauschnabel, Johannes Voigt
  • Publication number: 20030157267
    Abstract: Low dielectric constant porous materials with improved elastic modulus and film hardness. The process of making such porous materials involves providing a porous dielectric material and plasma curing the porous dielectric material with a fluorine-free plasma gas to produce a fluorine-free plasma cured porous dielectric material. Fluorine-free plasma curing of the porous dielectric material yields a material with improved modulus and hardness, but with a higher dielectric constant. The improvement in elastic modulus is typically greater than or about 100%, and more typically greater than or about 200%. The improvement in film hardness is typically greater than or about 50%. The fluorine-free plasma cured porous dielectric material can optionally be post-plasma treated.
    Type: Application
    Filed: January 17, 2003
    Publication date: August 21, 2003
    Inventors: Carlo Waldfried, Qingyuan Han, Orlando Escorcia, Ralph Albano, Ivan L. Berry, Atsushi Shiota
  • Patent number: 6599584
    Abstract: Methods and systems are provided for making a coated plastic container, such as for packaged beverages, possessing a gas barrier and having enhanced resistance to loss in barrier due to handling abuses expansion of walls of the container. The system comprises a vacuum cell, a coating source in the vacuum cell for supplying a coating vapor to an external surface of a plastic container positioned within the vacuum cell, and gas feeds for supplying one or more process gases into an interior space of the vacuum cell. The coating source heats and evaporates an inorganic coating material, such as metal or silicon, to form a coating vapor, which is energized to form a plasma. The process gases include a carbon-containing gas, such as acetylene.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: July 29, 2003
    Assignee: The Coca-Cola Company
    Inventors: George Plester, Horst Ehrich
  • Patent number: 6589715
    Abstract: A process for etching a PPMS layer that increases the etch selectivity of PPMS relative to PPMSO from an initial low etch selectivity to a higher etch selectivity at a later stage of the etching process. In some embodiments, the etch selectivity used during a first etching step of the process is less than 4:1 and the etch selectivity used during a second etching step, subsequent to the first step, is greater than 5:1. In some other embodiments, the etch selectivity of the first step is between 2-3:1 and the etch selectivity of the second step is greater than 8:1. Optionally, in still other embodiments a third etching step, performed between the first and second etching steps may be employed where the etch selectivity is between 3-8:1.
    Type: Grant
    Filed: March 15, 2001
    Date of Patent: July 8, 2003
    Assignees: France Telecom, Applied Materials, Inc.
    Inventors: Olivier Joubert, Cedric Monget, Timothy Weidman, Dian Sugiarto, David Mui
  • Publication number: 20030113477
    Abstract: A device, and its production method, the device has a substrate and a coating composition, the coating composition being formed by the gas phase or plasma polymerization of a gas comprising at least one organic compound or monomer. The polymerization is carried out using a pulsed discharge having a duty cycle of less than about ⅕, in which the pulse-on time is less than about 100 msec and the pulse-off time is less than about 2000 msec. The duty cycle can also be varied, thus the coating composition can be gradient layered accordingly. The device has a coating composition which is uniform in thickness, pin-hole free, optically transparent in the visible region of the magnetic spectrum, permeable to oxygen, abrasive resistant, wettable and biologically non-fouling.
    Type: Application
    Filed: October 22, 2002
    Publication date: June 19, 2003
    Applicant: Board of Regents, The University of Texas System
    Inventors: Richard B. Timmons, Jenn-Hann Wang, Charles R. Savage, Yuliang Wu
  • Patent number: 6544600
    Abstract: A method for making conjugated polymers. The method includes flash evaporating a conjugated material forming an evaporate, passing the evaporate to a glow discharge electrode creating a glow discharge conjugated material plasma from the evaporate, and cryocondensing the glow discharge conjugated polymer precursor plasma on a substrate as a condensate and crosslinking the condensate thereon, the crosslinking resulting from radicals created in the glow discharge conjugated material plasma.
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: April 8, 2003
    Assignee: Battelle Memorial Institute
    Inventors: John D. Affinito, Gordon L. Graff, Mark E. Gross
  • Publication number: 20030059573
    Abstract: Devices, and their method of production, having coatings deposited by pulsed plasma polymerization of a macrocycle containing a heteroatom, wherein the heteroatom is oxygen, nitrogen, sulfur, or a mixture thereof The coatings on contact lens are preferably deposited by gas phase polymerization of a cyclic ether, such as crown ether, which coatings are non-fouling and wettable, and the gas phase polymerization utilizes a pulsed discharge.
