Abstract: A photoacid generating polymer (PAG polymer) comprises i) a first repeat unit of capable of reacting with a photogenerated acid to form a carboxylic acid containing repeat unit, ii) a second repeat unit of capable of forming the photogenerated acid, and iii) a third repeat unit comprising a norbornyl ester, wherein a norbornyl ring of the norbornyl ester comprises a monovalent substituent having the formula *-L?-C(CF3)2(OH). L? is a divalent linking group comprising at least one carbon and the starred bond of L? is linked to the norbornyl ring. The first repeat unit, second repeat unit, and the third repeat unit are covalently bound repeat units of the PAG polymer.

Abstract: There is provided a resist composition including a polymeric compound (A1) containing a structural unit derived from a compound represented by general formula (a0-m), and a method of forming a resist pattern using the resist composition. In the formula, R1 represents a polymerizable group; Y1 represents a hydrocarbon group of 1 to 30 carbon atoms; L1 represents a single bond or a carbonyl group; Y2 represents a divalent linking group, and R2 represents a hydrogen atom or a hydrocarbon group, provided that Y2 and R2 may be mutually bonded to form a ring with the nitrogen atom having Y2 and R2 bonded thereto; R3 represents a hydrogen atom or a hydrocarbon group; Y3 represents a group which forms an aromatic ring together with the two carbon atoms having Y3 bonded thereto, provided that the aromatic ring may have a nitro group or a substituent other than the nitro group bonded to the aromatic ring.

Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.

Abstract: A flexographic printing sleeve or plate is made by a method that includes providing a millable polyurethane, crosslinking the millable polyurethane, and forming a relief by at least laser engraving the crosslinked millable polyurethane. For example, crosslinking may be accomplished by a peroxide-based process or by a vulcanization process using sulfur. A relief in one example is formed by extruding the millable polyurethane, thermally crosslinking the polyurethane after the extrusion step and laser engraving the crosslinked millable polyurethane. A printing article is formed into the shape of a flat printing plate or a continuous in-the-round printing sleeve.

Abstract: The present invention provides a photosensitive resin composition comprising 100 parts by mass of a polyurethane prepolymer having an ethylenically unsaturated group, 10 to 150 parts by mass of an ethylenically unsaturated compound, and 0.01 to 10 parts by mass of a photopolymerization initiator, wherein the ethylenically unsaturated compound comprises 0.1 to 10 parts by mass of a polyfunctional ethylenically unsaturated compound having 6 or more (meth)acryloyl groups in a molecule thereof with respect to 100 parts by mass of the polyurethane prepolymer.

Abstract: A photoresist composition comprising a resin which is selected from the group consisting of (meth)acryl resins and poly(hydroxystylene) resins, a novolak resin, an acid generator, and a compound represented by formula (X1): and a solvent.

Abstract: There are provided a method of forming a resist pattern includes: a step (1) in which a resist composition containing a base component (A) that generates base upon exposure and exhibits increased solubility in an alkali developing solution by the action of acid is applied to a substrate to form a resist film; a step (2) in which the resist film 2 is subjected to exposure; a step (3) in which baking is conducted after the step (2); and a step (4) in which the resist film 2 is subjected to an alkali development, thereby forming a negative-tone resist pattern in which the unexposed portion 2b of the resist film 2 has been dissolved and removed, and the resist composition used in the step (1).

Abstract: A solvent-free conductive paste composition including (a) a binder, (b) an initiator, (c) a glass powder and (d) a conductive powder; and a solar cell element having an electrode or wire made by coating and sintering the conductive paste composition coated on a silicon semiconductor substrate. The conductive paste composition is solvent-free so that it will not cause environmental problems with respect to the evaporation of solvents and will not be easy to spread out. The conductive paste composition facilitates the development of fine wire and high aspect ratio designs and can efficiently enhance the photoelectric conversion efficiency.

Abstract: The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern, in the general formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a linear or branched alkyl group.

