Abstract: A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolymer with a second reactive phenol in the presence of an aldehyde to form substantially block copolymers. The use of these resins in photoresist formulations leads to improved thermal properties, etch resistance and photospeed.

Abstract: A solution containing a low-temperature curing type organosilicon ladder resin composition comprising: (A) a polylphenysylsesquioxane which has a hydroxyl group at the end, in which 3% of the side chain consists of vinyl groups, and which has a weight-average molecular weight of 150,000; (B) 1.8 wt % of 3,3'-diazidophenylsulfone based on the polylphenysylsesquioxane (A); and (C) methoxybenzene which is added to the polylphenysylsesquioxane (A) so that the polylphenysylsesquioxane content is about 15 wt % is used as the material for a surface protective film of a color filter for a light-receiving element or a display element.

Abstract: A tonable, aqueous-processable, photosensitive element and process for forming a colored image from said element is described. The element comprises a support and a tonable, aqueous-processable photosensitive layer, said photosensitive layer consisting essentially of (a) an aqueous-processable, photoinsolubilizable photosensitive composition comprising a photosensitive material, and (b) a water-soluble plasticizer, wherein said photosensitive material is present in sufficient amount to insolubilize said photosensitive layer on exposure to actinic radiation, said photosensitive composition is present in sufficient amount to form a layer when said photosensitive layer is coated, and said plasticizer is present in sufficient amount to make said photosensitive layer.

Abstract: A photosensitive material either comprises a support, a peel layer, a barrier layer and a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer, superposed in order, or comprises a support having a releasing surface, an intermediate layer instead of both the peel layer and the barrier layer as mentioned above, a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer, superposed in order. The barrier layer or the intermediate layer comprises a polymer having a glass transition temperature not higher than 70.degree. C.

Abstract: A silicon-containing negative photoresist is used as the top imaging layer in a bilayer substrate patterning scheme. The photoresist is a single component resist in which the photoactive element is chemically bonded to the base polymer. In particular, an aromatic azide containing group is covalently bonded to the phenolic group of the poly(4-hydroxybenzyl)silsesquioxane (PHBS) via an esterification reaction. The new photoresist is easily synthesized and has the advantageous properties of aqueous base developability, excellent O.sub.2 RIE resistance, and high sensitivity to DUV, I-line and E-beam exposures.

Abstract: Disclosed is a photosensitive resin composition, containing a polyamic acid derivative having a repeating unit represented by general formula (1) given below and a photosensitive agent: ##STR1## where, R.sup.1 represents a tetravalent organic group, R.sup.2 represents a divalent organic group, and R.sup.3 and R.sup.4 represent a monovalent organic group, at least one of R.sup.3 and R.sup.4 being an organic group having at least on hydroxyl group bonded to an aromatic ring. A semiconductor substrate is coated with the photosensitive resin composition, followed by exposing the coated film to light through a patterning mask and subsequently applying a development and a heat treatment so as to form a polyimide film pattern. A baking treatment also be applied immediately after the exposure step. The photosensitive resin composition of the present invention performs the function of a positive or negative photoresist film and the function of a polyimide protective film on a semiconductor substrate.

Abstract: A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl and wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.

Abstract: A photosensitive composition contains a polyimide constituted by a repeating unit having a hydroxyl group and a repeating unit having a siloxane bond, or a repeating unit having a hydroxyl group, a repeating unit having a siloxane bond, and a repeating unit other than these two repeating units, and a photosensitive agent consisting of an ester compound or an amide-ester compound of naphthoquinonediazidesulfonic acid or benzoquinonediazidesulfonic acid. The photosensitive composition is used as a passivation film of a semiconductor device or a photoresist.