    Type: Application
    Filed: October 26, 2001
    Publication date: March 27, 2003
    Applicant: Board of Regents, The University of Texas System
    Inventors: Richard B. Timmons, Yuliang Wu
  • Publication number: 20030054117
    Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 &mgr;m or smaller) features.
    Type: Application
    Filed: February 2, 2001
    Publication date: March 20, 2003
    Applicant: BREWER SCIENCE, INC.
    Inventors: Ram W. Sabnis, Douglas J. Guerrero
  • Patent number: 6528170
    Abstract: The invention relates to a metal substrate with a corrosion-resistant coating produced by means of plasma polymerization, wherein the substrate is subjected to mechanical, chemical and/or electrochemical smoothing in a pre-treatment step and is subsequently exposed to a plasma at a temperature of less than 200° C. and at a pressure of 10−5 bis 100 mbars, whereby in a first step the surface is activated in a reducing plasma and in a second step the polymer is separated from a plasma containing at least one hydrocarbon or silico-organic compound which can be vaporized in plasma conditions, optionally contains oxygen, nitrogen or sulphur and can contain fluorine.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: March 4, 2003
    Assignee: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e. V.
    Inventors: Alfred Baalmann, Henning Stuke, Klaus-Dieter Vissing, Hartmut Hufenbach, Wolfgang Semrau
  • Patent number: 6520650
    Abstract: A no base coat vehicle headlamp reflector can be improved with a plasma deposited layer of a siloxane material. The siloxane layer acts as an barrier layer formed directly on the vehicle reflector. The vehicle headlamp reflector with no base coat, but an barrier layer yields a resin lamp interior protected from upsets in the reflective layer and from outgasing condensate. The lamp reflector coated with plasma polymer of methanol yields a plastic lamp reflector resistant to condensation forming thereon, and resistant to attach by water vapor.
    Type: Grant
    Filed: February 8, 1999
    Date of Patent: February 18, 2003
    Assignee: Valeo Sylvania L.C.C.
    Inventor: Robert L. Fraizer
  • Patent number: 6514573
    Abstract: A method for reducing crazing in a plastics material characterised in that it comprises the steps of: (1) cleaning the surface of the material; and (2) exposing the cleaned surface to plasma of a monomer vapour so as to produce a substantially non-oxidising plasma polymer coating on the surface.
    Type: Grant
    Filed: March 25, 1999
    Date of Patent: February 4, 2003
    Assignee: Commonwealth Scientific and Industrial Research Organisation
    Inventors: Jonathan Howard Hodgkin, Hans Jorg Griesser, Thomas Reinhold Gengenbach
  • Patent number: 6509065
    Abstract: The method of the present invention has the steps of (a) flash evaporating a conjugated material in an evaporate outlet forming an evaporate; (b) passing the evaporate to a glow discharge electrode creating a glow discharge conjugated monomer plasma from the evaporate; and (c) cryocondensing the glow discharge conjugated monomer plasma on a substrate and crosslinking the glow discharge conjugated monomer plasma thereon, wherein the crosslinking results from radicals created in the glow discharge conjugated monomer plasma and achieves self curing.
    Type: Grant
    Filed: May 11, 2001
    Date of Patent: January 21, 2003
    Assignee: Battelle Memorial Institute
    Inventor: John D. Affinito
  • Publication number: 20030008072
    Abstract: An atomic layer deposition (ALD) method, whereby an organometallic complex with a &bgr;-diketone ligand is chemically adsorbed onto a substrate and oxidized by activated oxygen radicals to deposit an atomic metal oxide layer on the substrate, uses reactive oxygen radicals generated using plasma and an organometallic complex having a &bgr;-diketone ligand as a precursor, which could not be used in a thermal ALD method using oxygen or water as an oxidizing agent, to address and solve the problem of the removal of organic substances using organometallic complexes with &bgr;-diketone ligands, thereby enabling diversification of the precursors for ALD and formation of excellent oxide films at low temperatures.
