Abstract: A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.

Abstract: A thin film deposition source, a deposition apparatus and a deposition method using the same are disclosed. The deposition apparatus includes a deposition source including a plurality of jet nozzles that spray a deposition substance on a surface of a substrate and are arranged in a first direction, and at least one shutter controlling a jet region of the deposition substance by opening or shielding at least a portion of a jetting passageway of the deposition substance.

Abstract: Silicon sintering method, without applying an external force, comprising placement of a silicon sample in a furnace, then heat treatment of this sample at, at least one temperature and at least one partial pressure of oxidising species to control the thickness of a silicon oxide layer on its surface.

Abstract: A plasma processing apparatus and method are disclosed which improve the repeatability of various plasma processes. The actual implanted dose is a function of implant conditions, as well as various other parameters. This method used knowledge of current implant conditions, as well as information about historical data to improve repeatability. In one embodiment, a plasma is created, a first sensing system is used to monitor a composition of the plasma and a second sensing system is used to monitor a total number of ions implanted. Information about plasma composition and dose per pulse is used to control one or more operating parameters in the plasma chamber. In another embodiment, this information is combined with historical data to control one or more operating parameters in the plasma chamber. In another embodiment, the thickness of material on the walls is measured, and used to modify one or more operating parameters.

Abstract: Provided are an automatic lithium target regenerating apparatus and an automatic lithium target regenerating method, which are equipped with a measurement function of a lithium film thickness of a lithium target, and may automatically regenerate the consumed lithium target by moving a vapor deposition source to the lithium target. An automatic lithium target regenerating apparatus (106) is allowed to automatically regenerate lithium of a lithium target. The automatic lithium target regenerating apparatus (106) includes a lithium vapor deposition unit (1) for vapor-depositing the lithium on the lithium target. The lithium vapor deposition unit (1) is allowed to vapor-deposit the lithium on the lithium target by moving to the lithium target side.

Abstract: A method for in-situ monitoring of gas-phase photoactive organic molecules in real time while depositing a film of the photoactive organic molecules on a substrate in a processing chamber for depositing the film includes irradiating the gas-phase photoactive organic molecules in the processing chamber with a radiation from a radiation source in-situ while depositing the film of the one or more organic materials and measuring the intensity of the resulting photoluminescence emission from the organic material. One or more processing parameters associated with the deposition process can be determined from the photoluminescence intensity data in real time providing useful feedback on the deposition process.

Abstract: A method for applying a coating to a cable, the cable having a longitudinal direction, includes A) cleaning the surface of the cable, and B) applying coating to the cable by rotating a coating application means around the cable allowing the application of the coating. The steps are performed from a platform being moved along the cable in a movement direction by at least three wheels that are fastened in a force-locking manner to the cable. Step A) is performed in the movement direction before the wheels, and step B) is performed in the movement direction behind the wheels. The wheels are driven by a motor that can be controlled in such a manner that the platform can be positioned at predefined positions reproducibly.

Abstract: A coating system, a paper machine, and methods of their use are provided.

Abstract: A method for measuring the thickness of a coating on a component section of a rotating component, wherein a heat expansion of the component section is determined by detecting a component core temperature and an actual coating thickness is produced, a device for conducting a method of this type having a temperature detecting system and having an evaluating device, as well as a production process and a coating system, are disclosed.

Abstract: Disclosed is an apparatus and process for coating a component with aligning device. Alignments or checking of the spray cone take place within the coating apparatus via an optically transparent reference plate which is optically evaluated.

Abstract: This invention relates to the field of molecular layer-by-layer deposition processes and more specifically to the synthesis of a polymer layer relevant to a separation membrane using molecular layer-by-layer deposition of highly cross-linked polyamide films to promote consistent layer growth consistent for the formation of membrane layers having a uniform chemical composition and thickness.

Abstract: An apparatus includes a piezoelectric print head capable of ejecting a droplet of a coating substance towards a stent strut, a sensor capable of sensing a parameter of the droplet, and a controller, communicatively coupled to the print head and the sensor, capable of determining if the parameter of the droplet meets a requirement. A method includes ejecting a droplet of a coating substance towards a stent strut with a piezoelectric print head, sensing a parameter of the droplet, and determining whether the parameter of the droplet meets a requirement.

