Product With At Least Two Named Layers Patents (Class 430/155)
  • Patent number: 10124312
    Abstract: The disclosure relates to methods of photopatterning molecules directly on a surface by photochemical means.
    Type: Grant
    Filed: June 3, 2015
    Date of Patent: November 13, 2018
    Assignee: The Regents of the University of California
    Inventors: Matthew B. B. Francis, Amy A. Twite, Kareem El Muslemany
  • Patent number: 6846613
    Abstract: A positive-working printing plate precursor for wet lithographic printing is disclosed which comprises a support having a hydrophilic surface and a coating comprising a first layer closest to the support, said first layer containing an oleophilic phenolic resin soluble in an aqueous alkaline developer, and a second layer containing an amphyphilic polymer, wherein (a) the second layer is capable of preventing the aqueous alkaline developer from penetrating into the first layer to an extent that substantially no dissolution of unexposed coating occurs upon immersion in the aqueous alkaline developer during a time period t2; (b) and wherein said capability of the second layer of preventing the aqueous alkaline developer from penetrating into the first layer is reduced upon exposure to heat or light to an extent that substantially complete dissolution of exposed coating occurs upon immersion in the aqueous alkaline developer during a time period t1; wherein t2>t1 and t2?t1 is at least 10 seconds; and wherein t
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: January 25, 2005
    Assignee: AGFA-Gevaert
    Inventors: Joan Vermeersch, Marc Van Damme
  • Publication number: 20040101780
    Abstract: A planographic printing plate precursor includes a support having disposed thereon a recording layer containing a water-insoluble and alkali-soluble resin, a development inhibitor and an infrared absorber and exhibiting enhanced solubility in an aqueous alkali solution through light exposure. The recording layer may have either a mono-layer construction or a multi-layer construction containing a lower layer and an upper layer. In the case of the multi-layer construction, a layer containing the water-insoluble and alkali-soluble resin is used as the lower layer, and a layer containing the water-insoluble and alkali-soluble resin and the development inhibitor and exhibiting enhanced solubility in an aqueous alkali solution through light exposure is used as the upper layer, and at least one of the lower layer and the upper layer contains the infrared absorber.
    Type: Application
    Filed: November 6, 2003
    Publication date: May 27, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Kazuo Maemoto
  • Patent number: 6677103
    Abstract: Disclosed is a novel chemical-amplification positive-working photoresist composition capable of giving a patterned resist layer with excellent properties such as photosensitivity, pattern resolution, heat resistance and cross sectional profile of the patterned resist layer. The composition is characterized by the use of, as the film-forming resinous component, a hydroxyl-containing resinous ingredient which is a combination of a first resin of which from 30 to 60% of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups and a second resin of which from 5 to 20% of the hydroxyl groups are substituted by acid-dissociable groups of the same kind as in the first resin in a weight proportion of 1.9 to 9:1.
    Type: Grant
    Filed: April 3, 2002
    Date of Patent: January 13, 2004
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kazufumi Sato, Satoshi Maemori, Taku Nakao, Kazuyuki Nitta
  • Patent number: 6623905
    Abstract: A precursor for preparing a resist pattern comprises an imageable layer which includes a relatively volatile compound that can be volatilized by application of heat, wherein imaging radiation can be applied to the precursor to heat areas thereof and volatilizes said compound so that properties, for example, the ink accepting abilities of heated and non heated areas, are different.
    Type: Grant
    Filed: January 11, 2000
    Date of Patent: September 23, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Kevin Barry Ray, Mark John Spowage
  • Patent number: 6613494
    Abstract: Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: September 2, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Celin Savariar-Hauck, Gerhard Hauck, Dietmar Frank, Ulrich Fiebag
  • Patent number: 6524763
    Abstract: The object of the present invention is to provide a material which takes on a color or which changes its colors when selectively sensitized by ionizing radiation (especially by low doses of radiation) and which is not sensitive to visible and ultraviolet light etc. This is achieved by microcapsules containing a radiation sensitive composition comprising leuco compounds (a) and organic halogen compounds (b) as indispensable components.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: February 25, 2003
    Assignees: The Japan Atomic Power Company, Nuclear Fuel Industries, Ltd.
