Abstract: The invention relates to a pigment dispersion which contains at least one polymer containing polyvinyl alcohol, polyvinyl ether an/or polyvinyl acetal units and at least one polymer based on acrylate, wherein the weight ratio is generally 1:10 to 10:1, preferably 4:1 to 1:4. This dispersion is used in positive- or negative-working and reversible photosensitive mixtures for the preparation of recording materials.

Abstract: This patent describes an on-press developable thermosensitive lithographic plate having on a substrate a thermosensitive layer comprising an ethylenically unsaturated monomer, an infrared absorbing dye, and an onium or borate salt free radical initiator. The plate can be imagewise exposed with an infrared laser on a plate exposure device, and then mounted on a lithographic press for on-press development with ink and/or fountain solution and lithographic printing. No regular development process with a liquid developer is needed after exposure. Alternatively, the plate can be imagewise exposed with an infrared laser while mounted on a plate cylinder of a lithographic press, on-press developed with ink and/or fountain solution, and then print images to the receiving sheets.

Abstract: Copolymers containing the units A, B, C, D and optionally E are used to prepare radiation sensitive compositions and lithographic printing plates.

Abstract: A photosensitive composition comprising a resin containing a repeating unit corresponding to a monomer having a structure represented by formula (I) defined in the specification, and a negative working lithographic printing plate having a negative working photosensitive layer comprising the above-described photosensitive composition.

Abstract: A method of manufacturing a selectively relief-treated image member that comprises: (a) providing a precursor of the image member, the precursor comprising a surface having an image-forming layer comprising a photosensitive resist composition comprising: (i) a polymerizable material, and (ii) a binder; (b) delivering radiation image-wise to the precursor; (c) developing the precursor in a developer in order to selectively remove the image-forming layer in regions to which said radiation was not delivered image-wise in step (b); and (d) contacting the image-wise exposed precursor with a relief-treatment material, in order to selectively relief-treat regions of the surface of the precursor in which the image-forming layer was removed on development in step (c).

Abstract: The present invention provides a negative-working photosensitive composition which can widen the preheat latitude upon exposure without increasing ablation, and a negative-working photosensitive lithographic printing plate. The negative-working photosensitive composition comprises (a) an alkali-soluble resin, (b) a compound capable of being crosslinked by an acid, (c) a compound capable of generating an acid by heat, (d) a photothermal converting agent, and (e) a sulfone compound represented by the following general formula (I).

Abstract: This invention relates to a photosensitive element for use as a flexographic printing plate and a process for preparing the plate from the element. The photosensitive element has at least one photopolymerizable elastomeric layer that comprises a binder, a monomer, a photoinitiator, an onium salt, and a leuco dye. Upon exposure to actinic radiation, the onium salt and leuco dye react resulting in a change of color in polymerized portions of the photopolymerizable layer. The color change provides enhanced image color contrast in the photosensitive element.

Abstract: This patent describes an on-press developable thermosensitive lithographic plate having on a substrate a thermosensitive layer comprising an ethylenically unsaturated monomer, an infrared absorbing dye, and an onium or borate salt free radical initiator. The plate can be imagewise exposed with an infrared laser on a plate exposure device, and then mounted on a lithographic press for on-press development with ink and/or fountain solution and lithographic printing. No regular development process with a liquid developer is needed after exposure. Alternatively, the plate can be imagewise exposed with an infrared laser while mounted on a plate cylinder of a lithographic press, on-press developed with ink and/or fountain solution, and then print images to the receiving sheets.

Abstract: A positive resist composition comprising the components of: (A) a resin having an aliphatic cyclic hydrocarbon group on its side chain and being capable of increasing the solubility in an alkali developer by an action of acid; and (B) a compound being capable of generating an acid by irradiation with one of an actinic light and radiation, wherein the component (A) is a resin comprising at least one of repeating unit having a partial structure comprising an alicyclic hydrocarbon represented by one of the following general formulae (pI) to (pVI), and the content of the repeating units corresponding to an acrylic monomer is from 5 to 45 mol % based on the total of the repeating units.

Abstract: A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.

Abstract: A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

Abstract: A negative-working lithographic printing plate has a coating which is imaged by heating an area of the coating with an infrared laser and actinically reacting the coating in the heated area with ultraviolet or visible radiation. The coating contains an infrared absorber but the coating is not imageable by infrared radiation or by the heat generated. The imaging time is reduced since the actinic reaction rate is increased at the elevated temperature.

