Urethane Patents (Class 430/284.1)
  • Patent number: 10795261
    Abstract: An additive for a resist underlayer film-forming composition, including a copolymer having structural units of the following Formulae (1) to (3): wherein R1s are each independently a hydrogen atom or a methyl group, R2 is a C1-3 alkylene group, A is a protecting group, R3 is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, tricyclodecane skeleton, or norbornane skeleton, and R4 is a linear, branched, or cyclic organic group having a carbon atom number of 1 to 12, wherein at least one hydrogen atom is substituted with a fluoro group and that optionally has at least one hydroxy group as a substituent. A resist underlayer film-forming composition for lithography including additive, a resin that is different from copolymer, organic acid, crosslinker, and solvent, wherein the copolymer's content is 3 parts by mass to 40 parts by mass relative to 100 parts by mass of the resin.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: October 6, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tokio Nishita, Rikimaru Sakamoto
  • Patent number: 10711082
    Abstract: A near infrared absorbing colorant polymer has a maximal absorption in a wavelength range of 700 to 1200 nm. It is preferable that the near infrared absorbing colorant polymer includes at least one near infrared absorbing colorant structure selected from the group consisting of a pyrrolopyrrole colorant, a cyanine colorant, a squarylium colorant, a diimonium colorant, a phthalocyanine colorant, a naphthalocyanine colorant, a rylene colorant, a dithiol complex colorant, a croconium colorant, an oxonol colorant, a triarylmethane colorant, a pyrromethene colorant, an azomethine colorant, an anthraquinone colorant, and a dibenzofuranone colorant.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: July 14, 2020
    Assignee: FUJIFILM Corporation
    Inventors: Kyohei Arayama, Kazuya Oota
  • Patent number: 10557064
    Abstract: The invention relates to a process for making e-Beam curable pressure sensitive adhesive compositions by derivatizing an acrylic polymer having one or more hydroxy groups or one or more acid groups with a derivatizing agent prepared from a hydroxy-functional acrylate monomer and a diisocyanate. The pressure sensitive adhesive can be effectively cured without a photoinitiator or reactive diluent. Also disclosed are e-Beam curable pressure sensitive adhesives made with the derivatizing agent and methods for adhering substrates with the pressure sensitive adhesive compositions.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: February 11, 2020
    Assignee: Ashland Licensing and Intellectual Property LLC
    Inventors: Terry Emerson Hammond, Zhaohui Sun
  • Patent number: 10503073
    Abstract: New photoresists are provided that are useful in a variety of applications, including negative-tone development processes. Preferred resists comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: December 10, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Eui-Hyun Ryu, Min-Kyung Jang, Chang-Young Hong, Dong-Yong Kim, Dong-Je Hong, Hae-Jin Lim, Myung Yeol Kim, Hyun Jeon
  • Patent number: 10505056
    Abstract: A composition for forming an electrode includes a conductive powder, a glass frit, an organic vehicle, and a burn-out retardant. The burn-out retardant exhibits a residual carbon of greater than or equal to about 1 wt % at a temperature of about 600° C. based on the initial amount of 100 wt % and an exothermic peak at about 200° C. to about 500° C.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: December 10, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sanghee Park, Hyunjin Koo, Daechan Kwon, Tae-Joon Kim, Min-Su Park, Jiseon Lee, Myung-Sung Jung
  • Patent number: 10429736
    Abstract: A method of producing a flexographic printing plate using a continuous liquid interphase is provided herein. This method allows for significantly reduced production times and fewer preparation steps compared to standard non-continuous techniques and results in less waste than typical methods for preparing flexographic printing plates. The printing plate provided by using continuous liquid interphase production results in a printing plate with desirable elastomeric elongation, desirable hardness, plate thickness in the range of 0.030 inches to 0.250 inches, and comprises printing dots with desirable characteristics.