    Type: Application
    Filed: June 4, 2002
    Publication date: January 9, 2003
    Inventors: Jung-Hyun Lee, Dae-Sig Kim, Yo-Sep Min, Young-Jin Cho
  • Patent number: 6503564
    Abstract: A method of making a polymer coating on a microstructured substrate. The method may be performed by vaporizing a liquid monomer or other pre-polymer composition and condensing the vaporized material onto a microstructured substrate, followed by curing. The resulting article may possess a coating that preserves the underlying microstructural feature profile. Such a profile-preserving polymer coating can be used to change or enhance the surface properties of the microstructured substrate while maintaining the function of the structure.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: January 7, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. Fleming, Joseph M. McGrath, Christopher S. Lyons
  • Patent number: 6497923
    Abstract: An electrical insulator is produced by coating a molded part of the insulator with a hydrophobic plasma-polymer coating. The plasma-polymer coating is produced by igniting a plasma in a non-polar working gas or a working gas having non-polar groups at a working pressure of between 0.001 Pa (1·10−5 mbar) and 50 Pa (5·10−1 mbar). The electrical power input per chamber volume lies between 0.5 and 5 kW/m3, the gas flow per chamber volume lies between 10 and 1000 sccm/m3. A durable, hard and hydrophobic plasma-polymer coating is created, the quality of which is independent of the material of the molded part.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: December 24, 2002
    Assignee: Siemens Aktiengesellschaft
    Inventors: Alfred Baalmann, Otto-Diedrich Hennemann, Johannes Liebermann, Klaus Vissing
  • Patent number: 6488384
    Abstract: In a method for the coating of substrates made of plastic, with a light-reflecting layer, preferably an aluminum layer, and another layer placed between the substrate and the light-reflecting layer, the additional layer, which has a high barrier effect to substances which migrate or evolve gases from the plastic, is a highly crosslinked hydrocarbon layer, a silicon dioxide, silicon nitride, or silicon oxynitride layer, with a thickness of at least 15 nm, wherein the carbon content of the barrier layer is <15%.
    Type: Grant
    Filed: December 22, 1999
    Date of Patent: December 3, 2002
    Assignee: Leybold Systems GmbH
    Inventors: Heinrich Grünwald, Thomas Schulte, Klaus Nauenburg, Wilfried Dicken
  • Patent number: 6489585
    Abstract: A plasma treatment apparatus includes two or more pairs of electrodes for plasma generation, a treatment chamber for accommodating the electrodes, gas supply unit for supplying a plasma-generation gas such as rare gas into the chamber, and a power supply. A pulse-like or AC voltage is applied between the electrodes to generate dielectric barrier discharge plasma of the gas in the vicinity of atmospheric pressure, so that an object placed between the electrodes is treated by the plasma. At least one of the electrodes is provided with a tubular electrode substrate and a protection layer formed by heat-fusion coating a glass-based material on at least an outer surface exposed to plasma of the tubular electrode substrate.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: December 3, 2002
    Assignee: Matsushita Electric Works, Ltd.
    Inventors: Kosuke Nakamura, Yasushi Sawada, Hiroaki Kitamura, Yoshitami Inoue
  • Publication number: 20020168480
    Abstract: This invention relates to the surface modified silica by plasma polymerization coating, plasma polymerization method and plasma polymerization devices. Silica, active ingredients of EMC, is coated by plasma polymerization coating in order to enhance the adhesion of silica to epoxy resin and thus to improve the reliability of EMC. The monomers for the plasma polymerization coating were 1,3-diaminopropane, allylamine, pyrrole, 1,2-epoxy-5-hexene, allylmercaptan and allylalcohol, and the surface modified silica was utilized to prepare EMC for electronic devices. The plasma polymerization coating, which is known to be environment-friendly method, provided excellent flexural properties of EMC compared to the conventionally prepared EMC.
    Type: Application
    Filed: June 21, 2001
    Publication date: November 14, 2002
    Inventors: Tae-Ho Yoon, Joon Ho Roh
  • Patent number: 6465050
    Abstract: A non-cracking hydrophilic polyether sulfone membrane is prepared by (a) directly coating the entire surface of a hydrophobic polyethersulfone membrane with an aqueous solution of a polyalkylene oxide polymer and at least one polyfunctional monomer, and (b) polymerizing the monomer over the entire surface of the membrane under conditions which cause the resulting polymer to attach to the polyethersulfone membrane and the polyethylene oxide to form a non-extractable surface which does not crack when the membrane is folded to form a pleated cartridge.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: October 15, 2002
    Assignee: Osmonics, Inc.
