Thickness Or Uniformity Of Thickness Determined Patents (Class 427/9)
  • Patent number: 10435776
    Abstract: A blade outer air seal (BOAS) or segment thereof comprises: a metallic substrate having an inner diameter (ID) surface; and a coating system along the inner diameter surface comprises: a bondcoat atop the substrate; and a ceramic barrier coat atop the bondcoat. The bondcoat has a combined content of one or more of molybdenum, chromium, and vanadium of at least 50 percent by weight.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: October 8, 2019
    Assignee: United Technologies Corporation
    Inventors: Christopher W. Strock, Matthew E. Bintz
  • Patent number: 10181415
    Abstract: In some embodiments, the present disclosure relates to a method of bump metrology The method is performed by forming a through-substrate-via within a substrate, forming a plurality of metal interconnect layers within a dielectric structure over the substrate, and forming a bump on the plurality of metal interconnect layers. One or more substrate warpage parameters of the substrate are measured and an initial position of a lens within a substrate metrology module is calculated based upon the one or more substrate warpage parameters. The lens is then moved to the initial position, and a height and a width of the bump are measured using the substrate metrology module after moving the lens to the initial position.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: January 15, 2019
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Nai-Han Cheng, Chi-Ming Yang
  • Patent number: 10144178
    Abstract: A uniquely featured addition to previous three dimensional prototyping machinery without any traversing X and Y coordinate moving parts, thus saving time by focusing on only an incrementally regular Z stage and the rapidity of chemical deposition via electrically localized reaction nodes through a porous/channeled plane called the build/extrusion platen. Processes for making objects using such machine and platen are also disclosed as well as features and further indexing of extrusion location inventions. Other features including chemistry, curing material, and curing control as well as activation methods and machines are also disclosed in combination with the feature of a simultaneous two-dimensional layer-wise deposition machine and process for “growing” the object in the Z direction using the displaceable platen or object supporting stage in a rapid manner. Further due to the rapid growth and deposition manner, additional benefits to the object creation and curable material, e.g. a monomer can be realized.
    Type: Grant
    Filed: February 22, 2016
    Date of Patent: December 4, 2018
    Assignee: Voxel LLC
    Inventors: Milton Dale Meisner, Robin Wynne Nack Meisner
  • Patent number: 9969153
    Abstract: A uniquely featured addition to previous three dimensional prototyping machinery without any traversing X and Y coordinate moving parts, thus saving time by focusing on only an incrementally regular Z stage and the rapidity of chemical deposition via electrically localized reaction nodes through a porous/channeled plane called the build/extrusion platen. Processes for making objects using such machine and platen are also disclosed as well as features and further indexing of extrusion location inventions. Other features including chemistry, curing material, and curing control as well as activation methods and machines are also disclosed in combination with the feature of a simultaneous two-dimensional layer-wise deposition machine and process for “growing” the object in the Z direction using the displaceable platen or object supporting stage in a rapid manner. Further due to the rapid growth and deposition manner, additional benefits to the object creation and curable material, e.g. a monomer can be realized.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: May 15, 2018
    Assignee: VOXEL 3D LLC
    Inventors: Milton Dale Meisner, Robin Wynne Nack Meisner
  • Patent number: 9297765
    Abstract: A gas decomposition reactor for the decomposition of a gas into a mixture of solid and gaseous by-products is disclosed. The gas decomposition reactor includes a reactor vessel, a Raman spectrometer, and a processor. The reactor vessel has an inlet for receiving inlet gas and an exhaust outlet for releasing exhaust gas. The Raman spectrometer is connected with the exhaust outlet for determining a chemical conversion within the reactor chamber and generating a corresponding signal. The processor is connected with the Raman spectrometer to receive the signal from the Raman spectrometer. The processor is capable of comparing the signal with a set of values and calculating differences between the signal and the set of values. The processor is connected with the inlet to regulate a flow of the inlet gas.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: March 29, 2016
    Assignee: SunEdison, Inc.