    Type: Grant
    Filed: April 27, 2017
    Date of Patent: October 1, 2019
    Assignee: MacDermid Graphics Solutions LLC
    Inventors: Laurie A. Bryant, Kyle P. Baldwin, Ryan W. Vest
  • Patent number: 10421856
    Abstract: A three-dimension forming support material includes a photocurable compound that contains an urethane (meth)acrylate and a non-photocurable polymer having a hydroxyl value of 60 mgKOH/g to 300 mgKOH/g.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: September 24, 2019
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Takashi Morikawa, Takashi Oyanagi, Hiroshi Inoue, Jun Kawahara
  • Patent number: 10345705
    Abstract: Methods herein form a photoresist on an exterior of a cylinder and expose the photoresist to a light source while rotating the cylinder. Such methods develop the photoresist, after exposing, to change the photoresist into a patterned protective layer on the exterior of the cylinder. Then, these methods pattern the exterior of the cylinder while rotating the cylinder using the patterned protective layer to produce a patterned cylinder.
    Type: Grant
    Filed: July 12, 2013
    Date of Patent: July 9, 2019
    Assignee: Xerox Corporation
    Inventors: Karl E. Kurz, Amir Prizant, Christopher D. Blair
  • Patent number: 10241401
    Abstract: A method of producing a flexographic printing plate using a continuous liquid interphase is provided herein. This method allows for significantly reduced production times and fewer preparation steps compared to standard non-continuous techniques and results in less waste than typical methods for preparing flexographic printing plates. The printing plate provided by using continuous liquid interphase production results in a printing plate with desirable elastomeric elongation, desirable hardness, plate thickness in the range of 0.030 inches to 0.250 inches, and comprises printing dots with desirable characteristics.
    Type: Grant
    Filed: August 1, 2016
    Date of Patent: March 26, 2019
    Assignee: MacDermid Graphics Solutions LLC
    Inventors: Ryan W. Vest, Kyle P. Baldwin, Laurie A. Bryant
  • Patent number: 10022996
    Abstract: The invention is directed to an infrared sensitive color-forming composition containing a compound having an infrared absorbing skeleton and a thermochromic skeleton in a molecule thereof wherein the infrared absorbing skeleton and the thermochromic skeleton are connected with a covalent bond or an ionic bond and a binder; an infrared curable color-forming composition wherein the infrared sensitive color-forming composition further contains a radical initiator and a polymerizable compound; a lithographic printing plate precursor having an image-recording layer containing the infrared curable color-forming composition on a support; a plate making method including imagewise exposing the lithographic printing plate precursor and conducting on-press development processing by supplying printing ink and dampening water on a printing machine to remove a non-image area; a compound represented by the formula (7) as defined herein; and a compound represented by the formula (8) as defined herein.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: July 17, 2018
    Assignee: FUJIFILM Corporation
    Inventors: Akio Mizuno, Shota Suzuki, Noriaki Sato
  • Patent number: 9303166
    Abstract: Coating compositions are disclosed that include corrosion resisting particles such that the coating composition can exhibit corrosion resistance properties. Also disclosed are substrates at least partially coated with a coating deposited from such a composition and multi-component composite coatings, wherein at least one coating later is deposited from such a coating composition. Methods and apparatus for making ultrafine solid particles are also disclosed.
    Type: Grant
    Filed: December 12, 2011
    Date of Patent: April 5, 2016
    Assignee: PPG Industries Ohio, Inc.
    Inventors: David N. Walters, John R. Schneider
  • Patent number: 9085655
    Abstract: The invention relates to radiation-curable aqueous composition comprising an (meth)acrylated polyurethane prepolymer obtained from the reaction of a polyisocyanate, optionally a polyol, at least one hydrophilic compound containing at least one reactive group capable to react with isocyanate groups and which is capable to render the polyurethane pre-polymer dispersible in aqueous medium either directly or after the reaction with a neutralizing agent to provide a salt, an (meth)acrylated compound containing at least two reactive groups capable to react with isocyanate groups and an (meth)acrylated compound containing essentially one reactive group capable to react with isocyanate groups, said composition comprising an amount of (meth)acrylated and polymerizable ethylenically unsaturated groups of at least 3 meq per g.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: July 21, 2015
    Assignee: ALLNEX BELGIUM S.A.
