Polymeric Mixture Patents (Class 430/176)
  • Patent number: 6838222
    Abstract: A photopolymerizable composition that is cured with visible light or an infrared laser and is used as a recording layer in a negative planographic printing plate precursor. The photopolymerizable composition is cured by exposure and includes (A) a polymerizable compound that is solid at 25° C. and has at least one radical-polymerizable ethylenically unsaturated double bond in a molecule, (B) a radical polymerization initiator, (C) a binder polymer and, as required, (D) a compound generating heat by infrared exposure.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: January 4, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keitaro Aoshima, Kazuhiro Fujimaki
  • Patent number: 6830872
    Abstract: Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: December 14, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuyoshi Mizutani, Shiro Tan
  • Publication number: 20040241569
    Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: 1
    Type: Application
    Filed: May 28, 2003
    Publication date: December 2, 2004
    Applicant: Everlight USA, Inc.
    Inventors: Chi-Sheng Chen, Chan-Chan Tsai, Bin Jian, Hsin-Ming Liao
  • Patent number: 6824946
    Abstract: A lithographic printing plate precursor comprising a support having a hydrophilic surface having provided thereon an image-forming layer containing a hydrophobic high molecular compound having at least either a functional group represented by formula (1) or a functional group represented by formula (2): wherein X+ represents an iodonium ion, a sulfonium ion or a diazonium ion.
    Type: Grant
    Filed: September 28, 2001
    Date of Patent: November 30, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hidekazu Oohashi, Kazuto Shimada
  • Patent number: 6824947
    Abstract: Photosensitive compositions comprising a phenol resin having a urea bond in the main chain, planographic printing plate precursors containing the photosensitive compositions, and methods for preparing planographic printing plates using the planographic printing plate precursors are disclosed. Planographic printing plates that exhibit good durability, good exposure visual image property, and good solvent resistance; particularly superior resistance to washing oil used in UV ink printing; and superior baking property are produced.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: November 30, 2004
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Yasuhiro Ishizuka, Yasuhiko Kojima
  • Patent number: 6818372
    Abstract: A lithographic printing plate precursor comprising a hydrophilic support having provided thereon an image-forming layer containing a radical initiator, an infrared absorbing dye, and at least one component selected from fine particles containing a radical polymerizable compound having the specific structure and microcapsules encapsulating a radical polymerizable compound having the specific structure.
    Type: Grant
    Filed: March 7, 2002
    Date of Patent: November 16, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Kunita, Hiromitsu Yanaka
  • Patent number: 6808857
    Abstract: The present invention provides a negative-working photosensitive composition which can widen the preheat latitude upon exposure without increasing ablation, and a negative-working photosensitive lithographic printing plate. The negative-working photosensitive composition comprises (a) an alkali-soluble resin, (b) a compound capable of being crosslinked by an acid, (c) a compound capable of generating an acid by heat, (d) a photothermal converting agent, and (e) a sulfone compound represented by the following general formula (I). R—SO2—R′  (I) wherein R and R′ may be the same or different and represent a substituted or non-substituted alkyl, alkenyl, aryl, or heterocyclic group. The negative-working photosensitive lithographic printing plate comprises a photosensitive layer made of the negative-working photosensitive composition.
    Type: Grant
    Filed: May 20, 2002
    Date of Patent: October 26, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Yasushi Miyamoto, Eiji Hayakawa
  • Patent number: 6808858
    Abstract: The present invention relates to a light-sensitive composition containing: (i) at least one diazonium polycondensation product or at least one system that can be radically polymerized and consists of photoinitiators and unsaturated compounds which can be radically polymerized or at least one hybrid system consisting of a diazonium polycondensation product and a system that can be radically polymerized and consists of photo initiators and unsaturated compounds which can be radically polymerized, (ii) at least one binding agent and optionally one or more exposure indicators, one or more dyes for increasing the image contrast and one or more acids for stabilizing the light-sensitive composition which is characterized in that the binding agent essentially consists of units (A, B, C, D), whereby A corresponds to formula (I), B corresponds to formula (II), C corresponds to formula (III) and D corresponds to formula (IV). The invention also relates to the use thereof for coating printing plates.