    Inventors: Alexis Grabbe, Pramatha Payra
  • Patent number: 9293354
    Abstract: A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to indicate the desired boundary of an edge bead removal (EBR) region. A second mark type may be located on an outer peripheral portion of the wafer to indicate the desired boundary of a wafer edge expose region (WEE). A third mark type may indicate the border of a portion of the wafer expected to bear a wafer identification mark. A fourth mark type may be located at the center of the wafer to allow for precise and uniform application of liquid photoresist material to the calibration wafer. The calibration wafer may be employed in methods of rapidly and easily assessing the accuracy of various phases of photolithography processes.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: March 22, 2016
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Sai Hung Lam, Wei Zhu, Chin Yu Chen
  • Patent number: 9108438
    Abstract: A treatment liquid application apparatus including an application roller for applying treatment liquid; a press roller for pressing against the application roller an elongated recording medium which is placed between the press roller and the application roller; and a conveyance roller located downstream relative to the application roller on a conveyance path of the recording medium and conveying the recording medium is disclosed. The apparatus includes a control unit for causing the press roller to be pressed against the application roller when a value related to a conveyance amount of the recording medium conveyed by the conveyance roller from a re-start of conveyance exceeds a value corresponding to a slack amount of the recording medium which occurs in an upstream side of the conveyance roller at a stopping of conveyance.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: August 18, 2015
    Assignee: Ricoh Company, Ltd.
    Inventors: Kohji Kuwana, Hironori Numata
  • Patent number: 9039907
    Abstract: A method is described for improving the uniformity over a predetermined substrate area of a spectral response of photonic devices fabricated in a thin device layer. The method includes (i) establishing an initial device layer thickness map for the predetermined area, (ii) establishing a linewidth map for the predetermined area, and (iii) establishing an etch depth map for the predetermined area. The method further includes, based on the initial device layer thickness map, the linewidth map and the etch depth map, calculating an optimal device layer thickness map and a corresponding thickness correction map for the predetermined substrate area taking into account photonic device design data. Still further, the method includes performing a location specific corrective etch process in accordance with the thickness correction map.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: May 26, 2015
    Assignees: IMEC, Universiteit Gent
    Inventors: Philippe Absil, Shankar Kumar Selvaraja
  • Publication number: 20150113801
    Abstract: A method for manufacturing a gravure plate includes, setting a certain measurement area on a surface of the gravure plate, finding at least one of a spatial volume that is the total of the volume of a space formed by a plurality of cells located in the measurement area and an average depth obtained by dividing the spatial volume by a surface area of the measurement area, and adjusting, based on a relationship between at least one of the spatial volume and the average depth and an application thickness of a printing material after printing, at least one of the spatial volume and the average depth so as to fall within at least one of a specified value range for the spatial volume and a specified value range for the average depth determined in accordance with a target value range for the application thickness.
    Type: Application
    Filed: October 3, 2014
    Publication date: April 30, 2015
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Kunxian CAO, Yoshiharu KUBOTA
  • Patent number: 8986778
    Abstract: A method for non-destructive evaluation of an article of manufacture (30) by coating the article with a temperature-sensitive coating (34), stimulating the article with energy (18) to induce temperature changes in the article responsive to features of the article, then evaluating (24) a resulting topography of energy-induced changes (50, 52, 53) in the coating (34). The energy imparted to the article may be, for example, electromagnetic, magnetic, or sonic energy that produces localized changes in temperature in the article (30) in response to features (32) of the article such as flaws or other discontinuities. The coating (34) may be a suspension of liquid crystals in a liquid, and the energy may be an application of sonic energy. The coating may be a material that hardens (42, 54) or softens (44, 56) upon a slight increase in temperature. Layers (34, 35) of different energy-sensitive coatings (38, 40) may be applied to indicate different aspects of features of the article.
    Type: Grant
    Filed: July 6, 2006
    Date of Patent: March 24, 2015
    Assignee: Siemens Energy, Inc.
    Inventor: Paul J. Zombo
  • Publication number: 20150079274
    Abstract: Provided are a crucible for vapor deposition, a vapor deposition apparatus and a vapor deposition method capable of detecting a film formation rate using a sensor in vapor deposition by proximity vapor deposition. The crucible according to the present invention includes a storage section that stores a vapor deposition source, a first guide passage that guides a vaporized material emitted from the vapor deposition source toward a substrate to be treated, a wall section for defining the first guide passage and a second guide passage that diverges from a middle part of the first guide passage, penetrates the wall section and communicates with the outside.