    Inventors: Michel Tielemans, Dirk Bontinck, Jean-Claude Van Overvelt
  • Patent number: 9075307
    Abstract: The photosensitive resin composition for a protective film of a printed wiring board for a semiconductor package, according to the invention, comprises (A) an acid-modified vinyl group-containing epoxy resin, (B) a phenol compound, (C) a compound having at least one ethylenically unsaturated group in each molecule, (D) a photopolymerization initiator and (E) inorganic fine particles.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: July 7, 2015
    Assignee: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Kazuhiko Kurafuchi, Toshizumi Yoshino, Hideyuki Katagi, Masaya Ookawa, Yoshiaki Fuse
  • Publication number: 20150111155
    Abstract: A resist composition including a polymeric compound containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. R1 represents a polymerizable group; Y1 represents a hydrocarbon group of 1 to 30 carbon atoms; L1 represents a single bond or a carbonyl group; Y2 represents a divalent linking group, and R2 represents a hydrogen atom or a hydrocarbon group, provided that Y2 and R2 may be mutually bonded to form a ring with the nitrogen atom having Y2 and R2 bonded thereto; R3 represents a hydrogen atom or a hydrocarbon group; Y3 represents a group which forms an aromatic ring together with the two carbon atoms having Y3 bonded thereto, provided that the aromatic ring may have a nitro group or a substituent other than the nitro group bonded to the aromatic ring.
    Type: Application
    Filed: December 23, 2014
    Publication date: April 23, 2015
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Jiro Yokoya
  • Patent number: 8962712
    Abstract: An alkali-developable photosensitive resin composition comprises a carboxyl group-containing urethane resin having a biphenyl novolak structure, a photopolymerization initiator, and aluminum hydroxide and/or a phosphorus-containing compound. The composition may be formulated as a photocurable and thermosetting resin composition by further incorporating therein a thermosetting component having a plurality of cyclic ether groups and/or cyclic thioether groups in the molecule, besides the components described above. The photosensitive resin composition may further contain a colorant.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: February 24, 2015
    Assignee: Taiyo Holdings Co., Ltd.
    Inventors: Nobuhito Ito, Kazuyoshi Yoneda, Masao Arima
  • Patent number: 8927195
    Abstract: A photosensitive composition includes (A) a polyurethane obtained by reacting a diol component including a compound represented by the following Formula (I) with a polyisocyanate component; and (B) a photosensitive component. In Formula (I), A represents a single bond, or a divalent linking group including an atom selected from the group consisting of a carbon atom, a hydrogen atom, and an oxygen atoms; B represents a monovalent organic group; each of R1 to R5 independently represents a hydrogen atom or an alkyl group; m represents an integer from 0 to 3; n represents an integer from 0 to 3; and m+n is not zero.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: January 6, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Takashi Aridomi
  • Patent number: 8916335
    Abstract: A photo-curable transfer sheet having a photo-curable transfer layer comprising a photo-curable composition, the photo-curable composition being deformable by application of pressure and containing a reactive polymer having a photopolymerizable functional group, wherein the photo-curable transfer layer shows linearity in relationship between strain [?] (%) and time [t] (second) measured by a creep test using a dynamic viscoelasticity measuring apparatus under the conditions of an ordinary temperature, stress of 50 Pa and a time period of 120 seconds, and satisfies a following formula: log ?=a+b·log t, in which “a” is a real number, and “b” is in the range of 0.10 to 0.53; and a process for the preparation of an optical information recording medium using the sheet and an optical information recording medium.
