Abstract: An apparatus for use in a coating process includes a chamber, a crucible configured to hold a coating material in the chamber, an energy source operable to heat the interior of the chamber, a coating envelope situated with respect to the crucible, and at least one gas manifold located near the coating envelope. The at least one gas manifold is configured to provide a gas screen between the coating envelope and the crucible.

Abstract: The present invention relates to a substrate comprising an ion-implanted layer, for example a cation, wherein the ion implanted layer has a substantially uniform distribution of the implanted ions at a significantly greater depth than previously possible, to a well-defined and sharp boundary within the substrate. The invention further comprises said sub-strate wherein the substrate is a silicon based substrate, such as glass. The invention also comprises the use of said material as a waveguide and the use of said material in measurement devices.

Abstract: The present invention relates to an amorphous oxide and a thin film transistor using the amorphous oxide. In particular, the present invention provides an amorphous oxide having an electron carrier concentration less than 1018/cm3, and a thin film transistor using such an amorphous oxide. In a thin film transistor having a source electrode 6, a drain electrode 5, a gate electrode 4, a gate insulating film 3, and a channel layer 2, an amorphous oxide having an electron carrier concentration less than 1018/cm3 is used in the channel layer 2.

Abstract: A body made of a ceramic material stabilized by a stabilizing agent, characterized in that the body comprises a surface region extending from the surface of the body to a predetermined depth, the stabilizing agent being enriched in said surface region.

Abstract: The invention relates to a method and a system for the plasma treatment of successive substrates comprising one or more steel products in which the substrates are transported, one after another, through at least one plasma treatment zone, characterized in that the electric power for generating the plasma in the treatment zone is varied according to the area of the substrate is present in this treatment zone when the substrate is running through this zone.

Abstract: The invention relates to a process for depositing an anti-fouling top coat onto the outermost coating layer of a coated optical article, comprising the following steps: a) providing an optical article having two main faces, at least one of which being coated with an outermost layer; b) treating said outermost layer with energetic species resulting in surface physical attack and/or chemical modification; and c) vacuum evaporating a liquid coating material for an anti-fouling top coat by means of an evaporation device, resulting in the deposition of the evaporated coating material onto the treated outermost layer of the optical article, wherein prior to the vacuum evaporation step of the liquid coating material, said liquid coating material has been treated with energetic species.

Abstract: Luminescent materials and the use of such materials in anti-counterfeiting, inventory, photovoltaic, and other applications are described herein. In one embodiment, a method of forming a luminescent material includes: (1) providing a source of A and X, wherein A is selected from at least one of elements of Group 1, and X is selected from at least one of elements of Group 17; (2) providing a source of B, wherein B is selected from at least one of elements of Group 14; (3) subjecting the source of A and X and the source of B to vacuum deposition to form a set of films adjacent to a substrate; and (4) heating the set of films to a temperature in the range of 120° C. to 350° C. to form a luminescent material adjacent to the substrate, wherein the luminescent material includes A, B, and X.

Abstract: A deposition apparatus includes a deposition source that produces a deposition flow of a deposited material and has an evaporation source with a material to be deposited therein, and a sputtering source that produces sputtering ions directed at the material to be deposited in the evaporation source. A deposition target is in facing relationship to the deposition source. The sputtering source is operated simultaneously with the evaporation source.

Abstract: A deposition source with uniform deposition characteristics includes a crucible in which a deposition material is disposed; a heat transfer member disposed on upper portions of the deposition material in the crucible; and an accommodation member for accommodating the heat transfer member and including a mesh plate.

