Identified Overlayer On Radiation-sensitive Layer Patents (Class 430/273.1)
  • Patent number: 10474032
    Abstract: In one aspect, coating compositions are provided that comprise a component a component that comprises one or more silicon, antimony, aluminum, yttrium, cerium, lanthanum, tin, titanium, zirconium, hafnium, indium or zinc compounds. In another aspect, coating compositions are provided that comprise a plurality of discrete particles. Preferred coating compositions of the invention are useful for antireflective purposes, particularly with an underlaying photoresist coating layer, as well as for a barrier layer in immersion lithography.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: November 12, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Michael K. Gallagher
  • Patent number: 10319590
    Abstract: A method of forming a semiconductor device includes forming an etching layer on a substrate, forming a photoresist layer on the etching layer, forming an exposed area configured to define an unexposed area in the photoresist layer, forming a hardmask layer on the exposed area using a selective deposition process, partially removing the photoresist layer using the hardmask layer as an etch mask and forming a photoresist pattern, and etching the etching layer using the photoresist pattern as an etch mask and forming a fine pattern.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: June 11, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Cha-won Ko, Hyun-woo Kim, Youn-joung Cho, Jin-kyu Han
  • Patent number: 10243198
    Abstract: A method for forming a pattern, a structural body, a method for producing a comb-shaped electrode, and a secondary cell. The pattern forming method, in which n patterns (n?2) are formed on a support, includes forming a first resist layer on the support surface; and repeating: forming a guide hole through a kth resist layer by exposure and development, filling a kth pattern material into the guide hole by a screen printing process, removing the kth resist layer, and forming a (k+1)th resist layer on the support and all pattern materials, regarding kth (k=1 to n?1) pattern material and resist layer in order of k=1 to n?1; forming a guide hole and nth pattern material filling similarly, and removing the nth resist layer.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: March 26, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takahiro Asai, Kaoru Ishikawa
  • Patent number: 10180627
    Abstract: New lithographic processing methods are provided which are particularly useful in immersion lithography schemes. In one aspect, processes of the invention comprise: applying on a substrate a photoresist composition; exposing the photoresist layer to radiation activating for the photoresist composition; removing a portion but not all of the exposed photoresist layer; and developing the treated photoresist layer to provide a photoresist relief image.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: January 15, 2019
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, George G. Barclay, Thomas A. Estelle, Kenneth J. Spizuoco, Doris Kang
  • Patent number: 10040879
    Abstract: A film layer comprising a high-chi (?) block copolymer for self-assembly and a hexafluoroalcohol-containing surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a substituted or unsubstituted styrene-based block). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0 Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block.
    Type: Grant
    Filed: November 21, 2016
    Date of Patent: August 7, 2018
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Anindarupa Chunder, Ankit Vora
  • Patent number: 9791775
    Abstract: A method includes forming a first photo resist layer over a base structure and a target feature over the base structure, performing an un-patterned exposure on the first photo resist layer, and developing the first photo resist layer. After the step of developing, a corner portion of the first photo resist layer remains at a corner between a top surface of the base structure and an edge of the target feature. A second photo resist layer is formed over the target feature, the base structure, and the corner portion of the first photo resist layer. The second photo resist layer is exposed using a patterned lithography mask. The second photo resist layer is patterned to form a patterned photo resist.
    Type: Grant
    Filed: March 11, 2016
    Date of Patent: October 17, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Wei Chang, Hong-Da Lin, Chih-Chien Wang, Chun-Chang Chen, Wang-Pen Mo, Hung-Chang Hsieh
  • Patent number: 9746768
    Abstract: There is provided a resist overlayer film forming composition for use in a lithography process in semiconductor device production, which does not intermix with a resist, blocks undesirable exposure light particularly in EUV exposure, for example, UV and DUV and selectively transmits EUV alone, and which can be developed with a developer after exposure. A resist overlayer film forming composition comprising: a polymer including an organic group including a linear or branched saturated alkyl group having a carbon atom number of 1 to 10, in which some or all of hydrogen atoms thereof are substituted with fluorine atoms, and an optionally substituted C8-16 ether compound as a solvent.