Abstract: An anti-biofilm catheter comprising a tubing configured to be disposed within a luminal system, wherein the tubing comes in contacting engagement with a blood flow within the luminal system in vivo. The catheter comprises a surface disposed over at least a portion of the tubing, wherein the surface comprises a surface profile having a skewness value of from about ?0.01 to about ?0.6 such that few or no components of the blood flow is capable of attaching themselves to the surface to encourage biofilm formation. The surface profile further comprises a kurtosis value of from about 2.7 to 3.3.

Abstract: A corrosion sensor includes a plurality of conductive portions and at least one non-conductive portion between adjacent conductive portions, wherein the at least one non-conductive portion has a dimension less than approximately 500 microns. A method for manufacturing a corrosion sensor includes applying a non-conductive material to a substrate and applying a conductive material to discrete locations on the non-conductive material. The method further includes applying a brazing material around each discrete location of the conductive material.

Abstract: A method for automatically setting the rider roll/glue applicator roll gap for the single face web on a glue machine senses a forward drag that the single face web, operating at corrugator speed, exerts on the glue applicator roll, driven at an underspeed, after bringing the flute tips of the single face web into contact with the glue applicator roll by adjusting the position of the rider roll. Changes in forward drag exerted on the glue applicator roll are monitored and related directly to glue applicator roll drive current to provide a slight compression of the single face web between the rider roll and the glue applicator roll. Preferably, the glue applicator roll uses a regenerative drive and the target drive current command in a feedback control system to cause the gap to be adjusted to achieve the desired slight compression of the web flutes and to maintain the glue applicator roll under speed.

Abstract: Methods and systems for coating metal substrates are provided. The methods and systems include sequential application of low flow and high flow powder coatings followed by a single heating step to provide a cured coating. The methods and systems include a marker that allows coating uniformity to be monitored and assessed during application. The described methods provide coatings with optimal surface smoothness and edge coverage.

Abstract: The invention relates to a multilayer composite film which is substantially free from polyvinyl chloride and polyolefins. In particular, the layers of the film may include an ABS material, a polystyrene material, and/or a polyester material. The material composition and thickness of composite film are such that the maximum tensile force generated when a test body including the composite film is subjected to a specified single-axis tensile testing procedure ranges between 30 Newtons and 280 Newtons.

Abstract: Improved methods and apparatus for forming thin-film layers of chalcogenide on a substrate web. Solutions containing the reactants for the chalcogenide layer may be contained substantially to the front surface of the web, controlling the boundaries of the reaction and avoiding undesired deposition of chalcogenide upon the back side of the web.

Abstract: This description relates to a plasma treatment apparatus including a vapor chamber, a gas supply and an upper electrode assembly. The upper electrode assembly includes a gas distribution plate having a plurality of holes in a bottom surface thereof and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle. The plasma treatment apparatus further includes a controller configured to generate a control signal. The at least one controllable valve is configured to be adjusted based on the control signal. A control system and a method of controlling a controllable valve are also described.

Abstract: In at least some examples, a three-dimensional (3D) printing system comprises a coarse 3D printing interface to form a 3D object core. The 3D printing system also comprises a fine 3D printing interface to form a 3D object shell around at least some of the 3D object core. The 3D printing system also comprises a controller to receive a dataset corresponding to a 3D object model and to direct the coarse 3D printing interface to form the 3D object core based on the dataset.

Abstract: A process and apparatus for the production of metal parts by layered manufacturing starting from wire raw material comprising of the steps of; descaling of the wire; creating and maintaining a melt pool of the metal in a melt chamber; expelling controlled amounts of melt from the melt chamber in predetermined layer patterns, which solidify to form a desired object; managing the solidification parameters to achieve the deposit cross sections desired and depositing a removable support material to assist in maintaining the geometry of the desired metal deposit. Said apparatus is capable of higher production rate than other metal layered manufacturing systems available commercially and can be used for any metal alloy or non-metal material that can be supplied in wire form and that is within the melt capacity of this invention.