    Inventors: Michael J. Witham, James S. Johnson
  • Patent number: 6444254
    Abstract: Functionalized polymer surfaces having reactive moieties thereon are contacted with stamps having ligands adsorbed thereto, the ligands also comprising reactive moieties. The reactive moieties of the functionalized surfaces and the ligands form covalent bonds, thus providing a method of microstamping polymer surfaces directly with ligands such as biological ligands. Using this method, devices such as tissue culture plates with polymer surfaces that are microstamped directly with ligands can be made.
    Type: Grant
    Filed: March 3, 2000
    Date of Patent: September 3, 2002
    Assignee: Duke University
    Inventors: Ashutosh Chilkoti, Zhongping Yang
  • Patent number: 6444274
    Abstract: A process for producing antiadhesive layers on a web-form material, characterized in that the antiadhesive layers are applied to the web-form material by means of low pressure plasma polymerization by guiding the web-form material continuously through a plasma zone containing a low pressure plasma.
    Type: Grant
    Filed: February 22, 2001
    Date of Patent: September 3, 2002
    Assignee: tesa AG
    Inventor: Olaf Görbig
  • Publication number: 20020113521
    Abstract: In a method for producing surface wave sensors on the basis of a surface wave building component a polymer parylene film with a thickness of 20 to 200 nm is applied to a hydrophilic sensor surface of the surface wave building component by deposition from the gas phase, whereby the hydrophilic sensor surface becomes hydrophobic, the surface is then subjected to plasma activation to render it hydrophilic and a hydrophilic sorption polymer layer is then applied to the parylene film so as to provide a surface wave sensor with a homogenous sorption polymer layer.
    Type: Application
    Filed: April 1, 2002
    Publication date: August 22, 2002
    Inventors: Michael Rapp, Ullrich Stahl
  • Patent number: 6436481
    Abstract: The present invention describes coated articles and methods for preparing such articles, wherein the primary coating comprises a plasma-induced polymer carrying reactive groups. The invention further relates to the reaction of said primary coatings carrying reactive groups with monomeric, oligomeric or macromolecular compounds of synthetic, semisynthetic or biological origin to provide hybrid-type coated articles (secondary coatings).
    Type: Grant
    Filed: June 22, 1999
    Date of Patent: August 20, 2002
    Assignee: Novartis AG
    Inventors: Peter Chabrecek, Dieter Lohmann
  • Publication number: 20020106500
    Abstract: Low dielectric constant porous materials with improved elastic modulus and film hardness. The process of making such porous materials involves providing a porous dielectric material and plasma curing the porous dielectric material to produce a plasma cured porous dielectric material. Plasma curing of the porous dielectric material yields a material with improved modulus and hardness, but with a higher dielectric constant. The improvement in elastic modulus is typically greater than about 100%, and more typically greater than about 200%. The improvement in film hardness is typically greater than about 50%. The porous dielectric material is plasma cured for a time between about 15 and about 120 seconds at a temperature less than about 350° C. The plasma cured porous dielectric material can optionally be post-plasma treated.
    Type: Application
    Filed: September 14, 2001
    Publication date: August 8, 2002
    Inventors: Ralph Albano, Cory Bargeron, Ivan L. Berry, Jeff Bremmer, Phil Dembowski, Orlando Escorcia, Qingyuan Han, Nick Sbrockey, Carlo Waldfried
  • Patent number: 6428903
    Abstract: There are disclosed electronic or microelectronic components having on at least a portion of a surface thereof a coating containing hyaluronic acid or a derivative thereof wherein said coating has the ability to inhibit adhesion of microorganisms and formation of biofilms. Also disclosed are methods of inhibiting corrosion and changes in electrical conductivity by inhibiting biofilm formation on electronic or microelectronic components by applying a coating containing hyaluronic acid or a derivative thereof directly onto the surface of said components.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: August 6, 2002
    Assignee: Fidia Advanced Biopolymers S.r.L.