    Type: Grant
    Filed: January 24, 2014
    Date of Patent: August 29, 2017
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ryuji Ohnishi, Rikimaru Sakamoto, Noriaki Fujitani
  • Patent number: 9703200
    Abstract: Methods of forming an electronic device, comprising in sequence: (a) providing a semiconductor substrate comprising one or more layers to be patterned; (b) forming a photoresist layer over the one or more layers to be patterned, wherein the photoresist layer is formed from a composition that comprises: a matrix polymer comprising a unit having an acid labile group; a photoacid generator; and an organic solvent; (c) coating a photoresist overcoat composition over the photoresist layer, wherein the overcoat composition comprises a quenching polymer and an organic solvent, wherein the quenching polymer comprises a unit having a basic moiety effective to neutralize acid generated by the photoacid generator in a surface region of photoresist layer; (d) exposing the photoresist layer to activating radiation; (e) heating the substrate in a post-exposure bake process; and (f) developing the exposed film with an organic solvent developer.
    Type: Grant
    Filed: December 31, 2014
    Date of Patent: July 11, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Jong Keun Park, Christopher Nam Lee, Cecily Andes, Choong-Bong Lee
  • Patent number: 9601694
    Abstract: A donor substrate for a laser transfer includes a base layer, a primer layer disposed on the base layer, a light-to-heat conversion layer disposed on the primer layer, and an intermediate layer disposed on the light-to-heat conversion layer, where the light-to-heat conversion layer includes graphene.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: March 21, 2017
    Assignee: SAMSUNG DISPLAY CO., LTD
    Inventors: Ji-Young Kwon, Ji-Hwan Yoon, Sang-Woo Pyo, Ha-Jin Song, Byeong-Wook Yoo, Bum-Suk Lee, Ji-Myoung Ye, Yi-Seul Kim
  • Patent number: 9574107
    Abstract: A film layer comprising a high-chi (?) block copolymer for self-assembly and a hexafluoroalcohol-containing surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a substituted or unsubstituted styrene-based block). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block.
    Type: Grant
    Filed: February 16, 2015
    Date of Patent: February 21, 2017
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Anindarupa Chunder, Daniel P. Sanders, Melia Tjio, Ankit Vora
  • Patent number: 9568821
    Abstract: There is provided a patterning process that forms a negative pattern by developing using an organic solvent, using a resist top coat composition that not only reduces the effect from the environment on a resist film and effectively blocks OOB light, but also reduces the film loss of a resist pattern and the bridging between patterns, enhances the sensitivity of the resist film, and suppresses the emission of an outgas from the resist film. The patterning process includes the steps of forming a resist top coat on a photoresist film formed on a substrate, with the resist top coat using as a top base material a polymer having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group, in which m is 1 or 2, and p is 0<p?1.0; performing EUV exposure using an electron beam or having a wavelength of 3 nm to 15 nm; and forming a negative pattern by developing using an organic-solvent-based developer.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: February 14, 2017
    Assignees: Samsung Electronics Co., Ltd., Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Hyun-Woo Kim
  • Patent number: 9507262
    Abstract: There are provided a top coat composition and a patterning process using that composition, which reduce the effect of contaminants in the surrounding atmosphere on the resist film in absorbing OOB light and in reducing film loss of the resist pattern and bridging between patterns, and also enhances the sensitivity of the resist film and suppresses the emission of outgas from the resist film. The resist top coat composition of the present invention is formed on a photoresist film formed on a wafer, and is used in a patterning process performed by lithography in which, after exposure, developing is performed. The resist top coat composition contains a polymer as a base resin having a repeating unit p of styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group shown by the following general formula (1), a C6-C10 ether compound, and a C7-C12 hydrocarbon compound, and wherein m is 1 or 2, and p is in the range of 0<p?1.0.
    Type: Grant
    Filed: February 13, 2015
    Date of Patent: November 29, 2016
    Assignees: Shin-Etsu Chemical Co., Ltd., Samsung Electronics Co., Ltd.