    Type: Grant
    Filed: December 10, 2002
    Date of Patent: October 26, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Robert Fuss, Harald Baumann, Udo Dwars, Hans-Joachim Timpe
  • Patent number: 6806020
    Abstract: The present invention provides a thermally imageable composition, which includes an acid curable composition, an acid generator, a strong acid and optionally an infrared absorber. The present invention further provides an imageable element, which includes a substrate and a thermally imageable composition according to the present invention coated on a surface of the substrate. Also provided are methods of producing an imaged element according to the present invention.
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: October 19, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Neil Haley, John Kalamen
  • Publication number: 20040180291
    Abstract: A method for forming images useful as lithographic printing plate precursors is disclosed. An imageable element in which the imageable layer comprises an acid generator, a crosslinking agent, and a binder is imaged with ultraviolet radiation and developed with a solvent based developer. The acid generator is an iodonium, sulfonium, or diazonium salt in which the anion is an organic sulfate or thiosulfate anion. The binder comprises a copolymer that contains a reactive pendent group capable of undergoing acid crosslinking, in which the reactive pendent group is hydroxyl, carboxylic acid, sulfonamide, alkoxymethyl, or a mixture thereof. The method is especially suited for use with direct digital ultraviolet imaging devices. The resulting image is useful as a lithographic printing plate.
    Type: Application
    Filed: November 21, 2003
    Publication date: September 16, 2004
    Inventors: Jeffrey Collins, Thomas Jordan, Joanne Ray, Ting Tao, Chris McCullough, Scott A. Beckley, Jianbing Huang
  • Publication number: 20040180283
    Abstract: Imageable elements with improved dot stability are disclosed. The imageable elements comprise a layer of an imageable composition over a support. The imageable composition comprises an infrared absorbing compound, an acid generator, an acid activatable crosslinking agent, a polymeric binder, and about 0.01 wt % to 1 wt % of an added onium compound. The elements may be thermally imaged and developed to produce images useful as lithographic printing plates.
    Type: Application
    Filed: March 10, 2003
    Publication date: September 16, 2004
    Inventors: Ting Tao, Jeffrey James Collins, Thomas Jordan, Scott A. Beckley
  • Patent number: 6790580
    Abstract: A resist material is made of a polymer or copolymer having a cyclic hydrocarbon as a skeletal structure and an alkali-soluble group to which a protective group is attached as a side chain. Because of the protective group, the resist material is insoluble in alkali solution. In addition, an acid generating agent is added to the resist material. When the acid generating agent is irradiated with a radiation ray, an acid is generated from the acid generating agent, and the protective group is detached from the alkali-soluble group by the function of the acid. Therefore, a resist film made of the resist material can be formed in a desired pattern by irradiating the resist film with the radiation ray.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: September 14, 2004
    Assignee: Fujitsu Limited
    Inventor: Satoshi Takechi
  • Patent number: 6787281
    Abstract: An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III). wherein R1 is selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group; wherein X is selected from the group consisting of oxygen, sulfur and selenium; wherein Y is selected from the group consisting of sulfur, selenium and tellurium; wherein Ar1 is selected from the group consisting of an unsubstituted and substituted aryl group; wherein R2, R3 and R4 are individually selected from the group consisting of an unsubstituted and substituted hydrocarbon or aryl group or any two of them are bonded together to form a ring structure; and wherein R5 and R6 are individually selected from the group of an unsubstituted and substituted hydrocarbon or aryl group, or are bonded to each other to form a ring structure.
    Type: Grant
    Filed: May 24, 2002
    Date of Patent: September 7, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ting Tao, Jianbing Huang
  • Patent number: 6783913
    Abstract: Polymeric acetal resins useful in lithographic printing are disclosed. The polymeric acetal resin contains units (A), (B), (C), (D), and (E). Unit (A) is a vinyl alcohol unit. Unit; (B) is a polyvinyl acetal unit containing an R group, where R is hydrogen, an aliphatic group, an aromatic group, or an arylaliphatic group. Unit (C) is a vinyl carboxylate unit. Unit (D) is an acidic vinyl acetal unit and/or a residue of an acidic vinyl monomer. Unit (E) is a free radical polymerization-inhibiting vinyl acetal unit and/or a free radical polymerization-inhibiting vinyl alcohol ester unit. The resin comprises about 10 to about 60 mol % of unit (A), about 5 to about 60 mol % of unit (B), about 0.3 to about 30 mol % of unit (C), about 1 to about 40 mol % of unit (D), and about 0.01 to about 2 mol % of unit (E).
