Multilayer Patents (Class 430/14)
  • Patent number: 9547237
    Abstract: Provided is a colored photo-sensitive composition having a high sensitivity and a good developablity, even if the ratio of content of a pigment, relative to the total solids of the colored photo-sensitive composition, is 20% by mass or more. The colored photo-sensitive composition includes (A) a resin which is increased, by action of an acid, in solubility into an alkali developing solution; (B) a pigment; (C) a compound which produces an acid upon irradiated by active light or radial ray; and (D) a solvent, wherein the ratio of content of the (B) pigment, relative to the total solids of the colored photo-sensitive composition, is 20% by mass or more.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: January 17, 2017
    Assignee: FUJIFILM Corporation
    Inventor: Yuushi Kaneko
  • Patent number: 9513544
    Abstract: Provided is a colored photo-sensitive composition having a high sensitivity and a good developablity, even if the ratio of content of a pigment, relative to the total solids of the colored photo-sensitive composition, is 20% by mass or more. The colored photo-sensitive composition includes (A) a resin which is increased, by action of an acid, in solubility into an alkali developing solution; (B) a pigment; (C) a compound which produces an acid upon irradiated by active light or radial ray; and (D) a solvent, wherein the ratio of content of the (B) pigment, relative to the total solids of the colored photo-sensitive composition, is 20% by mass or more.
    Type: Grant
    Filed: August 6, 2015
    Date of Patent: December 6, 2016
    Assignee: FUJIFILM Corporation
    Inventor: Yuushi Kaneko
  • Patent number: 9249315
    Abstract: A release film for soft composite materials is provided. The release film contains a film with a closely packed self-assembled monolayer. A method of applying soft composite materials to a substrate without loss of the soft composite material to the release film is also provided. The method is useful in applications such as applying thermal pastes to semiconductor packaging.
    Type: Grant
    Filed: August 19, 2009
    Date of Patent: February 2, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventor: Ijeoma M. Nnebe
  • Patent number: 9096469
    Abstract: The present invention provides a two component geopolymer composition of wherein one component comprises a dry mix of an aluminosilicate, such as flyash, geopolymer precursor and one or more epoxy multilayer polymer particle redispersible polymer powder (RDP) having an epoxy resin core and an alkali soluble polymer shell, the epoxy resin having a calculated glass transition temperature (Tg) of from 7 to 45° C., and, wherein the other component, comprises one or more alkaline silicate geopolymer precursor, preferably in the form of an aqueous solution. The two-component compositions having from 1 to 20 wt. % of the RDP, based on solids, and provide greater formulation flexibility to make geopolymer compositions having improved tensile strength.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: August 4, 2015
    Assignee: DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Liang Chen, Chan Han, Dongkyu Kim, Michael J. Radler
  • Patent number: 9049790
    Abstract: The invention relates to a masking layer. The masking layer produced by coating a white-color photosensitive resin composition on a peripheral region of a transparent substrate, developing the white-color photosensitive resin composition to obtain a patterned composition layer, coating a gray-color photosensitive resin composition on the cured composition layer and developing the gray-color photosensitive resin composition, so that the gray-color photosensitive resin composition is cured to obtain the masking layer having an optical density (O.D.) of ?3.5. The masking layer is adapted for use on a touch panel or a flat panel display device. The masking layer shows a white color appearance when viewed from outside and serves as a white color decoration around the peripheral region of the device. The masking layer further comprises a gray colored sub-layer to mask the electrical circuitry disposed beneath the masking layer.
    Type: Grant
    Filed: August 13, 2013
    Date of Patent: June 2, 2015
    Assignee: ECHEM SOLUTIONS CORP.
    Inventors: Shih-Peng Lin, Yu-cheng Lai, Hsin-Jen Cheng, Yan-fu Pan, Yi-Lun Chiu, Tsung-Mu Yang, Chen-Wen Chiu, Chia-Ling Luo
  • Publication number: 20150125787
    Abstract: A conductive pattern can be formed a reactive polymer comprising pendant tertiary alkyl ester groups, (b) a compound that provides an acid upon exposure to radiation, (c) a crosslinking agent that is capable of reacting in the presence of the acid, and (d) optionally, a photosensitizer. The polymeric layer is patternwise exposed to provide non-exposed regions and exposed regions comprising a polymer comprising carboxylic acid groups. Both the non-exposed regions and the exposed regions of the polymeric layer are contacted with a reducing agent, bleached to remove surface amounts of the reducing agent in both non-exposed and exposed regions of the polymeric layer, and contacted with electroless seed metal ions to oxidize the reducing agent and to form corresponding electroless seed metal nuclei in the exposed regions. The corresponding electroless seed metal nuclei are then electrolessly plated with a conductive metal.