    Type: Application
    Filed: September 11, 2012
    Publication date: March 19, 2015
    Applicant: NITTO DENKO CORPORATION
    Inventors: Ryohei Kakiuchi, Satoru Yamamoto
  • Publication number: 20150064499
    Abstract: A method of producing a multilayer magnetoelectronic device and a related device. The method includes depositing a multilayer structure including at least two ferromagnetic layers disposed one on top of the other and each having a magnetic anisotropy with a corresponding magnetic moment. A magnetization curve is specified for the magnetoelectronic device. The number of ferromagnetic layers and, for each of the ferromagnetic layers, the magnetic moment and the magnetic hardness for obtaining the specified magnetization curve are determined. For each of the ferromagnetic layers a magnetic material, a thickness, an azimuthal angle and an angle of incidence are determined for obtaining the determined magnetic moment and magnetic hardness of the respective ferromagnetic layer. The multilayer structure is deposited using the determined material, thickness, azimuthal angle and angle of incidence for each of the ferromagnetic layers.
    Type: Application
    Filed: September 3, 2014
    Publication date: March 5, 2015
    Inventors: Kai Schlage, Denise Erb, Ralf Röhlsberger, Hans-Christian Wille, Daniel Schumacher, Lars Bocklage
  • Publication number: 20150064343
    Abstract: A method of producing an extremely thick insulation coating on a surface of an electrical steel, comprises the following steps: 1) preparing a coating liquid—stirring sufficiently the coating liquid for 0.1˜4 hours, with the viscosity of the coating liquid being within 10˜80 S; 2) coating a strip steel—using a double-roller or a tri-roller coating machine, wherein the film thickness and evenness can be controlled by adjusting different parameters; 3) baking the coating—using three sections, that is, a drying section, a baking section and a cooling section, to bake the coating, wherein the temperature in the drying section is 100˜400° C., the temperature in the baking section is 200˜370° C.
    Type: Application
    Filed: December 14, 2011
    Publication date: March 5, 2015
    Applicant: BAOSHAN IRON & STEEL CO., LTD
    Inventors: Yongqiang Lu, Chunguo Lv, Zhicheng Wang, Bin Chen, Xiao Chen, Shishu Xie
  • Patent number: 8962067
    Abstract: Processes for real time process control of the Polymer Dispersion Index (PDI) during polymerization processes. By tuning this chain length distribution in real time, a resulting polymer can have predetermined physical properties such as thickness, physical yield strength, decomposition time, thermal stability, etc. Techniques herein can dynamically control chain length distribution through use of a mass density measurement device located within a processing chamber and providing real time feedback of polymer growth. Chamber parameters can be controlled or modified before and during polymerization based on mass density feedback. Such chamber parameters can include pressure, temperature, chemistry, and process gas flow rates and flow periods.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: February 24, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Bruce Adair Altemus, Scott W. LeFevre
  • Publication number: 20150050418
    Abstract: It is described a method for changing parameters for controlling a transfer of solder paste onto a printed circuit board (150, 250).
    Type: Application
    Filed: June 12, 2014
    Publication date: February 19, 2015
    Inventors: Mathew GREER, Robert GRAY
  • Publication number: 20150042502
    Abstract: The invention relates to a material configured such as to include a plurality of layers, some layers being made of a composite material and some layers being made of a dielectric material. The layers of composite material include a mixture of host dielectric material and inclusions, such that said inclusions are embedded in the structure of the host dielectric material. Said inclusions preferably include highly conductive fibres, specifically metal microwires. Thus, the structure of the material according to the invention includes a plurality of layers, some layers being made of a composite material, which includes a host dielectric material with inclusions, and some layers being made of a dielectric material. The structure of the material according to the invention is designed so that the surface on which said material is applied is capable of absorbing a portion of the incident electromagnetic radiation, thus substantially reducing the electromagnetic radiation reflected by same curved.
    Type: Application
    Filed: March 26, 2013
    Publication date: February 12, 2015
    Applicant: MICROMAG 2000, S.L.
    Inventors: Ainhoa Gorriti González, Daniel Cortina Blanco, María De La Sierra Flores, Javier Calvo Robledo, Juan José Gómez Robledo, Pilar Marín Palacios, Antonio Hernando Grande
  • Publication number: 20150038044
    Abstract: A method of forming a micropattern structure includes: coating a structure including a plurality of guide blocks extending in a first direction on a substrate and disposed to be spaced apart from each other in a second direction, which is perpendicular to the first direction, with a sacrificial material; ashing a portion of the sacrificial material to expose upper portions of the plurality of guide blocks; coating the structure with a first material having a polarity that is contrary to a polarity of a filling material filling the structure; heat-treating the structure to chemically bond the first material to the upper portions of the plurality of guide blocks; removing the sacrificial material and excess first material to form a first material cap chemically bonded to the upper portions of the plurality of guide blocks; and filling the structure with the filling material.