Abstract: Provided are a photosensitive resin composition which is excellent in a moisture and heat resistance and provides a cured product thereof with a high elastic modulus at high temperature and which is excellent as well in a hollow structure holding property and a photosensitive film prepared by using the same, a forming method for a rib pattern, a hollow structure and a forming method for the same and an electronic component. In an electronic component having a hollow structure, a photosensitive resin composition is used as a rib material or a cover material for forming the hollow structure described above, and it is characterized by using a photosensitive resin composition containing (A) a photopolymerizable compound having at least one ethylenically unsaturated group and (B) a photopolymerization initiator and a photosensitive film obtained from the above photosensitive resin composition.

Abstract: A lithographic printing plate precursor comprises an imageable layer comprising a free radically polymerizable component, an initiator composition capable of generating free radicals upon exposure to imaging infrared radiation, an infrared radiation absorbing dye that is defined by Structure (I) shown in the disclosure, which dyes comprise one or more ethylenically unsaturated polymerizable groups in an organic group that is attached to the methine chain. These infrared radiation absorbing dyes exhibit a reduced tendency to crystallize in the imageable layers in the presence of tetraaryl borate counter anions and therefore provide improved shelf life.

Abstract: Disclosed is a photosensitive resin composition suitable for use in a transflective liquid crystal display (LCD). The photosensitive resin composition uses, as an alkali-soluble binder resin, a blend of two kinds of binder resins. The first binder resin has a weight average molecular weight greater than or equal to 1,000 but lower than 20,000 and contains no reactive group. The second binder resin has a weight average molecular weight greater than or equal to 20,000 but lower than 80,000 and contains reactive groups. The photosensitive resin composition has good adhesion to an underlying substrate while forming a high resolution fine pattern.

Abstract: A resist composition is provided comprising a (co)polymer comprising recurring units of acid labile group-substituted (meth)acrylic acid, styrenecarboxylic acid or vinylnaphthalenecarboxylic acid and/or recurring units having an acid labile group-substituted phenolic hydroxyl group, an acid generator, and a metal salt of carboxylic acid or a metal complex of ?-diketone. Due to a high contrast of alkaline dissolution rate before and after exposure, high resolution, high sensitivity, and controlled acid diffusion rate, the composition forms a pattern with satisfactory profile and minimal LER.

Abstract: A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23, R24, R25, R26, X21 and X22 are defined in the specification.

Abstract: To provide a coloring photosensitive composition and a lithographic printing plate precursor, ensuring that coloring stability after exposure by infrared laser exposure is good and high coloring is obtained even when exposed after the elapse of time. These can be a coloring photosensitive composition containing a microgel encapsulating (A) a polymer having a glass transition temperature of 50° C. or more, (B) a photoinitiator, and (C) an infrared absorbing dye, and a lithographic printing plate precursor having an image-recording layer containing the composition.

Abstract: The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board.

Abstract: According to the present invention, there are provided a fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). It is possible obtain a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.

Abstract: To provide a resist composition capable of prevention of the formation of abnormal resist pattern shapes for efficient, high-precision formation of fine, high-resolution resist patterns, a resist pattern forming process capable of efficient, high-precision formation of finer, high-resolution resist patterns by using the resist composition, and a method for manufacturing a semiconductor device. The resist composition of the present invention includes a base resin, a photoacid generator, a first additive, and a second additive, wherein the pKa of the second additive is higher than the pKa of the first additive, and at a resist formation temperature, the vapor pressure of the second additive is lower than the vapor pressure of the first additive.

Abstract: The invention relates to holographic media containing specific photopolymers, a process for the production thereof, and unsaturated glycidyl ether acrylate urethanes as writing monomers which are suitable for the preparation of photopolymers.

Abstract: Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

Abstract: A photosensitive composition including: a photosensitive polyurethane resin; a phosphorus-containing flame retardant; a polymerizable compound; and a photopolymerization initiator, wherein the photosensitive polyurethane resin contains an ethylenically unsaturated bond group and a carboxyl group, and contains a polyurethane skeleton which contains a polyol group as a repeating unit.