Abstract: A resist composition for forming a upper resist layer and a process for forming a pattern thereby are disclosed. This resist comprises an azide compound and a polyacrylic copolymer of the following formula (1): ##STR1## wherein, R.sub.1 means CH.sub.3, CF.sub.3, CN, CH.sub.2 OH, or CH.sub.2 CO.sub.2 R, wherein R means an alkyl having 1 to 5 carbon atomsR.sub.2 means a hydrocarbon radical having at least one Si,R.sub.3 means OH, O--C(CH.sub.3).sub.3, NH.sub.2 , or NHCH.sub.2 OH, and, a ratio of n to m is more than 0 and is 1 or less than 1.Whereby a finely-resolved resist pattern is obtained by a preset process for forming the resist pattern.

Abstract: A photosensitive polymer containing a repeating unit represented by the following formula (I) and having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a temperature of 30.+-.0.01.degree. C. at a concentration of 0.5 g/dl: ##STR1## (wherein R.sup.1 is a trivalent or tetravalent carbocyclic aromatic group or heterocyclic group, R.sup.2 is an aliphatic group having at least two carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbocyclic aromatic group, a heterocyclic group or a polysiloxane group, R.sup.3 is a divalent organic group, R.sup.4 is ##STR2## a hydrogen atom or a monovalent organic group, R.sup.5 is a hydrogen atom or a monovalent organic group, m is independently 1 or 2, n is independently 0 or 1, and m and n meet 1.ltoreq.m+n.ltoreq.2); a method for preparing the above-mentioned photosensitive polymer; a photosensitive polymer composition containing the above-mentioned photosensitive polymer; and a method for preparing a poly(amide)imide film.

Abstract: A photosensitive polymer containing a repeating unit represented by the following formula (I) and having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a temperature of 30.degree..+-.0.01.degree. C. at a concentration of 0.5 g/dl: ##STR1## (wherein R.sup.1 is a trivalent or tetravalent carbocyclic aromatic group or heterocyclic group, R.sup.2 is an aliphatic group having at least two carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbocyclic aromatic group, a heterocyclic group or a polysiloxane group, R.sup.3 is a divalent organic group, R.sup.4 is ##STR2## a hydrogen atom or a monovalent organic group, R.sup.5 is a hydrogen atom or a monovalent organic group, m is independently 1 or 2, n is independently 0 or 1, and m and n meet 1.ltoreq.m+n.ltoreq.

Abstract: A radiation-sensitive composition comprising an admixture in a solvent of: at least one alkali-soluble binder resin, at least one photoactive compound and an effective sensitivity enhancing amount of at least one dimeric or trimeric unit formed by the condensation reaction of an aldehyde with sesamol; the amount of said binder resin being about 60 to 95% by weight, the amount of said photoactive component being about 5% to about 40% by weight, based on the total solids content of said radiation-sensitive composition.

Abstract: A photoresist comprising a light sensitive component and an essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1,500 and a glass transition temperature in excess of 125.degree. C. If desired, the aromatic novolak resin may be blended with a conventional novolak resin to regulate the glass transition temperature of the resin.

Abstract: A positive type photosensitive composition developable with water or warm water alone of water-soluble photocrosslinking agent, water-soluble resin and synthetic resin emulsion and further a coloring agent, if necessary.

Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.

Abstract: A negative-working, radiation-sensitive composition comprising an admixture in a solvent of:(a) at least one cyclized rubber polymer,(b) at least one photoactive compound, and(c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH.sub.3 ; wherein R.sub.1 is either H, CH.sub.3, C.sub.2 H.sub.5, CH.sub.2 CH.sub.2 CN, CH CH.sub.2 OH or Q;wherein R.sub.2 is either H, CH.sub.3, OCH.sub.3, or NHCOCH.sub.3 ;wherein R.sub.3 is either H, OCH.sub.3 or OC.sub.2 H.sub.5 ; andwherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.

Abstract: A radiation-sensitive compound, which comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.

Abstract: A photoresist comprising a light sensitive component and an alternating copolymer resin formed by condensing a preformed bishydroxymethylated compound and a reactive phenol, in the absence of an aldehyde. Additional useful resins may be formed by further reacting the alternating copolymer with a second reactive phenol in the presence of an aldehyde to form substantially block copolymers. The use of these resins in photoresist formulations leads to improved thermal properties, etch resistance and photospeed.