    Inventors: Jun Hatakeyama, Hyun-Woo Kim
  • Patent number: 9499002
    Abstract: It is an object of the present invention to provide a resin printing plate precursor for laser engraving that is able to form a relief by laser engraving, the relief having excellent image reproducibility, and moreover has toughness and improved printing durability. The present invention is a resin printing plate precursor for laser engraving comprising a substrate and a resin layer on the substrate, the resin layer containing: (A) a modified partially saponified polyvinyl acetate having reactive groups in its side chain; (B) a polyamide having basic nitrogen; (C) a compound having a 5- to 7-membered ring and a polymerizable ethylenic double bond; and (D) a photopolymerization initiator.
    Type: Grant
    Filed: January 20, 2014
    Date of Patent: November 22, 2016
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Hiroyuki Kawahara, Tsutomu Abura
  • Patent number: 9417520
    Abstract: A method of patterning a block copolymer layer, the method including: providing a substrate including a topographic pattern on a surface of the substrate, wherein the topographic pattern includes a trench and a mesa; forming, on the surface of the substrate, an underlayer including a polymer, wherein the polymer includes a repeating unit derived from a substituted or unsubstituted aromatic vinyl monomer and has an anchoring group; heat-treating the underlayer to anchor the underlayer to the surface of the substrate via the anchoring group; irradiating the heat-treated underlayer with light to form a crosslinked polymer with a crosslink between carbon atoms of main chains of the polymer; forming a block copolymer layer on the underlayer including the crosslinked polymer; and heat-treating the block copolymer layer to form a self-assembled structure of the block copolymer directed by the topographic pattern.
    Type: Grant
    Filed: February 4, 2014
    Date of Patent: August 16, 2016
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Haeng Deog Koh, Mi-Jeong Kim, In Taek Han
  • Patent number: 9362231
    Abstract: Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, fluoroalkyl groups, heteroaryl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: June 7, 2016
    Assignee: Intermolecular, Inc.
    Inventors: Tony P. Chiang, Majid Keshavarz, David E Lazovsky
  • Patent number: 9353344
    Abstract: Biomass feedstocks (e.g., plant biomass, animal biomass, and municipal waste biomass) are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, to produce a product or intermediate, e.g., energy, a food, a fuel, or a material.
    Type: Grant
    Filed: October 19, 2015
    Date of Patent: May 31, 2016
    Assignee: XYLECO, INC.
    Inventors: Marshall Medoff, Thomas Craig Masterman
  • Patent number: 9352602
    Abstract: A lithographic printing plate precursor includes a photosensitive layer and a protective layer in this order on a support, the photosensitive layer contains a sensitizing dye, a polymerization initiator, a polymerizable compound and a binder polymer, and the protective layer contains a polymer which has a repeating unit represented by the formula (1) as defined herein and a repeating unit represented by the formula (2) as defined herein in which a sum of the repeating unit represented by the formula (1) and the repeating unit represented by the formula (2) is 90% by mole or more based on total repeating units constituting the polymer.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: May 31, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Yuriko Ishiguro, Shota Suzuki
  • Patent number: 9333162
    Abstract: A linear, branched or cross-linked anionic polyelectrolyte, resulting from the polymerisation, for 100 molar percentage: a) 50% to 99% of monomeric units including a strong, free and partially or completely salified acid function ; b) 1% to 50% of a monomeric units of formula (I): CH2?CH(R1)-C(?O)—O—(CH2)n-CF3 (I), wherein R1 represents H or CH3, and n is 1, 2 or 3; c) optionally greater than 0% to 5% of monomeric units of formula (II): R2-C(?O)—O—[(CH2-CH(R4)-O]m-R3 (II), wherein m is 0 to 50, R2 represents an unsaturated aliphatic monovalent radical with 2 to 4 carbon atoms, R4 represents H, CH3 or CH3CH2 and R3 represents a linear or branched, saturated or unsaturated hydrocarbon aliphatic radical with 8 to 30 carbon atoms, and d) optionally greater than 0% to 5% of at least one monomer with diethylenic or polyethylenic cross-linking. The use thereof as a thickener in topical compositions.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: May 10, 2016
    Assignee: SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES SEPPIC
    Inventors: Olivier Braun, Paul Mallo
  • Patent number: 9266316
    Abstract: A flexographic printing precursor can be imaged and used for flexographic printing. This precursor has at least two laser-engraveable layers, in which the underlying non-printing laser-engraveable layer is more sensitive than the outermost non-metallic printing laser-engraveable layer. The non-printing layer-engraveable layer comprises (1) a first elastomer, (2) a polymer that is nitrocellulose, a polymer comprising a triazene group, a glycidyl azide polymer, or a poly(vinyl nitrate), and (3) a first near-infrared radiation absorber. The outermost non-metallic printing laser-engraveable layer comprises a second elastomer and a second infrared radiation absorber.