Abstract: A lithographic printing plate precursor is provided that includes, above a support, a photosensitive layer including (i) a binder polymer, (ii) an ethylenically unsaturated compound, and (iii) a polymerization initiator, the ethylenically unsaturated compound (ii) including a compound represented by Formula (1) below. (In Formula (1), L denotes an (m+n)-valent linking group, the Ds independently denote a group selected from the group consisting of groups represented by Formulae (A) to (D) below, the Rs independently denote a monovalent substituent, m denotes an integer of 1 to 20, and n denotes an integer of 2 to 20.) (In Formulae (A) to (D), X, Y, and Z independently denote an oxygen atom, a sulfur atom, or NR17, R4 to R14 and R17 independently denote a hydrogen atom or a monovalent substituent, R15 denotes a hydrogen atom or a methyl group, R16 denotes a monovalent substituent, and k denotes an integer of 0 to 4.

Abstract: A colored curable composition including: (A) a pigment dispersion containing (a-1) a pigment, (a-2) a compound having a pigment mother nucleus structure and an amino group in a molecule, and (a-3) a resin having an acid group and a polymerizable group; (B) an oxime ester initiator; and (C) a polymerizable compound.

Abstract: A negative type resist composition for a color filter including (A) a pigment dispersant, (B) a pigment, (C) an alkaline-soluble resin, (D) a polyfunctional monomer, (E) a photo initiator and (F) a solvent.

Abstract: An alkali-developable photosensitive resin composition comprises a carboxyl group-containing urethane resin having a biphenyl novolak structure, a photopolymerization initiator, and aluminum hydroxide and/or a phosphorus-containing compound. The composition may be formulated as a photocurable and thermosetting resin composition by further incorporating therein a thermosetting component having a plurality of cyclic ether groups and/or cyclic thioether groups in the molecule, besides the components described above. The photosensitive resin composition may further contain a colorant.

Abstract: A resist composition contains (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator, and (D) at least one compound selected from the group consisting of a compound represented by the formula (II1) and a compound represented by the formula (II2), wherein R1, A1, R2, R6, X1, X2, R3, R4 and R5 are defined in the specification.

Abstract: A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having a nitrogen atom bonded to an acid labile group, an acid generator, and an organic solvent onto a substrate, prebaking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved.

Abstract: A radiation-sensitive resin composition includes an acid-labile group-containing resin, a radiation-sensitive acid generating agent, and an acid diffusion controller including a first compound shown by a following general formula (1-1) and a second compound shown by a following general formula (1-2) or (1-3). In the formula (1-1), each of R1 and R2 individually represents a hydrogen atom or the like, and Rp represents an acid-labile group. In the formula (1-2), R3 represents a hydrogen atom or the like, and each of R4 to R6 individually represents a hydrogen atom or the like. In the formula (1-3), R3 represents a hydrogen atom or the like, Rq represents a single bond or the like, and each of R5 and R6 individually represents a hydrogen atom or the like.

Abstract: A photopolymerization initiator is provided. The photopolymerization initiator contains at least one unsaturated double bond and at least one oxime ester group in the molecule. The photopolymerization initiator comprises a compound represented by Formula 1 or 2: wherein R1 and R2 are each independently —CH3, —C2H5, —C3H7 or —C6H5; wherein R3, R4 and R5 are each independently —CH3, —C2H5, —C3H7 or —C6H5. Further provided is a photosensitive resin composition comprising the photopolymerization initiator. The use of the photosensitive resin composition in photolithography reduces the formation of volatile residue during post-development baking.

Abstract: An adhesive sheet includes a substrate and an energy-ray curable adhesive layer formed on the substrate. The energy-ray curable adhesive layer includes an energy-ray curable acrylic copolymer and a urethane acrylate. The energy-ray curable acrylic copolymer is formed by copolymerizing at least one of either a dialkyl(meth)acrylamide that has an alkyl group with carbon number of not more than 4, a phenol EO modified (meth)acrylate that has an ethylene glycol chain with a phenyl group bonded to the ethylene glycol chain, a (meth)acryloyl morpholine, or a (meth)acrylate that has an aceto-acetoxyl group, in total of 1 to 30 weight percent of all monomers to form the energy-ray curable acrylic copolymer. The energy-ray curable acrylic copolymer further includes a side chain with an unsaturated group.