    Type: Application
    Filed: November 5, 2013
    Publication date: May 7, 2015
    Inventors: Mark Edward Irving, Thomas B. Brust
  • Patent number: 8993897
    Abstract: The photosensitive resin composition contains a (A) binder polymer, (B) cross-linked polymer particles, (C) thermosetting resin, (D) photo-polymerization initiator, and a (E) phosphoric flame retardant, in which a content of the (B) cross-linked polymer particles is 30 parts by weight to 100 parts by weight with respect to the 100 parts by weight of the (A) binder polymer, and an average particle diameter of the (B) cross-linked polymer particles is 1 ?m to 10 ?m. Therefore, the photosensitive resin composition (i) obtains an excellent tack-free property after being applied and dried, (ii) can be subjected to fine processing, (iii) is formed into a cured film having excellent flexibility, flame retardancy, and electrical insulation reliability, and (iv) causes a substrate to have a small warpage after being cured.
    Type: Grant
    Filed: April 24, 2012
    Date of Patent: March 31, 2015
    Assignee: Kaneka Corporation
    Inventor: Yoshihide Sekito
  • Patent number: 8883379
    Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a protective film-forming composition comprising a novolak resin of a bisphenol compound and a mixture of an alcohol solvent and an ether or aromatic solvent.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: November 11, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Daisuke Kori
  • Patent number: 8865391
    Abstract: A chemically amplified negative resist composition is provided comprising (A) a resin having a crosslinking group, (B) a crosslinker, (C) a photoacid generator capable of generating an acid upon exposure to light of wavelength 190-500 nm, (D) a solvent, and (E) an isocyanuric acid. The resist composition overcomes the stripping problem that the film is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: October 21, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuya Takemura, Takashi Miyazaki, Hiroyuki Urano
  • Publication number: 20140227637
    Abstract: A pattern forming method contains: (i) a step of forming a bottom anti-reflective coating on a substrate by using a first resin composition (I), (ii) a step of forming a resist film on the bottom anti-reflective coating by using a second resin composition (II), (iii) a step of exposing a multi-layered film having the bottom anti-reflective coating and the resist film, and (iv) a step of developing the bottom anti-reflective coating and the resist film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.
    Type: Application
    Filed: April 21, 2014
    Publication date: August 14, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Keita KATO, Michihiro SHIRAKAWA, Tadahiro ODANI, Atsushi NAKAMURA, Hidenori TAKAHASHI, Kaoru IWATO
  • Patent number: 8790861
    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: July 29, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Mingqi Li, Cheng-Bai Xu
  • Patent number: 8748060
    Abstract: A coating including an oligomer is disclosed, the oligomer being the reaction product of an epoxy silane, a multifunctional (meth)acrylate; and a polymerizable fluorochemical. The polymerizable fluorochemical can be fluorinated (meth)acrylate or a polymerizable fluorinated urethane. Phototools having a layer of the coating on a substrate can be made. A method of making a printed assembly such as a printed circuit board is also disclosed.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: June 10, 2014
    Assignee: 3M Innovative Properties Company
    Inventor: Zai-Ming Qiu
  • Patent number: 8530117
    Abstract: The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.
    Type: Grant
    Filed: December 8, 2011
    Date of Patent: September 10, 2013
    Assignee: Eastman Kodak Company
    Inventors: M. Zaki Ali, David E. Brown, Elsie A. Fohrenkamm, Michael B. Heller
  • Patent number: 8409790
    Abstract: The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.
    Type: Grant
    Filed: December 8, 2011
    Date of Patent: April 2, 2013
    Assignee: Eastman Kodak Company
    Inventors: M. Zaki Ali, David E. Brown, Elsie A. Fohrenkamm, Michael B. Heller
  • Publication number: 20120270143
    Abstract: A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1:
    Type: Application
    Filed: July 2, 2012
    Publication date: October 25, 2012
    Inventors: Hui-Chan YUN, Sang-Kyun KIM, Hyeon-Mo CHO, Mi-Young KIM, Sang-Ran KOH, Yong-Jin CHUNG, Jong-Seob KIM
  • Publication number: 20120264040
    Abstract: Present embodiments generally relate to a novel clear or colorless overcoat composition that may be used for overcoating, for example, ink based images and xerographic images. The overcoat composition, which may be used as a base for a clear solid ink, comprises one or more waxes. Also included in the present embodiments is methods for using and stabilizing the overcoat composition as a solid ink.