Abstract: Methods for vapor depositing high temperature coatings on gas turbine components are provided, as are methods for producing pre-alloyed pucks for usage in vapor deposition processes. In one embodiment, the method includes the step of producing a pre-alloyed puck including a master alloy and a high vaporization temperature refractory metal, which has a vaporization temperature greater than each of the master alloy constituents. The pre-alloyed puck is placed over an ingot and heated to a temperature greater than the melt point of the pre-alloyed puck and less than the vaporization temperature of the high vaporization temperature refractory metal to transform the puck and a portion of the ingot into a molten pool and to produce a vapor stream containing the constituents of the master alloy and the ingot. The vapor stream is exposed to a gas turbine engine component to deposit the high temperature coating over at least one surface thereof.

Abstract: An apparatus for applying a coating to a substrate comprises a deposition chamber. A crucible may hold a melt pool of coating material. The melt pool is rotated during deposition.

Abstract: The invention relates to a method for marking an item based on the formation of color centers on a lithium fluoride film. The method provides for the deposition of thin LiF films on the item or on mark supports to be applied to the item and the formation of the color centers by irradiation, thus forming an identification mark. Optionally, the method may provide for the detection of the identification mark and the control of its authenticity. The method may be employed both to guarantee the authenticity of the item and to classify it. The application of the method is particularly advantageous in the field of high value goods and specifically in the field of cultural objects.

Abstract: An apparatus for coating a work piece includes a process chamber, a coating material supply apparatus located at least partially within the process chamber for delivering a coating material to the work piece, a pre-heater assembly adjoining the process chamber, and a support for holding the work piece. The pre-heater assembly includes a housing that opens to the process chamber, a thermal hood positioned within the housing and configured to reflect thermal energy for reflecting thermal energy toward the work piece. The support is movable to selectively move the work piece between a first position within the housing of the pre-heater assembly and a second position within the process chamber and outside the housing of the pre-heater assembly.

Abstract: A method for use with a coating process includes depositing a ceramic coating on a substrate within a coating chamber. Prior to depositing the ceramic coating, an electron beam source is used to heat a ceramic material. The ceramic material radiates heat to heat a substrate to an oxidation temperature to form an oxide layer on the substrate. A desired evaporation rate of the ceramic material is established during the heating to thereby provide an improved ceramic coating.

Abstract: An apparatus for processing coating material includes a crucible having a receptacle for receiving coating material, a drive member having a drive shaft, a cover coupled to the drive shaft, and a monitor system including a light source and a camera module. The cover includes a flat surface, a slot defined in the flat surface, a first through hole and a second through hole respectively communicating with opposite ends of the slot. The drive shaft drives the cover to rotate between a closed position where the cover covers the receptacle, and the flat surface presses and flattens the coating material, and an open position where the cover is moved away from the receptacle. The light source is for emitting light through the first through hole to illuminate the coating material. The camera module is for capturing images of the illuminated coating material through the second through hole.

Abstract: The present invention relates to a lithography method using tilted evaporation, and includes: (1) coating a resist on top of a substrate; (2) patterning the resist using a lithography process; (3) tilt-evaporating a first thin film material on an upper layer of the patterned resist to form a modified pattern mask; (4) evaporating a second thin film material on the top of the substrate with the modified pattern mask; and (5) removing the resist coated on the top of the substrate.

Abstract: A method of making a cathode structure for an OLED provided over organic layers includes evaporating a first layer over the organic layers, such layer including a metal or metal alloy whose work function is less that 4.0 eV, or a material including an electron-injecting dopant and a reactive metal; depositing at least one second layer of an inorganic material over the first layer to form a buffer structure with the first layer; and sputtering a protective layer of a metal or metal alloy provided over the buffer structure.

Abstract: A coating apparatus comprises a coating chamber for coating the articles. The at least one preheat chamber is coupled to the coating chamber. The at least one loading station has a proximal end connectable to at least one of the preheat chambers when in an installed position at a distal end of the preheat chamber. The loading station further includes a carrier for carrying the articles and a drive system. The drive system is positioned to move the carrier between: a loading/unloading position of the carrier in the loading station; a preheat position of the carrier in the preheat chamber to which the loading station is connected; and a deposition position of the carrier in the coating chamber. A gas source is connected to the preheat chamber.