    Type: Grant
    Filed: January 18, 2012
    Date of Patent: February 23, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Ophira Melamed, Eynat Matzner, Dana Barshishat
  • Patent number: 9223216
    Abstract: A lithographic printing plate precursor in a positive-type with an infrared-sensitivity, having a support and an image recording layer provided on the support, the support having a hydrophilic surface, the recording layer having a particular resin, an amphoteric surfactant and/or an anionic surfactant, and an infrared absorbing agent, wherein the particular resin being at least one of resins selected from the group consisting of a polyurethane resin, a poly(vinyl acetal) resin, and maleimide resin A.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: December 29, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Shigekatsu Fujii, Norio Aoshima, Yoshinori Taguchi, Yoichiro Ara, Takashi Aridomi
  • Patent number: 9205638
    Abstract: A print material pattern is formed on a receiver element using an elastomeric relief element having a relief pattern. A printable material composition is applied only to the uppermost relief surface of the elastomeric relief element and at least at least 50 weight % of a carrier liquid is removed. A receiver element has a print material receptive layer having a dry thickness of 0.05-10 ?m and is heated. During contact of the print material composition on the uppermost relief surface and the heated receiver element, the elastomeric relief element is compressed to provide sufficient contact with the receiver element. The elastomeric relief element is then separated from the heated receiver element to leave a pattern of the functional material on the heated receiver element, wherein at least 70 weight % of the original print material is transferred to the heated receiver element.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: December 8, 2015
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Gregory Lloyd Zwadlo, Elsie Anderson Fohrenkamm, Charles W. Simpson
  • Patent number: 9063426
    Abstract: A method of manufacturing a flexographic printing plate includes designing a patterned design that includes a plurality of lines and a plurality of support structures and laser-ablating the patterned design into a thermal imaging layer. A support structure of the plurality of support structures is disposed at an offset relative to a line of the plurality of lines.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: June 23, 2015
    Assignee: Uni-Pixel Displays, Inc.
    Inventors: Ed S. Ramakrishnan, Daniel Van Ostrand
  • Patent number: 9029075
    Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer of hydroxystyrene with acenaphthylene and/or vinylnaphthalene and a mixture of an alcohol solvent and an ether or aromatic solvent.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: May 12, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 8999631
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: April 7, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Patent number: 8968979
    Abstract: A positive resist composition comprises a polymer comprising repeat units having formula (1) or (2). Herein denotes an aromatic hydrocarbon group, R1 is H, methyl or trifluoromethyl, R2 is H, C1-C12 alkyl or aromatic hydrocarbon group, R3 is C1-C12 alkyl, or R2 and R3 may bond together to form a ring, and a is 1 or 2. When used in the ArF lithography, the resist composition exhibits high resolution. When used in the EB image writing for mask processing, the resist composition exhibits high resolution and sensitivity sufficient to comply with high-accelerating-voltage EB irradiation, and high etch resistance.