    Type: Application
    Filed: December 17, 2013
    Publication date: February 5, 2015
    Applicant: Samsung Display Co., Ltd.
    Inventors: Su Mi LEE, Min Hyuck KANG, Myung Im KIM, Tae Woo KIM, Seung-Won PARK, Xie Lei, Moon Gyu LEE
  • Publication number: 20150017320
    Abstract: A method of manufacturing a stacked thin film piezoelectric filter includes the steps of forming a lower thin film piezoelectric resonator on a substrate, measuring a frequency of the lower thin film piezoelectric resonator and adjusting the frequency, forming an acoustic coupling layer on the lower thin film piezoelectric resonator whose frequency has been adjusted, forming the stacked thin film piezoelectric filter by forming an upper thin film piezoelectric resonator on the acoustic coupling layer, and measuring a frequency of the upper thin film piezoelectric resonator and adjusting the frequency.
    Type: Application
    Filed: September 22, 2014
    Publication date: January 15, 2015
    Inventor: Takashi MIYAKE
  • Publication number: 20150010464
    Abstract: The present invention includes the steps of (A) forming a solution containing zinc into mist and spraying the solution formed into mist onto a substrate under no vacuum to form a metal oxide film on the substrate, and (B) irradiating the metal oxide film with ultraviolet rays to decrease a resistance of the metal oxide film. Further, the step (B) includes the steps of (B-1) determining, in accordance with a film thickness of the metal oxide film, wavelengths of the ultraviolet rays to be radiated, and (B-2) irradiating the metal oxide film with the ultraviolet rays having the wavelengths determined in said step (B-1).
    Type: Application
    Filed: October 24, 2012
    Publication date: January 8, 2015
    Applicant: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
    Inventors: Takahiro Shirahata, Hiroyuki Orita, Takahiro Hiramatsu
  • Publication number: 20140377450
    Abstract: An ultrasonic transmitting and receiving device is provided for measuring the transmission and/or reflection of ultrasonic waves on a thin material sheet, or a coating applied thereto. The device may include a plurality of ultrasonic transmitters, a plurality of ultrasonic receivers, wherein the number of the ultrasonic transmitters corresponds to the number of the ultrasonic receivers, and one receiver electronics respectively for each of the ultrasonic receivers or a group receiver electronics respectively for a predetermined number of ultrasonic receivers. A method is provided for ultrasonic absorption and/or transmission measurement, in which signals are emitted by multiple ultrasonic transmitters at the same time or nearly at the same time which are received by ultrasonic receivers and in which the received signals are evaluated in parallel.
    Type: Application
    Filed: September 4, 2014
    Publication date: December 25, 2014
    Inventor: Helmut Knorr
  • Patent number: 8916229
    Abstract: Provided is a substrate processing apparatus in which after a module is disabled, a substrate is provided to a carry-in module capable of placing the wafers most rapidly in the plurality of unit blocks and the substrates are sequentially transported to the module group by the transportation means to be delivered to the carry-out module according to a providing sequence of the substrate to the carry-in module in each of the plurality of unit blocks. In particular, the substrates are extracted from the carry-out module according to a providing sequence of the substrate to the carry-in module and transported to a rear module or a substrate placing part. Thereafter, the substrates are transported to the rear module from the carry-out module or the substrate placing part according to a predetermined sequence in which the substrate is provided to the carry-in module in a normal state.
    Type: Grant
    Filed: August 23, 2011
    Date of Patent: December 23, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Akira Miyata, Kenichirou Matsuyama, Kunie Ogata
  • Patent number: 8889214
    Abstract: A deposition amount measuring apparatus includes a plate-shaped body having a rotating shaft, a plurality of deposition amount sensors along side surfaces of the body, the deposition amount sensors being configured to measure an amount of deposition material, and a housing surrounding the body, the housing including an inflow port that exposes one of the deposition amount sensors.