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: August 31, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Hans-Horst Glatt, Udo Dwars, Harald Baumann, Ingrid Glatt
  • Publication number: 20040166433
    Abstract: The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, 1
    Type: Application
    Filed: December 17, 2003
    Publication date: August 26, 2004
    Inventors: Ralph R. Dammel, Raj Sakamuri
  • Patent number: 6777155
    Abstract: A photosensitive lithographic printing plate comprising: a support; and a photosensitive layer, wherein the photosensitive layer comprises: a polyurethane resin binder comprising an aliphatic cyclic structure which has a carboxyl group as a substituent directly or indirectly attached to the structure; or a polyvinyl alcohol resin binder modified with an acetal skeleton comprising an aliphatic cyclic structure.
    Type: Grant
    Filed: November 6, 2001
    Date of Patent: August 17, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yasuhito Oshima
  • Publication number: 20040146800
    Abstract: A planographic printing plate precursor of the present invention includes a hydrophilic support, and a lower layer and an image recording layer disposed on the hydrophilic support in this order. The lower layer includes a water-insoluble and alkali-soluble resin, and wherein the image recording layer includes a novolak type phenolic resin containing phenol as a structural unit thereof and a light-to-heat conversion agent, and exhibits increased solubility in an alkaline aqueous solution when exposed to an infrared laser.
    Type: Application
    Filed: January 20, 2004
    Publication date: July 29, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kotaro Watanabe, Kaoru Iwato, IKuo Kawauchi
  • Publication number: 20040142272
    Abstract: This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.
    Type: Application
    Filed: November 24, 2003
    Publication date: July 22, 2004
    Inventors: Tsing-Tang Song, Chih-Shin Chuang, Wei-Chan Tseng, Kuen-Yuan Hwang, Tsung-Yu Chen
  • Publication number: 20040131973
    Abstract: Methods for forming images are disclosed. The images are formed by imaging and developing an imageable element comprising a layer of an imageable composition over a substrate.
    Type: Application
    Filed: January 3, 2003
    Publication date: July 8, 2004
    Inventors: Ting Tao, Jeffrey James Collins, Thomas Jordan
  • Publication number: 20040106063
    Abstract: Although use of a nitrogen-containing compound as a basic compound component of a resist composition makes it possible to ease the T-top problem at an acid dissociation constant pKa falling within a range of 2 to 6, it is accompanied with the problem that the reaction, that is, acid diffusion upon use of a highly-reactive acid-labile group cannot be controlled. In order to overcome this problem, one or more basic compounds selected from those represented by the following formulas (I) to (III) and (1) to (4) are employed.
    Type: Application
    Filed: July 9, 2003
    Publication date: June 3, 2004
    Inventors: Jun Hatakeyama, Youichi Ohsawa, Takeru Watanabe
  • Publication number: 20040091810
    Abstract: The present invention relates to a microcapsule produced by using at least an isocyanate compound, a heat-sensitive recording material including the microcapsules and a multicolor heat-sensitive recording material including the microcapsules, wherein the isocyanate compound is a reaction product of an isocyanate compound with a polyether derivative.