Abstract: A resist is formed by sorption of an inorganic-containing gas into an organic material. The development of the resist occurs by exposure to a plasma (e.g., oxygen reactive ion etching) that forms a protective compound (e.g., a metal oxide) selectively in the resist. The selected regions can be defined by patterning radiation of various types, including visible, ultraviolet, electron beam, and ion beam. In an alternate embodiment, the selected regions are defined by an overlying resist, with the gas sorption protecting the underlying layer in a bilevel resist. The protective compound can protect the organic resist layer during etching of an underlying inorganic layer, such as metal, silicide, oxide, nitride, etc.

Abstract: A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formulae I and II:[(A--B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain of silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; ando, p, u and v each denote 0 or 1.

Abstract: A negative-working, radiation-sensitive composition comprising an admixture in a solvent of:(a) at least one cyclized rubber polymer,(b) at least one photoactive compound, and(c) an effective contrast enhancing amount of at least one rubber-soluble azo dye containing a reactive acrylate or methacrylate group of formula (I): ##STR1## wherein Q is a reactive group of the structure ##STR2## wherein Y is either H or CH.sub.3 ; wherein R.sub.1 is either H, CH.sub.3, C.sub.2 H.sub.5, CH.sub.2 CH.sub.2 CN, CH CH.sub.2 OH or Q;wherein R.sub.2 is either H, CH.sub.3, OCH.sub.3, or NHCOCH.sub.3 ;wherein R.sub.3 is either H, OCH.sub.3 or OC.sub.2 H.sub.5 ; andwherein X is selected from the group consisting of an unsubstituted or a substituted benzene, thiazole, thiophene, benzothiazole, benzoisothiazole, thiadiazole, and pyrazole moiety having, if substituted, 1-3 substituent groups selected from cyano, nitro, acetyl, and halogen groups; the amount of said cyclized rubber being about 90% to 99.

Abstract: A device for controlling cell arrangement having a pattern composed of a cell adhesive surface and a cell non-adhesive surface, which has a good selectivity of cell adhesion and which can provide a fine pattern of cells in high resolution by culturing cells in a usual manner.

Abstract: A photosensitive resin composition comprising:(a) a polymer dyeable with an anionic dye(b) an azide photosensitive compound, and(c) a compound having at least two acryloyl and/or methacryloyl groups in the same molecule thereof, and a color filter obtained by using the resin composition.

Abstract: Resist containing novolak prepared by condensating halogenated phenol represented by the following formula (III) and one or more phenol derivatives selected from the group consisting of cresol, xylenol, tet-butylphenol and propenylphenol, with a carbonyl compound ##STR1## wherein R.sub.3 is an halogen atom selected from the group consisting of F, Cl, and Br. If the resist is used as a positive-type one, it further contains a photo-sensitive agent, and R.sub.3 in the formula (III) is either F or Br. If the resist is used as a negative-type one, it further contains a photosensitive agent and/or a sensitizer, and R.sub.3 in the formula (III) is either Cl or Br.

Abstract: A positive-working photoresist composition is disclosed comprising an alkali-soluble resin and a 1,2-naphthoquinonediazido group-containing compound, and further contains at least one light absorber selected from the group consisting of the azo compounds represented by the following formulae (I), (II), (III), (IV), (V) and (VI) in a proportion of from about 0.1 to about 10% by weight based on the total solid content of the photoresist composition, and is useful for forming a fine pattern of excellent quality even on a substrate with unevenness or high reflectivity: ##STR1## wherein R.sub.1 represents a hydrogen atom or a lower alkyl group; and X represents a sulfur atom or an oxygen atom; ##STR2## wherein R.sub.2 represents a hydroxyl group or a di(lower alkyl)amino group; R.sub.3 and R.sub.4 each represents a hydrogen atom or a carboxyl group, provided that at least one of R.sub.3 and R.sub.4 represents a carboxyl group; and R.sub.