    Type: Grant
    Filed: May 8, 2013
    Date of Patent: November 18, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Kyung-Soo Kim, Seong-Ho Jeong, Hyun-Keun Song, Eu-Gene Kang
  • Publication number: 20140336758
    Abstract: The invention relates to a method for hydrophilizing surfaces of polymer workpieces. The method has a step (a) of pretreating the workpiece surfaces in a high-frequency gas plasma which is produced on the basis of an inert gas in order to clean and activate the workpiece surfaces; a step (b) of precoating the pretreated workpiece surfaces with polyacrylic acid using a high-frequency gas plasma made of a gas mixture, said gas mixture being composed of an inert gas and a first gas made of biocompatible, polymerizable carboxy group-containing monomers; and a step (c) of subsequently coating the precoated workpiece surfaces using a second gas substantially containing acrylic acid monomers.
    Type: Application
    Filed: February 1, 2013
    Publication date: November 13, 2014
    Inventors: Martin Görne, Thomas Kordick
  • Publication number: 20140335699
    Abstract: Various embodiments relate to application of a fluid to a substrate. The fluid is locally heated, for example, to obtain a desired thickness profile.
    Type: Application
    Filed: May 10, 2013
    Publication date: November 13, 2014
    Applicant: Infineon Technologies AG
    Inventors: Karl Pilch, Hans Leitner, Michael Kalin
  • Publication number: 20140329001
    Abstract: A system and method of coating a workpiece is disclosed. A controller is in electronic communication with a robotic manipulator having a coating dispenser. A layer of coating is applied to a surface of the workpiece by the robot. A wet-surface time is determined corresponding to the areas of the surface upon which the layer of coating is applied. A second layer of coating is applied prior to the expiration of the wet-surface time of the first layer. The layers of coating in adjacent segments can be applied in an overlapping manner within the boundary regions of the segments.
    Type: Application
    Filed: April 28, 2014
    Publication date: November 6, 2014
    Applicant: ABB Technology AG
    Inventors: Didier Rouaud, Michael G. Nelson, Srinivas Nidamarthi
  • Publication number: 20140314947
    Abstract: The present disclosure provides, among other things, scale-coated surfaces, vessels with controlled deposits of scale, and associated methods for enhanced boiling heat transfer. It is presently found that creating and/or maintaining a scale deposit at a controlled thickness actually enhances a type of boiling called nucleate boiling, which improves heat transfer.
    Type: Application
    Filed: August 22, 2013
    Publication date: October 23, 2014
    Applicant: Massachusetts Institute of Technology
    Inventors: Kripa K. Varanasi, Christopher Jameson Love
  • Publication number: 20140272110
    Abstract: According to some embodiments, a method of depositing at least one electrode on a base member of an ultrasound transducer comprises at least partially etching a surface of the base member using a first etching agent, catalyzing the surface of the base member using a first catalyst, plating copper on the surface of the base member using an electroless plating process, inspecting the copper plated on the surface of the base member, at least partially etching a surface of the copper-plated surface using a second etching agent, catalyzing the copper-plated surface using a second catalyst, plating nickel on the copper-plated surface using an electroless plating process and depositing at least one layer of gold on the nickel-plated surface.
    Type: Application
    Filed: March 13, 2014
    Publication date: September 18, 2014
    Applicant: ReCor Medical, Inc.
    Inventors: Kevin Taylor, Paul Chandler
  • Publication number: 20140227507
    Abstract: Disclosed are coating apparatus including flow coating and roll-coating that may be used for uniform sol-gel coating of substrates such as glass, solar panels, windows or part of an electronic display. Also disclosed are methods for substrate preparation, flow coating and roll coating. Lastly systems and methods for skin curing sol-gel coatings deposited onto the surface of glass substrates using a high temperature air-knife are disclosed.
    Type: Application
    Filed: December 23, 2013
    Publication date: August 14, 2014
    Applicant: Enki Technology, Inc.
    Inventors: Brenor L. Brophy, Sina Maghsoodi, Patrick J. Neyman, Peter R. Gonsalves, Jeffrey G. Hirsch, Yu S. Yang
  • Patent number: 8790743
    Abstract: A method for processing a substrate in a reactor by pulsing RF power, includes: applying RF power in pulses in the reactor to process the substrate; monitoring data from the reactor indicative of anomalous pulses of RF power, including data from a photo sensor equipped in the reactor; counting the number of anomalous pulses of RF power in the monitored data; determining whether or not the number of anomalous pulses of RF power is acceptable; and initiating a pre-designated sequence if the number of anomalous pulses of RF power is determined to be unacceptable.
