Metal Or Metal Alloy Plating Or Implanted Material Patents (Class 427/531)
  • Patent number: 9828668
    Abstract: Systems and methods for strengthening a sapphire part are described herein. One embodiment may take the form of a method including orienting a first surface of a sapphire member relative to an ion implantation device and performing a first implantation step. The implanting step may include directing ions at the first surface of the sapphire member to embed them under the first surface. The systems and methods may also include one or more of heating the sapphire member to diffuse the implanted ions into deeper layers of sapphire member, cooling the sapphire member, and performing at least a second implantation step directing ions at the first surface of the sapphire member to embed the ions under the first surface.
    Type: Grant
    Filed: February 12, 2013
    Date of Patent: November 28, 2017
    Assignee: APPLE INC.
    Inventors: Dale N. Memering, Scott A. Myers, Douglas J. Weber
  • Patent number: 9260780
    Abstract: This is a thin film forming apparatus which is equipped with a target constructed of a thin film material, a cathode for generating a particulate thin film material from the target, a supporting member for supporting the substrate on which the particulate thin film material is to be deposited, a heater for heating the substrate, and a guide for introducing the particulate thin film material onto a surface of the substrate where the thin film material is deposited, wherein the supporting member supports the substrate so as to expose the first principal surface and its backside (second principal surface) of the substrate, the target is disposed in a position for producing the particulate thin film material in an extension of the first principal surface of the substrate, and the guide is disposed on the first principal surface and the second principal surface of the substrate.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: February 16, 2016
    Assignee: TOHOKU SEIKI INDUSTRIES, LTD.
    Inventors: Masanobu Kusunoki, Keitaro Harada, Masayoshi Yokoo, Yoshinobu Takano
  • Publication number: 20150118521
    Abstract: A magnetic data storage medium includes an ion doped magnetic recording layer having a continuous grading of coercivity or anisotropy. The medium also includes an ion-doped overcoat having an ion density that is at a maximum substantially at the interface with the recording layer and has a continuous grading of ion density between the overcoat and the recording layer. The coercivity is at a minimum substantially at the interface.
    Type: Application
    Filed: October 9, 2014
    Publication date: April 30, 2015
    Inventors: Charanjit Singh Bhatia, Koashal Kishor Mani Pandey, Nikita Gaur, Siegfried L. Maurer, Ronald W. Nunes
  • Publication number: 20150103405
    Abstract: It is described a method for the production of a fully or partially reflective stretchable and deformable optical element, comprising the implantation in at least one surface of an elastomeric support, by a technique of “Cluster Beam Implantation”, of neutral nanoclusters of a material selected among one or more metals, their alloys, their oxides or mixtures thereof, thus obtaining in said support a nanocomposite layer, possibly emerging at the surface of said element, and said implantation taking place by: uniformly implanting said nanoclusters in a surface of said elastomeric support, wherein said surface has a molded profile essentially corresponding to the profile of the optical element to be produced; or selectively implanting said nanoclusters in a flat surface of said elastomeric support; or uniformly implanting a first layer of said nanoclusters in a surface of said elastomeric support, and then selectively implanting a second layer of said nanoclusters onto the first nanoclusters layer thus obtain
    Type: Application
    Filed: December 5, 2012
    Publication date: April 16, 2015
    Inventors: Gabriele Corbelli, Cristian Ghisleri, Luca Ravagnan, Paolo Milani
  • Patent number: 8975603
    Abstract: Systems and methods for plasma doping microfeature workpieces are disclosed herein. In one embodiment, a method of implanting boron ions into a region of a workpiece includes generating a plasma in a chamber, selectively applying a pulsed electrical potential to the workpiece with a duty cycle of between approximately 20 percent and approximately 50 percent, and implanting an ion specie into the region of the workpiece.
    Type: Grant
    Filed: February 3, 2014
    Date of Patent: March 10, 2015
    Assignee: Micron Technology, Inc.
    Inventors: Shu Qin, Allen McTeer
  • Patent number: 8920937
    Abstract: A protective coating system includes a nickel-aluminum-zirconium alloy coating having beta phase nickel-aluminum and at least one phase selected from gamma phase nickel and the gamma prime phase nickel-aluminum. The nickel-aluminum-zirconium alloy coating comprises 10 vol % to 60 vol % of the beta phase nickel-aluminum or 25 vol % to 75 vol % of the beta phase nickel-aluminum.