    Inventors: Yuji Kuroda, Masahiko Seki, Yumiko Fujita, Mitsuto Montani, Takeshi Sakai, Shozo Suefuku, Hiroyuki Nakazumi
  • Patent number: 6472128
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: August 7, 2001
    Date of Patent: October 29, 2002
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Patent number: 6444394
    Abstract: Disclosed is a novel chemical-amplification positive-working photoresist composition capable of giving a patterned resist layer with excellent properties such as photosensitivity, pattern resolution, heat resistance and cross sectional profile of the patterned resist layer. The composition is characterized by the use of, as the film-forming resinous component, a hydroxyl-containing resinous ingredient which a combination of a first resin of which from 30 to 60% the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups and a second resin of which from 5 to 20% of the hydroxyl groups are substituted by acid-dissociable groups of the same kind as in the first resin a weight proportion of 1.9 to 9:1.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: September 3, 2002
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kazufumi Sato, Satoshi Maemori, Taku Nakao, Kazuyuki Nitta
  • Publication number: 20020110750
    Abstract: Disclosed is a novel chemical-amplification positive-working photoresist composition capable of giving a patterned resist layer with excellent properties such as photosensitivity, pattern resolution, heat resistance and cross sectional profile of the patterned resist layer. The composition is characterized by the use of, as the film-forming resinous component, a hydroxyl-containing resinous ingredient which is a combination of a first resin of which from 30 to 60% of the hydroxyl groups are substituted by acid-dissociable solubility-reducing groups and a second resin of which from 5 to 20% of the hydroxyl groups are substituted by acid-dissociable groups of the same kind as in the first resin in a weight proportion of 1.9 to 9:1.
    Type: Application
    Filed: April 3, 2002
    Publication date: August 15, 2002
    Inventors: Kazufumi Sato, Satoshi Maemori, Taku Nakao, Kazuyuki Nitta
  • Publication number: 20010028990
    Abstract: A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.
    Type: Application
    Filed: March 23, 2001
    Publication date: October 11, 2001
    Inventors: Akio Uesugi, Masahiro Endo
  • Patent number: 6297058
    Abstract: A small sample of a refractory material, e.g., about 0.1 g to about 10 g, is heated to at least 1000° C., generally under a pressure of less than about 10−5 Torr. Evolved hydrogen-containing gases and/or carbon-containing gases are monitored, e.g., by mass spectrometry, and, based on the amount of the evolved gases, the concentration of hydrogen and/or carbon in the sample is calculated. It is therefore possible to accurately determine the hydrogen and carbon concentration from a small sample of a material, by a process much less burdensome than conventional techniques.
    Type: Grant
    Filed: January 14, 1999
    Date of Patent: October 2, 2001
    Assignee: Agere Systems Optoelectronics Guardian Corp.
    Inventor: William David Reents, Jr.
  • Patent number: 6291060
    Abstract: The present invention concerns a water-developable plate package comprising water-developable plates packaged in a laminated state. The water-developable plate is a sheet-like plate comprising a photosensitive layer made of a photosensitive resin composition having water-developability and protective films covering both surfaces of this photosensitive layer. The package of the present invention is obtained by sandwiching an open cell foamed sheet (2) between a water-developable plate (1) and between a water-developable plate (1) to make a laminate (3), packaging the laminate (3) with a light-screening film and fixing the packaging ends with a tape. The subject of the present invention is to prevent the occurrence of deformation of the plates in the package during transportation or storage at a high temperature and high humidity in summer, without complicating the operations at the time of use or packaging of the plates and without increasing the cost remarkably.
    Type: Grant
    Filed: February 25, 2000
    Date of Patent: September 18, 2001
    Assignee: Asahi Kasei Kabushiki Kaisha
    Inventors: Takeshi Oyoshi, Yoshifumi Araki
  • Patent number: 6232037
    Abstract: A lithographic printing plate having an average curvature in a rolling direction of 1.5×10−3 mm−1 or less, a curvature distribution in a crosswise direction of 1.5×10−3 mm−1 or less, and a curvature in a direction perpendicular to said rolling direction of 1.0×10−3 mm−1 or less and a method for producing the printing plate are disclosed. A method for producing a support for a lithographic printing plate is also disclosed, which comprises roughening a surface of an aluminum web having a center line average surface roughness of 0.15 to 0.35 &mgr;m and a maximum surface roughness of 1 to 3.5 &mgr;m by at least one of mechanical surface roughening, chemical etching and electrochemical surface roughening, and then applying anodization thereto.