Abstract: Provided is a positive photoresist composition which comprises (A) a resin which contains a repeating unit represented by formula (I) shown below and a repeating unit represented by formula (II) shown below and whose solubility in an alkaline developing solution increases by the action of an acid and (B) a compound which generates an acid upon irradiation with an actinic ray or radiation, wherein R1, R2 and R3 each independently represents an alkyl group, a haloalkyl group, a halogen atom, an alkoxy group, a trialkylsilyl group or a trialkylsilyloxy group; and n represents 0 or 1, wherein M represents an atomic group necessary for forming an alicyclic structure, which may be substituted, together with the connected two carbon atoms (C—C); and R11 and R12 each independently represents a hydrogen atom, a cyano group, a halogen atom or an alkyl group which may be substituted.

Abstract: The present invention relates to a positive type image forming material comprising A: an alkali-aqueous-solution-soluble polymer compound having a phenolic hydroxyl group, B: a light and heat decomposing compound which suppresses alkali-aqueous-solution-solubility of said alkali-aqueous-solution-soluble polymer compound (A) having a phenolic hydroxyl group and is decomposed by light or heat to lose its alkali-aqueous-solution-solubility-suppressing effect on said compound (A), and C: a cross-linkable compound which increases said solubility-suppressing effect of said compound (B) when used together with said component (B) in a composition containing the alkali-aqueous-solution-soluble polymer compound (A) having a phenolic hydroxyl group, and which has in its molecule two or more cross-linkable groups which are cross-linked with the alkali-aqueous-solution-soluble polymer compound (A) with heating.

Abstract: The present invention provides a photosensitive lithographic printing plate with a long press life, high sensitivity, and excellent storage stability, and a photosensitive composition for a lithographic printing plate for producing such a photosensitive lithographic printing plate. The photosensitive composition for the lithographic printing plate includes (A) a binder resin, (B) a diazo resin, (C) a monomer or oligomer, a molecule of which has at least two polymerizable ethylenically unsaturated double bonds, (D) a photopolymerization initiator, (E) an o-tert-butylphenol derivative, and (F) a 2-mercaptoimidazole derivative such as 2-mercaptobenzimidazole.

Abstract: The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1.

Abstract: The invention resides in a photosensitive composition for screen printing. Preferably, the composition of the invention comprises a polymer comprising a vinylpyridine monomer or polymer having a pyridinium salt character and a photoreactable constituent. The resulting stencil, once dried, exposed, cured, and subjected to alkaline treatment obtains enhanced solvent/water resistance but can be reclaimed using an acidic wash. In use, the stencil provides a screen/stencil assembly or blockout utility of high structural integrity through repeated use and screen printing images of high resolution and quality.

Abstract: A photopolymerizable composition that is cured with visible light or an infrared laser and is used as a recording layer in a negative planographic printing plate precursor. The photopolymerizable composition is cured by exposure and includes (A) a polymerizable compound that is solid at 25° C. and has at least one radical-polymerizable ethylenically unsaturated double bond in a molecule, (B) a radical polymerization initiator, (C) a binder polymer and, as required, (D) a compound generating heat by infrared exposure.

Abstract: A novel fluorinated aromatic acetal polymer comprises at least one unit of A and at least one unit of B or C, or at least one unit of each of A, B and C and optionally further comprises at least one unit of either D or E or at least one unit of each of D and E, wherein the units A and B and/or C, and optionally D and/or E are linked together by single covalent C-C bonds and have the formulae: 1

Abstract: A novel fluorinated aromatic acetal polymer comprises at least one unit of A and at least one unit of B or C, or at least one unit of each of A, B and C and optionally further comprises at least one unit of either D or E or at least one unit of each of D and E, wherein the units A and B and/or C, and optionally D and/or E are linked together by single covalent C—C bonds and have the formulae: wherein RA is H or C1-C11 alky, or an aryl group that does not contain fluorine, and RB and RC are an aryl groups that contain fluorine. The polymer is prepared by reacting a hydrolyzed polyvinyl acetate polymer or copolymer with at least one non-fluorinated aldehyde component, and at least one fluorinated aromatic component. The polymer is useful is preparing a photosensitive composition which comprises at least one diazo resin and at least one such fluorinated aromatic acetal polymer.

Abstract: The invention relates to a recording material having a dimensionally stable, two-dimensional support, preferably an aluminium support, and a negative-working, radiation-sensitive layer which comprises a diazonium salt, a polymeric binder and a sulphobetaine. In addition, the layer may also comprise a polymerizable monomer or oligomer and a photopolymerization initiator. The front of the recording material may be matted or pigmented, and the back may be coated with an organic polymeric material. The sulphobetaine improves the solubility of the diazonium salts in aqueous-alkaline developers without reducing the resistance of the offset printing plates produced from the recording material.