    Type: Grant
    Filed: November 20, 2009
    Date of Patent: March 3, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuya Takemura, Keiichi Masunaga, Daisuke Domon, Masayoshi Sagehashi
  • Patent number: 8956803
    Abstract: The present invention provides a sulfonium salt used in a resist composition that can give a pattern having a high resolution, especially an excellent rectangularity of a pattern form and a small roughness, while not readily generating a defect, in the photolithography using a high energy beam as a light source; a resist composition that contains the sulfonium salt; and a patterning process using this resist composition, wherein the sulfonium salt is shown by the following general formula (1a), wherein each of R and R0 independently represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms which may be optionally substituted by a heteroatom or interposed by a heteroatom.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: February 17, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi, Akihiro Seki, Masayoshi Sagehashi, Masahiro Fukushima
  • Patent number: 8956810
    Abstract: An undercoat agent usable in phase separation of a layer formed on a substrate, the layer containing a block copolymer having a plurality of polymers bonded, the undercoat agent including a resin component, and 20 mol % to 80 mol % of all the structural units of the resin component being a structural unit derived from an aromatic ring-containing monomer; and a method of forming a pattern of a layer containing a block copolymer, the method including: step (1) coating the undercoat agent on a substrate (1), thereby forming a layer (2) composed of the undercoat agent, step (2) forming a layer (3) containing a block copolymer having a plurality of polymers bonded on the surface of the layer (2) composed of the undercoat agent, and subjecting the layer (3) containing the block copolymer to phase separation, and step (3) selectively removing a phase (3a) of at least one polymer of the plurality of copolymers constituting the block copolymer from the layer (3) containing the block copolymer.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: February 17, 2015
    Assignees: Tokyo Ohka Kogyo Co., Ltd., Riken
    Inventors: Takahiro Senzaki, Takahiro Dazai, Ken Miyagi, Shigenori Fujikawa, Harumi Hayakawa, Mari Koizumi
  • Patent number: 8951712
    Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a composition comprising a copolymer comprising recurring units derived from a styrene, indene, benzofuran or benzothiophene monomer having 1,1,1,3,3,3-hexafluoro-2-propanol, and recurring units derived from a styrene, vinylnaphthalene, indene, benzofuran, benzothiophene, stilbene, styrylnaphthalene or dinaphthylethylene monomer and an ether solvent.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: February 10, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 8945813
    Abstract: An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent polymeric carrier sheet and a barrier layer comprising a first infrared radiation absorbing compound. A first ultraviolet radiation absorbing compound is provided in the transparent polymeric carrier sheet or the barrier layer. A non-silver halide thermally sensitive imageable layer is disposed on the barrier layer and comprises a second infrared radiation absorbing compound and a second ultraviolet radiation absorbing compound. A relief image is formed by imaging the imageable material to form an imaged mask material, exposing a relief-forming material with curing radiation through the imaged mask material to form exposed regions and non-exposed regions, and developing the imaged relief-forming material to form a relief image by removing its non-exposed regions.
    Type: Grant
    Filed: April 18, 2013
    Date of Patent: February 3, 2015
    Assignee: Eastman Kodak Company
    Inventor: Kevin M. Kidnie
  • Patent number: 8936899
    Abstract: A thermally-sensitive, positive-working lithographic printing plate precursor can be used to prepare lithographic printing plates using high pH, silicate-free processing solutions. The precursor has a grained an anodized aluminum-containing substrate including a poly(vinyl phosphonic acid) interlayer. A first ink receptive layer, and optionally a second ink receptive layer, is disposed directly on the poly(vinyl phosphonic acid) interlayer. This first ink receptive layer comprises an aromatic acid dye that comprises at least two aromatic groups in an amount of least 0.5 weight %. In addition, the precursor comprises an infrared radiation absorber in one of the layers.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: January 20, 2015
    Assignee: Eastman Kodak Company
    Inventors: Gerhard Hauck, Dietmar Frank, Celin Savariar-Hauck
  • Patent number: 8921031
    Abstract: Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: September 9, 2012
    Date of Patent: December 30, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Rosemary Bell, Jong Keun Park, Seung-Hyun Lee
  • Patent number: 8916018
    Abstract: An apparatus for fabricating an organic light emitting display panel is disclosed. In one embodiment, the apparatus includes i) a first roll around which a film is wound to be continuously drawn, ii) a second roll arranged to face the first roll and around which the film is continuously wound, iii) a plurality of chambers disposed between the first and second rolls and through which the film passes, and in which laser induced thermal imaging (LITI) is performed on a substrate by forming a transfer layer on the film, and iv) a gate unit installed at least one of the chambers and disposed at at least one of a film inlet and a film output of the chambers that are installed, to maintain a substantially vacuum state in the chambers during passing of the film.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: December 23, 2014
    Assignee: Samsung Display Co. Ltd.