    Type: Grant
    Filed: October 10, 1997
    Date of Patent: May 15, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akio Uesugi, Masahiro Endo, Hirokazu Sakaki
  • Patent number: 6143471
    Abstract: There is disclosed a positive type photosensitive composition which comprises a support, and a recording layer provided thereon containing at least a polymer which is soluble in an alkaline developer, a near infrared rays-absorbing dye, and a compound which lowers solubility of the polymer in the alkaline developer, wherein a contact angle of the recording layer is 70.degree. or higher and the contact angle is lowered by irradiating a near infrared rays laser.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: November 7, 2000
    Assignee: Mitsubishi Paper Mills Limited
    Inventors: Masakazu Takata, Naoki Hisamatsu
  • Patent number: 6140014
    Abstract: A precursor for a lithographic printing plate having an aluminum support subjected to at least two graining treatments and simultaneously satisfying the ranges shown by following (1), (2), and (3);1.5.ltoreq.R.sub.ms (10 to 100 .mu.m)/R.sub.ms (1 to 10 .mu.m).ltoreq.3.0(1 )0.2.ltoreq.R.sub.ms (1 to 10 .mu.m).ltoreq.0.4 [.mu.m] (2)0.4.ltoreq.R.sub.ms (10 to 100 .mu.m).ltoreq.1.0 [.mu.m] (3)wherein the R.sub.ms is the square average surface roughness obtained by measuring the surface form of the support by the AFM, the R.sub.ms (1 to 10 .mu.m) is the value about the frequency space of from 1 to 10 .mu.m, and the R.sub.ms (10 to 100 .mu.m) is the value about the frequency space of from 10 to 100 .mu.m. The lithographic printing plate using the aluminum support has greatly improved various characteristics such as scumming, the printability, the printing impression, etc.
    Type: Grant
    Filed: October 31, 1997
    Date of Patent: October 31, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akio Uesugi, Kiyotaka Fukino
  • Patent number: 6087068
    Abstract: Proposed is a novel undercoating composition to form an undercoating layer interposed between the surface of a substrate and a photoresist layer with an object to decrease the adverse influences by the reflection of light on the substrate surface in the pattern-wise exposure of the photo-resist layer to ultraviolet light without the undesirable phenomena of intermixing between layers and notching along with a large selectivity ratio in the etching rates between the patterned resist layer and the undercoating layer in a dry-etching treatment. The undercoating composition comprises (A) an ultraviolet absorber which is a benzophenone compound or an aromatic azomethine compound each having at least one unsubstituted or alkyl-substituted amino group on the aryl groups and (B) a crosslinking agent which is preferably a melamine compound having at least two methylol groups or alkoxymethyl groups bonded to the nitrogen atoms in a molecule in a weight proportion (A):(B) in the range from 1:1 to 1:10.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: July 11, 2000
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Katsumi Oomori, Etsuko Iguchi, Kiyoshi Ishikawa, Fumitake Kaneko
  • Patent number: 6054249
    Abstract: A photosensitive resin laminate comprising at least a support, a photosensitive resin layer, a tackiness preventive layer and a cover film successively laminated, said tackiness preventive layer having a water content of not less than 4 wt % under a relative humidity (RH) of 30-80%. During the production of such photosensitive resin laminate, a water content of the tackiness preventive layer of not less than 4% has been achieved by adding a water retention agent to the tackiness preventive layer or allowing presence of water on the cover film (preferably by directly spraying water onto the cover film or placing a water-containing sheet on the cover film), as a result of which the tackiness preventive layer thereof is free of occurrence of wrinkles during any handling step and under any environment.
    Type: Grant
    Filed: July 18, 1997
    Date of Patent: April 25, 2000
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Shigenori Nagahara, Toshihiko Kajima, Hiroyuki Hamada
  • Patent number: 5900345
    Abstract: Improved aluminum substrates suitable for use in the production of lithographic printing plates. A surfactant surface treatment for such aluminum substrates improves the quality of radiation sensitive coatings subsequently applied to the substrate. The surfactant may be in a layer comprising a mixture of a hydrophilizing composition and a surfactant on the aluminum alloy surface; or a hydrophilizing layer comprising a hydrophilizing composition may be on the aluminum alloy surface and a surfactant layer comprising a surfactant on the hydrophilizing layer.
