Abstract: A pattern creation method, including laying out data of a most extreme end pattern of integrated circuit patterns on a first layer and laying out data of the integrated circuit patterns excluding the most extreme end pattern on a second layer, extracting data of a first most proximate pattern being most proximate to the most extreme end pattern from the second layer and converting the extracted data to a third layer, generating data of a contacting pattern which contacts both the first most proximate pattern and the most extreme end pattern in a fourth layer, generating data of a non-overlapping pattern of the contacting pattern excluding overlapping portions with the most extreme end pattern and the first most proximate pattern in a fifth layer, extracting data of a second most proximate pattern being most proximate to the non-overlapping pattern and converting the extracted data to the first layer.

Abstract: Optimization of illumination for a full-chip layer is disclosed. A pitch frequency of the full-chip layer is determined so as to generate a pitch frequency histogram of the full-chip layer. The pitch frequency indicates how often a given pitch occurs in the full-chip layer. The pitch frequency histogram is equated to be the first eigenfunction from the sum of coherent system representation of a transformation cross coefficient. An integral equation for the first eigenfunction of the transformation cross coefficient is solved so as to define the optimal illumination for imaging the full-chip layer.

Abstract: A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formed on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.

Abstract: A method for laser marking a substrate which method comprises exposing a composition comprising a tetrabenzodiazadiketoperylene pigment to laser radiation to produce a fluorescent marking readily apparent under UV light is disclosed. Many of the tetrabenzodiazadiketoperylenes herein are novel. This method can yield fluorescent markings which are not readily apparent under ambient light. A method for producing non-fluorescent laser marked substrates containing tetrabenzodiazadiketoperylene dyes is also disclosed.

Abstract: Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).

Abstract: An oxetane-containing compound, a photoresist composition including the same, a method of preparing patterns using the photoresist composition, and an inkjet print head including polymerization products of the oxetane-containing compound.

Abstract: This invention relates to a negative-working photosensitive resin composition that can be developed in an alkaline developer. This photosensitive resin composition comprises: (a) a polyimide having at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group, and a thiol group at the terminus of the polymer main chain; (b) a compound having a polymerizable functional group comprising unsaturated double and/or triple bonds; and (c) a photopolymerization initiator.

Abstract: Provided are an indicating material having excellent facility and high security and an indicating method for recording and indicating information on this indicating material. The indicating material has a structure that an ultraviolet light-screening layer having visible light-transmitting ability is laminated on a recording layer having visible light-transmitting ability and composed of a recording layer-forming material containing a color-developing component that becomes a color-developed state by the action of ultraviolet light. The indicating method is an indicating method for recording and indicating information on the above-described indicating material, comprising condensing a laser beam having a wavelength of a visible range or longer on the recording layer in the indicating material to irradiate the recording layer with the laser beam and recording and indicating the information by two-photon absorption.

Abstract: The present invention relates to a protective heat transferable overcoat element comprising a support having thereon a protective polymer layer of at least one benzoated phenoxy resin of Formula I. The present invention also relates to a thermal transfer dye donor element comprising a support having on one side thereof at least one dye layer and a protective polymer layer of at least one benzoated phenoxy resin of Formula I and a thermal transfer assemblage comprising at least one thermal transfer donor element comprising a support having on one side thereof a protective polymer layer of at least one benzoated phenoxy resin of Formula I. Finally, the present invention relates to a protected image reproduction comprising a support, an imaging layer containing an image, and a transferred protective heat transferable overcoat comprising a protective polymer layer of at least one benzoated phenoxy resin of Formula I.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: A pattern forming body is provided or a color filter, wherein the color filter can be manufactured efficiently by a simple process without any cracks and no influence to an alignment of a liquid crystal. A pattern forming body is provided comprising: a base material; a photocatalyst containing layer, comprising at least a photocatalyst, formed on the base material; a protecting part formed on the photocatalyst containing layer; a property variable layer, whose surface property is varied by a function of a photocatalyst due to an energy irradiation, formed so as to cover the photocatalyst containing layer and the protecting part; and a property-varied pattern which is a property varied property variable layer.