    Inventors: Byung-Chul Lee, Jae-Seok Park, Jae-Ha Lim, Jin-Han Park, Dong-Sul Kim
  • Patent number: 8911927
    Abstract: The present invention relates to barrier layer compositions that are applied above a photoresist composition for immersion lithography processing. In a further aspect, new methods are provided for immersion lithography processing.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: December 16, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Michael K. Gallagher, Gerald B. Wayton, Gregory P. Prokopowicz, Stewart A. Robertson
  • Patent number: 8904668
    Abstract: A method for removing a moistening liquid from a moistened medium includes bringing at least one surface of the moistened medium into contact with a heating liquid. The heating liquid is warmed to a temperature greater than a moistening-liquid boiling point. Heat is transferred from the warmed heating liquid to the moistening liquid, thereby vaporizing the moistening liquid and removing it from the moistened medium.
    Type: Grant
    Filed: October 11, 2012
    Date of Patent: December 9, 2014
    Assignee: Eastman Kodak Company
    Inventors: Alan Richard Priebe, Donald Saul Rimai, Christopher J. White
  • Patent number: 8900796
    Abstract: The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: December 2, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi, Masayoshi Sagehashi
  • Patent number: 8895226
    Abstract: Provided are a coating composition for deep ultraviolet (DUV) filtering during an extreme ultraviolet (EUV) exposure, the coating composition including about 100 parts by weight of a solvent including a first solvent (the first solvent being an alcoholic solvent); and about 0.05 parts by weight to about 5 parts by weight of a coating polymer having a degree of absorption of about 50%/?m or greater with respect to 193-nm incident light.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: November 25, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-Woo Kim, Hai-Sub Na, Chil-Hee Chung, Han-Ku Cho
  • Patent number: 8895229
    Abstract: A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises a resin (A) having a repeating unit represented by the following general formula (1-1) and not having a repeating unit represented by the following general formula (1-2), and a resin (B) having a repeating unit represented by the following general formula (1-2) and not having a repeating unit represented by the following general formula (1-1). [In the general formulas (1-1) and (1-2), R1 is hydrogen or the like; R2 is single bonds or the like; and R3 is a fluorine-substituted, linear or branched alkyl group having 1 to 12 carbon atoms, or the like.] The composition can form an upper layer film giving a sufficiently high receded contact angle.
    Type: Grant
    Filed: October 11, 2007
    Date of Patent: November 25, 2014
    Assignee: JSR Corporation
    Inventors: Yukio Nishimura, Norihiko Sugie, Hiromitsu Nakashima, Norihiro Natsume, Daita Kouno
  • Patent number: 8889338
    Abstract: A method of making a flexographic printing form precursor for laser engraving including the steps of (i) providing at least one layer of a curable composition on a substrate; (ii) curing the at least one layer; wherein the curable composition defining an outermost layer includes at least 0.5% by weight relative to the total weight of the composition of an organo-silicon compound including at least one polymerizable group; and a urethane (meth)acrylate oligomer having three or less polymerizable groups.
    Type: Grant
    Filed: March 27, 2012
    Date of Patent: November 18, 2014
    Assignee: Agfa Graphics NV
    Inventors: Eddie Daems, Luc Leenders
  • Patent number: 8889334
    Abstract: Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compounds and at least one pH tuning agent that are incorporated into spin-on materials. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography. Suitable pH tuning agents not only adjust the pH of the final spin-on composition, but also influence the chemical performance and characteristics, mechanical performance and structural makeup of the final spin-on composition that is part of the layered material, electronic component or semiconductor component, such that the final spin-on composition is more compatible with the resist material that is coupled to it. A method of making absorbing and pH tuned spin-on materials includes combining at least one organic absorbing compound and at least one pH tuning agent with at least one silane reactant during synthesis of the spin-on materials and compositions.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: November 18, 2014
    Assignee: Honeywell International Inc.