    Type: Application
    Filed: October 28, 2003
    Publication date: May 13, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Masatoshi Yumoto, Takashi Tamura, Koreshige Ito
  • Patent number: 6733948
    Abstract: A negative image-recording material which can be imagewise exposed to IR radiation from IR lasers and ensures direct image formation from digital data of a computer or the like. The material, when used in a lithographic printing plate, ensures good hardenability in an image area and exhibits good printing durability, even if not heated for image formation, and ensures a large number of good prints from the printing plate. The recording material contains (A) an IR absorber, (B) a radical generator having an onium salt structure, (C) a radical-polymerizing compound, and (D) a reducing additive, and this is imagewise exposed to IR radiation for image formation. Preferably, the reducing additive (D) is highly reactive with radicals and a reaction product with a radical has high reductivity. Preferred examples of the reducing additive are ether-type hydrogen donors, alcohol-type hydrogen donors, vinyl ethers and phosphine-type compounds.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: May 11, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ippei Nakamura, Tadahiro Sorori
  • Publication number: 20040081914
    Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): 1
    Type: Application
    Filed: July 28, 2003
    Publication date: April 29, 2004
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Genji Imai, Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto
  • Patent number: 6727034
    Abstract: The present invention is related to a photosensitive composition which comprises 70 to 99 weight % of a vinyl polymer (A) comprising recurring units derived from a monomer (a) of the following general formula (1) and 1 to 30 weight % of at least one photosensitive compound (B) selected from the group consisting of azide compounds and diazo compounds.
    Type: Grant
    Filed: May 14, 1999
    Date of Patent: April 27, 2004
    Assignee: Sanyo Chemical Industries, Ltd.
    Inventors: Naohito Ogiso, Tetsuya Watanabe, Tetsuya Yamada
  • Patent number: 6723495
    Abstract: Negative-working, water-developable imageable elements, useful as printing plate precursors, and methods for their use, are disclosed. The elements can be imaged with ultraviolet radiation, with infrared radiation, or with heat. The elements contain an imageable composition that contains a latent Brönsted acid, a water-soluble or water-dispersible binder, and an acid-activated cross-linking agent.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: April 20, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Kevin Ray, Paul Kitson
  • Patent number: 6720125
    Abstract: The present invention provides an image recording material onto which images can be recorded with an infrared ray, the material comprising an infrared absorbent (A), a radical-generating agent (B) and a radically polymerizable compound (C), wherein the infrared absorbent is a cyanine dye in which at least one substituent on a nitrogen atom in a heterocyclic ring at each end forms a cyclic ring which includes a methine chain.
    Type: Grant
    Filed: June 24, 2002
    Date of Patent: April 13, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Ippei Nakamura, Kazuhiro Fujimaki
  • Patent number: 6716566
    Abstract: There is provided a negative planographic printing plate which can be directly recorded based on digital data from computers and the like, excellent in storage stability, shows no reduction in sensitivity with the lapse of time, and has excellent face flatness. It comprises a substrate having disposed thereon a photosensitive layer which is obtained by applying a photosensitive layer application solution containing an infrared absorber, a compound which generates a radical or acid due to heat, a polymerizable compound or a crosslinking compound, and a silicon-based surfactant such as a siloxane/oxyethylene copolymer and the like, onto the substrate and drying the solution, and which is hardened by exposure to an infrared laser ray.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: April 6, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Keitaro Aoshima
  • Publication number: 20040063022
    Abstract: The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1. Upon imagewise exposure and development, an imaged element is obtained.
    Type: Application
    Filed: September 17, 2003
    Publication date: April 1, 2004
    Applicant: Kodak Polychrome Graphics, LLC.
    Inventors: Stephan J. Platzer, Maria T. Sypek, Paul Perron, Harald Baumann, Melinda Alden
  • Patent number: 6709800
    Abstract: A presensitized plate for preparing a lithographic printing plate comprises a substrate provided thereon with a light-sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (A) an addition polymerizable monomer having, on a side chain, a fluoro-aliphatic group in which hydrogen atoms are replaced with fluorine atoms and (B) a (meth)acrylate having an ester chain represented by a specific general formula. The use of the foregoing specific fluorine atom-containing polymer permits the formation of a light-sensitive layer having uniform surface condition without causing abnormality in the surface quality due to the foaming phenomenon observed during the production and also permits the production of a positive light-sensitive resin composition having excellent solubility and dispersibility in a developer.