Abstract: A transfer recording medium is disclosed, comprising a light transmitting support having provided thereon a heat transfer solid ink layer via an interlayer having a photolyzable compound. The recording medium provides a clear and high-quality color image on an image-receiving sheet at high speed and low cost irrespective of surface smoothness of the image-receiving sheet.

Abstract: A presensitized plate for use in making a lithographic printing plate which comprises an aluminum substrate provided thereon with a light-sensitive layer comprising a polymer having at least two photodimerizable unsaturated double bonds in the molecule, wherein the light-sensitive layer further comprises a compound having at least one photodimerizable unsaturated double bond and at least one phosphinyl group in each molecule as well as a molecular weight of not more than 2,000. The presensitized plate shows excellent sensitivity and makes it possible to provide a lithographic printing plate showing high printing durability.

Abstract: Method of forming a positive-positive type image is disclosed, which is characterized in that a photosensitive layer is formed on a substrate using a composition comprising water-soluble photo-crosslinking agent, water-soluble resin and synthetic resin emulsion and further coloring agent, if necessary, said photosensitive layer is exposed to active rays through manuscript, then this is immersed into warm water of 30.degree. to 60.degree. C. for not less than 3 seconds to allow the exposed area to swell and soften sufficiently with warm water and simultaneously to allow almost all water-soluble photo-crosslinking agent in the nonexposed area to dissolve out into warm water, and successively the swollen and softened exposed area is rubbed out to form an image having no coloring originating from water-soluble photo-crosslinking agent without using the development chemicals except water.

Abstract: The invention relates to a photosensitive composition for direct dry negative color printing composition. The photosensitive composition comprises a binder containing a plurality of grains of a semiconductor material, each grain having adsorbed on its surface one of three different complexes of spiropyran with a metal salt, each complex being sensitive to a different wavelength of light, a cross-linkable polymer and free radical initiator. The composition and process enables photofinishing or printing from a negative.

Abstract: A photosensitive agent comprising an aromatic diazide compound represented by Formula (I) ##STR1## wherein X denotes ##STR2## Y denotes --CH.dbd.CH--, ##STR3## R.sub.1 is --CH.sub.2 CH.sub.2 --, R.sub.2 --CH.sub.2 CH.sub.3, R.sub.3 is hydrogen, m is 1, and n is 1,R.sub.6, R.sub.7, R.sub.8, R.sub.9, and R.sub.10 are individually hydrogen, alkyl, substituted alkyl, aryl, or two of R.sub.6 to R.sub.9 form alkylene groups, provided that R.sub.6 to R.sub.9 are not all hydrogen simultaneouslyand use of the photosensitive agent in a photosensitive composition and in a method forming forming an image.

Abstract: Printing plates having a photosensitive layer coated on a support wherein said photosensitive layer contains a powdered solid adhered to the surface of said plate by means of powdering followed by the application of heat or solvent before exposure. Said powders are capable of being removed from said surface during the developing process.

Abstract: A photosensitive material comprises:(I) an undercoat layer containing at least one alcohol-soluble polyamide;(II) an alcohol-insoluble barrier layer; and(III) a coloring material-containing photosensitive layer or a laminate of a coloring material layer and a photosensitive layer superposed in order on a support to form a laminate.

Abstract: An image forming material comprising a support, a coloring material-containing organic polymer layer and a photosensitive resin layer in order in the form of a laminate, wherein the organic polymer of the organic polymer layer comprises a copolymer of an aralkyl (meth)acrylate and (meth)acrylic acid.

Abstract: Substrates, e.g., silicon wafers, coated with a UV-curable organopolysiloxane composition including a crosslinking catalyst therefor (e.g., a platinum group metal compound) and an amount of a crosslinking inhibitor (e.g., an azodicarboxylate) which is effective at ambient temperature, but ineffective to prevent crosslinking on exposure of the composition to ultraviolet radiation, are well adapted for the imaging of negative intelligence patterns thereon.

Abstract: A light-sensitive printing plate for waterless planographic printing is disclosed comprising a support, a superimposed light-sensitive layer, an outer, ink-repellent silicone rubber layer, and an inner, ink-repellent silicone layer between the light-sensitive layer and the outer silicone rubber layer, the outer silicone rubber layer having a higher degree of crosslinking than the inner layer. The printing plate is less sensitive to scratching and, at the same time, shows good developability and image resolution.