    Type: Grant
    Filed: October 6, 1997
    Date of Patent: May 4, 1999
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Stephan J. W. Platzer, Joe E. South, Melinda A. Alden
  • Patent number: 5871879
    Abstract: According to the present invention an element comprising a layer on a glass support characterised in that: (i) the thickness of said glass support is less than 1.2 mm, (ii) said glass support has a failure stress (under tensile stress) equal to or higher than 5.times.10.sup.7 Pa and (iii) the sides in the longitudinal direction have a rounded border with a radius in the order of magnitude of half of the thickness of the glass support.
    Type: Grant
    Filed: October 23, 1997
    Date of Patent: February 16, 1999
    Assignee: AGFA-Gevaert, N.V.
    Inventors: Bartholomeus Verlinden, Pascale Steenhoudt
  • Patent number: 5817444
    Abstract: Proposed is a novel chemical-sensitization positive-working photoresist composition suitable for fine patterning of a resist layer in the manufacture of electronic devices. The composition is advantageous in various properties of photoresist composition without little dependency on the nature of the substrate surface, on which the photoresist layer is formed, with or without an antireflection undercoating layer. The most characteristic ingredient in the inventive composition is the film-forming resinous ingredient which is a combination of a first polyhydroxystyrene resin substituted by tetrahydropyranyl groups for the hydroxyl groups and a second hydroxystyrene resin substituted by alkoxyalkyl groups for the hydroxyl groups in a specified weight proportion of the first and second resins.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: October 6, 1998
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama
  • Patent number: 5759742
    Abstract: A masking element is prepared with a photosensitive layer on a suitable support, overcoated with a masking layer containing an infrared absorbing compound and a thermally bleachable dye. The dye is bleached by imagewise laser irradiation, followed by floodwise exposure to produce an image in the photosensitive layer corresponding to the laser produced image. The outermost layers are removed and development provides a suitable negative-working printing plate.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: June 2, 1998
    Assignee: Eastman Kodak Company
    Inventors: Paul Richard West, Jeffery Allen Gurney
  • Patent number: 5637549
    Abstract: A recording material comprising a plastic film provided with a layer of ionizing radiation cured resin having a hardness equal to or harder than a pencil hardness of H and an image-forming layer having pressure sensitivity or thermal sensitivity or photosensitivity and thermal sensitivity, wherein rippling during storage in high humidity or caused by heat is markedly reduced.
    Type: Grant
    Filed: December 26, 1995
    Date of Patent: June 10, 1997
    Assignee: Kimoto Co., Ltd.
    Inventor: Yoshihisa Kimura
  • Patent number: 5595861
    Abstract: Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption efficiency) of incident photolithographic light, and consequently the critical dimensions of underlying features being formed (e.g., polysilicon gates). A low solvent content resist solution that can be applied as an aerosol provides a more uniform thickness resist film, eliminating or diminishing photoresist thickness variations. A top antireflective coating (TAR) also aids in uniformizing reflectance, despite resist thickness variations. The two techniques can be used alone, or together. Hence, better control over underlying gate size can be effected, without differential biasing.
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: January 21, 1997
    Assignee: LSI Logic Corporation
    Inventor: Mario Garza
  • Patent number: 5443938
    Abstract: A photosensitive printing member comprises a porous supporting member and a photosensitive layer formed on the porous supporting member. The photosensitive layer comprises a photosensitive material and a foaming material or filler melted or dispersed in the photosensitive material. A porous stamp plate can be formed with fewer process steps than the conventional method and without using a mold. As a result, a small number of photosensitive printing members can be used to produce various models of stamps.
    Type: Grant
    Filed: September 24, 1993
    Date of Patent: August 22, 1995
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventor: Jun Sakai
  • Patent number: 5183723
    Abstract: This invention relates to a method for forming a colored image on a degradable sheet material. As a result, a negative- or positive-working color proofing sheet can be produced on a variety of printing paper stocks. Upon exposure to an actinic radiation source through a screened image and development, it can accurately reproduce the image on the degradable sheet. The construction is useful as a color proof which can be employed to accurately predict the image quality from a lithographic printing process on a variety of printing surfaces.