    Type: Grant
    Filed: August 5, 2002
    Date of Patent: March 23, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuo Fujita, Shiro Tan
  • Patent number: 6667142
    Abstract: The invention relates to a recording material having a substrate and a negative-working, radiation-sensitive layer which contains a diazonium salt, at least one film-forming, polymeric binder and organic colored pigments, on the surface of which an organic polymeric dispersant has been adsorbed and which are additionally dispersed in an organic polymeric binder which does not permanently combine with the pigments chemically or physically. The dispersant generally has groups, in particular primary, secondary or tertiary amino groups or derivatives thereof, which act as anchor groups on the colored pigment particles. The pigments themselves are preferably phthalocyanine pigments. As a result of the predispersing, aggregation of the pigment particles is effectively prevented so that uniform coloration of the radiation-sensitive layer is achieved. During development of the imagewise exposed recording materials, the colored pigment particles form virtually no insoluble precipitates.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: December 23, 2003
    Assignee: AGFA-Gevaert
    Inventors: Michael Dörr, Andreas Elsässer
  • Publication number: 20030232277
    Abstract: A positive resist composition comprising:
    Type: Application
    Filed: April 25, 2003
    Publication date: December 18, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Tomoya Sasaki, Kazuyoshi Mizutani, Shinichi Kanna
  • Publication number: 20030224281
    Abstract: Photosensitive compositions comprising a phenol resin having a urea bond in the main chain, planographic printing plate precursors containing the photosensitive compositions, and methods for preparing planographic printing plates using the planographic printing plate precursors are disclosed. Planographic printing plates that exhibit good durability, good exposure visual image property, and good solvent resistance; particularly superior resistance to washing oil used in UV ink printing; and superior baking property are produced.
    Type: Application
    Filed: February 19, 2003
    Publication date: December 4, 2003
    Inventors: Yasuhiro Ishizuka, Yasuhiko Kojima
  • Patent number: 6656660
    Abstract: A resist composition comprising (a) at least two kinds of polymers which become alkali-soluble by the action of an acid, (b) as a photoacid generator, a combination of an alkylsulfonyl diazomethane compound and a triarylsulfonium arylsulfonate compound or a diaryliodonium arylsulfonate compound, and (c) a solvent is excellent as a chemically amplified resist composition to give excellent pattern shape and very fine line-and-space, particularly when exposed to lights having a wavelength of 300 nm or less.
    Type: Grant
    Filed: January 27, 2000
    Date of Patent: December 2, 2003
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Fumiyoshi Urano, Hirotoshi Fujie, Naoki Takeyama, Koji Ichikawa
  • Publication number: 20030219673
    Abstract: An acid generating agent useful for imaging photosensitive elements selected from compounds of formulae (I), (II) and (III).
    Type: Application
    Filed: May 24, 2002
    Publication date: November 27, 2003
    Inventors: Ting Tao, Jianbing Huang
  • Patent number: 6653044
    Abstract: A chemical amplification type resist composition uses as the base resin a polymer having a molecular weight dispersity of 1.0 to 1.5 which is a polymer comprising recurring units of formula (1) and recurring units of formula (2) or a polymer comprising recurring units of formula (2) wherein R1 is alkyl, alkoxyalkyl, acetyl or carbonylalkoxy, 0<p/(p+q)≦1, R2 is hydrogen or methyl, and R3 is a tertiary hydrocarbon group of 4 to 30 carbon atoms. By virtue of the narrow dispersity effect of the polymer, the resist composition is improved in resolution as compared with prior art base resins having a wide dispersity. Advantages including a high resolution, good pattern profile and storage stability are obtained.
    Type: Grant
    Filed: January 17, 2001
    Date of Patent: November 25, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takanobu Takeda, Osamu Watanabe, Jun Watanabe, Jun Hatakeyama, Tsunehiro Nishi, Takeshi Kinsho
  • Publication number: 20030207202
    Abstract: The present invention provides a copolymer comprising repeating units derived from (A) at least one fluoroalkyl (meth) acrylate represented by the following general formula (I) or (II): 1
    Type: Application
    Filed: January 29, 2003
    Publication date: November 6, 2003
    Applicant: Fuji Photo Film Co., Ltd.
    Inventors: Kazuo Fujita, Shiro Tan
  • Publication number: 20030203305
    Abstract: A negative resist composition comprising (A-1) an alkali-soluble resin containing a repeating unit represented by formula (1) defined in the specification, (A-2) an alkali-soluble resin containing a repeating unit represented by formula (2) defined in the specification, (B) a crosslinking agent crosslinking with the alkali-soluble resin (A-1) or (A-2) by the action of an acid, (C) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (D) a nitrogen-containing basic compound.