Abstract: Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate and a transfer layer of semiconductive material in conjunction with a dielectric. The donor is exposed with the positive image of the desired pattern to be formed on the receiver, such that the exposed portions of the layer of semiconductive and dielectric material are simultaneously transferred, forming the desired pattern of semiconductive and dielectric material on the receiver. The semiconducting material can be patterned to form a thin film transistor. The method can also be used to pattern a light-emitting polymer or small molecule in conjunction with the charge injection layer to form the light-emitting display for light-sensitive organic electronic devices. Donor elements for use in the process are also disclosed.

Abstract: A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond between a proton donor polymer and a proton acceptor polymer.

Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.

Abstract: The laminate film for covering of an image carried by a support has a construction comprising a transparent base material and a transparent adhesive layer formed on one side of the base material, wherein the adhesive layer is composed of a pressure-sensitive adhesive and has a surface with a fine uneven structure.

Abstract: Disclosed herein is a multilayered sheet comprising a core layer comprising a thermoplastic polymer and an IR absorbing additive; a first cap layer comprising a thermoplastic polymer and an electromagnetic radiation absorbing additive; wherein a surface of the first cap layer is disposed upon and in intimate contact with a surface of the core layer. Disclosed herein too is a method for manufacturing a multilayered sheet comprising melt blending a composition comprising a thermoplastic polymer and an IR absorbing additive to produce a core layer; melt blending a composition comprising a thermoplastic polymer and an ultraviolet radiation absorber to produce a first cap layer; combining the core layer with the first cap layer in such a manner that the cap layer is disposed upon and in intimate contact with a surface of the core layer.

Abstract: A photocurable and thermosetting resin composition comprising (A) a photosensitive prepolymer having a carboxyl group in combination with at least two ethylenically unsaturated double bonds in its molecule, (B) a polymerization initiator, (C) a diluent, (D) an oxetane compound having at least two oxetanyl groups in its molecule, and (E) a curing promotor is developable with an alkaline solution and can be formulated as a one package preparation. Such a photocurable and thermosetting resin composition and a photosensitive dry film prepared by the use thereof are useful as various resist materials and electrical insulating materials, particularly as solder resists for printed circuit boards, interlaminar insulating materials for build-up multi-layer printed circuit boards, and the like.

Abstract: A method of preparing negative-working, single-layer imageable elements improves their storage stability in a humid environment. The method includes enclosing the coated imageable elements in a water-impermeable sheet material that substantially inhibits the transfer of moisture to and from the imageable element. Such imageable elements include a radiation-sensitive composition that includes a radically polymerizable component, an initiator composition to provide radicals upon exposure to imaging radiation, a radiation absorbing compound, and a polymeric binder having poly(alkylene glycol) side chains.

Abstract: A photo acid generator (PAG) or an acid is used to reduce resist scumming and footing. Diffusion of acid from photoresist into neighbors causes a decreased acid level, and thus causes resist scumming. An increased acid layer beneath the resist prevents acid diffusion. In one embodiment, the increased acid layer is a layer of spun-on acid or PAG dissolved in aqueous solution. In another embodiment, the increased acid layer is a hard mask material with a PAG or an acid mixed into the material. The high acid content inhibits the diffusion of acid from the photoresist into neighboring layers, and thus substantially reduces photoresist scumming and footing.

Abstract: A laminated resist pattern with a T-shaped cross section is formed on a film to be patterned. The laminated resist pattern is composed of a bottom resist pattern and a top resist pattern. The surface area of the top resist pattern is larger than the surface area of the bottom resist pattern, and increased after the film is patterned via the laminated resist pattern.

Abstract: This patent relates to an imaging member comprising a vacuous polymer base having adhered thereto an image formed on a transparent polymer sheet, wherein said vacuous polymer base has a density of less than 0.7 grams/cc and a modulus to density ratio of between 1500 and 4000 and wherein said image is in contact with said vacuous polymer base.