    Type: Application
    Filed: April 12, 2011
    Publication date: October 18, 2012
    Applicant: XEROX CORPORATION
    Inventors: Bo Wu, Jule W. Thomas, JR.
  • Publication number: 20120214094
    Abstract: According to one embodiment, there is provided a method of forming a pattern including forming a polymer layer on a substrate, the polymer layer including a first and second regions, selectively irradiating either of the first and second regions with energy rays or irradiating the first and second regions with energy rays under different conditions to cause a difference in surface free energy between the first and second regions, thereafter, forming a block copolymer layer on the polymer layer, and causing microphase separation in the block copolymer layer to simultaneously form first and second microphase-separated structures on the first and second regions, respectively.
    Type: Application
    Filed: February 22, 2012
    Publication date: August 23, 2012
    Inventors: Satoshi MIKOSHIBA, Koji Asakawa, Hiroko Nakamura, Shigeki Hattori, Atsushi Hieno, Tsukasa Azuma, Yuriko Seino, Masahiro Kanno
  • Patent number: 8198012
    Abstract: A mask-forming film has a transparent layer between the imageable layer and the carrier sheet, which transparent layer has a refractive index that is lower (by at least 0.04) than that of the carrier sheet or any immediately adjacent layer between it and the carrier sheet. This lower refractive index layer modifies the path of incident radiation during mask image transfer so as to provide steeper shoulder angles in the relief image solid areas. This mask film is used to form a relief image such as in a flexographic printing plate.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: June 12, 2012
    Assignee: Eastman Kodak Company
    Inventors: Gregory L. Zwadlo, David E. Brown, Elsie A. Fohrenkamm, A. Peter Stolt
  • Patent number: 8163463
    Abstract: A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: April 24, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-baek Kim, Byung-ha Park, Kyu-sik Kim, Young-ung Ha, Su-min Kim
  • Patent number: 8142988
    Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.
    Type: Grant
    Filed: March 20, 2006
    Date of Patent: March 27, 2012
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Edward K. Pavelchek
  • Patent number: 8142987
    Abstract: The present invention involves a method for making a relief image. A film that includes a carrier sheet and an imageable material is used to form a mask image that is opaque to a curing radiation. In one embodiment, the mask image is formed on the carrier sheet while in another embodiment, the mask image is formed on a receptor sheet. The mask image is then transferred to a photosensitive material, such as a flexographic printing plate precursor. The resulting assembly is exposed to the curing radiation resulting in exposed and unexposed areas of the photosensitive material. The carrier sheet or the receptor sheet may be removed from the mask image either before or after exposure to the curing radiation. Finally, the photosensitive material and mask image assembly is developed with a suitable developer to form a relief image.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: March 27, 2012
    Assignee: Eastman Kodak Company
    Inventors: M. Zaki Ali, David E. Brown, Elsie A. Fohrenkamm, Michael B. Heller
  • Patent number: 8137874
    Abstract: An antireflective coating that contains at least two polymer components and comprises chromophore moieties and transparent moieties is provided. The antireflective coating is useful for providing a single-layer composite graded antireflective coating formed beneath a photoresist layer.
    Type: Grant
    Filed: January 23, 2008
    Date of Patent: March 20, 2012
    Assignee: International Business Machines Corporation
    Inventors: Dario L. Goldfarb, Libor Vyklicky, Sean D. Burns, David R. Medeiros, Daniel P. Sanders, Robert D. Allen
  • Patent number: 8080350
    Abstract: Disclosed is a positive photosensitive resin composition containing (A) an alkali-soluble resin, (B) a diazoquinone compound, (d1) an activated silicon compound and (d2) an aluminum complex. Also disclosed is a positive photosensitive resin composition containing (A) an alkali-soluble resin, (B) a diazoquinone compound, (C) a compound having two or more oxetanyl groups in one molecule and (D) a catalyst for accelerating the ring-opening reaction of the oxetanyl groups of the compound (C).