Abstract: The present invention provides a method to determine the thickness of a thin film during deposition. A target film thickness is set. A substrate is placed within a deposition system. The thin film is deposited onto the substrate within the deposition system. Radiation reflected from the substrate is monitored at multiple wavelengths during the deposition of the thin film using standard OEI techniques. A value derived from the reflected radiation is monitored. A time is detected at which the derived value is at a target value. A film thickness is calculated at the detected times to generate data. A mathematical analysis is performed on the generated data to determine an equation for deposited film thickness versus time. The calculated equation for deposited film thickness versus time is used to achieve the target film thickness.

Abstract: A chuck and a wafer supported thereon are rotated during a plasma process or a film deposition process to reduce thickness non-uniformity of a film processed or deposited on the wafer.

Abstract: A method and apparatus for inspecting sealant on an object. First data is generated for a first geometry of a first surface of the object prior to sealing the object. Second data is generated for a second geometry of a second surface of the object after the sealant has been applied to the object. A difference is identified between the first data and the second data. The difference indicates a thickness of the sealant on the object.

Abstract: A maintenance system for an assembly comprises a storage medium containing an as-built computer-aided design model of the assembly, a displaying means for displaying the as-built computer-aided design model, a metrology device for measuring a location of at least one characteristic of the assembly and creating as-built data regarding the location, and a replacing means for replacing a part of the assembly with a replacement part. The replacing means determines the location for the replacement part on the assembly by analyzing the as-built computer-aided design model and the data created by the metrology device.

Abstract: Provided is a method for determining the presence of an alumina layer on a surface of a component. The method includes illuminating a surface of a component with radiation; detecting radiation emitted at a particular wavelength; analyzing the detected radiation; to determine the thickness of the alumina at at least one point on the surface of the component; and comparing the determined thickness of the alumina at the at least one point on the surface of the component with a predetermined thickness of alumina at that point to decide if the thickness of alumina at the at least one point on the surface of the component is satisfactory.

Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.

Abstract: In a wafer processing method and a wafer processing system, a first property on a back side of a wafer is measured. The back side of the wafer is supported on a multi-zone chuck having a plurality of zones with controllable clamping forces. The wafer is secured to the multi-zone chuck by controlling the clamping forces in the corresponding zones in accordance with measured values of the first property in the zones.

Abstract: The description relates to an adjustable nozzle capable of pivoting about an axis of the nozzle and translating along the axis of the nozzle. A high density plasma chemical vapor deposition (HDP CVD) chamber houses a plurality of adjustable nozzles. A feedback control system includes a control unit coupled to the adjustable nozzle and the HDP CVD chamber to form a more uniform thickness profile of films deposited on a wafer in the HDP CVD chamber.

Abstract: A spray monitoring device analyzes images obtained from a beam passing through a spray pattern applying a spray to a substrate, and identifies discontinuities in the image as indicative of a discontinuity in a spray pattern. The spray pattern is produced by a plurality of nozzles spaced apart across the substrate for applying a suitable coating thereto. The beam is produced by a laser, that preferably has a collimator for distributing the beam intensity. The beam is imaged by a camera that provides a constant image to a computers where the scattering of beam light by the spray pattern is processed by image processing software and optionally provided to a user interface for analysis. Discontinuities detected by the user or software indicate faulty spray nozzles and may trigger remedial action.

Abstract: Apparatus and a method for forming a thin film including a vacuum chamber, a substrate holder located on the inner upper side of the vacuum chamber to secure a substrate, an evaporation source located on the inner lower side of the vacuum chamber to evaporate a deposition material, an evaporation source shutter substantially confining the deposition material evaporated to the evaporation source, a sensor located within the vacuum chamber to detect the thickness of the deposition material deposited on itself, and a calculation portion calculating the thickness of the deposition material deposited on the evaporation source shutter using data detected by the sensor.

Abstract: New and improved microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed microwave plasma assisted reactors operate at pressures ranging from about 10 Torr to about 760 Torr. The disclosed microwave plasma assisted reactors include a movable lower sliding short and/or a reduced diameter conductive stage in a coaxial cavity of a plasma chamber. For a particular application, the lower sliding short position and/or the conductive stage diameter can be variably selected such that, relative to conventional reactors, the reactors can be tuned to operate over larger substrate areas, operate at higher pressures, and discharge absorbed power densities with increased diamond synthesis rates (carats per hour) and increased deposition uniformity.