    Type: Grant
    Filed: October 6, 2004
    Date of Patent: December 23, 2014
    Assignee: Bridgestone Corporation
    Inventors: Hideki Kitano, Takato Inamiya, Kenji Murayama, Hidefumi Kotsubo, Yasuhiro Morimura
  • Publication number: 20140349234
    Abstract: The present invention relates to a positive working lithographic printing plate precursor, comprising: (1) a substrate; and (2) an imaging layer, formed on the substrate, comprising a water-insoluble and an alkaline aqueous solution-soluble or dispersible resin and a photo-thermal converting material, wherein the imaging layer comprises either polyurethane or polyurethane urea or both of the polyurethane and the polyurethane urea, the polyurethane and the polyurethane urea comprising a unit having a substituent having an acidic hydrogen atom and a unit having a polysiloxane moiety in a side or main chain. The present invention can provide a lithographic printing plate precursor which has high printing durability, good scratch resistance, and good developing properties, as well as enhanced ink receptivity.
    Type: Application
    Filed: October 30, 2012
    Publication date: November 27, 2014
    Inventors: Motohiro Tsushima, Yasuhiro Asawa
  • Patent number: 8889341
    Abstract: A negative-working lithographic printing plate precursor comprises a negative-working radiation-sensitive imageable layer and an outermost layer comprising a vinyl alcohol copolymer comprising at least one unit of each of the (a), (b), and (c) recurring units, in any order, defined in the disclosure. The (c) recurring units are present in the vinyl alcohol copolymer in an amount of at least 0.5 mol %, based on the total recurring units. These precursors can be used to prepare lithographic printing plates either on-press or off-press after imaging using near-UV, visible, or infrared radiation.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: November 18, 2014
    Assignee: Eastman Kodak Company
    Inventors: Saija Werner, Harald Baumann, Udo Dwars, Christopher D. Simpson, Axel Draber
  • Patent number: 8883402
    Abstract: A photocurable composition comprising a photoresist component, and an ethylenically unsaturated perfluoropolyether is disclosed. The composition enables easier release of phototool from a photoresist.
    Type: Grant
    Filed: June 19, 2013
    Date of Patent: November 11, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Douglas C. Fall, Zai-Ming Qiu
  • Publication number: 20140272710
    Abstract: A lithographic printing plate precursor in a positive-type with an infrared-sensitivity, having a support and an image recording layer provided on the support, the support having a hydrophilic surface, the recording layer having a particular resin, an amphoteric surfactant and/or an anionic surfactant, and an infrared absorbing agent, wherein the particular resin being at least one of resins selected from the group consisting of a polyurethane resin, a poly(vinyl acetal) resin, and maleimide resin A.
    Type: Application
    Filed: May 27, 2014
    Publication date: September 18, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Shigekatsu FUJII, Norio AOSHIMA, Yoshinori TAGUCHI, Yoichiro ARA, Takashi ARIDOMI
  • Publication number: 20140255848
    Abstract: An object of the present invention is to provide a lithographic printing plate precursor which exhibits satisfactory developability using a developing solution having the pH of 12 or lower and has long print run length and satisfactory scratch resistance, and also exhibits improved ink receptivity.
    Type: Application
    Filed: October 30, 2012
    Publication date: September 11, 2014
    Inventors: Masamichi Kamiya, Yasuhiro Asawa, Yasushi Miyamoto, Maru Aburano, Eiji Hayakawa
  • Publication number: 20140255846
    Abstract: A polymerizable composition contains (A) a polymerization initiator that is an acetophenone-based compound or an acylphosphine oxide-based compound, (B) a polymerizable compound, (C) at least either a tungsten compound or a metal boride, and (D) an alkali-soluble binder.
    Type: Application
    Filed: May 20, 2014
    Publication date: September 11, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Kimi IKEDA, Yoshinori TAMADA, Makoto KUBOTA
  • Patent number: 8828648
    Abstract: Provided is a method of producing a planographic printing plate, including: subjecting a planographic printing plate precursor, to image-wise exposure; and developing it using an alkaline aqueous solution which contains a specific compound and has a pH of from 8.5 to 10.8, in this order. The recording layer has: a lower layer containing a water-insoluble and alkali-soluble resin and an infrared ray absorbing agent; and an upper layer containing a water-insoluble and alkali-soluble polyurethane resin and a polyorganosiloxane. The specific compound is a nonionic or anionic surfactant, or at least one compound represented by Formula (1) or (2), wherein R11, R12, and R13 each represent an alkyl group; R14 represents an alkylene group; and R15 represents a single bond or a divalent linking group containing a hetero atom; and R21, R22, and R23 each represent an alkyl group.