    Type: Grant
    Filed: March 4, 2013
    Date of Patent: July 29, 2014
    Assignee: ASM IP Holding B.V.
    Inventors: Taku Omori, Naoki Inoue, Wataru Adachi
  • Publication number: 20140199472
    Abstract: An aspect of the present invention provides an ejection volume correction method for an inkjet head, including: an arranging step of ejecting functional ink as ink droplets from nozzles of an inkjet head so as to discretely arrange the ink droplets on a front surface of a substrate; a contacting step of filling the functional ink in between a mold and the substrate by causing the mold to contact the ink droplets arranged on the front surface of the substrate; a curing step of curing the filled functional ink so as to generate a functional film ; a separating step of separating the mold from the functional film; a measuring step of measuring a thickness of the functional film; and a correcting step of correcting an ejection volume from the nozzles based on the measured thickness.
    Type: Application
    Filed: March 14, 2014
    Publication date: July 17, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kenichi KODAMA, Tadashi OMATSU
  • Patent number: 8772053
    Abstract: The present invention provides a method for repairing open line defect on LCD array substrate, which includes: when discovering open line defect on a pattern on LCD array substrate, identifying a repair line path of the open line on the pattern and scanning the repair line path; based on the result of scanning the repair line path, dividing the repair line path into at least two path segments and disposing corresponding coating speed for each path segment; and for each path segment, performing coating at the corresponding speed to form connected coating on the repair line path. The present invention also provides a device for repairing open line defect on LCD array substrate. As such, the present embodiment can increase success rate for repairing open lines.
    Type: Grant
    Filed: November 15, 2012
    Date of Patent: July 8, 2014
    Assignee: Shenzhen China Star Optoelectronics Technology co., Ltd.
    Inventor: Wenda Cheng
  • Publication number: 20140178568
    Abstract: An apparatus for passivating a coating of a flexible substrate includes a coating chamber for coating the flexible substrate, a chamber separation element, the chamber separation element being arranged for separating the coating chamber from a further chamber, a coating drum, the coating drum and the chamber separation element forming a gap, and a gas inlet, the gas inlet being arranged within the chamber separation element for supplying oxygen into the gap.
    Type: Application
    Filed: April 29, 2011
    Publication date: June 26, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Alexander Wolff, Gerd Hoffmann
  • Publication number: 20140170301
    Abstract: A thin film deposition apparatus and method are disclosed. In one aspect, the deposition apparatus comprises a deposition source emitting a deposition material that is to be deposited on a surface of a substrate, a transfer unit moving the deposition source, a thickness measurement sensor measuring a thickness of the deposition material deposited on the surface of the substrate, and a transfer controller adjusting a moving speed of the transfer unit according to the thickness of the deposition material deposited on the surface of the substrate per unit of time.
    Type: Application
    Filed: March 12, 2013
    Publication date: June 19, 2014
    Applicant: Samsung Display co., Ltd.
    Inventors: Yong Hun Jo, Jae Hong Ahn, Jong Woo Lee
  • Publication number: 20140170302
    Abstract: The invention provides methods and compositions for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined.
    Type: Application
    Filed: February 18, 2014
    Publication date: June 19, 2014
    Applicant: NALCO COMPANY
    Inventors: William A. Von Drasek, Rodney H. Banks, Gary S. Furman
  • Patent number: 8747949
    Abstract: A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.
    Type: Grant
    Filed: October 12, 2010
    Date of Patent: June 10, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Tomohiro Kaneko, Akira Miyata
  • Publication number: 20140154403
    Abstract: A thin film deposition source, a deposition apparatus and a deposition method using the same are disclosed. The deposition apparatus includes a deposition source including a plurality of jet nozzles that spray a deposition substance on a surface of a substrate and are arranged in a first direction, and at least one shutter controlling a jet region of the deposition substance by opening or shielding at least a portion of a jetting passageway of the deposition substance.
    Type: Application
    Filed: September 25, 2013
    Publication date: June 5, 2014
    Applicant: Samsung Display Co., Ltd.
    Inventor: Jong Woo Lee
  • Publication number: 20140154402
    Abstract: Silicon sintering method, without applying an external force, comprising placement of a silicon sample in a furnace, then heat treatment of this sample at, at least one temperature and at least one partial pressure of oxidising species to control the thickness of a silicon oxide layer on its surface.