Abstract: A lower crucible component 3 comprises a lower planer surface 5 sometimes supporting an upper crucible component 1, the lower planner surface 5 having an inside section 9, outer vertical wall 11, upper crown 12, inner vertical wall 13 and upper planer surface 14 sometimes used to hold material for vaporization and attachment to ophthalmic lens such as eyeglasses. An electron gun is used to focus electrons to both the lower crucible 3 and the upper crucible component so as to evenly vaporize material held at a center section of the crucible assembly.

Abstract: The invention relates to platinum complexes, to a method for preparing the same and to the use thereof for the chemical vapour deposition of metal platinum. The chemical vapour deposition of platinum onto a substrate is made from a platinum organometallic compound that includes a ligand with a cyclic structure including at least two non-adjacent C?C double bonds, and the platinum organometallic compound has a square-plane structure in which the platinum is bonded to each of the C?C double bonds of the ligand, thereby forming a (C?C)—Pt—(C?C) of 60° to 70°.

Abstract: A method involves: determining a percentage by which a thickness of a layer of material, if applied by a selected coating apparatus to a curved surface on a selected optical component having an operating wavelength, would decrease from a central region of the curved surface to an edge region of the curved surface; formulating a multi-layer optical coating that will provide, in the central region of the curved surface, a specified optical performance characteristic for all radiation within a waveband extending from the operating wavelength to a further wavelength, where the further wavelength decreased by the percentage equals the operating wavelength; and using the selected coating apparatus to form the multi-layer optical coating on the curved surface.

Abstract: Provided is a process by which an electret material having excellent thermal resistance of charge retentivity can be obtained. The process for producing an electret material of the invention includes an irradiation step, a formation step, and a charging step. In the irradiation step, a dispersion containing fine polytetrafluoroethylene particles is irradiated with ? rays. In the formation step, the dispersion which has been irradiated with ? rays is applied to an electrode plate and then dried, and the fine polytetrafluoroethylene particles are sintered to form a polytetrafluoroethylene layer on the electrode plate. In the charging step, the surface of the polytetrafluoroethylene layer is subjected to a charging treatment.

Abstract: The present technology generally relates to a wear-resistant coating, especially for gas turbine components, comprising a horizontally segmented or multilayered structure, i.e. at least one relatively hard, ceramic layer and at least one relatively soft, metallic layer. The ceramic layer and the metallic layer are alternately arranged on top of each other in such a way that an external layer forming an external surface of the wear-resistant coating is embodied as a ceramic layer. According to the invention, at least the external, ceramic layer is segmented in a column-type manner in a vertical direction.

Abstract: A direct vapor deposition (DVD) method and apparatus for applying coating(s) on substrate(s), including: presenting at least one of the substrates to a chamber, presenting at least one evaporant source (125) in crucible (110) to the chamber; presenting at least one carrier gas stream (105) to the chamber using a ring-shaped (133) converging/diverging nozzle (130); impinging at least one evaporant source with at least one electron beam in the chamber to generate an evaporated vapor flux in a main direction respective for any of the evaporant sources impinged by the electron beam; and guiding at least one of the generated evaporated vapor flux by at least one carrier gas stream from the ring shaped gap (132), which is essentially parallel to the main direction and substantially surrounds the evaporated flux. The evaporated vapor flux at least partially coats at least one of the substrates.

Abstract: The invention relates to a method for producing a carbon-containing material by the carbon or carbon and another component electron-beam vaporization in vacuum and by the consequent condensation thereof consisting in reflecting a carbon vapour flow with the aid of a reflector at least once on a path between a crucible and the substrate, in capturing atoms and clusters of a transition metal, in directing the pure carbon vapour flow to the substrate, wherein it meets the vapour flow of a second organic or non-organic component, and in condensing in the substrate heating and/or cooling conditions. When required, a mixture of several neutral or reaction gases is supplied to a vacuum condensation chamber/area.