    Inventor: Lanfranco Callegaro
  • Patent number: 6428861
    Abstract: A process for plasma treatment of particulate matter, and more particularly, an apparatus for plasma induced graft polymerization of particulate matter in a continuous or semi-continuous manner, and a process for plasma induced graft polymerization of particulate matter in a continuous or semi-continuous manner is provided.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: August 6, 2002
    Assignee: Procter & Gamble Company
    Inventors: Paul Amaat France, Arseni V. Radomyselski, Saswati Datta
  • Patent number: 6428859
    Abstract: The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. This is accomplished by 1) providing a non-thermal or non-pyrolytic means of triggering the deposition reaction; 2) providing a means of depositing a purer film of higher density at lower temperatures; and, 3) providing a faster and more efficient means of modulating the deposition sequence and hence the overall process rate resulting in an improved deposition method. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: August 6, 2002
    Assignee: Angstron Systems, Inc.
    Inventors: Tony P. Chiang, Karl F. Leeser
  • Patent number: 6426125
    Abstract: According to an exemplary embodiment of the invention, a method of forming a plurality of layers on an article comprises steps of generating a plasma by forming an arc between a cathode and an anode; injecting a first material comprising an organic compound into the plasma to deposit a first layer on the article; injecting a second material comprising an organometallic material into the plasma to form a second layer on the first layer; and injecting a third material comprising a silicon containing organic compound into the plasma to deposit a third layer on the second layer. The invention also relates to an article of manufacture comprising a substrate; an interlayer disposed on the substrate; a second layer disposed on the interlayer, the second layer comprising an inorganic ultraviolet absorbing material; and a third layer disposed on the second layer, the third layer comprising an abrasion resistant material.
    Type: Grant
    Filed: March 17, 1999
    Date of Patent: July 30, 2002
    Assignee: General Electric Company
    Inventors: Barry Lee-Mean Yang, Charles Dominic Iacovangelo
  • Patent number: 6426126
    Abstract: A method for preparing thin films of noble metals upon porous substrate surfaces including utilizing plasma polymerization wherein the noble metals are derived from a monomer or comonomer precursor of the noble metal and with the precursor being disposed within a plasma glow zone to convert the precursor to its dissociated form, thereby allowing the substrate to receive a deposit of a substantially continuous noble metal film thereon. A wide variety of noble metals and their alloys may be treated in this fashion, including such noble metals as platinum, ruthenium, gold and certain alloys thereof.
    Type: Grant
    Filed: October 21, 2000
    Date of Patent: July 30, 2002
    Assignee: AMT Holdings, Inc.
    Inventors: Stephen P. Conover, Ashok K. Sharma
  • Publication number: 20020098296
    Abstract: There is disclosed a gas barrier film having, as a base film, a polypropylene film, which makes it possible to take advantage of the excellent gas barrier property inherent to an SiOx thin film formed on the polypropylene film, and which is free from chlorine which would give a bad influence to the environment. This gas barrier film comprises a polypropylene film whose surface is bonded with tuning molecular chains having, as a main skeleton, an —O—Si—O— structure by enabling the oxygen (—O—) thereof to be bonded to carbon atoms of the surface of the polypropylene film, and an SiOx thin film formed on the surface of the polypropylene film where the tuning molecular chains are bonded, the SiOx thin film being bonded to the tuning molecular chains interposed between the polypropylene film and the SiOx thin film.
    Type: Application
    Filed: January 30, 2002
    Publication date: July 25, 2002
    Applicant: PRES. OF SHIZUOKA UNIV., A JAPANESE GOV. AGENCY
    Inventors: Norihiro Inagaki, Shigeru Tasaka, Tetsuya Nakajima
  • Patent number: 6383573
    Abstract: A process is provided for producing coated synthetic bodies during which, before the coating, the surface to be coated is subjected to a pretreatment in an excited gas atmosphere. The surface is then coated. The gas atmosphere is predominantly formed of a noble gas and nitrogen and/or hydrogen, and the ionic energy in the gas atmosphere and in the are of the surface to be coated is not more than 50 eV. The ionic energy is selected to be not more than 20 eV, preferable not more than 10 eV. The gas atmosphere is excited by means of a plasma discharge or by means of UV radiation.