    Type: Application
    Filed: March 26, 2003
    Publication date: October 30, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Shoichiro Yasunami, Yutaka Adegawa, Koji Shirakawa
  • Patent number: 6638679
    Abstract: The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: October 28, 2003
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Stephan J. Platzer, Maria T. Sypek, Paul Perron, Harald Baumann, Melinda Alden
  • Publication number: 20030194635
    Abstract: The present invention provides a positive working imageable composition, which includes a hydroxyfunctional resin comprising a covalently bound radiation sensitive group capable of increasing the solubility of the imageable composition in an alkaline developer upon exposure to radiation; and an isocyanate crosslinking agent. The present invention further provides an imageable element, which includes a substrate and an imageable composition according to the present invention coated on a surface of the substrate and a method of producing an imaged element according to the present invention. Also provided is a radiation sensitive hydroxyfunctional resin including a covalently bound radiation sensitive group capable of increasing solubility in an alkaline developer of an imageable composition derived therefrom upon exposure of the imageable composition to radiation.
    Type: Application
    Filed: January 24, 2002
    Publication date: October 16, 2003
    Applicant: KODAK POLYCHROME GRAPHICS, L.L.C.
    Inventor: James Mulligan
  • Publication number: 20030190554
    Abstract: A plate-making method of a printing plate comprising exposing a printing plate precursor having a photosensitive layer comprising a photopolymerizable composition containing (i) a crosslinking agent having two ethylenic polymerizable groups and (ii) a crosslinking agent having three or more ethylenic polymerizable groups, and development processing the exposed printing plate precursor with an alkali developer having a pH of not more than 12.5.
    Type: Application
    Filed: August 29, 2002
    Publication date: October 9, 2003
    Inventor: Kazuto Kunita
  • Patent number: 6630285
    Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): where R1 and R3 are each independently hydrogen or methyl and R2 is C1-C6 straight or branched unsubstituted alkyl or C1-C6 straight or branched substituted alkyl, wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: October 7, 2003
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Genji Imai, Ritsuko Fukuda, Toshiro Takao, Keiichi Ikeda, Yoshihiro Yamamoto
  • Publication number: 20030180654
    Abstract: The present invention relates to a light-sensitive composition containing: (i) at least one diazonium polycondensation product or at least one system that can be radically polymerized and consists of photoinitiators and unsaturated compounds which can be radically polymerized or at least one hybrid system consisting of a diazonium polycondensation product and a system that can be radically polymerized and consists of photo initiators and unsaturated compounds which can be radically polymerized, (ii) at least one binding agent and optionally one or more exposure indicators, one or more dyes for increasing the image contrast and one or more acids for stabilizing the light-sensitive composition which is characterized in that the binding agent essentially consists of units (A, B, C, D), whereby A corresponds to formula (I), B corresponds to formula (II), C corresponds to formula (III) and D corresponds to formula (IV). The invention also relates to the use thereof for coating printing plates.
    Type: Application
    Filed: December 10, 2002
    Publication date: September 25, 2003
    Inventors: Robert Fuss, Harald Baumann, Udo Dwars, Hans-Joachim Timpe
  • Patent number: 6623903
    Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises a conductivity enhanced outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a monodiazonium salt capable upon exposure of reducing the conductivity of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer and a method of making an electroconductive pattern.