Abstract: The invention relates to a preparation method of an identification card with utilizing a protective layer transfer foil having a peeling layer and a releasing layer laminated on the peeling layer, the preparation method comprising: adhering the transferring layer onto a card substrate; and peeling off the peeling layer to prepare the identification card. The peeling layer including a support and a releasing layer, the transferring layer including a photo-cured resin layer. A maximum electrostatic amount of the peeling layer at the peeling step is 0 to 30 kV.

Abstract: An image transfer sheet is provided which comprises a support, a barrier layer, a dye sublimation ink layer and a polyester layer; wherein the image transfer sheet exhibits cold peel, warm peel and hot peel properties when transferred. A method for transferring an image to a receptor element using the image transfer sheet is also provided. More specifically, the invention relates to an image transfer sheet which can be applied to a receptor element, such as cotton or cotton/polyester blend fabrics or the like.

Abstract: A structure and method for reducing standing waves in a photoresist during manufacturing of a semiconductor is presented. Embodiments of the present invention include a method for reducing standing wave formation in a photoresist during manufacturing a semiconductor device comprising depositing a first anti-reflective coating having an extinction coefficient above a material, and depositing a second anti-reflective coating having an extinction coefficient above the first anti-reflective coating, such that the first anti-reflective coating and the second anti-reflective coating reduce the formation of standing waves in a photoresist during a lithography process.

Abstract: A photomask and method for manufacturing the same are disclosed. A first material is deposited on at least a portion of a substrate to form a first material layer. Before completion of the deposition of the first material, a thermal treatment is applied to the substrate at a temperature greater than approximately 300 degrees Celsius.

Abstract: Disclosed is a protective transparent overcoat comprising a protective polymer and a surfactant compound having multiple non-end-group hydrogen bonding groups directly or indirectly bonded to the backbone chain of the surfactant compound. The coating enables simplified manufacturing of a thermal sublimation dye transfer donor of high quality.

Abstract: A process for preparing a substantially transparent conductive layer configuration on a support, the layer configuration comprising in any order at least a first layer containing an intrinsically conductive polymer optionally containing structural units represented by formula (I): wherein n is larger than 1 and each of R1 and R2 independently represents hydrogen or an optionally substituted C1-4 alkyl group or together represent an optionally substituted C1-4 alkylene group or an optionally substituted cycloalkylene group, preferably an ethylene group, an optionally alkyl-substituted methylene group, an optionally C1-12 alkyl- or phenyl-substituted ethylene group, a 1,3-propylene group or a 1,2-cyclohexylene group; and a second layer consisting of a non-continuous layer of conductive silver, the process comprising the step of: preparing the second layer by a photographic process; and light emitting diodes, photovoltaic devices, transistors and electroluminescent devices comprising a layer configuration pr

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: Laser imageable flexographic printing elements, including printing plates and printing sleeves and methods of making the laser imageable flexographic printing elements using a collapsible cross-linkable material comprising a curable elastomer, a material that absorbs laser radiation at a selected wavelength, and microspheres are disclosed. A laser is used to collapse and melt the collapsible cross-linkable material to form a relief image on the printing element. The printing element is thereafter cured by face exposure to crosslink and cure the formed relief image. The invention addresses a market need for eliminating chemical processing of printing elements, thus going from printing element to press much more quickly and using an environmentally friendly process.

Abstract: A method of producing a substrate having a color image applied thereto wherein said image was produced by a xerographic process wherein the substrate is first provided with an electrostatically applied powder coating which can be clear epoxy-polyester, acrylic, urethane or the like, curing the polyester coating to an eighty to ninety-five percent cure at a temperature of about 350°. to 400° F. applying said xerographically produced color image which has been applied to a backing sheet to said first coating and pressing said image against said first coating at about 40 psi with a press temperature of about 400° F. for about 3.5.-4 minutes, allowing the composite so produced to cool, applying electrostatically thereto a further polymer which is the same as the first polymer to encase the image therein. The composite is then heated for a sufficient time to achieve a complete cure.