Abstract: The present invention provides a film forming method and a film forming apparatus each of which is capable of forming films at low cost. The film forming method of the present invention includes the steps of (i) melting a solid material 51 of a thin film to prepare a melted liquid, solidifying the melted liquid 51a to form a rod-shaped body 51b, and pulling out the rod-shaped body 51b, (ii) melting and supplying a part of the rod-shaped body 51b to a melted liquid (evaporation source) 51d, and (iii) using the melted liquid (evaporation source) 51d to form the thin film. The steps (i), (ii), and (iii) are carried out in vacuum.

Abstract: A central dryer for electron beam curing is described which includes a first application unit for the application of a first coating to a web. The central dryer for electron beam curing also includes an irradiation unit in which a first electron beam generator and a second electron beam generator are arranged for the irradiation of the web. The electron beam generators arranged in the irradiation unit have connections for at least one pump system to generate an operating vacuum. In addition to this the central dryer for electron beam curing also has a web guiding system which feeds the web successively but not necessarily in direct succession, to the first application unit, the first electron beam generator, the second electron beam generator.

Abstract: The present invention involves a method for deposition of thin film and electrochemically active layered coatings for use as components including electrodes and solid electrolytes for electrochemical generation and storage devices including batteries, supercapacitors, fuel cell, solar cell and the like. According to the present invention, evaporation of the starting materials in a reactive gaseous medium is accomplished by means of a gas discharge electron gun with a cold cathode. The electron beam has a given specific power corresponding to the evaporation temperature of the starting material. Deposition of the evaporated starting material onto the substrate in a pressure controlled reactive gaseous medium is carried out at a controlled temperature and rate of condensate formation. This temperature is dependant on the partial pressure of the reactive gas.

Abstract: A direct vapor deposition (DVD) apparatus and method is taught, that provides a carrier gas flow entraining vapor atoms for the coating of regions on a substrate that are not in line-of-sight. The degree of non line-of-sight (NLOS) coating, hence thickness uniformity around the substrate is a sensitive function of the flow conditions. For a fixed background pressure in the region of deposition, an increase in the uniformity of the coating thickness is accomplished as the flow velocity is reduced. This improvement in uniformity is a result of an increase in the fraction of vapor atoms which deposit in NLOS positions on the substrate such as backside (21) of fiber (65) as indicated by vapor streamlines (51). Vapor impact width (VIW) is the width of the vapor flux impacting on some area of the fiber. Front side coating (FSC) width is the vapor width of atoms impacting on the substrate frontside (22).

Abstract: A method of making a layered component with an improved surface finish by a shape metal deposition process is provided. The method comprises the steps of discriminating a first set of vectors on an exterior portion of the component from a second set of vectors on an interior portion of the component, and depositing a layer of metal material based on the vectors discriminated at different rates, wherein the material is deposited on the exterior portion at a high resolution and a slow rate, and the material is deposited on the interior portion at a low resolution and a fast rate.

Abstract: A material for vapor deposition which is obtained by mixing a specific organosilicon compound having an alkyl group substituted with fluorine, a specific silane compound and a specific modified silicone oil, a process for producing an optical member which comprises a step of solidifying the material for vapor deposition described above by heating and a step of vapor depositing the solidified material for vapor deposition on a substrate made of a plastics by heating by a heating means to form a thin film exhibiting a water-repelling property, a process for producing a plastic lens for spectacles which is the above process applied to producing the plastic lens for spectacles, and a plastic lens for spectacles which is produced in accordance with the process.

Abstract: An electrically conductive separator element and assembly for a fuel cell which comprises an electrically conductive substrate having a monoatomic layer coating overlying the substrate. The monatomic layer coating may comprise an electrically conductive material, for example, a noble metal, desirably Ru, Rh, Pd, Ag, Ir, Os and preferably Au. Methods of making such separator elements and assemblies are also provided.