    Type: Grant
    Filed: May 17, 2000
    Date of Patent: May 7, 2002
    Assignee: Unaxis Balzers Aktiengesellschaft
    Inventors: Eugen Beck, Jürgen Ramm, Heinrich Zimmermann
  • Patent number: 6383575
    Abstract: A method for metallising solid substrates involves the use of non-equilibrium plasma treatment of a supported metal precursor layer. This technique can be used to make pure metal or alloy coatings. An oxidising plasma pre-treatment step of the supported metal precursor layer, or the incorporation of a plasma polymer coupling layer prior to metallisation, can result in improved adhesion. The method can be applied to the preparation of lithographic printing plate precursors.
    Type: Grant
    Filed: February 3, 2000
    Date of Patent: May 7, 2002
    Assignee: Agfa-Gevaert
    Inventors: Jas Pal Singh Badyal, Jonathan Mark Crowther, Allen Peter Gates
  • Patent number: 6379741
    Abstract: The surface of a high molecular weight polymer such as high molecular weight polyethylene is modified in a localized manner by treatment with a plasma gas. The treatment produces a variety of useful results, depending on the gas used and the treatment conditions. One such result is crosslinking of the polymer in a localized manner at the surface to improve the durability of the surface against detrimental processes such as reorientation and alignment of the crystalline lamellae parallel to the contact surface which renders the surface susceptible to disintegration into particles. Another result is the chemical transformation of the surface for purposes such as increasing the hydrophilic or hydrophobic nature of the surface or coupling functional groups to the surface.
    Type: Grant
    Filed: November 29, 1999
    Date of Patent: April 30, 2002
    Assignee: The Regents of the University of California
    Inventors: Kyriakos Komvopoulos, Catherine M. Klapperich, Lisa A. Pruitt, Stephen L. Kaplan
  • Patent number: 6368717
    Abstract: A combination wear protection film for components made of substrates susceptible to wear is described. The film has a wear-resistant surface film that contains one or more of the elements carbon, nitrogen, or boron, the proportion of this element—or, if more than one of these elements is present, the sum of the proportions of the elements present—is at least 30% by atomic weight, preferably at least 40% by atomic weight; and a support film, located between a substrate and the surface film and made of a plasma polymer, that exhibits a quasi-continuous transition in modulus of elasticity and optionally in hardness from a value of a base film to a value of the surface film. A method for producing a wear protection film of this kind, and objects equipped with the wear protection film is also described.
    Type: Grant
    Filed: February 4, 2000
    Date of Patent: April 9, 2002
    Assignee: Robert Bosch GmbH
    Inventors: Johannes Rauschnabel, Jeanne Forget, Johannes Voigt
  • Patent number: 6368658
    Abstract: Methods and apparatuses for coating medical devices and the devices thereby produced are disclosed. In one embodiment, the invention includes a method comprising the steps of suspending the medical device in an air stream and introducing a coating material into the air stream such that the coating material is dispersed therein and coats at least a portion of the medical device. In another embodiment, the medical devices are suspended in an air stream and a coating apparatus coats at least a portion of the medical device with a coating material. The coating apparatus may include a device that utilizes any number of alternative coating techniques for coating the medical devices. This process is used to apply one or more coating materials, simultaneously or in sequence. In certain embodiments of the invention, the coating materials include therapeutic agents, polymers, sugars, waxes, or fats.
    Type: Grant
    Filed: April 17, 2000
    Date of Patent: April 9, 2002
    Assignee: Scimed Life Systems, Inc.
    Inventors: Marlene Schwarz, Kathleen Miller, Kalpana Kamath
  • Patent number: 6358569
    Abstract: A method of applying a thin film to a body comprising exposing the body to pulsed-gas cold-plasma polymerization of an unsaturated-carboxylic acid monomer thereby forming a polymer film on a surface of the body.
    Type: Grant
    Filed: January 25, 2001
    Date of Patent: March 19, 2002
    Assignee: Mupor Limited
    Inventors: Jas Pal S Badyal, Simon J. Hutton
  • Patent number: 6355312
    Abstract: A rod-like or thread-like material is subjected to a plasma treatment by passing the material coaxially through a plasma nozzle while generating plasma therein.