Abstract: The undercoating composition of the invention, useful for providing an undercoating layer for a top coat of a photosensitive resist layer on a substrate surface, comprises, as a principal ingredient thereof, a condensation product obtained by the condensation reaction between a hydroxy-substituted diphenylamine and a melamine compound substituted on the nitrogen atoms with methylol groups and/or alkoxymethyl groups. The undercoating obtained of the composition is highly resistant against the attack by the overcoating solution applied thereon so that the fidelity of the pattern reproduction by the photolithographic technique is greatly improved by virtue of the absence of any disorder at the interface between the undercoating and top coat layers. The advantage is further increased when the undercoating composition further comprises a photoextinctive agent, e.g. a dye, having absorptivity in the wave length region where the photosensitive resist of the top coat has sensitivity.

Abstract: A light-sensitive composition comprises at least one polyuretane resin having repeating unit represented by formula (I) and/or repeating unit represented by formula (II) and which is insoluble in water and soluble in aqueous alkaline solution; and at least one positive-working light-sensitive compound: ##STR1## wherein R.sub.1 represents a bivalent aliphatic or aromatic hydrocarbon which may have a substituent; R.sub.2 represents hydrogen atom or an alkyl, an aralkyl, an aryl, an alkoxy or an aryloxy group which may be substituted with a substituent; R.sub.3, R.sub.4 and R.sub.5 may be the same or different and independently represent a single bond or a bivalent aliphatic or aromatic hydrocarbon group which may have a substituent and Ar represents a trivalent aromatic hydrocarbon group which may have a substituent.

Abstract: An improved overlay proofing film comprising a substantially transparent polyester base film which is first coated on one or both sides with a non-light sensitive composition having a refractive index of about 1.6, said non-light sensitive composition consisting essentially of a copolymer of polymethyl methacrylate and methacrylic acid.

Abstract: A novel photosensitive resin composition, which has fairly high sensitivity to light and developable with water comprising of essential components a resin represented by the general formula (I), ##STR1## wherein X, which may be present or absent, represents acetic acid when present, Y stands for a group containing carbon-carbon double bond(s) represented by the formula (II), ##STR2## n is an integer of 10 or greater, more than 0 and less than 1, and t is 0 or 1, and a sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), ##STR3## wherein z stands for sodium atom or potassium atom; or the resin represented by the general formula (I), the sodium or potassium salt of 4,4'-diazidostilbene-2,2'-disulfonic acid represented by the general formula (IV), and an aromatic ketone represented by the general formula (V), ##STR4## wherein G stands for hydrogen atom or an amino group or dialkylamino group represented by the general formula (VI), ##STR5## where u is 0,

Abstract: A thick polymer film containing an aromatic bisazide and/or an aromatic sulfonyl azide compound is formed on a substrate having topography level on its surface to flatten said surface and then heated or the whole surface thereof is exposed to a light. A mask pattern having a dry etching resistance higher than that of the polymer is formed on the polymer film, exposed parts of the polymer film are removed by the dry etching and the exposed parts of the film to be processed are removed to form a pattern.

Abstract: In a process for producing a support for a lithographic printing plate, at least one surface of an aluminum sheet is subjected to roughening treatment and subsequently to anodic oxidation treatment at a current density of at least 1 A/dm.sup.2 in an electrolytic solution containing 0.1 to 5% by weight of an alkaline electrolyte. Even if scratches are formed on non-image areas of a printing plate prepared from the support according to the invention, such scratches cause less stains on a printed matter.

Abstract: A dry photosensitive lithographic printing plate has a base, a photosensitive layer formed on the base and a silicone rubber layer formed on the photosensitive layer. The silicone rubber layer is formed from a silicon rubber composition containing an organopolysiloxane and a reactive aromatic aminosilane compound.