    Type: Grant
    Filed: August 5, 2007
    Date of Patent: December 30, 2014
    Assignee: United Technologies Corporation
    Inventors: David A. Litton, Venkatarama K. Seetharaman, Michael J. Maloney, Benjamin J. Zimmerman, Brian S. Tryon
  • Publication number: 20140356411
    Abstract: The present invention includes nanotubes or rods, methods and arrays using plasmonic-magnetic bifunctional nanotubes or rods comprising: one or more silica nanotubes or rods; one or more nanomagnets embedded in a portion of the silica nanotubes or rods; and plasmonic metal nanoparticles uniformly coating in or on at least a portion of the surface of the nanomagnets and the silica nanotubes surface-coated.
    Type: Application
    Filed: June 4, 2014
    Publication date: December 4, 2014
    Inventors: Donglei Fan, Xiaobin Xu
  • Patent number: 8895874
    Abstract: Thin indium-less “optically porous” layers adapted to replace traditional ITO layers are provided herein. A thin metalized film adapted to carry an electrical charge can include a dense pattern of small openings to allow the transmission of light to or from an underlying semiconductor material. The pattern of openings can create a regular or irregular grid pattern of low aspect ratio fine-line metal conductors. Creation of this optically porous metalized film can include the printing of a catalytic precursor material, such as palladium in solution in a pattern on a substrate, drying or curing the catalytic precursor, and the deposition of a thin layer of metal, such as copper on the dried precursor to form the final conductive and optically porous film.
    Type: Grant
    Filed: March 10, 2010
    Date of Patent: November 25, 2014
    Assignee: Averatek Corp.
    Inventors: Sunity Kumar Sharma, Alex Newsom Beavers, Jr., Thomas Furst
  • Publication number: 20140314897
    Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.
    Type: Application
    Filed: March 17, 2014
    Publication date: October 23, 2014
    Applicant: MOLECULAR IMPRINTS, INC.
    Inventors: Se Hyun Ahn, Byung-Jin Choi, Frank Y. Xu
  • Publication number: 20140299770
    Abstract: An infrared light sensor chip comprises a substrate (2), an infrared light sensor (9), which has a base electrode (10) that is in direct contact with one side (8) of the substrate (2) and which is used to attach the infrared light sensor (9) to the substrate (2), and a resistance thermometer (13), which has a resistance path (14) in direct contact with the side (8) of the substrate (2) adjacent to the infrared light sensor (9) and configured to measure the temperature of the substrate (2) via the resistance thermometer (13). The resistance path (14) is made of the same material of which the base electrode (10) is made.
    Type: Application
    Filed: June 19, 2014
    Publication date: October 9, 2014
    Inventor: Carsten Giebeler
  • Patent number: 8828854
    Abstract: A method of introducing dopants into a semiconductor wafer includes implanting the dopants into a region below a surface of the semiconductor wafer using an ion beam to form a first implanted layer. The dopants when activated causing a conductivity of the implanted layer to be either of N-type or P-type. The first implanted layer is characterized by a peak dopant concentration at a first depth below the surface of the semiconductor wafer. The method also includes removing a layer from the semiconductor wafer surface, wherein said layer includes a portion of said dopants.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: September 9, 2014
    Inventor: Tzu-Yin Chiu
  • Patent number: 8786936
    Abstract: Core-shell coated pigment particles are prepared by core-shell coating using pigment particles, at least one hydrophilic organometallic compound, at least one hydrophobic organometallic compound, distilled water and a solvent. Ink particles coated with an ionized organometallic compound are prepared by using the core-shell coated pigment particles, the solvent and a halogen compound. The ink particles, a dispersing agent and a dielectric liquid are mixed to prepare an ink composition. The ink composition has an electrophoresis property to exhibit an electric movement and has a good dispersibility in a dielectric liquid. The ink composition may be applied in a reflective type color display device.
    Type: Grant
    Filed: September 20, 2012
    Date of Patent: July 22, 2014
    Assignee: Noroo Holdings Co., Ltd.