Abstract: Disclosed is a protective transparent overcoat comprising a protective polymer and a surfactant compound having multiple non-end-group hydrogen bonding groups directly or indirectly bonded to the backbone chain of the surfactant compound. The coating enables simplified manufacturing of a thermal sublimation dye transfer donor of high quality.

Abstract: A lithographic printing plate precursor is disclosed, which comprises an image-forming layer which contains a hydrophilic resin, an acid precursor and at least one component selected from fine particles containing a compound having a vinyloxy group and microcapsules containing a compound having a vinyloxy group, on a hydrophilic support, which can be development processed on a printing machine.

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.

Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.

Abstract: A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.

Abstract: This patent relates to an imaging member comprising a vacuous polymer base having adhered thereto an image formed on a transparent polymer sheet, wherein said vacuous polymer base has a density of less than 0.7 grams/cc and a modulus to density ratio of between 1500 and 4000 and wherein said image is in contact with said vacuous polymer base.

Abstract: Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.

Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.

Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.

Abstract: A thermally imageable layer comprising an aqueous dispersion containing an immiscible compound, typically a near infrared absorber, and a dispersant, typically an acrylic polymer, which layer is useful in laser induced colorant transfer processes.

Abstract: An initial layout of an integrated circuit device is separated into a set of definitions for use in a multiple exposure fabrication process. The separation begins with reading a portion of the initial layout and identifying one or more target features within the initial layout. Further, a first revised layout definition is created for a first mask and a second revised layout definition is created for a second mask. The first revised layout definition includes the target features inside the dark-field content. In addition, in one embodiment, the first revised layout definition includes clear areas around each target feature. The second layout definition includes one or more dark features inside the bright-field content. These dark features, when used in the multiple exposure fabrication process, will overlap the target features. The first and second masks may be binary masks, attenuated phase-shifting masks (PSMs) or a combination of a binary mask and an attenuated PSM.

Abstract: The invention relates to a material to form an indicator element comprising a base material and at least one photosensitive silver halide layer, wherein the base material comprises at least one specular reflective layer between two polymer layers wherein the polymer layer between the at least one specular reflective layer and the silver halide layer is substantially transparent.

Abstract: A printed product including an image with visual effects and a method for obtaining the printed product, the method comprising providing a photographic image, printing the image on a front transparent sheet and adhering the transparent sheet to a light-reflecting front surface of a back support sheet for providing a visual effect resulting from the combination of the light-reflecting surface and the image.

Abstract: The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.

Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.

Abstract: This invention relates to a photo- or heat-curable resin composition which yields a cured product with minimal cracking and high reliability. The resin composition of this invention comprises 100 parts by weight of (A) photo- or heat-polymerizable unsaturated compound composed of a polycarboxylic acid adduct of bisphenol-epoxy (meth)acrylate, 10-100 parts by weight of (B) alkylene oxide-modified product of (meth)acrylate or oligomers thereof, 0-50 parts by weight of (C) compound containing epoxy group and 0-50 parts by weight of (D) photopolymerization initiator or sensitizer. The composition exhibits high heat resistance and good microfabrication quality and is useful as a peripheral material of electronic parts such as semiconductor devices by the build-up process, for example, as a material for forming insulation layers in multilayer printed wiring boards.

Abstract: A barrier rib for an EL display element. The rib is formed from the radiation sensitive resin composition containing (A) an alkali soluble resin, (B) a polymerizable compound having an ethylenically unsaturated bond, and (C) a radiation sensitive polymerization initiator.

Abstract: Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.

Abstract: A three-dimensional image making apparatus according to the present invention comprises: an image input device configured to obtain image information of the object; an object distance processing device configured to obtain object distance information of the object; a printer configured to print an object image of the object and to form a relief configuration of the object; and an information-processing device configured to control the printer to print the object image based upon the image information and to form the relief configuration, superimposed on the object image, based upon the object distance information.

Abstract: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the &ggr;-value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.