    Type: Grant
    Filed: December 13, 1991
    Date of Patent: February 2, 1993
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Arthur E. Procter, Thomas Dunder
  • Patent number: 5100757
    Abstract: This invention relates to a method for forming a colored image on a degradable sheet material. As a result, a negative- or positive-working color proofing sheet can be produced on a variety of printing paper stocks. Upon exposure to an actinic radiation source through a screened image and development, it can accurately reproduce the image on the degradable sheet. The construction is useful as a color proof which can be employed to accurately predict the image quality from a lithographic printing process on a variety of printing surfaces.
    Type: Grant
    Filed: October 21, 1988
    Date of Patent: March 31, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Arthur E. Proctor, Thomas Dunder
  • Patent number: 5084372
    Abstract: A light-sensitive composition for the preparation of printing plates is described, which contains a water-insoluble binder which is soluble in aqueous-alkaline solutions; a light-sensitive component which is an o- or p-quinone diazide, a diazonium salt polycondensation product or a mixture ofa) a compound which eliminates an acid on exposure to light andb) a compound having at least one C--O--C group which can be split by acid; and a thermo-crosslinking compound which is a cyclical acid amide of the general formula: ##STR1## wherein R denotes a hydrogen atom or an alkyl group. The printing plates can be baked at lower temperatures than plates without a crosslinking agent, but nevertheless have a long shelf life.
    Type: Grant
    Filed: January 23, 1991
    Date of Patent: January 28, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Shane Hsieh, Paul Stahlhofen
  • Patent number: 5061592
    Abstract: A presensitized plate for use in making a lithographic printing plate which comprises an aluminum substrate provided thereon with a light-sensitive layer comprising a polymer having at least two photodimerizable unsaturated double bonds in the molecule, wherein the light-sensitive layer further comprises a compound having at least one photodimerizable unsaturated double bond and at least one phosphinyl group in each molecule as well as a molecular weight of not more than 2,000. The presensitized plate shows excellent sensitivity and makes it possible to provide a lithographic printing plate showing high printing durability.
    Type: Grant
    Filed: April 25, 1990
    Date of Patent: October 29, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masanori Imai, Tadahiro Sorori
  • Patent number: 5008175
    Abstract: A light-sensitive composition for the preparation of printing plates is described, which contains a water-insoluble binder which is soluble in aqueous-alkaline solutions; a light-sensitive component which is an o- or p- quinone diazide, a diazonium salt polycondensation product or a mixture of(a) a compound which eliminates an acid on exposure to light and(b) a compound having at least one C--O--C group which can be split by acid; and a thermo-crosslinking compound which is a cyclical acid amide of the general formula: ##STR1## wherein R denotes a hydrogen atom or an alkyl group. The printing plates can be baked at lower temperatures than plates without a crosslinking agent, but nevertheless have a long shelf life.
    Type: Grant
    Filed: February 16, 1990
    Date of Patent: April 16, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Shane Hsieh, Paul Stahlhofen
  • Patent number: 4999266
    Abstract: The invention provides a photographic article having a protected image which comprisesa) a colored image disposed on a substrate; andb) a thin, transparent, colorless, thermoplastic adhesive composition directly on the surface of the image, wherein said adhesive is substantially non-tacky at room temperature, and comprises one or more thermoplastic polymers of copolymers capable of forming a flexible film, said adhesive being capable of being transferred directly to the image when the adhesive is first disposed on the release surface of a temporary support and said image and adhesive are laminated together under pressure at temperatures of between about 60.degree. C. and about 90.degree. C. and said temporary support is peeled away; andc) a non-self supporting antiblocking layer directly on said adhesive said antiblocking layer being transparent, colorless and comprises one or more organic polymers or copolymers, which coating does not cohesively block at about 50.degree. C. or less.
    Type: Grant
    Filed: December 6, 1989
    Date of Patent: March 12, 1991
    Assignee: Hoechst Celanese Corporation
    Inventors: Stephan J. W. Platzer, Mehmet U. Yener, Stanley F. Wanat
  • Patent number: 4987050
    Abstract: A light-sensitive transfer material is disclosed, comprising a substantially transparent support having provided on one side thereof, in order from the support, a stripping layer, and a lamination of a colorant layer containing a dye or a pigment and a photoresist layer or a photoresist layer containing a dye or a pigment, and having provided on the other side thereof a physical development nuclei-containing layer adapted for diffusion transfer processing using a silver halide emulsion.