Abstract: The invention relates to a surface-treatment technique in association with ablation, a surface-treatment apparatus and a turbine scanner. The invention also relates to a method of producing a coating, a radiation transmission line, a copying unit and a printing unit. The invention further relates to an arrangement for adjusting the radiation power of a radiation source in a radiation transmission line and a laser apparatus.

Abstract: In accordance with an embodiment of the invention, an article is provided. The article comprises a substrate comprised of silicon containing material, an environmental barrier coating (EBC) overlying the substrate and a thermal barrier coating (TBC) on the environmental barrier coating. The thermal barrier coating comprising a compound having a rhombohedral phase.

Abstract: In accordance with an embodiment of the invention, a thermal barrier coating for inclusion in a thermal barrier coating system is provided. The thermal barrier coating comprises a compound having a rhombohedral phase. In accordance with another embodiment of the invention, a thermal barrier coating is provided that comprises a compound having the formula of: A4B3O12, wherein A is at least one rare earth element; and B is selected from the group consisting of Zr, Hf and mixtures thereof.

Abstract: In accordance with an embodiment of the invention, a thermal barrier coating for inclusion in a thermal barrier coating system is provided. The thermal barrier coating comprises a compound having a rhombohedral phase. In accordance with another embodiment of the invention, a thermal barrier coating is provided that comprises a compound having the formula of: A4B3O12, wherein A is at least one rare earth element; and B is selected from the group consisting of Zr, Hf and mixtures thereof.

Abstract: A low-k interconnect dielectric layer is strengthened by forming pillars of hardened material in the low-k film. An E-beam source is used to expose a plurality of pillar locations. The locations are exposed with a predetermined power and exposure time to convert the low-k film in the selected locations to pillars having higher hardness and strength than the surrounding portions of the low-k film.

Abstract: The invention relates to a method for coating a substrate with a layer of a material, such as a metal, in which a quantity of electrically conductive material is vaporized in a space with a low background pressure and energy is supplied to the material which is to be vaporized in order to vaporize this material. According to the invention, the material which is to be vaporized, while it is being vaporized, is kept floating, without support, in the space and is enclosed in an alternating electromagnetic field, the alternating electromagnetic field being generated with the aid of a high-frequency alternating current. The invention also relates to a device for coating a substrate and to a substrate.

Abstract: A method and superalloy component for depositing a layer of material onto gas turbine engine components by atomic layer deposition. A superalloy component may have a ceramic thermal barrier coating on at least a portion of its surface, comprising a superalloy substrate and a bonding coat; and aluminum oxide (Al2O3) layer may be deposited on top of an yttria-stabilized zirconia layer and form a bonding coat by atomic layer deposition. The yttria-stabilized zirconia layer may have a plurality of micron sized gaps extending from the top surface of the ceramic coating towards the substrate and defining a plurality of columns of the yttria-stabilized zirconia layer. Also, atomic layer deposition may be used to lay an aluminum oxide (Al2O3) layer over a tantalum oxide (Ta2O5) layer on a silicon-based substrate.

Abstract: A protective film for protecting a dielectric layer of a plasma display panel from discharge contains a metallic oxide. A volume resistivity of the protective film is 3.5×1011 ?·cm or more.

Abstract: This invention is a method of forming a nitride layer on at least one metal or metal alloy biomedical device, comprising: providing a vacuum chamber with at least one biomedical device positioned thereon on a worktable within the vacuum chamber; reducing the pressure in the vacuum chamber; introducing nitrogen into the vacuum chamber so that the pressure in the vacuum chamber is about 0.01 to about 10 milli-Torr; generating electrons within the vacuum chamber to form positively charged nitrogen ions; providing a negative bias to the worktable so that the positively charged nitrogen ions contact the biomedical devices under conditions such that a nitride layer forms on the at least one prosthetic device.

