Abstract: The invention relates to a method comprising the steps of: Abrasion, preferably but non-limited by means of sandblasting which produces mechanical roughing on the surface of the glass substrate, optionally applying a primer on the roughed surface, and applying an ink on this primer by means of screen printing which may be digital inkjet screen printing, drying the injected ink deposited by means of digital screen printing, and performing a tempering process. A glass substrate with an embossed surface finish is achieved which simulates the aesthetic and surface texture of different construction materials, such as stone, wood, granite, marble or porcelain, among others.

Abstract: A multi-layered article including a substrate; a release layer including polyvinyl alcohol and at least one cross-linking agent; and a first selective light modulator layer; wherein the release layer crosslinks and is water insoluble is disclosed. Also, disclosed is a multi-layered article including a substrate; a waterborne release layer; and a first selective light modulator layer including a cross-linking agent. Methods of making the multi-layered articles are also disclosed.

Abstract: The present disclosure relates to a multi-laminate plastic carrier plate having a plurality N of A-B-A layer sequences, wherein the A layer includes a first thermoplastic resin and the B layer includes a second thermoplastic resin, and wherein the first thermoplastic resin is a virgin plastic and the second plastic is a recycled plastic, and wherein 250?N?2, preferably 200?N?3, preferably 125?N?4, still more preferably 100?N?5.

Abstract: Provided are a method of transferring a tin sulfide film and a photoelectric device using the tin sulfide film. The method includes: forming a first tin sulfide film on a first substrate; placing a second substrate on the first tin sulfide film; and forming a second tin sulfide film bonded to a surface of the second substrate by transferring a portion of the first tin sulfide film to the second substrate through a rapid thermal process (RTP).

Abstract: A protective film material for protecting a surface of a wafer during a laser processing treatment contains a water soluble poly-N-vinyl acetamide. The protective film material is applied to the surface of the wafer which is then irradiated with a laser beam through the protective film material to perform a laser processing treatment. After the laser processing treatment, the protective film material is removed by washing with water.

Abstract: A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.

Abstract: A copper clad metal printing plate can be coated with an azide-containing photoresist comprising a polyformal resin together with a modified polyformal resin that has up to 100% of its hydroxyl groups converted to carboxyl groups, an organo azide and a photosensitive dye that absorbs light at the frequency of a patterning laser and converts it to heat energy. This de-crosslinks the resin that has been exposed to the laser light. Preferably the photoresist is flood exposed with ultraviolet light prior to laser exposure. The photoresist becomes soluble in the laser-exposed areas, exposing the underlying copper after development. The printing plates are completed by etching away the copper in the exposed areas, removing the remaining photoresist, thereby providing a patterned copper layer on the printing plate.

Abstract: The present invention relates to a water-soluble photosensitive compound represented by the general formula (1): or by the general formula (2): in the formula, X represents a direct bond, an alkylene group containing 1 to 5 carbon atoms, —CH2O—, —OCH2—, —CH2OCH2—, —O—, —S— or —SO2—, and Z represents —SO3?.Q+, —COO?.Q+ or —SO2NR2, in which Q+ represents Li+, Na+, K+ or N+R4 and R represents a hydrogen atom and/or an alkyl group containing 1 to 5 carbon atoms, said alkyl group optionally having one hydroxy, ether, carbonyl, carbonyloxy or oxycarbonyl group, wherein a photosensitive group has an absorption maximum wavelength of not longer than 305 nm in the ultraviolet absorption spectrum thereof.

Abstract: The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less problems and more economically than the previous conventional layers, and which permit the use of existing technologies for microstructuring. The object is realized in that the thin layer is formed of an enzymatically degradable biopolymer in a range of layer thicknesses of from 30 nm to 3 &mgr;m. Biopolymeric thin layers manufactured according to the invention permit their application, after a respective structurizing, as test assays or in setting up substance libraries.

Abstract: A method of making improved aluminum printing plates comprising graining the aluminum plates, de-smutting them by treating them with nitric acid solution, then rinsing with hot water, acetating the aluminum plates, and silicating the aluminum plates. The plates are then coated with a photoresist, pattern exposed and developed. The printing plates of the invention have improved characteristics; they have excellent adhesion of the resist in image areas, and ink repellency in non-image areas. The developed printing plates have excellent durability without baking.

Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: wherein X is an organic moity and Y is selected from the following group: wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.

Abstract: A developer composition for developing a lithographic printing plate having a negative recording layer on which an image is recorded via an infrared laser, the composition containing a nonionic surfactant, and a process for forming an image on a lithographic printing plate. The process comprises the steps of imagewise exposing a lithographic printing plate having a negative recording layer on which an image is recorded via an infrared ray and which contains an infrared ray absorbent, a radical generator and a radically polymerizable compound, and then developing the lithographic printing plate with the developer composition containing a nonionic surfactant.

Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.

Abstract: A photosensitive laminate structure including a carrier layer and a photosensitive layer is described.

Abstract: A base material for a lithographic printing plate comprising a support, a hydrophilic organic polymer compound that is chemically bonded to a surface of the support, and an ionic compound that is ionically bonded to the hydrophilic organic polymer compound; and a lithographic printing plate comprising the base material and an image forming layer provided thereon.

Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.

Abstract: A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.

Abstract: The present invention concerns a water-developable plate package comprising water-developable plates packaged in a laminated state. The water-developable plate is a sheet-like plate comprising a photosensitive layer made of a photosensitive resin composition having water-developability and protective films covering both surfaces of this photosensitive layer. The package of the present invention is obtained by sandwiching an open cell foamed sheet (2) between a water-developable plate (1) and between a water-developable plate (1) to make a laminate (3), packaging the laminate (3) with a light-screening film and fixing the packaging ends with a tape. The subject of the present invention is to prevent the occurrence of deformation of the plates in the package during transportation or storage at a high temperature and high humidity in summer, without complicating the operations at the time of use or packaging of the plates and without increasing the cost remarkably.

Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.

Abstract: Photosensitive compositions prepared without use of a chromium compound. The compositions exhibit high resolution and satisfactory sensitivity, and do not cause environmental pollution. The photosensitive compositions contain a water-soluble azide compound which serves as a photocrosslinking agent and poly(N-vinylacetamide) that is photocrosslinkable in the presence of the water-soluble azide compound.

Abstract: A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.

Abstract: A method for fabricating a chip carrier, e.g., a printed circuit board, which includes at least one photo-via is disclosed. This method inlcudes the steps of forming a first dielectric layer on a substrate. A second dielectric layer, having a greater photosensitivity than the first dielectric layer, is formed on the first dielectric layer. Preferably, this second dielectric layer has a relatively low optical absorptivity at the wavelengths to be used during exposure. Then, at least the second dielectric layer is selectively exposed to actinic radiation. The second and first dielectric layers are then developed, to form one or more desired photo-vias.

Abstract: This invention provides an imageable element comprising a substrate having on at least one major surface thereof a layer of energy-sensitive material that is capable of being developed to form a relief image upon exposure to electromagnetic radiation having a wavelength in the ultraviolet-visible-infrared range (i.e., a wavelength ranging from 150 to 1500 nm). This invention also provides methods for imaging the imageable elements of this invention. The energy-sensitive materials suitable for this invention comprise polymers containing azido groups.

Abstract: The photosensitive compound of the present invention contains the following unit: ##STR1## and is particularly expressed by the following formula: ##STR2## Different photosensitive resin compositions can be prepared from this novel photosensitive resin compound, and the resulting photosensitive resin compositions do not raise the problem of environmental pollution, exhibit high resolution, possess a high level of sensitivity, and exhibit excellent adhesion with substrates, coating characteristics and storage stability.

Abstract: A ceramics green sheet which is suitably used for producing sintered ceramics substrates and the like is disclosed. The ceramics green sheet according to the present invention includes a ceramics powder, a photoinitiator, a UV absorber such as photoinitiation inhibitor organic dyes and inorganic powders, and a photosensitive resin composition. The ceramics green sheet according to the present invention has an advantage that via holes and through holes may be very easily formed with high precision, and fine holes may be formed reliably and inexpensively.

Abstract: A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products.