    Type: Grant
    Filed: October 15, 1999
    Date of Patent: March 12, 2002
    Assignee: Cottin Development, Inc.
    Inventors: Peter Förnsel, Christian Buske
  • Publication number: 20020014415
    Abstract: The present invention provides methods for fabricating a sensor on a substrate having a pair of electrodes. The methods are especially amenable to broad variations amongst individual sensor on a single substrate. The intra-sensor variation within the array can be achieved in various fashions. The method provide intra-sensor variation using quantitative and qualitative differences in each sensor.
    Type: Application
    Filed: May 2, 2001
    Publication date: February 7, 2002
    Inventors: Robert Nakayama, Richie Payne, Steven Sunshine, Beth Munoz, Jing Li, Chang-Meng Hsiung
  • Publication number: 20020012755
    Abstract: A method for reducing crazing in a plastics material characterized in that it comprises the steps of:
    Type: Application
    Filed: March 25, 1999
    Publication date: January 31, 2002
    Inventors: JONATHAN HOWARD HODGKIN, HANS JORG GRIESSER, THOMAS REINHOLD GENGENBACH
  • Patent number: 6342275
    Abstract: Gas discharge is caused in a predetermined discharging gas at atmospheric pressure or a pressure close to atmospheric pressure, and an organic material which is liquid at room temperature and which is previously contained in the discharging gas or applied to a surface of a treated member is dissociated or excited by a plasma caused by the gas discharge to generate activated species. By using these excited activated species, a polymerized film of organic material is formed on the surface of the treated member. By variously selecting the organic material or the kind of the discharging material and variously combining them, a water repellent film, a hydrophilic film or a film having a high hardness can easily be formed on the surface of the treated member according to use, or the polymerization speed of the organic material can be increased, or the polymerization can be limited.
    Type: Grant
    Filed: December 28, 1995
    Date of Patent: January 29, 2002
    Assignee: Seiko Epson Corporation
    Inventors: Takuya Miyakawa, Hiroaki Akiyama, Shintaro Asuke
  • Publication number: 20010050056
    Abstract: A process for plasma treatment of particulate matter, and more particularly, an apparatus for plasma induced graft polymerization of particulate matter in a continuous or semi-continuous manner, and a process for plasma induced graft polymerization of particulate matter in a continuous or semi-continuous manner is provided.
    Type: Application
    Filed: June 12, 2001
    Publication date: December 13, 2001
    Inventors: Paul Amaat France, Arseni V. Radomyselski, Saswati Datta
  • Patent number: 6316044
    Abstract: Antimicrobial activity is imparted to the surface(s) of an apparatus or article by polymerizing tert-butylaminoethyl methacrylate in the presence of the apparatus or article by which adhesion of the polymer to the surface(s) is achieved. In a preferred embodiment of the invention the antimicrobial monomer is graft polymerized on the surface(s).
    Type: Grant
    Filed: March 17, 2000
    Date of Patent: November 13, 2001
    Assignee: Degussa-Huels Aktiengesellschaft
    Inventors: Peter Ottersbach, Frank Hill, Christine Anders
  • Publication number: 20010038919
    Abstract: Low dielectric constant films with improved elastic modulus. The method of making such coatings involves providing a porous network coating produced from a resin containing at least 2 Si—H groups and plasma curing the coating to convert the coating into porous silica. Plasma curing of the network coating yields a coating with improved modulus, but with a higher dielectric constant. The coating is plasma cured for between about 15 and about 120 seconds at a temperature less than about 350° C. The plasma cured coating can optionally be annealed. Rapid thermal processing (RTP) of the plasma cured coating reduces the dielectric constant of the coating while maintaining an improved elastic modulus as compared to the plasma cured porous network coating. The annealing temperature is typically less than about 475° C., and the annealing time is typically no more than about 180 seconds. The annealed, plasma cured coating has a dielectric constant in the range of from about 1.1 to about 2.