    Type: Grant
    Filed: February 15, 2011
    Date of Patent: September 9, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Norio Aoshima
  • Patent number: 8816211
    Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment, and the photocurable compositions can be used to form various articles.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: August 26, 2014
    Assignee: Eastman Kodak Company
    Inventor: Deepak Shukla
  • Patent number: 8802355
    Abstract: A lithographic printing plate precursor includes a support, and an image-recording layer, the image-recording layer contains a urethane resin having a polyalkylene oxide chain represented by the formula (1) as defined herein in a side chain, an infrared absorbing agent, a radical polymerizable compound and a radical polymerization initiator, and an unexposed area of the image-recording layer is capable of being removed with at least one of dampening water and ink.
    Type: Grant
    Filed: September 29, 2010
    Date of Patent: August 12, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Katsuhiro Shimono, Hidekazu Oohashi
  • Patent number: 8785109
    Abstract: A method for producing a printable lithographic plate from a negative working, radiation imageable plate having an oleophilic resin coating that reacts to radiation by cross linking and is non-ionically adhered to a hydrophilic substrate. Steps include imagewise radiation exposing the coating to produce an imaged plate having partially reacted image areas including unreacted coating material, and completely unreacted nonimage areas; developing the plate by removing only the unreacted, nonimage areas from the substrate while retaining unreacted material in the image areas; and blanket exposing the developed plate with a source of energy which further reacts the retained unreacted material in the image areas. A plate with a coating containing resin particles can be imaged to produce initial cross-linking, then mechanically developed. Hardening of the imaged areas is completed with a relatively intense post-heating at 160 deg. C., which further cross links the monomer and fuses the resin particles.
    Type: Grant
    Filed: March 6, 2012
    Date of Patent: July 22, 2014
    Assignee: Anocoil Corporation
    Inventors: Howard A. Fromson, William J. Ryan
  • Publication number: 20140162178
    Abstract: There is provided a photosensitive composition for forming a black matrix including pigment of 5˜20 wt %; binder resin of 1˜25 wt %; photo-polymerizable monomer of 1˜25 wt %; photopolymerization initiator of 1˜25 wt %; solvent of 65˜85 wt %; and photo base generator of 1˜10 wt %, based on 100 parts by weight of the photosensitive composition.
    Type: Application
    Filed: December 4, 2013
    Publication date: June 12, 2014
    Applicant: LG DISPLAY CO., LTD.
    Inventor: Youn-Sung NA
  • Patent number: 8748082
    Abstract: A flexographic printing sleeve or plate is made by a method that includes providing a millable polyurethane, crosslinking the millable polyurethane, and forming a relief by at least laser engraving the crosslinked millable polyurethane. For example, crosslinking may be accomplished by a peroxide-based process or by a vulcanization process using sulfur. A relief in one example is formed by extruding the millable polyurethane, thermally crosslinking the polyurethane after the extrusion step and laser engraving the crosslinked millable polyurethane. A printing article is formed into the shape of a flat printing plate or a continuous in-the-round printing sleeve.
    Type: Grant
    Filed: June 25, 2013
    Date of Patent: June 10, 2014
    Assignee: Xiper Innovations, Inc.
    Inventor: Rustom S. Kanga
  • Patent number: 8729397
    Abstract: An embedded structure of circuit board is provided. The embedded structure includes a substrate, a first patterned conductive layer disposed on the substrate and selectively exposing the substrate, a first dielectric layer covering the first patterned conductive layer and the substrate, a pad opening disposed in the first dielectric layer, and a via disposed in the pad opening and exposing the first patterned conductive layer, wherein the outer surface of the first dielectric layer has a substantially even surface.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: May 20, 2014
    Assignee: Unimicron Technology Corp.