Abstract: A photosensitive resin composition includes a polymer compound having a component of Formula (I) and a sensitizer having a cationic group in the molecule: ##STR1## (wherein X denotes a cationic species, and n is 0, 1 or 2.) The photosensitive resin composition is high in sensitivity, good in storage stability, and easy to produce, and is suitable for use in a screen printing plate, formation of black matrix or phosphor pattern of a color cathode-ray tube, a CCD or LCD color filter, a printing color proof, and various etching resists.

Abstract: A method for electrophotographically forming a Braun tube's fluorescent layer coats conductive and photoconductive layers on the internal surface of a Braun tube's panel. The photoconductive layer is formed of a water soluble photoconductive liquid including a water soluble binder, allowing a part of the photoconductive layer to be selectively exposed to a visible ray. The photoresist of the above photoconductive liquid is substituted with dye, which can be processed through general exposure and solvent, allowing the fluorescent layer to be formed on a Braun tube under the same conditions as a typical Braun tube production process without darkroom processing.

Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

Abstract: The improved water-soluble photosensitive resin composition comprises a high-polymer compound represented by the general formula(I): ##STR1## (where X is Na, K or NH.sub.4) and a water-soluble polymer which is either polyvinylpyrrolidone or a copolymer of vinylpyrrolidone and vinylimidazole or both. The composition is applied to a substrate, exposed through a mask pattern and developed to form a photocured pattern and, thereafter, a light absorber is applied to the entire surface of the substrate and dried, followed by stripping away the photocured pattern and the overlying light absorber to form a black matrix pattern. The composition is suitable for use as a photoresist in the manufacture of black matrices as on color CRTs and capable of efficient formation of photocured patterns with high sensitivity by shorter times and lower intensities of exposure. In addition, the composition adheres strongly to glass substrates and is capable of pattern formation as thin film that is faithful to the mask pattern used.

Abstract: An infrared imaging composition comprises three essential components: a photocrosslinkable polymeric binder having pendant photopolymerizable olefinic double bonds, a polyazide photoinitiator and an infrared absorbing compound. These compositions are useful in photosensitive elements such as lithographic printing plates that can be used to provide images using lasers, followed by development.

Abstract: Microlithographic methods for the use of improved underlayers for chemically amplified deep UV photoresist compositions and structures produced thereby are disclosed. The compositions comprise, in admixture, a polymeric binder, and an azide which is thermolyzed during microlithographic processing to form an amine. Films formed from the underlayer compositions of the present invention, when applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction.

Abstract: A radiation sensitive device comprising a substrate carrying a radiation sensitive layer is coated with a discontinuous covering layer which is more light sensitive than the radiation sensitive layer. The covering layer is formed by spraying and assists in improving vacuum drawdown during image-wise exposure of the device without having a deleterious affect on the exposure and development characteristics of the device.

Abstract: A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photo-sensitive film which comprises a supporting sheet, a image mask-protection layer peelablly adhered to the supporting sheet and a layer of a water-soluble resin composition having photocrosslinkability to thus cause crosslinking of the exposed area of the resin layer to thereby form a predetermined pattern on the resin layer; (b) a process for dissolving out the non-crosslinked portion of the layer of the water-soluble photo-sensitive resin composition by developing the layer with water to thus from an image-carrying mask which is constituted from the crosslinked area of the photo-sensitive resin composition remaining on the image mask-protection layer; (c) a process for adhering the photo-sensitive laminate film on which the images are formed to the surface of a material to be processed; (d) a process for peeling off the supporting sheet from th

Abstract: The present invention relates to a method of forming positive polyimide patterns which includes a process wherein a film of a composition of actinic radiation-sensitive polyimide precursor is formed on a substrate which is selectively exposed to an actinic radiation, then such a treatment is applied to the film that the film in unexposed portion attains higher degree of curing than the film in exposed portion after the exposure, and the film is removed from the exposed portion. According to the invention, such an unexpected effect can be achieved as a positive polyimide pattern can be formed by using a composition of actinic radiation-sensitive polyimide precursor which has only been used in forming negative patterns. According to the invention, the positive polyimide pattern can be formed easily and the pattern obtained has excellent performance.

Abstract: A device for controlling cell arrangement having a pattern composed of a cell adhesive surface and a cell non-adhesive surface, which has a good selectivity of cell adhesion and which can provide a fine pattern of cells in high resolution by culturing cells in a usual manner.