    Type: Application
    Filed: March 19, 2001
    Publication date: November 8, 2001
    Inventors: Ivan L. Berry, Todd Bridgewater, Wei Chen, Qingyuan Han, Eric S. Moyer, Michael J. Spaulding, Carlo Waldfried
  • Patent number: 6312767
    Abstract: A process for the surface treatment of a running substrate by an electrical discharge created between two roller electrodes, comprising a first roller electrode and a second roller electrode, in a gas mixture comprising the steps of passing the substrate in between the two roller electrodes by applying it against the first roller electrode; injecting the gas mixture between the rollers to apply a first surface treatment to the substrate; passing the substrate in between the two roller electrodes by applying it against a second roller electrode; and injecting the gas mixture between the rollers to apply a second surface treatment to the substrate.
    Type: Grant
    Filed: November 5, 1998
    Date of Patent: November 6, 2001
    Assignee: L'Air Liquide, Societe Anonyme pour l'Exploitation des Procedes Georges Claude
    Inventors: Alain Villermet, François Coeuret, Panayotis Cocolios, Bernd Martens, Eckhard Prinz, Jürgen Salge
  • Patent number: 6287642
    Abstract: In the process for coating the elastomeric rubber wiper a vaporous coating material is generated and activated by a plasma and/or laser; a protective coating is formed on a rubber wiper surface by exposing it to the vaporous coating material by CVD and/or PVD methods and process parameters for the coating process are controlled so that the protective coating includes at least three coating layers and has a total thickness of from 200 nm to 2 &mgr;m. The coating layers include at least one thicker softer elastic coating layer with elastomeric properties similar to those of the rubber wiper and other thinner harder coating layers having wear-resistant properties. The other thinner harder coating layers have respective hardness increasing from an inner most one to an outermost one of the other thinner harder coating layers.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: September 11, 2001
    Assignee: Robert Bosch GmbH
    Inventors: Wolfgang Leutsch, Johannes Rauschnabel, Jeanne Forget, Johannes Voigt
  • Patent number: 6277449
    Abstract: A method of producing radio frequency discharge plasma film layers having a three-dimensional functional film network. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks provides means for significantly increasing the surface functional density.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: August 21, 2001
    Inventors: Omprakash S. Kolluri, Robert G. Johanson
  • Patent number: 6245150
    Abstract: Vapor coating apparatus comprising a chamber having a liquid inlet, atomization means, and chilled substrate support. Carrier gas and coating liquid (e.g. monomer or polymer) are contacted under conditions that vaporize the liquid. Nozzle near chamber inlet has liquid and carrier gas inlets, outlets, and passageways through which liquid and gas streams flow. The outlets and passageways are shaped so that the liquid and carrier gas streams collide outside the nozzle, and the liquid is atomized and then vaporized due to conditions within the chamber. The vapor flows to a substrate at the chamber outlet where it is condensed. The gas discharged from the nozzle is at high velocity and can be shaped as a cone surrounding the liquid discharged from the nozzle in the interior of the gas stream cone.
    Type: Grant
    Filed: September 20, 1999
    Date of Patent: June 12, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: Christopher S. Lyons, Constantin I. Ruta, Robert J. Fleming, Russell E. Blette
  • Patent number: 6242054
    Abstract: The invention relates to a method for corrosion-resistant coating of metal substrates by means of plasma polymerization, wherein the substrate is subjected to mechanical, chemical and/or electrochemical smoothing in a pre-treatment step and is subsequently exposed to a plasma at a temperature of less than 200° C. and at a pressure of 10−5 bis 100 mbars, whereby in a first step the surface is activated in a reducing plasma and in a second step the polymer is separated from a plasma containing at least one hydrocarbon or silico-organic compound which can be vaporized in plasma conditions, optionally contains oxygen, nitrogen or sulphur and can contain fluorine.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: June 5, 2001
    Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E. V.
    Inventors: Alfred Baalmann, Henning Stuke, Klaus-Dieter Vissing, Hartmut Hufenbach
  • Patent number: 6242053
    Abstract: A process and device is shown for coating the delineating surfaces of a hollow object, preferably a hollow object having at least one sealable opening, by means of plasma coating, via the action of plasma on the delineating surface of the hollow object that is to be coated.
    Type: Grant
    Filed: May 20, 1998
    Date of Patent: June 5, 2001
    Assignee: Leybold Systems GmbH
    Inventors: Friedrich Anderle, Jürgen Henrich, Wilfried Dicken, Heinrich Grünwald, Michael Liehr, Klaus Nauenburg, Rudolf Beckmann