    Type: Grant
    Filed: December 5, 1989
    Date of Patent: January 22, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Shunzo Yagami
  • Patent number: 4980273
    Abstract: The matting agent particles of matted photographic imaging materials contain a finely divided solid as well as a dye that is only present at the image-forming points after exposure and development of the material. The starry night effect is thereby avoided. The dye can be formed during exposure and development from a precursor, e.g., from silver halide or from couplers for color photography or for diazo processes.
    Type: Grant
    Filed: July 26, 1989
    Date of Patent: December 25, 1990
    Assignee: E. I. DuPont de Nemours and Company
    Inventor: Manfred Fautz
  • Patent number: 4957847
    Abstract: A heat-sensitive recording material comprising a base and, on top of the said base, a heat-sensitive layer containing a cyclic diazo component and a coupling component, the cyclic diazo component being a benzotriazine compound of the formula ##STR1## wherein Q is --CH.sub.2 --, --CO-- or --SO.sub.2 --, R is hydrogen, hydroxyl, or aryl or alkenyl, each unsubstituted or substituted by halogen, hydroxyl, cyano, lower alkoxy, lower alkylthio, acyloxy, lower alkoxycarbonyl or lower alkylsulfonyl, or is acyl, acyloxy or acylamino, cycloalkyl, or is aryl or aralkyl such as phenyl, phenylalkyl or naphthyl each unsubstituted or substituted on the ring by cyano, halogen, nitro, trifluoromethyl, lower alkyl, lower alkylthio, lower alkoxy, lower alkylcarbonyl or lower alkoxycarbonyl, or is a heterocyclic radical, and the benzene ring A is unsubstituted or substituted by halogen, cyano, nitro, lower alkyl, lower alkoxy, lower alkylthio, lower alkylcarbonyl or lower alkoxycarbonyl.
    Type: Grant
    Filed: December 2, 1988
    Date of Patent: September 18, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Jean-Marie Adam, Hans Baumann
  • Patent number: 4950582
    Abstract: A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.
    Type: Grant
    Filed: March 31, 1988
    Date of Patent: August 21, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Keitaro Aoshima, Yasuo Okamoto
  • Patent number: 4939065
    Abstract: Substrates, e.g., silicon wafers, coated with a UV-curable organopolysiloxane composition including a crosslinking catalyst therefor (e.g., a platinum group metal compound) and an amount of a crosslinking inhibitor (e.g., an azodicarboxylate) which is effective at ambient temperature, but ineffective to prevent crosslinking on exposure of the composition to ultraviolet radiation, are well adapted for the imaging of negative intelligence patterns thereon.
    Type: Grant
    Filed: July 11, 1988
    Date of Patent: July 3, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Jacques Cavezzan, Sylvianne Dumas, Louis Giral, Christian Prud'Homme, Francois Schue
  • Patent number: 4840868
    Abstract: A photosensitive composition is described, which contains a diazonium salt polycondensation product and a polymeric binder which is soluble or at least swellable in aqueous-alkaline solutions and comprises a reaction product of a trimellitic anhydride, the free carboxyl group of which is esterified with an alcohol containing a urethane group, with a polymer containing hydroxyl groups and having no further functional groups capable of reaction with acid anhydrides. The composition yields an increased print run and has, at the same time, good storability and developability.
    Type: Grant
    Filed: December 21, 1987
    Date of Patent: June 20, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg Pawlowski, Guenter Hultsch, Gerhard Mack
  • Patent number: 4833065
    Abstract: In a process for producing a support for a lithographic printing plate, at least one surface of an aluminum sheet is subjected to roughening treatment and subsequently to anodic oxidation treatment at a current density of at least 1 A/dm.sup.2 in an electrolytic solution containing 0.1 to 5% by weight of an alkaline electrolyte. Even if scratches are formed on non-image areas of a printing plate prepared from the support according to the invention, such scratches cause less stains on a printed matter.