Abstract: The invention relates to metallurgy and mechanical engineering, in particular to the development of methods for providing metallic pieces with protective coatings with a view to improving the performance characteristics thereof. In accordance with the inventive method, a multilayer coating is formed by combining and simultaneously or consecutively using of various technologies including ion-plasma evaporation diffusive metallization and controlled atmosphere thermal treatment. The obtained coatings possess superior characteristics with respect to overall properties and are used for gas turbine construction, in particular, for manufacturing gas turbine vanes of aircraft engines.

Abstract: A vacuum deposition system has been designed to produce thin film based demultiplexers with high throughput and production yields of greater than 25% for use in Dense Wavelength Division Multiplexer (DWDM) systems. The system employs a dense array of high yield fixtures and an ion assisted movable dual electron beam evaporation system. The fixture array increases acceptable yields of narrow band pass filters to 25–75% compared to less than 5% in conventional coating systems used for DWDM. The movable e-beam system allows critical symmetry to be maintained while eliminating significant delays resulting from deposition of two materials from a single electron gun. The vacuum deposition system will enable production of more than 15,000 50–200 GHZ filters which meet specifications for DWDM demultiplexers every 48 hours.

Abstract: A superconducting magnesium diboride (MgB2) thin film having c-axial orientation and a method and apparatus for fabricating the same are provided. The fabrication method includes forming a boron thin film on a substrate and thermally processing the substrate on which the boron thin film is formed along with a magnesium source and cooling the resulting structure. The superconducting magnesium diboride thin film can be used in a variety of electronic devices employing superconducting thin films, such as precision medical diagnosis equipment using superconducting quantum interface devices (SQUIDs) capable of sensing weak magnetic fields, microwave communications equipment used for satellite communications, and Josephson devices. Computer systems with 100 times greater computing speed can be implemented with the superconducting magnesium diboride thin film.

Abstract: A method of fabricating a polarizing layer using a gas cluster ion beam apparatus (GCIB) is disclosed. The method includes generating a metal-organic gas that includes a metal-organic compound. The metal-organic compound includes a polarizing material, such as iron Fe, Co, or CoFe, for example. The metal-organic gas and a carrier gas are combined to form a composite gas that is supplied to the GCIB. The GCIB processes the composite gas to form a beam of gas cluster ions that include the polarizing material. The beam irradiates an interface surface of a layer of material and at least a portion of the polarizing material remains in contact with the interface surface to form the polarizing layer on the interface surface.

Abstract: The present invention is a turbine engine component comprising a superalloy substrate, a bond coat overlying the substrate having a thickness in the range of about 0.0005 inch to about 0.005 inch, a thin alumina scale overlying the bond coat, and a thermal barrier coating (TBC) overlying the thin alumina scale, the TBC having a thickness in the range of about 0.0025 inch to about 0.010 inch, and comprising at least mischmetal oxide.

Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.

Abstract: An improved crucible cover for multiple pocket electron beam sources has been invented. The invention provides selection between one of the multiple pockets for evaporative heating and a noncontacting, line-of-sight blocking baffle between heated and unheated pockets. In one embodiment, the baffle is formed by the cooperation of a crucible surface groove with a cover feature that extends into the groove. In a second embodiment, the baffle is formed by a barrier extending upwards from the crucible surface between pockets that cooperates with a cover to form the line-of-sight baffle. The crucible and cover in these embodiments accommodate deposits without hindering the ability of the baffle to reduce contamination or interfere with the operation of the source. Additionally, the cover and crucible may be operated separately, with a cover lifting mechanism that lowers the cover to form a baffle and raises the cover to allow the separately controlled rotation of the crucible.

Abstract: A composite surface having a thickness from 10 to 5,000 microns comprising a spinel of the formula MnxCr3?xO4 wherein x is from 0.5 to 2 and oxides of Mn, Si selected from the group consisting of MnO, MnSiO3, Mn2SiO4 and mixtures thereof which are not prone to coking and are suitable for hydrocarbyl reactions such as furnace tubes for cracking.

Abstract: An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0.010 mbar.