Abstract: A process for forming a colored image comprising, in order:(A) imagewise exposing to actinic radiation a photosensitive element comprising a carrier support, a carrier surface, a first adhesive layer and a first photosensitive layer,(B) developing the exposed first photosensitive layer,(C) laminating to the element a transfer element comprising a transfer support, and a transfer surface layer which is adjacent to a colored pattern in the element of step (A) with the proviso that the transfer element does not have an adhesive layer which transfers to the colored pattern,(D) removing said carrier support and said carrier surface, revealing said first adhesive layer,(E) laminating the element the element from step (D) to a permanent support wherein the first adhesive layer is adjacent to the permanent support; and(F) removing said transfer support and said transfer surface layer.

Abstract: A photosensitive material comprising a photosensitive-group-containing fullerene such as a photosensitive material which is obtained by adding a photosensitive group to fullerene and/or a photosensitive material which is obtained by combining the fullerene with a photosensitive agent is provided. The photosensitive material according to the present invention has excellent properties as a new resist which is a photosensitive material suitable as a photolithographic resist for the production of semiconductors utilizing such light source as ultraviolet light, deep ultraviolet light, X-ray or electron beam and which meets the requirements for realization of a higher level of resolution and sensitivity.

Abstract: A method of forming a multicolored image wherein image layers etc. formed on photosensitive transfer sheets are transferred in turn onto an image-receiving sheet and then, its image layer etc. are retransferred onto a permanent supporter. Both of a transferring image layer alone and a transferring image layer and adhesive layer are used properly for photosensitive transfer sheets. The finish quality comes close to original print and the runnability becomes better when making a color proof.

Abstract: A photolithographically viahole-forming photosensitive element is formed of a light-transmitting base material and a photosensitive resin composition laminated as a layer on the light-transmitting base material. The photosensitive resin composition comprises:(a) 100 parts by weight of a mixture comprising:(a-1) 10 to 90 parts by weight of a rubber,(a-2) 5 to 40 parts by weight of a phenol resin, and(a-3) 10 to 80 parts by weight of an epoxy resin;(b) 1 to 10 parts by weight of an epoxy resin photoinitiator; and(c) 1 to 10 parts by weight of an aromatic polyazide compound.

Abstract: An aqueous alkaline developing solution comprises an alkali compound, water and an alkylnaphthalene sulfonate having the following formula: ##STR1## in which R represents an alkyl group of 3 to 5 carbon atoms and q is 0 or an integer of 1 to 3, in the amount of 1 to 20 weight %. The aqueous alkaline developing solution further contains an anionic surface active agent of the specific sulfonate compound having a naphthalene ring and a polypolyoxyethylene moiety, in the amount of 0.1 to 10 weight % and an nonionic surface active agent having a polyoxyethylene moiety and an aromatic ring in its structure in the amount of 0.03 to 3 weight %, or contains an anionic surface active agent of the specific sulfonate compound having the specific aralkyl-substituted benzene ring and a polypolyoxyethylene moiety.

Abstract: This invention relates to a photosensitive sheet having on a substrate one or more resin layers that are peelable from the substrate and heat-fusible, and a colored photosensitive layer in this order, said substrate comprising a biaxially stretched plastic film and having a molecular orientation ratio in the range of from 1.0 to 1.4.The object of this invention is to solve the problem of misregister without decreasing productivity during the formation of plastic film (substrate) or during the production of a photosensitive sheet in a method in which said photosensitive sheet having an image formed thereon and an image receiving sheet for receiving the image are superimposed on each other, and pressed and heated for image transfer.

Abstract: Photochromic compositions comprise a bacteriorhodopsin suspension, at least one organic nitrogen-containing compound and a binder. The composition may further include a detergent. Photochromic materials comprise a support and a photochromic film formed on the support from a photochromic composition as described.