    Type: Grant
    Filed: October 1, 1986
    Date of Patent: May 23, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Haruo Nakanishi, Hirokazu Sakaki
  • Patent number: 4826752
    Abstract: A dry photosensitive lithographic printing plate has a base, a photosensitive layer formed on the base and a silicone rubber layer formed on the photosensitive layer. The silicone rubber layer is formed from a silicon rubber composition containing an organopolysiloxane and a reactive aromatic aminosilane compound.
    Type: Grant
    Filed: June 18, 1987
    Date of Patent: May 2, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Susumu Yoshida, Hiroshi Takahashi, Hisashi Aoki, Kiyohiro Kondow, Tetsuya Mayuzumi
  • Patent number: 4822715
    Abstract: An aluminum alloy support for lithographic printing plate comprising 0.05 to 0.5 wt. % of Fe, 0.1 to 0.9 wt. % of Mg, 0.01 to 0.3 wt % of V and/or Ni, not more than 0.2 wt. % of Si, not more than 0.05 wt. % of Cu and the remainder of Al and inevitable impurities is disclosed. In addition, 0.01-0.3 wt. % of Zr and/or 0.05-2 wt. % of Mn may be contained.
    Type: Grant
    Filed: March 30, 1987
    Date of Patent: April 18, 1989
    Assignees: Furukawa Aluminum Co., Ltd., Fuji Photo Film Co., Ltd.
    Inventors: Ryo Shoji, Chozo Fujikura, Kazushige Takizawa, Hirokazu Sakaki
  • Patent number: 4822713
    Abstract: A light-sensitive composition for use in making a light-sensitive layer of, for instance, a presensitized plate from which a lithographic printing plate is to be prepared, which comprises a fluorine-containing surfactant and is characterized in that the fluorine-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group, Rf, which has 3 to 20 carbon atoms and at least 40% by weight of fluorine atoms and at least three terminal carbon atoms of which are fully fluorinated; and (ii) a poly(oxyalkylene) (meth)acrylate and that Rf group-containing (meth)acrylate monomer unit is present in the copolymer in an amount of from 25 to 70% by weight based on the total weight of the copolymer. The composition provides a light-sensitive layer of a uniform thickness and it provides a lithographic printing plate having acceptable and excellent properties.
    Type: Grant
    Filed: January 21, 1987
    Date of Patent: April 18, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nishioka, Masayuki Kamei, Toshihiko Umaba
  • Patent number: 4814246
    Abstract: The disclosed light-sensitive recording material is composed of an electrically conductive support, suitable for the production of printing forms or printed circuits, an a photoconductive layer system containing a photoconductor, a binder, a sensitizing dye and conventional additives. The photoconductive system comprises (A) a single photoconductive layer, or multiple layers, applied to the support and (B) a light-sensitive covering layer which contains at least one photochemically reactive compound. The use of the recording material in a process for the production of printing forms and printed circuits is also disclosed.
    Type: Grant
    Filed: April 16, 1987
    Date of Patent: March 21, 1989
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Peter Lehmann, Manfred Michel
  • Patent number: 4777109
    Abstract: A metal base lithographic printing plate cleaned and treated by RF plasma to render the non-exposed area hydrophilic, then coated with either a negative working or positive working photosensitive coating. The method is characterized by its elimination of the conventional alkaline etch with attendant hazard, pollution and toxicity problems.
    Type: Grant
    Filed: May 11, 1987
    Date of Patent: October 11, 1988
    Inventors: Robert Gumbinner, Gregory Halpern
  • Patent number: 4775607
    Abstract: A light-sensitive printing plate for waterless offset printing is comprised of a layer carrier, a light-sensitive layer containing a diazonium salt polycondensation product, and of an ink-repellent crosslinked silicone elastomer layer superimposed on the light-sensitive layer, wherein the diazonium salt polycondensation product comprises recurrent A-N.sub.2 X and B units which are mutually linked by bridge members, preferably methylene groups, derived from carbonyl compounds capable of condensation, A being the radical of an aromatic diazonium compound capable of condensation with formaldehyde and B being the radical of a compound, in particular an aromatic amine, a phenol, a phenol ether, an aromatic thioether, an aromatic hydrocarbon, an aromatic heterocyclic compound or an organic acid amide, that is free of diazonium groups and that is capable of condensation with formaldehyde.