Abstract: A lithographic printing plate precursor includes a support; and an image forming layer formed from a photosensitive composition, wherein the photosensitive composition includes: a photopolymerization initiator; a polymerizable compound; and a binder polymer including a graft chain, and the graft chain is a hydrophilic graft chain including a hydrophilic group.

Abstract: A method for preparing a lithographic printing plate includes treating a lithographic printing plate precursor including a hydrophilic support and an image-forming layer containing the following (i) to (iii) with an aqueous solution having a buffering ability: (i) a binder polymer comprising a repeating unit having a structure represented by the following formula (1); (ii) an ethylenically unsaturated compound; and (iii) a polymerization initiator, P-L-(CO2H)n??(1) wherein P represents a part constituting a main chain skeleton of the polymer, L represents an (n+1) valent connecting group, and n represents an integer of 1 or more.

Abstract: Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.

Abstract: A lithographic printing plate precursor is provided that, using laser exposure, exhibits an excellent capacity for plate inspection, an excellent on-press development performance or gum development performance, and an excellent scumming behavior, while maintaining a satisfactory printing durability. There is also provided a method of lithographic printing that uses this lithographic printing plate precursor. The lithographic printing plate precursor comprises an image recording layer having (A) a nonionic polymerization initiator that contains at least two cyclic imide structures, and (B) a compound that has at least one addition-polymerizable ethylenically unsaturated bond.

Abstract: The present invention relates to a UV curable photochromic composition comprising a photochromic dye and an acrylate-based prepolymer having a polyol structure in which an acrylate-based functional group is introduced by using an iso-cyanate-based compound having two or more isocyanate functional groups as a linker, and to products formed by using the same.

Abstract: A laser-decomposable resin composition of the invention contains a polyurethane resin having a structure wherein an aromatic group is directly connected to a urethane bond.

Abstract: The invention provides an infrared-sensitive positive-working image forming material which provides excellent development latitude, image formability and image region strength, and in which decrease in development property is prevented even when a certain time has passed after pattern exposure until development treatment; an infrared-sensitive positive-working planographic printing plate precursor which is formed from the image forming material and has excellent image formability and image region printing durability; and a method for manufacturing a planographic printing plate using the planographic printing plate precursor. The image forming material includes; on a support, a lower layer containing a polymer having carboxylic acid groups at side chains thereof, at least a part of the carboxylic acid groups forming a salt structure with a monovalent basic compound, and an infrared absorbing agent; and an upper layer whose solubility to aqueous alkaline solution is increased by heat, in this order.

Abstract: A photosensitive composition, at least containing: a carboxyl group-containing photosensitive polyurethane resin; a phosphorus-containing flame retardant; a polymerizable compound; and a photopolymerization initiator, wherein both a resin polymer of the photosensitive polyurethane resin and the polymerizable compound do not contain a phosphorus atom, wherein the photosensitive polyurethane resin has the weight average molecular weight from 2,000 to 60,000, the acid value from 20 mg KOH/g to 120 mg KOH/g, and the ethylenically unsaturated group equivalent from 0.05 mmol/g to 3.0 mmol/g, and wherein the photosensitive polyurethane resin has, in the side chain thereof, at least one particular functional group.

Abstract: Radiation-sensitive element comprising a substrate and a radiation-sensitive coating comprising (a) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (b) at least one free-radical polymerizable oligomer A having an average molecular weight in the range of 3,500 to 9,000 determined by GPC, obtainable by reacting a triisocyanate with (i) at least one acrylic or methacrylic monomer with two free OH groups and at least one (meth)acrylic group and (ii) at least one compound comprising one OH group, at least one (meth)acrylic group and at least one poly(alkyleneoxide) chain in the molecule, wherein the (meth)acrylic monomer (i) is present in an amount of 2 to 20 mole-%, based on the total amount of (meth)acrylic compounds with OH functionality.