Abstract: Disclosed are a positive type photosensitive resin composition which comprises (A) a polyimide precursor or a polyoxazole precursor having a group represented by —OR, wherein R represents a monovalent group constituting a acetal or ketal, an alkoxyalkyl group or an alkylsilyl group, which can be converted into a hydrogen atom by decomposition with an action of an acid, in the molecule which is bonded to an aromatic ring, and (B) a compound which generates an acid by irradiating radiation, a process for producing the same and electronic parts using the same.

Abstract: A photosensitive resin composition containing a high molecular compound having at least a) a fluoro aliphatic group, and b) a group represented by formula —L—P (wherein L represents a divalent organic group connected to the skeleton of the high molecular compound, and P represents an aromatic group having a carboxyl group at the ortho-position).

Abstract: A lithographic printing plate has a coating which is imaged by heating an area of the coating with an infrared laser and actinically reacting the coating in the heated area with ultraviolet or visible radiation. The coating can be either positive working or negative working and the coating contains an infrared absorber. The imaging time is reduced since the actinic reaction rate is increased at the elevated temperature.

Abstract: A positive resist composition comprising: (A) a compound which generates an acid upon irradiation with active light or radiant ray, and (B) a resin which exhibits increased solubility in an alkali by action of an acid and includes a copolymer including (b-1) 40% to 85% by mole of a unit having an alkali-soluble group, (b-2) 3% to 25% by mole of a unit having (i) an acid-decomposable dissolution-inhibiting group and (ii) a group which accelerates dry-etching resistance, and (b-3) 3% to 40% by mole of a unit having an acid-decomposable dissolution-inhibiting group and being other than the units (b-1) and (b-2). This composition is a chemically amplified positive resist composition that can be applied to a resist having a reduced thickness, is excellent in dry-etching resistance and definition and can form a patterned resist with a good sectional shape.

Abstract: The invention relates to a recording material having a substrate and a negative-working, radiation-sensitive layer which contains a diazonium salt, at least one film-forming, polymeric binder and organic colored pigments, on the surface of which an organic polymeric dispersant has been adsorbed and which are additionally dispersed in an organic polymeric binder which does not permanently combine with the pigments chemically or physically. The dispersant generally has groups, in particular primary, secondary or tertiary amino groups or derivatives thereof, which act as anchor groups on the colored pigment particles. The pigments themselves are preferably phthalocyanine pigments. As a result of the predispersing, aggregation of the pigment particles is effectively prevented so that uniform coloration of the radiation-sensitive layer is achieved. During development of the imagewise exposed recording materials, the colored pigment particles form virtually no insoluble precipitates.

Abstract: A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.

Abstract: An image forming material comprises a support and provided thereon, a light sensitive layer containing a compound capable of generating an acid on irradiation of an active light, a compound having a chemical bond capable of being decomposed by an acid and an infrared absorber.

Abstract: Provided is a positive photoresist composition for use in the production of a semiconductor device, which ensures high resolution, reduced edge roughness of a line pattern and a small number of development defects. The positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an alkali developer increases under the action of an acid.

Abstract: A radiation sensitive composition comprising (A), a mixture of an isoindolinone pigment and a yellow organic pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: The invention is a curable cyclobutarene based polymer comprising acid functional pendant groups. The cured polymer displays excellent qualities of toughness, adhesion, dielectric constant, and low stress. The preferred system is soluble in an aqueous base and can be used to generate patterned films with excellent resolution without the need to handle organic developer solvents.

Abstract: A radiation sensitive composition comprising (A) a colorant containing a quinacridone pigment, a mixture of an isoindolinone pigment and a yellow organic pigment or a mixture of copper phthalocyanine blue and a green pigment, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The composition is useful for production of an additive or subtractive color filter which is used in a reflection-type color liquid crystal display device.

Abstract: A method of coupling a diazonium salt with an organic polymer comprising, on order, the steps of: providing a polymer in one liquid phase; providing an diazonium salt in a separate liquid phase; contacting the separate phases, and thereby reacting the polymer and the diazonium salt.

Abstract: A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): 1

Abstract: A positive image can be obtained from a positive-working element that is sensitive to infrared radiation. The element comprises an imaging layer containing an alkali-soluble reactive resin (such as a phenolic resin), an infrared radiation absorbing compound, a thermochemical acid generating compound, and a dissolution inhibitor that has acid-cleavable C—O—C groups. Upon laser exposure, a Bronsted acid is generated which then breaks the bonds of the C—O—C groups, allowing the exposed regions of the reactive resin to be solubilized in an alkaline developer solution.