Abstract: A method for monitoring and controlling the thickness of coating on a creping cylinder is disclosed. The methodologies involve a coordinated scheme of apparatuses that function to monitor various aspects of a creping cylinder coating so that the thickness of the coating can be determined.

Abstract: A method for applying a coating to a cable, the cable having a longitudinal direction, includes A) cleaning the surface of the cable, and B) applying coating to the cable by rotating a coating application means around the cable allowing the application of the coating. The steps are performed from a platform being moved along the cable in a movement direction by at least three wheels that are fastened in a force-locking manner to the cable. Step A) is performed in the movement direction before the wheels, and step B) is performed in the movement direction behind the wheels. The wheels are driven by a motor that can be controlled in such a manner that the platform can be positioned at predefined positions reproducibly.

Abstract: A method for real-timely monitoring thickness change of a coating film is disclosed. In the method, a coating module having a chamber and a film thickness-monitoring module containing an SPR optical fiber sensor, a light source, a light-receiving detector, and optical fibers are first provided. The optical fibers are used to connect the SPR optical fiber sensor with the light source and the light-receiving detector. The SPR optical fiber sensor has a sensing area and is arranged in the chamber. The light source provides the SPR optical fiber sensor with light. Then, a substrate is put into the chamber. While coating process is performed on the substrate, a film is also formed on the sensing area of the SPR optical fiber sensor. The light-receiving detector receives signals output from the sensing area of the SPR optical fiber sensor and then outputs signals of light-intensity change.

Abstract: An alignment film coating method for spraying alignment film droplets on a glass substrate provided with color filters is disclosed. The color filters include a plurality of groups of cuboidal R, G, B trichromatic color filters having an equal area but different thicknesses and arranged in rows and columns, and the R, G, B trichromatic color filters are disposed at intervals with a groove being formed between every two adjacent color filters. A plurality of spray nozzles for spraying the alignment film droplets are arranged in a direction parallel to an arrangement direction of the color filters of a same color. An alignment film coating apparatus is further disclosed. By using the alignment film coating method and the alignment film coating apparatus of the present disclosure to coat an alignment film, the alignment film can be made more uniform and flat.

Abstract: A coated chassis is disclosed. The chassis can be made from a non-conductive material and can be operable to support a display. A conductive material can be applied to at least a portion of the chassis to form a continuous strip on the chassis frame. The conductive material can further form a closed-loop around the chassis frame. The chassis frame can be included within a device, such as a mobile phone, touchpad, portable computer, portable media player, and the like. The conductive material on the chassis can be coupled to the system ground of the device. Processes for making a coated chassis are also disclosed.

Abstract: A method for regenerating oxide coatings on selected gas turbine engine components in situ, comprising the steps of defining an exhaust gas recirculation (EGR) loop for the gas turbine engine, identifying one or more target locations within the EGR loop for purposes of monitoring the level of metal oxide degradation occurring in key gas turbine engine components over time, collecting and analyzing data corresponding to the level of metal oxide degradation with a fixed time period at each of the target locations, determining which ones of the target locations within the EGR loop require oxide regeneration using injected oxygen, and controlling the amount of oxygen injection at the target locations sufficient to regenerate the metal oxide coatings to desired levels.

Abstract: A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.

Abstract: An injector for a vacuum vapour deposition system, includes an injection duct suitable for receiving vaporized materials from a vacuum evaporation source and a diffuser having a plurality of nozzles for diffusing the vaporized materials into a vacuum deposition chamber, each nozzle including a channel suitable for connecting the injection duct to the deposition chamber. The diffuser has a spatially varying nozzle distribution. A process for calibrating an injector and a process for manufacturing a diffuser for an injector are also described.

Abstract: Thermally insulating layer incorporating a distinguishing agent and method for inspecting the insulating layer are provided. The distinguishing agent may be used for determining a remaining thickness of the thermally insulating layer.

Abstract: Provided are an apparatus and method for depositing a thin film on a substrate. The substrate is supported by a substrate holder. The substrate holder is seated on each of a plurality of holder seating grooves defined in a top surface of the susceptor. An injection hole for injecting a gas is defined in a top surface of each of the holder seating grooves. When a process is performed, the susceptor is rotated with respect to a central axis thereof, and the substrate holder is rotated with respect to a central axis of the substrate holder by the gas injected from the injection hole. A flow rate of the gas supplied onto an under surface of the substrate holder is adjusted according to a state of the substrate.