    Type: Grant
    Filed: December 17, 1986
    Date of Patent: October 4, 1988
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Hans-Joachim Schlosser
  • Patent number: 4746591
    Abstract: A process for preparing a lithographic support, and the printing plate made therefrom, are described, wherein the process comprises the steps of (a) liquid-honing a surface of an aluminum sheet, and (b) electrochemically graining the surface of the aluminum sheet in an electrolyte comprises hydrochloric acid, nitric acid, or a mixture thereof.
    Type: Grant
    Filed: September 4, 1986
    Date of Patent: May 24, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hirokazu Sakaki, Akira Shirai, Akio Uesugi, Tsutomu Kakei
  • Patent number: 4731317
    Abstract: A coated lithographic printing plate comprises a grained, anodized aluminum substrate and coating thereon comprising a diazo resin in admixture with particulate energy absorbing material that will absorb incident radiation and re-radiate it as radiation that will change the diazo resin coating which is imageable with a Crosfield Datrax 760 YAG laser plate maker producing incident radiation of 1/06 microns. The topography of the substrate and the particulate material in the coating trap and convert a substantial portion of the incident laser radiation which passes through the coating without substantially affecting same into radiation that will change the coating.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: March 15, 1988
    Assignee: Howard A. Fromson
    Inventors: Howard A. Fromson, Robert F. Gracia
  • Patent number: 4692397
    Abstract: A method of producing a light sensitive element wherein a substrate is coated with a photosensitive layer having a particular class of diazonium salts, a colorant and a polyvinyl acetal resin. Upon imagewise exposure it is developed with an aqueous composition of salts and surfactants in the absence of organic solvents.
    Type: Grant
    Filed: November 27, 1985
    Date of Patent: September 8, 1987
    Assignee: American Hoechst Corporation
    Inventor: Shuchen Liu
  • Patent number: 4684600
    Abstract: A layered sheet construction suitable after processing for use as a relief printing plate is provided. The sheet is made of a photosensitive layer comprising an elastomeric polymer, between about 5 and 30 phr of an ethylenically unsaturated compound and between 0.1 and 5 phr of a photoinitiator activatable by actinic radiation; a base layer immediately adjacent to said photosensitive layer capable of supporting a relief image after processing; having the same or a different composition than said photosensitive layer. The sheet is bonded to an open or closed cell foam layer having a thickness between about 0.010 inch and 0.250 inch. Said foam has a recovery rate of at least 80%, a compression value between about 0.003 inch and 0.030 inch and a density of between about 2 to 50 lbs/ft.sup.3 and is bonded to a dimensionally stable supporting layer.
    Type: Grant
    Filed: October 2, 1985
    Date of Patent: August 4, 1987
    Assignee: Uniroyal Plastics Co., Inc.
    Inventors: John R. Worns, James W. Chase, Bruce W. Capriotti
  • Patent number: 4650739
    Abstract: A process for manufacturing materials in the form of sheets, foils or webs comprising chemically, mechanically and/or electrochemically roughened and anodically oxidized aluminum or one of its alloys, wherein the resultant aluminum oxide layers are post-treated with an aqueous solution containing phosphoroxo anions, is performed such that a post-treatment of the aluminum oxide layers is effected by immersion in an aqueous solution containing hexametaphosphate anion. In a preferred embodiment, the aqueous solution is adjusted to a pH of 1 to 5 by addition of an acid. The resulting materials, which have reduced adsorption properties, are preferably employed as support materials for offset printing plates.
    Type: Grant
    Filed: May 15, 1985
    Date of Patent: March 17, 1987
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ulrich Simon, Reiner Beutel
  • Patent number: 4645730
    Abstract: The lithographic printing plate of the invention comprises a substrate having a hydrophilic surface, a coating on said surface of a light sensitive material (e.g., a water soluble diazo) and a top coating of discrete, oleophilic resin particles (e.g., an emulsion polymer), the resin particle coating being:(a) transparent to actinic light;(b) sufficiently permeable to allow a developer for the light sensitive material to penetrate through to the underlying light sensitive coating;(c) insoluble in said developer;(d) capable of being coalesced in situ after the plate is imaged and developed.
    Type: Grant
    Filed: September 17, 1984
    Date of Patent: February 24, 1987
    Assignee: Howard A. Fromson
    Inventors: Howard A. Fromson, Robert F. Cracia