    Type: Grant
    Filed: November 17, 2006
    Date of Patent: December 20, 2011
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Toshio Banba, Ayako Mizushima
  • Patent number: 8068663
    Abstract: The intensity distribution of an optical image in a resist film is calculated (S1); the intensity distribution of the optical image is transformed through a Fourier transform in a periodic direction of the intensity distribution of the optical image (S2) and is transformed through a spectral transform in an aperiodic direction of the intensity distribution of the optical image by use of a base which satisfies a boundary condition (S3); a modulation function for modulating the intensity distribution of the optical image is transformed through a Fourier transform in the periodic direction (S4) and is transformed through a spectral transform in the aperiodic direction by use of the base satisfying the boundary direction (S5); a product of the post-transformed intensity distribution of the optical image and the post-transformed modulation function is computed (S6), is transformed through an inverse Fourier transform in the periodic direction (S7), and is transformed through an inverse spectral transform in the ap
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: November 29, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masanori Takahashi, Satoshi Tanaka
  • Patent number: 8048608
    Abstract: An ink formulation comprises a marking component, e.g. ammonium octamolybdate, and a metal salt that absorbs laser irradiation at 780-2500 nm, e.g. reduced indium tin oxide, and thereby causes the marking component to change colour.
    Type: Grant
    Filed: June 6, 2007
    Date of Patent: November 1, 2011
    Assignee: Datalase Ltd.
    Inventors: Anthony Nicholas Jarvis, Martin Robert Walker
  • Patent number: 7985529
    Abstract: Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided.
    Type: Grant
    Filed: July 1, 2009
    Date of Patent: July 26, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mitsuhiro Hata, Hyun-woo Kim, Jung-hwan Hah, Sang-gyun Woo
  • Patent number: 7932012
    Abstract: A heat resistant photosensitive resin composition having excellent film properties is provided by constituting a photosensitive resin composition containing (A) a polymer having an acid functional group and/or a substituent derived therefrom, (B) a compound having at least one substituent derived from an amine functional group, (C) a photoreactive compound, and (D) a solvent. Using this composition, a pattern with high resolution can be produced, and thus an electronic part having a high quality can be produced.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: April 26, 2011
    Assignee: Hitachi Chemical Dupont Microsystems Ltd.
    Inventors: Hiroshi Komatsu, Nagatoshi Fujieda, Hajime Nakano
  • Patent number: 7923200
    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) where R1 is independently selected hydrogen, C1-C4 alkyl, C1-C6 alkyl alcohol, hydroxy (OH), amine (NH2), carboxylic acid, and amide (CONH2), ?represents the attachment to the polymer, m=1-6, and n=1-4. The present invention also relates to a process for manufacturing a microelectronic device comprising providing a substrate with a photoresist pattern, coating the photoresist pattern with the novel coating material reacting a portion of the coating material in contact with the photoresist pattern, and removing a portion of the coating material which is not reacted with a removal solution.
    Type: Grant
    Filed: April 9, 2007
    Date of Patent: April 12, 2011
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Muthiah Thiyagarajan, Ralph R. Dammel, Yi Cao, SungEun Hong, WenBing Kang, Clement Anyadiegwu
  • Patent number: 7855038
    Abstract: Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the layer exposed through the resist pattern and the organic-inorganic hybrid siloxane network film may then be removed. Related structures are also discussed.
    Type: Grant
    Filed: March 5, 2008
    Date of Patent: December 21, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-hwan Hah, Hyun-woo Kim, Mitsuhiro Hata, Sang-gyun Woo
  • Patent number: 7851125
    Abstract: Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: December 14, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Hwan Hah, Jin Hong, Hyun-Woo Kim, Hata Mitsuhiro, Kolake Mayya Subramanya, Sang-Gyun Woo
  • Patent number: 7827519
    Abstract: Disclosed is an improved method, system, and computer program product for preparing multiple levels of semiconductor substrates for three-dimensional IC integration. Some embodiments utilize the process and design models to check and fabricate the insulating dielectric layer (IDL) separating the first and the second film stacks on separate substrates and then prepare the surface of the IDL to receive an additional layer of semiconductor substrate for further fabrication of the chips. Yet some other embodiments further employ the design and process models to ensure the IDL and the semiconductor substrate are sufficiently flat, or are otherwise satisfactory, so the three-dimensional integrated circuits meet the reliability, manufacturability, yield, or performance requirements. Yet some other embodiments further employ design and process models to place the vias connecting the multiple film stacks.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: November 2, 2010
    Assignee: Cadence Design Systems, Inc.