Abstract: A chemically amplified photosensitive resin composition containing a first compound forming an acid by irradiation of actinic ray and a second compound that changes the solubility to an aqueous alkali solution with acid-catalyzed reaction wherein an ion dissociative compound having the composition represented by the general formula (1) or (2), as well a method of forming a resist pattern using the composition are disclosed, the formulae being expressed by: where each of R2, R3 and R4 represents hydrogen, and an alkyl or aryl group of 1 to 7 carbon atoms, at least one of R1, R2, R3 and R4 represents hydrogen, Y1 represents chlorine, bromine, iodine, carbonate group of 1 to 7 carbon atoms or sulfonate group of 1 to 7 carbon atoms, and

Abstract: A positive photoresist composition which comprises (A) a resin having a group which decomposes by the action of an acid to increase solubility in an alkaline developing solution, and (B) a compound which generates an aliphatic or aromatic carboxylic acid substituted with at least one fluorine atom upon irradiation with an actinic ray or radiation.

Abstract: The present invention provides radiation sensitive compositions and methods that comprise novel means for providing relief images of enhanced resolution. In one aspect the invention provides a method for controlling diffusion of photogenerated acid comprising adding a polar compound to a radiation sensitive composition and applying a layer of the composition to a substrate; exposing the composition layer to activating radiation whereby a latent image is generated comprising a distribution of acid moieties complexed with the polar compound; and treating the exposed composition layer to provide an activating amount of acid.

Abstract: A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern.

Abstract: A recording material having a recording layer with microcapsules therein on a support, and a recording method. The microcapsules constituting the recording layer each are composed of a core, a heat-responsive resin layer covering the core, and a shell enveloping the heat-responsive resin layer. The shell is made of a material sensitive to and curable with light having a predetermined wavelength, the core contains a developer (or a dye precursor), and the shell contains a dye precursor (or a developer).

Abstract: A positive photoresist composition comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which is insoluble or sparingly soluble in alkali but becomes soluble in alkali by the action of an acid, and (C) a nitrogen-containing compound containing at least one partial structure represented by formula (I) shown below in its molecule: 1

Abstract: A recording material is provided, having, in this sequence, a support, a radiation-sensitive layer and a silicone layer. The radiation-sensitive layer contains, as a radiation-sensitive component, a diazonium salt polycondensation product and, as a binder, a homopolymer of (C1-C12) alkyl vinyl ether units and/or a copolymer including at least 5 mol-% of such units, and being free of aliphatic hydroxyl groups. In a process to produce a printing plate for driographic offset printing, this recording material is exposed imagewise and subsequently developed using water or an aqueous solution.

Abstract: The present invention relates to particular acetal copolymers and radiation-sensitive compositions comprising said copolymers and, inter alia, are excellently suitable for the production of lithographic printing plates. In particular, the invention relates to acetal copolymers containing furylvinylidene, thienylvinylidene or pyrrolylvinylidene.

Abstract: There is described a method of preparing a lithographic plate which comprises coating on a lithographic support having a hydrophilic surface, a layer of a heat sensitive coating, digitally imaging the coating, then processing the plate with water to remove the unexposed areas of the coating to reveal the hydrophilic surface of the plate and to leave an ink receptive image, wherein the heat sensitive coating comprises a diazo salt of formula (I): wherein R1 is an anion, R2 and R3 represent optional substitution, R4 is —N— or —S— and R5 is a group which, after exposure of the plate, renders the residue of the diazo salt oleophilic and fount solution insoluble.

Abstract: A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

Abstract: A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.

Abstract: Disclosed are photoresist compositions comprising a polymeric backbone and a quaternary heterocyclic pendant group, particularly usefull in the preparation of screen printing and sandblast etching photoresists. The pendant groups comprise furanyl substituted quaternary heterocyclic groups, as seen in the formula: where n ranges from 0 to 4 and Z denotes the atoms necessary to complete a substituted or unsubstituted nitrogen containing heterocyclic ring.

Abstract: A photosensitive material, which comprises, an alkali-soluble resin moiety having an alicyclic skeleton, a polycyclic condensation skeleton, or both alicyclic and polycyclic condensation skeletons, and a diazo compound moiety. The diazo compound moiety may be contained in a side chain of the alkali-soluble resin moiety or included in the photosensitive material in separate from the alkali-soluble resin moiety.

Abstract: Disclosed is a photosensitive composition useful for preparation of various imaging materials and having good stability over time and a high sensitivity. The composition comprises a polymerizable monomer, a photopolymerization initiator, and a diazonium salt having a specific, borate anion portion represented by the general formula (I-1) or (I-2) given below, or the like. A combination of a specific borate compound and a general-purpose diazonium salt can also be used in place of the above-mentioned diazonium salt.

Abstract: The present invention provides a pigment dispersed color-filter composition containing a binder polymer such as an alkali-soluble block copolymer; a radiation-sensitive compound; and a pigment. The pigment-dispersed color-filter composition which further contains an organic medium, or an organic medium and a carboxylic acid is also provided.