Abstract: An aluminum alloy support for lithographic printing plate comprising 0.05 to 0.5 wt. % of Fe, 0.1 to 0.9 wt. % of Mg, 0.01 to 0.3 wt % of V and/or Ni, not more than 0.2 wt. % of Si, not more than 0.05 wt. % of Cu and the remainder of Al and inevitable impurities is disclosed. In addition, 0.01-0.3 wt. % of Zr and/or 0.05-2 wt. % of Mn may be contained.

Abstract: The disclosed light-sensitive recording material is composed of an electrically conductive support, suitable for the production of printing forms or printed circuits, an a photoconductive layer system containing a photoconductor, a binder, a sensitizing dye and conventional additives. The photoconductive system comprises (A) a single photoconductive layer, or multiple layers, applied to the support and (B) a light-sensitive covering layer which contains at least one photochemically reactive compound. The use of the recording material in a process for the production of printing forms and printed circuits is also disclosed.

Abstract: A light-sensitive image-forming material which has on a support a coloring layer comprising a coloring agent and an alkali soluble organic macromolecular binder, and a photopolymer layer, in the order listed, with the coloring layer further containing a particular fluorine-containing surface active agent, whereby uniform film thickness is ensured to the coloring layer even when drying is carried out in a short time using simple equipment. The fluorine-containing surface active agent is a copolymer comprising as repeating units (1) an acrylate or a methacrylate which has a fluorinated alphatic group containing from 3 to 20 carbon atoms and not less than 40 wt % of fluorine atoms, with the aliphatic group having a terminal moiety containing at least 3 fluorinated carbon atoms, and (2) a poly(oxyalkylene)acrylate or a poly(oxyalkylene)methacrylate. In addition, the portion of the fluorinated aliphatic group-containing acrylate or methacrylate repeating unit is from 10 to 70% by weight.

Abstract: A dually photosensitive composition useful as a photoresist in the manufacture of ICs and the like electronic devices, which is positively photosensitive by exposure to ultraviolet in a relatively small dose but negatively photosensitive by exposure to ultraviolet in a substantially larger dose than above or by exposure to far ultraviolet light, is obtained by admixing a positive-type photoresist material comprising a novolac resin and an o-naphthoquinone diazide compound with a bisazide compound such as 4,4'-diazidodiphenyl sulfide. The inventive photosensitive composition provides a possibility of developing an ingenious technique for patterning of a photoresist layer on the substrate such as a checkboard-like patterned layer by use of a photomask of a line-and-space pattern.

Abstract: A photosensitive composition comprising (a) a photosensitive component such as an aromatic diazo compound or an aromatic azide, (b) a polymer and (c) a quaternary alkylammonium salt wherein each straight- or branched-chain alkyl group has 1 to 7 carbon atoms is suitable for producing a positive type or negative type photresist excellent in contrast and sensitivity in the microlithography of semiconductor elements.

Abstract: A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.

Abstract: A radiation-sensitive composition is described, which is comprised of (1) a polymer containing repeating units of the formula: ##STR1## wherein R.sup.1 is a trivalent or tetravalent aromatic or heteroaromatic residue having 6 to 30 carbon atoms, R.sup.2 is a divalent aromatic or heteroaromatic residue having 6 to 30 carbon atoms, R.sup.3 is hydrogen or an ammonium ion, n is 1 or 2, and COOR.sup.3 is located in an ortho or peri position with respect to the amide linkage, (2) an organic compound having a radiation-dimerizable or radiation-polymerizable olefinic double bond and an amino radical or a quaternary ammonium salt, and (3) an aromatic monoazide compound [III] having no substituent or having a neutral or acidic substituent. This composition has a highly improved radiation sensitivity and the sensitive wavelength region of this composition is very broad. This composition can give a highly heat-resistant relief pattern with a good edge sharpness.

Abstract: A metal base lithographic printing plate cleaned and treated by RF plasma to render the non-exposed area hydrophilic, then coated with either a negative working or positive working photosensitive coating. The method is characterized by its elimination of the conventional alkaline etch with attendant hazard, pollution and toxicity problems.