    Inventors: Jung-II Kong, Jung-Sok Noh, Hoon Cheong, Deok-Min Park, Hee-Jong Kim, Jin-Hwan Jung, Cheol-Woo Kim
  • Patent number: 8778463
    Abstract: Disclosed herein is a method of manufacturing a color-controlled sapphire, comprising: vaporizing a metal material, irradiating the vaporized metal material with electron beams or high-frequency waves to form the vaporized metal material into a plasma state, and then implanting the metal ions into a sapphire by extracting the metal ions from the plasma and accelerating the metal ions (step 1); and heat-treating the sapphire implanted with the metal plasma ions in an oxygen atmosphere or in air (step 2). According to the method of manufacturing a sapphire of the present invention, a sapphire, which can exhibit various colors, can be manufactured by implanting the ions, which can cause optical band gap changes into the sapphire, and a sapphire, which cannot be damaged by radiation and can exhibit colors uniformly, can be manufactured by conducting heat treatment under an oxygen atmosphere.
    Type: Grant
    Filed: June 12, 2008
    Date of Patent: July 15, 2014
    Inventors: Jae-Won Park, Ju-Hyung Ahn, Young-chool Kim, Jang-Min Han, Junyeon Kim
  • Publication number: 20140170432
    Abstract: The ion bombardment of Cr, etc. onto a surface of a WC-based cemented carbide substrate in a nitrogen-based gas forms a modified phase having a bcc structure on the substrate surface, and a hard coating containing at least Cr formed thereon has high adhesion to the substrate by the modified phase.
    Type: Application
    Filed: July 30, 2012
    Publication date: June 19, 2014
    Applicant: HITACHI TOOL ENGINEERING, LTD.
    Inventors: Masakazu Isaka, Fumihiro Fujii
  • Patent number: 8747599
    Abstract: The present invention relates to a process for making self-patterning substrates comprising the steps of providing electrically conductive traces on a substrate; pre-coating the substrate with at least a layer of complementary reactant electrically resistant reactant formulations; altering the conductivity of complementary reactant formulation selectively upon application of external source of energy and a self-patterning substrate using the said process.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: June 10, 2014
    Inventors: Chidella Krishna Sastry, Chidella Venkata Krishna Mohan Sharma, Srinivas Tangirala
  • Patent number: 8728286
    Abstract: A method of manufacturing a sample for an atom probe analysis of the invention is made one going through a step of manufacturing a concave/convex structure in both of a base needle and a transplantation sample piece by an etching working of an FIB, a step of jointing mutual members, and a step of bonding such that the concave/convex structure becomes a mesh form by a deposition working of the FIB.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: May 20, 2014
    Assignee: SII Nano Technology Inc.
    Inventor: Takashi Kaito
  • Publication number: 20140127580
    Abstract: Embodiments of the present disclosure provide for a structure, methods of making the structure, methods of using the structure, and the like. In particular, the structure includes a porous germanium layer, where the porous germanium layer includes a porous network that improves the performance of the structure.
    Type: Application
    Filed: June 26, 2012
    Publication date: May 8, 2014
    Inventors: Kevin Scott Jones, Bradley Robert Yates, Blake Leonardl Darby
  • Patent number: 8703247
    Abstract: A cross section processing method to be performed on a sample by irradiating the sample having a layer or a structure of an organic substance on a surface at a cross section processing position thereof with a focused ion beam using a focused ion beam apparatus includes: a protective film forming step for forming a protective film on the surface of the layer or the structure of the organic substance by irradiating the surface of the sample including the cross section processing position with the focused ion beam under the existence of source gas as the protective film; and a cross section processing step for performing cross section processing by irradiating the cross section processing position formed with the protective film with the focused ion beam at a voltage higher than an accelerating voltage in the protective film forming step.
    Type: Grant
    Filed: January 26, 2010
    Date of Patent: April 22, 2014
    Assignees: SII Nanotechnology Inc., SII Nanotechnology USA Inc.
    Inventors: Hidekazu Suzuki, Toshiaki Fujii, Mike Hassel-Shearer
  • Patent number: 8658288
    Abstract: A method for manufacturing a porous device with restrictive layer comprises the steps of providing a porous structure having a micro pore structure, flattening the porous carrier to form a surface, and forming a restrictive layer on the surface of the porous carrier, a method for manufacturing said restrictive layer includes forming a nickel-chromium alloy layer on the surface of the porous carrier, forming a copper metal layer on the nickel-chromium alloy layer, forming a nickel metal layer having a top surface on the copper metal layer, and processing said nickel-chromium alloy layer, said copper metal layer and said nickel metal layer to form a plurality of channels communicating with the micro pore structure and the top surface. The restrictive effect and damping effect can raise anti-vibration ability of the porous device itself by formation of dual restrictive structure composed of the micro pore structure and the channels.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: February 25, 2014
    Assignee: Metal Industries Research & Development Centre
    Inventor: Kuo-Yu Chien
  • Patent number: 8654446
    Abstract: An optical element or module is designed to be placed in front of an optical sensor of a semiconductor component. At least one optically useful part of the element or module is provided through which the image to be captured is designed to pass. A method for obtaining such an optical element or module includes forming at least one through passage between a front and rear faces of the element or module. The front and rear faces are covered with a mask. Ion doping is introduced through the passage. As a result, the element or module has a refractive index that varies starting from a wall of the through passage and into the optically useful part. An image capture apparatus includes an optical imaging module having at least one such element or module.