Abstract: A method for measuring the thickness of a coating on a component section of a rotating component, wherein a heat expansion of the component section is determined by detecting a component core temperature and an actual coating thickness is produced, a device for conducting a method of this type having a temperature detecting system and having an evaluating device, as well as a production process and a coating system, are disclosed.

Abstract: A process of coating at least one substrate with a plurality of deposition sources, a method of tooling, a carrier unit and a deposition system are described. The systems and methods provide for or allow for exposing a first substrate portion 112a of said at least one substrate 112 to a first deposition source 118a through an aperture 122 of a carrier unit 110, 510, depositing a first layer 126a over the first substrate portion, said first layer including material from said first deposition source, varying a relative position between said at least one substrate and said aperture for exposing a second substrate portion of said at least one substrate, or another substrate, to a second deposition source, and depositing a second layer 126b over the second substrate portion 112b, said second layer including material from said second deposition source.

Abstract: A method and system for interrogating a thickness of a carbon layer are described. The carbon layer is on a magnetic media having an underlayer and at least one magnetic layer on the underlayer. The carbon layer resides on the magnetic layer(s). A sample underlayer is deposited on a sample substrate and a sample carbon layer provided on the sample underlayer. The sample substrate corresponds to a substrate including the magnetic media. The sample underlayer corresponds to the underlayer of the magnetic media. The sample carbon layer corresponds to the carbon layer. A region between the sample carbon layer and the sample underlayer is free of magnetic material. The sample substrate including the sample carbon layer is exposed to light. Emitted light from the sample substrate is detected to provide a Raman spectrum. The thickness of the carbon layer is determined based on the Raman spectrum.

Abstract: A method for simulating of the thickness of a coating which is placed onto a substrate surface is disclosed. The thickness is simulated using mass conservation principles. In a preferred embodiment at least one reference spray trial is performed, the correlation of a single spray profile to at least one spray process parameter is determined, the single spray profile is simulated using mass conservation principles to an incoming powder jet stream.

Abstract: The present invention relates to methods and apparatuses for forming an active-containing film product, while significantly reducing the amount of wasted active material. The resulting product is an active-containing film product that meets the user's predetermined criteria of physical properties and is suitable for use.

Abstract: A processing condition inspection method of a damage recovery process for reforming a film having OH groups generated by damages from a predetermined process by using a processing gas includes preparing a substrate having an OH group containing resin film, measuring an initial film thickness of the OH group containing resin film, performing a damage recovery process on the substrate after measuring the initial film thickness, measuring a film thickness of the OH group containing resin film after the damage recovery process, calculating a film thickness difference of the OH group containing resin film before and after the damage recovery process, and determining whether processing conditions of the damage recovery process are appropriate or inappropriate based on the film thickness difference.

Abstract: A printed layer formation processing device performs a part of a process for forming a printed layer on a part of the print medium by a first colorant in a molded object formation process. The printed layer formation processing device includes: a formation amount correspondence relationship storage part that stores a formation amount correspondence relationship, which is a correspondence relationship between a degree of deformation of the print medium and a formation amount of the first colorant, which are correlated so that the thickness of the printed layer is substantially the same in respective regions of the molded object, a deformation degree acquisition part that acquires the degree of deformation in the respective regions of the print medium; and a formation amount determining part that determines the formation amount of the first colorant in the respective regions based on the degree of the deformation and the formation amount correspondence relationship.

Abstract: A method is provided for the determination a thickness error in a previously deposited layer using the reflection monitor signal of the currently-depositing layer. This thickness error is then used to compute corrections to the thickness of the currently-depositing layer and the next layer which corrects for the thickness error in the previous layer. The method is stable with respect to noise in the optical monitor signal. The technique is applicable for optical coating designs which are not necessarily quarter wave. The approach avoids the buildup of thickness errors from layer to layer and thus is applicable for very thick designs with many layers. Near the end of a currently depositing layer the monitor signal is used to fit the admittance of the base stack under the current layer. This establishes the parameters in an exact reflectance model used for the thickness monitoring of the current layer.