    Inventors: Yi-Chun Liu, Wei-Ming Cheng, Tsung-Yuan Chen, Shu-Sheng Chiang
  • Publication number: 20140134540
    Abstract: A photosensitive composition includes (A) a polyurethane obtained by reacting a diol component including a compound represented by the following Formula (I) with a polyisocyanate component; and (B) a photosensitive component. In Formula (I), A represents a single bond, or a divalent linking group including an atom selected from the group consisting of a carbon atom, a hydrogen atom, and an oxygen atoms; B represents a monovalent organic group; each of R1 to R5 independently represents a hydrogen atom or an alkyl group; m represents an integer from 0 to 3; n represents an integer from 0 to 3; and m+n is not zero.
    Type: Application
    Filed: January 22, 2014
    Publication date: May 15, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Yoshinori TAGUCHI, Takashi ARIDOMI
  • Patent number: 8722309
    Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: May 13, 2014
    Assignee: Lucky Huaguang Graphics Co., Ltd.
    Inventors: Qinghai Yang, Fangqian Teng, Xiaowei Song, Hecheng Li, Zhaoyang Wu, Junjun Wu, Xiaohong Chen, Dongli Liu
  • Patent number: 8673540
    Abstract: The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: March 18, 2014
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Meng-Yen Chou, Chuan-Zong Lee
  • Publication number: 20140069702
    Abstract: The photosensitive resin composition contains a (A) binder polymer, (B) cross-linked polymer particles, (C) thermosetting resin, (D) photo-polymerization initiator, and a (E) phosphoric flame retardant, in which a content of the (B) cross-linked polymer particles is 30 parts by weight to 100 parts by weight with respect to the 100 parts by weight of the (A) binder polymer, and an average particle diameter of the (B) cross-linked polymer particles is 1 ?m to 10 ?m. Therefore, the photosensitive resin composition (i) obtains an excellent tack-free property after being applied and dried, (ii) can be subjected to fine processing, (iii) is formed into a cured film having excellent flexibility, flame retardancy, and electrical insulation reliability, and (iv) causes a substrate to have a small warpage after being cured.
    Type: Application
    Filed: April 24, 2012
    Publication date: March 13, 2014
    Inventor: Yoshihide Sekito
  • Publication number: 20140044932
    Abstract: A photocurable composition comprising a photoresist component, and an ethylenically unsaturated perfluoropolyether is disclosed. The composition enables easier release of phototool from a photoresist.
    Type: Application
    Filed: June 19, 2013
    Publication date: February 13, 2014
    Inventors: Douglas C. Fall, Zai-Ming Qiu
  • Patent number: 8637224
    Abstract: A process for making a relief printing plate is provided, the process including a layer formation step of forming a relief-forming layer from a resin composition containing (Component A) a compound having a hydrolyzable silyl group and/or a silanol group and (Component B) a conjugated diene monomer unit-containing polymer, and at least either further containing (Component C) a vulcanizing agent having a sulfur atom or Component A above being a compound further having a sulfur atom, a crosslinking step of thermally crosslinking the relief-forming layer to thus obtain a relief printing starting plate having a crosslinked relief-forming layer, and an engraving step of laser-engraving the relief printing starting plate having a crosslinked relief-forming layer to thus form a relief layer.
    Type: Grant
    Filed: December 23, 2010
    Date of Patent: January 28, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hiroshi Sato
  • Patent number: 8632951
    Abstract: A positive-working lithographic printing plate precursor for infrared laser is provided that includes, layered sequentially above a support, a lower layer and an upper layer, the lower layer and/or the upper layer including an infrared absorbing agent, either the lower layer comprising an alkali-soluble group-containing graft copolymer or the upper layer comprising a sulfonamide group-, active imide group-, and/or amide group-containing graft copolymer, and the graft copolymer being a polyurethane resin having as a graft chain an ethylenically unsaturated monomer-derived constitutional unit. There is also provided a process for making a lithographic printing plate, the process including in sequence an exposure step of imagewise exposing by means of an infrared laser the positive-working lithographic printing plate precursor for infrared laser and a development step of developing using an aqueous alkali solution with a pH of 8.5 to 10.8.