Abstract: There are disclosed urethane acrylates of Formula 1: where R1a, R1b and R1c each independently represent C2-15hydrocarbylene, preferably linear C3-12alkylene (such as, C4-8alkylene; e.g. hexylene); a isophorone unit and/or a tolyl unit. R2a, R2b and R2c each independently represent: a divalent moiety of (Formula 2) where X and Y independently represent C2-10hydrocarbylene, preferably C2-8alkylene; and k is from 0 to 30; l is from 0 to 30; and ‘k+l’ is from 1 to 30; and/or a divalent moiety of Formula 3 where V and W independently represent C2-10hydrocarbylene, preferably C2-8alkylene; and i is from 0 to 30; j is from 0 to 30; and ‘i+j’ is from 1 to 30; p is from 1 to 10; and r is from 1 to 10; and R3a R3b and R3c each independently represent H or methyl (i.e.

Abstract: A photosensitive resin composition according to the invention comprises (A) a binder polymer, (B) a photopolymerizing compound with an ethylenic unsaturated group and (C) a photopolymerization initiator, wherein component (B) contains a compound represented by the following general formula (I). [Wherein R1-R3 each independently represent a group represented by the following general formula (II): or the following general formula (III): and at least one of R1-R3 is a group represented by general formula (III).

Abstract: An optical moulding process is disclosed comprising the sequential steps of: (a)(y) forming a layer of a photocurable composition; and (bXz) irradiating selected areas of the composition in the layer with radiation from a radiation source, thereby curing the composition in said selected areas and repeating the steps a) and b) on top of an earlier cured layer to form a three dimensional structure, wherein the radiation source used in step b) is a non-coherent source of radiation and wherein the photocurable composition comprises at least two curable components: (i) 45%-95% (and preferably at least 50%, more preferably at least 60%, e.g.

Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.

Abstract: Polymer-containing solution can be purified and the solvent reused by subjecting the solution to microfiltration using tubular filters having an average pore diameter of less than 1 ?m and a filtration pressure of at least 0.35 MPa. This method is particularly useful for reclaiming and reusing solvents that are used in the development or chemical washout of flexographic printing plates.

Abstract: A backside coating is applied to lithographic printing plate precursors and this coating provides sufficient protection so that adjacent precursors are not scratched or otherwise damaged when stacked. The backside coating is readily dissolved during processing or development at a pH of at least 6.5 after the precursors are imaged.

Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.

Abstract: Negative-working imageable element can be used to prepared lithographic printing plates. These elements include a water-soluble contrast dye having a ?max in the range of from about 450 to about 750 nm and having an absorption that is lower than 10% with respect to the absorption of the radiation absorbing compound in the element at the wavelength used for exposure. The contrast dye is present in sufficient H-aggregation such that less than 40% of the entire absorption spectrum from the contrast dye is contributed by it in non-H-aggregated form.

Abstract: A laser-decomposable resin composition of the invention contains a polyurethane resin having a structure wherein an aromatic group is directly connected to a urethane bond.

Abstract: A curable composition in which polymerization inhibition due to oxygen is suppressed and which may be cured with high sensitivity by exposure to laser light or the like is provided. The curable composition includes: a polymerizable compound having an ethylenically unsaturated bond; a binder; a radical polymerization initiator; and at least one specific amine compound. Also provided is an image forming material and a negative-working planographic printing plate precursor including the curable composition.

Abstract: The present invention relates to a system and a resin relating to rapid prototyping. The System comprises: (a) an apparatus for producing a three-dimensional object from a light-sensitive material, wherein input optics (IO) and output optics (OO) facilitates transmission of light emitted from an illumination source via individually controllable light modulators (LM) of spatial light modulator (SLM) to an illumination area (IA), wherein said output optics (OO) enable focusing of the pattern of light from spatial light modulators (SLM) on an illumination area (IA); and (b) a resin composition comprising: (A) an acrylate component with (B) a methacrylate component and (C) a photo initiator.