    Type: Grant
    Filed: June 18, 2002
    Date of Patent: September 23, 2003
    Assignee: AGFA-Gevaert
    Inventor: Johan Lamotte
  • Patent number: 6613844
    Abstract: A chemically amplified positive resist composition comprising a styrene polymer represented by formula (1), terminated with P, and having a weight average molecular wherein R is OH or OR3, R1 is H or CH3, R2 is alkyl, R3 is acid labile group, x≧0, y>0, k≧0, m≧0, n>0, 0<q≦0.8, p+q=1, P is H, alkyl, alkenyl, aromatic, carboxyl, OH, —R4(COR5)r, —R4O(OH)r or —R4 (OR5)r. A chemically amplified positive resist composition comprising the polymer as a base resin has high sensitivity and resolution and forms resist patterns having plasma etching resistance, heat resistance, and reproducibility.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: September 2, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Osamu Watanabe, Shimada Junji, Nagura Shigehiro, Takeda Takanobu
  • Publication number: 20030162121
    Abstract: The invention provides a negative image recording material comprising: a support and an image recording layer disposed on the support, the image recording layer comprising an amide-acid compound containing a carboxyl group and an amide group expressed by the following General Formula (1): 1
    Type: Application
    Filed: December 31, 2002
    Publication date: August 28, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Keitaro Aoshima
  • Patent number: 6596456
    Abstract: Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates. The copolymer contains about 25 to 55 mol % of unit A which has the formula The copolymer contains about 0.5 to 25 mol % of unit B which has the formula wherein R1 is selected from the group consisting of alkyl, aryl and aralkyl. The copolymer contains about 0.5 to 40 mol % of unit C which has the formula wherein X is an aliphatic or aromatic spacer group, and Ac is an acidic group selected from the group consisting of —COOH, —SO3H, —SO2NR9R10 with R9 and R10 independently being selected from hydrogen and alkyl; and when X is phenylene, Ac can also be OH.
    Type: Grant
    Filed: April 11, 2002
    Date of Patent: July 22, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Harald Baumann, Michael Flugel, Eduard Kottmair
  • Publication number: 20030129524
    Abstract: A photopolymerizable composition which comprises (A) a polymerizable compound having at least one radical-polymerizable ethylenically unsaturated double bond per molecule and a cohesive energy density of not smaller than 500 J/cm3, (B) a radical polymerization initiator and (C) a binder polymer and cures when exposed to light.
    Type: Application
    Filed: September 10, 2002
    Publication date: July 10, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Hiromitsu Yanaka
  • Publication number: 20030129526
    Abstract: The present invention provides an imageable composition, which includes a bottom layer including a first strong, non-volatile acid having a pKa of not more than about 8 and coated thereon a top layer including an acid curable composition, an acid generator, an infrared absorber and optionally a colorant. The present invention further provides an imageable element, which includes a substrate and an imageable composition according to the present invention coated on a surface of the substrate. Also provided is method of producing an imaged element according to the present invention.
    Type: Application
    Filed: January 22, 2002
    Publication date: July 10, 2003
    Applicant: KODAK POLYCHROME GRAPHICS, L.L.C.
    Inventors: Neil Haley, John Kalamen
  • Publication number: 20030113655
    Abstract: The present invention provides an imageable composition, which includes an acid curable composition, an acid generator, an infrared absorber, optionally a colorant, such as, a colorant dye or colorant pigment, wherein at least one of the infrared absorber and the colorant has a counter anion derived from a non-volatile acid, and further optionally, a strong acid. The present invention further provides an imageable element, which includes a substrate and an imageable composition according to the present invention coated on a surface of the substrate. Also provided is method of producing an imaged element according to the present invention.
    Type: Application
    Filed: August 21, 2001
    Publication date: June 19, 2003
    Applicant: Kodak Polychrome Graphics, L.L.C
    Inventors: Eiji Hayakawa, Jianbing Huang, Thomas Jordan, Yasushi Miyamoto, Jeffrey Collins
  • Patent number: RE38256
    Abstract: Disclosed are a safe slurry photosensitive composition superior in image formation capabilities such as resolution and sensitivity and containing no harmful compound, and a safe water-soluble photosensitive composition capable of being dissolved in water without using any organic solvent while maintaining a sufficient sensitivity as a resist and containing no harmful substance. The slurry photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, at least one type of a resin with acid-crosslinkability or acid-decomposability, and a powder. Various devices can be manufactured by forming a layer of this photosensitive composition on a substrate, exposing the layer to light in accordance with a desired pattern, and heating the layer. The water-soluble photosensitive composition contains a compound which generates an acid when irradiated with light or ionizing radiation, and an acetal resin.
    Type: Grant
    Filed: November 24, 1999
    Date of Patent: September 23, 2003
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Toru Ushirogouchi, Naomi Shida, Takuya Naito, Koji Asakawa, Akinori Hongu, Makoto Nakase, Hirokazu Niki