    Type: Grant
    Filed: April 8, 2009
    Date of Patent: February 18, 2014
    Assignee: STMicroelectronics S.A.
    Inventors: Emmanuelle Vigier-Blanc, Guillaume Cassar
  • Patent number: 8642135
    Abstract: Systems and methods for plasma doping microfeature workpieces are disclosed herein. In one embodiment, a method of implanting boron ions into a region of a workpiece includes generating a plasma in a chamber, selectively applying a pulsed electrical potential to the workpiece with a duty cycle of between approximately 20 percent and approximately 50 percent, and implanting an ion specie into the region of the workpiece.
    Type: Grant
    Filed: September 1, 2005
    Date of Patent: February 4, 2014
    Assignee: Micron Technology, Inc.
    Inventors: Shu Qin, Allen McTeer
  • Publication number: 20140030598
    Abstract: The present invention provides a lithium secondary battery having reduced internal resistance. The lithium secondary battery comprises a positive electrode, a negative electrode, and a non-aqueous electrolyte. The positive electrode comprises, as a positive electrode active material 30, a lithium transition metal composite oxide having a layered structure. In a surface region 82A of a positive electrode active material particle 82, at least one species among elements belonging to groups 3 to 7 of the periodic table is supplemented by ion implantation.
    Type: Application
    Filed: April 19, 2011
    Publication date: January 30, 2014
    Inventors: Mitsuru Sakano, Hisao Yamashige
  • Publication number: 20140003959
    Abstract: A method for modifying a wear characteristic of a rotor component in a turbine system and a modified rotor component for a turbine system are disclosed. The method includes implanting ions of one of a Group 6 element, a Group 13 element, or a metalloid element through an exterior surface of a rotor component. The rotor component is one of a rotor wheel or a distance wheel.
    Type: Application
    Filed: June 27, 2012
    Publication date: January 2, 2014
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: David Vincent Bucci, Stephen Gerard Pope, Jason Robert Parolini
  • Publication number: 20140003954
    Abstract: A method for modifying a wear characteristic of a rotor blade in a turbine system and a modified rotor blade for a turbine system are disclosed. The method includes implanting ions of one of a Group 6 element, a Group 14 element, or a Group 15 element through an exterior surface of a rotor blade. The rotor blade is one of a compressor blade or a turbine bucket.
    Type: Application
    Filed: June 27, 2012
    Publication date: January 2, 2014
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: David Vincent Bucci, Stephen Gerard Pope, Jason Robert Parolini
  • Patent number: 8597797
    Abstract: [Task] The chromium nitride ion-plating coating has a property that it is hard but is liable to peel off. Year by year, the required level of wear resistance and scuffing resistance becomes higher in a diesel engine. The property of a coating is improved to enhance the wear resistance and scuffing resistance and also to improve resistance against peeling off. [Means for Solution] (1) Composition is mainly composed of chromium, nitrogen, and carbon, and the concentration of carbon relative to the total concentration of the main components is from 4 to 8% by weight. (2) The crystal structure is that texture of the CrN (111) plane orientation is from 0.4 to 2.0 in terms of a CrN (111) structural coefficient. (3) Vickers hardness is from Hv 1600 to Hv 2000.
    Type: Grant
    Filed: November 12, 2007
    Date of Patent: December 3, 2013
    Assignee: Kabushiki Kaisha Riken
    Inventors: Takuma Sekiya, Terushige Ueda, Yuji Shima, Shigeo Inoue
  • Publication number: 20130242298
    Abstract: The invention relates to a prism part included in an analysis chip for use in an analysis device for analyzing a specimen utilizing surface plasmon resonance, and being cooperative with a channel member to form a channel for flowing a sample solution containing the specimen. The prism part includes a prism main body into which excitation light for generating surface plasmon is incident, and a gold film formed on a specified surface of the prism main body. The prism main body includes a mixed layer having a predetermined thickness from the specified surface toward the inner side. The mixed layer is formed by ions of gold for the gold film to enter from the specified surface in the formation of the gold film on the specified surface.