    Inventors: Louis K. Scheffer, David White
  • Patent number: 7794902
    Abstract: The present invention discloses printing plates comprising a substrate and a radiation-absorptive layer, wherein the radiation-absorptive layer comprises at least one modified pigment product. The modified pigment product comprises a pigment having attached at least one organic group and at least one amphiphilic counterion. Methods of imaging printing plates are also disclosed.
    Type: Grant
    Filed: February 22, 2007
    Date of Patent: September 14, 2010
    Assignee: Cabot Corporation
    Inventors: Collin P. Galloway, James A. Belmont, Rosa Casado-Portilla
  • Patent number: 7745077
    Abstract: The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: June 29, 2010
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Muthiah Thiyagarajan, Yi Cao, Sung Eun Hong, Ralph R. Dammel
  • Patent number: 7704673
    Abstract: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.
    Type: Grant
    Filed: September 17, 2007
    Date of Patent: April 27, 2010
    Assignee: Micron Technology, Inc.
    Inventors: Zhiping Yin, Jingyi Bai
  • Patent number: 7700246
    Abstract: A conductive photolithographic film and method of forming a device using the conductive photolithographic film. The method includes depositing a conductive photolithographic film on a top surface of a substrate; and patterning the conductive photolithographic film to create a desired circuit pattern using a lithographic process. The conductive photolithographic film comprising about 50% to about 60% of a mixture of epoxy acrylate, a thermal curing agent, and a conductive polymer; about 20% to about 30% of a lithographic reactive component; about 10% to about 15% of a photo-active material; and about 3% to about 5% of additives that enhance conductivity of the conductive photolithographic polymer.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: April 20, 2010
    Assignee: Intel Corporation
    Inventors: Rebecca Shia, Jack Tsung-Yu Chen
  • Patent number: 7669172
    Abstract: A pattern creation method, including laying out data of a most extreme end pattern of integrated circuit patterns on a first layer and laying out data of the integrated circuit patterns excluding the most extreme end pattern on a second layer, extracting data of a first most proximate pattern being most proximate to the most extreme end pattern from the second layer and converting the extracted data to a third layer, generating data of a contacting pattern which contacts both the first most proximate pattern and the most extreme end pattern in a fourth layer, generating data of a non-overlapping pattern of the contacting pattern excluding overlapping portions with the most extreme end pattern and the first most proximate pattern in a fifth layer, extracting data of a second most proximate pattern being most proximate to the non-overlapping pattern and converting the extracted data to the first layer.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: February 23, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takeshi Ito, Satoshi Tanaka, Toshiya Kotani, Tadahito Fujisawa, Koji Hashimoto
  • Patent number: 7639864
    Abstract: Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: December 29, 2009
    Assignee: ASML Masktools B.V.
    Inventors: Robert J. Socha, Jang Fung Chen
  • Patent number: 7604911
    Abstract: A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formed on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.
    Type: Grant
    Filed: December 3, 2007
    Date of Patent: October 20, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo
  • Patent number: 7544448
    Abstract: A method for laser marking a substrate which method comprises exposing a composition comprising a tetrabenzodiazadiketoperylene pigment to laser radiation to produce a fluorescent marking readily apparent under UV light is disclosed. Many of the tetrabenzodiazadiketoperylenes herein are novel. This method can yield fluorescent markings which are not readily apparent under ambient light. A method for producing non-fluorescent laser marked substrates containing tetrabenzodiazadiketoperylene dyes is also disclosed.
    Type: Grant
    Filed: October 30, 2006
    Date of Patent: June 9, 2009
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Damien Thurber Cole, Joseph E. Sarver, Colin Dennis Campbell
  • Patent number: 7524610
    Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.
    Type: Grant
    Filed: June 26, 2007
    Date of Patent: April 28, 2009
    Assignee: Samsung Electronics Co., Ltd
    Inventors: Kyu-sik Kim, Jin-baek Kim, Young-ung Ha, Byung-ha Park, Ji-young Park, Su-min Kim
  • Patent number: 7524613
    Abstract: Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: April 28, 2009
    Assignee: Kodak Graphic Communications, GmbH
    Inventors: Harald Baumann, Bernd Strehmel, Ulrich Fiebag, Friederike Von Gyldenfeldt, Tanja Ebhardt, Ulrike Dallmann, Dietmar Frank
  • Patent number: 7476476
    Abstract: This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.