    Type: Application
    Filed: October 14, 2011
    Publication date: June 5, 2014
    Applicants: Commissariat A L'energie Atomique ET Aux Energies Alternatives, Universite Joseph Fourier
    Inventors: Jean-Marie Lebrun, Jean-Michel Missiaen, Celine Pascal, Jean-Paul Garandet, Florence Servant
  • Patent number: 8728587
    Abstract: A plasma processing apparatus and method are disclosed which improve the repeatability of various plasma processes. The actual implanted dose is a function of implant conditions, as well as various other parameters. This method used knowledge of current implant conditions, as well as information about historical data to improve repeatability. In one embodiment, a plasma is created, a first sensing system is used to monitor a composition of the plasma and a second sensing system is used to monitor a total number of ions implanted. Information about plasma composition and dose per pulse is used to control one or more operating parameters in the plasma chamber. In another embodiment, this information is combined with historical data to control one or more operating parameters in the plasma chamber. In another embodiment, the thickness of material on the walls is measured, and used to modify one or more operating parameters.
    Type: Grant
    Filed: June 24, 2011
    Date of Patent: May 20, 2014
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: George Papasouliotis, Deven M. Raj, Harold Persing
  • Publication number: 20140134324
    Abstract: Provided are an automatic lithium target regenerating apparatus and an automatic lithium target regenerating method, which are equipped with a measurement function of a lithium film thickness of a lithium target, and may automatically regenerate the consumed lithium target by moving a vapor deposition source to the lithium target. An automatic lithium target regenerating apparatus (106) is allowed to automatically regenerate lithium of a lithium target. The automatic lithium target regenerating apparatus (106) includes a lithium vapor deposition unit (1) for vapor-depositing the lithium on the lithium target. The lithium vapor deposition unit (1) is allowed to vapor-deposit the lithium on the lithium target by moving to the lithium target side.
    Type: Application
    Filed: May 31, 2012
    Publication date: May 15, 2014
    Applicant: CANCER INTELLIGENCE CARE SYSTEMS, INC.
    Inventors: Ryo Fujii, Masaru Nakamura, Yoshio Imahori, Masaharu Hoshi
  • Publication number: 20140106062
    Abstract: A method for in-situ monitoring of gas-phase photoactive organic molecules in real time while depositing a film of the photoactive organic molecules on a substrate in a processing chamber for depositing the film includes irradiating the gas-phase photoactive organic molecules in the processing chamber with a radiation from a radiation source in-situ while depositing the film of the one or more organic materials and measuring the intensity of the resulting photoluminescence emission from the organic material. One or more processing parameters associated with the deposition process can be determined from the photoluminescence intensity data in real time providing useful feedback on the deposition process.
    Type: Application
    Filed: October 16, 2012
    Publication date: April 17, 2014
    Applicant: The Regents of the University of Michigan
    Inventors: Stephen R. Forrest, Garen Vartanian, Cedric Rolin
  • Patent number: 8697178
    Abstract: A method for applying a coating to a cable, the cable having a longitudinal direction, includes A) cleaning the surface of the cable, and B) applying coating to the cable by rotating a coating application means around the cable allowing the application of the coating. The steps are performed from a platform being moved along the cable in a movement direction by at least three wheels that are fastened in a force-locking manner to the cable. Step A) is performed in the movement direction before the wheels, and step B) is performed in the movement direction behind the wheels. The wheels are driven by a motor that can be controlled in such a manner that the platform can be positioned at predefined positions reproducibly.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: April 15, 2014
    Assignee: Diagnose-und Ingenieurgesellschaft Dr. Boué
    Inventor: Andreas Boué
  • Publication number: 20140096925
    Abstract: A coating system, a paper machine, and methods of their use are provided.
    Type: Application
    Filed: October 8, 2013
    Publication date: April 10, 2014
    Applicant: Journey Electronics Corp.
    Inventor: Michael Gorden
  • Patent number: 8689731
    Abstract: Disclosed is an apparatus and process for coating a component with aligning device. Alignments or checking of the spray cone take place within the coating apparatus via an optically transparent reference plate which is optically evaluated.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: April 8, 2014
    Assignee: Siemens Aktiengesellschaft
    Inventor: Falk Stadelmaier
  • Patent number: 8691322
    Abstract: A method for measuring the thickness of a coating on a component section of a rotating component, wherein a heat expansion of the component section is determined by detecting a component core temperature and an actual coating thickness is produced, a device for conducting a method of this type having a temperature detecting system and having an evaluating device, as well as a production process and a coating system, are disclosed.