    Type: Application
    Filed: September 12, 2011
    Publication date: September 19, 2013
    Applicant: KONICA MINOLTA, INC.
    Inventors: Tomoko Miyaura, Yasuhiro Sando
  • Publication number: 20130224452
    Abstract: Methods of forming a metal nanoparticle-graphene composite are provided. The methods include providing a functionalized hydrogen exfoliated wrinkled graphene (f-HEG) substrate and dispersing metal nanoparticles on a first major surface of the f-HEG substrate to form the metal nanoparticle-graphene composite.
    Type: Application
    Filed: February 28, 2012
    Publication date: August 29, 2013
    Applicant: Indian Institute of Technology Madras
    Inventors: Sundara Ramaprabhu, Tessy Theres Baby
  • Publication number: 20130163119
    Abstract: A hard disk drive comprising a mixed layer is provided to reduce the head-media spacing in the hard disk drive by embedding a surface of a magnetic recording medium or head of the hard disk drive with energetic ions. The mixed layer provides sufficient protection against corrosion and wear of the magnetic layer of the magnetic recording medium without requiring any DLC and/or lubricant overcoat.
    Type: Application
    Filed: September 7, 2011
    Publication date: June 27, 2013
    Applicant: NATIONAL UNIVERSITY OF SINGAPORE
    Inventors: Charanjit Signh Bhatia, Abdul Samad Mohammed
  • Publication number: 20130147586
    Abstract: A method for preparing magnetic materials is disclosed. The magnetic materials are prepared by implanting low energy magnetic ions into a substrate and annealing with a charged particle beam. Magnetic materials comprising magnetic nanoclusters in the near-surface region of a substrate are also disclosed. The magnetic materials are useful in, for example, magneto-electronic devices such as magnetic sensors.
    Type: Application
    Filed: May 27, 2011
    Publication date: June 13, 2013
    Inventors: John Vedamuthu Kennedy, Andreas Markwitz
  • Patent number: 8448842
    Abstract: An advanced copper bonding with ceramic substrate technology includes the steps of (1) forming a copper film of thickness <1 ?m on a ceramic substrate by sputtering deposition under 1.33×10?3 torr and 150° C., (2) plating a copper layer of thickness 10˜50 ?m at room temperature, and (3) bonding a copper foil to the ceramic substrate by diffusion bonding under environments of high temperature, vacuum, and negative pressure inertia gas or H2 partial pressure.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: May 28, 2013
    Assignee: Vaclong Vacuum Technology Co., Ltd.
    Inventor: Rong-Fu Wu
  • Publication number: 20130084465
    Abstract: A method of making a coated substrate comprises depositing a base layer onto a substrate to form a first coated substrate. A chromium nitride layer is then deposited onto the first coated substrate to form a second coated substrate. The chromium nitride has an atomic percent of nitrogen less that about 45 atom percent.
    Type: Application
    Filed: September 29, 2011
    Publication date: April 4, 2013
    Applicant: VAPOR TECHNOLOGIES, INC.
    Inventors: Bryce Randolph Anton, Jeffrey S. Rice
  • Patent number: 8389390
    Abstract: A method of introducing an impurity into a wafer surface is provided. The method comprises the steps of: low energy implantation of impurity into a surface of the wafer to generate an implanted dopant layer; and simultaneously removing an implanted surface of the implanted dopant layer to generate a doping profile with controlled areal impurity dosage.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: March 5, 2013
    Inventor: Tzu-Yin Chiu
  • Patent number: 8337958
    Abstract: A process for manufacturing electrodes for electrolysis, including the steps of forming an arc ion plating undercoating layer comprising valve metal or valve metal alloy including a crystalline tantalum component and a crystalline titanium component on the surface of the electrode substrate comprising valve metal or valve metal alloy, by an arc ion plating method; heat sintering the electrode substrate to transform only the tantalum component of the arc ion plating undercoating layer into an amorphous substance; and forming an electrode catalyst layer on the surface of the arc ion plating undercoating layer including the valve metal or valve metal alloy including the tantalum component transformed to the amorphous substance and the crystalline titanium component.