Abstract: A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photo-sensitive film which comprises a supporting sheet, a image mask-protection layer peelablly adhered to the supporting sheet and a layer of a water-soluble resin composition having photocrosslinkability to thus cause crosslinking of the exposed area of the resin layer to thereby form a predetermined pattern on the resin layer; (b) a process for dissolving out the non-crosslinked portion of the layer of the water-soluble photo-sensitive resin composition by developing the layer with water to thus from an image-carrying mask which is constituted from the crosslinked area of the photo-sensitive resin composition remaining on the image mask-protection layer; (c) a process for adhering the photo-sensitive laminate film on which the images are formed to the surface of a material to be processed; (d) a process for peeling off the supporting sheet from th

Abstract: Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R.sup.1 represents a tetravalent organic group, R.sup.2 represents a divalent organic group, and R.sup.3 and R.sup.4 represent a monovalent organic group, at least one of R.sup.3 and R.sup.4 being an organic group having at least on hydroxyl group bonded to an aromatic ring. A semiconductor substrate is coated with the photosensitive resin composition, followed by exposing the coated film to light through a patterning mask and subsequently applying a development and a heat treatment so as to form a polyimide film pattern. A baking treatment also be applied immediately after the exposure step. The photosensitive resin composition of the present invention performs the function of a positive or negative photoresist film and the function of a polyimide protective film on a semiconductor substrate.

Abstract: Cost-effective, negative resists having high thermal stability based on oligomeric and/or polymeric polybenzoxazole precursors are disclosed. Also disclosed are resist solutions having a high level of storage stability when they contain a photoactive component in the form of a bisazide and when the polybenzoxazole precursors are hydroxypolyamides having the following structure: ##STR1## where R, R*, R.sub.1, R.sub.1 * and R.sub.2 are aromatic groups, R.sub.3 is an aromatic group or a norbornene residue, and wherein n.sub.1, n.sub.2 and n.sub.3, are defined as follows:n.sub.1 =1 to 100, n.sub.2 and n.sub.3 =0 orn.sub.1 and n.sub.2 =1 to 100, n.sub.3 =0 orn.sub.2 =1 to 100, n.sub.1 and n.sub.3 =0 orn.sub.1, n.sub.2 and n.sub.3 =1 to 100 (with R.noteq.R* or R.sub.1 .noteq.R.sub.1 * or both) orn.sub.1 and n.sub.3 =1 to 100, n.sub.2 =0 (with R.noteq.R* or R.sub.1 .noteq.R.sub.1 * or both),on the condition that: n.sub.1 +n.sub.2 +n.sub.3 .gtoreq.3.

Abstract: A photosensitive printing member comprises a porous supporting member and a photosensitive layer formed on the porous supporting member. The photosensitive layer comprises a photosensitive material and a foaming material or filler melted or dispersed in the photosensitive material. A porous stamp plate can be formed with fewer process steps than the conventional method and without using a mold. As a result, a small number of photosensitive printing members can be used to produce various models of stamps.

Abstract: Bisazo compounds of formula (I), an intermediate for producing the bisazo compound of formula (I), and trisazo compounds of formula (II) for use in optical information recording media, and methods of producing these compounds are disclosed: ##STR1## wherein R represents hydrogen, an alkyl group having 1 to 20 carbon atoms; an aryl group selected from the group consisting of phenyl group, naphthyl group, mesityl group, and tri-t-butyl phenyl group; an alkoxyl group having 1 to 4 carbon atoms; a nitro group; a cyano group; chlorine; or bromine; n is an integer of 1, 2, or 3, and C.sub.p represents a coupler residue.

Abstract: A method for engraving and/or etching comprising the steps of: (a) a process for exposing, to light, a layer of a water-soluble resin composition of a laminated photosensitive film which comprises a supporting sheet, a image mask-protection layer peelablly adhered to the supporting sheet and a layer of a water-soluble resin composition having photocrosslinkability to thus cause crosslinking of the exposed area of the resin layer to thereby form a predetermined pattern on the resin layer; (b) a process for dissolving out the non-crosslinked portion of the layer of the water-soluble photo-sensitive resin composition by developing the layer with water to thus from an image-carrying mask which is constituted from the crosslinked area of the photo-sensitive resin composition remaining on the image mask-protection layer; (c) a process for adhering the photo-sensitive laminate film on which the images are formed to the surface of a material to be processed; (d) a process for peeling off the supporting sheet from the