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: April 8, 2014
    Assignee: MTU Aero Engines GmbH
    Inventors: Jochen Zierhut, Susanne Hogger
  • Publication number: 20140083925
    Abstract: This invention relates to the field of molecular layer-by-layer deposition processes and more specifically to the synthesis of a polymer layer relevant to a separation membrane using molecular layer-by-layer deposition of highly cross-linked polyamide films to promote consistent layer growth consistent for the formation of membrane layers having a uniform chemical composition and thickness.
    Type: Application
    Filed: May 17, 2013
    Publication date: March 27, 2014
    Applicant: The United States of America as represented by the Secretary of Commerce
    Inventors: Christopher M. Stafford, Peter M. Johnson
  • Patent number: 8679573
    Abstract: An apparatus includes a piezoelectric print head capable of ejecting a droplet of a coating substance towards a stent strut, a sensor capable of sensing a parameter of the droplet, and a controller, communicatively coupled to the print head and the sensor, capable of determining if the parameter of the droplet meets a requirement. A method includes ejecting a droplet of a coating substance towards a stent strut with a piezoelectric print head, sensing a parameter of the droplet, and determining whether the parameter of the droplet meets a requirement.
    Type: Grant
    Filed: June 28, 2006
    Date of Patent: March 25, 2014
    Assignee: Advanced Cardiovascular Systems, Inc.
    Inventors: Jason Van Sciver, Greg Teaby, Phil Foreman, Manish Gada
  • Patent number: 8641686
    Abstract: An anti-biofilm catheter comprising a tubing configured to be disposed within a luminal system, wherein the tubing comes in contacting engagement with a blood flow within the luminal system in vivo. The catheter comprises a surface disposed over at least a portion of the tubing, wherein the surface comprises a surface profile having a skewness value of from about ?0.01 to about ?0.6 such that few or no components of the blood flow is capable of attaching themselves to the surface to encourage biofilm formation. The surface profile further comprises a kurtosis value of from about 2.7 to 3.3.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: February 4, 2014
    Inventor: Rabie Stephan
  • Patent number: 8643389
    Abstract: A corrosion sensor includes a plurality of conductive portions and at least one non-conductive portion between adjacent conductive portions, wherein the at least one non-conductive portion has a dimension less than approximately 500 microns. A method for manufacturing a corrosion sensor includes applying a non-conductive material to a substrate and applying a conductive material to discrete locations on the non-conductive material. The method further includes applying a brazing material around each discrete location of the conductive material.
    Type: Grant
    Filed: January 6, 2011
    Date of Patent: February 4, 2014
    Assignee: General Electric Company
    Inventors: Rebecca Evelyn Hefner, Paul Stephen DiMascio
  • Publication number: 20140030424
    Abstract: A method for automatically setting the rider roll/glue applicator roll gap for the single face web on a glue machine senses a forward drag that the single face web, operating at corrugator speed, exerts on the glue applicator roll, driven at an underspeed, after bringing the flute tips of the single face web into contact with the glue applicator roll by adjusting the position of the rider roll. Changes in forward drag exerted on the glue applicator roll are monitored and related directly to glue applicator roll drive current to provide a slight compression of the single face web between the rider roll and the glue applicator roll. Preferably, the glue applicator roll uses a regenerative drive and the target drive current command in a feedback control system to cause the gap to be adjusted to achieve the desired slight compression of the web flutes and to maintain the glue applicator roll under speed.
    Type: Application
    Filed: May 24, 2011
    Publication date: January 30, 2014
    Applicant: MARQUIP, LLC
    Inventors: Charles M. Hirtreiter, John R. Sofinowski, James A. Cummings
  • Publication number: 20140011040
    Abstract: Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single heating step to provide a cured coating. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.
    Type: Application
    Filed: September 5, 2013
    Publication date: January 9, 2014
    Applicant: Valspar Sourcing, Inc.
    Inventors: Owen H. Decker, Thomas E. Reno, Robert D. Breitzman, Carlos A. Concha, Jeffrey D. Rogozinski