    Type: Grant
    Filed: May 27, 2004
    Date of Patent: January 13, 2009
    Assignee: Toray Industries, Inc.
    Inventor: Mitsuhito Suwa
  • Publication number: 20080248411
    Abstract: Provided are an indicating material having excellent facility and high security and an indicating method for recording and indicating information on this indicating material. The indicating material has a structure that an ultraviolet light-screening layer having visible light-transmitting ability is laminated on a recording layer having visible light-transmitting ability and composed of a recording layer-forming material containing a color-developing component that becomes a color-developed state by the action of ultraviolet light. The indicating method is an indicating method for recording and indicating information on the above-described indicating material, comprising condensing a laser beam having a wavelength of a visible range or longer on the recording layer in the indicating material to irradiate the recording layer with the laser beam and recording and indicating the information by two-photon absorption.
    Type: Application
    Filed: March 30, 2005
    Publication date: October 9, 2008
    Applicants: Masahiro IRIE, JSR Corporation
    Inventors: Masahiro Irie, Makoto Mihara
  • Patent number: 7402365
    Abstract: The present invention relates to a protective heat transferable overcoat element comprising a support having thereon a protective polymer layer of at least one benzoated phenoxy resin of Formula I. The present invention also relates to a thermal transfer dye donor element comprising a support having on one side thereof at least one dye layer and a protective polymer layer of at least one benzoated phenoxy resin of Formula I and a thermal transfer assemblage comprising at least one thermal transfer donor element comprising a support having on one side thereof a protective polymer layer of at least one benzoated phenoxy resin of Formula I. Finally, the present invention relates to a protected image reproduction comprising a support, an imaging layer containing an image, and a transferred protective heat transferable overcoat comprising a protective polymer layer of at least one benzoated phenoxy resin of Formula I.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: July 22, 2008
    Assignee: Eastman Kodak Comapny
    Inventors: David B. Bailey, Peter D. Rollinson, Carol M. McDonald, Jacob J. Hastreiter
  • Patent number: 7378222
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: January 9, 2006
    Date of Patent: May 27, 2008
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Patent number: 7335451
    Abstract: A pattern forming body is provided or a color filter, wherein the color filter can be manufactured efficiently by a simple process without any cracks and no influence to an alignment of a liquid crystal. A pattern forming body is provided comprising: a base material; a photocatalyst containing layer, comprising at least a photocatalyst, formed on the base material; a protecting part formed on the photocatalyst containing layer; a property variable layer, whose surface property is varied by a function of a photocatalyst due to an energy irradiation, formed so as to cover the photocatalyst containing layer and the protecting part; and a property-varied pattern which is a property varied property variable layer.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: February 26, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Kaori Yamashita
  • Patent number: 7316874
    Abstract: Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate and a transfer layer of semiconductive material in conjunction with a dielectric. The donor is exposed with the positive image of the desired pattern to be formed on the receiver, such that the exposed portions of the layer of semiconductive and dielectric material are simultaneously transferred, forming the desired pattern of semiconductive and dielectric material on the receiver. The semiconducting material can be patterned to form a thin film transistor. The method can also be used to pattern a light-emitting polymer or small molecule in conjunction with the charge injection layer to form the light-emitting display for light-sensitive organic electronic devices. Donor elements for use in the process are also disclosed.
    Type: Grant
    Filed: March 23, 2004
    Date of Patent: January 8, 2008
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Graciela Beatriz Blanchet-Fincher
  • Patent number: 7314691
    Abstract: A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.
    Type: Grant
    Filed: October 23, 2004
    Date of Patent: January 1, 2008
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mitsuhiro Hata, Jung-Hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo
  • Patent number: 7285372
    Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: October 23, 2007
    Assignee: Kodak Graphic Communications GmbH
    Inventors: Harald Baumann, Michael Flugel, Udo Dwars, Eduard Kottmair
  • Patent number: 7276278
    Abstract: The laminate film for covering of an image carried by a support has a construction comprising a transparent base material and a transparent adhesive layer formed on one side of the base material, wherein the adhesive layer is composed of a pressure-sensitive adhesive and has a surface with a fine uneven structure.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: October 2, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Koji Kamiyama, Haruyuki Mikami, Shigeaki Dohgoshi, Joseph C. Carls