    Type: Grant
    Filed: March 4, 2011
    Date of Patent: January 21, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Noriaki Watanabe, Norio Aoshima
  • Patent number: 8632944
    Abstract: A mask-forming film has a transparent layer between the imageable layer and the carrier sheet, which transparent layer has a refractive index that is lower (by at least 0.04) than that of the carrier sheet or any immediately adjacent layer between it and the carrier sheet. This lower refractive index layer modifies the path of incident radiation during mask image transfer so as to provide steeper shoulder angles in the relief image solid areas. This mask film is used to form a relief image such as in a flexographic printing plate.
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: January 21, 2014
    Assignee: Eastman Kodak Company
    Inventors: Gregory L. Zwadlo, David E. Brown, Elsie A. Fohrenkamm, A. Peter Stolt
  • Patent number: 8632957
    Abstract: A process for making a relief printing plate is provided that includes a layer formation step of forming a relief-forming layer from a resin composition that contains (Component A) a compound having a hydrolyzable silyl group and/or a silanol group, (Component B) a binder polymer, and (Component C) a peroxide, a crosslinking step of thermally crosslinking the relief-forming layer to thus obtain a relief printing plate precursor having a crosslinked relief-forming layer, and an engraving step of laser-engraving the relief printing plate precursor having a crosslinked relief-forming layer to thus form a relief layer.
    Type: Grant
    Filed: December 23, 2010
    Date of Patent: January 21, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Takashi Kawashima
  • Patent number: 8574822
    Abstract: A nanoimprint resist includes a hyperbranched polyurethane oligomer, a perfluoropolyether, a methylmethacrylate, a diluent solvent, and a photo initiator. The hyperbranched polyurethane oligomer can be polymerized by a copolymerization of trimellitic anhydride, ethylene mercaptan, and epoxy acrylic acid. The hyperbranched polyurethane oligomer can also be polymerized by a ring-opening copolymerization epoxy acrylic acid and ethylene glycol.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: November 5, 2013
    Assignees: Tsinghua University, Hon Hai Precision Industry Co., Ltd.
    Inventors: Zhen-Dong Zhu, Qun-Qing Li, Li-Hui Zhang, Mo Chen
  • Patent number: 8563222
    Abstract: A lithographic printing plate precursor comprising an image-recording layer, said image-recording layer being photopolymerizable upon exposure to light having a wavelength of from 300 to 500 nm and containing a mixture of sensitizers.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: October 22, 2013
    Assignee: Agfa Graphics NV
    Inventors: Jan Venneman, Peter Hendrikx, Paul Callant, Alexander Williamson
  • Patent number: 8557948
    Abstract: A photosensitive composition, at least containing: a carboxyl group-containing photosensitive polyurethane resin; a phosphorus-containing flame retardant; a polymerizable compound; and a photopolymerization initiator, wherein both a resin polymer of the photosensitive polyurethane resin and the polymerizable compound do not contain a phosphorus atom, wherein the photosensitive polyurethane resin has the weight average molecular weight from 2,000 to 60,000, the acid value from 20 mg KOH/g to 120 mg KOH/g, and the ethylenically unsaturated group equivalent from 0.05 mmol/g to 3.0 mmol/g, and wherein the photosensitive polyurethane resin has, in the side chain thereof, at least one particular functional group.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: October 15, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideki Tomizawa, Kazumori Minami, Daisuke Arioka
  • Publication number: 20130266899
    Abstract: The present disclosure provides a sensitive material. The sensitive material includes a polymer that turns soluble to a base solution in response to reaction with acid; a plurality of photo-base generators (PBGs) that decompose to form base in response to radiation energy; and a thermal sensitive component that generates acid in response to thermal energy.