    Type: Grant
    Filed: March 18, 2009
    Date of Patent: December 25, 2012
    Assignee: Permelec Electrode Ltd.
    Inventors: Yi Cao, Masashi Hosonuma
  • Patent number: 8216671
    Abstract: The present invention relates to a luminescent glass element comprising a luminescent glass substrate, which a metal layer is positioned on a surface thereof. The metal layer is provided with a metal microstructure. The luminescent glass substrate has composite oxides represented as the following formula: aM2O.bY2O3.cSiO2.dCe2O3, wherein M represents alkali metal element, a, b, c and d are, by mol part, 25-60, 1-30, 20-70 and 0.001-10 respectively. The present invention also provides a producing method of the luminescent glass element and a luminescing method thereof. The metal layer is positioned on the luminescent glass substrate, thereby improving luminescence efficiency of the luminescent glass substrate. The luminescent glass element can be used in luminescent devices with ultrahigh brightness or high-speed operation.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: July 10, 2012
    Assignee: Ocean's King Lighting Science & Technology Co., Ltd.
    Inventors: Mingjie Zhou, Wenbo Ma, Yugang Liu
  • Publication number: 20120152294
    Abstract: A thermoelectric material includes powders having a surface coated with an inorganic material. The thermoelectric material includes a thermoelectric semiconductor powder and a coating layer on an outer surface of the thermoelectric semiconductor powders.
    Type: Application
    Filed: December 16, 2011
    Publication date: June 21, 2012
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sang-il KIM, Kyu-hyoung LEE, Sang-mock LEE
  • Patent number: 8192805
    Abstract: Embodiments of methods for improving electrical leakage performance and minimizing electromigration in semiconductor devices are generally described herein. Other embodiments may be described and claimed.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: June 5, 2012
    Assignee: TEL Epion Inc.
    Inventors: Noel Russell, Steven Sherman, John J. Hautala
  • Publication number: 20120129007
    Abstract: The free layer of a CPP-TMR sensor is biased by laterally disposed hard bias (HB) layers that include a seedlayer structure, a magnetic layer structure of high coercivity material and a capping layer structure. The magnetic layer structure is a layer of FePt-containing material, such as FePtCu, while the seedlayers and capping layers include layers of Cr, CrTi, Fe, FeCo or FeCoMo. These combinations enable the promotion of the L10 phase of the FePt-containing material which provides a high coercivity magnetic layer structure at much lower annealing temperatures than in the prior art.
    Type: Application
    Filed: November 22, 2010
    Publication date: May 24, 2012
    Inventors: Min Zheng, Kunliang Zhang, Min Li
  • Publication number: 20120126934
    Abstract: A chip resistor includes an insulating substrate 11, top terminal electrodes 12 formed on top surface of the substrate using silver-based cermet, bottom electrodes 13, resistive element 14 that is situated between the top terminal electrodes 12 and overlaps them partially, an optional internal protective coating 15 that covers resistive element 14 completely or partially, an external protective coating 16 that covers completely the internal protection coating 15 and partially covers top terminal electrodes 12, a plated layer of nickel 17 that covers face sides of the substrate, top 12 and bottom 13 electrodes, and overlaps partially external protective coating 16, finishing plated layer 18 that covers nickel layer 17. The overlap of nickel layer 17 and external protective layer 16 possesses a sealing property because of metallization of the edges of external protective layer 16 prior to the nickel plating process.
    Type: Application
    Filed: July 18, 2011
    Publication date: May 24, 2012
    Applicant: VISHAY INTERTECHNOLOGY, INC.
    Inventors: Michael Belman, Leonid Akhtman
  • Publication number: 20120104243
    Abstract: Silver nanoparticles as a sample matrix for Matrix Assisted Laser Desorption Ionization (MALDI) along with a novel method for nanoparticle development is described herein. The silver nanoparticles were generated from silver ions on the surface of a MALDI plate utilizing a Soft Landing Ion Mobility (SLIM) instrument. Upon interaction with the surface the incident silver ions were labile and aggregated into the nanoparticle structures in a time dependent fashion. Post landing analyses were completed by Time of Flight mass spectrometry (TOF), and of particular interest in the spectra were the elimination of low mass interference peaks that generally plague organic based matrices. The approach of the present invention significantly decreases sample preparation time and may lead to a preparation free MALDI source by soft landing a matrix directly on the sample surface.