    Inventors: Joseph T Kennedy, Teresa Baldwin-Hendricks
  • Patent number: 8889337
    Abstract: Such a film forming method is provided that can prevent peeling of surface films including a resist film from a substrate during immersion exposure. The film forming method includes the steps of forming surface films including a resist film and a protective film covering the resist film over a surface of a wafer, and forming an edge cap film by supplying an edge cap film material to at least a boundary portion including a periphery of the wafer and peripheries of the surface films such as the protective film.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: November 18, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Hitoshi Kosugi, Taro Yamamoto, Yoshiaki Yamada, Yasuhito Saiga
  • Patent number: 8889341
    Abstract: A negative-working lithographic printing plate precursor comprises a negative-working radiation-sensitive imageable layer and an outermost layer comprising a vinyl alcohol copolymer comprising at least one unit of each of the (a), (b), and (c) recurring units, in any order, defined in the disclosure. The (c) recurring units are present in the vinyl alcohol copolymer in an amount of at least 0.5 mol %, based on the total recurring units. These precursors can be used to prepare lithographic printing plates either on-press or off-press after imaging using near-UV, visible, or infrared radiation.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: November 18, 2014
    Assignee: Eastman Kodak Company
    Inventors: Saija Werner, Harald Baumann, Udo Dwars, Christopher D. Simpson, Axel Draber
  • Patent number: 8883400
    Abstract: Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: November 11, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Chunyi Wu
  • Patent number: 8883407
    Abstract: In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: November 11, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: John P. Amara, James F. Cameron, Jin Wuk Sung, Gregory P. Prokopowicz
  • Patent number: 8883399
    Abstract: A photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: November 11, 2014
    Assignee: Asahi Kasei E-Materials Corporation
    Inventor: Chisato Iso
  • Patent number: 8883379
    Abstract: A pattern is printed by forming a photoresist layer on a wafer, forming a protective film thereon, exposure, and development. The protective film is formed from a protective film-forming composition comprising a novolak resin of a bisphenol compound and a mixture of an alcohol solvent and an ether or aromatic solvent.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: November 11, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Daisuke Kori
  • Patent number: 8877467
    Abstract: Biomass feedstocks (e.g., plant biomass, animal biomass, and municipal waste biomass) are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, to produce a product or intermediate, e.g., energy, a food, a fuel, or a material.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: November 4, 2014
    Assignee: Xyleco, Inc.
    Inventors: Marshall Medoff, Thomas Craig Masterman
  • Publication number: 20140315129
    Abstract: An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent polymeric carrier sheet and a barrier layer comprising a first infrared radiation absorbing compound. A first ultraviolet radiation absorbing compound is provided in the transparent polymeric carrier sheet or the barrier layer. A non-silver halide thermally sensitive imageable layer is disposed on the barrier layer and comprises a second infrared radiation absorbing compound and a second ultraviolet radiation absorbing compound. A relief image is formed by imaging the imageable material to form an imaged mask material, exposing a relief-forming material with curing radiation through the imaged mask material to form exposed regions and non-exposed regions, and developing the imaged relief-forming material to form a relief image by removing its non-exposed regions.
    Type: Application
    Filed: April 18, 2013
    Publication date: October 23, 2014
    Inventor: Kevin M. Kidnie
  • Patent number: 8865391
    Abstract: A chemically amplified negative resist composition is provided comprising (A) a resin having a crosslinking group, (B) a crosslinker, (C) a photoacid generator capable of generating an acid upon exposure to light of wavelength 190-500 nm, (D) a solvent, and (E) an isocyanuric acid. The resist composition overcomes the stripping problem that the film is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: October 21, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Katsuya Takemura, Takashi Miyazaki, Hiroyuki Urano
  • Patent number: 8859194
    Abstract: A polymer compound and a resist protective film composition for an immersion lithography process including the same.
    Type: Grant
    Filed: May 17, 2013
    Date of Patent: October 14, 2014
    Assignee: Dongjin Semichem Co., Ltd.
    Inventors: Man Ho Han, Jong Kyoung Park, Hyun Jin Kim, Jae Hyun Kim
  • Patent number: 8852848
    Abstract: The present invention relates to an aqueous composition for coating over a photoresist pattern comprising a first water soluble compound comprising at least a silicon moiety and at least one amino group, and a second compound comprising at least 1 carboxylic acid group. The invention further relates to processes for using the novel invention.
    Type: Grant
    Filed: July 28, 2010
    Date of Patent: October 7, 2014
    Assignee: Z Electronic Materials USA Corp.
    Inventors: Hengpeng Wu, Meng Li, Yi Cao, Jian Yin, DongKwan Lee, SungEun Hong, Margareta Paunescu