    Type: Application
    Filed: April 9, 2012
    Publication date: October 10, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chen-Hau Wu, Ching-Yu Chang
  • Publication number: 20130260313
    Abstract: A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L?-C(CF3)2(OH). L? is a divalent linking group comprising at least one carbon and the starred bond of L? is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.
    Type: Application
    Filed: March 31, 2012
    Publication date: October 3, 2013
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Robert David Allen, Phillip Joe Brock, Masaki Fujiwara, Kazuhiko Maeda, Hoa D. Truong
  • Publication number: 20130260314
    Abstract: There is provided a resist composition including a polymeric compound (A1) containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. In the formula, R1 represents a polymerizable group; Y1 represents a hydrocarbon group of 1 to 30 carbon atoms; L1 represents a single bond or a carbonyl group; Y2 represents a divalent linking group, and R2 represents a hydrogen atom or a hydrocarbon group, provided that Y2 and R2 may be mutually bonded to form a ring with the nitrogen atom having Y2 and R2 bonded thereto; R3 represents a hydrogen atom or a hydrocarbon group; Y3 represents a group which forms an aromatic ring together with the two carbon atoms having Y3 bonded thereto, provided that the aromatic ring may have a nitro group or a substituent other than the nitro group bonded to the aromatic ring.
    Type: Application
    Filed: March 26, 2013
    Publication date: October 3, 2013
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Jiro Yokoya
  • Patent number: 8535874
    Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: September 17, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 8501390
    Abstract: A flexographic printing sleeve or plate is made by a method that includes providing a millable polyurethane, crosslinking the millable polyurethane, and forming a relief by at least laser engraving the crosslinked millable polyurethane. For example, crosslinking may be accomplished by a peroxide-based process or by a vulcanization process using sulfur. A relief in one example is formed by extruding the millable polyurethane, thermally crosslinking the polyurethane after the extrusion step and laser engraving the crosslinked millable polyurethane. A printing article is formed into the shape of a flat printing plate or a continuous in-the-round printing sleeve.
    Type: Grant
    Filed: January 20, 2009
    Date of Patent: August 6, 2013
    Assignee: Xiper Innovations, Inc.
    Inventor: Rustom S. Kanga
  • Patent number: 8501391
    Abstract: The present invention provides a photosensitive resin composition comprising 100 parts by mass of a polyurethane prepolymer having an ethylenically unsaturated group, 10 to 150 parts by mass of an ethylenically unsaturated compound, and 0.01 to 10 parts by mass of a photopolymerization initiator, wherein the ethylenically unsaturated compound comprises 0.1 to 10 parts by mass of a polyfunctional ethylenically unsaturated compound having 6 or more (meth)acryloyl groups in a molecule thereof with respect to 100 parts by mass of the polyurethane prepolymer.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: August 6, 2013
    Assignee: Asahi Kasei E-Materials Corporation
    Inventors: Masahiro Yoshida, Shusaku Tabata
  • Publication number: 20130177851
    Abstract: A photoresist composition comprising a resin which is selected from the group consisting of (meth)acryl resins and poly(hydroxystylene) resins, a novolak resin, an acid generator, and a compound represented by formula (X1): and a solvent.
    Type: Application
    Filed: December 14, 2012
    Publication date: July 11, 2013
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: SUMITOMO CHEMICAL COMPANY, LIMITED
  • Publication number: 20130115555
    Abstract: There are provided a method of forming a resist pattern includes: a step (1) in which a resist composition containing a base component (A) that generates base upon exposure and exhibits increased solubility in an alkali developing solution by the action of acid is applied to a substrate to form a resist film; a step (2) in which the resist film 2 is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film 2 is subjected to an alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion 2b of the resist film 2 has been dissolved and removed, and the resist composition used in the step (1).
    Type: Application
    Filed: November 2, 2012
    Publication date: May 9, 2013
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Tokyo Ohka Kogyo Co., Ltd.