    Type: Application
    Filed: November 2, 2011
    Publication date: May 3, 2012
    Applicant: UNIVERSITY OF NORTH TEXAS
    Inventors: Guido Fridolin Verbeck, IV, Stephen Davila
  • Patent number: 8153207
    Abstract: A silicon oxide of a film thickness of about 50 nm is formed on a surface of a silicon substrate by thermal oxidation. Silver is implanted into the silicon oxide with implantation energy of about 30 keV by a negative ion implantation method. By subjecting the silicon oxide, into which the silver has been implanted, to heat treatment at a temperature of not lower than 200° C. and lower than the melting point of silver, silver particles are formed. By oxidizing the surface portions of the fine particles by heat treatment in an oxidizing atmosphere, silver oxide is formed as a coating layer.
    Type: Grant
    Filed: June 19, 2009
    Date of Patent: April 10, 2012
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Nobutoshi Arai, Hiroshi Iwata
  • Patent number: 8133553
    Abstract: A process for forming a ceramic layer comprising a compound of a metal on a deposition surface of a workpiece comprises providing a reactive gas, selecting the amounts of a vapor of the metal and ions of the metal relative to each other, generating the metal vapor, and projecting an ion beam of the metal ions. The metal vapor, the metal ions, and the reactive gas form the ceramic layer with a desired structure. The process may include the step of controlling a deposition surface temperature. In one embodiment, the metal vapor comprises zirconium vapor and the ion beam comprises zirconium ions. The relative amounts of the zirconium vapor and the zirconium ions are selected to form a zirconia ceramic layer on the deposition surface. The zirconia may have multiple crystal phases that are formed according to a predetermined ratio.
    Type: Grant
    Filed: June 18, 2007
    Date of Patent: March 13, 2012
    Assignee: Zimmer, Inc.
    Inventors: Jeffrey P. Anderson, Oludele Popoola
  • Publication number: 20120040254
    Abstract: Performance, properties and stability of bifunctional air electrodes may be improved by using modified current collectors, and improving water wettability of air electrode structures. This invention provides information on creating non-corroding, electrically rechargeable, bifunctional air electrodes. In some embodiments, this bifunctional air electrode includes a corrosion-resistant outer layer and an electrically conductive inner layer. In some embodiments, this bifunctional air electrode includes titanium suboxides formed by reducing titanium dioxide. Titanium suboxides may be corrosion-resistant and electrically conductive.
    Type: Application
    Filed: August 10, 2010
    Publication date: February 16, 2012
    Inventors: Steven Amendola, Michael Binder, Phillip J. Black, Stefanie Sharp-Goldman, Lois Johnson, Michael Kunz, Michael Oster, Tesia Chciuk, Regan Johnson
  • Patent number: 8114477
    Abstract: A method of fabricating a cleaning wafer capable of cleaning process residues from a substrate support surface is disclosed. The method comprises providing a cleaning disc, and applying a liquid polymer precursor to the cleaning disc by spraying or spin coating the liquid polymer precursor onto the disc to form a polymer precursor film on the disc. The polymer precursor film is cured to form a polymer layer having a cleaning surface.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: February 14, 2012
    Assignee: Applied Materials, Inc.
    Inventor: Vijay D Parkhe
  • Publication number: 20110293847
    Abstract: A system or method of charge particle beam induced materials processing is disclosed. A charged particle beam (electron or ion) is focused at the interface of a substrate and a bulk liquid. The beam induces a localized chemical reaction that results in deposition or etching of deterministic micro- or nano-scale structures. The bulk liquid reactants permit the deposition and etching of metals, semiconductors, and insulators. A charged particle transparent membrane separates the liquid reactant from the vacuum chamber in which the beam is transmitted. In many cases, bulk liquid reactants permit processing of materials with much higher purity that of the prior art and permit processing of materials previously unavailable in charged particle beam processes.
    Type: Application
    Filed: May 28, 2010
    Publication date: December 1, 2011
    Inventor: Jeffrey Todd Hastings
  • Patent number: 8067104
    Abstract: A magnetic recording medium includes a substrate; and a recording film formed on the substrate and including a main magnetic film, the main magnetic film where a recording area and a guard area are formed by local ion doping, the guard area having saturation magnetization smaller than saturation magnetization of the recording area. A primary layer is provided at a substrate side of the main magnetic film. A main ingredient of the primary layer is at least one kind of atom selected from a group consisting of Cr, B, Mo, Al, Si, and C.
    Type: Grant
    Filed: November 17, 2008
    Date of Patent: November 29, 2011
    Assignee: Fujitsu Limited
    Inventors: Tsutomu Tanaka, Kenji Sato
  • Publication number: 20110200760
    Abstract: Disclosed herein is a method of manufacturing a color-controlled sapphire, comprising: vaporizing a metal material, irradiating the vaporized metal material with electron beams or high-frequency waves to form the vaporized metal material into a plasma state, and then implanting the metal ions into a sapphire by extracting the metal ions from the plasma and accelerating the metal ions (step 1); and heat-treating the sapphire implanted with the metal plasma ions in an oxygen atmosphere or in air (step 2). According to the method of manufacturing a sapphire of the present invention, a sapphire, which can exhibit various colors, can be manufactured by implanting the ions, which can cause optical band gap changes into the sapphire, and a sapphire, which cannot be damaged by radiation and can exhibit colors uniformly, can be manufactured by conducting heat treatment under an oxygen atmosphere.
    Type: Application
    Filed: June 12, 2008
    Publication date: August 18, 2011
    Inventors: Jae-Won Park, Ju-Hyung Ahn, Young-chool Kim, Jang-Min Han, Junyeon Kim
  • Publication number: 20110194207
    Abstract: It is an object to provide a simple method capable of producing a magnetic storage medium, a magnetic storage medium and an information storage device which may be produced by a simple production method with a high recording density, and a magnetic disk is produced by a production method having: a film-forming process of forming, on a substrate 61, a magnetic film made of a Co—Cr—Pt alloy and having a thickness of less than 10 nm; and an ion injection process of forming, by reducing saturation magnetization by locally injecting ions into a point other than plural points that become magnetic dots on each of which information is magnetically recorded, a between-dot separator having saturation magnetization smaller than saturation magnetization of the magnetic dots, between the magnetic dots.
    Type: Application
    Filed: November 18, 2009
    Publication date: August 11, 2011
    Applicant: ULVAC, INC.
    Inventors: Kenji Sato, Tsutomu Tanaka, Takuya Uzumaki, Tsutomu Nishihashi, Tadashi Morita, Kazuhiro Watanabe
  • Publication number: 20110180761
    Abstract: The invention provides methods for the application of active materials onto active surfaces useful in organic electronic devices. The methods of the invention include selecting a liquid composition including an active material and a suitable liquid medium whereby when the liquid composition is deposited on the desired active surface it has no greater than about a 40° contact angle; treating the active surface to raise its surface tension before the deposition of a liquid composition containing the desired active material is deposited thereon; and combination thereof. The invention also provides organic electronic devices having at least two active layers, wherein at least one active layer comprises an active material that was deposited using at least one practice of the method of the invention.
    Type: Application
    Filed: April 5, 2011
    Publication date: July 28, 2011
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: VIACHESLAV A. PETROV, Daniel David Lecloux
  • Patent number: 7947586
    Abstract: A method of manufacturing a semiconductor device is disclosed, wherein a plating layer is formed on a first surface side of a semiconductor substrate stably and at a low cost, while preventing the plating liquid from being contaminated and avoiding deposition of uneven plating layer on a second surface side. An electrode is formed on the first surface of the semiconductor substrate, and another electrode is formed on the second surface. A curing resin is applied on the electrode on the second surface and a film is stuck on the curing resin, and the curing resin is then cured. After that, a plating process is conducted on the first surface. The film and the curing resin are then peeled off.
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: May 24, 2011
    Assignee: Fuji Electric Systems Co., Ltd.
    Inventor: Yuichi Urano
  • Patent number: 7931518
    Abstract: The present invention provides a process for preparing a light transmissive electromagnetic wave shielding material having an excellent light transmissive property, an excellent electromagnetic wave shielding property, an excellent appearance property and an excellent legibility by a simple method. A process for the preparation of a light transmissive electromagnetic wave shielding material comprising; (A1) printing a pretreatment agent for electroless plating comprising a noble metal compound and a mixture of silane coupling agent and azole compound or a reaction product thereof in a mesh pattern on a transparent substrate 11 to form a mesh-patterned pretreatment layer 12, and (A2) subjecting the pretreatment layer 12 to electroless plating to form a mesh-patterned metal conductive layer 13 on the pretreatment layer 12.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: April 26, 2011
    Assignee: Bridgestone Corporation
    Inventors: Hidefumi Kotsubo, Tatsuya Funaki, Kiyomi Sasaki